JP2014504028A - スラブ型レーザ - Google Patents
スラブ型レーザ Download PDFInfo
- Publication number
- JP2014504028A JP2014504028A JP2013550783A JP2013550783A JP2014504028A JP 2014504028 A JP2014504028 A JP 2014504028A JP 2013550783 A JP2013550783 A JP 2013550783A JP 2013550783 A JP2013550783 A JP 2013550783A JP 2014504028 A JP2014504028 A JP 2014504028A
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- Prior art keywords
- flat surface
- partial
- resonator
- slab type
- type laser
- Prior art date
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 5
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 5
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 230000012447 hatching Effects 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0388—Compositions, materials or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08081—Unstable resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
【選択図】図1
Description
6,8 電極
10 放電空間
12,14 端面
16,18 共振器ミラー
20 誘電性層
21 部分面
22 残りの領域
Claims (9)
- 二酸化炭素CO2を含む混合ガスをレーザ活性媒体として有するスラブ型レーザであって、
平坦面で互いに向かい合った2つのプレート状の金属電極(6,8)の間に前記媒体が入っており、該電極により放電空間(10)が画定され、
前記放電空間の互いに反対側の端面(12,14)に共振器ミラー(16,18)がそれぞれ配置されており、該共振器ミラーにより前記平坦面と平行に不安定共振器が構成され、
互いに向かい合った前記平坦面(2,4)の少なくとも1つが該平坦面全体に誘電性層(20)を備えかつ該誘電性層の厚みが少なくとも1つの部分面(21)で前記平坦面(2,4)の残りの領域(22)よりも厚くなっているか、または、少なくとも1つの前記平坦面(2,4)が少なくとも1つの部分面(21)にのみ誘電性層(20)を備えている、スラブ型レーザ。 - 前記少なくとも1つの部分面は、前記平坦面の端面側の縁部にある、請求項1に記載のスラブ型レーザ。
- 前記部分面は、前記電極の互いに反対側の長辺まで延びている、請求項2に記載のスラブ型レーザ。
- 前記少なくとも1つの部分面は、前記平坦面の出力結合縁部にある、請求項1に記載のスラブ型レーザ。
- 前記部分面は、互いに反対側の端面まで延びている、請求項4に記載のスラブ型レーザ。
- 前記共振器は、前記放電空間の中に焦点がある共焦点の負分岐共振器であり、該焦点が前記少なくとも1つの部分面内に位置している、請求項1に記載のスラブ型レーザ。
- 前記部分面は、前記平坦面の内方に配置されている、請求項6に記載のスラブ型レーザ。
- 前記部分面は、前記電極の互いに反対側の長辺まで延びている、請求項6に記載のスラブ型レーザ。
- 前記部分面は、前記互いに反対側の端面まで延びている、請求項6に記載のスラブ型レーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011003147A DE102011003147B3 (de) | 2011-01-26 | 2011-01-26 | Bandleiterlaser |
DE102011003147.2 | 2011-01-26 | ||
PCT/EP2011/071281 WO2012100866A1 (de) | 2011-01-26 | 2011-11-29 | Bandleiterlaser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014504028A true JP2014504028A (ja) | 2014-02-13 |
JP5719038B2 JP5719038B2 (ja) | 2015-05-13 |
Family
ID=45375286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013550783A Active JP5719038B2 (ja) | 2011-01-26 | 2011-11-29 | スラブ型レーザ |
Country Status (5)
Country | Link |
---|---|
US (1) | US8913642B2 (ja) |
EP (1) | EP2668701A1 (ja) |
JP (1) | JP5719038B2 (ja) |
DE (1) | DE102011003147B3 (ja) |
WO (1) | WO2012100866A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012222469B4 (de) * | 2012-12-06 | 2017-03-30 | Trumpf Laser- Und Systemtechnik Gmbh | Diffusionsgekühlte Gaslaseranordnung und Verfahren zur Einstellung der Entladungsverteilung bei einer diffusionsgekühlten Gaslaseranordnung |
WO2016207737A1 (en) * | 2015-06-23 | 2016-12-29 | Soreq Nuclear Research Center | Gas slab laser |
CN105305215B (zh) * | 2015-11-06 | 2018-08-17 | 华中科技大学 | 一种激光器 |
GB2552636B (en) * | 2017-11-22 | 2019-01-09 | Rofin Sinar Uk Ltd | Polarisation and mode selection technique for a laser |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5479428A (en) * | 1992-01-22 | 1995-12-26 | Mitsubishi Denki Kabushiki Kaisha | Laser apparatus |
JPH1168196A (ja) * | 1997-08-26 | 1999-03-09 | Nissin Electric Co Ltd | ガスレーザ装置 |
JP2001053362A (ja) * | 1999-08-11 | 2001-02-23 | Matsushita Electric Ind Co Ltd | ガスレーザ装置 |
