JP2015005676A - Illuminating optical system, illuminating optical device, exposure device, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an illuminating optical system by which a pupil intensity distribution at each point on a target illumination face can be adjusted to its required distribution.SOLUTION: An illuminating optical system that illuminates a target illumination face with light from a light source, comprises: a spatial light modulator that has a plurality of optical elements arrayed in a predetermined face and independently controlled, and that forms in the first plane a light intensity distribution corresponding to a pupil intensity distribution to be formed on the illumination pupil of the illuminating optical system; an optical integrator having a plurality of unit wavefront splitting faces arrayed along the first plane; a first deflecting part by which light passes through the unit wavefront splitting face of a first group among the unit wavefront splitting faces is guided to a first illumination area in an illuminating area on the target illumination face; and a second deflecting part by which light passed through the unit wavefront splitting face of the second group, different from the first group, among the unit wavefront splitting faces is guided to a second illumination area different form the first illumination area.

Description

  The present invention relates to an illumination optical system, an illumination optical apparatus, an exposure apparatus, and a device manufacturing method.

  In an exposure apparatus used for manufacturing a device such as a semiconductor element, a light source emitted from a light source is a secondary light source (generally a surface light source consisting of a number of light sources via a fly-eye lens as an optical integrator). Form a predetermined light intensity distribution in the illumination pupil. Hereinafter, the light intensity distribution in the illumination pupil is referred to as “pupil intensity distribution”. The illumination pupil is a position where the illumination surface becomes the Fourier transform plane of the illumination pupil by the action of the optical system between the illumination pupil and the illumination surface (a mask or a wafer in the case of an exposure apparatus). Defined.

  The light from the secondary light source is collected by the condenser optical system and then illuminates the mask on which a predetermined pattern is formed in a superimposed manner. The light transmitted through the mask forms an image on the wafer via the projection optical system, and the mask pattern is projected and exposed (transferred) onto the wafer. The pattern formed on the mask is miniaturized, and it is indispensable to obtain a uniform illuminance distribution on the wafer in order to accurately transfer the fine pattern onto the wafer.

  Conventionally, there has been proposed an illumination optical system capable of continuously changing the pupil intensity distribution (and thus the illumination condition) without using a zoom optical system (see, for example, Patent Document 1). In a conventional illumination optical system, an incident light flux is made minute for each reflecting surface by using a movable multi-mirror configured by a large number of minute mirror elements that are arranged in an array and whose tilt angle and tilt direction are individually driven and controlled. By dividing the light into units and deflecting, the cross section of the light beam is converted into a desired shape or a desired size, and thus a desired pupil intensity distribution is realized.

US Patent Application Publication No. 2009/0116093

  In order to accurately transfer the fine pattern of the mask onto the wafer, not only the pupil intensity distribution is adjusted to the desired shape, but also the pupil intensity distribution for each point on the wafer as the final irradiated surface is almost uniform. It is necessary to adjust to. If there is a variation in the uniformity of the pupil intensity distribution at each point on the wafer, the line width of the pattern varies from position to position on the wafer, and the fine pattern of the mask has the desired line width over the entire exposure area. It cannot be accurately transferred onto the wafer.

  The present invention has been made in view of the above-described problems, and an object thereof is to provide an illumination optical system that can adjust the pupil intensity distribution at each point on the irradiated surface to a required distribution. . Further, the present invention uses an illumination optical system that adjusts the pupil intensity distribution at each point on the surface to be irradiated to a required distribution, and can perform exposure with good exposure under appropriate illumination conditions. An object is to provide an apparatus.

In order to solve the above-described problem, in the first embodiment, in the illumination optical system that illuminates the illuminated surface with light from the light source,
Spatial light modulation having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on the illumination pupil of the illumination optical system on the first surface And
An optical integrator having a plurality of unit wavefront division planes arranged along the first plane;
A first deflector that guides light that has passed through a first group of unit wavefront division surfaces of the plurality of unit wavefront division surfaces to a first illumination region in an illumination region on the irradiated surface;
Second light that guides light that has passed through a second group of unit wavefront division planes different from the first group among the plurality of unit wavefront division planes to a second illumination area different from the first illumination area in the illumination area. Provided is an illumination optical system comprising a deflection unit.

In the second embodiment, in the illumination optical system that illuminates the illuminated surface with light from the light source,
A spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on an illumination pupil of the illumination optical system in a predetermined area When,
An optical integrator having a plurality of unit wavefront division planes arranged in the predetermined region;
A condenser optical system that condenses the light from the optical integrator and guides it to the irradiated surface,
The light that has passed through the first group of unit wavefront division planes arranged in a part of the first partial area in the predetermined area is guided to the first illumination area in the illumination area on the irradiated surface, and in the predetermined area Guiding the light having passed through the second group of unit wavefront division planes arranged in the second partial region different from the first partial region to a second illumination region different from the first illumination region in the illumination region. An illumination optical system is provided.

In the third embodiment, in the illumination optical system that illuminates the illuminated surface with light from the light source,
A spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on an illumination pupil of the illumination optical system in a predetermined area When,
An optical integrator having a plurality of unit wavefront division planes arranged in the predetermined region;
A condenser optical system that condenses the light from the optical integrator and guides it to the irradiated surface,
The plurality of unit wavefront dividing surfaces and the irradiated surface are optically conjugate,
The spatial light modulator generates a first pupil intensity distribution related to a first illumination area in an illumination area on the irradiated surface in a partial first partial area in the predetermined area, and the illumination Generating a second pupil intensity distribution related to a second illumination area different from the first illumination area in the area in a second partial area different from the first partial area in the predetermined area; An illumination optical system is provided.

  According to a fourth aspect, there is provided an exposure apparatus comprising the illumination optical system according to any one of the first to third aspects for illuminating a predetermined pattern, and exposing the predetermined pattern onto a substrate.

In the fifth embodiment, using the exposure apparatus of the fourth embodiment, exposing the predetermined pattern onto a photosensitive substrate;
Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate;
And processing the surface of the photosensitive substrate through the mask layer. A device manufacturing method is provided.

In the sixth embodiment, in the illumination optical device that illuminates the illuminated surface with light from the light source,
A wavefront splitting member having a plurality of wavefront splitting elements arranged in parallel;
A condenser optical system for guiding a plurality of light fluxes wave-divided by the wave-front splitting member to the irradiated surface;
The wavefront dividing member includes a first optical member having a plurality of first elements arranged in parallel, and a second optical member having at least one power member movable in the optical axis direction on the rear side of the first element. A member, and a drive unit that moves the at least one power member in the optical axis direction in order to change the size and position of the illumination field formed on the irradiated surface by the light that has passed through the wavefront splitting element,
The power member of the second optical member is disposed in a space including a rear focal position of the first element, and provides an illumination optical device.

  According to a seventh aspect, there is provided an exposure apparatus comprising the illumination optical apparatus according to the sixth aspect for illuminating a predetermined pattern installed on the irradiated surface, and exposing the predetermined pattern onto a substrate. .

In an eighth embodiment, using the exposure apparatus of the seventh embodiment, exposing the predetermined pattern to a photosensitive substrate;
Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate;
And processing the surface of the photosensitive substrate through the mask layer. A device manufacturing method is provided.

  In the illumination optical system according to the embodiment, the pupil intensity distribution at each point on the irradiated surface can be adjusted to a required distribution. In the exposure apparatus according to the embodiment, it is possible to perform good exposure under appropriate illumination conditions using an illumination optical system that adjusts the pupil intensity distribution at each point on the irradiated surface to a required distribution. And by extension, a good device can be manufactured.

It is a figure which shows schematically the structure of the exposure apparatus concerning 1st Embodiment. It is a figure explaining the structure and effect | action of a spatial light modulator. It is a fragmentary perspective view of the principal part of a spatial light modulator. It is a figure explaining the cooperation effect | action of the spatial light modulator and deflection | deviation unit in 1st Embodiment. It is a figure which shows a mode that four ring-shaped light intensity distribution is formed in the incident side surface of a micro fly's eye lens in 1st Embodiment. It is a figure which shows roughly the principal part structure of the modification of 1st Embodiment. It is a figure which shows the arrangement | sequence of each deflection | deviation element in the modification of FIG. It is a figure which shows a mode that the ring-shaped light intensity distribution centering on an optical axis is formed in the incident side surface of a micro fly's eye lens in the modification of FIG. It is a figure which shows the modification which has arrange | positioned several partial illumination area | region in zigzag form. It is a figure which shows the modification which comprised the deflection | deviation unit by the some reflective surface. It is a figure which shows the modification which used the fly eye lens itself as a deflection | deviation part. It is a figure which shows the structure which provides a some spatial light modulator corresponding to the some fly eye lens of FIG. It is a figure which shows schematically the structure of the exposure apparatus concerning 2nd Embodiment. It is a figure which shows roughly the principal part structure of 2nd Embodiment. It is a figure explaining the correspondence of the light ray between the illumination pupil plane in a normal illumination optical apparatus, and the illumination area | region on a to-be-irradiated surface. It is a figure explaining the pupil intensity distribution regarding each point on the illumination area | region of FIG. It is a figure explaining the effect in 2nd Embodiment. It is a flowchart which shows the manufacturing process of a semiconductor device. It is a flowchart which shows the manufacturing process of liquid crystal devices, such as a liquid crystal display element.

  Hereinafter, embodiments will be described with reference to the accompanying drawings. FIG. 1 is a drawing schematically showing a configuration of an exposure apparatus according to the first embodiment. In FIG. 1, the Z-axis is along the normal direction of the transfer surface (exposure surface) of the wafer W, which is a photosensitive substrate, and the Y-axis is in the direction parallel to the paper surface of FIG. In the W transfer surface, the X axis is set in a direction perpendicular to the paper surface of FIG.

  Referring to FIG. 1, in the exposure apparatus of the first embodiment, exposure light (illumination light) is supplied from a light source LS. As the light source LS, for example, an ArF excimer laser light source that supplies light with a wavelength of 193 nm, a KrF excimer laser light source that supplies light with a wavelength of 248 nm, or the like can be used. Light emitted from the light source LS in the + Z direction is incident on the optical path bending mirror 2 via the beam transmission unit 1. The light reflected by the optical path bending mirror 2 enters the spatial light modulator 3.

  As will be described later, the spatial light modulator 3 individually controls the postures of a plurality of mirror elements arranged in a predetermined plane and individually controlled based on a control signal from the control system CR. And a driving unit for driving. The beam transmitting unit 1 guides the incident light beam from the light source LS to the spatial light modulator 3 while converting the incident light beam into a light beam having a cross section having an appropriate size and shape, and arranges a plurality of mirror elements of the spatial light modulator 3. The position variation and the angle variation of the light incident on the surface (hereinafter referred to as “spatial light modulator array surface”) are actively corrected.

