JP2014196472A - Epoxy resin composition for electronic material and cured product of the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an epoxy resin composition for an electronic material, which exhibits excellent heat resistance, moisture absorption resistance, and low thermal expansion and has excellent solubility in a solvent, a cured product of the composition, and an electronic member containing a cured product of the epoxy resin.SOLUTION: An epoxy resin composition containing: a tetrafunctional epoxy resin which uses 2,2',7,7'-tetraglycidyloxy-1,1'-binaphthalene represented by formula (2) as a raw material, which has a 1,1'-binaphthalene-2,2',7,7'-tetraol skeleton, and which has a low softening point; and a curing agent, a cured product of the epoxy resin, and an electronic member containing the cured product of the epoxy resin, are disclosed.

Description

The present invention relates to an epoxy resin composition for electronic materials that is excellent in heat resistance, moisture absorption resistance, and low thermal expansion properties of the resulting cured product, and a cured product thereof.

An epoxy resin composition containing an epoxy resin and its curing agent as essential components is excellent in various physical properties such as heat resistance and moisture absorption, so that it is a semi-laminate resin material, an electrical insulating material, a semiconductor sealing material, a fiber reinforced composite. Widely used in materials, coating materials, molding materials, adhesive materials, etc.

In recent years, in these various uses, particularly in the field of advanced materials, further improvement in performance represented by heat resistance and low hygroscopicity has been demanded. Furthermore, due to environmental regulations, high melting point solder that does not use lead has become mainstream, and the use temperature of this lead-free solder is about 20-40 ° C. higher than that of conventional eutectic solder. Resin compositions are required to have higher heat resistance than ever before.

As an epoxy resin material that can meet demands for high heat resistance, low moisture absorption, and low thermal expansion, for example, the following structural formula 1

There is known a tetrafunctional naphthalene-based epoxy resin represented by (Patent Document 1).

Compared to general phenol novolac epoxy resins, the above tetrafunctional naphthalene epoxy resins have a naphthalene skeleton with high heat resistance and hydrophobicity, are tetrafunctional and have a high crosslinking density, and are symmetrical. Since it has an excellent molecular structure, the cured product exhibits extremely excellent heat resistance, moisture absorption resistance and low thermal expansion. However, in recent years, higher performance is required in heat resistance, and further improvement is required. Furthermore, since the tetrafunctional naphthalene-based epoxy resin has low solubility in a solvent, for example, in the production of an electronic circuit board, the properties of the cured product are not sufficiently exhibited.

In the above-mentioned tetrafunctional naphthalene-based epoxy resin, the methylene structure is relatively weak at high temperatures. Therefore, it is effective for the naphthalene ring to be a direct bond rather than a bond via the methylene structure as a means for improving heat resistance. it is conceivable that. There is a description of an epoxy resin having a bi (dihydroxynaphthalene) structure in which a dihydroxynaphthalene dimer does not contain a methylene structure and is directly connected by a single bond (Patent Documents 2 to 5). The position of the hydroxyl group of dihydroxynaphthalene and the bonding position of the dimer are important factors that affect the physical properties such as the softening point of the epoxy resin, the solvent solubility, and the heat resistance of the cured product. In any of Literatures 2 to 5, the position of the hydroxyl group of dihydroxynaphthalene and the bonding position of the dimer are not specified, and there is no description about a specific compound.

Japanese Patent No. 3137202 JP 2004-111380 A JP2007-308640 JP 2010-24417 JP 2010-106150 A

The problem to be solved by the present invention is an epoxy resin composition for electronic materials that exhibits excellent heat resistance, low hygroscopicity, low thermal expansion, and realizes good workability from its good solvent solubility and its It is to provide a cured product.

As a result of diligent dimerization reaction of dihydroxynaphthalene, the present inventors have conducted a selective coupling reaction of 2,7-dihydroxynaphthalene at the 1,1 ′ position, and therefore, high-purity 1,1′-binaphthalene. -2,2 ', 7,7'-tetraol can be obtained, and 2,2', 7,7'-tetraglycidyloxy-1,1'-binaphthalene obtained by reacting it with epihalohydrin can be obtained. It was found that the epoxy resin composition for electronic materials used exhibited excellent heat resistance, low hygroscopicity, and low thermal expansibility, and further exhibited good solvent solubility, thereby completing the present invention.

That is, the present invention relates to an epoxy resin composition for electronic materials containing 2,2 ', 7,7'-tetraglycidyloxy-1,1'-binaphthalene and a curing agent as essential components.

The present invention further relates to an epoxy resin composition for electronic materials, which further contains a filler in the epoxy resin composition for electronic materials.

The present invention further relates to an epoxy resin composition for electronic materials containing a fibrous base material.

The present invention further relates to an epoxy resin cured product for electronic materials obtained by curing reaction of the above epoxy resin composition for electronic materials.

ADVANTAGE OF THE INVENTION According to this invention, the epoxy resin composition for electronic materials which expresses the outstanding heat resistance, low hygroscopicity, and low thermal expansibility, and implement | achieves favorable solvent solubility, and its hardened | cured material can be provided.

Hereinafter, the present invention will be described in detail.
The epoxy resin used in the present invention has 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene as a main component and is represented by the following structural formula (2). .

・・・（２）

... (2)

1,1′-Binaphthalene-2,2 ′, 7,7′-tetraol, which is a raw material for the epoxy resin used in the present invention, is obtained by a dihydroxynaphthalene coupling reaction. In the coupling reaction of dihydroxynaphthalene, 2,7-dihydroxynaphthalene selectively undergoes a coupling reaction at the 1,1 ′ position and is difficult to multimerize, and has a similar structure of 1,1′-methylenebis (naphthalene-2 , 7-diol) has a low melting point, and the glycidyl etherified product has a lower softening point than the tetrafunctional glycidyl etherified product of 1,1′-methylenebis (naphthalene-2,7-diol). And low viscosity and high solvent solubility.
Although the manufacturing method of the epoxy resin used for this invention is explained in full detail below, the manufacturing method of the epoxy resin of this invention is not limited to these.

That is, the method for producing the epoxy resin used in the present invention is to react 1,1'-binaphthalene-2,2 ', 7,7'-tetraol with epihalohydrin. Specifically, for example, epihalohydrin is added in a ratio of 2 to 10 times the amount (molar basis) with respect to the number of moles of the phenolic hydroxyl group in the phenolic compound, and further 0.9% relative to the number of moles of the phenolic hydroxyl group. A method of reacting at a temperature of 20 to 120 ° C. for 0.5 to 10 hours while adding or gradually adding up to 2.0 times (molar basis) of the basic catalyst is mentioned. The basic catalyst may be solid or an aqueous solution thereof. When an aqueous solution is used, it is continuously added and water and epihalohydrins are continuously distilled from the reaction mixture under reduced pressure or normal pressure. Alternatively, the solution may be separated and further separated to remove water and the epihalohydrin is continuously returned to the reaction mixture.

