JP2014201794A - Electroless plating method and electroless plating apparatus - Google Patents

Electroless plating method and electroless plating apparatus Download PDF

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JP2014201794A
JP2014201794A JP2013079391A JP2013079391A JP2014201794A JP 2014201794 A JP2014201794 A JP 2014201794A JP 2013079391 A JP2013079391 A JP 2013079391A JP 2013079391 A JP2013079391 A JP 2013079391A JP 2014201794 A JP2014201794 A JP 2014201794A
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plating
electroless plating
plated
electroless
rotating shaft
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善昭 伊藤
Yoshiaki Ito
善昭 伊藤
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MITOMO SEMICON ENGINEERING KK
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Abstract

PROBLEM TO BE SOLVED: To provide an electroless plating method capable of plating uniformly at high speed without taking out a plating solution to the outside of a plating tank, and to provide an electroless plating apparatus usable preferably for execution thereof.SOLUTION: In the dipped state into an electroless plating solution of a rod-like plating object whose one end is mounted on a revolving shaft 46 in the tilted state at a prescribed angle with respect to the axial direction of the revolving shaft 46 or in the decentered state with respect to the shaft center of the revolving shaft 46, the revolving shaft 46 is rotated, to thereby plate the other end of the plating object, while moving it circularly.

Description

本発明は、被めっき物をめっき槽内で高速回転させながらめっきを行う無電解めっき方法、及び同無電解めっき方法の実施に用いて好適な無電解めっき装置に関する。   The present invention relates to an electroless plating method for performing plating while rotating an object to be plated at a high speed in a plating tank, and an electroless plating apparatus suitable for use in the implementation of the electroless plating method.

無電解めっき方法は、材料表面の触媒とめっき液との接触により生じる還元作用を利用するめっき方法である。非導電性材料からなる被めっき物をめっきできることや、小型の被めっき物にも比較的均一な膜厚でめっきできることなどから、自動車部品、半導体材料等に多用されている。   The electroless plating method is a plating method that utilizes a reducing action caused by contact between a catalyst on the material surface and a plating solution. Since it is possible to plate an object to be plated made of a non-conductive material, and it is possible to plate a small object to be plated with a relatively uniform film thickness, it is widely used for automobile parts, semiconductor materials, and the like.

従来、無電解めっき方法においては、治具に多数の被めっき物を吊下げ、これを大きなめっき槽に浸漬して、めっきを行っている。しかし、この方法による場合は、寿命を迎えためっき液中に多量の金属イオンが残存しているので、この金属イオンを回収しないと、経済的に大きな損失になる問題がある。金属イオンが金や白金等の貴金属イオンである場合は、金属イオンの回収は、特に重要である。   Conventionally, in the electroless plating method, a large number of objects to be plated are suspended on a jig and immersed in a large plating tank to perform plating. However, when this method is used, a large amount of metal ions remains in the plating solution that has reached the end of its life. Therefore, there is a problem that a large loss occurs economically if this metal ion is not recovered. When the metal ion is a noble metal ion such as gold or platinum, the recovery of the metal ion is particularly important.

一方、六角筒状の多孔性バレル内に被めっき物を収納し、このバレルを無電解めっき液中で穏やかに回転させることにより、めっきを行うバレル方式も周知である。この方法に於いても、上記問題がある。更に、めっき中に、被めっき物同士が互いに衝突し、被めっき物の材質によっては、被めっき物の変形、破損、傷つきが生じる問題がある。   On the other hand, a barrel system in which plating is performed by housing an object to be plated in a hexagonal cylindrical porous barrel and gently rotating the barrel in an electroless plating solution is also well known. This method also has the above problem. Furthermore, the objects to be plated collide with each other during plating, and depending on the material of the objects to be plated, there is a problem that the objects to be plated are deformed, broken, or damaged.

また更に、上記無電解めっき方法による場合は、めっき終了後、治具、バレル、被めっき物等に付着するめっき液がめっき槽外に多量に持出され、不経済である。特に、めっき液が貴金属含有めっき液の場合はこの問題は深刻である。   Furthermore, in the case of the above electroless plating method, a large amount of plating solution adhering to the jig, barrel, object to be plated, etc. is taken out of the plating tank after completion of plating, which is uneconomical. This problem is particularly serious when the plating solution is a noble metal-containing plating solution.

その他の問題点としては、めっき時間が長い問題がある。無電解めっきを行う場合、めっき時間は長いもので10時間程度を必要とする。しかし、工業目的のめっき時間としては、この時間はあまりにも長い。   Another problem is that the plating time is long. When performing electroless plating, the plating time is long and requires about 10 hours. However, this time is too long as a plating time for industrial purposes.

無電解めっき装置としては、例えば特許文献1が挙げられる。
特開2003−113477号公報
As an electroless plating apparatus, for example, Patent Document 1 is cited.
JP 2003-113477 A

本発明は、上記事情に鑑みなされたもので、その目的とするところは、高速で、且つめっき浴外にめっき液を持出すこと無く、均一なめっきをすることができる無電解めっき方法及びその実施に用いて好適な無電解めっき装置を提供することにある。   The present invention has been made in view of the above circumstances, and the object thereof is an electroless plating method capable of performing uniform plating at high speed and without taking out a plating solution outside the plating bath, and the method thereof An object is to provide an electroless plating apparatus suitable for use in implementation.

本発明者らは、上記目的を達成するために種々の検討を行った。その結果、棒状の被めっき物を無電解めっき液中で所定の回転運動をさせることにより、従来の無電解めっき時間と比較して1/5〜1/10時間の高速で無電解めっきができることを知得した。更に、互いに噛合する複数のギヤを着脱自在にめっき槽に取付けると共に、このギヤに、モータを取付けた駆動ギヤを噛合させることにより、簡単な機構で多数の被めっき物を同時に無電解めっきできることを知得し、本発明を完成するに至った。   The present inventors have made various studies in order to achieve the above object. As a result, it is possible to perform electroless plating at a high speed of 1/5 to 1/10 hours compared to the conventional electroless plating time by causing the rod-shaped object to rotate in a predetermined rotational motion in the electroless plating solution. I knew. In addition, a plurality of gears that mesh with each other can be detachably attached to the plating tank, and a drive gear fitted with a motor can be meshed with this gear so that a large number of objects can be electrolessly plated simultaneously with a simple mechanism. I have come to know and have completed the present invention.

