JP2014197143A - Conductive pattern forming method, resin composition, conductive pattern, and electronic circuit - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a conductive pattern forming method for forming a high-definition conductive pattern excellent in conductivity and adhesion, and to provide a resin composition, a conductive pattern, and an electronic circuit.SOLUTION: The conductive pattern forming method comprises the steps of: applying a resin composition which contains [A] a polymer containing a constituent unit having a polymerizable group, [B] a surfactant whose content is 0.5-10 pts.mass based on 100 pts.mass of the total resin composition, and a solvent to a substrate 1; subjecting at least a part of a coating film of the resin composition to at least one of irradiation and heating to form a base film 3; applying a conductive film forming ink onto the base film 3; and heating a coating film of the conductive film forming ink to form a conductive pattern 5. The electronic circuit is formed using the conductive pattern 5.

Description

  The present invention relates to a conductive pattern forming method, a resin composition, a conductive pattern, and an electronic circuit.

  Electronic devices such as liquid crystal displays and mobile phones, and electronic devices such as digital cameras are required to be smaller, thinner and more functional, and electronic devices such as semiconductor chips mounted on these electronic devices are mounted. A wiring board is used as a substrate to be used.

  The wiring board includes what is called a printed wiring board and the like, and the electronic device is used for the configuration of the electronic device by fixing and wiring the electronic device as described above to form the circuit board provided with the electronic circuit. Is the main part. In recent years, the wiring of an electronic circuit on a circuit board of an electronic device tends to be further miniaturized and complicated as the electronic device becomes smaller and more functional. Therefore, development of highly accurate wiring technology is being promoted in the fields of electronic circuits, wiring boards, and circuit boards using the same.

  One such highly accurate wiring technology is printed electronics (PE) using conductive ink for forming a conductive film. In printed electronics, it is possible to form a low-resistance conductive pattern by applying a conductive film forming ink, which is a conductive film forming ink, on a substrate and then heating at about 200 ° C. (for example, (See Patent Document 1). Here, most of the substrates to be applied are resin substrates, and there is a concern about the heat resistance when forming a conductive pattern.

  In addition, when a conductive pattern is formed by directly printing a conductive film forming ink on a substrate, it is difficult to form a high-definition wiring because the conductive film forming ink has poor adhesion to the substrate, causes bleeding, etc. There is a problem of becoming.

  Therefore, in order to solve the above-described problems and form a high-definition wiring, a technique for providing a base layer so as to be suitable for forming a conductive pattern has been studied. The base treatment for providing a base layer is performed in order to suppress bleeding of the conductive film forming ink and improve the printability on the substrate, and the following are known.

  For example, a technique of grafting an epoxy group on a substrate is known (see, for example, Patent Document 2 and Patent Document 3). Moreover, the technique of apply | coating a photocatalyst on a board | substrate is known (for example, refer patent document 4 and patent document 5). Furthermore, a technique for applying an acrylic copolymer on a substrate is known (see, for example, Patent Document 6 and Patent Document 7).

JP 2011-241309 A JP 2003-114525 A JP 2006-58797 A JP 2003-209340 A JP 2004-98351 A JP 2012-232434 A JP 2012-218318 A

  However, the technique of grafting an epoxy group on a substrate has a problem that the graft polymerization takes time and throughput is poor. Moreover, there is a problem that the substrate is limited to those containing an epoxy resin and cannot be developed on other resin films.

In the case of a technique for applying a photocatalyst on a substrate, there are problems that the process is complicated and that a high dose of ultraviolet irradiation is required.
Furthermore, in the case of the technique of applying an acrylic copolymer on the substrate, there is a problem that the conductive layer forming ink permeates into the underlayer, thereby deteriorating the conductivity of the formed conductive pattern. .
That is, the conventional technology described above has not been sufficiently effective so far for forming a high-definition conductive pattern excellent in conductivity.

  Therefore, there is a need for a method of forming a conductive pattern that is sufficiently effective for the formation of high-definition wiring, and in particular, a technique for providing a layer serving as a base effective for the formation of high-definition wiring, that is, a base film is required. It has been. In addition, the method for forming the conductive pattern can be applied even when a substrate made of an organic material such as a resin substrate is used as the substrate, and the conductive pattern can be formed with excellent characteristics such as appearance, conductivity and adhesion. It is desirable that it be possible.

  The present invention has been made based on the above findings. That is, an object of the present invention is to provide a conductive pattern forming method for forming a high-definition conductive pattern excellent in conductivity and adhesion.

  Another object of the present invention is to provide a resin composition used for forming a high-definition conductive pattern excellent in conductivity and adhesion.

  Another object of the present invention is to provide a high-definition conductive pattern excellent in conductivity and adhesion.

  Furthermore, the objective of this invention is providing the electronic circuit which has a high-definition conductive pattern excellent in electroconductivity and adhesiveness.

  Other objects and advantages of the present invention will become apparent from the following description.

The first aspect of the present invention is:
[A] a step of applying a resin composition containing a structural unit having a polymerizable group, [B] a surfactant, and a solvent to a substrate;
A step of performing at least one of radiation irradiation and heating on at least a part of the coating film of the resin composition;
A step of applying a conductive film forming ink on the coating film on which at least one of the radiation irradiation and heating is applied;
A method of forming a conductive pattern comprising heating a coating film of the conductive film-forming ink,
It is related with the conductive pattern formation method characterized by the content of [B] surfactant of a resin composition being 0.5 mass part-10 mass parts with respect to 100 mass parts of the resin composition.

  In the first aspect of the present invention, the polymerizable group of the [A] polymer is preferably at least one selected from the group consisting of an epoxy group, a (meth) acryloyl group, and a vinyl group.

  In the first embodiment of the present invention, the [A] polymer is preferably at least one selected from the group consisting of an acrylic polymer, a siloxane polymer, and an epoxy resin.

In the first aspect of the present invention, the resin composition further comprises:
[C] a polymerizable compound having an ethylenically unsaturated bond, and
[D] a radiation-sensitive polymerization initiator,
It is preferable that it is a radiation sensitive resin composition.

The second aspect of the present invention is:
[A] a polymer containing a structural unit having a polymerizable group [B] a surfactant;
And it is related with the resin composition characterized by being used for formation of the base film for providing a conductive pattern including a solvent.

In a second aspect of the invention,
It is preferable to further contain [C] a polymerizable compound having an ethylenically unsaturated bond, and [D] a radiation-sensitive polymerization initiator.

  A third aspect of the present invention relates to a conductive pattern obtained by the conductive pattern forming method according to the first aspect of the present invention.

  A 4th aspect of this invention is related with the electronic circuit characterized by having the electroconductive pattern of the 3rd aspect of this invention.

  According to the first aspect of the present invention, there is provided a conductive pattern forming method for forming a high-definition conductive pattern excellent in conductivity and adhesion.

  According to the 2nd aspect of this invention, the resin composition used for forming the high-definition electroconductive pattern excellent in electroconductivity and adhesiveness is provided.

  According to the third aspect of the present invention, a high-definition conductive pattern excellent in conductivity and adhesion is provided.

  According to the 4th aspect of this invention, the electronic circuit which has a high-definition conductive pattern excellent in electroconductivity and adhesiveness is provided.

It is sectional drawing which shows typically the coating film of the resin composition of embodiment of this invention formed on the board | substrate. It is sectional drawing which shows typically the base film of embodiment of this invention formed in the whole surface on a board | substrate. It is sectional drawing which illustrates typically the electrically conductive film formation ink application | coating process of the conductive pattern formation method of embodiment of this invention. It is sectional drawing which shows typically the electroconductive pattern of embodiment of this invention formed on the board | substrate. It is a top view which shows the shape of the electroconductive pattern formed in the Example of this invention.

  The present invention relates to a conductive pattern forming method, a resin composition, a conductive pattern, and an electronic circuit. In the method for forming a conductive pattern of the present invention, for example, when a conductive pattern is formed on a substrate, a base film serving as a base for the conductive pattern is formed on the substrate. The base film of the present invention is formed using the resin composition of the present invention. That is, the resin composition of the present invention is used for forming the base film of the present invention. The conductive pattern of the present invention is formed on the base film of the present invention using the resin composition of the present invention and the conductive pattern forming method of the present invention, and is used for the electronic circuit of the present invention. it can.

  The conductive pattern forming method of the present invention includes a step of applying the resin composition of the present invention to a substrate, a step of forming at least one of radiation irradiation and heating on at least a part of the coating film of the resin composition; The method includes a step of applying a conductive film forming ink on a coating film on which at least one of the radiation irradiation and heating has been performed, and a step of heating the coating film of the conductive film forming ink.

  Hereinafter, embodiments of the present invention will be described. First, the resin composition and conductive film forming ink of the embodiment of the present invention used for the conductive pattern forming method of the embodiment of the present invention will be described. Next, a conductive pattern forming method, a conductive pattern, and an electronic circuit according to an embodiment of the present invention will be described.

Embodiment 1. FIG.
(Resin composition)
The resin composition of the first embodiment of the present invention is used in the conductive pattern forming method of the third embodiment of the present invention described in detail later. [A] a polymer and [B] a surfactant And a solvent as components. Below, the component contained in the resin composition of 1st Embodiment of this invention is demonstrated.

<[A] polymer>
[A] polymer of [A] component of the resin composition of this embodiment is a polymer containing the structural unit which has a polymeric group.

The polymerizable group is preferably at least one selected from the group consisting of an epoxy group, a (meth) acryloyl group, and a vinyl group. [A] The polymer has such a group as a polymerizable group, so that the resin composition of this embodiment can be easily cured by at least one of irradiation and heating. Can do. And the resin composition of this embodiment can form the base layer suitable for formation of the electroconductive pattern of 3rd Embodiment of this invention.
In the present invention, “radiation” irradiated upon exposure is a concept including visible light, ultraviolet light, far ultraviolet light, X-rays, charged particle beams and the like.

  [A] The polymer is preferably at least one selected from the group consisting of an acrylic polymer, a siloxane polymer and a novolac resin. Hereinafter, a preferred [A] polymer will be described.

(Acrylic polymer)
The acrylic polymer can be synthesized by radical polymerization of a compound giving each structural unit in the presence of a polymerization initiator in a solvent. Hereinafter, each structural unit will be described in detail.

[Structural unit (a1)]
The structural unit (a1) is represented by the following formula (a). When the acrylic polymer has the structural unit (a1), the curability and the like of the obtained cured film for a display element can be improved.

In the above formula (a), R ^a and R ^b are each independently a hydrogen atom or a methyl group. R ^c is a divalent group represented by the following formula (ai) or the following formula (a-ii). m is an integer of 1-6.

In said formula (ai), ^Rd is a hydrogen atom or a methyl group. In the above formula (ai) and the above formula (a-ii), * represents a binding site with an oxygen atom.

The structural unit (a1) is obtained by reacting a carboxy group in the structural unit (a3) described later with an epoxy group contained in the epoxy group-containing (meth) acrylic acid compound to form an ester bond. For example, when the polymer having the structural unit (a3) is reacted with an epoxy group-containing (meth) acrylic acid compound such as glycidyl methacrylate or 2-methylglycidyl methacrylate, for example, R ^c in the formula (a) is a group represented by the above formula (a-ii). On the other hand, when an epoxy group-containing (meth) acrylic acid compound such as 3,4-epoxycyclohexylmethyl methacrylate is reacted with the polymer having the structural unit (a3), R ^c in the above formula (a) is: The group is represented by the above formula (a-ii).

  As a content rate of a structural unit (a1), 5 mol%-60 mol% are preferable with respect to all the structural units which comprise an acryl-type polymer, and 10 mol%-50 mol% are more preferable. By setting the content ratio of the structural unit (a1) in the above range, a cured film for display element having excellent curability and the like can be formed.

[Structural unit (a2)]
The structural unit (a2) is a structural unit derived from an epoxy group-containing unsaturated compound. When the acrylic polymer has the structural unit (a2), the curability and the like of the obtained cured film for display element can be further improved.

  Examples of the epoxy group include an oxiranyl group (1,2-epoxy structure) and an oxetanyl group (1,3-epoxy structure).

  Examples of the unsaturated compound containing an oxiranyl group include glycidyl acrylate, glycidyl methacrylate, glycidyl α-ethyl acrylate, glycidyl α-n-propyl acrylate, glycidyl α-n-butyl acrylate, acrylic acid- 3,4-epoxybutyl, methacrylic acid-3,4-epoxybutyl, acrylic acid-6,7-epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, α-ethylacrylic acid-6,7-epoxyheptyl, o-Vinylbenzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, 3,4-epoxycyclohexyl methacrylate, and the like.