In the first batch of epoxy resin production, all of the epihalohydrins used for preparation are new in industrial production, but the subsequent batches are consumed by the reaction with epihalohydrins recovered from the crude reaction product. It is possible to use in combination with new epihalohydrins corresponding to the amount that disappears in part, which is economically preferable. At this time, the epihalohydrin used is not particularly limited, and examples thereof include epichlorohydrin, epibromohydrin, β-methylepichlorohydrin, and the like. Of these, epichlorohydrin is preferred because it is easily available industrially.

  Specific examples of the basic catalyst include alkaline earth metal hydroxides, alkali metal carbonates and alkali metal hydroxides. In particular, alkali metal hydroxides are preferable from the viewpoint of excellent catalytic activity of the epoxy resin synthesis reaction, and examples thereof include sodium hydroxide and potassium hydroxide. In use, these basic catalysts may be used in the form of an aqueous solution of about 10 to 55% by mass, or in the form of a solid. Moreover, the reaction rate in the synthesis | combination of an epoxy resin can be raised by using an organic solvent together. Examples of such organic solvents include, but are not limited to, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol, 1-propyl alcohol, isopropyl alcohol, 1-butanol, secondary butanol, and tertiary butanol, methyl Examples include cellosolves such as cellosolve and ethyl cellosolve, ethers such as tetrahydrofuran, 1,4-dioxane, 1,3-dioxane and diethoxyethane, and aprotic polar solvents such as acetonitrile, dimethyl sulfoxide and dimethylformamide. These organic solvents may be used alone or in combination of two or more kinds in order to adjust the polarity.

  After the reaction product of the epoxidation reaction is washed with water, unreacted epihalohydrin and the organic solvent to be used in combination are distilled off by distillation under heating and reduced pressure. Further, in order to obtain an epoxy resin with less hydrolyzable halogen, the obtained epoxy resin is again dissolved in an organic solvent such as toluene, methyl isobutyl ketone, methyl ethyl ketone, and alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. Further reaction can be carried out by adding an aqueous solution of the product. At this time, a phase transfer catalyst such as a quaternary ammonium salt or crown ether may be present for the purpose of improving the reaction rate. When the phase transfer catalyst is used, the amount used is preferably 0.1 to 3.0 parts by mass with respect to 100 parts by mass of the epoxy resin used. After completion of the reaction, the produced salt is removed by filtration, washing with water, etc., and further, a solvent such as toluene and methyl isobutyl ketone is distilled off under reduced pressure by heating to obtain the desired epoxy resin as an essential component of the present invention. be able to.

  Next, the epoxy resin composition for electronic materials according to the present invention comprises the epoxy resin and the curing agent described in detail above as essential components, and the epoxy resin is a reaction product during production containing an oligomer component. It can be used as a thing.

  The curing agent used here is not particularly limited, and any compound commonly used as a curing agent for ordinary epoxy resins can be used. For example, amine compounds, amide compounds, acid anhydride compounds, Examples include phenolic compounds. Specifically, examples of the amine compound include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, imidazole, BF3-amine complex, and guanidine derivatives. Examples of the amide compound include dicyandiamide, Examples include polyamide resins synthesized from dimer of linolenic acid and ethylenediamine. Examples of acid anhydride compounds include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, and tetrahydrophthalic anhydride. , Methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, etc., and phenolic compounds include phenol novolac resins, cresol novolac resins, Aromatic hydrocarbon formaldehyde resin modified phenolic resin, dicyclopentadiene phenol addition type resin, phenol aralkyl resin (Zyloc resin), polyhydric phenol novolak resin synthesized from formaldehyde and polyhydroxy compound represented by resorcin novolac resin, naphthol Aralkyl resin, trimethylol methane resin, tetraphenylol ethane resin, naphthol novolac resin, naphthol-phenol co-condensed novolac resin, naphthol-cresol co-condensed novolac resin, biphenyl-modified phenol resin (polyvalent polyphenol with bismethylene group linked to phenol nucleus) Phenolic compounds), biphenyl-modified naphthol resins (polyvalent naphthol compounds in which phenol nuclei are linked by bismethylene groups), aminotriazine-modified phenols Resin (polyhydric phenol compound in which phenol nucleus is linked by melamine, benzoguanamine, etc.) and alkoxy group-containing aromatic ring modified novolak resin (polyhydric phenol compound in which phenol nucleus and alkoxy group-containing aromatic ring are linked by formaldehyde) And monohydric phenol compounds. These curing agents may be used alone or in combination of two or more.

Among these, those containing a large amount of an aromatic skeleton in the molecular structure are preferred from the viewpoint of low thermal expansion, and specifically, phenol novolac resins, cresol novolac resins, aromatic hydrocarbon formaldehyde resin-modified phenol resins, phenol aralkyls. Resin, resorcinol novolak resin, naphthol aralkyl resin, naphthol novolak resin, naphthol-phenol co-condensed novolak resin, naphthol-cresol co-condensed novolak resin, biphenyl-modified phenol resin, biphenyl-modified naphthol resin, aminotriazine-modified phenol resin, alkoxy group-containing aromatic A ring-modified novolak resin (a polyhydric phenol compound in which a phenol nucleus and an alkoxy group-containing aromatic ring are linked with formaldehyde) is preferable because of its low thermal expansion.

  The blending amount of the epoxy resin and the curing agent in the epoxy resin composition for electronic materials of the present invention is not particularly limited, but the total of epoxy groups of the epoxy resin from the point that the obtained cured product characteristics are good. The amount by which the active group in the curing agent is 0.7 to 1.5 equivalents with respect to 1 equivalent is preferable.

  Moreover, a hardening accelerator can also be suitably used together with the epoxy resin composition of this invention as needed. Various curing accelerators can be used, and examples thereof include phosphorus compounds, tertiary amines, imidazoles, organic acid metal salts, Lewis acids, and amine complex salts. In particular, when used as a semiconductor sealing material application, from the viewpoint of excellent curability, heat resistance, electrical characteristics, moisture resistance reliability, etc., triphenylphosphine is used for phosphorus compounds, and 1,8-diazabicyclo- is used for tertiary amines. [5.4.0] -undecene (DBU) is preferred.

