JP2014214320A - Device and method for manufacturing chromium electroplated steel strip - Google Patents

Device and method for manufacturing chromium electroplated steel strip Download PDF

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JP2014214320A
JP2014214320A JP2013089874A JP2013089874A JP2014214320A JP 2014214320 A JP2014214320 A JP 2014214320A JP 2013089874 A JP2013089874 A JP 2013089874A JP 2013089874 A JP2013089874 A JP 2013089874A JP 2014214320 A JP2014214320 A JP 2014214320A
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tank
plating solution
drag
plating
chromium
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JP5786888B2 (en
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宏和 木内
Hirokazu Kiuchi
宏和 木内
嘉秀 山本
Yoshihide Yamamoto
嘉秀 山本
英輔 堀田
Eisuke Hotta
英輔 堀田
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JFE Steel Corp
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/18Regeneration of process solutions of electrolytes

Abstract

PROBLEM TO BE SOLVED: To provide a device for chromium electroplating of a steel strip, with adjustment of the concentration of metal impurities in a chromium plating tank; and a method of chromium electroplating.SOLUTION: The device for manufacturing a chromium electroplated steel strip includes: a plating tank in which a steel strip is chromium electroplated; a drag-out tank in which chromium plating solution dragged out of the plating tank by an associated flow along with the transfer of the steel strip is collected; a drag-out storage tank in which the chromium plating solution collected in the drag-out tank is stored; a device which is separately connected to the drag-out storage tank so as to remove metal impurities in the stored chromium plating solution; and a chromium plating solution buffer tank connected between the plating tank and the drag-out storage tank, which allows the chromium plating solution to be circulated into the plating tank and returns the chromium plating solution stored in the drag-out storage tank to the plating tank.

Description

本発明は、電気クロムめっき鋼帯の製造装置および電気クロムめっき鋼帯の製造方法に関するものである。   The present invention relates to an apparatus for producing an electrochromic steel strip and a method for producing an electrochrome steel strip.

近年、クロムめっきを施す場合、操業時間の経過に伴って、めっき液中に、鉄、ニッケル、銅、亜鉛、アルミニウム等の金属不純物の溶け込み量が増加してくる。これら金属不純物の溶け込み量の増加に伴って、その結果、鋼帯の溶接性の低下等、品質不良を招くという問題があった。   In recent years, when chromium plating is performed, the amount of penetration of metal impurities such as iron, nickel, copper, zinc, and aluminum increases in the plating solution as the operation time elapses. As the amount of penetration of these metal impurities has increased, there has been a problem of incurring quality defects such as a decrease in weldability of the steel strip.

そこで、クロムめっきを施す際には、一般的にめっき液中に含まれる金属不純物(特に鉄分)の混入量の上限値を設定し、めっき液の管理を行っている(非特許文献1)。そして、めっき液中に含まれる金属不純物の管理方法として、金属不純物濃度が上限に達した場合、めっき液の一部を新液と入れ替え、金属不純物濃度を低下させることにより、金属不純物濃度を管理する方法が挙げられる(特許文献1)。また、特許文献2のように、鉄分除去装置を用いて鉄分濃度(金属不純物濃度)を管理する方法もある。   Therefore, when performing chromium plating, the upper limit value of the amount of metal impurities (particularly iron) contained in the plating solution is generally set to manage the plating solution (Non-patent Document 1). As a method for managing metal impurities contained in the plating solution, when the metal impurity concentration reaches the upper limit, the metal impurity concentration is managed by replacing part of the plating solution with a new solution and lowering the metal impurity concentration. (Patent Document 1). In addition, as disclosed in Patent Document 2, there is a method of managing the iron concentration (metal impurity concentration) using an iron removing device.

