JP2005029876A - Copper sulfate plating method - Google Patents

Copper sulfate plating method Download PDF

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JP2005029876A
JP2005029876A JP2003273641A JP2003273641A JP2005029876A JP 2005029876 A JP2005029876 A JP 2005029876A JP 2003273641 A JP2003273641 A JP 2003273641A JP 2003273641 A JP2003273641 A JP 2003273641A JP 2005029876 A JP2005029876 A JP 2005029876A
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plating
copper
tank
metal
copper sulfate
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Manabu Inoue
学 井上
Noriko Matsumoto
典子 松本
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Think Laboratory Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method where a plating tank in which copper sulfate plating is performed using an insoluble anode and a dissolver in which copper as plating metal is dissolved to produce copper ions are provided and the feed of the copper ions made short is performed from the dissolver to the plating tank, and, characteristically, the production of the copper ions is promoted to maintain the copper sulfate plating for a long time. <P>SOLUTION: A roll to be engraved is dipped into a plating liquid of a plating tank, is rotated, and is subjected to copper sulfate plating using an insoluble anode. Further, metal copper is dipped into the plating liquid of a dissolver and is subjected to air stirring. The metal copper is dissolved by the synergism of free sulfuric acid and dissolved oxygen in the plating liquid to produce copper ions. The feed of the copper ions made poor is performed from the dissolver to the plating tank by a liquid feeding means. Further, the surplus liquid in the plating tank is returned to the dissolver by a liquid returning means, and copper sulfate plating is performed. Particularly, in the dissolver, the copper metal to be dipped into the plating liquid is brought into contact with a metal nobler than copper, and the dissolution of the copper is promoted to maintain the copper sulfate plating for a long time. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、不溶性陽極を使用するメッキ槽と、メッキ金属である銅を溶かして銅イオンの生成を行う溶解槽を備えて、溶解槽からメッキ槽に不足する銅イオンの供給を行う方法であって、溶解槽における銅イオンの生成を大きくしてメッキ作業を持続できる硫酸銅メッキ方法に関する。   The present invention includes a plating tank that uses an insoluble anode and a dissolution tank that generates copper ions by melting copper, which is a plating metal, and supplies copper ions that are insufficient from the dissolution tank to the plating tank. In addition, the present invention relates to a copper sulfate plating method capable of maintaining the plating operation by increasing the production of copper ions in the dissolution tank.

従来のグラビア印刷用の被製版ロールの硫酸銅メッキ方法は、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットをメッキ装置本体フレームに載置して該カセット形ロールチャック回転搬送ユニットにより両端チャックされるグラビア印刷用の被製版ロールを陰極に接続してメッキ槽に貯留されるメッキ液に浸漬して回転し、メッキ液に浸漬するメッキ金属銅ボールを陽極にして被製版ロールとの間にメッキ電流を流す方法であった。
特開平11−061488公報(上記の硫酸銅メッキ方法) 特開2003−166100公報(不溶解性陽極を用いるメッキ方法)
The conventional copper sulfate plating method for a plate roll for gravure printing is carried out by placing a cassette type roll chuck rotating / conveying unit conveyed by a stacker crane on the main frame of the plating apparatus and chucking both ends by the cassette type roll chuck rotating / conveying unit. The plate-making roll for gravure printing connected to the cathode is immersed in a plating solution stored in a plating tank and rotated, and a plated metal copper ball immersed in the plating solution is used as an anode between the plate-making roll. This was a method of flowing a plating current.
Japanese Patent Laid-Open No. 11-061488 (copper sulfate plating method) JP 2003-166100 A (Plating method using insoluble anode)

上記従来のグラビア印刷用の被製版ロールの硫酸銅メッキ方法(特開平11−061488公報)によれば、メッキ金属銅ボールの表面に黒色のアノードスラッジが付着し液の攪拌とメッキ金属銅ボールの溶解によってアノードスラッジがメッキ金属銅ボールから離れてメッキ液中を浮遊し被製版ロールの表面に付着してブツやピットになっていた。又、メッキ金属銅ボールの溶解量が多過ぎてメッキ液中の銅イオン濃度が高すぎて適切な硫酸銅メッキができなくなるのを回避するために定期的にメッキ液を抜いて希釈して適切な銅イオン濃度のメッキ液とするメンテナンスが必要であった。   According to the conventional copper sulfate plating method for a plate roll for gravure printing (Japanese Patent Laid-Open No. 11-061488), black anode sludge adheres to the surface of the plated metal copper ball, and the stirring of the liquid and the plated metal copper ball are performed. As a result of dissolution, the anode sludge was separated from the plated metal copper ball, floated in the plating solution, and adhered to the surface of the plate-making roll, forming lumps and pits. Also, to avoid the plating metal copper balls from dissolving too much and the copper ion concentration in the plating solution being too high, it is not possible to perform appropriate copper sulfate plating. Maintenance with a copper ion concentration plating solution was necessary.

