JP2014159618A - Surface treatment agent for silver or silver alloy, light-reflecting substrate, light emitting device and method of producing light emitting device - Google Patents
Surface treatment agent for silver or silver alloy, light-reflecting substrate, light emitting device and method of producing light emitting device Download PDFInfo
- Publication number
- JP2014159618A JP2014159618A JP2013031174A JP2013031174A JP2014159618A JP 2014159618 A JP2014159618 A JP 2014159618A JP 2013031174 A JP2013031174 A JP 2013031174A JP 2013031174 A JP2013031174 A JP 2013031174A JP 2014159618 A JP2014159618 A JP 2014159618A
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- Prior art keywords
- silver
- treatment agent
- surface treatment
- light
- silicate compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 69
- 239000004332 silver Substances 0.000 title claims abstract description 69
- 229910001316 Ag alloy Inorganic materials 0.000 title claims abstract description 64
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 62
- 239000000758 substrate Substances 0.000 title claims description 43
- 238000000034 method Methods 0.000 title claims description 13
- -1 for example Inorganic materials 0.000 claims abstract description 97
- 239000007788 liquid Substances 0.000 claims abstract description 47
- 229920000642 polymer Polymers 0.000 claims abstract description 36
- 239000003792 electrolyte Substances 0.000 claims abstract description 29
- 125000002091 cationic group Chemical group 0.000 claims abstract description 28
- 235000012239 silicon dioxide Nutrition 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 125000003010 ionic group Chemical group 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- 125000005496 phosphonium group Chemical group 0.000 claims description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 3
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- 125000003277 amino group Chemical group 0.000 claims description 2
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 2
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- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
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- NJSSICCENMLTKO-HRCBOCMUSA-N [(1r,2s,4r,5r)-3-hydroxy-4-(4-methylphenyl)sulfonyloxy-6,8-dioxabicyclo[3.2.1]octan-2-yl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)O[C@H]1C(O)[C@@H](OS(=O)(=O)C=2C=CC(C)=CC=2)[C@@H]2OC[C@H]1O2 NJSSICCENMLTKO-HRCBOCMUSA-N 0.000 description 3
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- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
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- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
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Abstract
Description
本発明は各種銀又は銀合金の表面処理剤に関し、より詳細には、電子部品、発光装置等に使用される銀又は銀合金の変色を防止するための表面処理剤に関する。また、本発明は、光反射基板、発光装置及び発光装置の製造方法に関する。 The present invention relates to various silver or silver alloy surface treatment agents, and more particularly to a surface treatment agent for preventing discoloration of silver or silver alloys used in electronic parts, light emitting devices and the like. The present invention also relates to a light reflecting substrate, a light emitting device, and a method for manufacturing the light emitting device.
銀又は銀合金は、貴金属として、その優れた光学的性質、電気化学的性質を利用して古くから装飾品、貨幣、食器、電子用材料、照明機器、歯科用材料等として利用されてきた。特に最近では、発光ダイオード用反射材料としての需要が急速に増加している。発光ダイオードの需要も、蛍光灯又は白熱電球に替わる照明機器、自動車用ライト等の用途で急速に増加している。 Silver or a silver alloy has been used as a noble metal as a decorative article, money, tableware, electronic material, lighting device, dental material, etc. for a long time using its excellent optical properties and electrochemical properties. Particularly recently, the demand as a reflective material for light emitting diodes has been rapidly increasing. The demand for light-emitting diodes is also rapidly increasing in applications such as lighting equipment for automobiles and fluorescent lamps or incandescent lamps.
しかし、これらの用途に供する銀又は銀合金は、化学的に非常に不安定で、空気中の酸素、水分、硫化水素、亜硫酸ガス等と容易に反応して、酸化銀又は硫化銀を生成し、それにより銀表面が褐色又は黒色に変色(腐食)するという欠点を有する。銀又は銀合金が変色すると、反射材料としての機能が低下する。 However, silver or silver alloys used for these applications are chemically very unstable and easily react with oxygen, moisture, hydrogen sulfide, sulfurous acid gas, etc. in the air to produce silver oxide or silver sulfide. , Thereby having the disadvantage that the silver surface is discolored (corroded) to brown or black. If silver or a silver alloy changes color, the function as a reflective material will fall.
銀又は銀合金の変色を防止する方法として、例えば下記特許文献1には、塗膜基体成分として、シリコンアクリル樹脂成分を含有した銀被覆塗料用組成物において、銀不活性化成分としてカルボン酸のジルコニウム錯体を塗膜樹脂中0.01〜5重量%含有して成る銀被覆塗料用組成物が開示されている。また下記特許文献2には、特定のイミダゾール化合物を含有する銀及び銀合金の表面処理剤が提案されている。下記特許文献3には、特定の、有機ケイ素化合物、オルガノハイドロジェンポリシロキサン及び白金系触媒を必須成分とする付加硬化型シリコーン樹脂組成物が開示されており、この付加硬化型シリコーン樹脂組成物の硬化物により封止された光半導体素子を備える光半導体装置も示されている。
As a method for preventing discoloration of silver or a silver alloy, for example, in
しかし、特許文献1及び2の処理剤は、紫外線に対する耐性が低く、長期間の紫外線暴露によって変色するという欠点を有する。照明機器及び自動車用途で使用される発光ダイオードにおいては、近紫外光が用いられるため、発光ダイオードを備える発光装置の光反射層に上記処理剤を適用しても、発光強度を維持させることは困難である。また、特許文献3の封止用樹脂は展性が不十分であることに加え、発光ダイオード用封止材として使用した場合、駆動時の発熱によって応力が発生し、接着面から剥離するおそれがある。その結果としてガス遮蔽性が低下するため、光反射層として用いられる銀又は銀合金の変色を十分に抑制することができなくなる。
However, the treatment agents of
本発明の目的は、銀又は銀合金の表面へ優れた耐変色性を付与することのできる、銀又は銀合金の表面処理剤を提供することである。本発明の目的はまた、前記表面処理剤から形成される、クラック及びひび割れのない処理層を備えた、耐変色性に優れた光反射基板、並びに発光強度の低下しにくい発光装置を提供することである。 The objective of this invention is providing the surface treating agent of silver or a silver alloy which can provide the outstanding discoloration resistance to the surface of silver or a silver alloy. Another object of the present invention is to provide a light-reflecting substrate excellent in discoloration resistance and a light-emitting device in which the light emission intensity is unlikely to decrease, provided with a treatment layer free from cracks and cracks formed from the surface treatment agent. It is.
