JP2014505166A - Electrode for electrolytic cell - Google Patents
Electrode for electrolytic cell Download PDFInfo
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- JP2014505166A JP2014505166A JP2013545366A JP2013545366A JP2014505166A JP 2014505166 A JP2014505166 A JP 2014505166A JP 2013545366 A JP2013545366 A JP 2013545366A JP 2013545366 A JP2013545366 A JP 2013545366A JP 2014505166 A JP2014505166 A JP 2014505166A
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- 239000000203 mixture Substances 0.000 claims abstract description 49
- 239000003054 catalyst Substances 0.000 claims abstract description 40
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 18
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 16
- 229910052741 iridium Inorganic materials 0.000 claims description 13
- 229910052707 ruthenium Inorganic materials 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 8
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- 229910001361 White metal Inorganic materials 0.000 claims description 6
- 238000005240 physical vapour deposition Methods 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 239000010969 white metal Substances 0.000 claims description 6
- 238000005546 reactive sputtering Methods 0.000 claims description 5
- 239000012267 brine Substances 0.000 claims description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 1
- -1 platinum group metals Chemical class 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- 239000000460 chlorine Substances 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000001035 drying Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 235000011121 sodium hydroxide Nutrition 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 239000010431 corundum Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/046—Alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Catalysts (AREA)
- Inorganic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Inert Electrodes (AREA)
Abstract
本発明は電解槽において気体状の生成物を発生させるための電極に関し、この電極は少なくとも二つの触媒組成物で被覆された金属の支持体を含み、最も外側の触媒組成物は化学的または物理的気相析出法によって堆積され、そして白金族金属の群から選択される貴金属またはその酸化物を含む組成を有する。
【選択図】なしThe present invention relates to an electrode for generating a gaseous product in an electrolytic cell, the electrode comprising a metal support coated with at least two catalyst compositions, the outermost catalyst composition being chemically or physically Deposited by chemical vapor deposition and having a composition comprising a noble metal selected from the group of platinum group metals or oxides thereof.
[Selection figure] None
Description
本発明は電解槽におけるアノードとして、例えば塩素-アルカリ電解槽における塩素発生用のアノードとして操作するのに適した電極に関する。 The present invention relates to an electrode suitable for operation as an anode in an electrolytic cell, for example as an anode for chlorine generation in a chlor-alkali electrolytic cell.
電気分解の用途において触媒被覆を備えた金属製電極を使用することは、当分野で公知である。貴金属またはそれらの酸化物を主成分とする被覆を備えた金属の支持体からなる電極は、例えば、水またはアルカリ塩化物の電気分解プロセスにおいて水素を発生させるためのカソードとして用いられ、また種々の電気冶金プロセスにおいて酸素を発生させるためやアルカリ塩化物の電気分解において塩素を発生させるためのアノードとして用いられる。この種の電極は熱過程によって製造することができ、すなわち、堆積すべき金属の先駆物質を含む溶液の適当な熱分解や、適当な電解浴からのガルバニ電着、あるいは溶射法やプラズマスプレー法または化学(または物理)気相析出法による直接の金属被覆によって製造することができる。 The use of metal electrodes with catalyst coatings in electrolysis applications is known in the art. Electrodes consisting of a metal support with a coating based on precious metals or their oxides are used, for example, as cathodes for generating hydrogen in water or alkaline chloride electrolysis processes, It is used as an anode for generating oxygen in the electrometallurgical process and for generating chlorine in the electrolysis of alkali chlorides. This type of electrode can be produced by a thermal process, i.e. suitable pyrolysis of a solution containing the metal precursor to be deposited, galvanic deposition from a suitable electrolytic bath, or spraying or plasma spraying. Alternatively, it can be produced by direct metallization by chemical (or physical) vapor deposition.