上記の問題点を解決するために、不溶解性陽極を用いて被メッキ体に銅メッキ処理を施す手法の採用を考えた。この手法は、不溶解性陽極として例えばチタンの表面に触媒をコーティングしたものを用い、メッキ槽と、銅の溶解槽とを用意し、溶解槽にて銅メッキ材料を溶解して、これをメッキ槽中の電解液に供給し、不溶性陽極と陰極をなす被メッキ体との間で通電してメッキ処理を行うものでアノードスラッジが発生しない。   In order to solve the above-mentioned problems, it was considered to adopt a technique of subjecting the object to be plated to copper plating using an insoluble anode. This method uses, for example, a titanium-coated catalyst as an insoluble anode, prepares a plating tank and a copper dissolution tank, dissolves the copper plating material in the dissolution tank, and plating this It is supplied to the electrolytic solution in the tank, and the plating treatment is performed by energizing between the insoluble anode and the object to be plated, which does not form anode sludge.

本願発明者らは、不溶性陽極を使用して硫酸銅メッキを行うメッキ槽と、メッキ金属である金属銅をメッキ液に浸して空気撹拌を行いメッキ液中の遊離の硫酸と溶存酸素との相乗作用によって金属銅を溶解し銅イオン(陽イオン)の生成を行う溶解槽と、溶解槽から前記メッキ槽に不足する銅イオンの供給を行う液供給手段と、前記メッキ槽の過剰液を前記溶解槽に返す液返送手段とを備えた硫酸銅メッキ装置を試作し、そして、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットをメッキ装置本体フレームに載置して該カセット形ロールチャック回転搬送ユニットにより両端チャックされるグラビア印刷用の被製版ロールをメッキ液に浸漬し不溶性陽極を使用して硫酸銅メッキを行うことを試験した。   The inventors of the present application are a synthesizing of a plating tank that performs copper sulfate plating using an insoluble anode, and metal sulfate, which is a plating metal, in a plating solution and agitated in air to dissolve free sulfuric acid and dissolved oxygen in the plating solution. A dissolution tank that dissolves metallic copper by action to generate copper ions (cations); a liquid supply means that supplies copper ions that are insufficient from the dissolution tank to the plating tank; and an excess liquid in the plating tank that is dissolved Prototype copper sulfate plating equipment with liquid return means to return to tank, and then place cassette type roll chuck rotating and conveying unit conveyed by stacker crane on plating apparatus main body frame to rotate and convey cassette type roll chuck A test plate roll for gravure printing, chucked at both ends by the unit, was immersed in a plating solution and tested to perform copper sulfate plating using an insoluble anode.

試験結果によれば、アノードスラッジが発生しないので被製版ロールに着いた硫酸銅メッキの表面にブツやピットの付着は見られなかったが、溶解槽におけるメッキ金属銅ボールの溶解量が少な過ぎてメッキ液中の銅イオン濃度が直ぐに過少になり硫酸銅メッキができなくなった。   According to the test results, no anode sludge was generated, so no adhesion of pits or pits was observed on the surface of the copper sulfate plating that was attached to the plate making roll, but the dissolution amount of the plated copper metal balls in the dissolution tank was too small. The copper ion concentration in the plating solution soon became too low to make copper sulfate plating.

従って、本願発明は、不溶性陽極を使用するメッキ槽と、メッキ金属である銅を溶かして銅イオン(陽イオン)の生成を行う溶解槽を備えて、溶解槽からメッキ槽に不足する銅イオンの供給を行う硫酸銅メッキ方法であって、溶解槽における銅イオンの生成を大きくして大きくしてメッキ作業を持続できることが解決課題である。   Accordingly, the present invention includes a plating tank that uses an insoluble anode and a dissolution tank that generates copper ions (cations) by melting copper, which is a plating metal. It is a copper sulfate plating method to supply, and it is a solution subject that the production | generation of copper ion in a dissolution tank can be enlarged and enlarged and a plating operation can be continued.