  In the epoxy resin composition for electronic materials of the present invention, the aforementioned 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene may be used alone as the epoxy resin component. Other epoxy resins may be used in combination as long as the above effects are not impaired. Specifically, another epoxy resin can be used in combination in the range where the epoxy resin is 30% by mass or more, preferably 40% by mass or more with respect to the total mass of the epoxy resin component.

Here, as the other epoxy resin that can be used in combination with the aforementioned 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene, various epoxy resins can be used. For example, bisphenol A Type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, tetramethylbiphenyl type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, triphenylmethane type epoxy resin, tetraphenyl Ethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin, phenol aralkyl type epoxy resin, naphthol novolak type epoxy resin, naphthol aralkyl type epoxy resin, naphthol-phenol Condensed novolak type epoxy resin, naphthol - cresol co-condensed novolac type epoxy resin, aromatic hydrocarbon formaldehyde resin-modified phenol resin type epoxy resin, a biphenyl novolak type epoxy resins. Among these, phenol aralkyl type epoxy resin, biphenyl novolac type epoxy resin, naphthol novolak type epoxy resin containing naphthalene skeleton, naphthol aralkyl type epoxy resin, naphthol-phenol co-condensed novolac type epoxy resin, naphthol-cresol co-condensed novolak type Epoxy resin, crystalline biphenyl type epoxy resin, tetramethyl biphenyl type epoxy resin, xanthene type epoxy resin, alkoxy group-containing aromatic ring-modified novolak type epoxy resin (formaldehyde has glycidyl group-containing aromatic ring and alkoxy group-containing aromatic ring The linked compound) is particularly preferred from the viewpoint of obtaining a cured product having excellent heat resistance.

  The epoxy composition for electronic materials of the present invention can further contain a filler. By adding a filler, the resin composition can be provided with characteristics such as improved heat resistance, flame retardancy, low linear expansion coefficient, low dielectric constant, and the like. Examples of the filler used here include silica, alumina, silicon nitride, and aluminum hydroxide. Examples of silica include fused silica and crystalline silica. When silica is used as the filler, it is preferable to use fused silica when the amount is particularly large. The fused silica can be used in either a crushed shape or a spherical shape, but in order to increase the blending amount of the fused silica and to suppress an increase in the melt viscosity of the molding material, it is preferable to mainly use a spherical shape. . In order to further increase the blending amount of the spherical silica, it is preferable to appropriately adjust the particle size distribution of the spherical silica. The filling rate is preferably higher in consideration of flame retardancy, and is preferably 65% by mass or more with respect to the total amount of the epoxy resin composition.

  The epoxy resin composition for electronic materials of the present invention can further contain a fibrous base material. By adding a fibrous base material, strength and a low linear expansion coefficient can be imparted to the resin composition for electronic materials of the present invention, which can be suitably used as a fiber reinforced resin. Here, the fibrous base material used includes, for example, plant fibers, glass fibers, carbon fibers, aramid fibers, and the like, which may be woven or non-woven, fiber aggregates or dispersions. It doesn't matter. Specific examples of the fibrous base material include paper, glass cloth, glass nonwoven fabric, aramid paper, aramid cloth, aramid nonwoven fabric, glass mat, and glass roving cloth. For example, when used as an electronic circuit board, strength and low line Glass fiber is preferable because it can provide an expansion coefficient. For example, in the case of producing a prepreg using glass fibers, the preferred ones from the viewpoint of resin fluidity (impregnation) are glass fibers having a diameter of 10 μm or less, fiber density of 40 to 80 fibers / inch, and epoxysilane. A glass cloth treated with a silane coupling agent such as a coupling agent or an aminosilane coupling agent. More preferably, a treatment which eliminates the gap between the warp and weft nets as much as possible is preferable. The glass nonwoven fabric preferably has a basis weight of 15 g / m 2, a thickness of about 0.1 mm to a basis weight of 120 g / m 2, and a thickness of about 1.0 mm. In addition, it is preferable from a viewpoint of a use purpose that the fibrous base material used for this invention is 100 micrometers or less in thickness.

The epoxy resin composition for electronic materials of the present invention is characterized by exhibiting excellent solvent solubility. Therefore, the epoxy resin composition for electronic materials of the present invention may contain an organic solvent. Examples of the organic solvent that can be used here include, but are not limited to, methyl ethyl ketone, acetone, dimethylformamide, methyl isobutyl ketone, methoxypropanol, cyclohexanone, methyl cellosolve, ethyl diglycol acetate, propylene glycol monomethyl ether acetate, and the like. The selection and proper amount used can be appropriately selected depending on the application. For example, in the printed wiring board application, a polar solvent having a boiling point of 160 ° C. or lower such as methyl ethyl ketone, acetone, dimethylformamide, etc. is preferable. It is preferable to use in the ratio which becomes 40-80 mass%. On the other hand, in build-up adhesive film applications, as organic solvents, for example, ketones such as acetone, methyl ethyl ketone, cyclohexanone, acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, carbitol acetate, It is preferable to use carbitols such as cellosolve and butyl carbitol, aromatic hydrocarbons such as toluene and xylene, amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone, and a non-volatile content of 30 to 60 It is preferable to use at a ratio of mass%.

Moreover, the epoxy resin composition for electronic materials of the present invention may be blended with a non-halogen flame retardant that substantially does not contain a halogen atom, for example, in the field of electronic circuit boards, in order to exhibit flame retardancy. Good.

  Examples of the non-halogen flame retardant include phosphorus flame retardant, nitrogen flame retardant, silicone flame retardant, inorganic flame retardant, organometallic salt flame retardant and the like. However, it may be used alone, or a plurality of flame retardants of the same system may be used, or different types of flame retardants may be used in combination.

  As the phosphorus-based flame retardant, both inorganic and organic can be used. Examples of the inorganic compounds include red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphates such as ammonium polyphosphate, and inorganic nitrogen-containing phosphorus compounds such as phosphate amide. .

  The red phosphorus is preferably subjected to a surface treatment for the purpose of preventing hydrolysis and the like. Examples of the surface treatment method include (i) magnesium hydroxide, aluminum hydroxide, zinc hydroxide, A method of coating with an inorganic compound such as titanium hydroxide, bismuth oxide, bismuth hydroxide, bismuth nitrate or a mixture thereof; (ii) an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, titanium hydroxide; And a method of coating with a mixture of thermosetting resin such as phenol resin, (iii) thermosetting phenol resin or the like on a film of an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide or titanium hydroxide For example, a method of double coating with a functional resin.

  Examples of the organic phosphorus compound include, for example, general-purpose organic phosphorus compounds such as phosphate ester compounds, phosphonic acid compounds, phosphinic acid compounds, phosphine oxide compounds, phospholane compounds, organic nitrogen-containing phosphorus compounds, and 9,10. -Dihydro-9-oxa-10-phosphaphenanthrene = 10-oxide, 10- (2,5-dihydrooxyphenyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide, 10- (2,7 -Dihydrooxynaphthyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide and other cyclic organic phosphorus compounds, and derivatives obtained by reacting them with compounds such as epoxy resins and phenol resins.