本発明は、カチオン性電解質ポリマーを含有するA液と、層状ケイ酸化合物を含有するB液とからなる、銀又は銀合金の表面処理剤を提供するものである。 The present invention provides a surface treatment agent for silver or a silver alloy, which comprises a liquid A containing a cationic electrolyte polymer and a liquid B containing a layered silicate compound.
本発明の銀又は銀合金の表面処理剤によれば、クラック及びひび割れのない処理層を、銀又は銀合金の表面に設けることができ、銀又は銀合金の変色(腐食)の防止性に優れ、特に銀めっき面へ優れた耐変色性を付与することができる。 According to the surface treatment agent for silver or silver alloy of the present invention, a treatment layer free from cracks and cracks can be provided on the surface of silver or silver alloy, and is excellent in preventing discoloration (corrosion) of silver or silver alloy. In particular, it is possible to impart excellent discoloration resistance to the silver-plated surface.
A液はpHが7〜14であることが好ましく、カチオン性電解質ポリマーは、イオン性基が、塩を形成していてもよいアミノ基、第4級アンモニウム基、第4級ホスホニウム基、からなる群より選ばれる1以上であることが好ましい。この場合において、カチオン性電解質ポリマーのA液中における濃度は、0.0003質量%以上3質量%以下にすることができる。A液をこのような構成にすることで、銀又は銀合金表面に対する耐変色性をさらに向上させることができる。 The liquid A preferably has a pH of 7 to 14, and the cationic electrolyte polymer is composed of an amino group, a quaternary ammonium group, and a quaternary phosphonium group whose ionic groups may form a salt. It is preferably 1 or more selected from the group. In this case, the concentration of the cationic electrolyte polymer in the liquid A can be 0.0003 mass% or more and 3 mass% or less. By making A liquid into such a structure, the discoloration resistance with respect to the surface of silver or a silver alloy can further be improved.
層状ケイ酸化合物は、平均長辺長さが0.03μm以上50μm以下であることが好ましい。 The layered silicate compound preferably has an average long side length of 0.03 μm or more and 50 μm or less.
B液には、さらに上記層状ケイ酸化合物以外のケイ酸化合物を含有させてもよい。このようなケイ酸化合物を含有させる場合は、層状ケイ酸化合物に対する層状ケイ酸化合物以外のケイ酸化合物の質量比は、層状ケイ酸化合物以外のケイ酸化合物/層状ケイ酸化合物=99/1〜1/99にすることが好適である。 The B liquid may further contain a silicate compound other than the layered silicate compound. When such a silicic acid compound is contained, the mass ratio of the silicic acid compound other than the laminar silicic acid compound to the laminar silicic acid compound is the silicic acid compound other than the laminar silicic acid compound / the lamellar silicic acid compound = 99/1. 1/99 is preferable.
層状ケイ酸化合物としては、天然層状ケイ酸化合物及び合成層状ケイ酸化合物並びにこれらの変性物のうちの1種を単独で又は2種以上を組み合わせて用いることができる。 As the layered silicic acid compound, one of natural layered silicic acid compound, synthetic layered silicic acid compound and modified products thereof can be used alone or in combination of two or more.
天然層状ケイ酸化合物としては、例えば、以下の層状ケイ酸塩を用いることができる。例えば、カオリン、タルク−パイロフィライト、スメクタイト、バーミキュライト、雲母(マイカ)、脆雲母、緑泥石等が挙げられる。代表的な種としては、例えば、リザーダイト、アメサイト、クリソタイル、カオリナイト、ディッカイト、ハロイサイト、タルク、パイロフィライト、サポナイト、ヘクトライト、モンモリロナイト、バイデライト、3八面体型バーミキュライト、2八面体型バーミキュライト、金雲母、黒雲母、レピドライト、イライト、白雲母、パラゴナイト、クリントナイト、マーガライト、クリノクロア、シャモサイト、ニマイト、ドンバサイト、クッケアイト、スドーアイト等が挙げられる。市販品としては、クニピア(クニミネ工業社製、商品名、クニピアF)、湿式粉砕雲母(ヤマグチマイカ社製、Yシリーズ、SAシリーズ)等が挙げられる。 As the natural layered silicate compound, for example, the following layered silicate can be used. Examples include kaolin, talc-pyrophyllite, smectite, vermiculite, mica (mica), brittle mica, chlorite and the like. Representative species include, for example, lizardite, amesite, chrysotile, kaolinite, dickite, halloysite, talc, pyrophyllite, saponite, hectorite, montmorillonite, beidellite, three octahedral vermiculite, two octahedral vermiculite, Examples include phlogopite, biotite, lepidrite, illite, muscovite, paragonite, clintonite, margarite, clinochlore, chamosite, nimite, dombasite, kukeite, and suedeite. Examples of commercially available products include Kunipia (Kunimine Kogyo Co., Ltd., trade name, Kunipia F), wet pulverized mica (Yamaguchi Mica Co., Ltd., Y series, SA series) and the like.