  The light emitted from the spatial light modulator 3 in the + Z direction is collected by the relay optical system 4, reflected in the + Y direction by the optical path bending mirror 5, and then to the micro fly's eye lens (or fly eye lens) 6. Incident. The relay optical system 4 has its front focal position positioned at or near the arrangement surface of the spatial light modulator 3 and its rear focal position positioned at or near the incident surface 6 a of the micro fly's eye lens 6. Yes. That is, the relay optical system 4 optically sets the arrangement surface of the spatial light modulator 3 and the incident side surface 6a of the micro fly's eye lens 6 in a Fourier transform relationship.

  The light that has passed through the spatial light modulator 3 variably forms a light intensity distribution according to the postures of the plurality of mirror elements on the incident-side surface 6 a of the micro fly's eye lens 6 as will be described later. A deflection unit 7 is attached to the rear focal plane of the micro fly's eye lens 6 or in the vicinity thereof. The configuration and operation of the deflection unit 7 will be described later. Hereinafter, in order to facilitate understanding of the description, the basic configuration and operation of the exposure apparatus will be described assuming that the deflection unit 7 is not installed.

  The micro fly's eye lens 6 is, for example, an optical element made up of a large number of micro lenses having positive refractive power arranged vertically and horizontally and densely. The micro fly's eye lens 6 is formed by etching a parallel plane plate to form a micro lens group. Has been. In a micro fly's eye lens, unlike a fly eye lens composed of lens elements isolated from each other, a large number of micro lenses are integrally formed without being isolated from each other. However, the micro fly's eye lens is the same wavefront division type optical integrator as the fly's eye lens in that the lens elements are arranged vertically and horizontally.

  In the micro fly's eye lens 6, the incident side refracting surfaces of the plurality of minute lenses, for example, a plurality of rectangular minute refracting surfaces, are divided into a plurality of unit wavefronts arranged along the incident side surface 6 a of the micro fly's eye lens 6. Make up surface. The refracting surfaces on the exit side of the plurality of microlenses in the micro fly's eye lens 6, for example, a plurality of rectangular micro refracting surfaces, are arranged along the exit side surface of the micro fly's eye lens 6. Typically, in the micro fly's eye lens 6, the front focal position of the exit-side refracting surface is positioned at the position of the entrance-side refracting surface. As the micro fly's eye lens 6, for example, a cylindrical micro fly's eye lens can be used. The configuration and operation of the cylindrical micro fly's eye lens are disclosed in, for example, US Pat. No. 6,913,373.

  The light beam incident on the micro fly's eye lens 6 is two-dimensionally divided by a large number of microlenses, and the rear focal plane (the rear focal position of the combined optical system of the incident-side refractive surface and the exit-side refractive surface) or In the vicinity of the illumination pupil, a secondary light source (substantial surface light source consisting of a large number of small light sources: pupil intensity distribution) having substantially the same light intensity distribution as the light intensity distribution formed on the incident-side surface 6a is formed. Is done. The light passing through the micro fly's eye lens 6 illuminates the mask blind 9 in a superimposed manner via the condenser optical system 8.

  The light that has passed through the rectangular opening (light transmission portion) of the mask blind 9 serving as an illumination field stop is subjected to the condensing action of the imaging optical system 10 and is disposed in the optical path of the imaging optical system 10. After being reflected in the −Z direction by the bending mirror 11, the mask M on which a predetermined pattern is formed is illuminated in a superimposed manner. That is, the imaging optical system 10 forms an image of the rectangular opening of the mask blind 9 on the mask M.

  The light transmitted through the mask M held on the mask stage MS forms a mask pattern image on the wafer (photosensitive substrate) W held on the wafer stage WS via the projection optical system PL. In this way, batch exposure or scan exposure is performed while the wafer stage WS is two-dimensionally driven and controlled in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL, and thus the wafer W is two-dimensionally driven and controlled. As a result, the pattern of the mask M is sequentially exposed in each exposure region of the wafer W.

  The exposure apparatus according to the first embodiment includes a first pupil intensity distribution measurement unit DTr that measures a pupil intensity distribution on the exit pupil plane of the illumination optical system based on light via the illumination optical system (1 to 11), and projection optics. A second pupil intensity distribution measurement unit DTw that measures a pupil intensity distribution on the pupil plane of the projection optical system PL (an exit pupil plane of the projection optical system PL) based on light via the system PL, and first and second pupil intensities And a control system CR that controls the spatial light modulator 3 based on the measurement result of at least one of the distribution measurement units DTr and DTw and controls the overall operation of the exposure apparatus.

  The first pupil intensity distribution measurement unit DTr includes, for example, an imaging unit having a photoelectric conversion surface disposed at a position optically conjugate with the exit pupil position of the illumination optical system, and each point on the surface to be irradiated by the illumination optical system. Is measured (pupil intensity distribution formed at the exit pupil position of the illumination optical system by the light incident on each point). In addition, the second pupil intensity distribution measurement unit DTw includes an imaging unit having a photoelectric conversion surface arranged at a position optically conjugate with the pupil position of the projection optical system PL, for example, and includes each image plane of the projection optical system PL. A pupil intensity distribution related to the points (pupil intensity distribution formed by light incident on each point at the pupil position of the projection optical system PL) is measured.

  For the detailed configuration and operation of the first and second pupil intensity distribution measuring units DTr and DTw, reference can be made to, for example, US Patent Publication No. 2008/0030707. As the pupil intensity distribution measuring unit, the disclosure of US Patent Publication No. 2010/0020302 can be referred to.

  In the first embodiment, a secondary light source formed by the micro fly's eye lens 6 is used as a light source, and the mask M (and thus the wafer W) disposed on the irradiated surface of the illumination optical system is Koehler illuminated. For this reason, the position where the secondary light source is formed is optically conjugate with the position of the aperture stop AS of the projection optical system PL, and the formation surface of the secondary light source can be called the illumination pupil plane of the illumination optical system. Further, the image of the formation surface of the secondary light source can be called an exit pupil plane of the illumination optical system. Typically, the irradiated surface (the surface on which the mask M is disposed or the surface on which the wafer W is disposed when the illumination optical system including the projection optical system PL is considered) is optical with respect to the illumination pupil plane. A Fourier transform plane. The pupil intensity distribution is a light intensity distribution (luminance distribution) on the illumination pupil plane of the illumination optical system or a plane optically conjugate with the illumination pupil plane.

  When the number of wavefront divisions by the micro fly's eye lens 6 is relatively large, the overall light intensity distribution formed on the incident side surface 6a of the micro fly's eye lens 6 and the overall light intensity distribution of the entire secondary light source ( (Pupil intensity distribution). In the configuration of FIG. 1, the relay optical system 4 and the micro fly's eye lens 6 variably form a desired light intensity distribution in the illumination pupil immediately after the micro fly's eye lens 6 based on the light beam that has passed through the spatial light modulator 3. The distribution forming optical system is configured.

  Next, the configuration and operation of the spatial light modulator 3 will be specifically described. As shown in FIG. 2, the spatial light modulator 3 includes a plurality of mirror elements 3a arranged in a predetermined plane, a base 3b holding the plurality of mirror elements 3a, and a cable (not shown) connected to the base 3b. ), And a drive unit 3c that individually controls and drives the postures of the plurality of mirror elements 3a. In FIG. 2, the optical path from the spatial light modulator 3 to the incident side surface 6 a of the micro fly's eye lens 6 is developed linearly. In the local coordinate system (x1, y1, z1) of FIG. 2, the z1 axis in the direction corresponding to the linearly expanded optical axis AX is the global coordinate system (X, Y, Z) in a plane orthogonal to the z1 axis. The x1 axis is set in the direction corresponding to the X axis, and the y1 axis is set in the direction orthogonal to the x1 axis in a plane orthogonal to the z1 axis.

  In the spatial light modulator 3, the attitude of the plurality of mirror elements 3a is changed by the action of the drive unit 3c that operates based on a command from the control system CR, and each mirror element 3a is set in a predetermined direction. . As shown in FIG. 3, the spatial light modulator 3 includes a plurality of minute mirror elements 3a arranged two-dimensionally, and the spatial modulation corresponding to the incident position of the incident light can be varied. Is applied and injected. For ease of explanation and illustration, FIG. 2 and FIG. 3 show a configuration example in which the spatial light modulator 3 includes 4 × 4 = 16 mirror elements 3a. The number of mirror elements 3a is typically large, typically about 4000 to 100,000.

  Referring to FIG. 2, among the light beams incident on the spatial light modulator 3, the light beam L1 is incident on the mirror element SEa of the plurality of mirror elements 3a, and the light beam L2 is incident on the mirror element SEb different from the mirror element SEa. To do. Similarly, the light beam L3 is incident on a mirror element SEc different from the mirror elements SEa and SEb, and the light beam L4 is incident on a mirror element SEd different from the mirror elements SEa to SEc. The mirror elements SEa to SEd give spatial modulations set according to their positions to the lights L1 to L4.

  In the spatial light modulator 3, the optical axis AX of the optical path between the optical path bending mirror 2 and the spatial light modulator 3 in the reference state in which the reflecting surfaces of all the mirror elements 3a are set along one plane. The configuration is such that the light beam incident along the parallel direction travels in a direction parallel to the optical axis AX of the optical path between the spatial light modulator 3 and the relay optical system 4 after being reflected by the spatial light modulator 3. Has been. Further, as described above, the arrangement surface of the plurality of mirror elements 3 a of the spatial light modulator 3 and the incident side surface 6 a of the micro fly's eye lens 6 are optically Fourier-transformed via the relay optical system 4. Is positioned.

  Therefore, the light reflected by the plurality of mirror elements SEa to SEd of the spatial light modulator 3 and given a predetermined angular distribution is provided with the predetermined light intensity distributions SP1 to SP4 on the incident side surface 6a of the micro fly's eye lens 6. Form. That is, the relay optical system 4 determines the angle that the plurality of mirror elements SEa to SEd of the spatial light modulator 3 gives to the emitted light, the incident-side surface 6a that is the far field (Fraunhofer diffraction region) of the spatial light modulator 3. Convert to position above. Thus, the light intensity distribution (pupil intensity distribution) of the secondary light source formed by the micro fly's eye lens 6 is the light that the spatial light modulator 3 and the relay optical system 4 form on the incident surface 6a of the micro fly's eye lens 6. The distribution corresponds to the intensity distribution.

  As shown in FIG. 3, the spatial light modulator 3 is a large number of minute reflecting elements regularly and two-dimensionally arranged along one plane with a planar reflecting surface as the upper surface. A movable multi-mirror including a mirror element 3a. Each mirror element 3a is movable, and the inclination of the reflection surface, that is, the inclination angle and the inclination direction of the reflection surface are independently controlled by the action of the drive unit 3c that operates based on a control signal from the control system CR. Each mirror element 3a can be rotated continuously or discretely by a desired rotation angle with two directions parallel to the reflecting surface and orthogonal to each other as rotation axes. That is, it is possible to two-dimensionally control the inclination of the reflecting surface of each mirror element 3a.