US20050175054A1 (en) * | 2004-02-06 | 2005-08-11 | Shackleton Christian J. | Dielectric coupled CO2 slab laser |
US20060029116A1 (en) * | 2004-08-05 | 2006-02-09 | Shackleton Christian J | Dielectric coupled CO2 slab laser |
US20100118898A1 (en) * | 2010-01-21 | 2010-05-13 | Gavin Alan James Markillie | Mode selection technique for a laser |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4875218A (en) * | 1985-05-29 | 1989-10-17 | Hitachi Cable Ltd. | Thin-film coated waveguide laser |
US4719639B1 (en) * | 1987-01-08 | 1994-06-28 | Boreal Laser Inc | Carbon dioxide slab laser |
DE3729053A1 (de) | 1987-08-31 | 1989-03-16 | Deutsche Forsch Luft Raumfahrt | Hochleistungs-bandleiterlaser |
EP0444442A3 (en) * | 1990-03-01 | 1991-11-13 | Siemens Aktiengesellschaft | Co or co2 waveguide laser |
DE9003331U1 (de) * | 1990-03-21 | 1991-07-18 | Rofin-Sinar Laser GmbH, 2000 Hamburg | Gaslaser |
US5155739A (en) * | 1990-10-12 | 1992-10-13 | Coherent, Inc. | RF excited CO2 slab waveguide laser |
EP0523674A1 (de) * | 1991-07-18 | 1993-01-20 | Siemens Aktiengesellschaft | Slab- oder Bandleiterlaser für hohe Laserleistungen |
US5379317A (en) * | 1993-05-28 | 1995-01-03 | California Institute Of Technology | Microwave-excited slab waveguide laser with all metal sealed cavity |
EP1116307A1 (en) * | 1998-09-21 | 2001-07-18 | Peter Vitruk | Stable multi-fold telescopic laser resonator |
WO2004049524A1 (en) * | 2002-11-28 | 2004-06-10 | Gosudarstvennoye Predpriyatie Nauchnoissledovatelsky Institut Lazernoy Fiziki | High power slab type gas laser |
CN1314173C (zh) * | 2003-09-29 | 2007-05-02 | 北京礴德恒激光科技有限公司 | 一维全金属板条波导气体激光器 |
DE102010040298B4 (de) | 2010-06-08 | 2012-09-13 | Rofin-Sinar Laser Gmbh | Bandleiterlaser |
-
2011
- 2011-01-26 DE DE102011003147A patent/DE102011003147B3/de active Active
- 2011-11-29 EP EP11799257.8A patent/EP2668701A1/de not_active Withdrawn
- 2011-11-29 WO PCT/EP2011/071281 patent/WO2012100866A1/de active Application Filing
- 2011-11-29 JP JP2013550783A patent/JP5719038B2/ja active Active
-
2013
- 2013-07-25 US US13/950,880 patent/US8913642B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5479428A (en) * | 1992-01-22 | 1995-12-26 | Mitsubishi Denki Kabushiki Kaisha | Laser apparatus |
JPH1168196A (ja) * | 1997-08-26 | 1999-03-09 | Nissin Electric Co Ltd | ガスレーザ装置 |
JP2001053362A (ja) * | 1999-08-11 | 2001-02-23 | Matsushita Electric Ind Co Ltd | ガスレーザ装置 |
US20050175054A1 (en) * | 2004-02-06 | 2005-08-11 | Shackleton Christian J. | Dielectric coupled CO2 slab laser |
US20060029116A1 (en) * | 2004-08-05 | 2006-02-09 | Shackleton Christian J | Dielectric coupled CO2 slab laser |
US20100118898A1 (en) * | 2010-01-21 | 2010-05-13 | Gavin Alan James Markillie | Mode selection technique for a laser |
Non-Patent Citations (1)
Title |
---|
JPN7014002926; Thierry Teuma: 'Mode selectivity using selective layered and combined metallic-dielectric electrodes in slab wavegui' PROCEEDINGS OF SPIE Vol. 4184, 200101, pp.286-290 * |
Also Published As
Publication number | Publication date |
---|---|
WO2012100866A1 (de) | 2012-08-02 |
JP5719038B2 (ja) | 2015-05-13 |
EP2668701A1 (de) | 2013-12-04 |
US20130308673A1 (en) | 2013-11-21 |
US8913642B2 (en) | 2014-12-16 |
DE102011003147B3 (de) | 2012-04-05 |
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