JP2014531583A - 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 - Google Patents
熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 Download PDFInfo
- Publication number
- JP2014531583A JP2014531583A JP2014529862A JP2014529862A JP2014531583A JP 2014531583 A JP2014531583 A JP 2014531583A JP 2014529862 A JP2014529862 A JP 2014529862A JP 2014529862 A JP2014529862 A JP 2014529862A JP 2014531583 A JP2014531583 A JP 2014531583A
- Authority
- JP
- Japan
- Prior art keywords
- mechanical component
- spindle
- mounting
- thermal
- mounting elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims abstract description 27
- 230000000694 effects Effects 0.000 claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims description 11
- 230000033001 locomotion Effects 0.000 claims description 8
- 230000001419 dependent effect Effects 0.000 claims description 2
- 238000012937 correction Methods 0.000 abstract description 6
- 238000013461 design Methods 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 229910001374 Invar Inorganic materials 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 230000020347 spindle assembly Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 238000001712 DNA sequencing Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/021—Special mounting in general
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T403/00—Joints and connections
- Y10T403/21—Utilizing thermal characteristic, e.g., expansion or contraction, etc.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
X1+X2+X3=0である場合、変位=0
である。要素の長さの決定は、マルチフィジックスFEA(有限要素解析(Finite Element Analysis))プログラムを使用してシミュレートされ、マルチフィジックスFEAプログラムは、スピンドルモータの熱負荷と、空気の対流冷却と、ハウジングの熱変形の同時発生の影響のモデリングとを提供する。これは、代替的に、従来のFEAによって、またはおそらく、単純なシステムの手作業の計算によって反復的に行うことができるが、これらの代替の方法は、より一層時間がかかる。
Claims (12)
- システム上に搭載された機械部品の熱的影響を補正するための装置であって、
前記システム上に前記機械部品を搭載するための物理的構成を備え、
前記物理的構成は、熱膨張によって、前記機械部品を前記システムに対して対向運動させるように設計され、
前記対向運動は、熱膨張が温度変動に線形に依存する熱範囲について実質的に互いに相殺し、
前記機械部品は、前記熱範囲内で、温度変動中に前記システムに対して実質的に静止している装置。 - 前記物理的構成は、不等長な搭載要素であって、前記搭載要素をわたる温度分布が、前記物理的構成と組合されて、前記搭載要素の熱膨張による運動を相殺するように設計される、不等長な搭載要素を備える請求項1に記載の装置。
- 前記不等長な搭載要素は、
第1の長さを有する搭載要素の第1の組と、
前記第1の長さより短い第2の長さを有する搭載要素の第2の組とを含み、
前記搭載要素の第2の組は、前記搭載要素の第1の組より大きな温度変動を受け、
前記搭載要素の第1の組は、前記機械部品を第1の方向に運動させ、
前記搭載要素の第2の組は、前記機械部品を前記第1の方向に対向する第2の方向に運動させる請求項2に記載の装置。 - 前記機械部品は、光学要素、センサ、電荷結合素子(CCD)、および位置検知デバイスのうちの1つであり、
前記機械部品は、熱源に近接する請求項3に記載の装置。 - 温度は、前記機械部品から距離が遠い搭載要素ほど低い請求項3に記載の装置。
- 前記機械部品に近接する熱源を含む請求項5に記載の装置。
- 前記システムの外部に位置する熱源を含む請求項5に記載の装置。
- 前記システムはウェハ検査システムであり、前記機械部品はスピンドルである請求項1に記載の装置。
- 前記システムはLED検査システムであり、前記機械部品はスピンドルである請求項1に記載の装置。
- 前記システムはハードディスクドライブ検査システムであり、前記機械部品はスピンドルである請求項1に記載の装置。
- 前記システムは光学媒体検査システムであり、前記機械部品はスピンドルである請求項1に記載の装置。
- 請求項1の装置とともにスピンドルが搭載されている、ウェハ検査システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/226,492 | 2011-09-06 | ||
US13/226,492 US8995066B2 (en) | 2011-09-06 | 2011-09-06 | Passive position compensation of a spindle, stage, or component exposed to a heat load |
PCT/US2012/053990 WO2013036660A2 (en) | 2011-09-06 | 2012-09-06 | Passive position compensation of a spindle, stage, or component exposed to a heat load |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018006765A Division JP2018109632A (ja) | 2011-09-06 | 2018-01-18 | 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014531583A true JP2014531583A (ja) | 2014-11-27 |
JP6368644B2 JP6368644B2 (ja) | 2018-08-01 |
Family
ID=47752939