  When the reflection surface of each mirror element 3a is discretely rotated, the rotation angle is set in a plurality of states (for example,..., -2.5 degrees, -2.0 degrees, ... 0 degrees, +0.5 degrees). ... +2.5 degrees,. Although FIG. 3 shows a mirror element 3a having a square outer shape, the outer shape of the mirror element 3a is not limited to a square. However, from the viewpoint of light utilization efficiency, the shape can be arranged so that the gap between the mirror elements 3a is reduced (a shape that can be packed most closely). Further, from the viewpoint of light utilization efficiency, the interval between two adjacent mirror elements 3a can be minimized.

  In the first embodiment, as the spatial light modulator 3, for example, a spatial light modulator that continuously changes the directions of a plurality of mirror elements 3a arranged two-dimensionally is used. As such a spatial light modulator, for example, European Patent Publication No. 779530, US Pat. No. 5,867,302, US Pat. No. 6,480,320, US Pat. No. 6,600,591 U.S. Patent No. 6,733,144, U.S. Patent No. 6,900,915, U.S. Patent No. 7,095,546, U.S. Patent No. 7,295,726, U.S. Patent No. 7, No. 424,330, U.S. Pat. No. 7,567,375, U.S. Patent Publication No. 2008/0309901, U.S. Pat. Publication No. 2011/0181852 and U.S. Pat. Publication No. 2011/188017. A spatial light modulator can be used. Note that the orientations of the plurality of mirror elements 3a arranged two-dimensionally may be controlled to have a plurality of discrete stages.

  In the spatial light modulator 3, the attitude of the plurality of mirror elements 3a is changed by the action of the drive unit 3c that operates according to the control signal from the control system CR, and each mirror element 3a is set in a predetermined direction. The The light reflected at a predetermined angle by each of the plurality of mirror elements 3 a of the spatial light modulator 3 forms a desired pupil intensity distribution on the illumination pupil immediately after the micro fly's eye lens 6. Thus, the spatial light modulator 3 variably forms a pupil intensity distribution on the illumination pupil immediately after the micro fly's eye lens 6. Furthermore, the position of another illumination pupil optically conjugate with the illumination pupil immediately after the micro fly's eye lens 6, that is, the pupil position of the imaging optical system 10 and the pupil position of the projection optical system PL (the aperture stop AS is disposed). The desired pupil intensity distribution is also formed at the (position). Note that the pupil intensity distribution formed at the pupil position of the projection optical system PL (position at which the aperture stop AS is disposed) is subjected to the diffraction effect of the pattern on the mask M (when there is no pattern). If there is no influence of the pupil transmittance distribution of the optical system, the distribution is the same as the pupil intensity distribution formed on the illumination pupil).

  In the exposure apparatus, in order to transfer the pattern of the mask M onto the wafer W with high accuracy and faithfulness, it is important to perform exposure under appropriate illumination conditions according to the pattern characteristics of the mask M, for example. In the illumination optical system (1 to 11) of the first embodiment, the spatial light modulator 3 in which the postures of the plurality of mirror elements 3a are individually changed is used. The shape (concept including the size) of the pupil intensity distribution can be freely and quickly changed.

  However, in order to accurately transfer the fine pattern of the mask M onto the wafer W, not only the pupil intensity distribution regarding each point on the wafer W is uniformly adjusted to a desired shape but also the respective points on the wafer W. It is necessary to adjust the pupil intensity distribution almost uniformly. If there is variation in the uniformity of the pupil intensity distribution at each point on the wafer W, the line width of the pattern varies for each position on the wafer W, and a fine pattern of the mask M is desired over the entire exposure area. The line width cannot be accurately transferred onto the wafer W.

  Specifically, in the case of a scanning exposure apparatus that performs scanning exposure, for example, an elongated rectangular illumination region is formed on the pattern surface of the mask M along the X direction. A rectangular stationary exposure region that is elongated along the X direction is formed on the wafer W via the projection optical system PL as a region optically conjugate with the illumination region. When the pupil intensity distribution formed on the illumination pupil (for example, the pupil of the projection optical system PL) by light incident on one point in the still exposure region differs greatly depending on the position of the incident point, the pattern is different for each position on the wafer W. Therefore, the fine pattern of the mask M cannot be accurately transferred onto the wafer W with a desired line width over the entire exposure region.

  In the still exposure region, the pupil at each point along the scanning orthogonal direction, that is, the X direction, which is orthogonal to the scanning direction, rather than the uniformity of the pupil intensity distribution at each point along the Y direction which is the scanning direction (scanning direction). The uniformity of the intensity distribution is more important. This is because the influence of variations in pupil intensity distribution at each point along the Y direction in the still exposure region is averaged by scanning exposure along the Y direction.

  Therefore, when the exposure apparatus of the first embodiment is a scanning type, the uniformity of the pupil intensity distribution at each point along the X direction, which is the longitudinal direction, is ensured in the rectangular illumination area and the stationary exposure area. This is very important. In the first embodiment, as described later, the pupil intensity distribution at each point along the X direction in the illumination area and the still exposure area is adjusted by the cooperative action of the spatial light modulator 3 and the deflection unit 7.

  FIG. 4 is a diagram for explaining the cooperative action of the spatial light modulator 3 and the deflection unit 7 in the first embodiment. In FIG. 4, the optical path from the spatial light modulator 3 to the pattern surface of the mask M is developed linearly. In order to facilitate understanding of the description, the relay optical system 4 and the micro fly's eye lens 6 interposed between the spatial light modulator 3 and the deflection unit 7 are omitted in FIG. Illustration of the condenser optical system 8, the mask blind 9, and the imaging optical system 10 interposed between the deflection unit 7 and the mask M is omitted. FIG. 4B is a projection view in which light related to the deflection members 7a and 7d of the deflection unit 7 of FIG. 4A is projected onto the x2z2 plane. In order to facilitate understanding of the explanation, a mask is shown. The blind 9 and the imaging optical system 10 are not shown.

  In the local coordinate system (x2, y2, z2) in FIGS. 4A and 4B, the z2 axis in the direction corresponding to the linearly expanded optical axis AX is entirely on a plane orthogonal to the z2 axis. The x2 axis is set in the direction corresponding to the X axis of the coordinate system (X, Y, Z), and the y2 axis is set in the direction orthogonal to the x2 axis in a plane orthogonal to the z2 axis. Referring to FIG. 4, a deflection unit 7 including four deflection members 7a, 7b, 7c, and 7d is arranged immediately after the rear focal plane of the micro fly's eye lens 6 or the illumination pupil 41 in the vicinity thereof. The deflecting members 7a to 7d arranged in parallel have, for example, a wedge-shaped prism form.

  In the first embodiment, among the plurality of mirror elements 3a of the spatial light modulator 3, the light L1a that has passed through the plurality of mirror elements 3a belonging to the first mirror element group is transmitted from the micro fly's eye lens 6 as shown in FIG. A ring-shaped first light intensity distribution 20a is formed in the first region 42a on the incident-side surface 6a, and as a result, the first light intensity distribution 20a in the first region 41a on the illumination pupil 41 immediately after the micro fly's eye lens 6 is formed. An annular first pupil intensity distribution 21a corresponding to is formed. Similarly, the light L1b that has passed through the plurality of mirror elements 3a belonging to the second mirror element group forms an annular second light intensity distribution 20b in the second region 42b on the incident-side surface 6a. An annular second pupil intensity distribution 21b corresponding to the second light intensity distribution 20b is formed in the upper second region 41b.

  The light L1c that has passed through the plurality of mirror elements 3a belonging to the third mirror element group forms a ring-shaped third light intensity distribution 20c in the third region 42c on the incident-side surface 6a. An annular third pupil intensity distribution 21c corresponding to the third light intensity distribution 20c is formed in the three regions 41c. The light L1d that has passed through the plurality of mirror elements 3a belonging to the fourth mirror element group forms a ring-shaped fourth light intensity distribution 20d in the fourth region 42d on the incident-side surface 6a. A ring-shaped fourth pupil intensity distribution 21d corresponding to the fourth light intensity distribution 20d is formed in the four regions 41d.

  The light L1a that forms the first pupil intensity distribution 21a in the first region 41a on the illumination pupil 41 is deflected by the first deflecting member 7a disposed corresponding to the first region 41a, and on the pattern surface of the mask M. A rectangular first partial illumination region IRa is formed in a superimposed manner. Similarly, the light L1b in which the second pupil intensity distribution 21b is formed in the second region 41b on the illumination pupil 41 is deflected by the second deflecting member 7b arranged corresponding to the second region 41b, and the pattern of the mask M A rectangular second partial illumination region IRb that is adjacent to the first partial illumination region IRa on the −x2 direction side and has the same shape (concept including size) as the first partial illumination region IRa on the surface is superimposed. To do.

  The light L1c that forms the third pupil intensity distribution 21c in the third region 41c on the illumination pupil 41 is deflected by the third deflection member 7c arranged corresponding to the third region 41c, and on the pattern surface of the mask M A rectangular third partial illumination region IRc adjacent to the second partial illumination region IRb in the −x2 direction side and having the same shape as the partial illumination regions IRa and IRb is formed in a superimposed manner. The light L1d that forms the fourth pupil intensity distribution 21d in the fourth region 41d on the illumination pupil 41 is deflected by the fourth deflecting member 7d arranged corresponding to the fourth region 41d, and on the pattern surface of the mask M A rectangular fourth partial illumination region IRd that is adjacent to the third partial illumination region IRc on the −x2 direction side and has the same shape as the partial illumination regions IRa, IRb, and IRc is formed in a superimposed manner.

  Thus, an illumination area IR composed of four partial illumination areas IRa to IRd, that is, a rectangular illumination area IR elongated in the x2 direction (corresponding to the X direction on the mask M) is formed on the pattern surface of the mask M. Incidentally, when the deflection unit 7 is not arranged, the lights L1a to L1d forming the pupil intensity distributions 21a to 21d form a single rectangular illumination region on the pattern surface of the mask M in a superimposed manner. This single rectangular illumination region has the same shape as the partial illumination regions IRa to IRd, and the shape of the unit wavefront dividing surface (rectangular minute refractive surface) and the unit wavefront dividing element (in the micro fly's eye lens 6) The shape is in accordance with the focal length of the microlenses.

  As described above, the first deflecting member 7a has a plurality of light L1a in which the annular first pupil intensity distribution 21a is formed in the first region 41a on the illumination pupil 41, that is, the surface 6a on the incident side of the micro fly's eye lens 6. The first partial illumination region in the illumination region IR on the pattern surface (irradiated surface) of the mask M is irradiated with the light L1a having passed through the first group of unit wavefront division surfaces belonging to the first region 42a among the unit wavefront division surfaces of Leads to IRa. Similarly, the second deflecting member 7b transmits the light L1b having passed through the second group unit wavefront dividing surface belonging to the second region 42b on the incident side surface 6a of the micro fly's eye lens 6 to the second part in the illumination region IR. It leads to the illumination area IRb. Here, the first pupil intensity distribution 21a can be regarded as a pupil intensity distribution related to the first partial illumination area IRa, and the second pupil intensity distribution 21b is regarded as a pupil intensity distribution related to the second partial illumination area IRb. Can do.

