JP2014190932A5 - - Google Patents

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Publication number
JP2014190932A5
JP2014190932A5 JP2013068695A JP2013068695A JP2014190932A5 JP 2014190932 A5 JP2014190932 A5 JP 2014190932A5 JP 2013068695 A JP2013068695 A JP 2013068695A JP 2013068695 A JP2013068695 A JP 2013068695A JP 2014190932 A5 JP2014190932 A5 JP 2014190932A5
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JP
Japan
Prior art keywords
optical device
thin film
single crystal
transparent substrate
plasmon resonance
Prior art date
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Pending
Application number
JP2013068695A
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English (en)
Japanese (ja)
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JP2014190932A (ja
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Publication date
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Priority to JP2013068695A priority Critical patent/JP2014190932A/ja
Priority claimed from JP2013068695A external-priority patent/JP2014190932A/ja
Publication of JP2014190932A publication Critical patent/JP2014190932A/ja
Publication of JP2014190932A5 publication Critical patent/JP2014190932A5/ja
Pending legal-status Critical Current

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JP2013068695A 2013-03-28 2013-03-28 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス Pending JP2014190932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013068695A JP2014190932A (ja) 2013-03-28 2013-03-28 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013068695A JP2014190932A (ja) 2013-03-28 2013-03-28 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス

Publications (2)

Publication Number Publication Date
JP2014190932A JP2014190932A (ja) 2014-10-06
JP2014190932A5 true JP2014190932A5 (cg-RX-API-DMAC10.html) 2016-04-21

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ID=51837301

Family Applications (1)

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JP2013068695A Pending JP2014190932A (ja) 2013-03-28 2013-03-28 金属単結晶薄膜の製造方法、光学デバイスの製造方法及び光学デバイス

Country Status (1)

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JP (1) JP2014190932A (cg-RX-API-DMAC10.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101916316B1 (ko) * 2017-04-26 2018-11-09 한국과학기술연구원 플라즈모닉 도파관용 적층체 및 그의 제조방법
WO2023053649A1 (ja) * 2021-09-28 2023-04-06 学校法人東北工業大学 光学デバイス及びその製造方法
CN117448767A (zh) * 2023-11-02 2024-01-26 浙江师范大学 一种自由态金属薄膜及其制备方法
CN119685756A (zh) * 2024-12-03 2025-03-25 清华大学 一种超光滑金属薄膜及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52136865A (en) * 1976-05-11 1977-11-15 Oike Kogyo Kk Metal evaporation foil and method of making foil and metal evaporation powder
CN100378475C (zh) * 2003-06-26 2008-04-02 株式会社尼康 制造多层光学元件的方法
JP2007078451A (ja) * 2005-09-13 2007-03-29 Canon Inc 金属薄膜つきプリズム及びそれを用いた分光分析装置
JP4257437B2 (ja) * 2007-01-23 2009-04-22 国立大学法人長岡技術科学大学 薄膜電極の製造方法
JP2011242306A (ja) * 2010-05-19 2011-12-01 Kobe Steel Ltd 表面プラズモン共鳴測定用チップ
JP2012163342A (ja) * 2011-02-03 2012-08-30 National Institute Of Advanced Industrial & Technology 金属検出装置、検出板及び金属検出方法

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