合成層状ケイ酸化合物としては、例えば、フッ素金雲母、カリウム四ケイ素雲母、ナトリウム四ケイ素雲母、Naテニオライト、Liテニオライト、モンモリロナイト、サポナイト、ヘクトライト、スチーブンサイト等が挙げられる。市販品としては、ミクロマイカ、ソマシフ(コープケミカル社製、商品名、MEB−3)、ルーセンタイト(コープケミカル社製、商品名、SWN)、膨潤性マイカゾル(トピー工業社製、NTS−10、NTS−5)等が挙げられる。 Examples of the synthetic layered silicate compound include fluorine phlogopite, potassium tetrasilicon mica, sodium tetrasilicon mica, Na teniolite, Li teniolite, montmorillonite, saponite, hectorite, and stevensite. Commercially available products include micro mica, somasif (trade name, MEB-3, manufactured by Corp Chemical Co., Ltd.), lucentite (trade name, SWN manufactured by Corp Chemical Co., Ltd.), swelling mica sol (manufactured by Topy Industries, NTS-10, NTS-5) and the like.
合成層状ケイ酸化合物の変性物としては、例えば、市販品として、ソマシフ(コープケミカル社製、商品名、MAE)、ルーセンタイト(コープケミカル社製、商品名、SPN)等が挙げられる。 Examples of the modified product of the synthetic layered silicate compound include commercially available products such as Somasif (trade name, MAE, manufactured by Corp Chemical), Lucentite (trade name, SPN, manufactured by Corp Chemical), and the like.
上記層状ケイ酸化合物以外のケイ酸化合物は、一般式M2O・nSiO2(n=0.5〜4.0、MはLi、Na又はKのアルカリ金属を示す。)で表される化合物のうち1種以上であることが好ましい。 Silicate compounds other than the layered silicate compounds are compounds represented by the general formula M 2 O · nSiO 2 (n = 0.5 to 4.0, M represents an alkali metal of Li, Na, or K). Of these, one or more are preferable.
本発明はまた、基板と、基板上に設けられた銀又は銀合金からなる光反射層と、光反射層上に設けられた、表面処理剤から形成された処理層と、を備える光反射基板を提供する。処理層は、表面処理剤のA液から形成されたカチオン性電解質ポリマー層と、表面処理剤のB液から形成された層状ケイ酸化合物層とを、光反射層側から見てこの順に備えるようにしてもよい。 The present invention also includes a substrate, a light reflection layer made of silver or a silver alloy provided on the substrate, and a treatment layer formed on the light reflection layer and formed from a surface treatment agent. I will provide a. The treatment layer includes a cationic electrolyte polymer layer formed from the liquid A of the surface treatment agent and a layered silicate compound layer formed from the liquid B of the surface treatment agent in this order as viewed from the light reflection layer side. It may be.
本発明の光反射基板は、銀又は銀合金からなる光反射層上に本発明の表面処理剤から形成された処理層を備えていることにより、優れた耐変色性を有することができる。また、B液が、A液と接触していることで、銀又は銀合金の表面での濡れ性が改善されるため、クラック及びひび割れのない処理層を光反射層上に形成することができる。 The light reflecting substrate of the present invention can have excellent discoloration resistance by including a treatment layer formed from the surface treatment agent of the present invention on a light reflection layer made of silver or a silver alloy. Further, since the liquid B is in contact with the liquid A, the wettability on the surface of the silver or silver alloy is improved, so that a treatment layer free from cracks and cracks can be formed on the light reflecting layer. .
本発明はまた、光反射基板と、光反射基板の処理層上に配置された発光ダイオードと、を備える発光装置を提供する。この発光装置においては、発光ダイオードを覆うように処理層上に形成された透明樹脂からなる封止層をさらに備えるようにしてもよい。ガス遮断性の観点から、透明樹脂はシリコーン樹脂又はエポキシ樹脂であることが好ましい。 The present invention also provides a light emitting device including a light reflecting substrate and a light emitting diode disposed on a processing layer of the light reflecting substrate. The light emitting device may further include a sealing layer made of a transparent resin formed on the treatment layer so as to cover the light emitting diode. From the viewpoint of gas barrier properties, the transparent resin is preferably a silicone resin or an epoxy resin.
光反射層の処理層に対向する面は、粗面(例えば、凹凸形状を有する面)であってもよい。凹凸形状を有する面としては、例えば、蒸着の方法によりめっきされた面が挙げられる。 The surface of the light reflecting layer facing the treatment layer may be a rough surface (for example, a surface having an uneven shape). Examples of the surface having an uneven shape include a surface plated by a vapor deposition method.
本発明はまた、光反射層上に、表面処理剤のA液及びB液を順次接触させ、カチオン性電解質ポリマー層及び層状ケイ酸化合物層を形成する、発光装置の製造方法を提供する。この場合において、A液中の揮発成分を除去することによりカチオン性電解質ポリマー層を形成した後に、B液から層状ケイ酸化合物層を形成することが好ましい。 The present invention also provides a method for producing a light emitting device, wherein a cationic electrolyte polymer layer and a layered silicate compound layer are formed on a light reflecting layer by sequentially contacting a solution A and a solution B of a surface treatment agent. In this case, it is preferable to form a layered silicic acid compound layer from the B liquid after forming the cationic electrolyte polymer layer by removing the volatile components in the A liquid.