As an unsaturated compound containing the oxetanyl group, for example,
As the acrylic ester, 3- (acryloyloxymethyl) oxetane, 3- (acryloyloxymethyl) -2-methyloxetane, 3- (acryloyloxymethyl) -3-ethyloxetane, 3- (acryloyloxymethyl) -2- Trifluoromethyloxetane, 3- (acryloyloxymethyl) -2-pentafluoroethyloxetane, 3- (acryloyloxymethyl) -2-phenyloxetane, 3- (acryloyloxymethyl) -2,2-difluorooxetane, 3- (Acryloyloxymethyl) -2,2,4-trifluorooxetane, 3- (acryloyloxymethyl) -2,2,4,4-tetrafluorooxetane, 3- (2-acryloyloxyethyl) oxetane, 3- ( 2-acryloyloxye L) -2-ethyloxetane, 3- (2-acryloyloxyethyl) -3-ethyloxetane, 3- (2-acryloyloxyethyl) -2-trifluoromethyloxetane, 3- (2-acryloyloxyethyl)- 2-pentafluoroethyloxetane, 3- (2-acryloyloxyethyl) -2-phenyloxetane, 3- (2-acryloyloxyethyl) -2,2-difluorooxetane, 3- (2-acryloyloxyethyl) -2 , 2,4-trifluorooxetane, 3- (2-acryloyloxyethyl) -2,2,4,4-tetrafluorooxetane and the like;
As methacrylic acid esters, 3- (methacryloyloxymethyl) oxetane, 3- (methacryloyloxymethyl) -2-methyloxetane, 3- (methacryloyloxymethyl) -3-ethyloxetane, 3- (methacryloyloxymethyl) -2- Trifluoromethyloxetane, 3- (methacryloyloxymethyl) -2-pentafluoroethyloxetane, 3- (methacryloyloxymethyl) -2-phenyloxetane, 3- (methacryloyloxymethyl) -2,2-difluorooxetane, 3- (Methacryloyloxymethyl) -2,2,4-trifluorooxetane, 3- (methacryloyloxymethyl) -2,2,4,4-tetrafluorooxetane, 3- (2-methacryloyloxyethyl) oxetane, 3- ( 2 Methacryloyloxyethyl) -2-ethyloxetane, 3- (2-methacryloyloxyethyl) -3-ethyloxetane, 3- (2-methacryloyloxyethyl) -2-trifluoromethyloxetane, 3- (2-methacryloyloxyethyl) ) -2-pentafluoroethyloxetane, 3- (2-methacryloyloxyethyl) -2-phenyloxetane, 3- (2-methacryloyloxyethyl) -2,2-difluorooxetane, 3- (2-methacryloyloxyethyl) Examples include -2,2,4-trifluorooxetane and 3- (2-methacryloyloxyethyl) -2,2,4,4-tetrafluorooxetane.

  Among these, from the viewpoint of reactivity and improvement of solvent resistance of the cured film for display element, glycidyl methacrylate, 2-methylglycidyl methacrylate, -6,7-epoxyheptyl methacrylate, o-vinylbenzylglycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, 3,4-epoxycyclohexyl methacrylate, glycidyl methacrylate, 2-methyl glycidyl methacrylate, and methacrylic acid-6,7-epoxy heptyl are more preferable. More preferred is glycidyl acid.

  As a content rate of a structural unit (a2), 5 mol%-60 mol% are preferable with respect to all the structural units which comprise an acryl-type polymer, and 10 mol%-50 mol% are more preferable. By setting the content ratio of the structural unit (a2) in the above range, a cured film for display element having excellent curability and the like can be formed.

[Structural unit (a3)]
The structural unit (a3) is at least one structural unit selected from the group consisting of a structural unit derived from an unsaturated carboxylic acid and a structural unit derived from an unsaturated carboxylic acid anhydride. Examples of the compound that gives the structural unit (a3) include unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, anhydrides of unsaturated dicarboxylic acids, mono [(meth) acryloyloxyalkyl] esters of polyvalent carboxylic acids, both terminals Examples thereof include a mono (meth) acrylate of a polymer having a carboxy group and a hydroxyl group, an unsaturated polycyclic compound having a carboxy group, and an anhydride thereof.

  As said unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid etc. are mentioned, for example. Examples of the unsaturated dicarboxylic acid include maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid and the like. As an anhydride of the above-mentioned unsaturated dicarboxylic acid, the anhydride of the compound illustrated as the above-mentioned dicarboxylic acid etc. are mentioned, for example. Examples of the mono [(meth) acryloyloxyalkyl] ester of the polyvalent carboxylic acid described above include mono [2- (meth) acryloyloxyethyl] succinate, mono [2- (meth) acryloyloxyethyl] phthalate, and the like. Is mentioned. Examples of the mono (meth) acrylate of the polymer having a carboxyl group and a hydroxyl group at both ends described above include ω-carboxypolycaprolactone mono (meth) acrylate. Examples of the unsaturated polycyclic compound having a carboxyl group and anhydrides thereof include 5-carboxybicyclo [2.2.1] hept-2-ene and 5,6-dicarboxybicyclo [2.2. 1] hept-2-ene, 5-carboxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [ 2.2.1] hept-2-ene anhydride and the like.

  Among these, monocarboxylic acid and dicarboxylic acid anhydrides are preferable, and (meth) acrylic acid and maleic anhydride are more preferable from the viewpoint of copolymerization reactivity, solubility in an alkaline aqueous solution, and availability.

  As a content rate of a structural unit (a3), 5 mol%-30 mol% are preferable with respect to all the structural units which comprise an acryl-type polymer, and 10 mol%-25 mol% are more preferable. By making the content rate of a structural unit (a3) into the above-mentioned range, the resin composition which is excellent in the sensitivity while optimizing the solubility with respect to the aqueous alkali solution of an acrylic polymer is obtained.

  The acrylic polymer may be an alkali-soluble resin that dissolves in an alkali developer (for example, a 0.40 mass% potassium hydroxide aqueous solution at 23 ° C.). The solubility with respect to aqueous alkali solution can be optimized because the resin composition of this embodiment contains an acrylic polymer as a [A] polymer. This acrylic polymer is preferably a copolymer. Moreover, when an acrylic polymer expresses alkali solubility, it is preferable to have a structural unit (a3).

  In addition, the acrylic polymer may have other structural units other than each above-mentioned structural unit in the range which does not impair the effect of this invention. Moreover, the acrylic polymer may have 2 or more types of each said structural unit.

[Other structural units]
As a compound which gives other structural units other than structural unit (a1)-structural unit (a3) which may be included as long as the acrylic polymer does not impair the effects of the present invention, for example, (meth) acrylic having a hydroxyl group Acid ester, (meth) acrylic acid chain alkyl ester, (meth) acrylic acid cyclic alkyl ester, (meth) acrylic acid aryl ester, unsaturated aromatic compound, conjugated diene, unsaturated compound having tetrahydrofuran skeleton, maleimide, etc. Is mentioned.

  Examples of the (meth) acrylic acid ester having a hydroxyl group described above include 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, and 6-hydroxyhexyl acrylate. , 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, 5-hydroxypentyl methacrylate, 6-hydroxyhexyl methacrylate, and the like.

  Examples of the (meth) acrylic acid chain alkyl ester include, for example, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, t-butyl methacrylate, 2-ethylhexyl methacrylate, and methacrylic acid. Isodecyl, n-lauryl methacrylate, tridecyl methacrylate, n-stearyl methacrylate, methyl acrylate, ethyl acrylate, n-butyl acrylate, sec-butyl acrylate, t-butyl acrylate, 2-ethylhexyl acrylate, Examples include isodecyl acrylate, n-lauryl acrylate, tridecyl acrylate, and n-stearyl acrylate.

  Examples of the above-mentioned (meth) acrylic acid cyclic alkyl ester include cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, tricyclo [5.2.1.02,6] decan-8-yl methacrylate, tricyclomethacrylate [ 5.2.1.02,6] decan-8-yloxyethyl, isobornyl methacrylate, cyclohexyl acrylate, 2-methylcyclohexyl acrylate, tricyclo [5.2.1.02,6] decan-8-yl acrylate, Examples include tricyclo [5.2.1.02,6] decan-8-yloxyethyl acrylate, isobornyl acrylate, and the like.

  Examples of the (meth) acrylic acid aryl ester include phenyl methacrylate, benzyl methacrylate, phenyl acrylate, and benzyl acrylate.

  Examples of the unsaturated aromatic compound include styrene, α-methylstyrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, p-methoxystyrene, and the like.

  Examples of the conjugated diene include 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene and the like.

  Examples of the unsaturated compound containing a tetrahydrofuran skeleton include tetrahydrofurfuryl (meth) acrylate, 2-methacryloyloxy-propionic acid tetrahydrofurfuryl ester, 3- (meth) acryloyloxytetrahydrofuran-2-one, and the like. It is done.

  Examples of the maleimide include N-phenylmaleimide, N-cyclohexylmaleimide, N-tolylmaleimide, N-naphthylmaleimide, N-ethylmaleimide, N-hexylmaleimide, N-benzylmaleimide and the like.

  Examples of the solvent used in the polymerization reaction for synthesizing the acrylic polymer include alcohol, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol monoalkyl ether, diethylene glycol dialkyl ether, dipropylene glycol dialkyl ether, and propylene glycol monoalkyl. Examples include ether, propylene glycol alkyl ether acetate, propylene glycol monoalkyl ether propionate, ketone, ester and the like.

  As the polymerization initiator used in the polymerization reaction for synthesizing the acrylic polymer, those generally known as radical polymerization initiators can be used. Examples of the radical polymerization initiator include 2,2′-azobisisobutyronitrile, 2,2′-azobis- (2,4-dimethylvaleronitrile), 2,2′-azobis- (4-methoxy-). 2,4-dimethylvaleronitrile) and the like.

  In the polymerization reaction for producing the acrylic polymer, a molecular weight modifier can be used to adjust the molecular weight. Examples of the molecular weight modifier include halogenated hydrocarbons such as chloroform and carbon tetrabromide; mercaptans such as n-hexyl mercaptan, n-octyl mercaptan, n-dodecyl mercaptan, t-dodecyl mercaptan, and thioglycolic acid; Examples thereof include xanthogens such as dimethylxanthogen sulfide and diisopropylxanthogen disulfide; terpinolene and α-methylstyrene dimer.

  As a polystyrene conversion weight average molecular weight (Mw) by the gel permeation chromatography (GPC) of an acrylic polymer, 1000-30000 are preferable and 5000-20000 are more preferable. By making Mw of an acrylic polymer into the above-mentioned range, the sensitivity and developability of the resin composition containing it as the [A] polymer can be enhanced.

(Siloxane polymer)
[Siloxane polymer (b)]
The siloxane polymer (b) that can be used as the siloxane polymer has (b1) a silane compound having a radically polymerizable organic group (hereinafter also referred to as (b1) compound) and (b2) having no radically polymerizable organic group. A polysiloxane having a radical polymerizable organic group obtained by cohydrolytic condensation with a silane compound (hereinafter also referred to as (b2) compound), wherein the proportion of the (b1) compound in the polysiloxane is 15 mol%. Polysiloxane exceeding.

  The compound (b1) is preferably a hydrolyzable silane compound represented by the following formula (1) or the following formula (2).

（式（１）中、Ｒ^１は炭素数１〜４のアルキル基を示し、Ｒ^２は単結合、メチレン基またはアルキレン基を示し、Ｘはビニル基、アリル基、スチリル基または（メタ）アクリロイル基を示す。）

(In formula (1), R ¹ represents an alkyl group having 1 to 4 carbon atoms, R ² represents a single bond, a methylene group or an alkylene group, and X represents a vinyl group, an allyl group, a styryl group or (meth) acryloyl). Group.)

（式（２）中、Ｒ^３は炭素数１〜４のアルキル基を示し、Ｒ^４およびＲ^５は単結合、メチレン基またはアルキレン基を示し、Ｙはビニル基、アリル基、スチリル基または（メタ）アクリロイル基を示し、Ｚは水素原子、炭素数１〜２０のアルキル基、炭素数６〜１４の置換若しくは非置換のアリール基、ハロゲン原子、エポキシ基、イソシアネート基、アミノ基、ビニル基、スチリル基または（メタ）アクリロイル基を示す。ｐは１または２の整数である。）

(In formula (2), R ³ represents an alkyl group having 1 to 4 carbon atoms, R ⁴ and R ⁵ represent a single bond, a methylene group or an alkylene group, and Y represents a vinyl group, an allyl group, a styryl group or ( Represents a (meth) acryloyl group, Z represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 14 carbon atoms, a halogen atom, an epoxy group, an isocyanate group, an amino group, a vinyl group, Represents a styryl group or a (meth) acryloyl group, p is an integer of 1 or 2)

Here, in the present invention, the “hydrolyzable silane compound” refers to a “silane compound having a hydrolyzable group”, and the “hydrolyzable group” as used herein is usually a silanol group by reaction with water. A group capable of forming (-Si-OH). On the other hand, the “non-hydrolyzable group” refers to a group that stably exists without forming a silanol group by reaction with water. In addition, “hydrolysis condensation” means a siloxane bond (—Si—O) by at least one of a dehydration condensation reaction between silanol groups generated by hydrolysis and a condensation reaction between silanol groups and hydrolyzable groups. -Si-) is formed. In the hydrolysis reaction, if generated silanol groups from a portion of the hydrolyzable groups, it may be unhydrolyzed group (-OR ¹ or -OR ³⁾ is left, ie the siloxane polymer (b) it may have at least one of -OR ¹ and -OR ³ in a part of.

The alkyl group in R ¹ , R ³ and Z may be linear or branched. As the alkyl group in R ¹ and R ^3, an alkyl group having 1 to 2 carbon atoms is preferable from the viewpoint of the hydrolytic condensation reactivity. Moreover, as an alkyl group in Z, a C1-C6, especially 1-4 alkyl group is preferable.

The alkylene group for R ^{2, R 4} and ^{R 5,} preferably an alkylene group having 2 to 6 carbon atoms, particularly preferably an alkylene group having 2 to 3 carbon atoms. This alkylene group may be linear or branched, and specific examples include an ethylene group, a trimethylene group, and a propylene group.

  The (meth) acryloyl group in X, Y and Z is a concept including an acryloyl group and a methacryloyl group. In addition, the substitution position of the vinyl group on the aromatic ring of the styryl group is not particularly limited, and may be the ortho position, the meta position, or the para position.

  Examples of the aryl group for Z include monocyclic to tricyclic aromatic hydrocarbon groups. The aryl group may have a substituent as long as it has 6 to 14 carbon atoms. Examples of the substituent include an alkyl group having 1 to 6 carbon atoms, a halogen atom, a hydroxyl group, an amino group, and a nitro group. , A cyano group, a carboxyl group, and an alkoxy group. Examples of the aryl group include a phenyl group and a naphthyl group. Examples of the substituted aryl group include a tolyl group.