特開平10−158882号公報Japanese Patent Laid-Open No. 10-15882 特開2008−45186号公報JP 2008-45186 A

白井十四雄,めっき技術便覧,(昭和46年),p218〜219,日刊工業新聞社Shigei Shigeo, Plating Technology Handbook, (Showa 46), p218-219, Nikkan Kogyo Shimbun

特許文献1の方法で金属不純物濃度を低減させる場合、めっき液の一部を入れ替えるため、同時に入れ替えられためっき液中のクロム酸も廃液となってしまい、クロム酸原単位の悪化という問題がある。また、特許文献2の方法では、めっき液の濃縮装置と鉄分除去装置とが直列に並んでいる。この直列方式は、特許文献2のように、メタンスルフォン酸のような腐食性がそれほど高くないめっき液成分については有効である。しかしながら、これをクロム酸のめっき液に適用すると、めっき液の濃縮により高濃度のクロム酸を含むめっき液が鉄分除去装置に注入される。このため、高濃度のクロム酸が鉄分除去装置を腐食させ、鉄分除去装置の寿命を著しく低下させる。その結果、装置のランニングコストが悪化するという問題がある。   When the metal impurity concentration is reduced by the method of Patent Document 1, since a part of the plating solution is replaced, the chromic acid in the replaced plating solution is also a waste solution, and there is a problem that the chromic acid basic unit deteriorates. . In the method of Patent Document 2, the plating solution concentrating device and the iron removing device are arranged in series. This series method is effective for plating solution components such as methanesulfonic acid that are not highly corrosive like Patent Document 2. However, when this is applied to a chromic acid plating solution, the plating solution containing a high concentration of chromic acid is injected into the iron removing device by concentration of the plating solution. For this reason, a high concentration of chromic acid corrodes the iron content removing device and significantly reduces the life of the iron content removing device. As a result, there is a problem that the running cost of the apparatus is deteriorated.

本発明は、かかる事情に鑑みてなされたものであって、クロムめっき槽における金属不純物濃度を調整し、鋼帯に電気クロムめっきする装置および電気クロムめっき方法を提供することを目的とする。   This invention is made | formed in view of this situation, Comprising: It aims at providing the apparatus and electrochrome plating method which adjust the metal impurity density | concentration in a chromium plating tank, and electrochrome-plating to a steel strip.

本発明の要旨は、以下の通りである。
[1]鋼帯に電気クロムめっきを行うめっき槽と、鋼帯の移動に伴う随伴流によりめっき槽外に引き出されるクロムめっき液を回収するドラグアウトタンクと、前記ドラグアウトタンクに回収されたクロムめっき液を貯蔵するドラグアウトストレージタンクと、前記ドラグアウトストレージタンクに個別に接続され、前記貯蔵されたクロムめっき液を濃縮する装置と、前記ドラグアウトストレージタンクに個別に接続され、前記貯蔵されたクロムめっき液の金属不純物除去を行う装置と、前記めっき槽と前記ドラグアウトストレージタンクとの間に接続されて、前記めっき槽との間でクロムめっき液を循環させるとともに、前記ドラグアウトストレージタンクに貯蔵されたクロムめっき液を前記めっき槽へ戻すめっき液バッファータンクとからなることを特徴とする電気クロムめっき鋼帯の製造装置。
[2]クロムめっき液をめっき槽とめっき液バッファータンクとの間で循環させつつ、めっき槽にて移動する鋼帯に電気クロムめっきを行うに際し、鋼帯の移動に伴う随伴流によりめっき槽外に引き出されるクロムめっき液をドラグアウトタンクで回収し、当該回収したクロムめっき液を、一旦ドラグアウトストレージタンクに貯蔵した後に、再び、前記めっき液バッファータンクに戻す電気クロムめっき鋼帯の製造方法であって、前記ドラグアウトストレージタンクにおいて、前記貯蔵されためっき液の濃縮および金属不純物除去をそれぞれ個別に行うことを特徴とする電気クロムめっき鋼帯の製造方法。
[3]前記金属不純物除去は、前記ドラグアウトストレージタンク中のクロム酸濃度が所定値以下である場合に実施されることを特徴とする[2]に記載の電気クロムめっき鋼帯の製造方法。
The gist of the present invention is as follows.
[1] A plating tank for performing electrochromic plating on a steel strip, a drag-out tank for recovering a chromium plating solution drawn out of the plating tank by an accompanying flow accompanying the movement of the steel strip, and chromium recovered in the drag-out tank A drag-out storage tank for storing a plating solution; a device for concentrating the stored chromium plating solution separately connected to the drag-out storage tank; and a separate connection to the drag-out storage tank for storing A device for removing metal impurities from the chrome plating solution, connected between the plating tank and the drag-out storage tank, circulates the chromium plating liquid between the plating tank and the drag-out storage tank. A plating solution buffer tank that returns the stored chromium plating solution to the plating tank. Apparatus for manufacturing an electrical chrome plated steel strip characterized by comprising.
[2] When electrochromic plating is performed on the steel strip moving in the plating tank while circulating the chromium plating solution between the plating tank and the plating solution buffer tank, the accompanying flow accompanying the movement of the steel strip causes the outside of the plating tank. In the manufacturing method of the electrochromic steel strip, the chromium plating solution drawn out in the drag-out tank is collected in the drag-out tank, the collected chromium plating solution is once stored in the drag-out storage tank, and then returned to the plating solution buffer tank. In the drag-out storage tank, the stored plating solution is concentrated and the metal impurities are individually removed.
[3] The method for producing an electrochromic steel strip according to [2], wherein the metal impurity removal is performed when a chromic acid concentration in the drag-out storage tank is a predetermined value or less.