従って、上記課題を解決する本発明は、以下に記載するものである。   Therefore, the present invention that solves the above problems is described below.

〔1〕 支持枠と、
前記支持枠に固定される加熱槽と、
加熱槽内に配設され、所定数のめっき槽挿入孔を有するラックと、
めっき槽を跨いでめっき槽上方に配設される撹拌部固定腕と、
前記撹拌部固定腕に撹拌部を着脱自在に取付ける撹拌部取付け手段と、互いに噛合する所定数のギヤからなるギヤ部とを有し、前記各ギヤの回転軸には所定の角度で折曲する被めっき物装着用アダプター又は前記回転軸と偏心する被めっき物装着用アダプターを連結すると共に前記各ギヤは前記各めっき槽挿入孔の上方に位置して撹拌部固定腕に取付けられる撹拌部と、
前記撹拌部の何れかのギヤと噛合する駆動ギヤを備えるモータと、
からなる無電解めっき装置。
[1] a support frame;
A heating tank fixed to the support frame;
A rack disposed in the heating tank and having a predetermined number of plating tank insertion holes;
A stirring part fixing arm disposed above the plating tank across the plating tank;
A stirring unit mounting means for detachably mounting the stirring unit to the stirring unit fixing arm, and a gear unit including a predetermined number of gears meshing with each other, and the rotating shaft of each gear bends at a predetermined angle. A stirrer connected to a stirrer fixing arm and connected to a plating object mounting adapter or an adapter for mounting a plating object eccentric with the rotating shaft, and the gears are located above the plating tank insertion holes,
A motor having a drive gear meshing with any gear of the stirring unit;
An electroless plating apparatus comprising:

〔2〕 ギヤの回転軸と被めっき物装着用アダプターとが、互いに内部で連通する筒体で形成されてなり、アダプターに他端を閉じた筒状の被めっき物の一端を取付けることにより、前記連通する筒体内を通して、めっき液が、被めっき物内に供給される〔1〕に記載の無電解めっき装置。   [2] The rotating shaft of the gear and the adapter for mounting the object to be plated are formed by a cylindrical body communicating with each other, and by attaching one end of the cylindrical object to be plated with the other end closed, The electroless plating apparatus according to [1], wherein the plating solution is supplied into the object to be plated through the communicating cylinder.

〔3〕 支持枠に連結されたバイブレータを備える、〔1〕に記載の無電解めっき装置。   [3] The electroless plating apparatus according to [1], including a vibrator coupled to a support frame.

〔4〕 めっき槽が、有底筒状に形成されてなる、〔1〕に記載の無電解めっき装置。   [4] The electroless plating apparatus according to [1], wherein the plating tank is formed in a bottomed cylindrical shape.

〔5〕 めっき槽に供給するめっき液が無電解白金めっき液である〔1〕に記載の無電解めっき装置。   [5] The electroless plating apparatus according to [1], wherein the plating solution supplied to the plating tank is an electroless platinum plating solution.

〔6〕 被めっき物が、他端を閉じた筒状に形成されてなる〔1〕に記載の無電解めっき装置。   [6] The electroless plating apparatus according to [1], wherein the object to be plated is formed in a cylindrical shape with the other end closed.

〔7〕 回転軸の軸方向に対して所定角度傾けて回転軸にその一端を取付けた棒状被めっき物を、無電解めっき液に浸漬した状態で回転軸を回転させることにより、被めっき物の他端を円運動させながらめっきを行う、無電解めっき方法。   [7] By rotating the rotating shaft in a state where the rod-shaped object having one end attached to the rotating shaft and inclined at a predetermined angle with respect to the axial direction of the rotating shaft is immersed in the electroless plating solution, An electroless plating method in which plating is performed while circularly moving the other end.

〔8〕 回転軸の軸心と棒状被めっき物の軸心とを偏心させて被めっき物を回転軸に取り付け、無電解めっき液に浸漬した状態で回転軸を回転させることにより、被めっき物の軸心を円運動させながらめっきを行う、無電解めっき方法。   [8] An object to be plated is obtained by eccentrically aligning the axis of the rotating shaft and the axis of the rod-shaped object to be plated, attaching the object to be rotated to the rotating shaft, and rotating the rotating shaft while immersed in the electroless plating solution. Electroless plating method in which plating is performed while circularly moving the axis of the plate.

〔9〕 棒状被めっき物が、他端が閉塞した中空部を有し、前記中空部に無電解めっき液を注入してめっきを行う〔7〕又は〔8〕に記載の無電解めっき方法。   [9] The electroless plating method according to [7] or [8], wherein the rod-shaped object to be plated has a hollow portion whose other end is closed, and plating is performed by injecting an electroless plating solution into the hollow portion.

〔10〕 無電解めっき液が、無電解白金めっき液である〔7〕又は〔8〕に記載の無電解めっき方法。   [10] The electroless plating method according to [7] or [8], wherein the electroless plating solution is an electroless platinum plating solution.

〔11〕 回転軸の回転数が、600〜3000回/分である〔7〕又は〔8〕に記載の無電解めっき方法。   [11] The electroless plating method according to [7] or [8], wherein the rotational speed of the rotating shaft is 600 to 3000 times / minute.

〔12〕 回転軸の軸方向に対して被めっき物の軸心を1〜40度傾ける〔7〕に記載の無電解めっき方法。   [12] The electroless plating method according to [7], wherein the axis of the object to be plated is inclined by 1 to 40 degrees with respect to the axial direction of the rotary shaft.

〔13〕 回転軸の軸心と被めっき物の軸心を0.5〜30mm偏心させる〔8〕に記載の無電解めっき方法。   [13] The electroless plating method according to [8], wherein the axis of the rotating shaft and the axis of the object to be plated are eccentric by 0.5 to 30 mm.