上記表面処理剤は、カチオン性電解質ポリマーと、層状ケイ酸化合物粒子単体又は層状ケイ酸化合物粒子と層状ケイ酸化合物以外のケイ酸化合物の混合体とを含むものであり、表面処理剤を銀又は銀合金からなる光反射層上に塗布した後、溶媒を除去することによって、特に銀めっき面へ優れた耐変色性を与えることができる。上記表面処理剤に含有される板状形状の層状ケイ酸化合物粒子が、銀又は銀合金からなる光反射層上に積層することによって、例えば銀又は銀合金の変色要因である大気中の硫化水素ガスの遮蔽性が向上し、銀又は銀合金からなる光反射層に耐変色性を付与することができる。 The surface treatment agent includes a cationic electrolyte polymer, layered silicate compound particles alone or a mixture of layered silicate compound particles and a silicate compound other than the layered silicate compound, and the surface treatment agent is silver or By coating the light reflecting layer made of a silver alloy and then removing the solvent, excellent discoloration resistance can be imparted particularly to the silver-plated surface. The layered silicic acid compound particles contained in the surface treatment agent are laminated on a light reflecting layer made of silver or a silver alloy, so that, for example, hydrogen sulfide in the atmosphere which is a discoloration factor of silver or a silver alloy Gas shielding properties are improved, and discoloration resistance can be imparted to a light reflecting layer made of silver or a silver alloy.
また、表面処理剤に含有される、上記層状ケイ酸化合物以外のケイ酸化合物は、層状ケイ酸化合物粒子と銀又は銀合金との接着性を向上させる作用を有する。すなわち、上記層状ケイ酸化合物以外のケイ酸化合物が含有されることによって、層状ケイ酸化合物粒子と銀又は銀合金界面での応力が緩和され接着力がより向上するものである。これによりさらに高いガス遮断性を達成することが可能になり、銀又は銀合金からなる光反射層の変色をより確実に防ぐことができる。 Further, the silicate compound other than the layered silicate compound contained in the surface treatment agent has an action of improving the adhesion between the layered silicate compound particles and silver or a silver alloy. That is, by containing a silicate compound other than the layered silicate compound, the stress at the interface between the layered silicate compound particles and the silver or silver alloy is relieved, and the adhesive force is further improved. As a result, it is possible to achieve higher gas barrier properties and more reliably prevent discoloration of the light reflecting layer made of silver or a silver alloy.
本発明によれば、耐変色性に優れた光反射基板を有する、発光強度の低下しにくい発光装置を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the light-emitting device which has a light reflection board | substrate excellent in the color fastness, and is hard to fall in emitted light intensity can be provided.
本発明によれば、各種銀又は銀合金の表面へ優れた耐変色性を与えることのできる、表面処理剤を提供することが可能となる。また、前記表面処理剤から形成される、クラック及びひび割れのない処理層を備えた、耐変色性に優れた光反射基板、並びに発光強度の低下しにくい発光装置を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the surface treating agent which can give the outstanding discoloration resistance to the surface of various silver or silver alloys. In addition, it is possible to provide a light-reflecting substrate excellent in discoloration resistance and a light-emitting device in which light emission intensity is hardly reduced, which is provided with a treatment layer that is formed from the surface treatment agent and has no cracks and cracks.
以下、本発明を詳細に説明するが、本発明は以下の実施形態に限定されるものではない。 Hereinafter, although the present invention is explained in detail, the present invention is not limited to the following embodiments.
本発明の銀又は銀合金の表面処理剤は、カチオン性電解質ポリマーを含有するA液と、層状ケイ酸化合物を含有するB液からなることを特徴とする。銀合金としては、例えば、銀−ビスマス合金、銀−ネオジウム合金、銀−銅合金、銀−マグネシウム合金、銀−亜鉛合金、銀−スズ合金、銀−インジウム合金、銀−チタン合金、銀−ジルコニウム合金、銀−金合金、銀−パラジウム合金、銀−白金合金等が挙げられる。A液に含まれるカチオン性電解質ポリマーは、水中で電離可能なカチオンポリマーであり、カチオンを生じるイオン性基を有している。このイオン性基は、第1級アミノ基、第2級アミノ基、第3級アミノ基、第4級アンモニウム基及び第4級ホスホニウム基からなる群より選ばれる1以上を含むことが好ましい。上記第1〜3級アミノ基は塩を形成していてもよい。 The silver or silver alloy surface treatment agent of the present invention is characterized by comprising a liquid A containing a cationic electrolyte polymer and a liquid B containing a layered silicate compound. Examples of the silver alloy include silver-bismuth alloy, silver-neodymium alloy, silver-copper alloy, silver-magnesium alloy, silver-zinc alloy, silver-tin alloy, silver-indium alloy, silver-titanium alloy, silver-zirconium. An alloy, a silver-gold alloy, a silver-palladium alloy, a silver-platinum alloy, and the like can be given. The cationic electrolyte polymer contained in the liquid A is a cationic polymer that can be ionized in water and has an ionic group that generates a cation. This ionic group preferably contains one or more selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, a quaternary ammonium group and a quaternary phosphonium group. The primary to tertiary amino groups may form a salt.
カチオン性電解質ポリマーとしては、例えば、ポリエチレンイミン(PEI)及びその4級化物、ポリアリルアミン及びその4級化物、ポリアリルアミン塩酸塩(PAH)、ポリジアリルジメチルアンモニウムクロリド(PDDA)、ポリビニルピリジン(PVP)、ポリリジン、ポリアクリルアミド、ポリピロール、ポリアニリン、ポリパラフェニレン(+)、ポリパラフェニレンビニレン、ポリエチルイミン、並びにこれらを少なくとも1種以上含む共重合体又は塩の種類を変えたもの等を用いることができる。 Examples of the cationic electrolyte polymer include polyethyleneimine (PEI) and its quaternized product, polyallylamine and its quaternized product, polyallylamine hydrochloride (PAH), polydiallyldimethylammonium chloride (PDDA), and polyvinylpyridine (PVP). , Polylysine, polyacrylamide, polypyrrole, polyaniline, polyparaphenylene (+), polyparaphenylene vinylene, polyethylimine, and a copolymer or a salt containing at least one of these may be used. it can.