  The third deflection member 7c converts the light L1c that has passed through the third group unit wavefront dividing surface belonging to the third region 42c on the incident side surface 6a of the micro fly's eye lens 6 into the third partial illumination region IRc in the illumination region IR. Leading to. The fourth deflecting member 7d transmits the light L1d that has passed through the fourth unit wavefront dividing surface belonging to the fourth region 42d on the incident side surface 6a of the micro fly's eye lens 6 to the fourth partial illumination region IRd in the illumination region IR. Leading to. Here, the third pupil intensity distribution 21c can be regarded as a pupil intensity distribution related to the third partial illumination area IRc, and the fourth pupil intensity distribution 21d is regarded as a pupil intensity distribution related to the fourth partial illumination area IRd. Can do.

  On the incident side surface 6a of the micro fly's eye lens 6, the first region 42a is adjacent to the second region 42b and the third region 42c, and the fourth region 42d is adjacent to the first region 42a and the third region 42c. . This corresponds to the fact that in the illumination pupil 41, the first region 41a is adjacent to the second region 41b and the third region 41c, and the fourth region 41d is adjacent to the first region 41a and the third region 41c. Yes. In FIG. 4, the regions 41 a to 41 d and the illumination pupil 41 are illustrated as rectangular regions for the sake of clarity.

  Here, the light intensity distribution corresponding to the pupil intensity distribution to be formed on the illumination pupil is formed by the spatial light modulator 3 on the incident surface 6a of the micro fly's eye lens 6 or the surface 42 on which the surface 6a is positioned. It can be regarded as a first surface or a predetermined area. Further, the first area 41a can be regarded as a first partial area which is a partial area within the predetermined area, and the second area 41b is regarded as a second partial area different from the first partial area within the predetermined area. Can do. In the above example, the first partial region (first region 41a) and the second partial region (second region 41b) do not overlap each other.

  In the first embodiment, the pupil intensity distribution at each point of the first partial illumination region IRa is the annular first pupil intensity distribution 21a. Similarly, the pupil intensity distribution at each point in the second partial illumination area IRb is the second pupil intensity distribution 21b, and the pupil intensity distribution at each point in the third partial illumination area IRc is the third pupil intensity distribution 21c. The pupil intensity distribution at each point in the fourth partial illumination region IRd is a fourth pupil intensity distribution 21d. That is, the pupil intensity distributions 21a to 21d regarding the four different partial illumination areas IRa to IRd in the rectangular illumination area IR elongated in the x2 direction are the light L1a to the light L1a to the four different mirror element groups of the spatial light modulator 3. They are formed independently of each other by L1d.

  In the spatial light modulator 3, it is possible to virtually appropriately select four mirror element groups from the plurality of mirror elements 3a in accordance with a control signal from the control system CR, and consequently, the four pupil intensity distributions 21a to 21a. It is possible to adjust the relative intensity ratio of the four pupil intensity distributions 21a to 21d while keeping the outer shape (concept including size) of 21d the same. This means that the relative intensity ratio of the pupil intensity distributions 21a to 21d is adjusted for each of the partial illumination areas IRa to IRd located at different positions along the x2 direction in the illumination area IR, and consequently the illumination area IR (and This means that it is possible to adjust the pupil intensity distribution at each point along the x2 direction (corresponding to the X direction on the mask M and the wafer W) in the corresponding still exposure region.

  As described above, in the first embodiment, the control system CR appropriately changes the directions of the plurality of mirror elements 3a using the outputs from the pupil intensity distribution measurement units DTr and DTw, so that the illumination region IR (and thus the still exposure region) is obtained. ) The pupil intensity distribution at each of the above points can be adjusted to a required distribution. That is, in the illumination optical system (1 to 11) of the first embodiment, the pupil intensity distribution at each point on the illumination region IR is obtained as a required distribution by the cooperative action of the spatial light modulator 3 and the deflection unit 7. Can be adjusted. Further, in the exposure apparatus (1 to WS) of the first embodiment, illumination for adjusting the pupil intensity distribution at each point in the static exposure region on the wafer W optically conjugate with the illumination region IR to a required distribution. Using the optical system (1 to 11), it is possible to perform good exposure under an appropriate illumination condition according to the fine pattern of the mask M, and as a result, the fine pattern of the mask M is spread over the entire exposure region. It is possible to accurately transfer onto the wafer W with a desired line width.

  In the first embodiment, the unit wavefronts of the first to fourth groups belonging to the four regions 42a to 42d obtained by dividing the region through which the light beam passes on the incident-side surface 6a of the micro fly's eye lens 6 into four parts. Lights L1a to L1d that have passed through the split surfaces form partial illumination regions IRa to IRd, respectively. In other words, the unit wavefront division planes of the first to fourth groups through which the light L1a to L1d that respectively form the partial illumination areas IRa to IRd pass are isolated as four independent assemblies on the incident-side surface 6a. Has been. As a result, the deflecting members 7a to 7d that guide the lights L1a to L1d having passed through the unit wavefront dividing surfaces of the first group to the fourth group to the partial illumination regions IRa to IRd are each configured as a single optical member.

  However, the present invention is not limited to this configuration. For example, as shown in FIG. 6, one first unit wavefront dividing surface 43 a belonging to the first group of unit wavefront dividing surfaces and one unit wavefront dividing surface belonging to the second group. One second unit wavefront dividing surface 43b, one third unit wavefront dividing surface 43c belonging to the third group unit wavefront dividing surface, and one fourth unit wavefront dividing surface belonging to the fourth group unit wavefront dividing surface A modification in which the unit wavefront division planes of the first to fourth groups in the micro fly's eye lens 6 are distributed so that 43d is adjacent to each other is also possible.

  In FIG. 6, for the sake of clarity of the drawing, one minute lens 44 a having a rectangular first unit wavefront dividing surface 43 a, one minute lens 44 b having a rectangular second unit wavefront dividing surface 43 b, a rectangular shape Only one minute lens 44c having the third unit wavefront dividing surface 43c and one minute lens 44d having the rectangular fourth unit wavefront dividing surface 43d are illustrated, but in reality, the four minute lenses 44a are illustrated. Aggregates of .about.44d are two-dimensionally arranged along the x2y2 plane.

  Similarly, the light L2a that has passed through the first unit wavefront splitting surface 43a is deflected and guided to the first partial illumination region IRa, and the light L2b that has passed through the second unit wavefront splitting surface 43b is deflected. One second deflection element 71b that leads to the second partial illumination region IRb, one third deflection element 71c that deflects the light L2c that has passed through the third-order wavefront splitting surface 43c and leads it to the third partial illumination region IRc, and a fourth unit Only one fourth deflection element 71d that deflects the light L2d that has passed through the wavefront splitting surface 43d and guides it to the fourth partial illumination region IRd is shown, but in reality, a group of a plurality of deflection elements is arranged on the exit side (− As shown in FIG. 7 as viewed from the z2 direction side, a set of four deflection elements 71a to 71d is two-dimensionally arranged along the x2y2 plane. The deflecting elements 71a to 71d have, for example, a wedge-shaped prism form.

  Here, in FIG. 7A, a group of a plurality of first deflection elements 71a is indicated by hatching, in FIG. 7B, a group of a plurality of second deflection elements 71b is indicated by hatching, and FIG. FIG. 7D shows a group of a plurality of third deflection elements 71c by hatching, and FIG. 7D shows a group of the plurality of fourth deflection elements 71d by hatching. It is clear from FIGS. 7A to 7D that the regions where the groups of the first to fourth deflection elements 71a to 71d are dispersedly arranged do not overlap each other. In this example, since each deflection element 71a to 71d is provided in a one-to-one correspondence with each unit wavefront dividing surface of the micro fly's eye lens 6, the first to fourth unit wavefront dividing surfaces 43a of the micro fly's eye lens 6 are provided. The partial regions in which the groups of .about.43d are arranged also do not overlap with each other on the incident side surface 6a (first surface, predetermined region) of the micro fly's eye lens 6. FIG.

  In the modification shown in FIG. 6, the light intensity from the spatial light modulator 3 is, for example, a ring-shaped light intensity centered on the optical axis AX on the incident side surface 6a of the micro fly's eye lens 6 as shown in FIG. A distribution 22 is formed. The annular light intensity distribution 22 is a substantial surface light source formed by a plurality of unit light beams 22 a that reach the incident-side surface 6 a via the plurality of mirror elements 3 a of the spatial light modulator 3. As shown in FIG. 6, the unit light beams 22a constituting the annular light intensity distribution 22 formed on the incident side surface 6a of the micro fly's eye lens 6 by the spatial light modulator 3 are adjacent to each other. The light is incident on a region including a part of the wavefront dividing surface 43a, a part of the second unit wavefront dividing surface 43b, a part of the third unit wavefront dividing surface 43c, and a part of the fourth unit wavefront dividing surface 43d.

  In this case, the light L2a that has passed through the plurality of first unit wavefront dividing surfaces 43a dispersedly arranged on the incident-side surface 6a of the micro fly's eye lens 6 and the light intensity distribution 22 on the illumination pupil immediately after the micro fly's eye lens 6 After forming an annular first pupil intensity distribution 23a (not shown) having the same shape, the first pupil intensity distribution is deflected by a plurality of first deflection elements 71a arranged in a distributed manner, and is first in the illumination area IR of the pattern surface of the mask M. The partial illumination area IRa is formed in a superimposed manner. Similarly, the light L2b that has passed through the plurality of second unit wavefront division surfaces 43b arranged in a distributed manner forms an annular second pupil intensity distribution 23b (not shown) having the same shape as the light intensity distribution 22, and then disperses the light. The second partial illumination region IRb is superimposed on the illumination region IR by being deflected by the plurality of second deflection elements 71b arranged.

  The light L2c that has passed through the plurality of third unit wavefront dividing surfaces 43c arranged in a dispersed manner forms a ring-shaped third pupil intensity distribution 23c (not shown) having the same shape as the light intensity distribution 22, and is then arranged in a dispersed manner. The third partial illumination region IRc is formed in a superimposed manner in the illumination region IR by being deflected by the plurality of third deflection elements 71c. The light L2d that has passed through the plurality of fourth unit wavefront dividing surfaces 43d that are dispersedly arranged forms a ring-shaped fourth pupil intensity distribution 23d (not shown) having the same shape as the light intensity distribution 22, and is then dispersedly arranged. The fourth partial illumination region IRd is formed in a superimposed manner in the illumination region IR by being deflected by the plurality of fourth deflection elements 71d.

  In the modification of FIG. 6, the pupil intensity distribution at each point of the first partial illumination region IRa is a ring-shaped first pupil intensity distribution 23a formed through a plurality of first unit wavefront division planes 43a. Similarly, the pupil intensity distribution at each point in the second partial illumination region IRb is a second pupil intensity distribution 23b formed through the plurality of second unit wavefront dividing surfaces 43b, and each point in the third partial illumination region IRc. Is a third pupil intensity distribution 23c formed through a plurality of third unit wavefront dividing planes 43c, and the pupil intensity distribution at each point of the fourth partial illumination region IRd is a plurality of fourth unit wavefronts. It is the fourth pupil intensity distribution 23d formed through the dividing surface 43d. That is, the shape of the pupil intensity distributions 23a to 23d regarding the partial illumination areas IRa to IRd is the shape of the annular light intensity distribution 22 formed on the incident surface 6a of the micro fly's eye lens 6 by the spatial light modulator 3. Corresponding to each other.