〔14〕 めっき液中の金属イオンを1回のめっきで使い切る〔7〕又は〔8〕に記載の無電解めっき方法。   [14] The electroless plating method according to [7] or [8], wherein the metal ions in the plating solution are used up in one plating.

本発明の無電解めっき方法に於いては、被めっき物を回転軸に対して傾斜、または偏心させて回転させているので、撹拌効果が高く、反応物質の供給が促進されて、膜厚均一性が高く、且つ、めっき速度が速い。   In the electroless plating method of the present invention, the object to be plated is rotated while being inclined or decentered with respect to the rotation axis, so that the stirring effect is high, the supply of reactants is promoted, and the film thickness is uniform. High plating performance and high plating speed.

本発明の無電解めっき方法は、棒状の被めっき物をめっき液中で回転させるので、めっき槽は小容積の筒状で良く、使用するめっき液容積を少なくできる。従って、本めっき方法は、めっき液中の金属イオンを一回のめっきで使い切る方式の無電解めっきに適する。   In the electroless plating method of the present invention, since the rod-shaped object to be plated is rotated in the plating solution, the plating tank may be a small-volume cylinder, and the plating solution volume to be used can be reduced. Therefore, this plating method is suitable for electroless plating in which the metal ions in the plating solution are used up in a single plating.

この方法を貴金属めっきに適用する場合、めっき液量は必要最小限のめっき液量で良く、その結果めっき槽の廃液量も低減でき、経済的である。更に、めっき液が使いきりになり、めっきの度にめっき液を更新するので、無電解めっき液中の還元剤や貴金属イオン濃度を高めて、めっき液の安定性を維持しながらめっき速度を高めることができる。   When this method is applied to precious metal plating, the amount of plating solution may be the minimum necessary amount, and as a result, the amount of waste liquid in the plating tank can be reduced, which is economical. Furthermore, since the plating solution is used up and the plating solution is renewed at every plating, the concentration of reducing agent and noble metal ions in the electroless plating solution is increased, and the plating rate is increased while maintaining the stability of the plating solution. be able to.

本めっき装置は、めっきをすることが不要な部分はめっき液面から引上げてめっきすることにより、不要部分のめっきを避けられる。更に、本めっき装置は、治具、めっき液の循環ポンプ、めっき液の攪拌羽根等を使用していないので、装置の構造が簡単になる。また、これら部分にめっき被膜が形成されることが無いので、めっき装置のメンテナンスが容易になる。   This plating apparatus can avoid unnecessary portions from being plated by pulling portions that do not need to be plated from the plating solution surface. Furthermore, since the present plating apparatus does not use a jig, a plating solution circulation pump, a plating solution stirring blade, or the like, the structure of the device is simplified. Further, since no plating film is formed on these portions, the maintenance of the plating apparatus is facilitated.

本めっき装置は、複数のギヤからなる撹拌部を一体的にめっき装置に取付けることができるので、複数の被めっき物を同時にめっきする場合、操作性がよい。   Since the present plating apparatus can integrally attach the stirring unit composed of a plurality of gears to the plating apparatus, the operability is good when plating a plurality of objects to be plated at the same time.

本発明の無電解めっき装置の一例を示す正面図である。It is a front view which shows an example of the electroless-plating apparatus of this invention. 本発明の無電解めっき装置の一例を示す側面図である。It is a side view which shows an example of the electroless-plating apparatus of this invention. 本発明の無電解めっき装置に装着した被めっき物の状態の一例を示す正面図である。It is a front view which shows an example of the state of the to-be-plated object with which the electroless-plating apparatus of this invention was mounted | worn. 本発明の無電解めっき装置に装着した被めっき物の状態の他の例を示す正面図である。It is a front view which shows the other example of the state of the to-be-plated object with which the electroless-plating apparatus of this invention was mounted | worn.

以下、図面を参照して、本発明の一実施例に付き、詳細に説明する。   Hereinafter, with reference to the drawings, an embodiment of the present invention will be described in detail.

図1中、100は本発明の一例を示す無電解めっき装置である。2は、板状の基台で、前記基台2上には、スターラー4が載置されている。前記スターラー4の上部には、加熱槽6が配設され、その内部には水等の熱媒体8が満たされている。この熱媒体8は、前記スターラー4により撹拌されると共に、ヒーター10により加熱され、所望の媒体温度に保たれる。これらの制御は、制御装置12により行われる。   In FIG. 1, 100 is an electroless plating apparatus showing an example of the present invention. Reference numeral 2 denotes a plate-like base, and a stirrer 4 is placed on the base 2. A heating tank 6 is disposed at the top of the stirrer 4 and the inside thereof is filled with a heat medium 8 such as water. The heat medium 8 is stirred by the stirrer 4 and heated by the heater 10 to be maintained at a desired medium temperature. These controls are performed by the control device 12.

前記加熱槽6内には、ラック14が、熱媒体8に浸漬されて挿入されている。ラック14は、その上端に係止部16有し、この係止部16を加熱槽6の上端に係止することにより、加熱槽6内に固定される。   A rack 14 is immersed in the heating medium 8 and inserted into the heating tank 6. The rack 14 has a locking portion 16 at the upper end thereof, and is fixed in the heating bath 6 by locking the locking portion 16 to the upper end of the heating bath 6.

前記ラック14は、底板18を有する箱形で、その内部に、底板18と平行に配設した中板20、及び上板22を有する。これらの中板20、上板22には、所定数(本例に於いては5個)の中板めっき槽挿入孔24、上板めっき槽挿入孔26が、垂直方向に互いの孔中心を一致させて穿設されている。   The rack 14 has a box shape having a bottom plate 18, and has an intermediate plate 20 and an upper plate 22 disposed in parallel with the bottom plate 18. In the middle plate 20 and the upper plate 22, a predetermined number (five in this example) of the middle plate plating tank insertion holes 24 and the upper plate plating tank insertion holes 26 are vertically centered with respect to each other. It is drilled to match.