カチオン性電解質ポリマーとしてより具体的には、例えば、ポリアリルアミンアミド硫酸塩、アリルアミン塩酸塩とジアリルアミン塩酸塩の共重合体、アリルアミン塩酸塩とジメチルアリルアミン塩酸塩の共重合体、アリルアミン塩酸塩とその他の共重合体、部分メトキシカルボニル化アリルアミン重合体、部分メチルカルボニル化アリルアミン酢酸塩重合体、ジアリルアミン塩酸塩重合体、メチルジアリルアミン塩酸塩重合体、メチルジアリルアミンアミド硫酸塩重合体、メチルジアリルアミン酢酸塩重合体、ジアリルアミン塩酸塩と二酸化硫黄の共重合体、ジアリルアミン酢酸塩と二酸化硫黄の共重合体、ジアリルメチルエチルアンモニウムエチルサルフェイトと二酸化硫黄との共重合体、メチルジアリルアミン塩酸塩と二酸化硫黄との共重合体、ジアリルジメチルアンモニウムクロリドと二酸化硫黄との共重合体、ジアリルジメチルアンモニウムクロリドとアクリルアミドとの共重合体、ジアリルジメチルアンモニウムクロリドとジアリルアミン塩酸塩誘導体との共重合体、ジメチルアミンとエピクロロヒドリンの共重合体、ジメチルアミンとエチレンジアミンとエピクロロヒドリンの共重合体、ポリアミドポリアミンとエピクロロヒドリンとの共重合体等が挙げられる。 More specifically, as the cationic electrolyte polymer, for example, polyallylamine amide sulfate, copolymer of allylamine hydrochloride and diallylamine hydrochloride, copolymer of allylamine hydrochloride and dimethylallylamine hydrochloride, allylamine hydrochloride and other Copolymer, partially methoxycarbonylated allylamine polymer, partially methylcarbonylated allylamine acetate polymer, diallylamine hydrochloride polymer, methyldiallylamine hydrochloride polymer, methyldiallylamine amide sulfate polymer, methyldiallylamine acetate polymer, Copolymer of diallylamine hydrochloride and sulfur dioxide, copolymer of diallylamine acetate and sulfur dioxide, copolymer of diallylmethylethylammonium ethyl sulfate and sulfur dioxide, methyldiallylamine hydrochloride and sulfur dioxide Polymers, copolymers of diallyldimethylammonium chloride and sulfur dioxide, copolymers of diallyldimethylammonium chloride and acrylamide, copolymers of diallyldimethylammonium chloride and diallylamine hydrochloride derivatives, dimethylamine and epichlorohydrin And a copolymer of dimethylamine, ethylenediamine and epichlorohydrin, a copolymer of polyamide polyamine and epichlorohydrin, and the like.
これらのカチオン性電解質ポリマーは、いずれも水溶性又は水と有機溶媒との混合液に可溶なものであり、カチオン性電解質ポリマーの重量平均分子量としては、用いる電解質ポリマーの種類にもよるが、400〜300,000が好ましい。ここで、カチオン性電解質ポリマーの重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により、標準ポリスチレンを用いた検量線から換算した値である。 These cationic electrolyte polymers are both water-soluble or soluble in a mixture of water and an organic solvent, and the weight average molecular weight of the cationic electrolyte polymer depends on the type of electrolyte polymer used. 400-300,000 is preferred. Here, the weight average molecular weight of the cationic electrolyte polymer is a value converted from a calibration curve using standard polystyrene by gel permeation chromatography (GPC).
なお、カチオン性電解質ポリマーの濃度は、A液全量基準で、0.0003質量%以上3質量%以下が好ましく、0.001質量%以上1質量%以下がより好ましく、0.01質量%以上1質量%以下がさらに好ましい。カチオン性電解質ポリマーの濃度が低すぎると、カチオン性電解質ポリマー層が銀又は銀合金からなる光反射層の表面に形成できず、濃度が高すぎると余剰なカチオン性電解質ポリマーが凝集物を生成するために、その上に形成する層状ケイ酸化合物層の透明性及び平坦性を損なう。 The concentration of the cationic electrolyte polymer is preferably 0.0003% by mass or more and 3% by mass or less, more preferably 0.001% by mass or more and 1% by mass or less, and 0.01% by mass or more and 1% by mass based on the total amount of the liquid A. A mass% or less is more preferable. If the concentration of the cationic electrolyte polymer is too low, the cationic electrolyte polymer layer cannot be formed on the surface of the light reflecting layer made of silver or a silver alloy, and if the concentration is too high, the excess cationic electrolyte polymer generates aggregates. Therefore, the transparency and flatness of the layered silicate compound layer formed thereon are impaired.
また、カチオン性電解質ポリマーを含有するA液のpHは、7以上14以下が好ましく、9以上12以下がより好ましく、9以上11以下がさらに好ましい。pHが低すぎると、銀又は銀合金表面へのカチオン性電解質ポリマーの吸着が起こりにくい。pHが高すぎると、銀又は銀合金表面を侵しやすい。 Moreover, 7 or more and 14 or less are preferable, as for pH of the A liquid containing a cationic electrolyte polymer, 9 or more and 12 or less are more preferable, and 9 or more and 11 or less are more preferable. If the pH is too low, adsorption of the cationic electrolyte polymer on the surface of silver or the silver alloy is difficult to occur. If the pH is too high, the surface of the silver or silver alloy is likely to be affected.
B液は、層状ケイ酸塩等の層状ケイ酸化合物を含有する。この層状ケイ酸化合物粒子は厚さ約1nmが好ましく、平均長辺長さが0.03μm以上50μm以下の板状形状を有していることが好ましい。層状ケイ酸化合物は、水及びアルコール等の溶媒との混合によって膨潤して溶媒に分散する性質を有する。 Liquid B contains a layered silicate compound such as a layered silicate. The layered silicate compound particles preferably have a thickness of about 1 nm, and preferably have a plate-like shape having an average long side length of 0.03 μm or more and 50 μm or less. The layered silicate compound has a property of swelling and dispersing in a solvent by mixing with a solvent such as water and alcohol.
また、B液には、上記層状ケイ酸化合物以外のケイ酸化合物を含有することが好ましい。このようなケイ酸化合物も層状ケイ酸化合物と同様に、水及びアルコール等の溶媒との混合によって膨潤して溶媒に分散する性質を有する。 Moreover, it is preferable that B liquid contains silicic acid compounds other than the said layered silicic acid compound. Similar to the layered silicate compound, such a silicate compound also has a property of being swollen by being mixed with a solvent such as water and alcohol and dispersed in the solvent.
なお、B液に含有される層状ケイ酸化合物に対する層状ケイ酸化合物以外のケイ酸化合物の質量比は、層状ケイ酸化合物以外のケイ酸化合物/層状ケイ酸化合物=99/1〜1/99であることが好ましい。なお、質量比とは、溶剤等を含まない固形分状態での比である。 The mass ratio of the silicate compound other than the layered silicate compound to the layered silicate compound contained in the liquid B is silicate compound other than the layered silicate compound / layered silicate compound = 99/1 to 1/99. Preferably there is. In addition, mass ratio is ratio in the solid content state which does not contain a solvent etc.
層状ケイ酸化合物に対する層状ケイ酸化合物以外のケイ酸化合物の固体含有量が、層状ケイ酸化合物の99質量部に対して、1質量部以上であると、本ケイ酸化合物が銀又は銀合金への接着性向上作用を有するため、層状ケイ酸化合物粒子の銀又は銀合金からなる光反射層上への密着性が向上する。その結果、接着界面からの硫化水素等のガス透過量が減少し、銀又は銀合金の変色抑制効果をより向上させることができる。 When the solid content of the silicate compound other than the layered silicate compound relative to the layered silicate compound is 1 part by mass or more with respect to 99 parts by mass of the layered silicate compound, the present silicate compound is converted into silver or a silver alloy. Therefore, the adhesion of the layered silicate compound particles onto the light reflecting layer made of silver or a silver alloy is improved. As a result, the gas permeation amount of hydrogen sulfide or the like from the adhesion interface is reduced, and the discoloration suppressing effect of silver or a silver alloy can be further improved.
また、層状ケイ酸化合物の固体含有量が、層状ケイ酸化合物以外のケイ酸化合物の99質量部に対して、1質量部以上であると、ガス遮蔽性を有する層状ケイ酸化合物粒子含有量がより多くなる。その結果、硫化水素等のガス透過量がより減少し、銀又は銀合金の変色抑制効果がより向上する。 Further, when the solid content of the layered silicate compound is 1 part by mass or more with respect to 99 parts by mass of the silicate compound other than the layered silicate compound, the content of the layered silicate compound particles having gas shielding properties is increased. Become more. As a result, the gas permeation amount of hydrogen sulfide or the like is further reduced, and the discoloration suppressing effect of silver or a silver alloy is further improved.
なお、銀又は銀合金への接着性向上作用及び硫化水素等のガス遮蔽性向上作用の観点から、層状ケイ酸化合物に対する層状ケイ酸化合物以外のケイ酸化合物の質量比は、層状ケイ酸化合物以外のケイ酸化合物/層状ケイ酸化合物=95/5〜5/95であることがより好ましく、80/20〜20/80であることがさらに好ましい。 In addition, from the viewpoint of improving the adhesion to silver or a silver alloy and improving the gas shielding properties such as hydrogen sulfide, the mass ratio of the silicate compound other than the layered silicate compound to the layered silicate compound is other than the layered silicate compound. The silicate compound / layered silicate compound is more preferably 95/5 to 5/95, and further preferably 80/20 to 20/80.
厚さ約1nm、平均長辺長さが0.03μm以上50μm以下の扁平な板状形状を有する層状ケイ酸化合物粒子が、銀又は銀合金からなる光反射層上に積層することによって、例えば硫化水素等のガス遮蔽性を発現するものである。 By laminating layered silicate compound particles having a flat plate shape with a thickness of about 1 nm and an average long side length of 0.03 μm to 50 μm on a light reflecting layer made of silver or a silver alloy, for example, sulfide It exhibits gas shielding properties such as hydrogen.
ガス遮蔽性並びに銀又は銀合金本来の光沢を維持する観点から、B液に含有される層状ケイ酸化合物粒子は、平均長辺長さが0.03μm以上50μm以下であることが好ましく、平均長辺長さが0.05μm以上50μm以下であることがより好ましく、平均長辺長さが0.10μm以上50μm以下であることがさらに好ましい。 From the viewpoint of maintaining the gas shielding property and the original gloss of silver or silver alloy, the layered silicate compound particles contained in the liquid B preferably have an average long side length of 0.03 μm or more and 50 μm or less. The side length is more preferably 0.05 μm or more and 50 μm or less, and the average long side length is further preferably 0.10 μm or more and 50 μm or less.
なお、層状ケイ酸化合物粒子の平均長辺長さは、例えば透過型電子顕微鏡等を用いることによって測定することができる。なお、平均長辺長さとは、扁平な板状形状の粒子において、長辺部分の平均の長さである。具体的には、25万倍の画像中に写っている全ての層状ケイ酸化合物30個の長辺部分の測定値の平均を平均長辺長さとする。 The average long side length of the layered silicate compound particles can be measured by using, for example, a transmission electron microscope. The average long side length is the average length of the long side portion of the flat plate-like particles. Specifically, the average long side length is defined as the average of the measured values of the long side portions of all 30 layered silicate compounds in the 250,000-fold image.
層状ケイ酸化合物以外のケイ酸化合物としては、一般式M2O・nSiO2(n=0.5〜4.0、MはLi、Na又はKのアルカリ金属を示す。)で表される化合物のうち1種以上を好適に用いることができる。 As a silicate compound other than the layered silicate compound, a compound represented by a general formula M 2 O.nSiO 2 (n = 0.5 to 4.0, M represents an alkali metal of Li, Na, or K). Of these, one or more can be suitably used.