本発明は、鋼帯の随伴流によりクロムめっき槽外に引き出されるめっき液を回収し、一旦貯蔵した後、再びめっき液として利用し、前記貯蔵過程でめっき液の濃縮および金属除去を個別に行うことにより、鋼帯の随伴流により引き出されるめっき液をクロムめっき槽に戻し再利用することができるとともに、めっき槽における金属不純物濃度を調整することができる。また、金属除去装置に腐食性の高い高濃度のクロム酸が流れないことから、金属除去装置の寿命を適正に保つことができる。また、クロムめっき液中のクロム酸を廃液にすることがなく、クロム酸の原単位を改善することができる。   The present invention collects the plating solution drawn out of the chrome plating tank by the accompanying flow of the steel strip, stores it once, and then uses it again as the plating solution. The concentration of the plating solution and the metal removal are individually performed in the storage process. Thus, the plating solution drawn by the accompanying flow of the steel strip can be returned to the chromium plating tank and reused, and the metal impurity concentration in the plating tank can be adjusted. Moreover, since highly concentrated chromic acid with high corrosivity does not flow through the metal removing device, the life of the metal removing device can be maintained appropriately. Moreover, the chromic acid basic unit can be improved without using chromic acid in the chrome plating solution as a waste solution.

本発明の実施形態が適用されるクロムめっき槽における金属不純物濃度を調整する手順を示すフロー図である。It is a flowchart which shows the procedure which adjusts the metal impurity density | concentration in the chromium plating tank to which embodiment of this invention is applied. 特許文献2における金属不純物濃度を調整する手順を示すフロー図である。10 is a flowchart showing a procedure for adjusting a metal impurity concentration in Patent Document 2. FIG.

本発明の装置は、図1に示すとおり、クロムめっき槽1と、めっき液バッファータンク6と、ドラグアウトタンク2と、ドラグアウトストレージタンク3と、クロムめっき液の濃縮装置4と、金属不純物の除去装置5とからなる。なお、これら装置は一台に限らず複数台あってもよい。   As shown in FIG. 1, the apparatus of the present invention comprises a chromium plating tank 1, a plating solution buffer tank 6, a dragout tank 2, a dragout storage tank 3, a chromium plating solution concentrating device 4, a metal impurity And a removal device 5. Note that the number of these devices is not limited to one and may be plural.