28は所定数(本例に於いては5個)のめっき槽で、めっき槽挿入孔24,26に挿入され、ラック14に固定されている。このめっき槽28は、有底円筒状の合成樹脂製で、化学実験で使用する試験管に外形が類似している。   Reference numeral 28 denotes a predetermined number (in this example, five) of plating tanks, which are inserted into the plating tank insertion holes 24 and 26 and fixed to the rack 14. The plating tank 28 is made of a bottomed cylindrical synthetic resin and has an external shape similar to that of a test tube used in a chemical experiment.

30は、支持枠で、不図示の固定手段により、基台2に固定されている。めっき槽28の上方には、前記めっき槽28を跨いで撹拌部固定腕32が支持枠30に取付けられている。この撹拌部固定腕32にも、所定数の貫通孔34が、形成されている。この貫通孔34は、後述する回転軸46の挿入用の孔である。なお、33は、支持枠30に取付けられたバイブレータである。   Reference numeral 30 denotes a support frame, which is fixed to the base 2 by fixing means (not shown). Above the plating tank 28, a stirring portion fixing arm 32 is attached to the support frame 30 across the plating tank 28. A predetermined number of through holes 34 are also formed in the stirring portion fixing arm 32. The through hole 34 is a hole for inserting a rotating shaft 46 described later. Reference numeral 33 denotes a vibrator attached to the support frame 30.

36は、撹拌部で、38は、断面がコ字状に形成された撹拌部基板である。この撹拌部基板38は、前記撹拌部固定腕32の上面に載置されると共に、撹拌部基板38の長さ方向の両端側に取付けた撹拌部取付け手段40により、撹拌部固定腕32にワンタッチで着脱自在に固定されている。   Reference numeral 36 denotes an agitation unit, and reference numeral 38 denotes an agitation unit substrate having a U-shaped cross section. The stirring unit substrate 38 is placed on the upper surface of the stirring unit fixing arm 32, and the stirring unit fixing arm 32 is attached to the stirring unit fixing arm 32 with one touch by means of the stirring unit mounting means 40 mounted on both ends in the length direction of the stirring unit substrate 38. It is fixed detachably with.

42は、ギヤ部で、ギヤの回転軸を垂直にして撹拌部基板38に回転自在に取付けられた所定数(本例に於いては5箇)のギヤ44により構成される。所定数のギヤ44は、互いに噛合しており、一のギヤ44の回転が残りのギヤ44に伝達されるようになっている。   Reference numeral 42 denotes a gear portion, which is composed of a predetermined number (in this example, five) of gears 44 that are rotatably attached to the stirring portion substrate 38 with the rotation axis of the gear being vertical. The predetermined number of gears 44 mesh with each other, and the rotation of one gear 44 is transmitted to the remaining gears 44.

各ギヤ44の回転軸46は、図3に示すように円筒状で、内部中空管で形成されると共に、その一端側48は垂直方向下方に延長されている。延長された回転軸46の一端側48には、回転軸46の軸心方向に対して所定角度傾けて取付けた被めっき物装着用傾斜アダプター50が連結され、弾性を有する合成樹脂管52を介してアダプター50と被めっき物54の一端56とが接続されている。従って、被めっき物54は、その軸心を、ギヤ44の回転軸46の軸心に対して所定角度傾斜して、回転軸46に取付けられることになる。   The rotation shaft 46 of each gear 44 is cylindrical as shown in FIG. 3 and is formed of an internal hollow tube, and one end side 48 thereof extends downward in the vertical direction. To one end side 48 of the extended rotating shaft 46, an inclination adapter 50 for mounting a workpiece to be attached is attached at an angle with respect to the axial center direction of the rotating shaft 46, and is connected via an elastic synthetic resin tube 52. Thus, the adapter 50 and one end 56 of the workpiece 54 are connected. Therefore, the workpiece 54 is attached to the rotating shaft 46 with its axis inclined at a predetermined angle with respect to the axis of the rotating shaft 46 of the gear 44.

傾斜角度としては、1〜40度が好ましく、2〜10度がより好ましい。傾斜角度が1度未満の場合は、めっき時間短縮効果が小さい。傾斜角度が
40度を超える場合は、特に問題はないが、めっき槽が大きくなり、めっき液の希釈倍率が増えて白金イオンの消費率の低下およびめっき時間が長く不経済になる。
The inclination angle is preferably 1 to 40 degrees, and more preferably 2 to 10 degrees. When the inclination angle is less than 1 degree, the plating time shortening effect is small. When the inclination angle exceeds 40 degrees, there is no particular problem, but the plating tank becomes large, the dilution rate of the plating solution increases, the consumption rate of platinum ions decreases, and the plating time becomes long and uneconomical.

前記所定数のギヤ44の何れか1のギヤ44は、図2に示すように、連結ギヤ58、変速ギヤ60、62を介して駆動モータ64の駆動ギヤ66に連結している。従って、モータ64を作動させることにより、モータ軸の回転は、変速されて所定数のギヤ44全部に伝達される。   Any one of the predetermined number of gears 44 is connected to a drive gear 66 of a drive motor 64 via a connection gear 58 and transmission gears 60 and 62 as shown in FIG. Therefore, by operating the motor 64, the rotation of the motor shaft is shifted and transmitted to all the predetermined number of gears 44.

次に、上記無電解めっき装置100を用いて被めっき物54を無電解めっきする場合に付、説明する。   Next, the case where the object 54 is electrolessly plated using the electroless plating apparatus 100 will be described.

先ず、ラック14のめっき槽挿入孔24,26に、内部にめっき液60(図3)を入れためっき槽28が挿入される。   First, the plating tank 28 containing the plating solution 60 (FIG. 3) is inserted into the plating tank insertion holes 24 and 26 of the rack 14.