  The blending amount thereof is appropriately selected depending on the type of the phosphorus-based flame retardant, the other components of the curable resin composition, and the desired degree of flame retardancy. In the case of using red phosphorus as a non-halogen flame retardant for the epoxy resin composition containing all of the halogen flame retardant and other fillers and additives, the range is 0.1 to 2.0% by mass. It is preferable to mix, and when using an organophosphorus compound, it is similarly preferable to mix in the range of 0.1 to 10.0% by mass, and particularly in the range of 0.5 to 6.0% by mass. Is preferred.

  In addition, when using the above phosphorus flame retardant, hydrotalcite, magnesium hydroxide, boric compound, zirconium oxide, black dye, calcium carbonate, zeolite, zinc molybdate, activated carbon, etc. are used in combination with the phosphorus flame retardant. Also good.

  Examples of the nitrogen-based flame retardant include triazine compounds, cyanuric acid compounds, isocyanuric acid compounds, phenothiazines, and the like, and triazine compounds, cyanuric acid compounds, and isocyanuric acid compounds are preferable.

  Examples of the triazine compound include melamine, acetoguanamine, benzoguanamine, melon, melam, succinoguanamine, ethylene dimelamine, melamine polyphosphate, triguanamine, and the like, for example, (i) guanylmelamine sulfate, melem sulfate, (Iii) Cocondensates of phenols such as phenol, cresol, xylenol, butylphenol and nonylphenol with melamines such as melamine, benzoguanamine, acetoguanamine and formguanamine and formaldehyde, (iii) ) A mixture of the co-condensate of (ii) and a phenol resin such as a phenol formaldehyde condensate; (iv) the above (ii), (iii) further modified with paulownia oil, isomerized linseed oil, etc. It is.

  Specific examples of the cyanuric acid compound include cyanuric acid and cyanuric acid melamine.

  The blending amount of the nitrogen-based flame retardant is appropriately selected depending on the type of the nitrogen-based flame retardant, the other components of the curable resin composition, and the desired degree of flame retardancy. , It is preferable to mix in the range of 0.05 to 10% by mass, especially 0.1% to the epoxy resin composition containing all of the curing agent, non-halogen flame retardant and other fillers and additives. It is preferable to mix in the range of ˜5% by mass.

  Moreover, when using the said nitrogen-type flame retardant, you may use together a metal hydroxide, a molybdenum compound, etc.

  The silicone flame retardant is not particularly limited as long as it is an organic compound containing a silicon atom, and examples thereof include silicone oil, silicone rubber, and silicone resin.

  The amount of the silicone-based flame retardant is appropriately selected depending on the type of the silicone-based flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. For example, the epoxy resin composition It is preferable to mix in the range of 0.05 to 20% by mass with respect to the epoxy resin composition containing all of the product, non-halogen flame retardant and other fillers and additives. Moreover, when using the said silicone type flame retardant, you may use a molybdenum compound, an alumina, etc. together.

  Examples of the inorganic flame retardant include metal hydroxide, metal oxide, metal carbonate compound, metal powder, boron compound, and low-melting glass.

  Specific examples of the metal hydroxide include aluminum hydroxide, magnesium hydroxide, dolomite, hydrotalcite, calcium hydroxide, barium hydroxide, zirconium hydroxide and the like.

  Specific examples of the metal oxide include, for example, zinc molybdate, molybdenum trioxide, zinc stannate, tin oxide, aluminum oxide, iron oxide, titanium oxide, manganese oxide, zirconium oxide, zinc oxide, molybdenum oxide, and oxide. Examples include cobalt, bismuth oxide, chromium oxide, nickel oxide, copper oxide, and tungsten oxide.

  Specific examples of the metal carbonate compound include zinc carbonate, magnesium carbonate, calcium carbonate, barium carbonate, basic magnesium carbonate, aluminum carbonate, iron carbonate, cobalt carbonate, and titanium carbonate.

  Specific examples of the metal powder include aluminum, iron, titanium, manganese, zinc, molybdenum, cobalt, bismuth, chromium, nickel, copper, tungsten, and tin.

  Specific examples of the boron compound include zinc borate, zinc metaborate, barium metaborate, boric acid, and borax.

  Specific examples of the low-melting-point glass include, for example, Shipley (Bokusui Brown), hydrated glass SiO2-MgO-H2O, PbO-B2O3-based, ZnO-P2O5-MgO-based, P2O5-B2O3-PbO-MgO-based. , P-Sn-O-F series, PbO-V2O5-TeO2 series, Al2O3-H2O series, lead borosilicate series and the like.

  The amount of the inorganic flame retardant is appropriately selected depending on the type of the inorganic flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. For example, the epoxy resin composition It is preferable to blend in the range of 0.5 to 50% by weight, particularly 5 to 30% by weight, based on the curable resin composition in which all of the product, non-halogen flame retardant and other fillers and additives are blended. It is preferable to mix in the range of%.

  Examples of the organometallic salt flame retardant include ferrocene, acetylacetonate metal complex, organometallic carbonyl compound, organocobalt salt compound, organosulfonic acid metal salt, metal atom and aromatic compound or heterocyclic compound. Or the compound etc. which carried out the coordinate bond are mentioned.

  The amount of the organometallic salt flame retardant is appropriately selected depending on the type of the organometallic salt flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. The epoxy resin composition, non-halogen flame retardant and other fillers and additives are all preferably blended in the range of 0.005 to 10% by mass.

  Various compounding agents, such as a silane coupling agent, a mold release agent, a pigment, an emulsifier, can be added to the epoxy resin composition for electronic materials of this invention as needed.

  The epoxy resin composition for electronic materials of the present invention can be obtained by uniformly mixing the above-described components. The epoxy resin composition of the present invention, in which the epoxy resin of the present invention, a curing agent and, if necessary, a curing accelerator are blended, can be easily made into a cured product by a method similar to a conventionally known method. Examples of the cured product include molded cured products such as laminates, cast products, adhesive layers, coating films, and films.

  The epoxy resin composition for electronic materials of this invention can be used suitably as a semiconductor sealing material and an electronic circuit board material.