なお、B液に使用される溶媒としては、例えば、水、水溶性液体等が挙げられる。 In addition, as a solvent used for B liquid, water, a water-soluble liquid, etc. are mentioned, for example.
水としては、例えば、超純水が使用される。超純水は、イオン性不純物が極微量含まれる水であって、電気抵抗率(比抵抗、MΩ・cm)(JIS K0552)を指標として、25℃における理論値が15MΩ・cm以上の水、好ましくは18MΩ・cm以上の水を用いることができる。 As water, for example, ultrapure water is used. Ultrapure water is water that contains a very small amount of ionic impurities, and has an electrical resistivity (specific resistance, MΩ · cm) (JIS K0552) as an index, and has a theoretical value of 15 MΩ · cm or more at 25 ° C., Preferably, water of 18 MΩ · cm or more can be used.
水溶性液体としては、例えば、アルコール等の極性溶媒が挙げられる。アルコール及びその他の水溶性液体として、具体的には、エタノール、メタノール、イソプロピルアルコール、n−プロピルアルコール、n−ブチルアルコール、t−ブチルアルコール、ジオキサン、アセトン、アセトニトリル、ジエチルアミン、ピリジン、N,N−ジメチルホルムアミド、ジメチルスルホキシド、スルホラン、N−メチルピロリドン、炭酸プロピレン、γ−ブチロラクトン、ホルムアミド、アリルアルコール、アクリル酸、酢酸、エチレングリコール、プロピレングリコール、グリセリン、メタクリル酸、酪酸、トリメチルアミン、トリエチルアミン、アンモニア、ジエチルスルファイト等の液体を採用することができる。水溶性液体とは、1気圧において、温度20℃で同容量の純水と穏やかにかき混ぜた場合、流動が収まった後も当該混合液が均一な外観を維持するものをいう。水溶性液体は、1種を単独で又は2種以上を混合して用いることができる。 Examples of the water-soluble liquid include polar solvents such as alcohol. Specific examples of alcohol and other water-soluble liquids include ethanol, methanol, isopropyl alcohol, n-propyl alcohol, n-butyl alcohol, t-butyl alcohol, dioxane, acetone, acetonitrile, diethylamine, pyridine, N, N- Dimethylformamide, dimethylsulfoxide, sulfolane, N-methylpyrrolidone, propylene carbonate, γ-butyrolactone, formamide, allyl alcohol, acrylic acid, acetic acid, ethylene glycol, propylene glycol, glycerin, methacrylic acid, butyric acid, trimethylamine, triethylamine, ammonia, diethyl A liquid such as sulfite can be employed. A water-soluble liquid refers to a liquid that maintains a uniform appearance even after the flow has subsided when gently mixed with pure water of the same volume at a temperature of 20 ° C. at 1 atm. A water-soluble liquid can be used individually by 1 type or in mixture of 2 or more types.
本実施形態においては、水と水溶性液体との混合物を溶媒として用いる場合、形成する銀硫化防止膜の銀硫化防止性を向上させる観点から、水と水溶性液体との質量比は、99/1〜5/95であることが好ましく、95/5〜10/80であることがより好ましく、90/10〜50/50であることがさらに好ましい。 In the present embodiment, when a mixture of water and a water-soluble liquid is used as a solvent, the mass ratio of water to the water-soluble liquid is 99 / It is preferably 1 to 5/95, more preferably 95/5 to 10/80, and still more preferably 90/10 to 50/50.
本実施形態に係る表面処理剤を用いることによって、基板と、該基板上に設けられた銀又は銀合金からなる光反射層を備え、該光反射層の表面に、表面処理剤に含有される固体成分からなる処理層が形成されている、光反射基板を提供することが可能である。すなわち具体的には、基板上に設けられた銀又は銀合金からなる光反射層上に、表面処理剤のA液及びB液を順次、積層させることで、表面処理剤に含まれる固体成分からなる処理層が設けられている、光反射基板を作製できる。本実施形態の表面処理剤を銀又は銀合金からなる光反射層上に塗布した後、溶媒を除去することによって、銀又は銀合金からなる光反射層上に表面処理剤に含有される層状ケイ酸化合物及び層状ケイ酸化合物以外のケイ酸化合物を含む層を形成できる。 By using the surface treatment agent according to the present embodiment, a substrate and a light reflection layer made of silver or a silver alloy provided on the substrate are provided, and the surface treatment agent contains the surface of the light reflection layer. It is possible to provide a light reflecting substrate on which a treatment layer made of a solid component is formed. That is, specifically, by sequentially laminating the liquid A and liquid B of the surface treatment agent on the light reflection layer made of silver or a silver alloy provided on the substrate, the solid component contained in the surface treatment agent is removed. A light-reflecting substrate can be produced in which a treatment layer is provided. After the surface treatment agent of the present embodiment is applied on the light reflection layer made of silver or silver alloy, the layered silica contained in the surface treatment agent on the light reflection layer made of silver or silver alloy is removed by removing the solvent. A layer containing a silicate compound other than the acid compound and the layered silicate compound can be formed.
なお、本実施形態に係る表面処理剤の、銀又は銀合金への塗布方法としては、例えばバーコート、ディップコート、スピンコート、スプレーコート、ポッティング等の方法を好適に用いることができる。 As a method for applying the surface treating agent according to the present embodiment to silver or a silver alloy, for example, methods such as bar coating, dip coating, spin coating, spray coating, and potting can be suitably used.
また、表面処理剤から溶媒を除去する方法としては、乾燥を好適に用いることができ、乾燥温度は室温以上であれば特に限定されない。なお、本実施形態において、室温とは、20〜25℃である。 In addition, as a method for removing the solvent from the surface treatment agent, drying can be suitably used, and the drying temperature is not particularly limited as long as the drying temperature is room temperature or higher. In the present embodiment, the room temperature is 20 to 25 ° C.