クロムめっき槽1とめっき液バッファータンク6が配管で接続され、クロムめっき液が交互に移動可能とされる。クロムめっき槽1はドラグアウトタンク2に接続され、ドラグアウトタンク2はドラグアウトストレージタンク3に接続され、ドラグアウトストレージタンク3はめっき液バッファータンク6に接続される。また、クロムめっき液の濃縮装置4はドラグアウトストレージタンク3に個別に接続され、クロムめっき液が交互に移動可能とされる。さらに、金属不純物の除去装置5がドラグアウトストレージタンク3に個別に接続され、クロムめっき液が交互に移動可能とされる。なお、クロムめっき液の濃縮装置4と金属不純物の除去装置5は、それぞれ個別にドラグアウトストレージタンク3に接続され、クロムめっき液がクロムめっき液の濃縮装置4から直接金属不純物の除去装置5に入ることはなく、ドラグアウトストレージタンク3を必ず経由する。   The chrome plating tank 1 and the plating solution buffer tank 6 are connected by piping so that the chrome plating solution can be moved alternately. The chrome plating tank 1 is connected to a drag-out tank 2, the drag-out tank 2 is connected to a drag-out storage tank 3, and the drag-out storage tank 3 is connected to a plating solution buffer tank 6. Further, the chrome plating solution concentrating device 4 is individually connected to the drag-out storage tank 3 so that the chrome plating solution can be moved alternately. Further, the metal impurity removing device 5 is individually connected to the drag-out storage tank 3 so that the chromium plating solution can be moved alternately. The chromium plating solution concentrating device 4 and the metal impurity removing device 5 are individually connected to the drag-out storage tank 3, and the chromium plating solution is directly transferred from the chromium plating solution concentrating device 4 to the metal impurity removing device 5. It does not enter and always passes through the drag-out storage tank 3.

前記クロムめっき槽1では鋼帯に電気クロムめっきを行い、電気クロムめっきに用いるクロムめっき液は、クロムめっき槽1とめっき液バッファータンク6との間で循環される。また、クロムめっきされる鋼帯の移動に伴う随伴流によりクロムめっき液がめっき槽外に引き出されるため、鋼帯表面の(純水などを用いた)洗浄液とともに当該クロムめっき液はドラグアウトタンク2に希釈されて回収される。回収されたドラグアウトタンク2のクロムめっき液は、当該タンク2に接続されるドラグアウトストレージタンク3に一旦貯蔵される。ドラグアウトストレージタンク3に貯蔵した前記クロムめっき液は再びめっき液バッファータンク6に戻され、めっき液バッファータンク6と交互に液の移動が可能なクロムめっき槽1に入り、再び、鋼帯のめっきに供される。従って、鋼帯の随伴流により引き出されるクロムめっき液をめっき槽に戻して再利用でき。クロムめっき液中のクロム酸を廃液にすることがなく、クロム酸の原単位を改善することができる。   In the chrome plating tank 1, electrochromic plating is performed on the steel strip, and a chrome plating solution used for the electrochrome plating is circulated between the chrome plating tank 1 and the plating solution buffer tank 6. Moreover, since the chromium plating solution is drawn out of the plating tank by the accompanying flow accompanying the movement of the steel strip to be chromium plated, the chromium plating solution is used together with the cleaning solution (using pure water) on the surface of the steel strip as the drag-out tank 2. It is diluted and collected. The collected chromium plating solution in the drag-out tank 2 is temporarily stored in the drag-out storage tank 3 connected to the tank 2. The chrome plating solution stored in the drag-out storage tank 3 is returned to the plating solution buffer tank 6 again, enters the chrome plating tank 1 in which the solution can move alternately with the plating solution buffer tank 6, and is again plated with steel strip. To be served. Therefore, the chromium plating solution drawn out by the accompanying flow of the steel strip can be returned to the plating tank and reused. The basic unit of chromic acid can be improved without making chromic acid in the chrome plating solution waste.

また、前記ドラグアウトストレージタンク3に個別に接続された金属不純物の除去装置5により、ドラグアウトストレージタンク3に貯蔵されたクロムめっき液の金属不純物が除去される。金属不純物が除去されたクロムめっき液は、ドラグアウトストレージタンク3からめっき液バッファータンク6を経てクロムめっき槽1に戻る。従って、クロムめっき槽1における金属不純物の濃度を調整することができる。   Further, the metal impurity removal device 5 individually connected to the drag-out storage tank 3 removes metal impurities from the chromium plating solution stored in the drag-out storage tank 3. The chromium plating solution from which the metal impurities have been removed returns from the dragout storage tank 3 to the chromium plating tank 1 through the plating solution buffer tank 6. Therefore, the concentration of metal impurities in the chrome plating tank 1 can be adjusted.