例えば、塩素と苛性ソーダを製造することを目的とする塩化ナトリウムのブラインの電気分解は、アノードで塩素を発生させる反応の過電圧を低下させるために二酸化ルテニウム(RuO2)の表面層で活性化されたチタンまたはその他のバルブ金属の支持体からなるアノードを用いて、しばしば行うことができる。このタイプの電気分解については、ルテニウム、イリジウムおよびチタンの酸化物の混合物を主成分とする触媒配合物も知られていて、それらは全て、アノードで塩素を発生させる反応の過電圧を低下させることができる。 For example, the electrolysis of sodium chloride brine aimed at producing chlorine and caustic soda has been activated with a surface layer of ruthenium dioxide (RuO 2 ) to reduce the overvoltage of the reaction of generating chlorine at the anode. This can often be done with an anode consisting of a support of titanium or other valve metal. For this type of electrolysis, catalyst formulations based on a mixture of ruthenium, iridium and titanium oxides are also known, all of which can reduce the overvoltage of the reaction that generates chlorine at the anode. it can.
この種の電極は一般に、熱過程によって製造される。 This type of electrode is generally manufactured by a thermal process.
気相析出法によって支持体の上に触媒配合物を堆積させることができ、この方法は、被覆の堆積パラメーターを極めて正確に制御することができるという利点を有する。しかし、これらは基本的にバッチ(回分)タイプの加工であることによって特徴づけられ、単一のピースを処理することを可能にするためには、支持体を適当な堆積チャンバの中に装填する必要があり、このチャンバを数時間継続する緩やかな圧力降下過程に置かなければならない。プロセスの顕著な継続時間(必要な貴金属の量に応じて、通常は数時間を要する)に加えて、大量の触媒被覆を付与することによって、寿命が非常に短い被覆がもたらされる。 The catalyst formulation can be deposited on the support by vapor deposition, which has the advantage that the deposition parameters of the coating can be controlled very accurately. However, these are basically characterized by being a batch type process, and in order to be able to process a single piece, the support is loaded into a suitable deposition chamber. There is a need to place this chamber in a slow pressure drop process that lasts for several hours. In addition to the significant duration of the process (usually several hours depending on the amount of precious metal required), applying a large amount of catalyst coating results in a coating with a very short life.
本発明の様々な態様が、添付する特許請求の範囲に示されている。 Various aspects of the invention are set out in the accompanying claims.
第一の態様において、本発明は電解槽において気体状の生成物を発生させるための電極に関し、この電極は少なくとも一つの第一の触媒組成物と外側の触媒組成物で被覆されたバルブ金属の支持体からなり、前記少なくとも一つの第一の触媒組成物は、バルブ金属の酸化物またはスズの酸化物と白金属(PM)の群から選択される貴金属またはその単独か混合での酸化物との混合物を含み、前記少なくとも一つの第一の触媒組成物は先駆物質の熱分解によって得られ、前記外側の触媒組成物は白金属の群から選択される貴金属またはその単独か混合での酸化物を含み、前記外側の触媒組成物は化学的または物理的気相析出法によって堆積され、前記第一の触媒組成物における貴金属の量は表面について5g/m2よりも多く、そして前記外側の触媒組成物における貴金属の量は表面について0.1〜3.0g/m2の範囲である。 In a first aspect, the present invention relates to an electrode for generating a gaseous product in an electrolytic cell, the electrode comprising a valve metal coated with at least one first catalyst composition and an outer catalyst composition. The at least one first catalyst composition comprises a noble metal selected from the group consisting of a valve metal oxide or a tin oxide and a white metal (PM), or an oxide thereof alone or in combination. Wherein the at least one first catalyst composition is obtained by pyrolysis of a precursor and the outer catalyst composition is an oxide of a noble metal selected from the group of white metals, or a single or mixture thereof wherein the said outer catalyst composition is deposited by chemical or physical vapor deposition method, the amount of noble metal in the first catalyst composition more than 5 g / m 2 for the surface, and the outer The amount of the noble metal in the catalyst composition is in the range of 0.1 to 3.0 g / m 2 for the surface.
驚くべきことに、発明者らは、特定の性質を有する一つの最後の触媒層を化学的または物理的気相を介して堆積させることによって、寿命と電位の低下の両者について予期せざる特徴を有する電極が得られることを見いだした。 Surprisingly, the inventors have unforeseen features for both lifetime and potential reduction by depositing one final catalyst layer with specific properties via a chemical or physical gas phase. It has been found that an electrode having the same is obtained.
一つの態様において、本発明に係る電極の第一の触媒組成物は、チタン、イリジウム、ルテニウムを金属または酸化物の形で含んでいる。 In one embodiment, the first catalyst composition of the electrode according to the present invention contains titanium, iridium, ruthenium in the form of a metal or oxide.