  On the other hand, the relative intensity ratio of the pupil intensity distributions 23a to 23d with respect to the partial illumination areas IRa to IRd is the incident side of the plurality of unit light beams 22a constituting the annular light intensity distribution 22 formed by the spatial light modulator 3. Depending on the position along the surface 6a. In the spatial light modulator 3, the directions of the plurality of mirror elements 3a are changed independently from each other in accordance with a control signal from the control system CR, and the positions along the incident side surface 6a of the plurality of unit light beams 22a are mutually changed. It is possible to change it independently, and as a result, the relative intensities of the four pupil intensity distributions 23a to 23d are maintained while maintaining the same external shape (concept including size) of the four pupil intensity distributions 23a to 23d. It is possible to adjust the ratio.

  This means that the relative intensity ratio of the pupil intensity distributions 23a to 23d is adjusted for each of the partial illumination areas IRa to IRd at different positions along the x2 direction in the illumination area IR, and consequently the illumination area IR (and This means that it is possible to adjust the pupil intensity distribution at each point along the x2 direction (corresponding to the X direction on the mask M and the wafer W) in the corresponding still exposure region. As described above, also in the modified example of FIG. 6, the control system CR appropriately changes the directions of the plurality of mirror elements 3 a using the outputs from the pupil intensity distribution measurement units DTr and DTw, so that the illumination region IR (and stationary) The pupil intensity distribution at each point on the exposure area) can be adjusted to a required distribution.

  In the first embodiment and the modification, the illumination area IR is composed of four partial illumination areas IRa to IRd. However, the present invention is not limited to this, and the number of partial illumination areas constituting the illumination area (and thus the number of deflection members, the number of types of deflection elements, etc.) may be plural.

  In the first embodiment and the modification, the shape of the illumination area IR including the plurality of partial illumination areas IRa to IRd is a rectangular shape elongated in the x2 direction (corresponding to the X direction on the mask M). The overall shape of the IR shape is not limited to a rectangular shape, and the shape of each partial illumination region is not limited to a rectangular shape, and may be, for example, a trapezoidal shape or a parallelogram shape.

  Further, the plurality of partial illumination areas IRa to IRd do not have to be arranged in close contact with each other, and the plurality of partial illumination areas IRa to IRd may be arranged discretely. In other words, the number of illumination areas IR that is an aggregate of a plurality of partial illumination areas IRa to IRd is not limited to one.

  For example, as shown in FIG. 9, a plurality of partial illumination areas IRa to IRd may be arranged in a staggered manner. In FIG. 9, the plurality of partial illumination areas IRa to IRd are discretely arranged along a non-scanning direction (typically the X direction that is a scanning orthogonal direction) that is a direction crossing the scanning direction (Y direction). A first row having a plurality of partial illumination regions IRa and IRc, and a plurality of partial illumination regions IRb and IRd that are discretely arranged along the non-scanning direction at positions different from the first row in the scanning direction. And the second column having a plurality of partial illumination regions in the first and second columns may be arranged so as to overlap each other when viewed from the scanning direction side.

  In the first embodiment and the modification, the deflecting members 7a to 7d and the deflecting elements 71a to 71d have a wedge-shaped prism form. However, the present invention is not limited to this, and various forms are possible for the specific configurations of the plurality of deflection members and the plurality of types of deflection elements constituting the deflection unit.

  For example, a plurality of deflecting members 7a to 7d and deflecting elements 71a to 71d constituting the deflecting unit are not wedge-shaped prisms having two planes provided with a predetermined apex angle, and at least one plane is a curved surface. It may be an eccentric lens. Further, the plurality of deflecting members 7a to 7d and the deflecting elements 71a to 71d may be composed of a reflecting member having a reflecting surface or a diffractive optical element having a diffractive surface instead of a refracting member. At this time, the reflecting surface and the diffractive surface may have optical power. Further, the number of reflection surfaces and diffraction surfaces may be two or more. An optical system, typically an imaging optical system, may be interposed between the plurality of reflecting surfaces and diffraction surfaces.

  For example, as shown in FIG. 10 in which the deflection unit is composed of a plurality of reflecting surfaces, an imaging optical system may be arranged between a micro fly's eye lens as an optical integrator and the deflection unit. In FIG. 10, the relay optical system 4 and the micro fly's eye lens 6 interposed between the spatial light modulator 3 and the deflection unit 72 are not shown for easy understanding of the description, and the deflection unit is omitted. Illustration of mask blind 9 and imaging optical system 10 interposed between 72 and mask M is omitted.

  In the local coordinate system (x2, y2, z2) in FIG. 10, the z2 axis in a direction corresponding to the optical axis AX from the spatial light modulator 3 toward the deflection unit 72 is in the plane orthogonal to the z2 axis. , Y, Z), the x2 axis is set in a direction corresponding to the X axis, and the y2 axis is set in a direction orthogonal to the x2 axis in a plane orthogonal to the z2 axis. Referring to FIG. 10, a deflection unit 72 comprising four deflection members 72a, 72b, 72c, 72d is located at a position optically conjugate with the illumination pupil 41 in the vicinity of the rear focal plane of the micro fly's eye lens (not shown). Has been placed. In FIG. 10, the deflecting members 72a to 72d arranged in parallel have, for example, the shape of a reflecting mirror having a planar reflecting surface.

  Also in the modification shown in FIG. 10, among the plurality of mirror elements of the spatial light modulator 3, the light L <b> 1 a that has passed through the plurality of mirror elements 3 a belonging to the first mirror element group The first pupil intensity distribution 21a is formed. Similarly, the light L1b that has passed through a plurality of mirror elements belonging to the second mirror element group forms a ring-shaped second pupil intensity distribution 21b in the second region on the illumination pupil 41. The light L1c that has passed through the plurality of mirror elements belonging to the third mirror element group forms an annular third pupil intensity distribution 21c in the third region on the illumination pupil 41, and the plurality of mirror elements 3 belonging to the fourth mirror element group The passed light L1d forms a ring-shaped fourth pupil intensity distribution 21d in the fourth region on the illumination pupil 41.

  Then, images 23 a to 23 d of the pupil intensity distributions 21 a to 21 d are formed in the vicinity of the deflection unit 72 by the relay optical system 73 that forms a position optically conjugate with the illumination pupil 41. The light L1a related to the image 23a of the first pupil intensity distribution 21a is reflected by the first deflecting member 72a arranged corresponding to the image 23a, and then onto the pattern surface of the mask M via the condenser optical system 8. A rectangular first partial illumination region IRa is formed in a superimposed manner. Similarly, the light L1b related to the image 23b of the second pupil intensity distribution 21b is reflected by the second deflecting member 72b arranged corresponding to the image 23b, and then the pattern of the mask M through the condenser optical system 8. A rectangular second partial illumination region IRb is superimposed on the surface, and the light L1c related to the image 23c of the third pupil intensity distribution 21c is caused by the second deflecting member 72c arranged corresponding to the image 23c. After the reflection, a rectangular third partial illumination region IRc is superimposed on the pattern surface of the mask M via the condenser optical system 8. The light L1d related to the image 23d of the fourth pupil intensity distribution 21d is reflected by the fourth deflecting member 72d arranged corresponding to the image 23d, and then the pattern surface of the mask M through the condenser optical system 8. A rectangular fourth partial illumination region IRd is formed in an overlapping manner.

  As described above, also in the modified example of FIG. 10, the pattern surface of the mask M has a rectangular shape elongated in the illumination region IR including the four partial illumination regions IRa to IRd, that is, in the x2 direction (corresponding to the X direction on the mask M). The illumination area IR is formed. In the above-described embodiment and modification, only the refractive member or the reflective member is used, but a refractive member, a reflective member, or a diffractive optical element may be used in combination.

  In the first embodiment and the modification, the deflecting members 7a to 7d and the deflecting elements 71a to 71d are disposed on the rear focal plane of the micro fly's eye lens 6 or in the vicinity thereof. However, the present invention is not limited to this, and various modifications are possible with respect to the arrangement of the plurality of deflection members and the plurality of types of deflection elements constituting the deflection unit. As an example, a deflection unit may be disposed at or near the pupil position of the imaging optical system 10.

  In the first embodiment and the modification, the overall shape of the micro fly's eye lens 6 on the surface crossing the illumination optical path is a square shape circumscribing the circle, but the overall shape of the micro fly's eye lens 6 is a square shape. Is not limited, and may be, for example, a rectangular shape having an aspect ratio different from 1: 1. At this time, the plurality of light intensity distributions 20a to 20d and the plurality of pupil intensity distributions 21a to 21d corresponding thereto may be arranged along one direction crossing the illumination optical path. The light deflection angle by the plurality of deflection members and deflection elements constituting the deflection unit may be set in accordance with the arrangement of the plurality of pupil intensity distributions 21a to 21d.

  In the first embodiment and the modification, the light deflection angle by the plurality of deflection members and deflection elements constituting the deflection unit is fixed, but the light deflection angle by the plurality of deflection members and deflection elements. May be variable. At this time, when using a refracting member as a deflecting member or deflecting element, a variable apex angle prism or a plurality of wedge prisms having different apex angles can be used, and when using a reflecting member The reflective surface can be made to have a variable tilt angle or a plurality of reflective surfaces having different tilt angles can be exchanged. When a diffractive optical element is used, a plurality of diffractive surfaces having different deflection angles can be exchanged. Can be used.

  In the first embodiment and the modification, for example, the deflecting member and the deflecting element that deflect light such as a wedge prism are regarded as the deflecting unit, but the fly-eye lens itself as an optical integrator may be regarded as the deflecting unit. it can. In this case, as shown in FIG. 11, a plurality of fly-eye lenses are arranged in parallel on a surface crossing the illumination optical path, and the optical axis of each fly-eye lens arranged in parallel is the optical axis of the illumination optical system (typically Are arranged so as to be inclined with respect to the optical axis of the condenser optical system.

  In the local coordinate system (x2, y2, z2) in FIG. 11A, the z2 axis in the direction corresponding to the linearly expanded optical axis AX is in the global coordinate system (X, Y , Z), the x2 axis is set in a direction corresponding to the X axis, and the y2 axis is set in a direction orthogonal to the x2 axis in a plane orthogonal to the z2 axis. Referring to FIG. 11, light L1a that has passed through a plurality of mirror elements belonging to the first mirror element group among the plurality of mirror elements of the spatial light modulator 3 enters the fly-eye lens 60a via a relay optical system not shown. The light L1b that has passed through a plurality of mirror elements belonging to the second mirror element group enters the fly-eye lens 60b via a relay optical system not shown. As shown in FIG. 11B showing the fly-eye lens 60a (60b), the optical axis of the fly-eye lens 60a (60b) is a plurality of optical elements (first unit wavefronts of the first group) included in the fly-eye lens 60a (60b). Axis AX60 passing through the center of a region where a plurality of optical elements are arranged on a plane that is parallel to the optical axis AX601 of the division plane and the second group of unit wavefront division planes and that is orthogonal to the optical axis AX601. (AX61).

  Light from each of the fly-eye lenses 60a and 60b arranged at an angle reaches the partial illumination regions IRa and IRb on the pattern surface of the mask M that can be regarded as an irradiated surface via the condenser optical system 8. The positions of these partial illumination regions IRa and IRb can be set as desired by appropriately setting the angle formed by the optical axis AX60 (AX61) of the fly-eye lenses 60a and 60b arranged in an inclined manner and the optical axis AX of the condenser optical system 8. It can be a position. At this time, on the incident side of each of the fly-eye lenses 60a and 60b, for example, a deflecting unit made of a wedge-shaped prism and deflecting light from the spatial light modulator 3 may be provided. A plurality of fly-eye lenses that are inclined may be provided integrally.

  Further, it is only necessary that the optical axis of at least one of the fly eye lenses 60a and 60b is not parallel to the optical axis of the condenser optical system. Further, as shown in FIG. 11C, each fly-eye lens has a plurality of lens arrays provided apart from each other in the optical axis direction, and these lens arrays are arranged eccentrically in a plane orthogonal to the optical axis. Then, the optical axis AX602 of the lens array may be inclined with respect to the optical axis AX of the condenser optical system 8.

  Moreover, as shown in FIG. 12, the structure which provides the some spatial light modulator 30a, 30b with which each fly eye lens 60a, 60b was provided may be sufficient. At this time, the relay optical systems 40a and 40b that form a light intensity distribution on the incident-side surfaces of the fly-eye lenses 60a and 60b in cooperation with the spatial light modulators 30a and 30b are also connected to the fly-eye lenses 60a and 60b. Just prepare for each.

  In the above-described embodiment and modification, in order to adjust the telecentricity with respect to each partial illumination region IRa to IRd, another deflecting member is provided in the optical path of the light L1a to L1d toward each partial illumination region IRa to IRd. It may be arranged.

  FIG. 13 is a drawing schematically showing a configuration of an exposure apparatus according to the second embodiment. The second embodiment has a configuration similar to that of the first embodiment. However, the second embodiment differs from the first embodiment in that a lens array (or microlens array) 12 and a movable lens 13 are arranged instead of the micro fly's eye lens 6 and the deflection unit 7. Yes. Therefore, in FIG. 13, the same reference numerals as those in FIG. 1 are given to elements having the same functions as the components shown in FIG. Hereinafter, the configuration and operation of the second embodiment will be described focusing on differences from the first embodiment.

  In the second embodiment, as shown in FIG. 14, the lens array 12 includes a plurality of lens elements 12 a arranged in parallel along a plane (XZ plane) orthogonal to the optical axis AX. The relay optical system 4 has a front focal position positioned at or near the arrangement surface of the spatial light modulator 3, and a rear focal position positioned at or near the incident surface of the lens array 12. That is, the relay optical system 4 optically sets the arrangement surface of the spatial light modulator 3 and the incident side surface of the lens array 12 in a Fourier transform relationship.

  The movable lens 13 is a single biconvex lens configured to be movable in the direction of the optical axis AX, for example, and is arranged in a space including the rear focal position of the lens element 12a of the lens array 12. Here, the space including the rear focal position of the lens element 12a is a lens array that is an optical member that is arranged in the optical path on the light source side (left side in FIG. 14) with respect to the rear focal position of the lens element 12a and has power. 12 and a condenser optical system 8 that is an optical member that is disposed in the optical path closer to the irradiated surface (right side in FIG. 14) than the rear focal position of the lens element 12a and has power. In the second embodiment, a drive unit 14 that moves the movable lens 13 in the direction of the optical axis AX according to a command from the control system CR is provided.

  When a light beam enters the lens array 12 from the spatial light modulator 3, the incident light beam is wavefront divided by a plurality of lens elements 12 a, and the partial light beam that has passed through each lens element 12 a is incident on a corresponding partial region of the movable lens 13. As shown in FIG. 14, when the movable lens 13 is at a required reference position along the optical axis AX, the light that has passed through the corresponding central region of the lens element 12a and the movable lens 13 on the optical axis AX is, for example, a movable lens. Immediately after 13, one small light source K1 is formed.

  The light from the small light source K1 becomes a parallel light beam through the condenser optical system 8, and forms an illumination field 51 centered on the optical axis AX on the mask blind surface 9a. The mask blind surface 9a is a surface optically conjugate with the pattern surface of the mask M, which is the irradiated surface of the illumination optical device (1-14). In FIG. 14, only five lens elements 12 a among the plurality of lens elements 12 a constituting the lens array 12 are illustrated for clarity of the drawing.

  When the movable lens 13 is at the reference position, the light that has passed through the lens element 12a farthest from the optical axis AX in the + X direction and the corresponding peripheral region of the movable lens 13 passes, for example, one small light source K2 immediately after the movable lens 13. After the formation, an illumination field 52 that partially overlaps the illumination field 51 is formed on the mask blind surface 9 a via the condenser optical system 8. Due to the deflecting action of the peripheral area of the movable lens 13, the center position of the illumination field 52 is displaced in the −X direction from the optical axis AX that is the center of the illumination field 51.

  Similarly, when the movable lens 13 is at the reference position, the light that has passed through the lens element 12a farthest from the optical axis AX in the −X direction and the corresponding peripheral region of the movable lens 13 is, for example, one light immediately after the movable lens 13. After forming the small light source K3, an illumination field 53 partially overlapping with the illumination field 51 is formed on the mask blind surface 9a via the condenser optical system 8. Due to the deflection action of the peripheral region of the movable lens 13, the center position of the illumination field 53 is shifted in the + X direction from the optical axis AX that is the center of the illumination field 51.

  When the movable lens 13 moves from the reference position to the light source side (left side in FIG. 14), the light that has passed through the corresponding central region of the lens element 12a and the movable lens 13 on the optical axis AX is converged through the condenser optical system 8. Thus, an illumination field 51a (not shown) smaller than the illumination field 51 is formed on the mask blind surface 9a. The center position of the illumination field 51 a is on the optical axis AX as in the illumination field 51. Light that has passed through the corresponding peripheral regions of the lens element 12a and the movable lens 13 that are furthest away from the optical axis AX in the X direction passes through the condenser optical system 8 and is smaller than the illumination fields 52 and 53 on the mask blind surface 9a. 52a and 53a (not shown) are formed. The center positions of the illumination fields 52a and 53a are displaced in the X direction from the optical axis AX that is the center of the illumination field 51a.

  On the other hand, when the movable lens 13 moves from the reference position to the irradiated side (right side in FIG. 14), the light that has passed through the lens element 12 a on the optical axis AX and the corresponding central region of the movable lens 13 passes through the condenser optical system 8. Thus, a divergent light beam is formed, and an illumination field 51b (not shown) larger than the illumination field 51 is formed on the mask blind surface 9a. The center position of the illumination field 51b is on the optical axis AX as in the illumination field 51. Light that has passed through the corresponding peripheral regions of the lens element 12a and the movable lens 13 that are furthest away from the optical axis AX in the X direction passes through the condenser optical system 8 to the mask blind surface 9a that is larger than the illumination fields 52 and 53. 52b and 53b (not shown) are formed. The center positions of the illumination fields 52b and 53b are displaced in the X direction from the optical axis AX that is the center of the illumination field 51b.

  Thus, the lens array 12 and the movable lens 13 constitute a wavefront dividing member having a plurality of lens elements (wavefront dividing elements) 12a arranged in parallel. The drive unit 14 moves the movable lens 13 in the direction of the optical axis AX, and the light passing through each lens element 12a of the lens array 12 causes the mask blind surface 9a (and thus the pattern surface of the mask M that is the irradiated surface of the illumination optical device). ) To change the size and position of the illumination field formed.

  In the second embodiment, the light that has passed through the spatial light modulator 3 variably forms a light intensity distribution according to the postures of the plurality of mirror elements 3 a on the incident-side surface of the lens array 12. The light beam incident on the lens array 12 is divided into wavefronts by a plurality of lens elements 12a. The partial light flux that has passed through each lens element 12 a forms a small light source, for example, immediately after the movable lens 13 through a corresponding partial region of the movable lens 13. Light from each small light source is superimposed on the mask blind surface 9 a via the condenser optical system 8. A substantial surface light source composed of a plurality of small light sources formed on the illumination pupil immediately after the movable lens 13 has a secondary light intensity distribution that is substantially the same as the light intensity distribution formed on the incident-side surface of the lens array 12. A light source (pupil intensity distribution).

  Hereinafter, prior to the description of the effects of the second embodiment, with reference to FIG. 15, the correspondence relationship of light rays between the illumination pupil plane 61 and the illumination area 62 a on the illuminated surface 62 in a normal illumination optical apparatus is shown. explain. In FIG. 15, for example, light from a plurality of small light sources K11, K12, and K13 formed on the illumination pupil plane 61 immediately after the optical integrator such as a fly-eye lens is irradiated through the condenser optical system 63. It is superimposed on the upper illumination area 62a. In other words, the light from each of the small light sources K11 to K13 forms an illumination field 62a having the same size at the same position on the irradiated surface 62 in a superimposed manner.

  Referring to FIG. 15, the light beam L11 perpendicularly incident on the center point P1 of the illumination area 62a corresponds to the light beam L11 emitted from the small light source K11 on the optical axis AX in the optical axis AX direction (Y direction). Rays L12 and L13 incident at a maximum angle along the XY plane with respect to the center point P1 are rays L12 and L13 emitted in the optical axis AX direction from the small light sources K12 and K13 that are farthest from the optical axis AX in the X direction. It corresponds to.

  Light rays L14 and L15 perpendicularly incident on a peripheral point P2 farthest from the optical axis AX in the + X direction and a peripheral point P3 farthest in the −X direction in the illumination area 62a are transmitted from the small light sources K11 on the optical axis AX to the XY. It corresponds to light rays L14 and L15 emitted at a maximum angle with respect to the optical axis AX along the plane. Rays L16, L17, L18, and L19 that are incident at the maximum angle along the XY plane with respect to the peripheral points P2 and P3 are along the XY plane from the small light sources K12 and K13 that are furthest away from the optical axis AX in the X direction. This corresponds to the light beams L16, L17 and L18, 1L9 emitted at the maximum angle with respect to the optical axis AX.

  Thus, the position information in the X direction of the small light sources K11 to K13 is converted into angle information on the XY plane in the illumination area 62a by the Fourier transform action of the condenser optical system 63. Conversely, angle information on the XY plane of the light beams from the small light sources K11 to K13 is converted into position information in the X direction in the illumination region 62a by the Fourier transform action of the condenser optical system 63. Therefore, although not shown in the figure, the correspondence relationship of the light rays between the illumination pupil plane 61 on the YZ plane and the illumination area 62a on the illuminated surface 62 is the same as the correspondence relationship of the light rays on the XY plane shown in FIG. .