また、ドラグアウトタンク2に希釈されて回収されるクロムめっき液は、前記ドラグアウトストレージタンク3に一旦貯蔵され、前記ドラグアウトストレージタンク3に個別に接続されたクロムめっき液の濃縮装置4により所定のクロム酸濃度まで濃縮される。なお、本発明では、ドラグアウトストレージタンク3とクロムめっき液の濃縮装置4と金属不純物の除去装置5の配置から、クロムめっき液の濃縮装置4のめっき液が金属不純物の除去装置5に直接供給されることはない。従って、金属不純物の除去装置5に直接高濃度のクロムめっき液が供給されないことから、金属不純物の除去装置5の寿命を適正に保つことができる。   Further, the chromium plating solution diluted and recovered in the drag-out tank 2 is temporarily stored in the drag-out storage tank 3 and predetermined by the chromium plating solution concentrator 4 individually connected to the drag-out storage tank 3. Concentrated to a chromic acid concentration of In the present invention, the plating solution of the chromium plating solution concentrating device 4 is directly supplied to the metal impurity removing device 5 from the arrangement of the drag-out storage tank 3, the chromium plating solution concentrating device 4 and the metal impurity removing device 5. It will never be done. Therefore, since the high concentration chromium plating solution is not directly supplied to the metal impurity removing device 5, the life of the metal impurity removing device 5 can be maintained appropriately.

なお、クロムめっき液の濃縮装置4としては、例えば、低温蒸発装置などを用いることができる。また、金属不純物の除去装置5としては、例えば、イオン交換樹脂を充填した槽やイオン交換膜を層状に配置した装置などを用いることができる。   As the chromium plating solution concentrating device 4, for example, a low temperature evaporation device or the like can be used. Further, as the metal impurity removing device 5, for example, a tank filled with an ion exchange resin or an apparatus in which ion exchange membranes are arranged in layers can be used.

本発明において、ドラグアウトストレージタンク3に接続されるクロムめっき液の濃縮装置4においてめっき液の濃縮を行っているので、ドラグアウトストレージタンク3に貯蔵されるクロムめっき液のクロム酸濃度が上昇する。その結果、ドラグアウトストレージタンク3に貯蔵されるめっき液中のクロム酸濃度を、クロムめっき槽1に貯蔵されためっき液中のクロム酸濃度と同程度まで濃縮して調整することが可能である。また、万一、クロムめっき液のクロム酸濃度が所定値を超えて過剰に上昇した場合でも、金属不純物の除去装置5を停止することによって、金属不純物の除去装置5に直接高濃度のクロム酸が供給されないことから、金属不純物の除去装置5の寿命を適正に保つことができる。   In the present invention, since the plating solution is concentrated in the chromium plating solution concentrating device 4 connected to the drag-out storage tank 3, the chromic acid concentration of the chromium plating solution stored in the drag-out storage tank 3 is increased. . As a result, the chromic acid concentration in the plating solution stored in the drag-out storage tank 3 can be concentrated and adjusted to the same level as the chromic acid concentration in the plating solution stored in the chrome plating tank 1. . Also, even if the chromic acid concentration of the chrome plating solution exceeds the predetermined value and excessively increases, the high concentration chromic acid is directly applied to the metal impurity removal device 5 by stopping the metal impurity removal device 5. Is not supplied, the life of the metal impurity removing device 5 can be maintained appropriately.

また、めっき液を回収するドラグアウトタンク2とは別に、ドラグアウトストレージタンク3を設けたため、ドラグアウトストレージタンク3のクロムめっき液のクロム酸濃度を測定して、新しいめっき液、または、純水などの希釈液を供給してめっき液の濃度を適正に調整することもできる。   In addition, since the drag-out storage tank 3 is provided separately from the drag-out tank 2 for collecting the plating solution, the chromic acid concentration of the chromium plating solution in the drag-out storage tank 3 is measured to obtain a new plating solution or pure water. It is also possible to appropriately adjust the concentration of the plating solution by supplying a diluent such as.

なお、ドラグアウトストレージタンク3において目標のクロム酸濃度まで濃縮されためっき液は、クロムめっき槽1に直接戻してもよい。   Note that the plating solution concentrated to the target chromic acid concentration in the drag-out storage tank 3 may be returned directly to the chrome plating tank 1.

また、本発明では、ドラグアウトストレージタンク3とクロムめっき液の濃縮装置4と金属不純物の除去装置5の配置から、金属不純物の濃度が高い場合は、クロムめっき液の濃縮装置4を停止し、金属不純物の除去装置5の稼動時間を適宜長くすることができる。また、クロムめっき液の濃度が低い場合、金属不純物の除去装置5を停止し、クロムめっき液の濃縮装置4の稼動時間を適宜長くすることができる。   Further, in the present invention, when the concentration of metal impurities is high due to the arrangement of the drag-out storage tank 3, the chromium plating solution concentrating device 4 and the metal impurity removing device 5, the chromium plating solution concentrating device 4 is stopped. The operating time of the metal impurity removing device 5 can be lengthened appropriately. Moreover, when the density | concentration of chromium plating solution is low, the removal apparatus 5 of a metal impurity can be stopped and the operation time of the concentration apparatus 4 of chromium plating solution can be lengthened suitably.

なお、本発明において、金属不純物の除去装置5を腐食させるクロム酸濃度は、金属不純物の除去装置の材質により異なるので、金属不順物の除去装置5の材質により適宜設定すればよい。   In the present invention, the chromic acid concentration that corrodes the metal impurity removing device 5 varies depending on the material of the metal impurity removing device, and therefore may be set as appropriate depending on the material of the metal irregular material removing device 5.

図1に一例を示す。本発明の方法により、鋼帯の随伴流により引き出されるめっき液中の金属不純物濃度を調整しつつ、鋼帯をクロムめっきした。一方、比較例として、めっき液中の金属不純物濃度を特許文献2に記載の方法で調整した。図2は、特許文献2に記載の金属不純物濃度の調整する手順を示す比較例のフロー図である。図2において、クロムめっき槽1に収容されためっき液はめっき液循環タンク12に一旦貯留され、貯留されためっき液はめっき液循環タンク12からスラジ除去装置7へ供給される。スラジ除去装置7でめっき液中のスラジが除去された後、めっき液は濃縮装置4において濃縮される。濃縮されためっき液は、鉄分析出装置8、鉄化合物分離装置9、再溶解装置10、鉄分除去装置11の順に直接供給される。鉄化合物分離装置9にて鉄化合物を分離されためっき液は、循環タンク12に戻される。一方、鉄化合物は再溶解装置10に供給されて水に再溶解された後、鉄分除去装置11で鉄成分が除去されてから、再びめっき液循環タンク12に戻され、その後クロムめっき槽1に戻されて再利用される。   An example is shown in FIG. With the method of the present invention, the steel strip was chromium plated while adjusting the metal impurity concentration in the plating solution drawn by the accompanying flow of the steel strip. On the other hand, as a comparative example, the metal impurity concentration in the plating solution was adjusted by the method described in Patent Document 2. FIG. 2 is a flowchart of a comparative example showing a procedure for adjusting the metal impurity concentration described in Patent Document 2. In FIG. 2, the plating solution stored in the chrome plating tank 1 is temporarily stored in the plating solution circulation tank 12, and the stored plating solution is supplied from the plating solution circulation tank 12 to the sludge removing device 7. After the sludge in the plating solution is removed by the sludge removing device 7, the plating solution is concentrated in the concentrating device 4. The concentrated plating solution is directly supplied in the order of the iron analyzing and extracting device 8, the iron compound separating device 9, the remelting device 10, and the iron content removing device 11. The plating solution from which the iron compound is separated by the iron compound separation device 9 is returned to the circulation tank 12. On the other hand, the iron compound is supplied to the redissolving device 10 and redissolved in water, and then the iron component is removed by the iron content removing device 11 and then returned to the plating solution circulation tank 12. Returned and reused.

本発明例と比較例について、それぞれ12ヶ月間に亘って電気クロムめっき鋼帯の製造ラインを稼動させた。   About the example of this invention and the comparative example, the production line of the electrochromic steel strip was operated for 12 months, respectively.