一つの態様において、外側の触媒組成物はルテニウムおよび/またはイリジウムを金属または酸化物の形で含んでいる。 In one embodiment, the outer catalyst composition comprises ruthenium and / or iridium in the form of a metal or oxide.
一つの態様において、第一の触媒組成物における特定の貴金属の使用量は6〜8g/m2の範囲であり、そして外側の触媒組成物における特定の金属の使用量は1.5〜2.5g/m2の範囲である。 In one embodiment, the amount of specific noble metal used in the first catalyst composition is in the range of 6-8 g / m 2 and the amount of specific metal used in the outer catalyst composition is 1.5-2. The range is 5 g / m 2 .
別の態様において、本発明は電極を製造する方法に関し、この方法は、外側の触媒組成物を化学的または物理的気相析出法によって堆積することを含み、好ましくは、これを白金属の群から選択される貴金属の反応性スパッタリングによって行う。 In another aspect, the present invention relates to a method of manufacturing an electrode, the method comprising depositing an outer catalyst composition by chemical or physical vapor deposition, preferably in a group of white metals. By reactive sputtering of a noble metal selected from
さらなる態様において、本発明は使用された電極を再活性化することに関し、これは、白金属の群から選択される貴金属またはその単独か混合での酸化物を含む外側の触媒組成物を、化学的または物理的気相析出法によって堆積することを含む。 In a further aspect, the present invention relates to reactivating a used electrode, which comprises chemistry of an outer catalyst composition comprising an oxide of a noble metal selected from the group of white metals, or a single or mixture thereof. Depositing by physical or physical vapor deposition.
さらなる態様において、本発明はアルカリ塩化物溶液の電解槽、例えば塩素と苛性ソーダを製造することを目的とする塩化ナトリウムのブラインの電解槽に関し、これは上述した電極の上で塩素のアノード生成(陽極生成)を行うものである。 In a further aspect, the present invention relates to an alkaline chloride solution electrolyzer, for example a sodium chloride brine electrolyzer intended to produce chlorine and caustic soda, which produces an anodic generation of chlorine (anode) on the electrode described above. Generation).
以下の実施例は本発明の特定の態様を証明するために提示されるものであり、本発明の実行可能性は特許請求の範囲に記載された数値の範囲内で十分に実証されている。当業者であれば、実施例において開示された組成と技術は本発明を実施するために十分に機能するものであることが発明者によって見いだされた組成と技術を示していることを理解するべきであるが、しかるに、当業者であれば、本明細書の開示に照らして、開示された特定の態様において多くの変更を行うことができて、それでもなお、本発明の範囲から逸脱することなく、同様の結果または類似する結果が得られることを理解するべきである。 The following examples are presented to demonstrate certain embodiments of the invention, and the feasibility of the invention is well demonstrated within the numerical values recited in the claims. One skilled in the art should understand that the compositions and techniques disclosed in the examples are indicative of the compositions and techniques found by the inventors to be sufficiently functional to practice the present invention. However, one of ordinary skill in the art, in light of the disclosure herein, may make many modifications in the specific embodiments disclosed without departing from the scope of the present invention. It should be understood that similar or similar results can be obtained.