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014529862A Active JP6368644B2 (ja) | 2011-09-06 | 2012-09-06 | 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 |
JP2018006765A Withdrawn JP2018109632A (ja) | 2011-09-06 | 2018-01-18 | 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018006765A Withdrawn JP2018109632A (ja) | 2011-09-06 | 2018-01-18 | 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8995066B2 (ja) |
EP (1) | EP2754171A4 (ja) |
JP (2) | JP6368644B2 (ja) |
KR (1) | KR102046189B1 (ja) |
WO (1) | WO2013036660A2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013110750B3 (de) * | 2013-09-27 | 2014-11-13 | Jenoptik Optical Systems Gmbh | Optische Baugruppe mit einer Fassung mit thermisch abhängigem Kraftausgleich |
EP3368933B1 (en) * | 2015-11-01 | 2024-01-03 | Howard Hughes Medical Institute | Large field of view, high resolution microscope |
US10024880B2 (en) | 2016-05-21 | 2018-07-17 | Raytheon Company | Athermal hung mass accelerometer with reduced sensitivity to longitudinal temperature gradients |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05198107A (ja) * | 1992-01-20 | 1993-08-06 | Hitachi Ltd | 磁気ディスク装置 |
JPH07130310A (ja) * | 1993-10-29 | 1995-05-19 | Toshiba Corp | X線管及びその取付部材 |
US5938344A (en) * | 1997-03-26 | 1999-08-17 | Sabin; Jeffrey M. | Temperature compensating bearing |
JP2001053133A (ja) * | 1999-08-06 | 2001-02-23 | Tokyo Electron Ltd | 基板昇降機構 |
JP2002170855A (ja) * | 2000-11-30 | 2002-06-14 | Tokyo Seimitsu Co Ltd | プローバ |
JP2005056983A (ja) * | 2003-08-01 | 2005-03-03 | Apic Yamada Corp | スピンドル |
JP2007535380A (ja) * | 2004-04-28 | 2007-12-06 | バリアン・メディカル・システムズ・テクノロジーズ・インコーポレイテッド | X線デバイス焦点制御のためのシステム、方法、およびデバイス |
JP2008110426A (ja) * | 2006-10-30 | 2008-05-15 | Ntn Corp | スピンドル装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4601576A (en) | 1983-12-09 | 1986-07-22 | Tencor Instruments | Light collector for optical contaminant and flaw detector |
US4597708A (en) | 1984-06-04 | 1986-07-01 | Tencor Instruments | Wafer handling apparatus |
US4641967A (en) | 1985-10-11 | 1987-02-10 | Tencor Instruments | Particle position correlator and correlation method for a surface scanner |
US4766324A (en) | 1987-08-07 | 1988-08-23 | Tencor Instruments | Particle detection method including comparison between sequential scans |
DE19680845D2 (de) * | 1996-11-01 | 1999-03-18 | Theva Duennschicht Gmbh | Vorrichtung zur Herstellung oxidischer Dünnschichten |
DE10155078B4 (de) | 2001-11-09 | 2005-06-02 | Walter Ag | Maschine mit temperaturkompensierter Arbeitsspindel |
KR100448786B1 (ko) | 2001-12-19 | 2004-09-16 | 현대자동차주식회사 | 이너셔 가변형 비틀림 진동감쇠장치 |
EP1756641A1 (en) | 2004-05-03 | 2007-02-28 | Carl Zeiss SMT AG | Optical assembly structure comprising a connecting body with thermal expansion compensation means |
WO2008029158A2 (en) | 2006-09-08 | 2008-03-13 | Gideon Levingston | Thermally compensating balance wheel |
-
2011
- 2011-09-06 US US13/226,492 patent/US8995066B2/en active Active
-
2012
- 2012-09-06 JP JP2014529862A patent/JP6368644B2/ja active Active
- 2012-09-06 KR KR1020147008468A patent/KR102046189B1/ko active IP Right Grant
- 2012-09-06 WO PCT/US2012/053990 patent/WO2013036660A2/en unknown
- 2012-09-06 EP EP12830504.2A patent/EP2754171A4/en not_active Withdrawn
-
2018
- 2018-01-18 JP JP2018006765A patent/JP2018109632A/ja not_active Withdrawn
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05198107A (ja) * | 1992-01-20 | 1993-08-06 | Hitachi Ltd | 磁気ディスク装置 |
JPH07130310A (ja) * | 1993-10-29 | 1995-05-19 | Toshiba Corp | X線管及びその取付部材 |