本発明例(図1)では、めっき液中のクロム酸濃度が、金属不純物の除去装置5の腐食限界である150g/Lを超えた場合に、金属不純物の除去装置5を停止させた。なお、このとき、濃縮装置4は継続して稼働させた。結果として、金属不純物の除去装置5のトラブルなく操業できた。そして、目標のクロム酸濃度まで濃縮することができ、めっき槽における金属不純物濃度を調整することができた。   In the example of the present invention (FIG. 1), when the chromic acid concentration in the plating solution exceeded 150 g / L, which is the corrosion limit of the metal impurity removal device 5, the metal impurity removal device 5 was stopped. At this time, the concentrating device 4 was continuously operated. As a result, the metal impurity removing device 5 could be operated without any trouble. And it could concentrate to the target chromic acid density | concentration and was able to adjust the metal impurity density | concentration in a plating tank.

比較例(図2)では、本発明の金属不純物の除去装置に相当する鉄分析出装置8から鉄化合物分離装置9までの腐食が激しくて、12ヶ月間に亘って、めっき液中の金属不純物を十分に除去できず、途中で、クロム酸の新液でめっき液の一部を更新しなければならなくなり、クロム酸原単位が悪化し本発明例に比べてクロム酸使用量が1.5倍増加した。   In the comparative example (FIG. 2), the corrosion from the iron analyzing and extracting device 8 to the iron compound separating device 9 corresponding to the metal impurity removing device of the present invention is severe, and the metal impurities in the plating solution are used for 12 months. In the middle of the process, a part of the plating solution must be renewed with a new solution of chromic acid, the chromic acid basic unit deteriorates and the amount of chromic acid used is 1.5 compared to the present invention example. Doubled.

したがって、本発明例は、比較例に比べて、鋼帯の随伴流により引き出されるめっき液をめっき槽に戻し再利用するとともに、めっき槽における金属不純物濃度を調整できて、金属除去装置の寿命を適正に保つことができ、めっき液のクロム酸の原単位を大幅に改善することができた。   Therefore, compared with the comparative example, the present invention example can return the plating solution drawn out by the accompanying flow of the steel strip to the plating tank and reuse it, and can adjust the metal impurity concentration in the plating tank, thereby extending the life of the metal removing device. It was possible to maintain it properly, and the chromic acid basic unit of the plating solution could be greatly improved.

1 クロムめっき槽
2 ドラグアウトタンク
3 ドラグアウトストレージタンク
4 クロムめっき液の濃縮装置
5 金属不純物の除去装置
6 めっき液バッファータンク
7 スラジ除去装置
8 鉄分析出装置
9 鉄化合物分離装置
10 再溶解装置
11 鉄分除去装置
12 めっき液循環タンク
DESCRIPTION OF SYMBOLS 1 Chromium plating tank 2 Drag out tank 3 Drag out storage tank 4 Chromium plating solution concentration device 5 Metal impurity removal device 6 Plating solution buffer tank 7 Sludge removal device 8 Iron analyzer 9 Iron compound separation device 10 Remelting device 11 Iron removal equipment 12 Plating solution circulation tank

Claims (3)