  FIG. 16 is a diagram for explaining pupil intensity distributions H1, H2, and H3 related to the points P1, P2, and P3 in the illumination area 62a of FIG. As described with reference to FIG. 15, the light beam L11 perpendicularly incident on the center point P1 of the illumination area 62a corresponds to the light beam L11 emitted in the optical axis AX direction from the small light source K11 on the optical axis AX. . Light rays (L12, L13, etc.) incident on the center point P1 at the maximum angle correspond to light rays (L12, L13, etc.) emitted in the optical axis AX direction from the small light sources K12, K13 farthest from the optical axis AX. Yes.

  Further, as described with reference to FIG. 15, the light rays L14 and L15 perpendicularly incident on the peripheral points P2 and P3 on the illumination area 62a are maximum from the small light source K11 on the optical axis AX to the optical axis AX. It corresponds to light rays (L14, L15, etc.) emitted at an angle. Light rays (L16 to L19, etc.) incident on the peripheral points P2 and P3 at the maximum angle are light rays (L16 to L19) emitted from the small light sources K12 and K13 farthest from the optical axis AX with respect to the optical axis AX. L19 etc.).

  As described above, when the movable lens 13 is at the reference position, the centers of the illumination fields 52 and 53 formed by the light from the small light sources K2 and K3 farthest from the optical axis AX in the X direction are on the optical axis AX. Is shifted from the optical axis AX, which is the center of the illumination field 51 formed by the light from the small light source K1, to the X direction side. Hereinafter, as shown in FIG. 17, the illumination field 50 on the mask blind surface 9 a corresponding to the illumination area to be formed on the pattern surface of the mask M, which is the illuminated surface, is smaller than the illumination field 51 and the illumination field 51. Similarly, it is assumed that the optical axis AX is set as the center.

  In this case, as shown in FIG. 17A, the center of the illumination field 51 (51a, 51b) formed by the light passing through the lens element 12a on the optical axis AX coincides with the center of the illumination field 50. . However, as shown in FIG. 17B, the center of the illumination field 52 (52a, 52b) formed by the light that has passed through the lens element 12a farthest from the optical axis AX in the + X direction is from the center of the illumination field 50. -Position shifts in the X direction. Further, as shown in FIG. 17C, the center of the illumination field 53 (53a, 53b) formed by the light that has passed through the lens element 12a farthest from the optical axis AX in the −X direction is the center of the illumination field 50. To + X direction.

  In general, since the light intensity distribution of the partial light beam incident on the lens element 12a is not uniform, the light intensity distribution of the illumination field formed on the mask blind surface 9a via each lens element 12a is not uniform. Further, the movement of the movable lens 13 in the direction of the optical axis AX changes the size of the illumination field formed through each lens element 12a, and consequently the light intensity distribution of each illumination field. If the light intensity distribution of the illumination field formed through each lens element 12a is not uniform and changes, as shown by a double-headed arrow in FIG. 17, the light beam incident on the central point P1 of the illumination field 50 and the peripheral point P2 The intensities of the incident light beam and the light beam incident on the surrounding point P3 change.

  As described above, in the second embodiment, when the movable lens 13 is moved in the optical axis AX direction, the size and position of the illumination field formed on the mask blind surface 9a through each lens element 12a of the lens array 12 change. As a result, the light intensity distribution of the illumination field formed through each lens element 12a changes. As a result, the pupil intensity distribution at each point along the X direction of the illumination field 50 on the mask blind surface 9a changes according to the different modes depending on the moving amount and the moving direction of the movable lens 13, and as a result The pupil intensity distribution at each point along the X direction (corresponding to the X direction on the mask blind surface 9a) on the illumination area to be formed on the pattern surface of the mask M, which is the irradiation surface, changes according to different modes.

  Specifically, in the second embodiment, the light that reaches the predetermined point on the surface of the wafer W that is optically conjugate with the pattern surface of the mask M or the pattern surface of the mask M, which is the irradiated surface, by the control system CR. The drive unit 14 is controlled based on the measurement results of the pupil intensity distribution measurement units DTr and DTw that measure the intensity distribution in the angle direction. The drive unit 14 is formed on the mask blind surface 9a via each lens element 12a of the lens array 12 by moving the movable lens 13 in the optical axis AX direction using outputs from the pupil intensity distribution measurement units DTr and DTw. By changing the size and position of the illuminated field, the pupil intensity distribution at each point along the X direction in the elongated rectangular illumination region along the X direction is adjusted. Thus, in the illumination optical devices (1 to 14) of the second embodiment, the pupil intensity distribution at each point on the illumination area can be adjusted to a required distribution.

  In the second embodiment, the lens array 12 is used as a first optical member having a plurality of first elements arranged in parallel, and in the optical axis AX direction on the rear side of the lens elements 12a constituting the lens array 12. A movable lens 13 made of a single biconvex lens is used as the movable second optical member. However, the present invention is not limited to this, and various configurations are possible for the specific configurations of the first optical member and the second optical member.

  As an example, a second optical member is configured by a first lens and a second lens disposed on the rear side at a distance from the first lens, and at least one of the first lens and the second lens is made to emit light. It can also be configured to be movable in the axial direction. In general, in order to obtain the same effect as that of the second embodiment, it is necessary that the second optical member has at least one power member that can move in the optical axis direction.

  In the above-described embodiment, as the spatial light modulator having a plurality of mirror elements that are two-dimensionally arranged and individually controlled, the directions (angle: inclination) of the plurality of two-dimensionally arranged reflecting surfaces are individually set. The controllable spatial light modulator 3 is used. However, the present invention is not limited to this. For example, a spatial light modulator that can individually control the height (position) of a plurality of two-dimensionally arranged reflecting surfaces can be used. As such a spatial light modulator, for example, the spatial light modulator disclosed in FIG. 1d of US Pat. No. 5,312,513 and US Pat. No. 6,885,493 can be used. In these spatial light modulators, by forming a two-dimensional height distribution, an action similar to that of the diffractive surface can be given to incident light. The spatial light modulator having a plurality of reflection surfaces arranged two-dimensionally as described above is modified in accordance with the disclosure of, for example, US Pat. No. 6,891,655 and US Patent Publication No. 2005/0095749. May be.

  In the above-described embodiment, the reflective spatial light modulator 3 provided with a plurality of mirror elements 3a arranged in a predetermined plane and individually controlled is used as the spatial light modulator for pupil distribution formation. However, a transmissive spatial light modulator including a plurality of transmissive optical elements arranged in a predetermined plane and individually controlled can be used as the spatial light modulator for pupil distribution formation.

  In the above-described embodiment, a variable pattern forming apparatus that forms a predetermined pattern based on predetermined electronic data can be used instead of a mask. As the variable pattern forming apparatus, for example, a spatial light modulation element including a plurality of reflection elements driven based on predetermined electronic data can be used. An exposure apparatus using a spatial light modulator is disclosed, for example, in US Patent Publication No. 2007/0296936. In addition to the non-light-emitting reflective spatial light modulator as described above, a transmissive spatial light modulator may be used, or a self-luminous image display element may be used.

  The exposure apparatus of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus may be manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  Next, a device manufacturing method using the exposure apparatus according to the above-described embodiment will be described. FIG. 18 is a flowchart showing manufacturing steps of a semiconductor device. As shown in FIG. 18, in the semiconductor device manufacturing process, a metal film is vapor-deposited on a wafer W to be a semiconductor device substrate (step S40), and a photoresist, which is a photosensitive material, is applied on the vapor-deposited metal film. (Step S42). Subsequently, using the projection exposure apparatus of the above-described embodiment, the pattern formed on the mask (reticle) M is transferred to each shot area on the wafer W (step S44: exposure process), and the wafer W after the transfer is completed. Development, that is, development of the photoresist to which the pattern has been transferred (step S46: development process).

  Thereafter, using the resist pattern generated on the surface of the wafer W in step S46 as a mask, processing such as etching is performed on the surface of the wafer W (step S48: processing step). Here, the resist pattern is a photoresist layer in which unevenness having a shape corresponding to the pattern transferred by the projection exposure apparatus of the above-described embodiment is generated, and the recess penetrates the photoresist layer. It is. In step S48, the surface of the wafer W is processed through this resist pattern. The processing performed in step S48 includes, for example, at least one of etching of the surface of the wafer W or film formation of a metal film or the like. In step S44, the projection exposure apparatus of the above-described embodiment performs pattern transfer using the wafer W coated with the photoresist as a photosensitive substrate.

  FIG. 19 is a flowchart showing manufacturing steps of a liquid crystal device such as a liquid crystal display element. As shown in FIG. 19, in the liquid crystal device manufacturing process, a pattern forming process (step S50), a color filter forming process (step S52), a cell assembling process (step S54), and a module assembling process (step S56) are sequentially performed. In the pattern forming process of step S50, a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with a photoresist as the plate P using the projection exposure apparatus of the above-described embodiment. The pattern forming step includes an exposure step of transferring the pattern to the photoresist layer using the projection exposure apparatus of the above-described embodiment, and development of the plate P on which the pattern is transferred, that is, development of the photoresist layer on the glass substrate. And a developing step for generating a photoresist layer having a shape corresponding to the pattern, and a processing step for processing the surface of the glass substrate through the developed photoresist layer.

  In the color filter forming process in step S52, a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix or three R, G, and B A color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning direction. In the cell assembly process in step S54, a liquid crystal panel (liquid crystal cell) is assembled using the glass substrate on which the predetermined pattern is formed in step S50 and the color filter formed in step S52. Specifically, for example, a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter. In the module assembling process in step S56, various components such as an electric circuit and a backlight for performing the display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.

  In addition, the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor device, for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display, It can also be widely applied to an exposure apparatus for manufacturing various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, and a DNA chip. Furthermore, the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.

In the above-described embodiment, ArF excimer laser light (wavelength: 193 nm) or KrF excimer laser light (wavelength: 248 nm) is used as the exposure light. However, the present invention is not limited to this, and other suitable pulse lasers are used. A light source, for example, an F ₂ laser light source that supplies laser light with a wavelength of 157 nm, a Kr ₂ laser light source that supplies laser light with a wavelength of 146 nm, an Ar ₂ laser light source that supplies laser light with a wavelength of 126 nm, or the like can be used. It is also possible to use a CW (Continuous Wave) light source such as an ultrahigh pressure mercury lamp that emits bright lines such as g-line (wavelength 436 nm) and i-line (wavelength 365 nm). A harmonic generator of a YAG laser or the like can also be used. In addition, as disclosed in, for example, US Pat. No. 7,023,610, a single wavelength laser beam in an infrared region or a visible region oscillated from a DFB semiconductor laser or a fiber laser is used as vacuum ultraviolet light. For example, a harmonic that is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium) and wavelength-converted into ultraviolet light using a nonlinear optical crystal may be used.