[Semiconductor sealing material]
For example, in order to produce an epoxy resin composition for an electronic material used for a semiconductor sealing material, the 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene and the curing agent are used. These are mixed sufficiently until they become uniform using, for example, an extruder, a kneader, a roll, etc. to obtain a melt-mixed epoxy resin composition. In that case, as a filler, a silica is normally used and the filler is used in the range of 30-95 mass% with respect to 100 mass parts of epoxy resin compositions. Among these, in order to improve flame retardancy, moisture resistance and solder crack resistance, and to reduce the linear expansion coefficient, 65% by mass or more is preferable, and 70% by mass or more is particularly preferable, in order to greatly increase the effects. 80% by mass or more can further enhance the effect.
For semiconductor package molding, the composition is molded by casting, using a transfer molding machine, an injection molding machine or the like, and further heated at 50 to 200 ° C. for 2 to 10 hours to form a semiconductor device which is a molded product. There is a way to get it.

  In the epoxy resin composition for electronic materials used for the semiconductor sealing material of the present invention, a coupling agent may be used as necessary in order to enhance the adhesion between the resin component and the inorganic filler. Examples of the coupling agent include various silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum compounds, zirconium compounds, and aluminum chelates.

  The blending amount of the coupling agent is preferably 0.01 to 5% by mass, more preferably 0.05 to 2.5% by mass with respect to the filler. If it is less than 0.01% by mass, the adhesiveness to various package components tends to decrease, and if it exceeds 5% by mass, molding defects such as voids tend to occur.

  Furthermore, the epoxy resin composition for electronic materials used for the semiconductor sealing material of the present invention requires a mold release agent, a colorant, a stress relaxation agent, an adhesion improver, a surfactant, etc. as other additives. It can be blended according to.

  Examples of the mold release agent include carnauba wax, hydrocarbon, aliphatic, amide, ester, higher alcohol, and higher fatty acid metal salt.

  Examples of the hydrocarbons include paraffin wax and polyolefin wax. Polyolefin waxes are roughly classified into non-polarized non-polar polyolefin waxes and oxidized polyolefin waxes, and there are polyethylene-based, polypropylene-based, and vinyl acetate-ethylene copolymer systems, respectively.

  As the fatty acid system, montanic acid, stearic acid, hebenic acid, 12-hydroxystearic acid, as the amide system, stearic acid amide, oleic acid amide, methylenebisstearic acid amide, as the ester system, butyl stearate, stearic acid Examples of acid monoglycerides, stearyl stearate, and higher alcohols include stearyl alcohol, and examples of higher fatty acid metal salts include calcium stearate, zinc stearate, and magnesium stearate.

  As the colorant, inorganic colorants such as bengara, carbon black, glass compositions, and phthalocyanine-based compounds, anthraquinone-based, methine-based, indigoid-based, and azo-based organic compound pigments can be used. Carbon black is preferred because of its excellent effect.

  There is no restriction | limiting in particular as a low stress agent (stress relaxation agent), For example, silicone oil, liquid rubber, rubber powder, a methyl acrylate-butadiene-styrene copolymer, such as a thermoplastic resin, methyl methacrylate-butadiene- Examples include butadiene copolymer rubbers such as styrene copolymers and those described in silicone compounds.

  Further, hydrotalcites and ion trapping agents such as bismuth hydroxide may be blended for the purpose of improving the reliability in the moisture resistance reliability test. The adhesion improver is not particularly limited, and examples thereof include N-cyclohexyl-2-benzothiazolylsulfanamide, N-oxydiethylene-2-benzothiazolylsulfanamide, N, N-dicyclohexyl-2-benzo Examples thereof include thiazolylsulfanamide, Nt-butyl-2-benzothiazolylsulfanamide, a compound having a benzothiazole skeleton, an indene resin, a crosslinked diallyl phthalate resin powder, and butadiene rubber particles.

  Examples of the surfactant include polyethylene glycol fatty acid ester, sorbitan fatty acid ester, fatty acid monoglyceride and the like.

  The epoxy resin composition for electronic materials used for the semiconductor encapsulating material of the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed. The raw materials are sufficiently mixed with a mixer or the like, then melt-kneaded with a mixing roll or an extruder, and then cooled and pulverized. It is easy to use if it is tableted with dimensions and mass that match the molding conditions.

  As an electronic component device provided with an element sealed with an epoxy resin composition for electronic materials used for a semiconductor sealing material obtained in the present invention, a lead frame, a wired tape carrier, a wiring board, glass, a silicon wafer, etc. On the support member, active elements such as semiconductor chips, transistors, diodes, thyristors, and passive elements such as capacitors, resistors, and coils are mounted, and necessary portions are sealed with the semiconductor sealing material of the present invention. An electronic component device etc. are mentioned. As such an electronic component device, specifically, 1) a semiconductor element is fixed on a lead frame, a terminal part of an element such as a bonding pad and a lead part are connected by wire bonding or bump, DIP, PLCC, QFP, SOP, SOJ, TSOP, TQFP, and other general resin-encapsulated ICs that are encapsulated by transfer molding using a semiconductor encapsulation material, and 2) connected to the tape carrier by bumps A semiconductor chip in which a semiconductor chip is sealed with a semiconductor sealing material of the present invention, a wiring formed on a wiring board or glass by wire bonding, flip chip bonding, solder, or the like. 3) Transistor, diode, thyristor Active elements such as capacitors or passive elements such as capacitors, resistors, and coils are sealed with the semiconductor sealing material of the present invention. OB module, 4) A semiconductor chip is mounted on an interposer substrate on which terminals for connecting a hybrid IC, a multi-chip module, and a mother board are formed, and after connecting the semiconductor chip and the wiring formed on the interposer substrate by bump or wire bonding, One-side sealed packages such as BGA, CSP, MCP, etc., in which the semiconductor chip mounting side is sealed with the semiconductor sealing material of the invention, can be mentioned. Among them, a single-sided sealing type package including an element sealed with an epoxy resin composition for electronic materials used for a semiconductor sealing material obtained in the present invention has a feature that a warpage amount is small.

  As the lead frame, a copper (including copper alloy) lead frame, a Ni-plated lead frame in which a Ni layer is formed on the surface of a copper plate or the like by a method such as plating, or a 42 alloy lead frame should be used. Can do.

  As a method of sealing an element using the epoxy resin composition for electronic materials used in the semiconductor sealing material of the present invention, the low pressure transfer molding method is the most common, but the injection molding method, the compression molding method, etc. It may be used.

