JP2014199461A5 - - Google Patents

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JP2014199461A5
JP2014199461A5 JP2014129379A JP2014129379A JP2014199461A5 JP 2014199461 A5 JP2014199461 A5 JP 2014199461A5 JP 2014129379 A JP2014129379 A JP 2014129379A JP 2014129379 A JP2014129379 A JP 2014129379A JP 2014199461 A5 JP2014199461 A5 JP 2014199461A5
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image
plane
objective
intermediate image
objective part
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JP2014199461A (en
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Priority claimed from US11/035,103 external-priority patent/US7385756B2/en
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ここで説明された各投影対物系は、投影放射線が射出面ESにおいて投影対物系から射出する高NA像側端部を有し、射出面ESは、像面ISに配置された平面状の基板面と射出面の間で均一な距離を可能にするために、好ましくは平面である。像面に最も近くて射出面ESを形成するレンズは、ここでは「最終レンズ」LLと呼ばれる。好ましくは、最終レンズは、ほとんどの実施例で球面状に湾曲した、湾曲した入射面ENSと平面状の射出面を有する平凸正レンズである。高NAを得る目的で、湾曲した入射面ENSにより与えられる大きな屈折力が可能な限り像面に近くに配置されるように、最終レンズを構成するのが有利であることが分かった。更に、最終レンズLLの入射面ENSの大きな曲率、すなわち小さい曲率半径が望ましいのが明らかである。TLLが光軸上の最終レンズの厚さ(すなわち光軸に沿って測定された入射面ENSと射出面ESの間の軸方向距離)であり、RLLが最終レンズの物体側頂点半径(すなわち入射面ENSの半径)であり、DIALLが最終レンズの入射面の光学的自由直径である場合、パラメータLL1=TLL/RLLとLL2=DIALL/RLLは好ましくは一定の範囲内に入るべきである。とくに、もし条件0.46≦LL1≦0.69がLL1に当てはまるなら、それが有利であることが分かった。パラメータLL1は、入射面の曲率の中心が射出面と一致する半球レンズで1になるため、LL1に関する条件は、湾曲した入射面の曲率の中心が最終レンズの外側にとくに像面を越えて存在する、非半球の最終レンズが好ましいことを示している。 Each projection objective described here has a high NA image side end where projection radiation emerges from the projection objective at the exit plane ES, which is a planar substrate disposed on the image plane IS. A plane is preferred to allow a uniform distance between the surface and the exit surface. The lens that forms the exit surface ES closest to the image plane is referred to herein as the “final lens” LL. Preferably, the final lens is a plano-convex positive lens having a curved entrance surface ENS and a planar exit surface, which is curved spherically in most embodiments. For the purpose of obtaining a high NA, it has been found advantageous to configure the final lens so that the large refractive power provided by the curved entrance surface ENS is located as close as possible to the image plane. Furthermore, it is clear that a large curvature of the entrance surface ENS of the final lens LL, that is, a small radius of curvature is desirable. T LL is the thickness of the final lens on the optical axis (that is, the axial distance between the entrance surface ENS and the exit surface ES measured along the optical axis), and R LL is the object-side apex radius of the final lens ( That is, the radius of the incident surface ENS), and DIA LL is the optical free diameter of the incident surface of the final lens, the parameters LL1 = T LL / R LL and LL2 = DIA LL / R LL are preferably within a certain range. Should enter. In particular, it has been found advantageous if the condition 0.46 ≦ LL1 ≦ 0.69 applies to LL1. Since the parameter LL1 is 1 for a hemispherical lens whose center of curvature of the entrance surface coincides with the exit surface, the condition regarding LL1 is that the center of curvature of the curved entrance surface exists outside the final lens, particularly beyond the image plane. This indicates that a non-hemispheric final lens is preferred.

交替的に、又は追加的に、条件1.15≦LL2≦1.67は、好ましくはLL2に当てはまるべきである。LL1及びLL2のためのそれぞれの値が表18に示されている。
もし上記条件の少なくとも1つが当てはまるなら、最終レンズの湾曲した入射面により与えられる大きな正の屈折力が像面の近くに与えられ、これにより大きな像側開口数NAが、とくにNA>1.1又はNA>1.2で、NA=1.3又はNA=1.35のように、得られることが可能となる。
Alternately or additionally, the condition 1.15 ≦ LL2 ≦ 1.67 should preferably apply to LL2. The respective values for LL1 and LL2 are shown in Table 18.
If at least one of the above conditions is true, a large positive refractive power provided by the curved entrance surface of the final lens is provided near the image surface, so that a large image-side numerical aperture NA, in particular NA> 1.1. Or NA> 1.2, and NA = 1.3 or NA = 1.35 can be obtained.

〔表18〕

Figure 2014199461
[Table 18]
Figure 2014199461

Claims (1)

投影対物系の物体面に設けられたパターンを投影対物系の像面上に結像するためのカタディオプトリック投影対物系であって、
前記物体面に設けられたパターンを第1中間像に結像するための第1屈折対物系部分と、
前記第1中間像を第2中間像に結像するための第2対物系部分と、
前記第2中間像を前記像面上に結像するための第3屈折対物系部分を有し、
前記第2対物系部分が、第1連続鏡面を有する第1凹面鏡と第2連続鏡面を有する第2凹面鏡を有しており、
瞳面が、前記物体平面と前記第1中間像の間と、前記第1及び第2中間像の間と、前記第2中間像と前記像平面の間に形成されていて、
全ての凹面鏡が前記瞳面から光学的に離れて配置されていて、
前記第1対物系部分が第1の数であるN1AS個の非球面レンズを有し、
前記第3対物系部分が第2の数であるN3AS個の非球面レンズを有し、
非球面レンズ比ASR=N1AS/N3ASが1よりも小さく、
像側開口数NAが1.2よりも大きい、カタディオプトリック投影対物系。
A catadioptric projection objective for imaging a pattern provided on the object plane of the projection objective on the image plane of the projection objective,
A first refractive objective part for forming a pattern provided on the object plane into a first intermediate image;
A second objective part for imaging the first intermediate image into a second intermediate image;
A third refractive objective part for imaging the second intermediate image on the image plane;
The second objective part has a first concave mirror having a first continuous mirror surface and a second concave mirror having a second continuous mirror surface;
A pupil plane is formed between the object plane and the first intermediate image, between the first and second intermediate images, and between the second intermediate image and the image plane;
All concave mirrors are placed optically away from the pupil plane,
The first objective part has N1 AS aspherical lenses of a first number;
The third objective part has N3 AS aspherical lenses of a second number;
Aspheric lens ratio ASR = N1 AS / N3 AS is smaller than 1,
Catadioptric projection objective with an image-side numerical aperture NA greater than 1.2.
JP2014129379A 2004-07-14 2014-06-24 Catadioptric projection objective Withdrawn JP2014199461A (en)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US58750404P 2004-07-14 2004-07-14
US60/587,504 2004-07-14
US59177504P 2004-07-27 2004-07-27
US60/591,775 2004-07-27
US61282304P 2004-09-24 2004-09-24
US60/612,823 2004-09-24
US61767404P 2004-10-13 2004-10-13
US60/617,674 2004-10-13
US11/035,103 2005-01-14
US11/035,103 US7385756B2 (en) 2004-01-14 2005-01-14 Catadioptric projection objective
US65495005P 2005-02-23 2005-02-23
US60/654,950 2005-02-23

Related Parent Applications (1)

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JP2012023476A Division JP5600128B2 (en) 2004-07-14 2012-01-19 Catadioptric projection objective

Related Child Applications (2)

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JP2015028386A Division JP2015121815A (en) 2004-07-14 2015-02-17 Catadioptric projection objective
JP2015195718A Division JP2016021076A (en) 2004-07-14 2015-10-01 Catadioptric projection objective system

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JP2014199461A JP2014199461A (en) 2014-10-23
JP2014199461A5 true JP2014199461A5 (en) 2014-12-18

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JP2012023476A Expired - Fee Related JP5600128B2 (en) 2004-07-14 2012-01-19 Catadioptric projection objective
JP2013243793A Withdrawn JP2014059579A (en) 2004-07-14 2013-11-26 Catadioptric projection objective
JP2014129379A Withdrawn JP2014199461A (en) 2004-07-14 2014-06-24 Catadioptric projection objective
JP2015028386A Withdrawn JP2015121815A (en) 2004-07-14 2015-02-17 Catadioptric projection objective
JP2015195718A Withdrawn JP2016021076A (en) 2004-07-14 2015-10-01 Catadioptric projection objective system
JP2016171601A Withdrawn JP2016224460A (en) 2004-07-14 2016-09-02 Catadioptric projection objective system

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JP2012023476A Expired - Fee Related JP5600128B2 (en) 2004-07-14 2012-01-19 Catadioptric projection objective
JP2013243793A Withdrawn JP2014059579A (en) 2004-07-14 2013-11-26 Catadioptric projection objective

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JP2015028386A Withdrawn JP2015121815A (en) 2004-07-14 2015-02-17 Catadioptric projection objective
JP2015195718A Withdrawn JP2016021076A (en) 2004-07-14 2015-10-01 Catadioptric projection objective system
JP2016171601A Withdrawn JP2016224460A (en) 2004-07-14 2016-09-02 Catadioptric projection objective system

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JP5600128B2 (en) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー Catadioptric projection objective
US11194242B2 (en) 2017-07-10 2021-12-07 Sony Corporation Image display device and projection optical system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
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JP2000058436A (en) * 1998-08-11 2000-02-25 Nikon Corp Projection aligner and exposure method
US6600608B1 (en) * 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
JP2005233979A (en) * 2000-02-09 2005-09-02 Nikon Corp Catadioptric system
JP4245286B2 (en) * 2000-10-23 2009-03-25 株式会社ニコン Catadioptric optical system and exposure apparatus provided with the optical system
JP4292497B2 (en) * 2002-04-17 2009-07-08 株式会社ニコン Projection optical system, exposure apparatus, and exposure method
EP1532489A2 (en) * 2002-08-23 2005-05-25 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
EP2722703A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
JP5600128B2 (en) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー Catadioptric projection objective

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