In the above formula (1), R ¹ is preferably an alkyl group having 1 to 2 carbon atoms, R ² is preferably a single bond or an alkylene group having 2 to 3 carbon atoms, and X is a vinyl group or (meth) acryloyl. Groups are preferred.
In the above formula (2), R ³ is preferably an alkyl group having 1 to 2 carbon atoms, R ⁴ and R ⁵ are preferably a single bond or an alkylene group having 2 to 3 carbon atoms, and Y is a vinyl group or ( A (meth) acryloyl group is preferred, and Z is preferably an alkyl group having 1 to 6 carbon atoms. Further, p is preferably 1.

  Specific examples of the compound represented by the above formula (1) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltripropoxysilane, o-styryltrimethoxysilane, o-styryltriethoxysilane, m-styryltrimethoxysilane. M-styryltriethoxysilane, p-styryltrimethoxysilane, p-styryltriethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, methacryloxytrimethoxysilane, methacryloxytriethoxysilane, methacryloxytripropoxysilane, Acryloxytrimethoxysilane, acryloxytriethoxysilane, acryloxytripropoxysilane, 2-methacryloxyethyltrimethoxysilane, 2-methacryloxyethyltriethoxysilane, 2- Tacryloxyethyl tripropoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropyltripropoxysilane, 2-acryloxyethyltrimethoxysilane, 2-acryloxyethyltriethoxy Silane, 2-acryloxyethyltripropoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3-acryloxypropyltripropoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryl Examples include loxypropyltriethoxysilane and 3-methacryloxypropyltripropoxysilane. These may be used alone or in combination of two or more.

  Specific examples of the compound represented by the above formula (2) include vinylmethyldimethoxysilane, vinylmethyldiethoxysilane, vinylphenyldimethoxysilane, vinylphenyldiethoxysilane, vinyldimethylmethoxysilane, vinyldimethylethoxysilane, allylmethyldimethoxy. Silane, allylmethyldiethoxysilane, allyldimethylmethoxysilane, allyldimethylethoxysilane, divinylmethylmethoxysilane, divinylmethylethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-acryloxypropylmethyldimethoxysilane, 3-methacryloxy Propylphenyldimethoxysilane, 3-acryloxypropylphenyldimethoxysilane, 3,3′-dimethacryloxypropyldimethoxysilane, , 3'-diacryloxy propyl dimethoxy silane, 3,3 ', 3' '- tri methacryloxypropyl methoxysilane, 3,3', 3 '' - tri methacryloxypropyl silane, and the like. These may be used alone or in combination of two or more.

  Among the compounds represented by the above formula (1) and the above formula (2), the adhesion to crack resistance, surface hardness, conductive pattern and the like can be achieved at a high level, and from the viewpoint of the hydrolysis condensation reactivity, in particular Vinyltrimethoxysilane, p-styryltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltriethoxysilane, 3- Methacryloxypropylmethyldimethoxysilane, 3-acryloxypropylmethyldimethoxysilane and the like are preferable.

  The (b2) compound is preferably a hydrolyzable silane compound represented by the following formula (3).

(In formula (3), R ⁶ represents an alkyl group having 1 to 4 carbon atoms, R ⁷ represents a single bond, a methylene group or an alkylene group, and W represents a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms. A substituted or unsubstituted aryl group having 6 to 14 carbon atoms, an amino group, a mercapto group, an epoxy group, a glycidyloxy group, or a 3,4-epoxycyclohexyl group, and q is an integer of 0 to 3.)

The alkyl group in R ⁶ include the same as R ¹ in the formula (1), the alkyl group and aryl group in W include the same Z in the formula (2), in R ⁷ Examples of the alkylene group include the same groups as R ^{5 in the} above formula (2). Examples of the substituent of the alkyl group and aryl group in W include the same substituents as the substituent of the aryl group in Z of the above formula (2).

R ⁷ is preferably a single bond or an alkylene group having 2 to 3 carbon atoms, and W is a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 8 carbon atoms, or glycidyl. An oxy group is preferred. In addition, as a substituent of an alkyl group or an aryl group, a halogen atom is preferable. Further, q is preferably 0 or 1.

  As the hydrolyzable silane compound represented by the above formula (3), a silane compound having four hydrolyzable groups, a silane compound having one non-hydrolyzable group and three hydrolyzable groups Mention may be made of silane compounds having two non-hydrolyzable groups and two hydrolyzable groups, or mixtures thereof.

As a specific example of such a hydrolyzable silane compound,
As a silane compound having four hydrolyzable groups, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, tetraphenoxysilane, tetrabenzyloxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane and the like;
As a silane compound having one non-hydrolyzable group and three hydrolyzable groups, methyltrimethoxysilane, methyltriethoxysilane, methyltri-i-propoxysilane, methyltributoxysilane, ethyltrimethoxysilane, Ethyltriethoxysilane, ethyltri-i-propoxysilane, ethyltributoxysilane, butyltrimethoxysilane, decyltrimethoxysilane, trifluoropropyltrimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, aminotrimethoxysilane, amino Triethoxysilane, 3-mercaptopropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxy, γ-glycidoxypropyltrimethoxysilane and the like;
Examples of the silane compound having two non-hydrolyzable groups and two hydrolyzable groups include dimethyldimethoxysilane, diphenyldimethoxysilane, dibutyldimethoxysilane, and 3-mercaptopropylmethyldimethoxysilane. These may be used alone or in combination of two or more.

  Of these hydrolyzable silane compounds, a silane compound having four hydrolyzable groups and a silane compound having one non-hydrolyzable group and three hydrolyzable groups are preferred. A silane compound having a non-hydrolyzable group and three hydrolyzable groups is particularly preferred. Specific examples of preferable hydrolyzable silane compounds include tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltri-i-propoxysilane, methyltributoxysilane, phenyltrimethoxysilane, ethyltrimethoxysilane, ethyltrimethoxysilane. Examples include ethoxysilane, ethyltriisopropoxysilane, ethyltributoxysilane, butyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, decyltrimethoxysilane, and trifluoropropyltrimethoxysilane.

  The proportion of the (b1) compound in the siloxane polymer (b) obtained by the cohydrolysis condensation reaction of the (b1) compound and the (b2) compound exceeds 15 mol%, but is 16 mol% or more, particularly 18 mol%. The above is preferable. (B1) When the ratio of a compound is 15 mol% or less, exposure sensitivity falls and the heat resistance of the cured film obtained, adhesiveness, and resolution fall. In addition, the upper limit of the ratio of the (b1) compound of the siloxane polymer (b) is preferably 50 mol%, further 40 mol%, particularly 30 mol% from the viewpoint of crack resistance, heat resistance, and adhesion.

  The condition for cohydrolyzing and condensing the (b1) compound and the (b2) compound is that at least a part of the (b1) compound and the (b2) compound is hydrolyzed to convert the hydrolyzable group into a silanol group. And as long as it causes a condensation reaction, although it does not specifically limit, the following method can be mentioned as an example.

A method in which the (b1) compound and the (b2) compound are mixed in a solvent, water is added to the mixed solution, and hydrolytic condensation is preferably employed.
As the water used for the cohydrolysis condensation reaction between the (b1) compound and the (b2) compound, it is preferable to use water purified by a method such as reverse osmosis membrane treatment, ion exchange treatment, or distillation. By using such purified water, side reactions can be suppressed and the reactivity of hydrolysis can be improved. The amount of water used is preferably from 0.1 mol to 3 mol, more preferably from 0.3 mol to 2 mol, relative to 1 mol of the total amount of hydrolyzable groups in the (b1) compound and (b2) compound, More preferably, it is 0.5 mol-1.5 mol. By using such an amount of water, the reaction rate of the hydrolysis condensation can be optimized.

  Although it does not specifically limit as a solvent used for the cohydrolysis condensation reaction of a (b1) compound and a (b2) compound, Usually, the thing similar to the solvent used for preparation of the resin composition mentioned later is used. Can be used. Preferable examples of such a solvent include ethylene glycol monoalkyl ether acetate, diethylene glycol dialkyl ether, propylene glycol monoalkyl ether, propylene glycol monoalkyl ether acetate, and propionic acid esters. These may be used alone or in combination of two or more. Among these solvents, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether acetate or methyl 3-methoxypropionate is particularly preferable.

  The cohydrolysis condensation reaction between the (b1) compound and the (b2) compound is preferably an acid catalyst (for example, hydrochloric acid, sulfuric acid, nitric acid, formic acid, oxalic acid, acetic acid, trifluoroacetic acid, trifluoromethanesulfonic acid, phosphoric acid, Acidic ion exchange resins, various Lewis acids), base catalysts (for example, ammonia, primary amines, secondary amines, tertiary amines, nitrogen-containing compounds such as pyridine; basic ion exchange resins; sodium hydroxide, etc. It is carried out in the presence of a catalyst such as hydroxide; carbonate such as potassium carbonate; carboxylate such as sodium acetate; various Lewis bases] or alkoxide (for example, zirconium alkoxide, titanium alkoxide, aluminum alkoxide). As the aluminum alkoxide, for example, tri-i-propoxy aluminum can be used. The amount of the catalyst used is preferably 0.2 mol or less, more preferably 0.00001, based on the total of 1 mol of the compound (b1) and the compound (b2), from the viewpoint of promoting the hydrolysis condensation reaction. Mol to 0.1 mol.

  Although the reaction temperature and reaction time in the cohydrolysis condensation reaction of the (b1) compound and the (b2) compound can be appropriately set, for example, the following conditions can be employed. The reaction temperature is preferably 40 ° C to 200 ° C, more preferably 50 ° C to 150 ° C. The reaction time is preferably 30 minutes to 24 hours, more preferably 1 hour to 12 hours. By setting such reaction temperature and reaction time, the hydrolysis condensation reaction can be performed most efficiently. In this hydrolysis-condensation reaction, the hydrolyzable silane compound, water and catalyst may be added to the reaction system at a time and the reaction may be performed in one step, or the hydrolyzable silane compound, water and catalyst may be The hydrolysis reaction and the condensation reaction may be performed in multiple stages by adding them into the reaction system in several times. Incidentally, after the hydrolysis condensation reaction, water and the produced alcohol can be removed from the reaction system by adding a dehydrating agent and then subjecting it to evaporation. The dehydrating agent used at this stage is generally consumed or adsorbed by excess water, or the dehydrating capacity is completely consumed or removed by evaporation.

The molecular weight of the siloxane polymer (b) obtained by the hydrolysis condensation reaction can be measured as a weight average molecular weight in terms of polystyrene using GPC (gel permeation chromatography) using tetrahydrofuran as a mobile phase. The weight average molecular weight (Mw) of the siloxane polymer (b) is preferably in the range of 500 to 10,000, and more preferably in the range of 1000 to 5000. By setting the value of the weight average molecular weight of the siloxane polymer (b) to 500 or more, the film formability of the coating film of the resin composition containing it can be improved. On the other hand, by setting the weight average molecular weight to 10,000 or less, it is possible to prevent a decrease in alkali developability of the resin composition containing the same.
The ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) measured under the same conditions, that is, the degree of dispersion (Mw / Mn) is preferably 1.0 to 15.0, more preferably 1 .1 to 10.0, more preferably 1.1 to 5.0. By setting it within such a range, it is possible to achieve both alkali developability, adhesion, and crack resistance.

[Siloxane polymer (b-II)]
The siloxane polymer (b-II) is a polysiloxane obtained by hydrolytic condensation of a silane compound having no radical polymerizable organic group. By using the siloxane polymer (b) and the siloxane polymer (b-II) in combination, compared with the case where only the siloxane polymer (b) is used, from the resin composition containing it as the [A] polymer. It becomes possible to achieve crack resistance, heat resistance, adhesion and resolution of the formed cured film at a high level.

The siloxane polymer (b-II) undergoes (co) hydrolytic condensation of at least one hydrolyzable silane compound represented by the above formula (3) under the same conditions as the siloxane polymer (b). Can be obtained at
The weight average molecular weight (Mw) of the siloxane polymer (b-II) obtained by the hydrolytic condensation reaction can be measured under the same conditions as for the siloxane polymer (b). From the viewpoints of properties and developability, it is preferably 500 to 10000, more preferably 1000 to 5000.
Further, the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) measured under the same conditions, that is, the dispersity (Mw / Mn) is preferably from the viewpoint of alkali developability, adhesion, and crack resistance. Is 1.0 to 15.0, more preferably 1.1 to 10.0, and still more preferably 1.1 to 5.0.

The proportion of the siloxane polymer (b) and the siloxane polymer (b-II) used is a radically polymerizable organic occupying the bonding groups on all Si atoms in the siloxane polymer (b) and the siloxane polymer (b-II). It is preferable to adjust appropriately so that the group content is 1 mol% to 20 mol%, further 5 mol% to 18 mol%, particularly 10 mol% to 15 mol%. Adhesiveness of the cured film formed from the resin composition containing the siloxane polymer (b) and the siloxane polymer (b-II) within the above range as the [A] polymer. Crack resistance, heat resistance, and scratch resistance can be achieved at a high level. In addition, when the resin composition of this embodiment contains a siloxane polymer as a [A] polymer, since it contains a radically polymerizable organic group in the above-mentioned ratio, it can have radiation sensitivity.
In addition, the radically polymerizable organic group in the polysiloxane can be qualitatively and quantitatively analyzed by ¹ H-NMR, ¹³ C-NMR, FT-IR, and pyrolysis gas chromatography mass spectrometry.

(Epoxy resin)
Examples of the epoxy resin (c) used in the resin composition of the present embodiment include a phenol novolak type, a cresol novolak type, a bisphenol A type, a bisphenol F type, a hydrogenated bisphenol A type, a hydrogenated bisphenol F type, and a bisphenol S. Type, trisphenolmethane type, tetraphenolethane type, bixylenol type or biphenol type epoxy resin; alicyclic or heterocyclic epoxy resin; epoxy resin having a dicyclopentadiene type or naphthalene type structure.
The resin composition of this embodiment containing an epoxy resin (c) can form a cured film having excellent adhesion to various substrates (eg, copper substrate, polyimide film).
In addition, the epoxy resin in this invention shall not contain the acrylic polymer which has a structural unit derived from the monomer containing the epoxy group by the glycidyl methacrylate etc. demonstrated in [structural unit (a2)].