[Electronic circuit board]
Specifically, the epoxy resin composition for an electronic material used for the electronic circuit board of the present invention includes a printed wiring board material, a flexible wiring board material, an interlayer insulating material for a buildup board, a conductive paste, and an adhesive film for buildup Used in materials, resist inks, resin casting materials, adhesives, etc. Of these various applications, passive components such as capacitors and active components such as IC chips are placed in the substrate for printed wiring boards, flexible wiring board materials, build-up board interlayer insulation materials, and build-up adhesive films. It can be used as an insulating material for a so-called electronic component-embedded substrate embedded in the substrate. Among these, it is preferable to use for the resin composition for flexible wiring boards, and the interlayer insulation material for buildup board | substrates from the characteristics, such as high flame retardance, high heat resistance, low thermal expansibility, and solvent solubility.

  Here, in order to manufacture a printed wiring board from the epoxy resin composition for electronic materials of the present invention, in addition to the epoxy resin composition for electronic materials, an organic solvent is blended to obtain a varnished epoxy resin composition, which is reinforced. There is a method of impregnating the base material and stacking the copper foil and heat-pressing it. The reinforcing substrate that can be used here is the fibrous substrate of the present invention, and examples thereof include paper, glass cloth, glass nonwoven fabric, aramid paper, aramid cloth, glass mat, and glass roving cloth. If this method is described in further detail, first, the varnish-like curable resin composition is heated at a heating temperature corresponding to the solvent type used, preferably 50 to 170 ° C., thereby being a prepreg which is a cured product. Get. The mass ratio of the resin composition and the fibrous base material used at this time is not particularly limited, but it is usually preferable that the resin content in the prepreg is 20 to 60% by mass. Next, the prepreg obtained as described above is laminated by a conventional method, and a copper foil is appropriately stacked, and then subjected to thermocompression bonding at a pressure of 1 to 10 MPa at 170 to 250 ° C. for 10 minutes to 3 hours, A target printed wiring board can be obtained.

In order to produce a flexible wiring board from the epoxy resin composition for electronic materials of the present invention, in addition to the epoxy resin composition for electronic materials, a phosphorus atom-containing compound, a curing accelerator, and an organic solvent are blended, and reverse Using an applicator such as a roll coater or comma coater, it is applied to the electrically insulating film. Subsequently, it heats at 60-170 degreeC for 1 to 15 minutes using a heating machine, volatilizes a solvent, and B-stages an adhesive composition. Next, the metal foil is thermocompression bonded to the adhesive using a heating roll or the like. At that time, the pressure is preferably 2 to 200 N / cm and the pressure is preferably 40 to 200 ° C. If sufficient adhesive performance can be obtained, the process may be completed here. However, when complete curing is required, it is preferably post-cured at 100 to 200 ° C. for 1 to 24 hours. The thickness of the adhesive composition film after finally curing is preferably in the range of 5 to 100 μm.

  As a method for obtaining an interlayer insulating material for a build-up substrate from the epoxy resin composition for electronic materials of the present invention, for example, in addition to the epoxy resin composition for electronic materials, rubber, filler, etc. are appropriately blended to form a circuit. It is cured after being applied to the wiring board using a spray coating method, a curtain coating method, or the like. Then, after drilling a predetermined through-hole part etc. as needed, it treats with a roughening agent, forms the unevenness | corrugation by washing the surface with hot water, and metal-treats, such as copper. As the plating method, electroless plating or electrolytic plating treatment is preferable, and examples of the roughening agent include an oxidizing agent, an alkali, and an organic solvent. Such operations are sequentially repeated as desired, and a build-up base can be obtained by alternately building up and forming the resin insulating layer and the conductor layer having a predetermined circuit pattern. However, the through-hole portion is formed after the outermost resin insulating layer is formed. In addition, a resin-coated copper foil obtained by semi-curing the resin composition on the copper foil is thermocompression-bonded at 170 to 250 ° C. on a circuit board on which a circuit is formed, thereby forming a roughened surface and plating treatment. It is also possible to produce a build-up substrate by omitting the process.

  The method for producing an adhesive film for build-up from the epoxy resin composition for electronic materials of the present invention is, for example, in addition to the epoxy resin composition for electronic materials, blended with an organic solvent, and made a varnished epoxy resin composition, The method of apply | coating on a support film, forming the resin composition layer, and setting it as the adhesive film for multilayer printed wiring boards is mentioned.

  When the epoxy resin composition for electronic materials of the present invention is used for an adhesive film for build-up, the adhesive film is softened under a lamination temperature condition (usually 70 ° C. to 140 ° C.) in a vacuum laminating method, At the same time, it is important to show fluidity (resin flow) capable of filling the via hole or the through hole present in the circuit board, and it is preferable to blend the above-described components so as to exhibit such characteristics.

  Here, the diameter of the through hole of the multilayer printed wiring board is usually 0.1 to 0.5 mm, and the depth is usually 0.1 to 1.2 mm. It is usually preferable to allow resin filling in this range. When laminating both surfaces of the circuit board, it is desirable to fill about 1/2 of the through hole.

  Specifically, the method for producing the adhesive film described above is such that a varnish-like epoxy resin composition for electronic materials is applied to the surface of the support film, and further the organic solvent is dried by heating or hot air blowing. It can manufacture by forming the layer of an epoxy resin composition.

  The thickness of the formed layer is usually greater than or equal to the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 μm, the thickness of the resin composition layer is preferably 10 to 100 μm.

  In addition, the said layer may be protected with the protective film mentioned later. By protecting with a protective film, it is possible to prevent dust and the like from being attached to the surface of the resin composition layer and scratches.

  The above-mentioned support film and protective film are made of polyolefin such as polyethylene, polypropylene and polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes abbreviated as “PET”), polyester such as polyethylene naphthalate, polycarbonate, polyimide, and further. Examples thereof include metal foil such as pattern paper, copper foil, and aluminum foil. In addition, the support film and the protective film may be subjected to a release treatment in addition to the mud treatment and the corona treatment.

  Although the thickness of a support film is not specifically limited, Usually, it is 10-150 micrometers, Preferably it is used in 25-50 micrometers. Moreover, it is preferable that the thickness of a protective film shall be 1-40 micrometers.

  The above support film is peeled off after laminating on the circuit board or after forming the insulating layer by heat curing. If the support film is peeled after the adhesive film is heat-cured, adhesion of dust and the like in the curing process can be prevented. In the case of peeling after curing, the support film is usually subjected to a release treatment in advance.

  Next, the method for producing a multilayer printed wiring board using the adhesive film obtained as described above is, for example, when the layers are protected by a protective film, after peeling them, the layers are applied to the circuit board. Lamination is performed, for example, by vacuum lamination on one or both sides of the circuit board so as to be in direct contact. The laminating method may be a batch method or a continuous method using a roll. Further, the adhesive film and the circuit board may be heated (preheated) as necessary before lamination.

  The lamination conditions are such that the pressure bonding temperature (laminating temperature) is preferably 70 to 140 ° C., the pressure bonding pressure is preferably 1 to 11 kgf / cm 2 (9.8 × 10 4 to 107.9 × 104 N / m 2), and the air pressure is 20 mmHg (26 It is preferable to laminate under a reduced pressure of 0.7 hPa or less.

  When the epoxy resin composition for electronic materials of the present invention is used as a conductive paste, for example, a method of dispersing fine conductive particles in the curable resin composition to obtain a composition for anisotropic conductive film, room temperature And a liquid paste resin composition for circuit connection and an anisotropic conductive adhesive.

  When the epoxy resin composition for electronic materials of the present invention is used as a resist ink, for example, a cationic polymerization catalyst is used as a catalyst for the epoxy resin composition, and further a pigment, talc, and filler are added to form a resist ink composition. After making it into a product, after applying on a printed board by a screen printing method, a method of forming a resist ink cured product can be mentioned.

  As a method of obtaining a cured product from the epoxy resin composition for electronic materials of the present invention, it is sufficient to comply with a general curing method of a curable resin composition. The composition obtained by the above method may be heated in a temperature range of about room temperature to about 250 ° C.

  Therefore, by using the epoxy resin, the solvent solubility of the epoxy resin composition is dramatically improved, and the cured product exhibits extremely excellent heat resistance, moisture absorption resistance and low thermal expansion, and the semiconductor sealing material and It can be suitably used for printed wiring board materials.

The present invention will be specifically described with reference to examples and comparative examples.

The melt viscosity at 150 ° C. and GPC and MS spectra were measured under the following conditions.
1) Melt viscosity at 150 ° C .: in accordance with ASTM D4287 2) Softening point measurement method: JIS K7234
3) GPC: The measurement conditions are as follows.
Measuring device: “HLC-8220 GPC” manufactured by Tosoh Corporation
Column: Guard column “HXL-L” manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
+ "TSK-GEL G2000HXL" manufactured by Tosoh Corporation
+ Tosoh Corporation “TSK-GEL G3000HXL”
+ Tosoh Corporation “TSK-GEL G4000HXL”
Detector: RI (differential refractometer)
Data processing: “GPC-8020 Model II version 4.10” manufactured by Tosoh Corporation
Measurement conditions: Column temperature 40 ° C
Mobile phase: Tetrahydrofuran
Flow rate: 1.0 ml / min
Standard: The following monodisperse polystyrene having a known molecular weight was used in accordance with the measurement manual of “GPC-8020 Model II version 4.10”.
(Polystyrene used)
“A-500” manufactured by Tosoh Corporation
"A-1000" manufactured by Tosoh Corporation
"A-2500" manufactured by Tosoh Corporation
"A-5000" manufactured by Tosoh Corporation
“F-1” manufactured by Tosoh Corporation
"F-2" manufactured by Tosoh Corporation
“F-4” manufactured by Tosoh Corporation
“F-10” manufactured by Tosoh Corporation
“F-20” manufactured by Tosoh Corporation
“F-40” manufactured by Tosoh Corporation
“F-80” manufactured by Tosoh Corporation
“F-128” manufactured by Tosoh Corporation
Sample: A 1.0 mass% tetrahydrofuran solution filtered in terms of resin solids and filtered through a microfilter (50 μl).
4) NMR: NMR LA300 manufactured by JEOL Ltd.
5) MS: Gas chromatograph time-of-flight mass spectrometer JMS-T100GC manufactured by JEOL Ltd.

[Synthesis Example 1]
A flask equipped with a thermometer, a stirrer, and a reflux condenser was charged with 139 g (0.5 mol) of iron (III) chloride hexahydrate and 1330 mL of water while purging nitrogen gas, and the inside of the reaction vessel was stirred while stirring. After nitrogen substitution, a solution prepared by dissolving 82 g (0.5 mol) of naphthalene-2,7-diol in 190 mL of isopropyl alcohol in advance was added and stirred at 40 ° C. for 30 minutes. A mixed solution of 139 g (0.5 mol) of iron (III) chloride hexahydrate, 664 mL of water and 94 mL of isopropyl alcohol was added, the temperature was raised to 40 ° C., and the mixture was further stirred for 1 hour. Ethyl acetate 500mL was added to the reaction liquid, and it stirred for 10 minutes. The reaction solution was transferred to a separatory funnel, the organic layer was separated, and the aqueous layer was further extracted with ethyl acetate. The combined organic layers were washed with saturated brine. After the solvent was distilled off to about 200 mL under vacuum, the solution was transferred to a SUS container equipped with a thermometer, stirrer, and Dean-Stark trap, 5 L of toluene was added, and the solvent was replaced with toluene from ethyl acetate and water. did. After cooling the toluene solution to room temperature, insoluble matters were filtered off. The filtrate is transferred to a SUS vessel equipped with a thermometer, stirrer, and Dean-Stark trap, heated to a temperature higher than the boiling point while stirring, and concentrated by distilling off toluene to about 500 mL. -Crystals of binaphthalene-2,2 ', 7,7'-tetraol were precipitated. The precipitate and solvent were filtered by hot filtration at a temperature of 80 ° C. or higher and then dried at 110 ° C. for 5 hours to obtain 53 g of 1,1′-binaphthalene-2,2 ′, 7,7′-tetraol. (Yield 68%). The obtained 1,1′-binaphthalene-2,2 ′, 7,7′-tetraol was confirmed by GPC and MS to contain no multimerized component and high purity.

[Synthesis Example 2]
79 of 1,1′-binaphthalene-2,2 ′, 7,7′-tetraol obtained in Synthesis Example 1 while purging a nitrogen gas purge to a flask equipped with a thermometer, a dropping funnel, a condenser, and a stirrer 0.5 g (0.25 mol), 462 g (5.0 mol) of epichlorohydrin, and 126 g of n-butanol were charged and dissolved. After the temperature was raised to 40 ° C., 100 g (1.20 mol) of a 48% aqueous sodium hydroxide solution was added over 8 hours, and then the temperature was further raised to 50 ° C. and reacted for another 1 hour. After completion of the reaction, 150 g of water was added and allowed to stand, and then the lower layer was discarded. Thereafter, unreacted epichlorohydrin was distilled off under reduced pressure at 150 ° C. Then, 230 g of methyl isobutyl ketone was added to the crude epoxy resin thus obtained and dissolved. Further, 100 g of a 10% by mass aqueous sodium hydroxide solution was added to this solution and reacted at 80 ° C. for 2 hours, and then washing with water was repeated three times until the pH of the washing solution became neutral. Next, the system was dehydrated by azeotropic distillation, and after microfiltration, the solvent was distilled off under reduced pressure to obtain the desired epoxy resin 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-. 135 g of binaphthalene (A-1) was obtained. The resulting epoxy resin (A-1) had a softening point of 61 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 1.1 dPa · s, and an epoxy equivalent of 144 g / Equivalent. 90% or more in area ratio is the target product by GPC measurement, and 542 peak indicating 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene (A-1) is obtained by MS measurement. confirmed.