比較例1
10cm×10cmの大きさのチタンメッシュのサンプルにコランダムを吹き付け、残った部分に圧縮空気を噴射して洗浄した。次いで、このサンプルについて、超音波浴中でアセトンを用いて約10分にわたって脱脂を行った。乾燥した後、サンプルを250g/lのNaOHと50g/lのKNO3を含む水溶液の中に約100℃で1時間にわたって浸漬した。このアルカリ処理を行った後、サンプルを脱イオン水の中で60℃で3回すすぎ洗いし、このとき一回毎に水を替えた。最後のすすぎ洗いは、少量のHCl(溶液1リットル当り約1ml)を加えて行った。空気による乾燥を行い、TiOxの薄膜が成長したことによる褐色の色合いの形成が観察された。次いで、HClで酸性化した水と2-プロパノールの混合物中にRuCl3・3H2O、H2IrCl6・6H2O、TiCl3を含み、金属について36%Ru、20%Ir、44%Tiのモル組成を有する水性アルコール溶液を100ml調製した。
Comparative Example 1
Corundum was sprayed on a sample of titanium mesh having a size of 10 cm × 10 cm, and the remaining portion was washed by jetting compressed air. The sample was then degreased with acetone in an ultrasonic bath for about 10 minutes. After drying, the sample was immersed in an aqueous solution containing 250 g / l NaOH and 50 g / l KNO 3 at about 100 ° C. for 1 hour. After this alkali treatment, the sample was rinsed three times at 60 ° C. in deionized water, with the water being changed every time. The final rinse was done by adding a small amount of HCl (about 1 ml per liter of solution). After drying with air, the formation of a brown color due to the growth of the TiO x thin film was observed. Then, RuCl 3 · 3H 2 O in a mixture of acidified water and 2-propanol in HCl, H 2 IrCl 6 · 6H 2 O, comprises TiCl 3, 36% for metals Ru, 20% Ir, 44% Ti 100 ml of an aqueous alcohol solution having a molar composition of
溶液を5回の被覆としてはけ塗りすることによって、チタンメッシュのサンプルに塗布し、それぞれの被覆を施した後、100〜110℃で約10分間の乾燥を行い、その後、450℃で15分間の熱処理を行った。後続の被覆を塗布する前に、そのたびにサンプルを空気中で冷却した。 The solution is applied to the titanium mesh sample by brushing as 5 coatings, each coating is applied, followed by drying at 100-110 ° C. for about 10 minutes, and then at 450 ° C. for 15 minutes. The heat treatment was performed. Each time the sample was cooled in air before applying subsequent coatings.
全ての手順の最後に、金属についてのRuおよびIrの合計として表して、9g/m2の貴金属の総含有量が得られた。 At the end of all procedures, a total noble metal content of 9 g / m 2 expressed as the sum of Ru and Ir for the metal was obtained.
このようにして得られた電極を、サンプル番号1と定めた。 The electrode thus obtained was designated as sample number 1.
比較例2
10cm×10cmの大きさのチタンメッシュのサンプルにコランダムを吹き付け、残った部分に圧縮空気を噴射して洗浄した。次いで、このサンプルについて、超音波浴中でアセトンを用いて約10分にわたって脱脂を行った。乾燥した後、サンプルを250g/lのNaOHと50g/lのKNO3を含む水溶液の中に約100℃で1時間にわたって浸漬した。このアルカリ処理を行った後、サンプルを脱イオン水の中で60℃で3回すすぎ洗いし、このとき一回毎に水を替えた。最後のすすぎ洗いは、少量のHCl(溶液1リットル当り約1ml)を加えて行った。空気による乾燥を行い、TiOxの薄膜が成長したことによる褐色の色合いの形成が観察された。
Comparative Example 2
Corundum was sprayed on a sample of titanium mesh having a size of 10 cm × 10 cm, and the remaining portion was washed by jetting compressed air. The sample was then degreased with acetone in an ultrasonic bath for about 10 minutes. After drying, the sample was immersed in an aqueous solution containing 250 g / l NaOH and 50 g / l KNO 3 at about 100 ° C. for 1 hour. After this alkali treatment, the sample was rinsed three times at 60 ° C. in deionized water, with the water being changed every time. The final rinse was done by adding a small amount of HCl (about 1 ml per liter of solution). After drying with air, the formation of a brown color due to the growth of the TiO x thin film was observed.
次いで、このメッシュのサンプルを反応性スパッタリング装置の真空チャンバの中に入れた。 The mesh sample was then placed in a vacuum chamber of a reactive sputtering apparatus.
20%アルゴンとの酸素の混合物を供給して動的真空度が約50−4ミリバールに達したとき、スパッタリングターゲットを次の出力で分極させた:ルテニウム35W、イリジウム24W、チタン250W。ターゲットと電極基板の間隙は約10センチメートルであった。 When a mixture of oxygen with 20% argon was supplied and the dynamic vacuum reached about 50-4 mbar, the sputtering target was polarized with the following outputs: ruthenium 35W, iridium 24W, titanium 250W. The gap between the target and the electrode substrate was about 10 centimeters.