Various commercially available products can be used as the epoxy resin (c), and TECHMORE (registered trademark) VG3101L (trade name; manufactured by Mitsui Chemicals, Inc.), Epicoat 828, 834, 1001 and 1004 (trade names). Manufactured by Japan Epoxy Resin Co., Ltd.), Epicron 840, 850, 1050, 1050, 2055 (trade name; manufactured by DIC), Epotot YD-011, YD-013, YD-127, YD-128 (trade names) Manufactured by Toto Kasei Co., Ltd.), D.E.R. 317, 331, 661, 664 (trade name; manufactured by Dow Chemical Co.), Araldide 6071, 6084, GY250, GY260 (trade name; Ciba Specialty Chemicals), Sumi-Epoxy ESA-011, ESA-014, ELA-115, ELA-128 (trade name) Bisphenol A type epoxy resins such as A.E.R. 330, 331, 661, 664 (trade name; manufactured by Asahi Kasei Kogyo);
Epicoat 152, 154 (trade name; manufactured by Japan Epoxy Resin Co., Ltd.), D.E.R. 431, 438 (trade name; manufactured by Dow Chemical Company), Epicron N-730, N-770, N-865 (Trade name; manufactured by DIC Corporation), Epototo YDCN-701, YDCN-704 (trade name; manufactured by Toto Kasei Co., Ltd.), Araldide ECN1235, ECN1273, ECN1299 (trade name; manufactured by Ciba Specialty Chemicals), XPY307 EPPN (registered trademark) -201, EOCN (registered trademark) -1025, EOCN (registered trademark) -1020, EOCN (registered trademark) -104S, RE-306 (trade name; manufactured by Nippon Kayaku Co., Ltd.), Sumie Epoxy ESCN -195X, ESCN-220 (trade name; manufactured by Sumitomo Chemical Co., Ltd.), AER ECN-235, EC -299 (trade name; ADEKA Co., Ltd.) novolak type such as an epoxy resin;
Epicron 830 (trade name; manufactured by DIC), JER (registered trademark) 807 (trade name; manufactured by Japan Epoxy Resin), Epototo YDF-170 (trade name; manufactured by Tohto Kasei), YDF-175, YDF-2001, Bisphenol F type epoxy resin such as YDF-2004, Araldide XPY306 (trade name; manufactured by Ciba Specialty Chemicals); Epototo ST-2004, ST-2007, ST-3000 (trade name; manufactured by Tohto Kasei Co., Ltd.), etc. Hydrogenated bisphenol A type epoxy resin;
Alicyclic epoxy resins such as Celoxide (registered trademark) 2021 (trade name; manufactured by Daicel Chemical Industries), Araldide CY175, CY179, and CY184 (trade names; manufactured by Ciba Specialty Chemicals);
Trihydroxyphenylmethane type epoxy resins such as YL-933 (trade name; manufactured by Japan Epoxy Resin Co., Ltd.), EPPN (registered trademark) -501, EPPN (registered trademark) -502 (trade name; manufactured by Dow Chemical Company); YL- Bixylenol type or biphenol type epoxy resins such as 6056, YX-4000, YL-6121 (trade name; manufactured by Japan Epoxy Resin Co., Ltd.) or mixtures thereof;
Bisphenol S type epoxy resins such as EBPS-200 (trade name; manufactured by Nippon Kayaku Co., Ltd.), EPX-30 (trade name; manufactured by ADEKA), EXA-1514 (trade name; manufactured by DIC); JER (registered trademark) 157S (trade name; manufactured by Japan Epoxy Resin Co., Ltd.) and other bisphenol A novolak type epoxy resins; YL-931 (trade name; manufactured by Japan Epoxy Resin Co., Ltd.), Araldide 163 (trade name; manufactured by Ciba Specialty Chemicals Co., Ltd.), etc. Tetraphenylolethane type epoxy resin;
Heterocyclic epoxy resins such as Araldide PT810 (trade name; manufactured by Ciba Specialty Chemicals) and TEPIC (registered trademark) (trade name; manufactured by Nissan Chemical Industries); HP-4032, EXA-4750, EXA-4700 ( Naphthalene-containing epoxy resins such as trade name; manufactured by DIC); and epoxy resins having a dicyclopentadiene skeleton such as HP-7200, HP-7200H, and HP-7200HH (trade name; manufactured by DIC).

  Among these epoxy resins (c), aromatic epoxy resins such as phenol novolac type epoxy resins, cresol novolac type epoxy resins, bisphenol A type epoxy resins, and bisphenol F type epoxy resins are preferable from the viewpoint of curability.

Moreover, the epoxy group in the epoxy resin is reacted with a (meth) acryloyl group-containing monocarboxylic acid to open the epoxy group to form a hydroxyl group, and a polyvalent carboxylic acid or polyvalent carboxylic acid is partially formed on the hydroxyl group. A modified epoxy resin having both an epoxy group, a carboxyl group, and a (meth) acryloyl group obtained by reacting an anhydride can be used. The modified epoxy resin means that a part of the epoxy group in the epoxy resin is modified to a carboxyl group or a (meth) acryloyl group.
By modifying some of the epoxy groups in such epoxy resins to carboxyl groups or (meth) acryloyl groups, alkali solubility can be imparted by carboxyl groups, and radical polymerizability is imparted by (meth) acryloyl groups. It becomes possible to do.

Examples of the (meth) acryloyl group-containing monocarboxylic acid include methacrylic acid and acrylic acid.
Examples of the polyvalent carboxylic acid and polyvalent carboxylic acid anhydride include oxalic acid, succinic acid, phthalic acid, adipic acid, dodecanedioic acid, dodecenyl succinic acid, pentadecenyl succinic acid, and octadecenyl succinic acid. Aliphatic saturated polycarboxylic acids; tetrahydrophthalic acid, hexahydrophthalic acid, methyltetrahydrophthalic acid, trimellitic acid, pyromellitic acid, biphenyltetracarboxylic acid and naphthalenetetracarboxylic acid) (E.g., aliphatic saturated polycarboxylic anhydrides such as succinic anhydride, dodecenyl succinic anhydride, pentadecenyl succinic anhydride and octadecenyl succinic anhydride; phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, Methyltetrahydrophthalic anhydride, anhydrous Mellitic acid, pyromellitic anhydride, biphenyltetracarboxylic acid anhydride and naphthalene tetracarboxylic acid anhydride and aromatic polycarboxylic acid anhydrides) and the like.
A saturated polycarboxylic acid anhydride is preferable from the viewpoint of reactivity and developability.

The reaction time between the (meth) acryloyl group-containing monocarboxylic acid and the epoxy group in the epoxy resin is not particularly limited, but is preferably 70 ° C to 110 ° C. The reaction time is not particularly limited, but is preferably 5 hours to 30 hours. Further, if necessary, a catalyst (for example, triphenylphosphine) and a radical polymerization inhibitor (hydroquinone, p-methoxyphenol, etc.) may be used.
The charge equivalent of the polyvalent carboxylic acid or polyvalent carboxylic acid anhydride relative to the weight of the (meth) acrylic acid adduct is such that the acid value of the obtained resin is preferably 10 mgKOH / g to 500 mgKOH / g. The charge equivalent is preferred.
The reaction temperature in the reaction between the (meth) acrylic acid adduct and the polyvalent carboxylic acid or polyvalent carboxylic acid anhydride is not particularly limited, but is preferably 70 ° C to 110 ° C. The reaction time is not particularly limited, but is preferably 3 hours to 10 hours.

<[B] Surfactant>
The resin composition of the embodiment of the present invention contains [B] a surfactant. In the resin composition of the present embodiment, the content of [B] surfactant is 0.5 part by mass to 10 parts by mass with respect to 100 parts by mass of the resin composition. When a film is formed using the resin composition of the present embodiment, [B] surfactant is localized on the surface of the formed film. As a result, the contact angle of the conductive film forming ink with respect to the film increases, so that the penetration of the conductive film forming ink into the film can be suppressed, and wetting and spreading of the conductive film forming ink can be prevented. Therefore, when a base film is formed using the resin composition of the present embodiment, a conductive film forming ink can be used and a high-definition conductive pattern can be formed thereon.

  In addition, since the resin composition of this embodiment contains [B] surfactant, on the base film formed using it, the contact angle with respect to the base film of conductive film formation ink becomes high, and control is carried out. There is concern about the generation of invisible repels. However, the resin composition of this embodiment can suppress the occurrence of such repellency due to the effect of containing the [A] polymer selected as described above. From such a viewpoint, a surfactant containing a silicon atom in the molecule is more preferable.

  [B] As the surfactant, nonionic surfactants, fluorine surfactants, and silicone surfactants are preferable.

  Nonionic surfactants include, for example, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, and polyoxyethylene oleyl ether; polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, and the like And polyoxyethylene aryl ethers; polyethylene glycol dialkyl esters such as polyethylene glycol dilaurate and polyethylene glycol distearate; and (meth) acrylic acid copolymers. As an example of (meth) acrylic acid-based copolymers, Polyflow No. 57, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.).

  Examples of the fluorosurfactant include 1,1,2,2-tetrafluorooctyl (1,1,2,2-tetrafluoropropyl) ether, 1,1,2,2-tetrafluorooctyl hexyl ether, Octaethylene glycol di (1,1,2,2-tetrafluorobutyl) ether, hexaethylene glycol (1,1,2,2,3,3-hexafluoropentyl) ether, octapropylene glycol di (1,1,1) 2,2-tetrafluorobutyl) ether, hexapropylene glycol di (1,1,2,2,3,3-hexafluoropentyl) ether and other fluoroethers; sodium perfluorododecylsulfonate; 1,1,2 2,8,8,9,9,10,10-decafluorododecane, 1,1,2,2,3,3-hex Fluoroalkanes such as fluorodecane; sodium fluoroalkylbenzenesulfonates; fluoroalkyloxyethylene ethers; fluoroalkylammonium iodides; fluoroalkylpolyoxyethylene ethers; perfluoroalkylpolyoxyethanols; perfluoroalkylalkoxylates And fluorinated alkyl esters.

  Commercially available products of these fluorosurfactants include F-top EF301, 303, and 352 (manufactured by Shin-Akita Kasei Co., Ltd.), MegaFac (registered trademark) F171, 172, and 173 (manufactured by Dainippon Ink and Co., Ltd.). , FLORARD FC430, 431 (manufactured by Sumitomo 3M), Asahi Guard (registered trademark) AG710, Surflon (registered trademark) S-382, SC-101, 102, 103, 104, 105, 106 (manufactured by Asahi Glass Co., Ltd.) ), FTX-218 (manufactured by Neos Co., Ltd.) and the like.

  Examples of silicone-based surfactants are SH200-100cs, SH28PA, SH30PA, ST89PA, SH190 (manufactured by Toray Dow Corning Silicone), organosiloxane polymer KP341 (Shin-Etsu Chemical Co., Ltd.) )) And the like.

  [B] Surfactants may be used alone or in admixture of two or more. [B] The amount of the surfactant used is preferably 0.5 to 10 parts by mass, and preferably 0.7 to 10 parts by mass with respect to 100 parts by mass of the [A] polymer. Yes, and more preferably 1.0 to 8 parts by mass. From the viewpoint of obtaining an effect of forming a base film using the resin composition of the present embodiment and forming a high-definition conductive pattern thereon, the amount of [D] surfactant used is 0.5 mass. It is preferable that it is more than part. Moreover, from the viewpoint of obtaining the effect of improving the film formability on the substrate of the resin composition of the present embodiment, the amount of [B] surfactant used is preferably 10 parts by mass or less.

<[C] Polymerizable compound having an ethylenically unsaturated bond>
The resin composition according to the first embodiment of the present invention contains the above-described [A] polymer, [B] a surfactant, and a solvent described later, and further includes [C] an ethylenically unsaturated bond. And a polymerizable compound having a [D] radiation-sensitive polymerization initiator described later. The resin composition of the present embodiment contains [C] a polymerizable compound having an ethylenically unsaturated bond, and [D] a radiation-sensitive polymerization initiator, so that it can be cured with high sensitivity by radiation irradiation. It can be carried out. That is, the resin composition of the present embodiment contains [C] a polymerizable compound having an ethylenically unsaturated bond, and [D] a radiation-sensitive polymerization initiator, whereby a highly sensitive radiation-sensitive resin composition. It can be suitably used as a product.

[C] The polymerizable compound having an ethylenically unsaturated bond is an unsaturated compound that is polymerized by irradiation with radiation in the presence of a radiation sensitive polymerization initiator [D] described later. However, [A] polymer is excluded.
As such a polymerizable unsaturated monomer, a monofunctional, bifunctional, or trifunctional or higher (meth) acrylic acid ester is used from the viewpoint of good polymerizability and improved strength of the obtained cured film. preferable.

  Examples of monofunctional (meth) acrylic acid esters include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, diethylene glycol monoethyl ether acrylate, diethylene glycol monoethyl ether methacrylate, (2-acryloyloxyethyl) (2-hydroxypropyl) Examples include phthalate, (2-methacryloyloxyethyl) (2-hydroxypropyl) phthalate, and ω-carboxypolycaprolactone monoacrylate. As a commercial item, for example, Aronix (registered trademark) M-101, M-111, M-114, M-5300 (above, Toagosei Co., Ltd.); KAYARAD (registered trademark) TC-110S, TC- 120S (above, Nippon Kayaku Co., Ltd.); Biscoat 158, 2311 (above, Osaka Organic Chemical Industry Co., Ltd.) and the like.

  Examples of the bifunctional (meth) acrylic acid ester include ethylene glycol diacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, tetraethylene glycol diacrylate, and tetraethylene glycol. Examples include dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol diacrylate, 1,9-nonanediol dimethacrylate, and the like. As a commercial item, for example, Aronix (registered trademark) M-210, M-240, M-6200 (above, Toagosei Co., Ltd.); KAYARAD (registered trademark) HDDA, HX-220, R-604 ( As mentioned above, Nippon Kayaku Co., Ltd.); Biscoat 260, 312 and 335HP (Osaka Organic Chemical Co., Ltd.); Light acrylate 1,9-NDA (Kyoeisha Chemical Co., Ltd.) and the like can be mentioned.