  In the above-described embodiment, a so-called immersion method is applied in which the optical path between the projection optical system and the photosensitive substrate is filled with a medium (typically liquid) having a refractive index larger than 1.1. You may do it. In this case, as a technique for filling the liquid in the optical path between the projection optical system and the photosensitive substrate, a technique for locally filling the liquid as disclosed in International Publication No. WO99 / 49504, a special technique, A method of moving a stage holding a substrate to be exposed as disclosed in Kaihei 6-124873 in a liquid bath, or a predetermined stage on a stage as disclosed in JP-A-10-303114. A method of forming a liquid tank having a depth and holding the substrate therein can be employed. Here, the teachings of International Publication No. WO99 / 49504, JP-A-6-124873 and JP-A-10-303114 are incorporated by reference.

  In the above-described embodiment, a so-called polarization illumination method disclosed in US Publication Nos. 2006/0170901 and 2007/0146676 can be applied. Here, the teachings of US Patent Publication No. 2006/0170901 and US Patent Publication No. 2007/0146676 are incorporated by reference.

  In the above-described embodiment, the present invention is applied to a step-and-scan type exposure apparatus that scans and exposes the pattern of the mask M on the shot area of the wafer W. However, the present invention is not limited to this, and the present invention can also be applied to a step-and-repeat type exposure apparatus that repeats the operation of collectively exposing the pattern of the mask M to each exposure region of the wafer W.

  In the above-described embodiment, the present invention is applied to the illumination optical system (or illumination optical apparatus) that illuminates the mask (or wafer) in the exposure apparatus, but the present invention is not limited to this. Alternatively, the present invention can be applied to a general illumination optical system (or illumination optical apparatus) that illuminates an irradiated surface other than a wafer).

1 Beam Transmitter 3 Spatial Light Modulator 4 Relay Optical System 6 Micro Fly Eye Lens (Optical Integrator)
7 Deflection units 7a to 7d Deflection members 71a to 71d Deflection element 8 Condenser optical system 9 Mask blind 10 Imaging optical system 12 Lens array 13 Movable lens LS Light source DTr, DTw Pupil intensity distribution measurement unit CR Control system M Mask MS Mask stage PL Projection optical system W Wafer WS Wafer stage

Claims (33)

In the illumination optical system that illuminates the illuminated surface with light from the light source,
Spatial light modulation having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on the illumination pupil of the illumination optical system on the first surface And
An optical integrator having a plurality of unit wavefront division planes arranged along the first plane;
A first deflector that guides light that has passed through a first group of unit wavefront division surfaces of the plurality of unit wavefront division surfaces to a first illumination region in an illumination region on the irradiated surface;
Second light that guides light that has passed through a second group of unit wavefront division planes different from the first group among the plurality of unit wavefront division planes to a second illumination area different from the first illumination area in the illumination area. An illumination optical system comprising a deflection unit. The illumination optical system according to claim 1, wherein the first illumination area and the second illumination area are adjacent to each other. The unit wavefront division plane of the first group is located in a first area on the first plane, and the unit wavefront division plane of the second group is located in a second area adjacent to the first area on the first plane. The illumination optical system according to claim 1, wherein: 4. The first light intensity distribution formed in the first region by the spatial light modulator and the second light intensity distribution formed in the second region have the same outer shape. The illumination optical system described in 1. The first deflecting unit has a single first deflecting member that deflects light that has passed through the first group of unit wavefront dividing surfaces, and the second deflecting unit has light that has passed through the second group of unit wavefront dividing surfaces. The illumination optical system according to claim 3, further comprising a single second deflecting member that deflects the light beam. The first group of unit wavefront dividing planes and the second group of unit wavefront dividing planes are one first unit wavefront dividing plane belonging to the first group of unit wavefront dividing planes and the second group of unit wavefront dividing planes. 3. The illumination optical system according to claim 1, wherein one second unit wavefront dividing surface belonging to the above is distributed so as to be adjacent to each other. The unit light beam constituting the light intensity distribution formed on the first surface by the spatial light modulator includes a part of the first unit wavefront dividing surface and a part of the second unit wavefront dividing surface which are adjacent to each other. The illumination optical system according to claim 6, wherein the illumination optical system is incident on a region including. The first deflecting unit has a plurality of first deflecting members that deflect the light that has passed through the plurality of first unit wavefront dividing surfaces, and the second deflecting unit has the light that has passed through the plurality of second unit wavefront dividing surfaces. The illumination optical system according to claim 6, further comprising a plurality of second deflecting members that deflect each of the first and second deflecting members. In the illumination optical system that illuminates the illuminated surface with light from the light source,
A spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on an illumination pupil of the illumination optical system in a predetermined area When,
An optical integrator having a plurality of unit wavefront division planes arranged in the predetermined region;
A condenser optical system that condenses the light from the optical integrator and guides it to the irradiated surface,
The light that has passed through the first group of unit wavefront division planes arranged in a part of the first partial area in the predetermined area is guided to the first illumination area in the illumination area on the irradiated surface, and in the predetermined area Guiding the light having passed through the second group of unit wavefront division planes arranged in the second partial region different from the first partial region to a second illumination region different from the first illumination region in the illumination region. Characteristic illumination optical system. A first deflector that guides light that has passed through the first group of unit wavefront division planes of the plurality of unit wavefront division planes to the first illumination area in an illumination area on the irradiated surface; and the plurality of units. 10. The apparatus according to claim 9, further comprising: a second deflecting unit that guides light that has passed through the second group of unit wavefront dividing surfaces of the wavefront dividing surfaces to the second illumination region in the illumination region. Lighting optics. The spatial light modulator forms the light intensity distribution on a first surface crossing an illumination optical path, and the plurality of unit wavefront division surfaces of the optical integrator are arranged along the first surface. The illumination optical system according to claim 9 or 10. The illumination optical system according to claim 11, wherein the first surface is a flat surface. 13. The illumination optical system according to claim 9, wherein an optical axis of the unit wavefront dividing surface of the first group of the optical integrator is not parallel to an optical axis of the condenser optical system. . 14. The predetermined surface on which the plurality of optical elements of the spatial light modulator are arranged and the irradiated surface are optically non-conjugated. Lighting optics. 15. The irradiated surface is optically Fourier-transformed with respect to the predetermined surface on which the plurality of optical elements of the spatial light modulator are arranged. The illumination optical system according to Item. The illumination optical system according to claim 9, wherein the first partial region and the second partial region do not overlap each other. In the illumination optical system that illuminates the illuminated surface with light from the light source,
A spatial light modulator having a plurality of optical elements arranged in a predetermined plane and individually controlled, and forming a light intensity distribution corresponding to a pupil intensity distribution to be formed on an illumination pupil of the illumination optical system in a predetermined area When,
An optical integrator having a plurality of unit wavefront division planes arranged in the predetermined region;
A condenser optical system that condenses the light from the optical integrator and guides it to the irradiated surface,
The plurality of unit wavefront dividing surfaces and the irradiated surface are optically conjugate,
The spatial light modulator generates a first pupil intensity distribution related to a first illumination area in an illumination area on the irradiated surface in a partial first partial area in the predetermined area, and the illumination Generating a second pupil intensity distribution related to a second illumination area different from the first illumination area in the area in a second partial area different from the first partial area in the predetermined area; Illumination optical system. A first deflector that guides light that has passed through the first group of unit wavefront division planes of the plurality of unit wavefront division planes to the first illumination area in an illumination area on the irradiated surface; and the plurality of units. 18. The apparatus according to claim 17, further comprising: a second deflecting unit that guides light that has passed through the second group of unit wavefront dividing surfaces of the wavefront dividing surfaces to the second illumination region in the illumination region. Lighting optics. The spatial light modulator forms the light intensity distribution on a first surface crossing an illumination optical path, and the plurality of unit wavefront division surfaces of the optical integrator are arranged along the first surface. The illumination optical system according to claim 17 or 18. The illumination optical system according to claim 19, wherein the first surface is a flat surface. The spatial light modulator includes a plurality of mirror elements arranged two-dimensionally within the predetermined plane, and a control unit that individually controls the postures of the plurality of mirror elements. 21. The illumination optical system according to any one of 1 to 20. The projection pupil is used in combination with a projection optical system that forms a surface optically conjugate with the irradiated surface, and the illumination pupil is in a position optically conjugate with an aperture stop of the projection optical system. The illumination optical system according to any one of 1 to 21. 23. An exposure apparatus comprising the illumination optical system according to claim 1 for illuminating a predetermined pattern, and exposing the predetermined pattern onto a substrate. The projection optical system that forms an image of the predetermined pattern on the substrate is provided, and the illumination pupil is at a position optically conjugate with an aperture stop of the projection optical system. Exposure device. Using the exposure apparatus according to claim 23 or 24, exposing the predetermined pattern to a photosensitive substrate;
Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate;
Processing the surface of the photosensitive substrate through the mask layer. A device manufacturing method comprising: In an illumination optical device that illuminates the illuminated surface with light from a light source,
A wavefront splitting member having a plurality of wavefront splitting elements arranged in parallel;
A condenser optical system for guiding a plurality of light fluxes wave-divided by the wave-front splitting member to the irradiated surface;
The wavefront dividing member includes a first optical member having a plurality of first elements arranged in parallel, and a second optical member having at least one power member movable in the optical axis direction on the rear side of the first element. A member, and a drive unit that moves the at least one power member in the optical axis direction in order to change the size and position of the illumination field formed on the irradiated surface by the light that has passed through the wavefront splitting element,
The illumination optical device according to claim 1, wherein the power member of the second optical member is disposed in a space including a rear focal position of the first element. 27. The illumination optical apparatus according to claim 26, wherein the first optical member has a plurality of lens elements arranged in parallel. 28. The illumination optical apparatus according to claim 26 or 27, wherein the second optical member has a single lens movable in the optical axis direction. The second optical member includes a first lens and a second lens disposed on the rear side at a distance from the first lens, and at least one of the first lens and the second lens is 28. The illumination optical apparatus according to claim 26, wherein the illumination optical apparatus is movable in an optical axis direction. A pupil distribution measurement unit that measures the intensity distribution in the angular direction of light reaching a predetermined point on the irradiated surface or a surface optically conjugate with the irradiated surface;
30. The drive unit according to claim 26, wherein the drive unit changes the size and the position of the illumination field formed on the irradiated surface using an output from the pupil distribution measurement unit. The illumination optical apparatus according to Item 1. An illumination optical apparatus according to any one of claims 26 to 30 for illuminating a predetermined pattern installed on the irradiated surface, wherein the predetermined pattern is exposed on a substrate. apparatus. 32. The exposure apparatus according to claim 31, further comprising a projection optical system that forms an image of the predetermined pattern on the substrate. Using the exposure apparatus according to claim 31 or 32, exposing the predetermined pattern to a photosensitive substrate;
Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate;
Processing the surface of the photosensitive substrate through the mask layer. A device manufacturing method comprising:

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