本願発明は、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットをメッキ装置本体フレームに載置して該カセット形ロールチャック回転搬送ユニットにより両端チャックされるグラビア印刷用の被製版ロールを陰極に接続してメッキ槽に貯留されるメッキ液に浸漬して回転し不溶性陽極を使用して硫酸銅メッキを行うとともに、溶解槽に貯留されるメッキ液にメッキ金属である金属銅を浸して空気撹拌を行いメッキ液中の遊離の硫酸と溶存酸素との相乗作用によって金属銅を溶解し銅イオン(陽イオン)の生成を行い、液供給手段により溶解槽からメッキ槽に不足する銅イオンの供給を行うとともに、液返送手段によりメッキ槽の過剰液を溶解槽に返すようにした硫酸銅メッキ方法であって、
溶解槽において、メッキ液に浸す金属銅を金、白金、パラジュウムなどの銅よりも貴な金属に接触させて銅の溶解を促進することを特徴とする硫酸銅メッキ方法によって解決課題を達成できる。
In the present invention, a cassette-type roll chuck rotating / conveying unit conveyed by a stacker crane is placed on a plating apparatus main body frame, and a plate-making roll for gravure printing that is chucked at both ends by the cassette-type roll chuck rotating / conveying unit is used as a cathode. Connected and immersed in the plating solution stored in the plating tank and rotated to perform copper sulfate plating using an insoluble anode, and immersed in the plating solution stored in the dissolution tank with metal copper, which is the plating metal, and stirred by air The metal copper is dissolved by the synergistic action of free sulfuric acid and dissolved oxygen in the plating solution to generate copper ions (cations), and the supply of copper ions from the dissolution tank to the plating tank is performed by the solution supply means. A copper sulfate plating method in which the excess liquid in the plating tank is returned to the dissolution tank by the liquid return means,
The solution can be achieved by a copper sulfate plating method characterized in that in a dissolution tank, metal copper immersed in a plating solution is brought into contact with a metal nobler than copper such as gold, platinum, palladium, etc. to promote dissolution of copper.

(1)メッキ槽においてアノードスラッジが発生しないので被製版ロールに着いた硫酸銅メッキの表面にブツやピットの形成がなくなり、綺麗な表面の硫酸銅メッキを形成できて、製版において電解砥粒研磨を適用すると研磨代が小さくてもブツやピットが無い極めて良好な鏡面研磨ができるからメッキの厚みを小さくすることができメッキ時間を短縮できかつ製版の失敗が少なくなる。
(2)溶解槽においてメッキ金属銅ボール金、白金、パラジュウムなどの銅よりも貴な金属に接触させる面積を制御することは容易なのでメッキ金属銅ボールの溶解量を適切に制御することが容易にできてメッキ液中の銅イオン濃度を常に適切な状態に管理できるから良好な硫酸銅メッキを持続できる。
(1) Since no anode sludge is generated in the plating tank, there is no formation of pits or pits on the surface of the copper sulfate plating attached to the plate making roll, and a beautiful surface of copper sulfate plating can be formed. Is applied, even if the polishing allowance is small, it is possible to perform very good mirror polishing without any defects or pits, so that the plating thickness can be reduced, the plating time can be shortened, and the plate making failure is reduced.
(2) In the dissolution tank, it is easy to control the area of contact with the noble metal than copper such as plated metal copper ball gold, platinum, palladium, etc. Since the copper ion concentration in the plating solution can always be managed in an appropriate state, good copper sulfate plating can be maintained.

被製版ロールのグラビア製版工程は、例えば、ロール搬入−脱脂−水洗−酸洗い−水洗−バラード処理−水洗−バラード銅メッキ−水洗−砥石研磨−水洗−感光剤コート−レーザー露光装置による画像焼付−現像−水洗−食刻−水洗−レジスト剥離−水洗−クロムメッキ−水洗−研磨−水洗−搬出の工程となっている。
製版ラインの一部を構成する銅メッキラインは、好ましくは、スタッカクレーンを設備し、クレーン走行ゾーンに、脱脂装置と銅メッキ装置と現像装置と腐食装置とレジスト剥離装置とクロムメッキ装置等を備え、一対のチャックコーン及び各チャックコーンの外側を密封する防水キャップを有するカセット形ロールチャック回転搬送ユニットにより、水平に位置される被製版ロールの両端のチャック孔をチャックし、該カセット形ロールチャック回転搬送ユニットをスタッカクレーンにより吊り上げて装置から装置へと搬送し、脱脂装置と銅メッキ装置と現像装置と腐食装置とレジスト剥離装置とクロムメッキ装置では、カセット形ロールチャック回転搬送ユニットを載置して該カセット形ロールチャック回転搬送ユニットにチャックされた被製版ロールを処理できる構成である。
そこで、本願発明の硫酸銅メッキ方法も、カセット形ロールチャック回転搬送ユニットが適応できる構成であることが好ましい。
具体的には、硫酸銅メッキ装置が、不溶性陽極を使用して硫酸銅メッキを行うメッキ槽と、メッキ金属である金属銅をメッキ液に浸して空気撹拌を行いメッキ液中の遊離の硫酸と溶存酸素との相乗作用によって金属銅を溶解し銅イオン(陽イオン)の生成を行う溶解槽と、溶解槽から前記メッキ槽に不足する銅イオンの供給を行う液供給手段と、前記メッキ槽の過剰液を前記溶解槽に返す液返送手段とを備えて構成されていて、特に、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットをメッキ装置本体フレームに載置して該カセット形ロールチャック回転搬送ユニットにより両端チャックされるグラビア印刷用の被製版ロールをメッキ槽に貯留されるメッキ液に浸漬し不溶性陽極を使用して硫酸銅メッキを行うように構成されていることが好ましい。
本願発明の硫酸銅メッキ方法は、そのような構成の上で、溶解槽において、メッキ液に浸す金属銅を金、白金、パラジュウムなどの銅よりも貴な金属に接触させかつ空気撹拌をおこなうことによって銅の溶解を促進するように構成されていることが好ましい。
The gravure plate making process of the plate making roll includes, for example, roll loading, degreasing, water washing, pickling, water washing, ballad treatment, water washing, ballad copper plating, water washing, grinding stone polishing, water washing, photosensitive agent coating, and image printing using a laser exposure apparatus Development, water washing, etching, water washing, resist peeling, water washing, chrome plating, water washing, polishing, water washing, and carry-out processes.
The copper plating line constituting a part of the plate making line is preferably equipped with a stacker crane, and is provided with a degreasing device, a copper plating device, a developing device, a corrosion device, a resist stripping device, a chromium plating device, etc. in the crane traveling zone. The cassette-type roll chuck rotating conveyance unit having a pair of chuck cones and a waterproof cap for sealing the outside of each chuck cone chucks the chuck holes at both ends of the plate-making roll positioned horizontally, and rotates the cassette-type roll chuck. The transport unit is lifted by a stacker crane and transported from device to device. In the degreasing device, copper plating device, developing device, corrosion device, resist stripping device, and chrome plating device, a cassette type roll chuck rotary transport unit is placed. The cassette type roll chuck is chucked by the rotary conveyance unit. It is a configuration that can handle a plate-making roll.
Therefore, it is preferable that the copper sulfate plating method of the present invention has a configuration in which the cassette-type roll chuck rotating and conveying unit can be adapted.
Specifically, the copper sulfate plating apparatus is a plating tank that performs copper sulfate plating using an insoluble anode, and the free sulfuric acid in the plating solution is obtained by immersing metal copper, which is a plating metal, in the plating solution and stirring the air. A dissolution tank that dissolves metallic copper by a synergistic action with dissolved oxygen and generates copper ions (cations); a liquid supply means that supplies copper ions that are insufficient from the dissolution tank to the plating tank; and A liquid return means for returning excess liquid to the dissolution tank, and in particular, a cassette-type roll chuck rotary transport unit transported by a stacker crane is placed on the plating apparatus main body frame, and the cassette-type roll chuck A gravure printing plate roll chucked at both ends by a rotary transport unit is immersed in a plating solution stored in a plating tank, and copper sulfate plating is performed using an insoluble anode. It is preferably made of sea urchin.
In the copper sulfate plating method of the present invention, the metal copper immersed in the plating solution is brought into contact with a noble metal such as gold, platinum, palladium and the like in the dissolution tank, and the air is stirred in such a configuration. It is preferable that it is comprised so that melt | dissolution of copper may be accelerated | stimulated.

図1は、特公昭57-36995号公報に示すカセット形ロール自動脱着装置と実質的に同一のカセット形ロールチャック回転搬送ユニットを適用できるメッキ装置を示すもので、メッキ装置本体Xの上にカセット形ロールチャック回転搬送ユニットUを載置してメッキを行う。
詳述すると、メッキ装置本体Xの上にカセット形ロールチャック回転搬送ユニットUを載置すると、メッキ装置本体Xに備えたモータ1により走行駆動されるチェーン巻掛け装置のチェーン2に、カセット形ロールチャック回転搬送ユニットUの駆動側のスピンドル3に被嵌固定したスプロケット4が係合する。
カセット形ロールチャック回転搬送ユニットUは、吊り上げフレーム5の両端より設けられ互いに対向する一対のスピンドル3、6の先端に付設した一対の通電可能なロールチャック7、8により、被製版ロールRの両端の円錐孔を支持するとともに、各スピンドル3、6に被嵌された一対の防液キャップ9、10を移動して被製版ロールRの端面に当接して通電を行なうロールチャック7,8への処理液の進入を防止する構成である。
モータ1の駆動により被製版ロールRを回転して被製版ロールRと不溶性陽極11との間にメッキ電流を流してメッキを行う。
FIG. 1 shows a plating apparatus to which a cassette-type roll chuck rotating and conveying unit substantially the same as the cassette-type roll automatic detaching apparatus shown in Japanese Patent Publication No. 57-36995 can be applied. Plating is carried out by placing the roll-roll chuck rotary conveyance unit U.
More specifically, when the cassette-type roll chuck rotary conveyance unit U is placed on the plating apparatus main body X, the cassette-type roll is placed on the chain 2 of the chain winding apparatus driven by the motor 1 provided in the plating apparatus main body X. The sprocket 4 fitted and fixed to the spindle 3 on the driving side of the chuck rotation conveyance unit U is engaged.
The cassette-type roll chuck rotating and conveying unit U is provided at both ends of the plate-making roll R by a pair of energizable roll chucks 7 and 8 provided at both ends of the pair of spindles 3 and 6 that are provided from both ends of the lifting frame 5 and face each other. And a pair of liquid-proof caps 9 and 10 fitted to the spindles 3 and 6 are moved to abut against the end face of the plate-making roll R to energize the roll chucks 7 and 8 which are energized. It is the structure which prevents the approach of a process liquid.
The plate-making roll R is rotated by driving the motor 1 and plating is performed by passing a plating current between the plate-making roll R and the insoluble anode 11.

この硫酸銅メッキ方法は、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットUをメッキ装置本体XのフレームFに載置して該カセット形ロールチャック回転搬送ユニットUにより両端チャックされるグラビア印刷用の被製版ロールRをメッキ槽12に貯留されるメッキ液13に浸漬し不溶性陽極11を使用して硫酸銅メッキを行うとともに、メッキ液貯留槽を兼ねる溶解槽14に貯留されるメッキ液13にメッキ金属である金属銅を浸して空気撹拌を行いメッキ液中の遊離の硫酸と溶存酸素との相乗作用によってメッキ金属銅ボール15を溶解し銅イオン(陽イオン)の生成を行い、チャッキ弁式揚液口と揚液ポンプと配管と流量調整弁とフィルター等からなる液供給手段16により溶解槽14からメッキ槽12内に不足する銅イオンの供給を行うとともに、液返送手段6によりメッキ槽12の過剰液を溶解槽14にオーバーフロー方式で返すように構成されている。   This copper sulfate plating method is a gravure printing in which a cassette type roll chuck rotary transport unit U transported by a stacker crane is placed on a frame F of a plating apparatus body X and chucked at both ends by the cassette type roll chuck rotary transport unit U. The plate making roll R for use is immersed in a plating solution 13 stored in a plating tank 12 to perform copper sulfate plating using the insoluble anode 11, and the plating solution 13 stored in a dissolution tank 14 also serving as a plating solution storage tank. Metal copper, which is the plating metal, is soaked in the air and stirred in the air to dissolve the plated metal copper ball 15 by the synergistic action of free sulfuric acid and dissolved oxygen in the plating solution to generate copper ions (cations), and check valve A plating tank 1 from a dissolution tank 14 by a liquid supply means 16 comprising a liquid pumping port, a pump, a pipe, a flow control valve, a filter and the like. Together to supply the copper ions to be insufficient within, and is configured to return overflow scheme dissolving tank 14 the excess solution in the plating tank 12 by the liquid returning means 6.

カセット形ロールチャック回転搬送ユニットUがメッキ装置本体XのフレームFに載置されてから、液供給手段16により溶解槽14に貯留されている銅イオンを適度な濃度に含むメッキ液がメッキ槽12に給送され、もってメッキ槽12に貯留されるメッキ液によりカセット形ロールチャック回転搬送ユニットUにより両端チャックされるグラビア印刷用の被製版ロールRが浸漬するようになっている。
メッキ液の液面レベルが一定の高さになったとき以降のメッキ液の給送は、メッキ槽12の両端には設けられた溢流枡12aに流れ液返送手段(管路)17を通って重力作用で溶解槽14に返送される。なお、メッキを終了するときは、メッキ槽12と溶解槽14とを繋いでいる落液管18に設けた弁19を開いてメッキ槽12内のメッキ液を溶解槽14内に回収できるようになっている。
After the cassette-type roll chuck rotating / conveying unit U is placed on the frame F of the plating apparatus main body X, a plating solution containing copper ions stored in the dissolution tank 14 by the liquid supply means 16 at an appropriate concentration is supplied to the plating tank 12. The plate-making roll R for gravure printing, which is chucked at both ends by the cassette-type roll chuck rotary conveyance unit U, is immersed in the plating solution stored in the plating tank 12.
After the level of the plating solution reaches a certain level, the plating solution is fed to the overflow troughs 12a provided at both ends of the plating tank 12 through the liquid return means (pipe) 17. And returned to the dissolution tank 14 by gravity. When finishing the plating, the valve 19 provided in the liquid drop pipe 18 connecting the plating tank 12 and the dissolution tank 14 is opened so that the plating solution in the plating tank 12 can be collected in the dissolution tank 14. It has become.

不溶性陽極11は、チタンの板に酸化イリジウムをコーティングしてなるものが好ましく、溶解槽1内でメッキ液に浸漬しかつメッキを付けようとする被製版ロールRの両側に位置しロール面長方向に適宜ピッチで所要数配設される。好ましくは、不溶性陽極11は、被製版ロールRの長さに対応する部分についてのみ電流を流せるように構成する。   The insoluble anode 11 is preferably a titanium plate coated with iridium oxide. The insoluble anode 11 is located on both sides of the plate-making roll R to be dipped in the plating solution and to be plated in the dissolution tank 1 and in the roll surface length direction. The required number is arranged at an appropriate pitch. Preferably, the insoluble anode 11 is configured to allow current to flow only in a portion corresponding to the length of the plate-making roll R.

溶解槽14内の底部に、樹脂管20が多数本連通状態に敷かれ、該樹脂管20の上に、金、白金、パラジュウムなどの銅よりも貴な金属からなる網状体21が敷かれていて、さらに網状体21の上にメッキ金属銅ボール15が積層され、樹脂管20には槽外の図示しないエアコンプレッサと接続されていて、エアコンプレッサで作られる圧縮空気が樹脂管20に設けた多数の小孔からメッキ液中に流出してメッキ液を攪拌するように構成されている。網状体21は、例えば、柱状部21aを多数立設していてメッキ金属銅ボール15との接触面積の拡大が十分に図られているものとする。
従って、メッキ液中の遊離の硫酸と圧縮空気によって補給される溶存酸素との相乗作用によって金属銅が溶解し銅イオン(陽イオン)の生成が行われる。この場合、銅よりも貴な金属とメッキ金属銅ボールとの接触が大きな面積をもって確保されているので、銅よりも貴な金属と接触した銅がプラスにチャージされアノーデイックに溶解することによって銅の溶解が促進される。
溶解槽においてメッキ金属銅ボールを金、白金、パラジュウムなどの銅よりも貴な金属に接触させる面積を制御することは容易なのでメッキ金属銅ボールの溶解量を適切に制御することが容易にできてメッキ液中の銅イオン濃度を常に適切な状態に管理できるから良好な硫酸銅メッキを持続できる。
メッキ槽においてアノードスラッジが発生しないので被製版ロールに着いた硫酸銅メッキの表面にブツやピットの形成がなくなり、綺麗な表面の硫酸銅メッキを形成できて、製版において電解砥粒研磨を適用すると研磨代が小さくてもブツやピットが無い極めて良好な鏡面研磨ができるからメッキの厚みを小さくすることができメッキ時間を短縮できかつ製版の失敗が少なくなる。
〔実験例〕
溶解槽14内の底部に、白金製の網状体21を敷いてメッキを行ったところ、銅の溶解速度が0.84g/L/hであり、不溶性陽極を用いる硫酸銅メッキが長時間継続して行えた。
〔比較例〕
溶解槽14内の底部から、白金製の網状体21を取り除いてメッキを行ったところ、銅の溶解速度が0.43g/L/hであり、不溶性陽極を用いる硫酸銅メッキが僅かな時間経過した時点で行えなくなった。
A large number of resin pipes 20 are laid in a continuous state at the bottom of the dissolution tank 14, and a net-like body 21 made of a metal nobler than copper such as gold, platinum, palladium and the like is laid on the resin pipe 20. Further, the plated metal copper balls 15 are laminated on the mesh body 21, and the resin pipe 20 is connected to an air compressor (not shown) outside the tank, and the resin pipe 20 is provided with compressed air produced by the air compressor. The plating solution is configured to flow out from a large number of small holes into the plating solution and stir the plating solution. For example, it is assumed that the net-like body 21 has a large number of columnar portions 21 a and the contact area with the plated metal copper ball 15 is sufficiently expanded.
Accordingly, the copper metal is dissolved by the synergistic action of the free sulfuric acid in the plating solution and the dissolved oxygen replenished by the compressed air to generate copper ions (cations). In this case, the contact between the noble metal and the plated metal copper ball is ensured with a large area, so that the copper in contact with the noble metal than copper is charged positively and dissolved in the anodic copper. Dissolution is promoted.
Since it is easy to control the area in which the plated metal copper ball is brought into contact with a noble metal such as gold, platinum, palladium, etc. in the melting tank, the amount of dissolution of the plated metal copper ball can be controlled appropriately. Since the copper ion concentration in the plating solution can always be managed in an appropriate state, good copper sulfate plating can be maintained.
Since anode sludge does not occur in the plating tank, there is no formation of pits and pits on the surface of the copper sulfate plating attached to the plate making roll, and a clean surface copper sulfate plating can be formed, and electrolytic abrasive polishing is applied in plate making Even if the polishing allowance is small, it is possible to perform extremely good mirror polishing without any defects or pits, so that the plating thickness can be reduced, the plating time can be shortened, and the plate making failure is reduced.
[Experimental example]
When plating was performed by placing a platinum net 21 on the bottom of the dissolution tank 14, the copper dissolution rate was 0.84 g / L / h, and copper sulfate plating using an insoluble anode continued for a long time. I did it.
[Comparative Example]
When plating was performed by removing the platinum net 21 from the bottom of the dissolution tank 14, the dissolution rate of copper was 0.43 g / L / h, and the copper sulfate plating using the insoluble anode was slightly passed. I can no longer do it.