  Examples of the trifunctional or higher functional (meth) acrylic acid ester include trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol. Pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, ethylene oxide modified dipentaerythritol hexaacrylate, tri (2-acryloyloxy) Ethyl) Pho Fate, tri (2-methacryloyloxyethyl) phosphate, succinic acid modified pentaerythritol triacrylate, succinic acid modified dipentaerythritol pentaacrylate, tris (acryloxyethyl) isocyanurate, linear alkylene group and alicyclic structure And a compound having two or more isocyanate groups and a compound having one or more hydroxyl groups in the molecule and having three, four or five (meth) acryloyloxy groups The polyfunctional urethane acrylate type compound etc. which are obtained by making it contain are mentioned. Examples of commercially available products include Aronix (registered trademark) M-309, M-315, M-400, M-405, M-450, M-7100, M-8030, and M-8060. TO-1450 (above, Toagosei Co., Ltd.); KAYARAD (registered trademark) TMPTA, DPHA, DPCA-20, DPCA-30, DPCA-60, DPCA-120, DPEA-12 (above, Nippon Kayaku Co., Ltd.); Biscoat 295, 300, 360, GPT, 3PA, 400 (Osaka Organic Chemical Co., Ltd.); commercial products containing polyfunctional urethane acrylate compounds include New Frontier ( Registered trademark) R-1150 (Daiichi Kogyo Seiyaku Co., Ltd.), KAYARAD (registered trademark) DPHA-40H (Nippon Kayaku Co., Ltd.) and the like.

  Among these polymerizable compounds having [C] ethylenically unsaturated bond, ω-carboxypolycaprolactone monoacrylate, 1,9-nonanediol dimethacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate , Dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, mixtures of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate, ethylene oxide modified dipentaerythritol hexaacrylate, succinic acid modified pentaerythritol triacrylate, succinic acid modified di Commercially available products containing pentaerythritol pentaacrylate and polyfunctional urethane acrylate compounds Etc. are preferred. Among them, a tri- or higher functional (meth) acrylic acid ester is preferable, and a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate is particularly preferable.

  [C] The polymerizable compound having an ethylenically unsaturated bond may be used alone or in admixture of two or more. [C] The amount of the polymerizable compound having an ethylenically unsaturated bond is preferably 5 to 300 parts by mass with respect to 100 parts by mass in total of the [A] polymer and [B] surfactant. Mass parts to 200 parts by mass are more preferable, and 20 parts to 100 parts by mass are even more preferable. [C] By using the polymerizable compound having an ethylenically unsaturated bond in the above-mentioned range, the sensitivity of the resin composition of the present embodiment containing the polymerizable compound, the surface height of the cured film obtained, and the heat resistance Is even better.

<[D] Radiation sensitive polymerization initiator>
Examples of the radiation-sensitive polymerization initiator (hereinafter also referred to as “radical polymerization initiator”) used in the present invention include O-acyl oxime compounds, acetophenone compounds, biimidazole compounds and the like.

  Specific examples of the O-acyloxime compound include ethanone-1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -1- (O-acetyloxime), 1- [ 9-ethyl-6-benzoyl-9. H. -Carbazol-3-yl] -octane-1-one oxime-O-acetate, 1- [9-ethyl-6- (2-methylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-benzoate, 1- [9-n-butyl-6- (2-ethylbenzoyl) -9. H. -Carbazol-3-yl] -ethane-1-one oxime-O-benzoate, ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranylbenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydropyranylbenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofuranylbenzoyl) -9. H. -Carbazole-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- {2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) methoxybenzoyl } -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranylmethoxybenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime) and the like. These O-acyloxime compounds can be used alone or in admixture of two or more.

  Among these, preferable O-acyloxime compounds include ethanone-1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -1- (O-acetyloxime), Ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranylmethoxybenzoyl) -9. H. -Carbazole-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- {2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) methoxybenzoyl } -9. H. -Carbazol-3-yl] -1- (O-acetyloxime).

  Examples of acetophenone compounds include α-aminoketone compounds and α-hydroxyketone compounds.

  Specific examples of the α-aminoketone compound include 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2-dimethylamino-2- (4-methylbenzyl) -1 -(4-Morpholin-4-yl-phenyl) -butan-1-one, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one and the like can be mentioned.

  Specific examples of the α-hydroxyketone compound include 1-phenyl-2-hydroxy-2-methylpropan-1-one, 1- (4-i-propylphenyl) -2-hydroxy-2-methylpropane-1- ON, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl phenylketone and the like. These acetophenone compounds can be used alone or in admixture of two or more.

  Of these acetophenone compounds, α-aminoketone compounds are preferred, and 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one, 2- Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one is particularly preferred.

  Specific examples of the biimidazole compound include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) -1,2′-biimidazole, 2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2 ′ -Biimidazole etc. can be mentioned. These biimidazole compounds can be used alone or in admixture of two or more.

  Among these biimidazole compounds, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2, 4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5 5'-tetraphenyl-1,2'-biimidazole is preferred, 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole Is particularly preferred.

  In the resin composition of the present embodiment, when a biimidazole compound is used as the [D] radiation-sensitive polymerization initiator, an aliphatic or aromatic compound having a dialkylamino group (hereinafter, “ Amino sensitizer ") can be added.

  Examples of such amino sensitizers include 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (diethylamino) benzophenone. Of these amino sensitizers, 4,4'-bis (diethylamino) benzophenone is particularly preferred. These amino sensitizers can be used alone or in admixture of two or more.

  Furthermore, when a biimidazole compound and an amino sensitizer are used in combination, a thiol compound can be added as a hydrogen radical donor. A biimidazole compound is sensitized by an amino sensitizer and cleaved to generate an imidazole radical, but may not exhibit high polymerization initiation ability as it is. However, by adding a thiol compound to a system in which a biimidazole compound and an amino sensitizer coexist, a hydrogen radical is donated from the thiol compound to the imidazole radical. As a result, the imidazole radical is converted to neutral imidazole, and a component having a sulfur radical having a high polymerization initiating ability is generated, and a cured film having a high surface hardness can be formed even with a low radiation dose. .

As a specific example of such a thiol compound,
Aromatic thiol compounds such as 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-5-methoxybenzothiazole;
Aliphatic monothiol compounds such as 3-mercaptopropionic acid and methyl 3-mercaptopropionate;
Bifunctional or higher aliphatic thiol compounds such as pentaerythritol tetra (mercaptoacetate) and pentaerythritol tetra (3-mercaptopropionate) can be exemplified. These thiol compounds can be used alone or in admixture of two or more.
Among these thiol compounds, 2-mercaptobenzothiazole is particularly preferable.

  When a biimidazole compound and an amino sensitizer are used in combination, the use amount of the amino sensitizer is preferably 0.1 parts by mass to 50 parts by mass with respect to 100 parts by mass of the biimidazole compound. More preferably, it is 1 mass part-20 mass parts. By making the usage-amount of an amino sensitizer into the said range, the cure reactivity at the time of exposure can improve and the surface hardness of the cured film obtained can be raised.

  Moreover, when using together a biimidazole compound, an amino type sensitizer, and a thiol compound, as the usage-amount of a thiol compound, Preferably it is 0.1 mass part-50 mass parts with respect to 100 mass parts of biimidazole compounds. More preferably, it is 1 mass part-20 mass parts. By making the usage-amount of a thiol compound into the above-mentioned range, the surface hardness of the cured film obtained can be improved.

  In the resin composition of this embodiment, when it contains [D] a radiation sensitive polymerization initiator, it is preferable to contain at least 1 sort (s) selected from the group which consists of an O-acyl oxime compound and an acetophenone compound, It may contain a biimidazole compound.

  The amount of the component [D] used is preferably 0.05 to 30 parts by mass, more preferably 0.1 parts by mass with respect to 100 parts by mass of the total of [A] polymer and [B] surfactant. -15 parts by mass. By setting the amount of component [D] used within the above range, the resin composition of this embodiment forms a cured film having high radiation sensitivity and sufficient surface hardness even in the case of a low exposure amount. be able to.

<Solvent>
The resin composition of the embodiment of the present invention contains the above-described [A] polymer, [B] surfactant, and a solvent. The resin composition of the embodiment of the present invention can further contain [C] a polymerizable compound having an ethylenically unsaturated bond, and [D] a radiation-sensitive polymerization initiator.

  Although it does not specifically limit as a solvent, It is desirable to contain the alcohol solvent which is a protic solvent especially. By using an alcohol-based solvent, each component can be uniformly dissolved or dispersed, thereby making it possible to improve the coating property of the resin composition of the present embodiment on a large substrate, and further, streaks during application It is possible to suppress the occurrence of coating unevenness such as unevenness, pin mark unevenness, and smearing, and to further improve the film thickness uniformity.

As such an alcohol solvent,
Long-chain alkyl alcohols such as 1-hexanol, 1-octanol, 1-nonanol, 1-dodecanol, 1,6-hexanediol, 1,8-octanediol;
Aromatic alcohols such as benzyl alcohol;
Ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether;
Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether;
Diethylene glycol monoalkyl ethers such as diethylene glycol monomethyl ether and diethylene glycol monoethyl ether;
Examples include dipropylene glycol monoalkyl ethers such as dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, and dipropylene glycol monobutyl ether. These alcohol solvents can be used alone or in combination of two or more.

  Among these alcohol solvents, benzyl alcohol, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, and propylene glycol monoethyl ether are particularly preferable from the viewpoint of improving coatability.

  A solvent may be used individually by 1 type and may be used in mixture of 2 or more types. The amount of the solvent used is preferably 200 parts by mass to 1600 parts by mass, more preferably 400 parts by mass to 1000 parts by mass with respect to 100 parts by mass of the resin composition of the present embodiment. By making the amount of solvent used within the above-mentioned range, it is possible to improve the coating property for glass substrates and the like, and further suppress the occurrence of coating unevenness (such as streaky unevenness, pin mark unevenness, and moya unevenness). The film thickness uniformity can be further improved.

  In the resin composition of the present embodiment, together with the above-mentioned alcohol solvent, other solvents such as ethers, diethylene glycol alkyl ethers, ethylene glycol alkyl ether acetates, propylene glycol monoalkyl ether propionates, aliphatic There may be mentioned hydrocarbons, aromatic hydrocarbons, ketones, esters and the like.

Examples of solvents other than alcohol solvents include the following.
Examples of ethers include tetrahydrofuran, hexyl methyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol dimethyl ether, triethylene glycol diethyl ether, 1,4-dioxane, and the like;
Examples of diethylene glycol alkyl ethers include diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol ethyl methyl ether;
Examples of ethylene glycol alkyl ether acetates include methyl cellosolve acetate, ethyl cellosolve acetate, ethylene glycol monobutyl ether acetate, and ethylene glycol monoethyl ether acetate;
Examples of propylene glycol monoalkyl ether acetates include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate;
Examples of propylene glycol monoalkyl ether propionates include propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether propionate, propylene glycol monopropyl ether propionate, propylene glycol monobutyl ether propionate, and the like;

Examples of the aliphatic hydrocarbons include n-pentane, n-hexane, n-heptane, n-octane, n-nonane, n-decane, n-undecane, n-dodecane, cyclohexane, decalin and the like;
Examples of aromatic hydrocarbons include benzene, toluene, xylene, ethylbenzene, n-propylbenzene, i-propylbenzene, n-butylbenzene, mesitylene, chlorobenzene, dichlorobenzene and the like;
Examples of ketones include methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 2-heptanone, 4-hydroxy-4-methyl-2-pentanone, and the like;
Examples of esters include methyl acetate, ethyl acetate, propyl acetate, i-propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2-methylpropionic acid Ethyl, methyl hydroxyacetate, ethyl hydroxyacetate, butyl hydroxyacetate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate, 3-hydroxy Butyl propionate, methyl 2-hydroxy-3-methylbutanoate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, propyl ethoxyacetate, ethoxy Butyl acetate, methyl propoxyacetate, ethyl propoxyacetate, propylpropoxyacetate, butyl propoxyacetate, methyl butoxyacetate, ethyl butoxyacetate, propylbutoxyacetate, butylbutoxyacetate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2 Examples thereof include propyl methoxypropionate, butyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate and the like. These solvents can be used alone or in admixture of two or more.

Embodiment 2. FIG.
[Electrically conductive film forming ink]
The conductive film forming ink of the second embodiment of the present invention used in the conductive pattern forming method of the third embodiment of the present invention is a composition containing a metal salt and a reducing agent, and is a reduction reaction type composition. . Moreover, the conductive film forming ink of the present embodiment can further contain metal fine particles. And the electrically conductive film formation ink of this embodiment can contain a solvent further. The conductive film forming ink of the present embodiment can form a coating film by various printing methods and coating methods, and the coating film can be heated to form a conductive conducting part. Each component of the conductive film forming ink of this embodiment will be described below. In the present invention, the conductive film forming ink refers to an ink that expresses conductivity by a reduction reaction and can form a conductive film (conductive pattern).

<Metal salt>
The metal salt has a role in which the metal ions contained in the metal salt are reduced by the reducing agent in the conductive film forming ink to become a single metal, and the conductivity of the formed conductive portion is expressed. For example, when the metal salt is a copper salt, the copper ions contained in the copper salt are reduced by a reducing agent to form copper alone, thereby forming a conductive conducting part.

The metal salt of the conductive film forming ink of this embodiment is preferably a copper salt or a silver salt.
The copper salt is not particularly limited as long as it is a compound containing copper ions, and examples thereof include copper salts composed of copper ions and at least one of inorganic anion species and organic anion species. . Among these, from the viewpoint of solubility, it is preferable to use one or more selected from the group consisting of a copper carboxylate, a copper hydroxide, and a complex salt of copper and an acetylacetone derivative.