無電解めっき装置100から取外されていた撹拌部36の各ギヤ回転軸46の一端側48に取付けられたアダプター50に合成樹脂管52を介して被めっき物54がそれぞれ取付けられる(図3)。本例の場合、被めっき物54は、有底円筒状に形成されたセラミック管であり、この外面、及び内面には、所望のパターンで、触媒層(不図示)が形成されている。上記被めっき物54を取付けた撹拌部36は、撹拌部固定腕32に載置されるが、この際に被めっき物54は、めっき槽28内に挿入されると共に、ギヤ44と噛合している連結ギヤ58が変速ギヤ60と噛合する。この状態で、撹拌部取付け手段40を操作することにより、撹拌部36が撹拌部固定腕32に固定される。   An object to be plated 54 is attached to the adapter 50 attached to one end side 48 of each gear rotation shaft 46 of the stirring unit 36 removed from the electroless plating apparatus 100 via a synthetic resin tube 52 (FIG. 3). . In the case of this example, the workpiece 54 is a ceramic tube formed in a bottomed cylindrical shape, and a catalyst layer (not shown) is formed in a desired pattern on the outer surface and the inner surface. The stirring portion 36 to which the object 54 is mounted is placed on the stirring portion fixing arm 32. At this time, the object 54 is inserted into the plating tank 28 and meshed with the gear 44. The connected gear 58 meshes with the transmission gear 60. In this state, the stirring unit 36 is fixed to the stirring unit fixing arm 32 by operating the stirring unit mounting means 40.

その後、各ギヤ44の回転軸46、アダプター50内の中空部を通して、無電解めっき液が被めっき物内の中空部に供給される。   Thereafter, the electroless plating solution is supplied to the hollow portion in the object to be plated through the rotation shaft 46 of each gear 44 and the hollow portion in the adapter 50.

次に、加熱槽スターラー4、ヒーター10により、加熱槽6内の熱媒体8が無電解めっき温度に加熱される。   Next, the heating medium 8 in the heating tank 6 is heated to the electroless plating temperature by the heating tank stirrer 4 and the heater 10.

上記操作の終了後、制御部12の指示により、モータ64が作動を開始する。モータ64の回転軸の回転は、駆動ギヤ66からギヤ62、60と回転速度を変えて連結ギヤ58に伝えられ、最後に連結ギヤ58と噛合するギヤ44に伝えられる。これにより、所定数のギヤ44の全てが同一回転数で回転する。その結果、ギヤの回転軸46の軸方向に対して所定角度傾けて、回転軸46にその一端を取付けた被めっき物54の他端70は無電解めっき液中で円運動を起し、被めっき物54は、無電解めっきされる。   After the above operation is completed, the motor 64 starts to operate according to an instruction from the control unit 12. The rotation of the rotation shaft of the motor 64 is transmitted from the drive gear 66 to the connection gear 58 while changing the rotation speed with the gears 62 and 60, and finally transmitted to the gear 44 meshing with the connection gear 58. Thereby, all of the predetermined number of gears 44 rotate at the same rotational speed. As a result, the other end 70 of the workpiece 54, which is inclined at a predetermined angle with respect to the axial direction of the rotary shaft 46 of the gear and has one end attached to the rotary shaft 46, causes a circular motion in the electroless plating solution. The plated object 54 is electrolessly plated.

回転軸46の回転数は、600〜3000回/分が好ましく、900〜2000回/分がより好ましい。   The rotational speed of the rotating shaft 46 is preferably 600 to 3000 times / minute, and more preferably 900 to 2000 times / minute.

被めっき物としては、棒状、円筒状、又は有底円筒状のものが適している。具体的には、金属シャフト、ボルト、釘等が例示される。又、棒状であって、ガラス部品、セラミック部品、装飾品等の変形又は破損しやすいものが挙げられる。   As the object to be plated, a rod-shaped, cylindrical or bottomed cylindrical shape is suitable. Specifically, a metal shaft, a bolt, a nail, etc. are illustrated. Moreover, it is a rod-like thing and is easy to be deformed or damaged such as a glass part, a ceramic part, or a decorative article.

無電解めっき液としては、各種の無電解めっき液が特に制限無く使用できる。特に好ましい無電解めっき液としては、金、白金等の貴金属被膜形成用の無電解めっき液が挙げられる。めっき容器と被めっき物の大きさ、めっき面積およびめっき膜厚によりめっき液を原液のまま、もしくは希釈して被めっき物が浸漬する液量に調整して使用することができる。この様な白金めっき液としては、「無電解めっき基礎と応用−」電気鍍金研究会編,日刊工業新聞社(1994) pp.201-202に記載のめっき液が例示され、白金イオン濃度の高い無電解めっき液を用いてめっき時間を短縮することができる。このめっき液を構成する各成分濃度を1〜100倍の希釈倍率にすることが好ましく、1〜50倍の希釈倍率がより好ましい。   As the electroless plating solution, various electroless plating solutions can be used without particular limitation. Particularly preferred electroless plating solutions include electroless plating solutions for forming noble metal films such as gold and platinum. Depending on the size of the plating container and the object to be plated, the plating area, and the plating film thickness, the plating solution can be used as it is or adjusted to the amount of solution in which the object to be plated is immersed by dilution. Examples of such a platinum plating solution include the plating solution described in “Electroless plating basics and applications-” edited by Electroplating Research Society, Nikkan Kogyo Shimbun (1994) pp.201-202, and has a high platinum ion concentration. The plating time can be shortened using an electroless plating solution. The concentration of each component constituting the plating solution is preferably 1 to 100 times, more preferably 1 to 50 times.

尚、上記実施例に於いては、ギヤ部42を5個のギヤ44で構成したが、これに限られず、任意の数のギヤを用いることができる。この場合、めっき槽28の数、ラック14のめっき槽挿入孔24の数等は、ギヤ部42のギヤ44の数に応じて調節すればよい。   In the above embodiment, the gear portion 42 is composed of the five gears 44, but the present invention is not limited to this, and any number of gears can be used. In this case, the number of plating tanks 28, the number of plating tank insertion holes 24 of the rack 14, and the like may be adjusted according to the number of gears 44 of the gear portion 42.

無電解めっき中に、バイブレータ33を作動させてめっき装置全体に振動を加えても良い。振動を加えることにより、めっき中に還元剤の分解に伴って発生する水素ガスや窒素ガスがめっき被膜表面に付着して生じるガスピットの生成を避けることができる。   During electroless plating, the vibrator 33 may be operated to apply vibration to the entire plating apparatus. By applying vibration, it is possible to avoid the generation of gas pits caused by the hydrogen gas or nitrogen gas generated along with the decomposition of the reducing agent during plating and adhering to the surface of the plating film.

なお、被めっき物の内面のめっきが必要でない場合、又は被めっき物に中空部がない円柱状の場合は、円筒状回転軸46内を通して被めっき物内にめっき液を供給することを省略する。   In addition, when plating of the inner surface of the object to be plated is not necessary, or when the object to be plated has a columnar shape with no hollow portion, supplying the plating solution into the object to be plated through the cylindrical rotating shaft 46 is omitted. .

図4は、アダプターの他の例を示す。この偏心アダプター80の例に於いては、回転軸46と接続されるアダプター上部82と、被めっき物84が接続されるアダプター下部86の軸心とは、一致しておらず偏心している。即ち、アダプター80はその中間部で段違いになるように形成されている。アダプター80の上部の軸心と下部の軸心との間隔(偏心距離)は0.5〜30mmが好ましく1〜10mmがより好ましい。アダプター80の中間部を段違いに形成することにより、被めっき物の軸心は半径0.5〜30mm、好ましくは1〜10mmの円運動をする。   FIG. 4 shows another example of the adapter. In the example of the eccentric adapter 80, the adapter upper part 82 connected to the rotating shaft 46 and the adapter lower part 86 connected to the object 84 are not aligned with each other but eccentric. That is, the adapter 80 is formed so as to be stepped at the intermediate portion. The distance (eccentric distance) between the upper axis and the lower axis of the adapter 80 is preferably 0.5 to 30 mm, and more preferably 1 to 10 mm. By forming the middle part of the adapter 80 in steps, the axis of the object to be plated performs a circular motion with a radius of 0.5 to 30 mm, preferably 1 to 10 mm.

以下、上記装置を用いて無電解白金めっきをする場合を具体的に説明する。   Hereinafter, the case where electroless platinum plating is performed using the above apparatus will be described in detail.

実施例1
図1に示す無電解めっき装置を用いて、5個の被めっき物の外面、及び内面に、所定のパターンの白金無電解めっきを同時に行った。
Example 1
Using the electroless plating apparatus shown in FIG. 1, platinum electroless plating of a predetermined pattern was simultaneously performed on the outer surface and inner surface of five objects to be plated.

被めっき物は、長さ4cm、直径1cmの有底円筒状のセラミックスの外面及び内面に所定のパターンの触媒層を形成したものであった。被めっき物の軸線と回転軸の軸線との傾斜角度は、3度であった。めっき槽は内径1.4cm、長さ15cmのポリプロピレン製試験管であった。めっき液(原液)を10倍希釈し、めっき液温度70℃で、1時間めっきを行った。被めっき物の回転速度は1000回/分であった。得られためっき被膜は均一で良好な被膜であった。めっきを終了した時点で、めっき液中の白金イオンはほぼ完全(消費率98%)に消費されていた。以下に、用いためっき液(原液)の組成を記載する。   The object to be plated was obtained by forming a catalyst layer having a predetermined pattern on the outer and inner surfaces of a bottomed cylindrical ceramic having a length of 4 cm and a diameter of 1 cm. The inclination angle between the axis of the object to be plated and the axis of the rotating shaft was 3 degrees. The plating tank was a polypropylene test tube having an inner diameter of 1.4 cm and a length of 15 cm. The plating solution (stock solution) was diluted 10 times and plated at a plating solution temperature of 70 ° C. for 1 hour. The rotation speed of the object to be plated was 1000 times / minute. The obtained plating film was uniform and good. When the plating was finished, the platinum ions in the plating solution were almost completely consumed (consumption rate 98%). The composition of the plating solution (stock solution) used is described below.

使用しためっき液(原液)組成
・ 白金エチレンジアミン錯塩・・・・・・白金として10g/L
・ アンモニア水・・・・・・・・・・・・120ml/L
・ ヒドラジン一水和物・・・・・・・・・50ml/L
・ 水・・・・・・・・・・・・・・・・・残部
・ pH・・・・・・・・・・・・・・・・・11
Used plating solution (stock solution) composition ・ Platinum ethylenediamine complex salt ・ ・ ・ ・ ・ ・ 10g / L as platinum
・ Ammonia water ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ 120ml / L
・ Hydrazine monohydrate ・ ・ ・ ・ ・ ・ ・ ・ 50ml / L
・ Water ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Remainder ・ pH ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ 11

実施例2
傾斜アダプターを取除き、回転軸の軸心と被めっき物の軸心が1mm偏心する偏心アダプター(図4に示すアダプター80)を取付けた。この偏心アダプターに実施例1で用いた被めっき物と同じ被めっき物を傾斜させずに取り付けた。これ以外は、実施例1と同様の条件で、操作した。めっき終了後、得られた被膜を評価した。得られためっき被膜の厚さは均一で良好な外観であった。めっきを終了した時点で、外面に用いためっき液中の白金イオンはほぼ完全(消費率98%)に消費されていた。
Example 2
The inclination adapter was removed, and an eccentric adapter (adapter 80 shown in FIG. 4) in which the axis of the rotating shaft and the axis of the object to be plated were eccentric by 1 mm was attached. The same plating object as that used in Example 1 was attached to the eccentric adapter without being inclined. Except for this, the operation was performed under the same conditions as in Example 1. After the plating was finished, the obtained coating was evaluated. The thickness of the obtained plating film was uniform and had a good appearance. When the plating was completed, platinum ions in the plating solution used on the outer surface were almost completely consumed (consumption rate 98%).