220分の総継続時間にわたって、チタンのメッシュの両面について交互に同じ条件で堆積の工程を実施した。このようにして得られた電極において、約1ミクロンの触媒被覆が形成され、貴金属の総含有量は、金属についてのRuおよびIrの合計として表して、約9g/m2であった。 Over the entire duration of 220 minutes, the deposition process was carried out alternately under the same conditions on both sides of the titanium mesh. In the electrode thus obtained, a catalyst coating of about 1 micron was formed and the total precious metal content, expressed as the sum of Ru and Ir for the metal, was about 9 g / m 2 .
このようにして得られた電極を、サンプル番号2と定めた。 The electrode thus obtained was designated as sample number 2.
実施例1
10cm×10cmの大きさのチタンメッシュのサンプルにコランダムを吹き付け、残った部分に圧縮空気を噴射して洗浄した。次いで、このサンプルについて、超音波浴中でアセトンを用いて約10分にわたって脱脂を行った。乾燥した後、サンプルを250g/lのNaOHと50g/lのKNO3を含む水溶液の中に約100℃で1時間にわたって浸漬した。このアルカリ処理を行った後、サンプルを脱イオン水の中で60℃で3回すすぎ洗いし、このとき一回毎に水を替えた。最後のすすぎ洗いは、少量のHCl(溶液1リットル当り約1ml)を加えて行った。空気による乾燥を行い、TiOxの薄膜が成長したことによる褐色の色合いの形成が観察された。
Example 1
Corundum was sprayed on a sample of titanium mesh having a size of 10 cm × 10 cm, and the remaining portion was washed by jetting compressed air. The sample was then degreased with acetone in an ultrasonic bath for about 10 minutes. After drying, the sample was immersed in an aqueous solution containing 250 g / l NaOH and 50 g / l KNO 3 at about 100 ° C. for 1 hour. After this alkali treatment, the sample was rinsed three times at 60 ° C. in deionized water, with the water being changed every time. The final rinse was done by adding a small amount of HCl (about 1 ml per liter of solution). After drying with air, the formation of a brown color due to the growth of the TiO x thin film was observed.
次いで、HClで酸性化した水と2-プロパノールの混合物中にRuCl3・3H2O、H2IrCl6・6H2O、TiCl3を含む水性アルコール溶液を100ml調製した。この溶液は、金属について36%Ru、20%Ir、44%Tiのモル組成を有する。 Then, acidified water and 2- RuCl 3 · 3H 2 O in a mixture of propanol, H 2 IrCl 6 · 6H 2 O, the aqueous alcohol solution containing the TiCl 3 was 100ml prepared with HCl. This solution has a molar composition of 36% Ru, 20% Ir, 44% Ti for the metal.
溶液を5回の被覆としてはけ塗りすることによって、チタンメッシュのサンプルに塗布し、それぞれの被覆を施した後、100〜110℃で約10分間の乾燥を行い、その後、450℃で15分間の熱処理を行った。後続の被覆を塗布する前に、そのたびにサンプルを空気中で冷却した。 The solution is applied to the titanium mesh sample by brushing as 5 coatings, each coating is applied, followed by drying at 100-110 ° C. for about 10 minutes, and then at 450 ° C. for 15 minutes. The heat treatment was performed. Each time the sample was cooled in air before applying subsequent coatings.
全ての手順の最後に、金属についてのRuおよびIrの合計として表して、7g/m2の貴金属の総含有量が得られた。 At the end of all procedures, a total noble metal content of 7 g / m 2 expressed as the sum of Ru and Ir for the metal was obtained.
次いで、この半完成品としての電極を反応性スパッタリング装置の真空チャンバの中に入れた。 The semi-finished electrode was then placed in a vacuum chamber of a reactive sputtering apparatus.
20%アルゴンとの酸素の混合物を供給して動的真空度が約100−4ミリバールに達したとき、スパッタリングターゲットを次の出力で分極させた:ルテニウム30W、イリジウム35W。ターゲットと電極基板の間隙は約10センチメートルであった。得られる被覆に最適な特性を付与するために、基板に対してさらに約150Vの残りの分極化を行った。 When a mixture of oxygen with 20% argon was supplied and the dynamic vacuum reached about 100-4 mbar, the sputtering target was polarized with the following outputs: ruthenium 30W, iridium 35W. The gap between the target and the electrode substrate was about 10 centimeters. The remaining polarization of about 150V was further applied to the substrate in order to impart optimal properties to the resulting coating.