  Examples of copper carboxylates include copper acetate, copper trifluoroacetate, copper propionate, copper butyrate, copper isobutyrate, copper 2-methylbutyrate, copper 2-ethylbutyrate, copper valerate, copper isovalerate, pivalin. Copper salts with aliphatic carboxylic acids such as copper acid, copper hexanoate, copper heptanoate, copper octanoate, copper 2-ethylhexanoate, copper nonanoate, dicarboxylic acids such as copper malonate, copper succinate, copper maleate Copper salt with acid, Copper salt with aromatic carboxylic acid such as copper benzoate, copper salicylate, copper formate, copper hydroxyacetate, copper glyoxylate, copper lactate, copper oxalate, copper tartrate, copper malate, citric acid Suitable examples include a copper salt with an organic acid having a carboxy group such as copper. Note that copper formate may be anhydrous or hydrated. Examples of the hydrate of copper formate include tetrahydrate.

  Examples of complex salts of copper and acetylacetone derivatives include acetylacetonato copper, 1,1,1-trimethylacetylacetonatocopper, 1,1,1,5,5,5-hexamethylacetylacetonatocopper, Suitable examples include 1,1,1-trifluoroacetylacetonato copper, 1,1,1,5,5,5-hexafluoroacetylacetonato copper and the like.

  Among these, when considering the solubility and dispersibility in the reducing agent or solvent, and the resistance characteristics of the formed conductive part, copper acetate, copper propionate, copper isobutyrate, copper valerate, copper isovalerate, copper formate Copper carboxylates such as copper formate tetrahydrate and copper glyoxylate are preferred.

The silver salt is not particularly limited as long as it is a silver salt.
For example, silver nitrate, silver acetate, silver oxide, silver acetylacetone, silver benzoate, silver bromate, silver bromide, silver carbonate, silver chloride, silver citrate, silver fluoride, silver iodate, silver iodide, silver lactate, Mention may be made of silver nitrite, silver perchlorate, silver phosphate, silver sulfate, silver sulfide and silver trifluoroacetate.

  In the conductive film forming ink of the present embodiment, it is preferable to use a copper salt from the viewpoint of suppressing migration of metal atoms in the formed conductive portion. Among the copper salts, copper formate having a reducing property is particularly preferable. Copper formate may be anhydrous or copper formate tetrahydrate.

  As content of metal salt, the range of 0.01 mass%-50 mass% is preferable with respect to the whole quantity of the electrically conductive film formation ink of this embodiment, and the range of 0.1 mass%-30 mass% is more preferable. By setting the content of the metal salt in the range of 0.01% by mass to 50% by mass, the conductive part can be formed as a metal layer having stable and excellent conductivity. From the viewpoint of obtaining a low-resistance metal layer, the metal salt content is preferably 0.01% by mass or more. Further, from the viewpoint of obtaining a chemically stable conductive film forming ink, the content of the metal salt is preferably 50% by mass or less.

<Reducing agent>
The conductive film forming ink of the present embodiment contains a reducing agent together with the metal salt that is a metal component described above for the purpose of reducing metal ions contained in the metal salt to form a metal simple substance. The reducing agent is not particularly limited as long as it has reducing properties with respect to metal ions contained in the metal salt of the conductive film forming ink. Moreover, reducing property refers to the property that metal ions contained in the metal salt of the conductive film forming ink can be reduced.

  Examples of the reducing agent include monomolecular compounds having one or more functional groups selected from the group consisting of thiol groups, nitrile groups, amino groups, hydroxy groups, and hydroxycarbonyl groups, nitrogen atoms, oxygen Examples thereof include polymers having in the molecular structure one or more heteroatoms selected from the group consisting of atoms or sulfur atoms.

  Examples of such monomolecular compounds include alkanethiols, amines, hydrazines, monoalcohols, diols, hydroxyamines, α-hydroxyketones, and carboxylic acids.

  Examples of the polymer include polyvinyl pyrrolidone, polyethyleneimine, polyaniline, polypyrrole, polythiophene, polyacrylamide, polyacrylic acid, carboxymethylcellulose, polyvinyl alcohol, and polyethylene oxide.

  Among these, considering the solubility of the metal salt and the removability at the time of forming the conducting part, one or more selected from the group consisting of alkanethiols and amines are preferable.

  Examples of alkanethiols include ethanethiol, n-propanethiol, i-propanethiol, n-butanethiol, i-butanethiol, t-butanethiol, n-pentanethiol, n-hexanethiol, cyclohexanethiol, n -Heptanethiol, n-octanethiol, 2-ethylhexanethiol and the like are exemplified.

  Examples of amines include amine compounds such as 3- (2-ethylhexyloxy) propylamine, ethylamine, n-propylamine, i-propylamine, n-butylamine, i-butylamine, and t-butylamine. , N-pentylamine, n-hexylamine, cyclohexylamine, n-heptylamine, n-octylamine, 2-ethylhexylamine, 2-ethylhexylpropylamine, 3-ethoxypropylamine, n-nonylamine, n-decylamine, n -Monoamine compounds such as undecylamine, n-dodecylamine, n-tridecylamine, n-tetradecylamine, n-pentadecylamine, n-hexadecylamine, benzylamine, aminoacetaldehyde diethyl acetal, ethylene Amine, N-methylethylenediamine, N, N′-dimethylethylenediamine, N, N, N ′, N′-tetramethylethylenediamine, N-ethylethylenediamine, N, N′-diethylethylenediamine, 1,3-propanediamine, N , N′-dimethyl-1,3-propanediamine, 1,4-butanediamine, N, N′-dimethyl-1,4-butanediamine, 1,5-pentanediamine, N, N′-dimethyl-1, Diamine compounds such as 5-pentanediamine, 1,6-hexanediamine, N, N′-dimethyl-1,6-hexanediamine, isophoronediamine, diethylenetriamine, N, N, N ′, N ″ N ″ -penta Triethyl such as methyldiethylenetriamine, N- (aminoethyl) piperazine, N- (aminopropyl) piperazine Min compounds.

  Examples of hydrazines include 1,1-di-n-butylhydrazine, 1,1-di-t-butylhydrazine, 1,1-di-n-pentyldrazine, 1,1-di-n-hexylhydrazine, 1,1-dicyclohexylhydrazine, 1,1-di-n-heptylhydrazine, 1,1-di-n-octylhydrazine, 1,1-di- (2-ethylhexyl) hydrazine, 1,1-diphenylhydrazine, 1 , 1-dibenzylhydrazine, 1,2-di-n-butylhydrazine, 1,2-di-t-butylhydrazine, 1,2-di-n-pentyldrazine, 1,2-di-n-hexyl Hydrazine, 1,2-dicyclohexylhydrazine, 1,2-di-n-heptylhydrazine, 1,2-di-n-octylhydrazine, 1,2-di- (2-ethylhexyl) hydrazine, , 2-diphenyl hydrazine, or 1,2-dibenzyl hydrazine.

  Examples of the monoalcohols include methanol, ethanol, n-propyl alcohol, i-propyl alcohol, n-butyl alcohol, i-butyl alcohol, sec-butyl alcohol, pentanol, hexanol, heptanol, octanol, cyclohexanol, and benzyl. Examples include alcohol and terpineol.

  Diols include ethylene glycol, propylene glycol, 1,2-butanediol, 1,2-pentanediol, 1,2-hexanediol, 2,3-butanediol, 2,3-pentanediol, 2,3- Hexanediol, 2,3-heptanediol, 3,4-hexanediol, 3,4-heptanediol, 3,4-octanediol, 3,4-nonanediol, 3,4-decanediol, 4,5-octane Diol, 4,5-nonanediol, 4,5-decanediol, 5,6-decanediol, 3-N, N-dimethylamino-1,2-propanediol, 3-N, N-diethylamino-1,2 -Propanediol, 3-N, N-di-n-propylamino-1,2-propanediol, 3-N, N-di-i-propylamino -1,2-propanediol, 3-N, N-di-n-butylamino-1,2-propanediol, 3-N, N-di-i-butylamino-1,2-propanediol and 3-N Mention may be made of N, N-di-t-butylamino-1,2-propanediol.

  Examples of hydroxylamines include N, N-diethylhydroxylamine, N, N-di-n-propylhydroxylamine, N, N-di-n-butylhydroxylamine, N, N-di-n-pentylhydroxylamine, And N, N-di-n-hexylhydroxylamine.

Examples of α-hydroxyketones include hydroxyacetone, 1-hydroxy-2-butanone, 3-hydroxy-2-butanone, 1-hydroxy-2-pentanone, 3-hydroxy-2-pentanone, 2-hydroxy-3-pentanone 3-hydroxy-2-hexanone, 2-hydroxy-3-hexanone, 4-hydroxy-3-hexanone, 4-hydroxy-3-heptanone, 3-hydroxy-4-heptanone, and 5-hydroxy-4-octanone Can be mentioned.
Carboxylic acids are not particularly limited as long as they are reducible to metal salts, and examples thereof include formic acid, hydroxyacetic acid, glyoxylic acid, lactic acid, oxalic acid, tartaric acid, malic acid, and citric acid. be able to.

  The above-mentioned reducing agent can be used by appropriately selecting or combining one or two or more of those capable of reducing the metal salt according to the kind of the metal salt. For example, when copper formate is used as the metal salt, the reducing agent is preferably an amine compound, more preferably 2-ethylhexylpropylamine or 3-ethoxypropylamine.

  As content of a reducing agent, the range of 1 mass%-99 mass% is preferable with respect to the whole quantity of the electrically conductive film formation ink of this embodiment, and the range of 10 mass%-90 mass% is more preferable. By setting the content of the reducing agent in the range of 1% by mass to 99% by mass, a conductive part having excellent conductivity can be formed. Furthermore, by setting it as the range of 10 mass%-90 mass%, it has a low resistance value and can form the conduction | electrical_connection part excellent in adhesiveness with an electrode.

<Metal fine particles>
The conductive film forming ink of this embodiment can further contain metal fine particles for the purpose of improving the reduction precipitation rate of the metal salt or adjusting the viscosity of the conductive film forming ink.

  In the conductive film forming ink of the present embodiment, the metal fine particles are not particularly limited, but are selected from the group consisting of gold, silver, copper, platinum and palladium from the viewpoint of conductivity and stability. It is preferable that it contains one or more metal species. These metal species may be simple substances or alloys with other metals. When these metal species are simple substances, preferable metal fine particles are at least one selected from the group consisting of gold fine particles, silver fine particles, copper fine particles, platinum fine particles and palladium fine particles, or a combination of two or more.

  Among these, it may contain one or two or more metal species selected from the group consisting of silver, copper and palladium from the viewpoint of cost, availability, and catalytic ability when forming a conductive conducting part. preferable. Metal fine particles other than these may be used. However, for example, when copper salt is used as the metal salt, the metal fine particles are oxidized by copper ions, or the catalytic ability is reduced and the copper salt is converted into metal copper. Since the reduction precipitation rate may be reduced, it is more preferable to use the metal fine particles described above.

  In the conductive film forming ink of the present embodiment, the average particle diameter of the metal fine particles is preferably in the range of 0.05 μm to 5 μm. From the viewpoint of preventing the metal surface activity from increasing and causing an oxidation reaction, and from the viewpoint of preventing aggregation of the metal fine particles, the particle diameter of the metal fine particles is preferably 0.05 μm or more. Further, from the viewpoint of preventing sedimentation of the metal fine particles during long-term storage, the average particle size of the metal fine particles is preferably 5 μm or less.

  In the embodiment of the present invention, the method for measuring the average particle size of the metal fine particles is as follows. Particle diameter of metal fine particles from the field of view observed using a microscope such as a transmission electron microscope (TEM), a field emission transmission electron microscope (FE-TEM), or a field emission scanning electron microscope (FE-SEM) Select three locations where the images are relatively aligned, and shoot at the most suitable magnification for particle size measurement. From each of the obtained photographs, select 100 particles that seem to have a relatively uniform particle diameter, measure the diameter with a measuring instrument such as a ruler, and calculate the particle diameter by dividing the measurement magnification. These values can be obtained by arithmetic averaging. Further, the standard deviation can be obtained from the particle diameter and number of individual metal fine particles during the above observation. The coefficient of variation can be calculated by the following formula based on the above average particle diameter and its standard deviation.

  The metal fine particles may be commercially available or may be synthesized by a known method, and are not particularly limited. As a known synthesis method, for example, a gas phase method (dry method) in which a synthesis reaction is performed by a physical method such as a sputtering method or a gas evaporation method, or a metal compound solution is reduced in the presence of a surface protective agent. A liquid phase method (wet method) such as precipitation of metal fine particles is generally known.

  The purity of the metal fine particles is not particularly limited, but if it is low purity, it may adversely affect the conductivity when it is formed into a conductive thin film, so it is preferably 95% or more, more preferably 99% or more.

  The content of the metal fine particles contained in the conductive film forming ink of the present embodiment is usually in the range of 0% by mass to 60% by mass with respect to the total amount of the conductive film forming ink of the present embodiment, and 1% by mass. % To 40% by mass is preferable, and a range of 1% to 20% by mass is more preferable.

<Solvent>
The conductive film forming ink of the present embodiment preferably contains a solvent from the viewpoint of improving the productivity by adjusting the viscosity of the conductive film forming ink and obtaining a uniform conductive portion with low resistance.

  Examples of the solvent include an organic solvent that can dissolve or disperse each component in the conductive film forming ink and does not participate in the reduction reaction of the metal salt. Specifically, one type selected from the group consisting of ethers, esters, aliphatic hydrocarbons, and aromatic hydrocarbons, or a mixture of two or more types compatible with each other can be used.

  Examples of ethers, aliphatic hydrocarbons, and aromatic hydrocarbons include those exemplified in <Solvent> of the resin composition described above.

  Examples of the esters include methyl formate, ethyl formate, butyl formate, γ-butyrolactone, and those exemplified in <Solvent> of the resin composition.

  Of these organic solvents, ethers are preferable, particularly hexyl methyl ether, diethylene glycol dimethyl ether, and the like from the viewpoint of easy adjustment of the viscosity of the liquid conductive film forming ink.

  Content of the solvent contained in the electrically conductive film forming ink of this embodiment is the range of 0 mass%-95 mass% with respect to the whole quantity of the electrically conductive film forming ink of this embodiment, and 1 mass%-70 mass%. It is preferable that it is the range of 10 mass%-50 mass%.

  The mixing method for producing the conductive film forming ink of the present embodiment is not particularly limited. For example, stirring with a stirring blade, stirring with a stirrer and a stirrer, stirring with a boiler, ultrasonic (homogenizer) ) And the like. As stirring conditions, for example, in the case of stirring with stirring blades, the rotation speed of the stirring blades is usually in the range of 1 rpm to 4000 rpm, preferably in the range of 100 rpm to 2000 rpm.

Embodiment 3. FIG.
[Conductive pattern forming method]
The conductive pattern forming method of the third embodiment of the present invention includes a step of applying the resin composition of the first embodiment of the present invention to a substrate (hereinafter also referred to as a resin composition applying step), and On a coating film on which at least one of radiation irradiation and heating is performed on at least a part of the coating film (hereinafter also referred to as radiation irradiation / heating process) and at least one of the radiation irradiation and heating is performed. The step of applying the conductive film forming ink of the second embodiment of the present invention (hereinafter also referred to as the conductive film forming ink application step) and the step of heating the coating film of the conductive film forming ink (hereinafter also referred to as the heating step). ).

In the conductive pattern formation method of this embodiment, the base film of a conductive pattern is formed on a board | substrate by a resin composition application | coating process and a radiation irradiation / heating process, for example. Then, a conductive pattern is formed on the obtained base film by the conductive film forming ink application process and the heating process.
Hereinafter, each step will be described in more detail.

<Formation of conductive pattern base film>
In the conductive pattern formation method of this embodiment, the formation of the conductive pattern base film uses the resin composition of the embodiment of the present invention, and as described above, the resin composition coating step, the radiation irradiation / heating step, Can be performed. More specifically, the method for forming the base film of the conductive pattern can include the following steps (1) to (4). Step (1) is a resin composition application step, and steps (2) to (4) correspond to the radiation irradiation / heating step.

(1) The process of forming the coating film by apply | coating the resin composition of embodiment of this invention on a board | substrate,
(2) A step of irradiating at least a part of the coating film formed in step (1),
(3) A step of developing the coating film irradiated with radiation in step (2), and (4) a step of heating the coating film developed in step (3).

  The above-mentioned steps (2) to (4) are appropriately selected according to properties such as whether the resin composition to be used has radiation sensitivity or thermosetting properties and the necessity of patterning of the base film. To be implemented. For example, when patterning of the base film is unnecessary and the coating film of the resin composition of the embodiment of the present invention formed on the substrate is used by being cured on the entire coated surface on the substrate, the process (3) is omitted.

Moreover, when the patterning of a base film is unnecessary and the resin composition to be used has only thermosetting property, the steps (2) and (3) are omitted, and only the step (4) is performed. The Moreover, when the patterning of a base film is unnecessary and the resin composition to be used is radiation sensitive, only a process (2) or a process (2) and a process (4) are implemented.
Next, each process of a process (1)-a process (4) is demonstrated.

Process (1)
In the step (1), after applying the resin composition of the embodiment of the present invention on the substrate, the solvent is removed by preferably heating (pre-baking) the coating surface to form a coating film.

  FIG. 1 is a cross-sectional view schematically showing a coating film of a resin composition according to an embodiment of the present invention formed on a substrate.

  As shown in FIG. 1, in this step, a coating film 2 of the resin composition of the embodiment of the present invention is formed on a substrate 1.

  Examples of the substrate material that can be used include glass, quartz, silicon, and resin. Specific examples of the resin include polyethylene terephthalate, polybutylene terephthalate, polyethersulfone, polycarbonate, polyimide, a ring-opening polymer of cyclic olefin, and hydrogenated products thereof. Note that the substrate can be subjected to pretreatment such as cleaning, roughening, and imparting a minute uneven surface as necessary.

  The application method of the resin composition of the embodiment of the present invention is not particularly limited, and for example, spray method, roll coating method, spin coating method (spin coating method), slit die coating method, bar coating method, flexographic printing, offset An appropriate method such as printing or ink jet printing can be employed. Among these coating methods, a spin coating method or a slit die coating method is particularly preferable. Prebaking conditions vary depending on the type of each component, the blending ratio, and the like, but can be preferably about 70 to 120 ° C. for 1 to 10 minutes. The viscosity of the resin composition of the embodiment of the present invention may be adjusted according to the coating method and the desired film thickness. When the film thickness is 3 μm to 7 μm, the spin coating method is used, and the viscosity is 10 cP (0.01 Pa · s) to 50 cP. (0.05 Pa · s), 1 cP (0.001 Pa · s) to 10 cP (0.01 Pa · s) is exemplified for the slit die coating method.

Process (2)
In step (2), when the resin composition of the present embodiment is a radiation-sensitive resin composition, exposure is performed by irradiating the coating film formed in step (1) with radiation. The exposure is performed on at least a part of the coating film. When patterning of the base film is unnecessary, the entire coating film is exposed. If patterning of the underlying film is necessary, a part of the coating film is exposed. Usually, when exposing a part of coating film, it exposes through the photomask which has a predetermined pattern. Examples of radiation used for exposure include visible light, ultraviolet light, far ultraviolet light, electron beams, and X-rays. Among these radiations, radiation having a wavelength in the range of 190 nm to 450 nm is preferable, and radiation including ultraviolet light of 365 nm is particularly preferable.

The exposure amount in this step is preferably 10 mJ / cm ^{2 to} 1000 mJ / cm ² , more preferably 20 mJ / cm, as a value obtained by measuring the intensity of radiation at a wavelength of 365 nm with an illuminometer (OAI model 356, manufactured by OAI Optical Associates Inc.). cm ^{2 to} 700 mJ / cm ² .

Step (3)
In the step (3), the resin composition of the present embodiment is a radiation-sensitive resin composition, and when the base film is patterned, the coating film after the exposure in the step (2) is developed. Unnecessary portions (non-irradiated portions) are removed to form a predetermined coating film pattern.
The developer used in the development step is preferably an aqueous solution of an alkali (basic compound). Examples of alkalis include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and ammonia; quaternary ammonium salts such as tetramethylammonium hydroxide and tetraethylammonium hydroxide. be able to.

  In addition, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant can be added to such an alkaline aqueous solution. As a developing method, for example, an appropriate method such as a liquid piling method, a dipping method, a rocking dipping method, a shower method, or the like can be used. The development time varies depending on the composition of the resin composition of the present embodiment, but is preferably about 10 seconds to 180 seconds. Following such development processing, for example, after washing with running water for 30 seconds to 90 seconds, a desired pattern can be formed by, for example, air drying with compressed air or compressed nitrogen.

Process (4)
In step (4), when the resin composition of this embodiment has thermosetting properties, the coating film of the resin composition of this embodiment is heated using a heating device such as a hot plate or an oven. And the resin composition of this embodiment can be hardened and the base film of embodiment of this invention can be obtained.

  FIG. 2 is a cross-sectional view schematically showing the base film of the embodiment of the present invention formed on the entire surface of the substrate.

  As shown in FIG. 2, the base film 3 formed on the substrate 1 using the resin composition of the first embodiment of the present invention is obtained by this step.

  The base film 3 can be formed on the entire surface of the substrate 1 as shown in FIG. Moreover, when the coating film of the resin composition is patterned by the above-mentioned process (2) and process (3), the patterned coating film is cured by heating the patterned coating film, A patterned base film 3 can be obtained.

  The heating temperature is, for example, 120 ° C to 250 ° C. The heating time varies depending on the type of heating device, but for example, when performing the heating process on a hot plate, it may be 5 minutes to 30 minutes, and when performing the heating process in an oven, it may be 30 minutes to 90 minutes. it can. The step baking method etc. which perform a heating process 2 times or more can also be used. In this manner, the base film 3 having a desired conductive pattern can be formed on the surface of the substrate 1.

  The film thickness of the base film 3 of this embodiment formed by the above steps (1) to (4) is preferably 0.1 μm to 10 μm, more preferably 0.1 μm to 6 μm, and still more preferably 0.1 μm. ˜4 μm.

<Formation of conductive pattern>
In the conductive pattern forming method of this embodiment, the conductive pattern can be formed using the base film formed by the above-described resin composition coating process and the radiation irradiation / heating process. The conductive pattern is formed by the conductive film forming ink application process and the heating process described above.

  FIG. 3 is a cross-sectional view schematically illustrating the conductive film forming ink application process of the conductive pattern forming method of the embodiment of the present invention.

  As shown in FIG. 3, in the conductive film forming ink coating process, at least a part of the region on the base film 3 formed on the substrate 1 by the resin composition coating process and the radiation irradiation / heating process described above, The conductive film forming ink 4 of the second embodiment of the present invention is applied.

  Next, the coating film of the conductive film forming ink formed on the substrate 1 by the conductive film forming ink application process is heated in the heating process.

  FIG. 4 is a cross-sectional view schematically showing the conductive pattern of the embodiment of the present invention formed on the substrate.

  As shown in FIG. 4, the conductive pattern 5 patterned in a desired shape is formed on the base film 3 on the substrate 1 by the heating process.

  In the present embodiment, the viscosity of the conductive film forming ink can be adjusted in accordance with the method of applying the conductive film forming ink in the conductive film forming ink application process. The viscosity of the conductive film forming ink is preferably in the range of 0.1 Pa · s to 100 Pa · s, more preferably in the range of 0.5 Pa · s to 70 Pa · s, and still more preferably in the range of 1 Pa · s to 50 Pa · s. The viscosity of the conductive film forming ink can be adjusted by adjusting the type and amount of the reducing agent according to the coating method used. Further, the viscosity of the conductive film forming ink can be adjusted by adjusting the type and amount of the metal fine particles and the solvent used as necessary.

  The viscosity of the conductive film forming ink of the present embodiment can be measured by any method as long as it is a viscosity measuring method that can regulate the shear rate, such as a capillary type or a double cylinder type. For example, a cone / plate type The use of a (E type) viscometer is preferred.

  As a coating method of the conductive film forming ink in the conductive film forming ink coating process of the present embodiment, a printing coating method such as offset printing, ink jet printing, gravure printing, flexographic printing, (silk) screen printing, letterpress printing, or the like is used. The method of application etc. are mentioned. From the viewpoint of forming a conductive film that is fine, thick, low resistance, and difficult to break, offset printing is preferred. Offset printing can be performed, for example, based on the descriptions in JP 2010-159350 A and JP 2011-178006 A.

For example, when a conductive film forming ink in a high viscosity region such as offset printing, letterpress printing, or (silk) screen printing is a suitable method, 1 Pa · s to 50 Pa · s is preferable. Particularly in the case of offset printing, 10 Pa · s to 50 Pa · s is preferable. In addition, the temperature in the said viscosity is 20 degreeC, and a shear rate is 10 sec- ¹ .

  In the heating process performed after the conductive film forming ink application process of the present embodiment, the heating is preferably performed in a non-oxidizing atmosphere. Examples of the non-oxidizing atmosphere include a nitrogen atmosphere, a helium atmosphere, and an argon atmosphere. Among these, a nitrogen atmosphere in which inexpensive nitrogen gas can be used is preferable. In order to improve the processing capacity, it is also possible to perform heat treatment using a continuous firing furnace such as a nitrogen flow reflow furnace. As a result, the conductive film forming ink of the present embodiment does not need to form a reducing atmosphere using a reducing gas such as hydrogen gas after being applied, and is heated in a safe state to have a desired conductive pattern. Can be formed.

  The heating temperature in the heating process of the present embodiment is not particularly limited as long as the metal salt such as a copper salt is reduced and the organic substance is decomposed or volatilized. Preferably, it is the range of 50 to 500 degreeC, The range of 120 to 360 degreeC is more preferable, The range of 120 to 260 degreeC is further more preferable. For example, the heating temperature is preferably 50 ° C. or higher and more preferably 120 ° C. or higher in order to promote the reduction reaction of a metal salt such as a copper salt and to prevent the remaining of organic substances. The heating temperature is preferably 500 ° C. or lower, and considering the case where the substrate on which the conductive pattern is formed is a substrate made of an organic material, it is preferably 360 ° C. or lower, and 260 ° C. or lower. It is more preferable.

  The heating time in the heating step of the present embodiment may be appropriately selected in consideration of the type of metal salt contained in the conductive film forming ink of the present embodiment to be used and the conductivity of the conductive part to be formed. Although not limited, when a heating temperature of about 300 ° C. is set, it is usually about 10 minutes to 60 minutes, and when a heating temperature of about 250 ° C. is set, it is usually about 10 minutes to 70 minutes. It is.

The conductive pattern of the present embodiment formed on the base film on the substrate by the conductive pattern forming method of the present embodiment is excellent in characteristics such as conductivity and adhesion, and has high-definition wiring and electrodes. This is effective for forming the wiring.
And the electroconductive pattern of this embodiment can be used suitably for formation of the electronic circuit of embodiment of this invention. That is, the electronic circuit of the embodiment of the present invention is configured to have the conductive pattern of the embodiment of the present invention. And the electronic circuit of embodiment of this invention has the electroconductive pattern of embodiment of this invention, can form a circuit board, and can be used for the structure of an electronic device.

  EXAMPLES Hereinafter, although this invention is explained in full detail based on an Example, this invention is not interpreted limitedly to this Example.