比較例1
図1に示すめっき装置から傾斜アダプターを取除き、合成樹脂管52に実施例1と同じ被めっき物を直接取付けた。従って、回転軸の軸心と被めっき物の軸心とは一致していた。これ以外は、実施例1と同様の条件で、操作した。めっき終了後、得られた被膜を観察した。結果は一見して良好な外観の皮膜が得られた。めっき液中の白金イオンはほぼ完全(消費率98%)に消費されていたが、均一な厚さのめっき膜を得る事ができなかった。
Comparative Example 1
The inclination adapter was removed from the plating apparatus shown in FIG. 1, and the same object to be plated as in Example 1 was directly attached to the synthetic resin tube 52. Therefore, the axis of the rotating shaft coincided with the axis of the workpiece. Except for this, the operation was performed under the same conditions as in Example 1. After the completion of plating, the obtained film was observed. As a result, a film having a good appearance at first glance was obtained. The platinum ions in the plating solution were almost completely consumed (consumption rate 98%), but a plating film having a uniform thickness could not be obtained.

比較例2
図1に示すめっき装置の回転軸の回転を停止させて、静止状態でめっきを実施した。これ以外は、実施例1と同様の条件で操作した。めっき終了後、得られた被膜を観察した。
Comparative Example 2
The rotation of the rotating shaft of the plating apparatus shown in FIG. 1 was stopped, and plating was performed in a stationary state. Except this, the operation was performed under the same conditions as in Example 1. After the completion of plating, the obtained film was observed.

めっき液中の白金イオンは20%残存しており、めっき皮膜の外観は黒っぽいムラが発生し、均一な厚さのめっき膜を得る事ができなかった。   The platinum ions in the plating solution remained at 20%, and the plating film had blackish uneven appearance, and a plating film having a uniform thickness could not be obtained.

比較例3
図1に示すめっき装置の傾斜アダプターの傾斜を45度にした。被めっき物の他端の円運動の半径が大きくなるので、円筒状めっき槽の直径を7cmの大きなものにした。
Comparative Example 3
The inclination of the inclination adapter of the plating apparatus shown in FIG. Since the radius of the circular motion at the other end of the object to be plated is increased, the diameter of the cylindrical plating tank was increased to 7 cm.

このため、めっき液は実施例1の50倍量(原液を500倍に希釈したもの)を使用した。実施例1と同様に操作してめっきを行った。   For this reason, the plating solution used was 50 times that of Example 1 (the stock solution was diluted 500 times). Plating was carried out in the same manner as in Example 1.

めっき終了後得られた被膜を観察した。外観は良好であった。しかし、めっき液中の白金イオンは、30%が残存していた。比較例2の場合、めっき被膜は実施例1と同様に良好なものであった。しかし、めっき槽の直径を大きくして被めっき物を浸漬させるために液量を増やす必要があり、めっき液の希釈倍率が大きくなり白金イオンの消費率が低下し不経済であった。   The film obtained after the completion of plating was observed. Appearance was good. However, 30% of the platinum ions in the plating solution remained. In the case of Comparative Example 2, the plating film was as good as Example 1. However, in order to increase the diameter of the plating tank and immerse the object to be plated, it is necessary to increase the amount of the solution, which increases the dilution rate of the plating solution and lowers the consumption rate of platinum ions, which is uneconomical.

比較例4
めっき装置の回転軸の回転を停止させて、比較例2と同様に操作して、めっきを行った。但し、白金イオンがほぼ完全に消費されるまで、めっき時間を延長した。白金イオンの消費率は93%であり、めっき終了までに5時間を必要とし、生産性が悪かった。
Comparative Example 4
Plating was carried out by stopping the rotation of the rotating shaft of the plating apparatus and operating in the same manner as in Comparative Example 2. However, the plating time was extended until platinum ions were almost completely consumed. The consumption rate of platinum ions was 93%, requiring 5 hours to complete the plating, and the productivity was poor.

100 無電解めっき装置
2 基台
4 スターラー
6 加熱槽
8 熱媒体
10 ヒーター
12 制御装置
14 ラック
16 係止部有
18 底板
20 中板
22 上板
24 中板めっき槽挿入孔
26 上板めっき槽挿入孔
28 めっき槽
30 支持枠
32 撹拌部固定腕
34 貫通孔
33 バイブレータ
36 撹拌部
38 撹拌部基板
40 撹拌部取付け手段
42 ギヤ部
44 ギヤ
46 回転軸
48 一端側
50 傾斜アダプター
52 合成樹脂管
54 被めっき物
56 一端
58 連結ギヤ
60、62 変速ギヤ
64 駆動モータ
66 駆動ギヤ
70 他端
80 偏心アダプター
82 上部
84 被めっき物
86 下部
100 Electroless Plating Equipment 2 Base 4 Stirrer 6 Heating Tank 8 Heating Medium 10 Heater
12 Control device 14 Rack 16 Locking portion 18 Bottom plate 20 Middle plate 22 Upper plate 24 Middle plate plating tank insertion hole 26 Upper plate plating tank insertion hole 28 Plating tank 30 Support frame 32 Stirring portion fixing arm 34 Through hole 33 Vibrator 36 Stirring Part 38 Stirring part substrate 40 Stirring part mounting means 42 Gear part 44 Gear 46 Rotating shaft 48 One end side 50 Inclined adapter 52 Synthetic resin tube 54 To-be-plated object 56 One end 58 Connection gear 60, 62 Transmission gear 64 Driving motor 66 Driving gear 70 Others End 80 Eccentric adapter 82 Upper part 84 Plated object 86 Lower part

Claims (14)