US5938344A (en) * | 1997-03-26 | 1999-08-17 | Sabin; Jeffrey M. | Temperature compensating bearing |
JP2001053133A (ja) * | 1999-08-06 | 2001-02-23 | Tokyo Electron Ltd | 基板昇降機構 |
JP2002170855A (ja) * | 2000-11-30 | 2002-06-14 | Tokyo Seimitsu Co Ltd | プローバ |
JP2005056983A (ja) * | 2003-08-01 | 2005-03-03 | Apic Yamada Corp | スピンドル |
JP2007535380A (ja) * | 2004-04-28 | 2007-12-06 | バリアン・メディカル・システムズ・テクノロジーズ・インコーポレイテッド | X線デバイス焦点制御のためのシステム、方法、およびデバイス |
JP2008110426A (ja) * | 2006-10-30 | 2008-05-15 | Ntn Corp | スピンドル装置 |
Also Published As
Publication number | Publication date |
---|---|
KR102046189B1 (ko) | 2019-11-18 |
JP2018109632A (ja) | 2018-07-12 |
EP2754171A2 (en) | 2014-07-16 |
WO2013036660A2 (en) | 2013-03-14 |
WO2013036660A3 (en) | 2013-05-02 |
KR20140061476A (ko) | 2014-05-21 |
EP2754171A4 (en) | 2015-05-06 |
JP6368644B2 (ja) | 2018-08-01 |
US8995066B2 (en) | 2015-03-31 |
US20130057855A1 (en) | 2013-03-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2018109632A (ja) | 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償 | |
TW449680B (en) | High-speed precision positioning stage | |
KR102426823B1 (ko) | 계측 시스템 및 기판 처리 시스템, 그리고 디바이스 제조 방법 | |
US6437864B1 (en) | Stage positioning device | |
JP2005045215A (ja) | 熱膨張補償を備えるステージ | |
KR100914912B1 (ko) | 스테이지 장치, 노광 장치, 및 마이크로디바이스 제조 방법 | |
Geraldes et al. | The design of Exactly-constrained X-ray mirror Systems for Sirius | |
CN103543613B (zh) | 一种动铁式无线缆的六自由度磁浮运动平台 | |
CN103543612A (zh) | 一种带真空罩的动铁式无线缆六自由度磁浮运动平台 | |
CN105403212A (zh) | 一种具有八点减振和加表保温措施的三轴光纤陀螺仪结构 | |
CN108363430B (zh) | 一种高精度石英加速度计的温控装置及其温控方法 | |
CN110932602B (zh) | 一种六自由度磁悬浮转台、控制系统及方法 | |
US10331046B2 (en) | Homogeneous thermal equalization with active device | |
KR102488947B1 (ko) | 기판 처리 장치, 반응관 형상 측정 방법 및 반도체 장치의 제조 방법 | |
CN105509644A (zh) | 基于两个平面光栅的气浮台三自由度位移测量系统 | |
US20150098081A1 (en) | Metrology tool stage configurations and operation methods | |
JP2017107070A (ja) | 光学装置、それを備えた露光装置、および物品の製造方法 | |
Guo et al. | Investigation on the temperature compensating model for ring laser gyroscope | |
TWI819849B (zh) | 平台裝置及具備平台裝置的帶電粒子線裝置 | |
WO2024202930A1 (ja) | アライメント方法およびアライメント装置 | |
TW202345190A (zh) | 台裝置、帶電粒子線裝置及真空裝置 | |
Luo et al. | Mechanical and Thermal Performance Analysis of Optical Components with Integrated Function and Structure | |
JP2022093882A (ja) | 磁気浮上平面ステージ装置、真空装置及び荷電粒子線装置 | |
Devices et al. | Semiconductor | |
WO2007080523A1 (en) | Maglev object positioning apparatus and method for positioning an object and maintaining position with high stability |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150827 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160615 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160621 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160916 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170228 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170530 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20170919 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180118 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20180126 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180327 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180418 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180626 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180709 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6368644 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |