JP2014201012A - Laminate film composed of substrate film with fine structure formed on surface thereof and resin for transfer - Google Patents

Laminate film composed of substrate film with fine structure formed on surface thereof and resin for transfer Download PDF

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JP2014201012A
JP2014201012A JP2013079716A JP2013079716A JP2014201012A JP 2014201012 A JP2014201012 A JP 2014201012A JP 2013079716 A JP2013079716 A JP 2013079716A JP 2013079716 A JP2013079716 A JP 2013079716A JP 2014201012 A JP2014201012 A JP 2014201012A
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resin
base film
film
ultraviolet curable
fine structure
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JP6125299B2 (en
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朋宏 高橋
Tomohiro Takahashi
朋宏 高橋
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Kuraray Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a laminate film which follows a three dimensional solid surface by plastic deformation and forms a fine structure.SOLUTION: A laminate film comprises: a fine structure 4 whose level difference between the bottom part and the upper part adjacent to each other is 5 μm or less formed on a substrate film 1; and a layer 5 composed of a thermoplastic resin formed on the fine structure 4, in which breaking elongation of the substrate at a predetermined temperature is 100% or more.

Description

本発明は微細構造を形成した基材フィルムと前記微細構造上に塗布した熱可塑性樹脂または熱硬化性樹脂の転写用樹脂からなる積層フィルムであって、更に詳しくは、被成形体の微細構造形成面が曲面形状であることを想定した積層フィルムに関するものである。   The present invention is a laminated film comprising a substrate film having a microstructure and a thermoplastic resin or a thermosetting resin transfer resin coated on the microstructure, and more specifically, forming a microstructure of a molded body The present invention relates to a laminated film assuming that the surface has a curved shape.

光の波長より小さい周期を有する微細な凹凸からなる微細構造は反射防止機能を発現するため、そのような微細構造をレンズの曲面に形成することが提案されている(特許文献1)。レンズ表面などの3次元的な曲面上に微細構造を形成した成形体の製造方法としては、あらかじめ微細構造を形成した金属、酸化物、樹脂からなる可撓性膜を被成形体の曲面に沿って接合する製造方法が知られている(特許文献2)。この方法では厚さ10〜100μmの可撓性膜を製品表面に接合するため、凹凸構造について10μm以下の寸法精度を必要とする製品には、寸法誤差が生じてしまうため適用し難いという問題がある。また、可撓性膜の厚さを10μm以下にした場合は可撓性膜のハンドリング性が極めて悪くなるため実用することは現実的ではない。   Since a fine structure composed of fine irregularities having a period smaller than the wavelength of light exhibits an antireflection function, it has been proposed to form such a fine structure on the curved surface of a lens (Patent Document 1). As a method of manufacturing a molded body in which a microstructure is formed on a three-dimensional curved surface such as a lens surface, a flexible film made of a metal, oxide, or resin having a microstructure formed in advance along the curved surface of the molded body. A manufacturing method for joining is known (Patent Document 2). In this method, since a flexible film having a thickness of 10 to 100 μm is bonded to the product surface, a dimensional error occurs in a product that requires a dimensional accuracy of 10 μm or less for the concavo-convex structure, which is difficult to apply. is there. Moreover, when the thickness of the flexible film is 10 μm or less, the handling property of the flexible film is extremely deteriorated, so that it is not practical to use it.

一方、基板上に微細構造を形成する方法としてナノインプリントがある。ナノインプリントは基板や成形体上に形成された微細構造をモールドとして使用し、モールドを熱や紫外線によって硬化する転写用樹脂を介して基板に貼り付けた状態で転写用樹脂を硬化させ、モールドを剥離することで基板上に微細構造の反転構造を形成する方法である。ナノインプリントを利用して曲面上に微細構造を形成する場合は、PET(ポリエチレンテレフタレート)などのフレキシブルなフィルムモールドを使用することが提案されている(非特許文献1)。しかしこの製造方法は、フィルムが弾性変形して被成形体の曲面に追従する必要があるため、被成形体の曲率によって、フィルムが追従できずに微細構造が形成できない問題がある。   On the other hand, there is nanoimprint as a method for forming a fine structure on a substrate. Nanoimprint uses a fine structure formed on a substrate or molded body as a mold, and the mold is peeled off by curing the transfer resin with the mold attached to the substrate via a transfer resin that is cured by heat or ultraviolet rays. This is a method of forming a fine structure inversion structure on the substrate. When forming a fine structure on a curved surface using nanoimprint, it has been proposed to use a flexible film mold such as PET (polyethylene terephthalate) (Non-Patent Document 1). However, this manufacturing method requires the film to be elastically deformed and follow the curved surface of the molded body. Therefore, there is a problem that the film cannot follow and the microstructure cannot be formed due to the curvature of the molded body.

特開2006−171219 公報JP 2006-171219 A 特開2004−361635 公報JP 2004-361635 A

Lithographic Mold: A Convenient Route to Structures with Sub-Micrometer Dimensions, James L. Wilbur, Enoch Kim, Younan Xia, and George M. WhitesidesLithographic Mold: A Convenient Route to Structures with Sub-Micrometer Dimensions, James L. Wilbur, Enoch Kim, Younan Xia, and George M. Whitesides

本発明は上記課題を解決するため、塑性変形して3次元立体面に追従し、微細構造を形成する積層フィルムを提供することを目的とする。   In order to solve the above problems, an object of the present invention is to provide a laminated film that plastically deforms to follow a three-dimensional solid surface and forms a fine structure.