本願発明は、スタッカクレーンにより搬送されるカセット形ロールチャック回転搬送ユニットを適用しないメッキ方法も含まれる。メッキ装置が被製版ロールをチャックして回転するチャック手段を備えていて、産業用ロボットにより搬送されてくる被製版ロールを授受する場合にも適用される。また、グラビア印刷用の被製版ロールは、軸付きタイプも含まれる。また、樹脂管20の上に銅よりも貴な金属からなる網状体21が敷かれていることに限定されない。樹脂管20が網状体21の上側に設けられていても良い。メッキ槽12の下に溶解槽14を設置することには限定されない。メッキ金属銅ボール12を溶解槽14に収容する手段は適宜に設けることができる。   The present invention also includes a plating method that does not use a cassette-type roll chuck rotary transport unit transported by a stacker crane. The present invention is also applicable to the case where the plating apparatus has chuck means for rotating the plate-making roll by chucking it and transfers the plate-making roll conveyed by an industrial robot. In addition, the plate making roll for gravure printing includes a type with a shaft. Further, the present invention is not limited to the net body 21 made of a metal nobler than copper on the resin tube 20. The resin tube 20 may be provided on the upper side of the mesh body 21. It is not limited to installing the dissolution tank 14 under the plating tank 12. Means for accommodating the plated metal copper balls 12 in the dissolution tank 14 can be appropriately provided.

本願発明にかかる硫酸銅メッキ方法を実施するための硫酸銅メッキ装置の概略の縦断正面図を示す。1 is a schematic longitudinal front view of a copper sulfate plating apparatus for carrying out a copper sulfate plating method according to the present invention.

符号の説明Explanation of symbols

U・・・カセット形ロールチャック回転搬送ユニット、X・・・メッキ装置本体、F・・・メッキ装置本体のフレーム、R・・・グラビア印刷用の被製版ロール、1・・・モータ、2・・・チェーン、3・・・駆動側のスピンドル、4・・・スプロケット、5・・・吊り上げフレーム、6・・・反駆動側のスピンドル、7,8・・・ロールチャック、9,10・・・防液キャップ、11・・・不溶性陽極、12・・・メッキ槽、12a・・・溢流枡、13・・・メッキ液、14・・・溶解槽、15・・・メッキ金属銅ボール、16・・・液供給手段、17・・・液返送手段、18・・・落液管、19・・・弁、20・・・樹脂管、21・・・銅より貴な金属からなる網状体、21a・・・柱状部、 U: cassette type roll chuck rotary conveyance unit, X: plating apparatus main body, F: frame of the plating apparatus main body, R: plate-making roll for gravure printing, 1 ... motor, 2. ..Chains, 3... Drive side spindle, 4... Sprocket, 5... Lifting frame, 6. Liquid-proof cap, 11 ... insoluble anode, 12 ... plating tank, 12a ... overflow, 13 ... plating liquid, 14 ... dissolution tank, 15 ... plated metal copper ball, DESCRIPTION OF SYMBOLS 16 ... Liquid supply means, 17 ... Liquid return means, 18 ... Falling-off pipe, 19 ... Valve, 20 ... Resin pipe, 21 ... The net-like body which consists of a metal more precious than copper 21a ... Columnar part,