鋼帯に電気クロムめっきを行うめっき槽と、
鋼帯の移動に伴う随伴流によりめっき槽外に引き出されるクロムめっき液を回収するドラグアウトタンクと、
前記ドラグアウトタンクに回収されたクロムめっき液を貯蔵するドラグアウトストレージタンクと、
前記ドラグアウトストレージタンクに個別に接続され、前記貯蔵されたクロムめっき液を濃縮する装置と、
前記ドラグアウトストレージタンクに個別に接続され、前記貯蔵されたクロムめっき液の金属不純物除去を行う装置と、
前記めっき槽と前記ドラグアウトストレージタンクとの間に接続されて、前記めっき槽との間でクロムめっき液を循環させるとともに、前記ドラグアウトストレージタンクに貯蔵されたクロムめっき液を前記めっき槽へ戻すめっき液バッファータンクと
からなることを特徴とする電気クロムめっき鋼帯の製造装置。
A plating tank for electrochrome plating on the steel strip;
A drag-out tank that collects the chromium plating solution drawn out of the plating tank by the accompanying flow accompanying the movement of the steel strip;
A drag-out storage tank for storing the chromium plating solution collected in the drag-out tank;
A device individually connected to the drag-out storage tank and concentrating the stored chromium plating solution;
An apparatus for individually removing metal impurities from the stored chromium plating solution, connected to the drag-out storage tank;
Connected between the plating tank and the drag-out storage tank to circulate the chromium plating solution between the plating tank and return the chromium plating solution stored in the drag-out storage tank to the plating tank. An electrochromic steel strip production apparatus comprising a plating solution buffer tank.
クロムめっき液をめっき槽とめっき液バッファータンクとの間で循環させつつ、めっき槽にて移動する鋼帯に電気クロムめっきを行うに際し、
鋼帯の移動に伴う随伴流によりめっき槽外に引き出されるクロムめっき液をドラグアウトタンクで回収し、当該回収したクロムめっき液を、一旦ドラグアウトストレージタンクに貯蔵した後に、再び、前記めっき液バッファータンクに戻す電気クロムめっき鋼帯の製造方法であって、
前記ドラグアウトストレージタンクにおいて、前記貯蔵されためっき液の濃縮および金属不純物除去をそれぞれ個別に行うことを特徴とする電気クロムめっき鋼帯の製造方法。
In carrying out electrochromic plating on the steel strip moving in the plating tank while circulating the chromium plating solution between the plating tank and the plating solution buffer tank,
The chromium plating solution drawn out of the plating tank due to the accompanying flow accompanying the movement of the steel strip is collected in the drag-out tank, and the collected chromium plating solution is once stored in the drag-out storage tank, and then again the plating solution buffer. A method for producing an electrochromic steel strip that is returned to a tank,
In the drag-out storage tank, concentration of the stored plating solution and removal of metal impurities are individually performed.
前記金属不純物除去は、前記ドラグアウトストレージタンク中のクロム酸濃度が所定値以下である場合に実施されることを特徴とする請求項2に記載の電気クロムめっき鋼帯の製造方法。   The method for producing an electrochromic steel strip according to claim 2, wherein the metal impurity removal is performed when the chromic acid concentration in the drag-out storage tank is a predetermined value or less.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4006072A (en) * 1975-06-02 1977-02-01 Takayasu Kyoteru Device for eliminating impure ions in chromium plating bath
JPS6370000A (en) * 1986-09-09 1988-03-30 Nippon Kagaku Sangyo Kk Method for controlling electroplating liquid for zinc or zinc alloy
JPH03130400A (en) * 1989-05-16 1991-06-04 Sumitomo Metal Ind Ltd Method for recovering valuable metallic matter from waste plating solution
JPH06256999A (en) * 1993-03-05 1994-09-13 Kawasaki Steel Corp Method for recovering and regenerating tin plating liquid
JP2003129299A (en) * 2001-09-04 2003-05-08 Boc Group Inc:The System for use together with plating tank configured to plate object and process for removing portion of by- product from plating substance
JP2008045187A (en) * 2006-08-21 2008-02-28 Jfe Steel Kk Apparatus for regenerating plating solution and method for regenerating plating solution
JP2009024186A (en) * 2007-07-17 2009-02-05 Daiso Co Ltd Method and apparatus for regenerating chromium plating solution

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4006072A (en) * 1975-06-02 1977-02-01 Takayasu Kyoteru Device for eliminating impure ions in chromium plating bath
JPS6370000A (en) * 1986-09-09 1988-03-30 Nippon Kagaku Sangyo Kk Method for controlling electroplating liquid for zinc or zinc alloy
JPH03130400A (en) * 1989-05-16 1991-06-04 Sumitomo Metal Ind Ltd Method for recovering valuable metallic matter from waste plating solution
JPH06256999A (en) * 1993-03-05 1994-09-13 Kawasaki Steel Corp Method for recovering and regenerating tin plating liquid
JP2003129299A (en) * 2001-09-04 2003-05-08 Boc Group Inc:The System for use together with plating tank configured to plate object and process for removing portion of by- product from plating substance
JP2008045187A (en) * 2006-08-21 2008-02-28 Jfe Steel Kk Apparatus for regenerating plating solution and method for regenerating plating solution
JP2009024186A (en) * 2007-07-17 2009-02-05 Daiso Co Ltd Method and apparatus for regenerating chromium plating solution

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