<[A] Synthesis of polymer>
[Synthesis Example 1]
A flask equipped with a condenser and a stirrer was charged with 7 parts by mass of 2,2′-azobis (2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol dimethyl ether. Subsequently, 16 parts by weight of methacrylic acid, 20 parts by weight of glycidyl methacrylate, 16 parts by weight of tricyclo [5.2.1.0 ^2,6 ] decan-8-yl methacrylate, 38 parts by weight of methyl methacrylate and 10 parts by weight of styrene were charged. After purging with nitrogen, the temperature of the solution is raised to 70 ° C. while gently stirring, and polymerization is carried out while maintaining this temperature for 4 hours, whereby a copolymer which is an acrylic polymer as [A] polymer A solution containing (A-1) was obtained (solid content concentration = 34.3% by mass, Mw = 8000, Mw / Mn = 2.3). In addition, solid content concentration means the ratio of the copolymer mass which occupies for the total mass of a copolymer solution.

[Synthesis Example 2]
A flask equipped with a condenser and a stirrer was charged with 4 parts by weight of 2,2′-azobisisobutyronitrile and 300 parts by weight of diethylene glycol methyl ethyl ether, and subsequently 23 parts by weight of methacrylic acid to give the structural unit (a3), While charging 10 parts by weight of styrene to give other structural units, 32 parts by weight of benzyl methacrylate and 35 parts by weight of methyl methacrylate, and 2.7 parts by weight of α-methylstyrene dimer as a molecular weight regulator, The temperature of the solution was raised to 80 ° C., and this temperature was kept for 4 hours, and then raised to 100 ° C., and this temperature was kept for 1 hour for polymerization to obtain a solution containing a copolymer (solid content). Concentration = 24.9% by mass). Mw of the obtained copolymer was 12500.

Next, 1.1 parts by mass of tetrabutylammonium bromide and 0.05 parts by mass of 4-methoxyphenol as a polymerization inhibitor were added to the solution containing the obtained copolymer, followed by stirring at 90 ° C. for 30 minutes in an air atmosphere. Then, 16 parts by mass of glycidyl methacrylate was added and reacted at 90 ° C. for 10 hours to obtain a copolymer (A-2) which is an acrylic polymer as [A] polymer (solid content concentration = 29.0% by weight). Mw of the copolymer (A-2) was 14200. Reprecipitation purification is performed by dropping the copolymer (A-2) into hexane, and the re-precipitated resin solid content is analyzed by ¹ H-NMR analysis to determine the reaction rate of glycidyl methacrylate (formation rate of structural unit (a1)). ) Was calculated. Integration between the peak derived from the methacrylic group of glycidyl methacrylate at around 6.1 ppm and 5.6 ppm and the proton of the aromatic ring around 6.8 ppm to 7.4 ppm derived from the structural unit of benzyl methacrylate in the copolymer From the comparison of the ratio, the reaction rate between glycidyl methacrylate and the carboxy group in the copolymer was calculated. As a result, it was confirmed that 96 mol% of the reacted glycidyl methacrylate reacted with the carboxy group in the copolymer.

[Synthesis Example 3]
In a vessel equipped with a stirrer, 23 parts by mass of propylene glycol monomethyl ether was charged, followed by 24 parts by mass of methyltrimethoxysilane, 22 parts by mass of tetramethoxysilane, and 17 parts by mass of 3-methacryloxypropyltrimethoxysilane, Heated until the solution temperature reached 60 ° C. After the solution temperature reached 60 ° C., 0.1 part by mass of formic acid and 21 parts by mass of ion-exchanged water were charged, heated to 75 ° C., and held for 2 hours. After cooling to 45 ° C., 30 parts by mass of methyl orthoformate was added as a dehydrating agent and stirred for 1 hour. Further, the solution temperature was set to 40 ° C., and evaporation was performed while maintaining the temperature, thereby removing ion-exchanged water and methanol and ethanol generated by hydrolysis condensation. As described above, polysiloxane (A-3), which is a siloxane polymer, was obtained as the [A] polymer. Polysiloxane (A-3) had a solid content concentration of 34% by mass, a weight average molecular weight (Mw) of 2600, and a dispersity (Mw / Mn) of 2.3.

[Synthesis Example 4]
200 mass of cresol novolac type epoxy resin “EOCN (registered trademark) -1020” (manufactured by Nippon Kayaku, epoxy equivalent 200) on glass Kolben equipped with heating / cooling / stirring device, reflux condenser, dropping funnel and nitrogen introduction tube Part and 245 parts by mass of propylene glycol monomethyl ether acetate were heated to 110 ° C. and dissolved uniformly. Subsequently, 76 parts by mass (1.07 mol) of acrylic acid, 2 parts by mass of triphenylphosphine, and 0.2 parts by mass of p-methoxyphenol were charged and reacted at 110 ° C. for 10 hours. The reaction product was further charged with 91 parts by mass (0.60 mol part) of tetrahydrophthalic anhydride, further reacted at 90 ° C. for 5 hours, and after cooling, propylene glycol monomethyl ether acetate was added to adjust the solid content concentration, and [A] Propylene glycol monomethyl ether acetate solution of resin (A-4) having carboxyl group and acryloyl group (Mn: 2200, SP value: 11.26, HLB value: 6.42, acid value: 91 mgKOH / g) as a polymer (Solid content concentration = 25 mass%) was obtained.

<Preparation of resin composition>
Details of each component used in Examples and Comparative Examples are shown below.

<[A] polymer>
A-1: See Synthesis Example 1 A-2: See Synthesis Example 2 A-3: See Synthesis Example 3 A-4: See Synthesis Example 4

<[B] Surfactant>
B-1: Megafuck (registered trademark) EXP. TF-1694 (manufactured by DIC Corporation)
B-2: SH8400 FLUID (Toray Dow Corning Co., Ltd.)
B-3: FTX-218, (manufactured by Neos Corporation)
B-4: Polyflow No. 95 (manufactured by Kyoeisha)

<[C] polymerizable compound>
C-1: Dipentaerythritol hexaacrylate C-2: 1,9-nonanediol diacrylate

<[D] Radiation sensitive polymerization initiator>
C-1: 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one (Irgacure (registered trademark) 907, Ciba Specialty Chemicals)
C-2: 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one (Irgacure (registered trademark) 379, Ciba Specialty Chemicals)
C-3: Ethanone-1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -1- (O-acetyloxime) (Irgacure (registered trademark) OXE02, Ciba Specialty・ Chemicals)

[Examples 1 to 10 and Comparative Examples 1 to 4]
By mixing each component of the type and content shown in Table 1 and adding propylene glycol monomethyl ether acetate so that the solid content concentration is 30% by mass, and then filtering with a Millipore filter having a pore size of 0.5 μm The resin compositions of Examples 1 to 10 and Comparative Examples 1 to 4 were prepared. In Table 1, “-” indicates that the corresponding component was not used.

<Preparation of conductive film forming ink>
[Preparation Example 1]
To the separable flask, 40.7 g of 2-ethylhexylamine was added, and then 19.3 g of anhydrous copper formate was gradually added over 30 minutes while stirring with a mechanical stirrer. After completion of the addition, the mixture was heated to 30 ° C. while continuing to stir with a mechanical stirrer and reacted for 3 hours to obtain a dark blue copper complex ink having a viscosity of 6.8 Pa · s.

<Formation and evaluation of conductive pattern>
Using the respective resin compositions prepared in Examples 1 to 10 and Comparative Examples 1 to 4, the following evaluation was performed using the conductive film forming ink prepared in Preparation Example 1. The evaluation results are shown in Table 2.

Example 11
[Ink printability]
After applying each resin composition prepared in Examples 1 to 10 and Comparative Examples 1 to 4 on a non-alkali glass substrate with a spinner, the film was prebaked on a hot plate at 90 ° C. for 2 minutes. A coating film having a thickness of 0.5 μm was formed. Subsequently, the obtained coating film was irradiated with radiation using a high-pressure mercury lamp at an exposure amount of 1000 mJ / cm ² . Thereafter, the substrate was further post-baked in an oven at 150 ° C. for 60 minutes to form a base film for forming a conductive pattern (hereinafter sometimes referred to as “conductive pattern base film forming step”).

  Next, using the conductive film forming ink prepared in Preparation Example 1, a coating film was formed on a non-alkali glass substrate on which a base film was formed using a screen printing method. The coating film is patterned and has a shape in which two rectangular pad portions are connected to a linear portion having a line width of 100 μm. When the conductive film forming ink exhibits good printability, the performance is A (good), B (bleed) when bleeding occurs after application, and C (repellency) when repelling occurs. Evaluated. The evaluation results are shown in Table 2 together with other examples described later.

Example 12
[Metal wiring formability]
In the same manner as in Example 11 described above, a base film forming substrate was prepared using the conductive pattern base film forming step, and the same screen printing was performed using the conductive film forming ink prepared in Preparation Example 1. Next, the obtained coating film was baked on a hot plate at 190 ° C. for 30 minutes under nitrogen to obtain a conductive pattern.

  FIG. 5 is a plan view showing the shape of the conductive pattern formed in the example of the present invention.

As shown in FIG. 5, the conductive pattern 11 of this embodiment is formed on the base film 12, and has a shape in which two rectangular pad portions 13 are connected by a linear metal wiring 14 having a line width of 100 μm. Prepare.
FIG. 5 shows an example in which the conductive film forming ink has good printability and no disconnection or the like.

  Then, using the formed conductive pattern, observation with a laser microscope (VK-8500, Keyence Corporation) was performed. As a result, A (good) when the metal wiring has a good linear shape, B (bad wettability) when the metal wiring has spread, and C (bad disconnection) when disconnection due to repelling or the like occurs. ).

Example 13
[appearance]
In the same manner as in Example 11 described above, a base film forming substrate was prepared using the conductive pattern base film forming step, and the same screen as in Example 11 described above was used using the conductive film forming ink prepared in Preparation Example 1. Printing was done. Next, the obtained coating film was baked on a hot plate at 190 ° C. for 30 minutes under nitrogen to obtain a conductive pattern. The obtained metal wiring and the pad part were visually confirmed, and the appearance was evaluated as “◯” when there was a metallic luster and “X” when there was no metallic luster.

Example 14
[Adhesion]
In the same manner as in Example 11 described above, a base film forming substrate was prepared using the conductive pattern base film forming step, and the same screen as in Example 11 described above was used using the conductive film forming ink prepared in Preparation Example 1. Printing was done. Next, the obtained coating film was baked on a hot plate at 190 ° C. for 30 minutes under nitrogen to obtain a conductive pattern.
When tape peeling test was performed on the metal wiring of the obtained conductive pattern, when peeling did not occur, ○ (good), when peeling partially occurred, Δ (somewhat poor), when peeling occurred Was evaluated for adhesion as x (defect).

Example 15
[Conductivity]
In the same manner as in Example 11 described above, a base film forming substrate was prepared using the conductive pattern base film forming step, and the same screen as in Example 11 described above was used using the conductive film forming ink prepared in Preparation Example 1. Printing was done. Next, the obtained coating film was baked on a hot plate at 190 ° C. for 30 minutes under nitrogen to obtain a conductive pattern.
The resistance (conductivity) of the metal wiring of the obtained conductive pattern was evaluated. As an evaluation method, it was measured by a two-terminal method using a pad portion on both sides of the conductive pattern with a tester, and as a result, it was judged as ◯ if continuity was obtained, and x if disconnected.

  From the results in Table 2, the base film formed using the resin compositions prepared in Examples 1 to 10 is the base film formed using the resin compositions prepared in Comparative Examples 1 to 4. It was found that the ink-printability of the ink for forming a conductive film was better, and better metal wiring formability, appearance of the metal wiring, adhesion of the metal wiring, and conductivity of the metal wiring could be imparted.

  When the base film formed using the resin composition of the present invention is used, fine and fine wiring can be easily formed by a printing method using various conductive film forming inks. The obtained conductive pattern such as a metal wiring is excellent in adhesion and conductivity and is suitable for forming an electronic circuit. Therefore, the present invention can be used as a highly accurate wiring technology, and is suitable for providing a wiring board on which an electronic device such as a semiconductor chip is mounted. This is effective in reducing the size, thickness and functionality of equipment.

DESCRIPTION OF SYMBOLS 1 Board | substrate 2 Coating film 3, 12 Base film 4 Conductive film formation ink 5, 11 Conductive pattern 13 Pad part 14 Metal wiring

Claims (8)

[A] a step of applying a resin composition containing a structural unit having a polymerizable group, [B] a surfactant, and a solvent to a substrate;
Forming at least one of radiation irradiation and heating on at least a part of the coating film of the resin composition;
Applying a conductive film forming ink on the coating film on which at least one of the radiation irradiation and the heating has been performed;
Heating the coating film of the conductive film forming ink, and a conductive pattern forming method comprising:
Content of [B] surfactant of the said resin composition is 0.5 mass part-10 mass parts with respect to 100 mass parts of this resin composition, The conductive pattern formation method characterized by the above-mentioned.   [A] The conductive pattern forming method according to claim 1, wherein the polymerizable group of the polymer is at least one selected from the group consisting of an epoxy group, a (meth) acryloyl group, and a vinyl group.   [A] The conductive pattern forming method according to claim 1 or 2, wherein the polymer is at least one selected from the group consisting of an acrylic polymer, a siloxane polymer, and an epoxy resin. The resin composition further comprises
[C] a polymerizable compound having an ethylenically unsaturated bond, and
[D] a radiation-sensitive polymerization initiator,
It is a radiation sensitive resin composition, The conductive pattern formation method of any one of Claims 1-3 characterized by the above-mentioned. [A] a polymer containing a structural unit having a polymerizable group [B] a surfactant;
And a resin composition comprising a solvent and used for forming a base film for providing a conductive pattern. The resin composition according to claim 5, further comprising [C] a polymerizable compound having an ethylenically unsaturated bond, and [D] a radiation-sensitive polymerization initiator.   A conductive pattern obtained by the conductive pattern forming method according to claim 1.   An electronic circuit comprising the conductive pattern according to claim 7.

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