支持枠と、
前記支持枠に固定される加熱槽と、
加熱槽内に配設され、所定数のめっき槽挿入孔を有するラックと、
めっき槽を跨いでめっき槽上方に配設される撹拌部固定腕と、
前記撹拌部固定腕に撹拌部を着脱自在に取付ける撹拌部取付け手段と、互いに噛合する所定数のギヤからなるギヤ部とを有し、前記各ギヤの回転軸には所定の角度で折曲する被めっき物装着用アダプターまたは前記回転軸と偏心する被めっき物装着用アダプターを連結すると共に前記各ギヤは前記各めっき槽挿入孔の上方に位置して撹拌部固定腕に取付けられる撹拌部と、
前記撹拌部の何れかのギヤと噛合する駆動ギヤを備えるモータと、
からなる無電解めっき装置。
A support frame;
A heating tank fixed to the support frame;
A rack disposed in the heating tank and having a predetermined number of plating tank insertion holes;
A stirring part fixing arm disposed above the plating tank across the plating tank;
A stirring unit mounting means for detachably mounting the stirring unit to the stirring unit fixing arm, and a gear unit including a predetermined number of gears meshing with each other, and the rotating shaft of each gear bends at a predetermined angle. A stirrer for connecting a to-be-plated object mounting adapter or a to-be-plated object mounting adapter that is eccentric with the rotating shaft, and each gear is located above each plating tank insertion hole and attached to a stirrer fixing arm,
A motor having a drive gear meshing with any gear of the stirring unit;
An electroless plating apparatus comprising:
ギヤの回転軸と被めっき物装着用アダプターとが、互いに内部で連通する筒体で形成されてなり、被めっき物装着用アダプターに他端を閉じた筒状の被めっき物の一端を取付けることにより、前記連通する筒体内を通して、めっき液が、被めっき物内に供給される請求項1に記載の無電解めっき装置。   The rotating shaft of the gear and the adapter for mounting the object to be plated are formed of a cylindrical body communicating with each other inside, and one end of the cylindrical object to be plated with the other end closed is attached to the adapter for mounting the object to be plated. The electroless plating apparatus according to claim 1, wherein the plating solution is supplied into the object to be plated through the communicating cylinder. 支持枠に連結されたバイブレータを備える、請求項1に記載の無電解めっき装置。 The electroless plating apparatus according to claim 1, further comprising a vibrator connected to the support frame. めっき槽が、有底筒状に形成されてなる、請求項1に記載の無電解めっき装置。 The electroless plating apparatus according to claim 1, wherein the plating tank is formed in a bottomed cylindrical shape. めっき槽に供給するめっき液が無電解白金めっき液である請求項1に記載の無電解めっき装置。 The electroless plating apparatus according to claim 1, wherein the plating solution supplied to the plating tank is an electroless platinum plating solution. 被めっき物が、他端を閉じた筒状に形成されてなる請求項1に記載の無電解めっき装置。 The electroless plating apparatus according to claim 1, wherein the object to be plated is formed in a cylindrical shape with the other end closed. 回転軸の軸方向に対して所定角度傾けて回転軸にその一端を取付けた棒状被めっき物を、無電解めっき液に浸漬した状態で回転軸を回転させることにより、被めっき物の他端を円運動させながらめっきを行う、無電解めっき方法。 The other end of the object to be plated is rotated by rotating the rotating shaft in a state where the rod-shaped object to be tilted at a predetermined angle with respect to the axial direction of the rotating shaft is immersed in the electroless plating solution. An electroless plating method in which plating is performed while circularly moving. 回転軸の軸心と棒状被めっき物の軸心とを偏心させて被めっき物を回転軸に取り付け、無電解めっき液に浸漬した状態で回転軸を回転させることにより、被めっき物の軸心を円運動させながらめっきを行う、無電解めっき方法。 The axis of the object to be plated is obtained by eccentrically aligning the axis of the rotating shaft and the axis of the rod-shaped object to be plated, attaching the object to the rotating shaft, and rotating the rotating shaft while immersed in the electroless plating solution. An electroless plating method in which plating is performed while circularly moving. 棒状被めっき物が、他端が閉塞した中空部を有し、前記
中空部に無電解めっき液を注入してめっきを行う請求項7又は8に記載の無電解めっき方法。
The electroless plating method according to claim 7 or 8, wherein the rod-shaped object to be plated has a hollow portion closed at the other end, and an electroless plating solution is injected into the hollow portion to perform plating.
無電解めっき液が、無電解白金めっき液である請求項7又は8に記載の無電解めっき方法。 The electroless plating method according to claim 7 or 8, wherein the electroless plating solution is an electroless platinum plating solution. 回転軸の回転数が、600〜3000回/分である請求項7又は8に記載の無電解めっき方法。 The electroless plating method according to claim 7 or 8, wherein the rotational speed of the rotary shaft is 600 to 3000 times / minute. 回転軸の軸方向に対して被めっき物の軸心を1〜40度傾ける請求項7に記載の無電解めっき方法。 The electroless plating method according to claim 7, wherein the axis of the object to be plated is inclined by 1 to 40 degrees with respect to the axial direction of the rotating shaft. 回転軸の軸心と棒状被めっき物の軸心とを0.5〜30mm偏心させる請求項8に記載の無電解めっき方法。 The electroless plating method according to claim 8, wherein the axis of the rotary shaft and the axis of the rod-shaped workpiece are eccentric by 0.5 to 30 mm. めっき液中の金属イオンを一回のめっきで使い切る請求項7又は8に記載の無電解めっき方法。 The electroless plating method according to claim 7 or 8, wherein metal ions in the plating solution are used up in one plating.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101777361B1 (en) * 2015-01-29 2017-09-13 한국에너지기술연구원 Electroless plating method of tubular or cylinder-type membrane and plating device therefor
JP6201029B1 (en) * 2016-12-26 2017-09-20 日本エレクトロプレイテイング・エンジニヤース株式会社 Electroless platinum plating solution and electroless platinum plating method
CN110724942A (en) * 2019-11-27 2020-01-24 衡阳市鑫晟新能源有限公司 Nickel plating process for aluminum tab of lithium battery

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101777361B1 (en) * 2015-01-29 2017-09-13 한국에너지기술연구원 Electroless plating method of tubular or cylinder-type membrane and plating device therefor
JP6201029B1 (en) * 2016-12-26 2017-09-20 日本エレクトロプレイテイング・エンジニヤース株式会社 Electroless platinum plating solution and electroless platinum plating method
JP2018104755A (en) * 2016-12-26 2018-07-05 日本エレクトロプレイテイング・エンジニヤース株式会社 Electroless platinum plating solution and electroless platinum plating method
CN110724942A (en) * 2019-11-27 2020-01-24 衡阳市鑫晟新能源有限公司 Nickel plating process for aluminum tab of lithium battery

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