[Example 1 and Comparative Example 1]
Epoxy resin (A-1) of the present invention obtained in Synthesis Example 2 and comparative epoxy resin (A-2) [the following structural formula]

4-functional naphthalene-based epoxy resin (“Epiclon HP-4700” manufactured by DIC Corporation, softening point 91 ° C., 150 ° C., melt viscosity 4.5 ps, epoxy equivalent 166 g / equivalent)]
The composition shown in Table 1 using a phenol novolac type phenol resin (“Phenolite TD-2131” manufactured by DIC Corporation, hydroxyl group equivalent 104 g / equivalent) as a curing agent and triphenylphosphine (TPP) as a curing accelerator. Blended, poured into a 11 cm x 9 cm x 2.4 mm mold, molded with a press at 150 ° C for 10 minutes, then removed from the mold and then cured at 175 ° C for 5 hours to create The cured product was evaluated for heat resistance, linear expansion coefficient, and hygroscopicity. Moreover, the solvent solubility about the said epoxy resin (A-1) and an epoxy resin (A-2) was measured with the following method. The results are shown in Table 1.

<Heat resistance (glass transition temperature)>
Using a viscoelasticity measuring device (DMA: solid viscoelasticity measuring device RSAII manufactured by Rheometric, rectangular tension method; frequency 1 Hz, heating rate 3 ° C./min), the elastic modulus change is maximized (tan δ change rate is the highest). The (large) temperature was evaluated as the glass transition temperature.
<Heat resistance (5% weight loss temperature)>
Using a differential calorific value simultaneous measurement device (TG / DTA6200 manufactured by SII Nanotechnology), weigh the resin coating on an aluminum pan container, raise the temperature from room temperature to 500 ° C, and measure the 5% weight loss temperature. did.
Measurement condition
Measurement temperature: room temperature to 500 ° C
Measurement atmosphere: Nitrogen heating rate: 10 ° C / min
<Linear expansion coefficient>
Thermomechanical analysis was performed in a compressed mode using a thermomechanical analyzer (TMA: SS-6100 manufactured by Seiko Instruments Inc.).
Measurement conditions Measurement weight: 88.8mN
Temperature increase rate: 2 times at 3 ° C / minute Measurement temperature range: -50 ° C to 300 ° C
The measurement under the above conditions was performed twice for the same sample, and the average expansion coefficient in the temperature range from 25 ° C. to 280 ° C. in the second measurement was evaluated as the linear expansion coefficient.
<Hygroscopic rate>
The moisture absorption rate was calculated from the rate of weight increase after moisture absorption for 300 hours under a moisture absorption condition of 85 ° C./85% RH in a constant temperature and humidity device.
<Solvent solubility>
10 parts of epoxy resin and 4.3 parts of methyl ethyl ketone were dissolved in a sealed state at 60 ° C. in a sample bottle. Then, it cooled to 25 degreeC and evaluated whether the crystal | crystallization precipitated. When the crystal did not precipitate, it was judged as ○, and when the crystal was precipitated, it was judged as ×.

[Example 2 and Comparative Example 2]
A tetrafunctional naphthalene-based epoxy resin (manufactured by DIC Corporation) which is the epoxy resin (A-1) of the present invention obtained in Synthesis Example 2 and the comparative epoxy resin (A-2) used in Comparative Example 1. “Epicron HP-4700”, softening point 82 ° C., 150 ° C. melt viscosity 4.5 ps, epoxy equivalent 166 g / equivalent)], as curing agent “XLC-3L” (phenol aralkyl resin, hydroxyl group equivalent: 172 g) / Eq), triphenylphosphine (TPP) as a curing accelerator, spherical silica (FB-560 manufactured by Electrochemical Co., Ltd.) as an inorganic filler, and γ-glycidoxytriethoxyxysilane (Shin-Etsu Chemical Co., Ltd.) as a silane coupling agent “KBM-403” manufactured by the company), Carnauba wax (Pearl Wax No. 1-P manufactured by Celalica Noda Co., Ltd.) The composition shown in Table 2 was blended and melted and kneaded for 5 minutes at a temperature of 90 ° C. using two rolls to prepare the desired composition. A product obtained by pulverizing the obtained composition was further cured at 180 ° C. for 5 hours using a transfer molding machine and formed into a rectangle having a width of 12.7 mm, a length of 127 mm, and a thickness of 1.6 mm.

<Heat resistance (5% weight loss temperature)>
In the formulations of Example 2 and Comparative Example 2, cured products were prepared by removing spherical silica, silane coupling agent, and carnauba wax, and evaluated in the same manner as in Example 1 and Comparative Example 1.
<Flame retardance>
A combustion test was conducted in accordance with the UL-94 test method using five test pieces for evaluation having a width of 12.7 mm, a length of 127 mm, and a thickness of 1.6 mm.
Fmax: Maximum burning time in one flame contact (second)
ΣF: Total burning time of 5 test pieces (seconds)

As can be seen from the results of Tables 1 and 2, the epoxy resin of the present invention has a low softening point temperature and a low melt viscosity, and its cured product has a low moisture absorption and a low heat characteristic of naphthalene-based tetrafunctional epoxy resins. It is clear that the solvent solubility is good and the heat resistance and flame retardancy are excellent while maintaining the expansion rate.

The epoxy resin composition of the present invention is useful for an electronic material, and can be suitably used particularly as a semiconductor sealing material and an electronic circuit board material.

Claims (9)

An electronic material comprising an epoxy resin and a curing agent, wherein the epoxy resin is 2,2 ′, 7,7′-tetraglycidyloxy-1,1′-binaphthalene Epoxy resin composition. Furthermore, the epoxy resin composition for electronic materials of Claim 1 containing a filler. Furthermore, the epoxy resin composition for electronic materials in Claim 1 or 2 containing a fibrous base material. The epoxy resin composition for electronic materials according to any one of claims 1 to 3, which is used for a semiconductor sealing material. The epoxy resin composition for electronic materials according to any one of claims 1 to 3, which is for electronic circuit board materials. A cured epoxy resin for electronic materials, wherein the epoxy resin composition for electronic materials according to claim 1 is cured. The electronic member containing the epoxy resin hardened | cured material for electronic materials of Claim 7. The electronic member according to claim 8, which is a semiconductor sealing material. The electronic member according to claim 8, which is an electronic circuit board.