Claims (1)

グラビア印刷用の被製版ロールを陰極に接続してメッキ槽に貯留されるメッキ液に浸漬して回転し不溶性陽極を使用して硫酸銅メッキを行うとともに、溶解槽に貯留されるメッキ液にメッキ金属である金属銅を浸して空気撹拌を行いメッキ液中の遊離の硫酸と溶存酸素との相乗作用によって金属銅を溶解し銅イオンの生成を行い、液供給手段により溶解槽からメッキ槽に不足する銅イオンの供給を行うとともに、液返送手段によりメッキ槽の過剰液を溶解槽に返すようにした硫酸銅メッキ方法であって、
溶解槽において、メッキ液に浸す金属銅を金、白金、パラジュウムなどの銅よりも貴な金属に接触させて銅の溶解を促進することを特徴とする硫酸銅メッキ方法。
A plate roll for gravure printing is connected to the cathode, immersed in a plating solution stored in the plating tank and rotated to perform copper sulfate plating using an insoluble anode, and plated to the plating solution stored in the dissolution tank The metal copper, which is a metal, is soaked in air, and the copper is dissolved by the synergistic action of free sulfuric acid and dissolved oxygen in the plating solution to generate copper ions. A copper sulfate plating method in which the copper ion is supplied and the excess liquid in the plating tank is returned to the dissolution tank by the liquid return means,
A copper sulfate plating method characterized in that, in a dissolution tank, metal copper immersed in a plating solution is brought into contact with a noble metal such as gold, platinum, palladium and the like to promote dissolution of copper.
JP2003273641A 2003-07-11 2003-07-11 Copper sulfate plating method Pending JP2005029876A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
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WO2006126518A1 (en) * 2005-05-25 2006-11-30 Think Laboratory Co., Ltd. Gravure cylinder-use copper plating method and device
JP2007224321A (en) * 2006-02-21 2007-09-06 Think Laboratory Co Ltd Plating method and apparatus for cylinder
WO2012043513A1 (en) 2010-10-01 2012-04-05 株式会社シンク・ラボラトリー Apparatus for plating cylinder
WO2013084929A1 (en) 2011-12-07 2013-06-13 株式会社シンク・ラボラトリー Processing unit having condenser, and fully automatic gravure platemaking processing system using same
KR20130100063A (en) 2010-09-30 2013-09-09 가부시키가이샤 씽크. 라보라토리 Cylinder plating method and device
CN105543908A (en) * 2016-02-29 2016-05-04 广州鸿葳科技股份有限公司 Solution and method for cyanide-free alkaline bright barrel copper plating

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006126518A1 (en) * 2005-05-25 2006-11-30 Think Laboratory Co., Ltd. Gravure cylinder-use copper plating method and device
JPWO2006126518A1 (en) * 2005-05-25 2008-12-25 株式会社シンク・ラボラトリー Copper plating method and apparatus for gravure cylinder
JP2007224321A (en) * 2006-02-21 2007-09-06 Think Laboratory Co Ltd Plating method and apparatus for cylinder
KR20130100063A (en) 2010-09-30 2013-09-09 가부시키가이샤 씽크. 라보라토리 Cylinder plating method and device
US9133561B2 (en) 2010-09-30 2015-09-15 Think Laboratory Co., Ltd. Cylinder plating method and device
WO2012043513A1 (en) 2010-10-01 2012-04-05 株式会社シンク・ラボラトリー Apparatus for plating cylinder
WO2013084929A1 (en) 2011-12-07 2013-06-13 株式会社シンク・ラボラトリー Processing unit having condenser, and fully automatic gravure platemaking processing system using same
CN105543908A (en) * 2016-02-29 2016-05-04 广州鸿葳科技股份有限公司 Solution and method for cyanide-free alkaline bright barrel copper plating
CN105543908B (en) * 2016-02-29 2018-04-13 广州鸿葳科技股份有限公司 A kind of non-cyanide alkali is bright to roll copper-plated solution and method

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