上記の課題を解決する本発明は、隣接する底部と上部の高低差が5μm以下の微細構造が基材フィルム上に形成されており、前記微細構造上に熱可塑性樹脂よりなる層が形成された積層フィルムであって、前記熱可塑性樹脂のガラス転移温度をT1℃、基材の貯蔵弾性率が300Maとなる温度をT2℃、基材の貯蔵弾性率が0.1MPaとなる温度をT3℃としたときに、T1+20℃がT2℃以下の場合はT2℃において、或いは、T1+20℃がT2℃以上T3℃以下の場合はT1+20℃において、基材の破断伸びが100%以上であることを特徴とする積層フィルムである。
ここで、本発明における「微細構造」とは、互いに隣接するトップとボトムの高さの差が0.05μm〜5μm以下であり、互いに隣接するトップ間の距離が0.05μm〜10μmの凹凸構造である。
In the present invention for solving the above-mentioned problems, a fine structure having an elevation difference of 5 μm or less between the adjacent bottom and top is formed on a base film, and a layer made of a thermoplastic resin is formed on the fine structure. A laminated film, wherein the glass transition temperature of the thermoplastic resin is T1 ° C., a temperature at which the storage elastic modulus of the substrate is 300 Ma, T 2 ° C., and a temperature at which the storage elastic modulus of the substrate is 0.1 MPa is T 3 ° C. When T1 + 20 ° C. is T2 ° C. or lower, the breaking elongation of the substrate is 100% or higher at T2 ° C., or when T1 + 20 ° C. is T2 ° C. or higher and T3 ° C. or lower, T1 + 20 ° C. It is a laminated film.
Here, the “microstructure” in the present invention is a concavo-convex structure in which the difference in height between the adjacent top and bottom is 0.05 μm to 5 μm or less, and the distance between the adjacent tops is 0.05 μm to 10 μm. It is.

また、基材フィルム上に形成された微細構造が紫外線硬化樹脂よりなる層からなり、前記基材フィルムと前記紫外線硬化樹脂との剥離力が、前記紫外線硬化樹脂で作製した微細構造と熱可塑性樹脂よりなる層との剥離力より相対的に高いことが好ましい。   Further, the microstructure formed on the base film is composed of a layer made of an ultraviolet curable resin, and the peeling force between the base film and the ultraviolet curable resin is a microstructure and a thermoplastic resin made of the ultraviolet curable resin. It is preferable that it is relatively higher than the peeling force with the layer.

さらに、T1+20℃がT2℃以下の場合はT2℃において、或いは、T1+20℃がT2℃以上T3℃以下の場合はT1+20℃において、前記紫外線硬化樹脂の貯蔵弾性率が0.1〜300MPaであるのが好ましい。   Furthermore, the storage elastic modulus of the ultraviolet curable resin is 0.1 to 300 MPa at T2 ° C when T1 + 20 ° C is T2 ° C or lower, or at T1 + 20 ° C when T1 + 20 ° C is T2 ° C or higher and T3 ° C or lower. Is preferred.

また別の本発明は、隣接する底部と上部の高低差が5μm以下の微細構造が基材フィルム上に形成されており、前記微細構造上に未硬化の熱硬化性樹脂が塗布された積層フィルムであって、前記熱硬化性樹脂の硬化開始温度をT4℃とした場合、前記基材のガラス転移温度以上T4℃以下における基材フィルムの貯蔵弾性率が0.1〜300MPaの範囲内である積層フィルムである。   Another aspect of the present invention is a laminated film in which a fine structure having an elevation difference of 5 μm or less between an adjacent bottom and top is formed on a base film, and an uncured thermosetting resin is applied on the fine structure. And when the hardening start temperature of the said thermosetting resin is set to T4 degreeC, the storage elastic modulus of the base film in the glass transition temperature of the said base material and below T4 degreeC is in the range of 0.1-300 MPa. It is a laminated film.

また、基材フィルム上に形成された微細構造が紫外線硬化樹脂よりなる層からなり、前記基材フィルムと紫外線硬化樹脂よりなる層との剥離力が、紫外線硬化樹脂で作製した微細構造と硬化した熱硬化性樹脂との剥離力より相対的に高いことが好ましい。   Further, the microstructure formed on the base film is composed of a layer made of an ultraviolet curable resin, and the peeling force between the base film and the layer made of the ultraviolet curable resin is cured with the microstructure made of the ultraviolet curable resin. It is preferable that it is relatively higher than the peel strength from the thermosetting resin.

さらに、前記基材のガラス転移温度以上T4℃以下における紫外線硬化樹脂の貯蔵弾性率が0.1〜300MPaであるのが好ましい。   Furthermore, it is preferable that the storage elastic modulus of the ultraviolet curable resin at the glass transition temperature or higher and T4 ° C. or lower of the substrate is 0.1 to 300 MPa.

基材フィルム上に形成する微細構造は公知のリソグラフィ技術を用いて作製可能なため、様々な形状の微細構造を作製して使用することができる。積層フィルムは塑性変形しながら被成形体の3次元立体面に追従し、熱可塑性樹脂または熱硬化性樹脂からなる微細構造を3次元立体面上に形成する。従って、積層フィルムが被成形体に追従する際の延伸分布を考慮することで、目的とする微細構造を形成した成形体を得ることができる。   Since the fine structure formed on the base film can be produced using a known lithography technique, fine structures having various shapes can be produced and used. The laminated film follows the three-dimensional solid surface of the molding while being plastically deformed, and forms a fine structure made of a thermoplastic resin or a thermosetting resin on the three-dimensional solid surface. Therefore, by considering the stretch distribution when the laminated film follows the molded body, it is possible to obtain a molded body having a desired microstructure.

微細構造上に転写用樹脂を設ける工程および本発明の積層フィルムを示す図である。It is a figure which shows the process of providing resin for transcription | transfer on a fine structure, and the laminated | multilayer film of this invention. 紫外線硬化樹脂を用いた微細構造の形成工程を示す図である。It is a figure which shows the formation process of the fine structure using ultraviolet curable resin. 熱プレスによる微細構造の形成工程を示す図である。It is a figure which shows the formation process of the microstructure by hot press. 実施例における基材フィルム上に形成されたモスアイ構造の反転構造の断面SEM写真である。It is a cross-sectional SEM photograph of the reversal structure of the moth eye structure formed on the base film in an Example. 実施例4におけるアクリル製レンズ上に形成されたモスアイ構造の断面SEM写真である。6 is a cross-sectional SEM photograph of a moth-eye structure formed on an acrylic lens in Example 4. 実施例4におけるモスアイ構造形成前後におけるアクリル製レンズの反射率測定結果を示す図である。It is a figure which shows the reflectance measurement result of the acrylic lens before and after formation of the moth-eye structure in Example 4. 実施例9におけるモスアイ構造形成前後におけるニッケル板の反射率測定結果を示す図である。It is a figure which shows the reflectance measurement result of the nickel plate before and behind formation of the moth-eye structure in Example 9.

以下、本発明を図示の実施形態に基づいて説明する。
本発明は、基材フィルム上に微細構造を形成する工程と、前記微細構造上に転写用樹脂5となる熱可塑性樹脂層を形成する工程または未硬化の熱硬化性樹脂を塗布する工程とから得られる積層フィルムであって、例えば3次元立体面を表面とする被成形体に該フィルムを延伸しつつ沿わせて貼り合わせるために、基材フィルムの貯蔵弾性率と破断伸びを特定範囲に規定したものである。図1に本発明の積層フィルムの構成および後述する製造工程を示す。本発明は、隣接する底部と上部の高低差が5μm以下の微細構造4が基材フィルム1上に形成されており、前記微細構造4の上に転写用樹脂5として熱可塑性樹脂よりなる層または未硬化の熱硬化性樹脂が塗布された層が形成された積層フィルムである。微細構造4は、基材フィルム1に直接設けられていても良いし、例えば後述する紫外線硬化性樹脂2よりなる層に設けられていても良い。図1では後者の態様を図示している。
なお、これらの図において図示される各部の大きさ、厚さ、寸法等は、実際の微細構造の形成工程における大きさ、厚さ、寸法とは異なる。
Hereinafter, the present invention will be described based on the illustrated embodiments.
The present invention includes a step of forming a fine structure on a base film, and a step of forming a thermoplastic resin layer serving as a transfer resin 5 on the fine structure or a step of applying an uncured thermosetting resin. The obtained laminated film, for example, the storage elastic modulus and elongation at break of the base film are specified within a specific range in order to bond the film along a stretched body having a three-dimensional solid surface as a stretch. It is a thing. FIG. 1 shows the structure of the laminated film of the present invention and the manufacturing process described later. In the present invention, a fine structure 4 having a difference in height of 5 μm or less between adjacent bottom and upper portions is formed on a base film 1, and a layer made of a thermoplastic resin as a transfer resin 5 on the fine structure 4 or It is a laminated film in which a layer coated with an uncured thermosetting resin is formed. The fine structure 4 may be provided directly on the base film 1 or may be provided, for example, in a layer made of the ultraviolet curable resin 2 described later. FIG. 1 illustrates the latter mode.
It should be noted that the size, thickness, dimensions, etc. of each part shown in these drawings are different from the size, thickness, dimensions in the actual fine structure forming process.

本発明において、基材フィルム1は前記転写用樹脂5が熱可塑性樹脂であるか未硬化の熱硬化性樹脂であるかによって特性が異なったものを用いる。   In the present invention, the base film 1 has different characteristics depending on whether the transfer resin 5 is a thermoplastic resin or an uncured thermosetting resin.

まず、前記転写用樹脂が熱可塑性樹脂である場合は、前記熱可塑性樹脂のガラス転移温度をT1℃、基材の貯蔵弾性率が300MPaとなる温度をT2℃、基材の貯蔵弾性率が0.1MPaとなる温度をT3℃としたときに、T1+20℃がT2℃以下の場合はT2℃、或いは、T1+20℃がT2℃以上T3℃以下の場合はT1+20℃において、基材の破断伸びが100%以上とする必要がある。積層フィルムをT2℃以下で被成形体に貼り付ける場合は、被成形体への貼り付け時に積層フィルムが充分に延伸することができず、微細構造4を被成形体に接着させることができないことがある。一方、T3℃以上で貼り付ける場合は、加熱により軟化した前記積層体の基材フィルム1がフィルム形状を保持できないことがある。
上記の積層フィルムを用いる際に、貼り付け工程を、T1+20℃で行う必要は必ずしもないが、該温度で上記の条件を満足した積層フィルムであれば多くの被成形体への微細形状の付与が容易に行われることが期待できる。
First, when the transfer resin is a thermoplastic resin, the glass transition temperature of the thermoplastic resin is T1 ° C., the temperature at which the storage elastic modulus of the substrate is 300 MPa, T2 ° C., and the storage elastic modulus of the substrate is 0. When T1 + 20 ° C. is T2 ° C. or lower when T1 ° C. is set to T3 ° C., or T1 + 20 ° C. is T2 ° C. or higher and T3 ° C. or lower at T1 + 20 ° C., the elongation at break of the substrate is 100 % Or more is necessary. When a laminated film is attached to a molded body at T2 ° C. or lower, the laminated film cannot be sufficiently stretched when applied to the molded body, and the microstructure 4 cannot be adhered to the molded body. There is. On the other hand, when pasting at T3 ° C. or higher, the base film 1 of the laminate softened by heating may not be able to maintain the film shape.
When using the above laminated film, it is not always necessary to perform the attaching step at T1 + 20 ° C. However, if the laminated film satisfies the above conditions at the temperature, the fine shape can be imparted to many molded bodies. It can be expected to be done easily.

一方、前記転写用樹脂が未硬化の熱硬化性樹脂である場合は、前記熱硬化性樹脂の硬化開始温度をT4℃とした場合、前記基材のガラス転移温度以上T4℃以下における基材フィルムの貯蔵弾性率が0.1〜300MPaの範囲内であることが必要である。この場合において、被成形体への貼り付けは基材のガラス転移温度以上T4℃以下で行われるのは当然である。ガラス転移温度より低い温度では、基材を延伸することができないし、T4℃より高い温度では、貼り合せ中に熱硬化性樹脂の硬化反応が進行してしまい、微細形状を被成形体表面に接着できなくなる。また、前記温度範囲において基材フィルムの貯蔵弾性率が0.1〜300MPaの範囲内であることが必要である。基材フィルムの貯蔵弾性率が0.1未満であると、前記積層体の基材フィルム1が柔らかすぎてフィルム形状を保持できないことがある。基材フィルムの貯蔵弾性率が300MPaを超えていると、被成形体への貼り付け時に積層フィルムが充分に延伸することができず、微細構造4を被成形体7に接着させることができないことがある。   On the other hand, in the case where the transfer resin is an uncured thermosetting resin, the base film at the glass transition temperature of the base material to T4 ° C. or less when the curing start temperature of the thermosetting resin is T4 ° C. It is necessary that the storage elastic modulus is in the range of 0.1 to 300 MPa. In this case, it is a matter of course that the attachment to the molded body is performed at a temperature not lower than the glass transition temperature of the substrate and not higher than T4 ° C. If the temperature is lower than the glass transition temperature, the substrate cannot be stretched. If the temperature is higher than T4 ° C., the curing reaction of the thermosetting resin proceeds during bonding, and the fine shape is formed on the surface of the molded body. Can not be bonded. In addition, it is necessary that the storage elastic modulus of the base film is in the range of 0.1 to 300 MPa in the temperature range. If the storage elastic modulus of the base film is less than 0.1, the base film 1 of the laminate may be too soft to maintain the film shape. When the storage elastic modulus of the base film exceeds 300 MPa, the laminated film cannot be sufficiently stretched when being applied to the molded body, and the microstructure 4 cannot be bonded to the molded body 7. There is.

基材フィルム1は無延伸のフィルムを用いるのが好ましい。これは被成形体に微細構造を有する積層フィルムを貼り付ける場合において、基材フィルム1を延伸しながら3次元立体面を有する被成形体の表面に追従させるためである。貼り付け工程の前に既に延伸されたフィルムを用いた場合では、一般にフィルムの素材の結晶性が高まるため、基材フィルム1が伸びにくくなり被成形体への追従が困難になる。さらに、基材フィルム1の延伸方向と非延伸方向での伸び率が異なってくるため、基材フィルム1を等方的に伸ばすことが困難になる等の問題が生じやすい。   The base film 1 is preferably an unstretched film. This is because, when a laminated film having a fine structure is attached to the molded body, the base film 1 is stretched to follow the surface of the molded body having a three-dimensional solid surface. In the case of using a film that has already been stretched before the attaching step, the crystallinity of the material of the film generally increases, so that the base film 1 is difficult to stretch and it is difficult to follow the molded body. Furthermore, since the elongation rates in the stretching direction and the non-stretching direction of the base film 1 are different, problems such as difficulty in stretching the base film 1 is likely to occur.

また、基材フィルム1の材料としては、アクリル樹脂、ポリ塩化ビニル、ポリスチレン、ポリカーボネートなどが例示できる。基材フィルム1の材料は、被成形体の大きさ、形状に応じて適宜選択すればよい。転写用樹脂5が熱可塑性樹脂の場合はゴム入りアクリル系樹脂を用いるのが加工性の観点から好ましい。転写用樹脂5が未硬化の熱硬化性樹脂の場合は、軟質ポリ塩化ビニルを用いるのが、熱硬化性樹脂の硬化開始温度T4℃以下の、より低温で延伸させやすい点で好ましい。   Examples of the material for the base film 1 include acrylic resin, polyvinyl chloride, polystyrene, and polycarbonate. What is necessary is just to select the material of the base film 1 suitably according to the magnitude | size and shape of a to-be-molded body. When the transfer resin 5 is a thermoplastic resin, it is preferable to use a rubber-containing acrylic resin from the viewpoint of workability. When the transfer resin 5 is an uncured thermosetting resin, it is preferable to use soft polyvinyl chloride because the thermosetting resin can be easily stretched at a lower temperature, which is a curing start temperature T4 ° C. or lower.

図2に紫外線硬化樹脂を用いた基材フィルム1上への微細構造4の形成工程を示す。該工程はいわゆる光ナノインプリントと呼ばれる方法である。基材フィルム1上の微細構造4は紫外線硬化樹脂2を基材フィルム1上に塗布し、紫外線硬化樹脂2側から微細構造の反転型3を押し当て、紫外線照射により硬化させることで得ることができる。紫外線照射は硬化に寄与する波長に対して、基材フィルム1と反転型3で透過率の高いどちらか一方向からあるいは両方から照射すればよい。   FIG. 2 shows a process of forming the microstructure 4 on the base film 1 using an ultraviolet curable resin. This step is a so-called optical nanoimprint method. The fine structure 4 on the base film 1 can be obtained by applying the ultraviolet curable resin 2 on the base film 1, pressing the reverse structure 3 of the fine structure from the ultraviolet curable resin 2 side, and curing by ultraviolet irradiation. it can. Irradiation with ultraviolet rays may be performed from one or both of the base film 1 and the inversion mold 3 having high transmittance with respect to the wavelength contributing to curing.

また図3に熱プレスによる基材フィルム上への微細構造の形成工程を示す。該工程はいわゆる熱ナノインプリントと呼ばれる方法である。基材フィルム1上から微細構造4の反転形状を有する反転型3を加熱したのち、圧力をかけることで基材フィルム1上に微細構造4を形成することができる。さらに基材フィルム1を押し出し成形で作製する場合は、ロール表面形状を微細構造4の反転形状としておくことで、押し出し成形時に基材フィルム1の表面に微細構造4を形成することができる。基材フィルム1の表面に微細構造4を形成する方法は、必要とする面積、構造の大きさ、フィルムの物性等を鑑み、適宜選択すればよい。   Moreover, the formation process of the fine structure on the base film by a hot press is shown in FIG. This step is a so-called thermal nanoimprint method. The fine structure 4 can be formed on the base film 1 by applying pressure after heating the reverse mold 3 having the reverse shape of the fine structure 4 from the base film 1. Furthermore, when producing the base film 1 by extrusion molding, the microstructure 4 can be formed on the surface of the base film 1 at the time of extrusion molding by setting the roll surface shape to the inverted shape of the microstructure 4. The method for forming the microstructure 4 on the surface of the base film 1 may be appropriately selected in view of the required area, the size of the structure, the physical properties of the film, and the like.

微細構造4の反転形状を有する反転型3は、公知技術を用いて作製することができる。例えば、マスク露光法、電子線リソグラフィ法、干渉露光法などがある。また大きな面積に対応することができる、自己組織化といわれるアルミの陽極酸化、微粒子配置なども利用できる。微細構造の反転型3の作製は、必要とする面積、微細構造の大きさに応じ、適宜選択すればよい。   The reversal mold 3 having the reversal shape of the fine structure 4 can be manufactured using a known technique. For example, there are a mask exposure method, an electron beam lithography method, an interference exposure method and the like. In addition, aluminum anodization, which is known as self-organization, and fine particle arrangement, which can deal with a large area, can be used. The fine structure inversion mold 3 may be appropriately selected according to the required area and the size of the fine structure.

微細構造の形成に紫外線硬化樹脂2を用いる場合、紫外線硬化樹脂の硬化後の貯蔵弾性率は0.1〜300MPaであることが好ましく、より好ましくは0.1〜10MPaである。なぜなら、被成形体に微細構造を有する積層フィルムを貼り付ける場合において、紫外線硬化樹脂2と基材フィルム1との弾性率を近い値にすることで、紫外線硬化樹脂2と基材フィルム1が剥離するのを防ぐことができるためである。紫外線硬化樹脂2の貯蔵弾性率が前記範囲外の場合、被成形体に微細構造を貼り付ける工程において、基材フィルム1と紫外線硬化樹脂2にかかる応力差により、基材フィルム1と紫外線硬化樹脂2が剥離する問題が生じやすい。
また、紫外線硬化樹脂2を基材フィルム1上に塗布する前に、紫外線硬化樹脂2を塗布する基材フィルム1の表面にコロナ処理等の易接着処理を施しても良い。これにより紫外線硬化性樹脂2と基材フィルム1の剥離をいっそう防止することができる。
When the ultraviolet curable resin 2 is used for forming the fine structure, the storage elastic modulus after curing of the ultraviolet curable resin is preferably 0.1 to 300 MPa, more preferably 0.1 to 10 MPa. This is because when the laminated film having a fine structure is attached to the molded body, the ultraviolet curable resin 2 and the base film 1 are peeled off by making the elastic modulus of the ultraviolet curable resin 2 and the base film 1 close to each other. This is because it can be prevented. When the storage elastic modulus of the ultraviolet curable resin 2 is outside the above range, the base film 1 and the ultraviolet curable resin are caused by a difference in stress applied to the base film 1 and the ultraviolet curable resin 2 in the step of attaching the fine structure to the molded body. The problem that 2 peels easily occurs.
Moreover, before apply | coating the ultraviolet curable resin 2 on the base film 1, you may give easy adhesion processing, such as a corona treatment, to the surface of the base film 1 which apply | coats the ultraviolet curable resin 2. FIG. Thereby, peeling of the ultraviolet curable resin 2 and the base film 1 can be further prevented.

形成する微細構造としては、モスアイ構造、ラインアンドスペース構造、ピラー構造、ホール構造などのフォトニック結晶、回折格子などが挙げられる。ここで、微細構造とは、互いに隣接するトップとボトムの高さの差が0.05μm〜5μm以下であり、互いに隣接するトップ間の距離が0.05μm〜10μmの凹凸構造である。   Examples of the fine structure to be formed include a moth-eye structure, a line and space structure, a pillar structure, a hole structure, and other photonic crystals, a diffraction grating, and the like. Here, the fine structure is a concavo-convex structure in which the difference in height between the top and bottom adjacent to each other is 0.05 μm to 5 μm or less, and the distance between the tops adjacent to each other is 0.05 μm to 10 μm.

次に、微細構造上に転写用樹脂5を設ける工程について説明する。図1のように、微細構造4上に転写用樹脂5を設ける工程は、転写用樹脂5が熱可塑性樹脂の場合と未硬化の熱硬化性樹脂の場合とでは異なる。   Next, the process of providing the transfer resin 5 on the fine structure will be described. As shown in FIG. 1, the process of providing the transfer resin 5 on the microstructure 4 is different depending on whether the transfer resin 5 is a thermoplastic resin or an uncured thermosetting resin.

転写用樹脂5が熱可塑性樹脂の場合、まず熱可塑性樹脂に対して可溶な溶剤を用いて溶解させた溶液6を作製する。溶液6をスピンコート、バーコート、スプレーコートなどの装置を用いて微細構造4上に均一に塗布した後、溶液6から前記溶剤を蒸発させる事で微細構造4の凹凸に転写用樹脂5が充填し、平滑な転写用樹脂5の薄膜が得られる。また、前記溶剤は微細構造4を形成する材料に対して不要な溶剤を選択する必要がある。これは、溶液6中の前記溶剤が微細構造4を溶解するのを防ぐためである。熱可塑性樹脂にはアクリル樹脂、ポリ塩化ビニル、ポリスチレン、ポリカーボネートなどが例示でき、前記熱可塑性樹脂を溶解させる溶剤にはケトン、エステル、塩素化溶剤などを用いることができる。   When the transfer resin 5 is a thermoplastic resin, a solution 6 is first prepared by using a solvent that is soluble in the thermoplastic resin. After uniformly applying the solution 6 onto the microstructure 4 using a spin coater, bar coater, spray coater or the like, the solvent is evaporated from the solution 6 to fill the unevenness of the microstructure 4 with the transfer resin 5. Thus, a smooth thin film of the transfer resin 5 is obtained. Further, it is necessary to select an unnecessary solvent for the material forming the microstructure 4 as the solvent. This is to prevent the solvent in the solution 6 from dissolving the fine structure 4. Examples of the thermoplastic resin include acrylic resin, polyvinyl chloride, polystyrene, and polycarbonate, and ketone, ester, chlorinated solvent, and the like can be used as a solvent for dissolving the thermoplastic resin.

転写用樹脂5が未硬化の熱硬化性樹脂の場合、希釈剤を添加して粘性を低下させた溶液6を作製する。溶液6をスピンコート、バーコート、スプレーコートなどの装置を用いて微細構造4上に均一に塗布した後、溶液6から前記溶剤を蒸発させることで微細構造4の凹凸に転写用樹脂5が充填し、平滑な転写用樹脂5の薄膜が得られる。熱硬化性樹脂にはエポキシ樹脂、フェノール樹脂、メラミン樹脂などが例示でき、希釈剤にはメタノールなどの前記熱硬化性樹脂と非反応な溶液を用いることができる。   When the transfer resin 5 is an uncured thermosetting resin, a solution 6 having a reduced viscosity by adding a diluent is prepared. After the solution 6 is uniformly applied on the microstructure 4 using a spin coater, bar coater, spray coater, or the like, the solvent is evaporated from the solution 6 to fill the unevenness of the microstructure 4 with the transfer resin 5. Thus, a smooth thin film of the transfer resin 5 is obtained. Examples of the thermosetting resin include an epoxy resin, a phenol resin, and a melamine resin. As the diluent, a solution that does not react with the thermosetting resin such as methanol can be used.

基材フィルム1と紫外線硬化樹脂2との間の剥離力は、前記紫外線硬化樹脂で作製した微細構造4と転写用樹脂5との間の剥離力より高い必要がある。そのため、転写用樹脂5を微細構造4上に塗布する前に、フッ素系の離型剤を微細構造4上に塗布してもよく、前記離型剤を添加した溶液6を微細構造4上に塗布しても良い。これは成形体に貼り付けた積層フィルムから微細構造4を形成した基材フィルム1を剥離する工程において、前記積層フィルムの基材フィルム1と転写用樹脂5の離型性を上げるためである。   The peeling force between the base film 1 and the ultraviolet curable resin 2 needs to be higher than the peeling force between the microstructure 4 made of the ultraviolet curable resin and the transfer resin 5. Therefore, before the transfer resin 5 is applied on the microstructure 4, a fluorine-based release agent may be applied on the microstructure 4, and the solution 6 to which the release agent is added is applied on the microstructure 4. It may be applied. This is to improve the releasability of the base film 1 of the laminated film and the transfer resin 5 in the step of peeling the base film 1 on which the fine structure 4 is formed from the laminated film attached to the molded body.

微細構造には周期300nm、高さ300nmのモスアイ構造を持つニッケル型(協同インターナショナル製)、基材フィルムにはポリ塩化ビニルフィルム(タフニール、日本ウェーブロック社製、以下PVC)およびゴム入りアクリル系フィルム(以下RT)を使用した。ゴム入りアクリル系フィルムとしては、厚さを150μmとした他は特開2009−228000に開示される実施例1に記載のフィルムと同等のものを用いた。   Nickel type with a moth-eye structure with a period of 300 nm and a height of 300 nm for fine structure (manufactured by Kyodo International), polyvinyl chloride film (Tough Neil, manufactured by Nippon Wavelock Co., Ltd., hereinafter PVC) and rubber-containing acrylic film (Hereinafter RT) was used. As the acrylic film containing rubber, the same film as that described in Example 1 disclosed in JP-A-2009-228000 was used except that the thickness was 150 μm.

アクリル系紫外線硬化樹脂(UVX4332、東亜合成製)を介してニッケル型を基材フィルムに貼り付け、紫外線照射した。ニッケル型を基材フィルムから剥離すると、硬化した紫外線硬化樹脂からなるモスアイ構造の反転構造を基材フィルム上に得ることができた(図4参照)。   A nickel mold was attached to the substrate film via an acrylic ultraviolet curable resin (UVX4332, manufactured by Toagosei Co., Ltd.), and irradiated with ultraviolet rays. When the nickel mold was peeled from the base film, an inverted structure of a moth-eye structure made of a cured UV curable resin could be obtained on the base film (see FIG. 4).

<転写用樹脂が熱可塑性樹脂の場合>
上記により得られたモスアイ構造の反転構造を微細構造として有する基材フィルムの微細構造上に、メチルイソブチルケトンを溶剤として5wt%に希釈したPMMA(パラペットGH、クラレ製)をスピンコートにより塗布し、70℃に加温して溶剤を蒸発させて積層フィルムを得た。なお、転写用樹脂として使用したPMMAのガラス転移温度は90℃である。
<When the transfer resin is a thermoplastic resin>
PMMA (parapet GH, manufactured by Kuraray Co., Ltd.) diluted to 5 wt% with methyl isobutyl ketone as a solvent was applied by spin coating on the fine structure of the base film having the inverted structure of the moth-eye structure obtained as above. The laminated film was obtained by heating to 70 ° C. and evaporating the solvent. The glass transition temperature of PMMA used as the transfer resin is 90 ° C.

モスアイ構造の反転構造を表面に形成する基材フィルムと熱可塑性樹脂からなる積層体を真空圧空成形機(布施真空製)内で100〜180℃まで加熱し、300kPaでアクリル製レンズ(φ60mm)に貼り付けた。前記積層体を貼り付けたアクリル製レンズを室温まで冷却した後、基材フィルムを剥離するとアクリル製レンズの表面にPMMAからなるモスアイ構造の形成が確認された。結果を表1に示す。   A laminate composed of a base film and a thermoplastic resin that forms a reverse structure of the moth-eye structure on the surface is heated to 100 to 180 ° C. in a vacuum / pressure forming machine (made by Fuse Vacuum), and is made into an acrylic lens (φ60 mm) at 300 kPa. Pasted. After cooling the acrylic lens to which the laminate was attached to room temperature, when the base film was peeled off, it was confirmed that a moth-eye structure made of PMMA was formed on the surface of the acrylic lens. The results are shown in Table 1.

<比較例>
実施例1と同じ微細構造、紫外線硬化樹脂、アクリル製レンズを用い、基材フィルム1に2軸延伸したPETフィルム(東洋紡エステル、A4300、東洋紡績製)を用いて100〜180℃で真空圧空成形を実施した。該温度における基材フィルムの破断伸びは、MD方向に最大95%、TD方向に最大60%であった。この結果、何れの温度でも基材フィルムが破断し、微細構造を形成することはできなかった。
<Comparative example>
Vacuum pressure forming at 100 to 180 ° C. using a PET film (Toyobo Ester, A4300, manufactured by Toyobo Co., Ltd.) biaxially stretched on the base film 1 using the same microstructure, UV curable resin and acrylic lens as in Example 1. Carried out. The elongation at break at the temperature was 95% at the maximum in the MD direction and 60% at the maximum in the TD direction. As a result, the base film was broken at any temperature, and a fine structure could not be formed.

実施例4で得られたアクリル製レンズの表面にモスアイ構造(図5)を形成した成形体を観察した結果、レンズの天頂部から裾部にかけてモスアイ構造が0〜30%延伸していた。また、図6のように、モスアイ形成前後でのアクリル製レンズの表面反射率を顕微分光装置(ラムダビジョン製)で測定し、モスアイ構造の形成による反射率の低減を確認した。   As a result of observing the molded body in which the moth-eye structure (FIG. 5) was formed on the surface of the acrylic lens obtained in Example 4, the moth-eye structure was stretched by 0 to 30% from the top to the bottom of the lens. Further, as shown in FIG. 6, the surface reflectance of the acrylic lens before and after the formation of the moth eye was measured with a microspectroscope (manufactured by Lambda Vision), and the reduction of the reflectance due to the formation of the moth eye structure was confirmed.

<転写用樹脂が未硬化の熱硬化性樹脂の場合>
上記により得られたモスアイ構造の反転構造を微細構造として有する基材フィルムの微細構造上に、メタノールで30wt%に希釈したエポキシ樹脂(jER828、三菱化学製)をスピンコートにより塗布し、20℃で放置してメタノールを蒸発させた。なお、エポキシ樹脂の重合開始温度は70℃である。
<When the transfer resin is an uncured thermosetting resin>
An epoxy resin (jER828, manufactured by Mitsubishi Chemical) diluted to 30 wt% with methanol is applied by spin coating on the microstructure of the base film having the inverted structure of the moth-eye structure obtained as described above at 20 ° C. The methanol was allowed to evaporate. The polymerization start temperature of the epoxy resin is 70 ° C.

モスアイ構造の反転構造を表面に形成する基材フィルムと未硬化の熱硬化性樹脂からなる積層フィルムを真空圧空成形機(NGF―0406−T、FVF製)内で60、80℃まで加熱し、300kPaで被成形体に貼り付けた。被成形体には、ガラス、シリコンウェハ、ステンレス板、ニッケル板、アクリル製レンズを使用した。前記積層フィルムを被成形体に貼り付けた状態で80℃、3時間加熱した。基材フィルムを被成形体から剥離し、被成形体の微細構造形成面に硬化したエポキシ樹脂からなるモスアイ構造の形成有無を確認した。結果を表2に示す。   A laminated film made of an uncured thermosetting resin and a base film that forms an inverted structure of the moth-eye structure on the surface is heated to 60, 80 ° C. in a vacuum / pressure forming machine (NGF-0406-T, manufactured by FVF), It affixed on the to-be-molded body at 300 kPa. Glass, silicon wafer, stainless steel plate, nickel plate, and acrylic lens were used for the molded body. The laminated film was heated at 80 ° C. for 3 hours in a state where the laminated film was attached to the molded body. The base film was peeled off from the molded body, and it was confirmed whether or not a moth-eye structure made of an epoxy resin cured on the fine structure forming surface of the molded body was formed. The results are shown in Table 2.

実施例9で得られたニッケル基板にモスアイ構造を形成した成形体に対して、モスアイ構造形成前後での表面反射率を顕微分光装置(ラムダビジョン製)で測定した結果を図7に示す。これより、モスアイ構造形成による反射率の低減を確認した。   FIG. 7 shows the results of measuring the surface reflectance before and after the formation of the moth-eye structure with a microspectroscope (made by Lambda Vision) for the molded body in which the moth-eye structure was formed on the nickel substrate obtained in Example 9. From this, the reduction of the reflectance by moth eye structure formation was confirmed.

1 基材フィルム
2 紫外線硬化樹脂
3 微細構造の反転型
4 微細構造
5 転写用樹脂
6 転写用樹脂を希釈した溶液
7 被成形体
8 真空圧空成形機
9 微細構造の反転構造
DESCRIPTION OF SYMBOLS 1 Base film 2 Ultraviolet curable resin 3 Micro structure reversal type 4 Micro structure 5 Transfer resin 6 Transfer resin diluted solution 7 Molded object 8 Vacuum / pressure forming machine 9 Micro structure reversal structure

Claims (6)

隣接する底部と上部の高低差が5μm以下の微細構造が基材フィルム上に形成されており、前記微細構造上に熱可塑性樹脂よりなる層が形成された積層フィルムであって、前記熱可塑性樹脂のガラス転移温度をT1℃、基材の貯蔵弾性率が300Maとなる温度をT2℃、基材の貯蔵弾性率が0.1MPaとなる温度をT3℃としたときに、T1+20℃がT2℃以下の場合はT2℃において、T1+20℃がT2℃以上T3℃以下の場合はT1+20℃において、基材の破断伸びが100%以上であることを特徴とする積層フィルム。 A laminated film in which a fine structure having an elevation difference of 5 μm or less between an adjacent bottom part and an upper part is formed on a base film, and a layer made of a thermoplastic resin is formed on the fine structure, wherein the thermoplastic resin T1 + 20 ° C. is T2 ° C. or lower when the glass transition temperature of T1 ° C., the temperature at which the storage elastic modulus of the base material is 300 Ma is T2 ° C., and the temperature at which the storage elastic modulus of the base material is 0.1 MPa is T3 ° C. In the case of T2, the laminated film is characterized in that the elongation at break of the substrate is 100% or more at T1 + 20 ° C when T1 + 20 ° C is T2 ° C or more and T3 ° C or less. 基材フィルム上に形成された微細構造が紫外線硬化樹脂よりなる層からなり、前記基材フィルムと前記紫外線硬化樹脂よりなる層との剥離力が、前記紫外線硬化樹脂で作製した微細構造と前記熱可塑性樹脂よりなる層との剥離力より相対的に高いことを特徴とする請求項1の積層フィルム。 The microstructure formed on the base film consists of a layer made of an ultraviolet curable resin, and the peeling force between the base film and the layer made of the ultraviolet curable resin is such that the microstructure made of the ultraviolet curable resin and the heat The laminated film according to claim 1, wherein the laminated film is relatively higher in peeling force than a layer made of a plastic resin. T1+20℃がT2℃以下の場合はT2℃において、T1+20℃がT2℃以上T3℃以下の場合はT1+20℃において、前記紫外線硬化樹脂の貯蔵弾性率が0.1〜300MPaであることを特徴とする請求項2に記載の積層フィルム。 The storage elastic modulus of the ultraviolet curable resin is 0.1 to 300 MPa at T2 ° C when T1 + 20 ° C is T2 ° C or lower, and at T1 + 20 ° C when T1 + 20 ° C is T2 ° C or higher and T3 ° C or lower. The laminated film according to claim 2. 隣接する底部と上部の高低差が5μm以下の微細構造が基材フィルム上に形成されており、前記微細構造上に未硬化の熱硬化性樹脂が塗布された積層フィルムであって、前記熱硬化性樹脂の硬化開始温度をT4℃とした場合、前記基材のガラス転移温度以上T4℃以下における基材フィルムの貯蔵弾性率が0.1〜300MPaの範囲内であることを特徴とする積層フィルム。 A laminated film in which a microstructure having an elevation difference of 5 μm or less between adjacent bottom and top is formed on a base film, and an uncured thermosetting resin is applied on the microstructure, the thermosetting When the curing start temperature of the conductive resin is T4 ° C., the storage elastic modulus of the base film at the glass transition temperature to T4 ° C. of the base material is in the range of 0.1 to 300 MPa. . 基材フィルム上に形成された微細構造が紫外線硬化樹脂よりなる層からなり、前記基材フィルムと前記紫外線硬化樹脂よりなる層との剥離力が前記紫外線硬化樹脂で作製した微細構造と硬化した熱硬化性樹脂との剥離力より相対的に高いことを特徴とする請求項4記載の積層フィルム。 The microstructure formed on the base film is made of a layer made of an ultraviolet curable resin, and the peeling force between the base film and the layer made of the ultraviolet curable resin is a microstructure made of the ultraviolet curable resin and the cured heat. The laminated film according to claim 4, wherein the laminated film is relatively higher than a peeling force with the curable resin. 前記基材のガラス転移温度以上T4℃以下における紫外線硬化樹脂の貯蔵弾性率が0.1〜300MPaであることを特徴とする請求項5記載の積層フィルム。 6. The laminated film according to claim 5, wherein the storage elastic modulus of the ultraviolet curable resin at the glass transition temperature to T4 ° C. is 0.1 to 300 MPa.
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CN114355489A (en) * 2022-01-13 2022-04-15 西华大学 Curved-surface fly-eye lens based on DMD digital photoetching and preparation method thereof

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JPH03296469A (en) * 1990-04-13 1991-12-27 Dainippon Printing Co Ltd Light permselective sheet and preparation thereof
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CN114355489A (en) * 2022-01-13 2022-04-15 西华大学 Curved-surface fly-eye lens based on DMD digital photoetching and preparation method thereof
CN114355489B (en) * 2022-01-13 2023-05-16 西华大学 Curved fly-eye lens based on DMD digital lithography and preparation method thereof

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