40分の総継続時間にわたって、電極の両面について交互に同じ条件で堆積の工程を実施した。このようにして得られた電極は約0.1μmの厚さの外側の触媒被覆を有し、貴金属の総含有量は、金属についてのRuおよびIrの合計として表して、約9g/m2であった。 Over the total duration of 40 minutes, the deposition process was carried out alternately under the same conditions on both sides of the electrode. The electrode thus obtained has an outer catalyst coating of about 0.1 μm thickness and the total precious metal content is about 9 g / m 2 expressed as the sum of Ru and Ir for the metal. there were.
このようにして得られた電極を、サンプル番号3と定めた。 The electrode thus obtained was designated as sample number 3.
以上の実施例のサンプルを、200g/lの濃度の塩化ナトリウムのブラインを入れた実験室用電解槽の中でpHを3に厳密に制御しながら塩素を発生させるためのアノードとして、特徴づけした。4kA/m2の電流密度で測定した塩素の過電圧と生成した塩素中の酸素の体積パーセントを、表1に報告する。 The sample of the above example was characterized as an anode for generating chlorine while strictly controlling the pH to 3 in a laboratory electrolytic cell containing 200 g / l sodium chloride brine. . The chlorine overvoltage measured at a current density of 4 kA / m 2 and the volume percent of oxygen in the chlorine produced are reported in Table 1.
同様に、以上の実施例のサンプルについて耐久試験を行った。この耐久試験は、電解液の濃度と温度についての工業上の電解条件の下での独立した電解槽におけるシミュレーションを行うものであるが、ただし、実験上の反応性を促進するために、電流密度を標準の値よりも2〜3倍高い値まで適宜増大させた。 Similarly, a durability test was performed on the samples of the above examples. This endurance test is a simulation in an independent electrolyzer under industrial electrolysis conditions for electrolyte concentration and temperature, but in order to promote experimental reactivity, the current density Was increased appropriately to a value 2-3 times higher than the standard value.
単位電流当りに減少した貴金属の量を、表2に報告する。 The amount of noble metal decreased per unit current is reported in Table 2.
以上の説明は本発明を限定することを意図しておらず、本発明はその範囲から逸脱することなく様々な態様に従って用いることができ、本発明の範囲は添付する特許請求の範囲によって一義的に確定される。 The above description is not intended to limit the present invention, and the present invention can be used in accordance with various embodiments without departing from the scope thereof, and the scope of the present invention is unambiguously defined by the appended claims. To be confirmed.
本出願の明細書と特許請求の範囲の全体を通して、「含む」という用語は、他の要素または付加物の存在を排除することを意図していない。 Throughout the specification and claims of this application, the term “comprising” is not intended to exclude the presence of other elements or additions.
文献中の検討事項、法令、資料、デバイス、記事、その他同種類のものは、単に本発明のための背景を提供するという目的のために本明細書に含まれる。これらの事項の何らかのもの、あるいはそれらの全てが先行技術の基礎の部分を形成していたか、あるいは、それらが、本出願の各々の請求項の優先日の前に、本発明に関連する分野において一般的な共通認識になっていた、ということは示唆されないし、表明されてもいない。 Literature considerations, statutes, materials, devices, articles, and the like are included herein for the purpose of merely providing a background for the present invention. Some of these matters, or all of them, form part of the prior art basis, or they are in the field relevant to the present invention before the priority date of each claim of this application. It has not been suggested or expressed that it was a general consensus.
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AU2011347262B2 (en) | 2016-03-31 |
JP6247535B2 (en) | 2017-12-13 |
CA2815137A1 (en) | 2012-06-28 |
AU2011347262A1 (en) | 2013-05-23 |
SG190951A1 (en) | 2013-07-31 |
EP2655693B1 (en) | 2016-11-16 |
CL2013001620A1 (en) | 2013-11-08 |
KR101886032B1 (en) | 2018-08-07 |
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BR112013014015A2 (en) | 2016-09-13 |
TW201226631A (en) | 2012-07-01 |
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