本実施形態では、上記光反射基板と、該光反射基板の処理層上に配置された発光ダイオードと、を備える発光装置を提供することが可能である。すなわち具体的には、基板上に、表面処理剤から形成される処理層を備える銀又は銀合金からなる光反射層が形成されている光反射基板の、処理層上に、発光ダイオードを実装する方法、又は銀若しくは銀合金からなる光反射層を備える光反射基板上に発光ダイオードを実装した後、光反射層上に表面処理剤を塗布し、溶媒を除去する方法、によって、表面処理剤に含有される固体成分からなる処理層を具備する光反射基板を具備する発光装置を提供することが可能である。 In the present embodiment, it is possible to provide a light emitting device including the light reflecting substrate and a light emitting diode disposed on the processing layer of the light reflecting substrate. Specifically, a light emitting diode is mounted on a processing layer of a light reflecting substrate in which a light reflecting layer made of silver or a silver alloy having a processing layer formed of a surface treatment agent is formed on the substrate. A surface treatment agent is applied by a method, or a method in which a light-emitting diode is mounted on a light reflection substrate including a light reflection layer made of silver or a silver alloy, and then a surface treatment agent is applied onto the light reflection layer and a solvent is removed. It is possible to provide a light emitting device including a light reflecting substrate including a treatment layer made of a contained solid component.
図1は、本実施形態に係る発光装置の一実施形態を示す模式断面図である。図1に示される発光装置20は、基板1と、基板1上に設けられた銀又は銀合金からなる光反射層3と、光反射層3上に設けられた処理層5と、処理層5上に設けられた発光ダイオード7と、発光ダイオード7を覆うように処理層5上に設けられた封止層10から構成されている。封止層10は透明樹脂から形成されている。
FIG. 1 is a schematic cross-sectional view showing an embodiment of a light emitting device according to this embodiment. A
なお、発光装置においては、処理層を形成させた後に発光ダイオードを設けても、発光ダイオードを設けた後に処理層を形成してもよい。 Note that in the light-emitting device, the light-emitting diode may be provided after the treatment layer is formed, or the treatment layer may be formed after the light-emitting diode is provided.
以下、実施例及び比較例によって、本発明をさらに具体的に説明するが、本発明は以下の実施例に限定されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further more concretely, this invention is not limited to a following example.
<スチーブンサイトの合成>
(合成例)
コロイダルシリカ(Ludox TM 50、SigmaAldrich社製)60gと蒸留水120mlとを混合した分散液に硝酸20mlを添加した。これに硝酸マグネシウム(一級試薬)91gと蒸留水128mlとを混合した溶液を入れて攪拌しながら、アンモニア水(28質量%水溶液)をゆっくりと滴下した。pH10になったところで滴下を止め、室温で一晩熟成させ、均一複合沈殿を得た。その後、蒸留水の添加、振盪、固液分離の過程による水洗浄をアンモニア臭がなくなるまで繰り返した。充分に洗浄を行った均一複合沈殿の分散液に、10質量%の水酸化リチウム水溶液を25.4ml添加し、よく混合し、出発原料スラリーを得た。出発原料スラリーをオートクレーブに仕込み、200℃で48時間水熱反応させた。冷却後、オートクレーブ内の反応生成物を取り出し、60℃で乾燥した後、粉砕し、スチーブンサイトに分類されるスメクタイトを得た。
(実施例1)
<Combination of steven sites>
(Synthesis example)
20 ml of nitric acid was added to a dispersion obtained by mixing 60 g of colloidal silica (
Example 1
A液としてはポリジアリルジメチルアンモニウムクロリド(PDDA、アルドリッチ社製)の濃度を0.0028質量%に調整し、さらにpHを0.1重量%の炭酸ナトリウム水溶液にて調整し、pH10とした水溶液をカチオン性電解質ポリマー溶液として用いた。B液としては、合成例で得られた、平均長辺長さ100nmのスチーブンサイト1gを層状ケイ酸化合物として使用し、蒸留水を添加して全重量100gとした後、自転・公転ミキサー(シンキー社製、ARE−310)を用いて2000rpm、10分混合、2200rpm10分脱泡を行い、平均長辺長さ1007nmの合成スメクタイト1質量%のB液を得た。 The liquid A was prepared by adjusting the concentration of polydiallyldimethylammonium chloride (PDDA, manufactured by Aldrich) to 0.0028% by mass, adjusting the pH with a 0.1% by weight sodium carbonate aqueous solution, and adjusting the pH to 10. Used as a cationic electrolyte polymer solution. As the liquid B, 1 g of stevensite having an average long side length of 100 nm obtained in the synthesis example was used as a layered silicate compound, and distilled water was added to make the total weight 100 g, followed by a rotation / revolution mixer (Sinky ARE-310) manufactured by the company, mixed at 2000 rpm for 10 minutes, and defoamed at 2200 rpm for 10 minutes to obtain a liquid B of 1% by mass of synthetic smectite having an average long side length of 1007 nm.
<光反射基板上への表面処理剤塗布>
ソーダガラス製のスライドガラスを基板とし、基板に厚さ100nmの銀を蒸着した光反射基板上に、wet厚12μmのバーコーターを用いて、上記A液を塗布し、1分間置いた後、エアブローによって表面の水分を除去、乾燥した。その後、1質量%の上記B液を塗布後、70℃で5分間静置して溶媒である水を除去し、層状ケイ酸化合物層を表面に具備する光反射基板を得た。なお、wet厚とは、溶媒を除去する前の表面処理剤の塗布直後の厚みである。
<Application of surface treatment agent on light reflecting substrate>
Using a soda glass slide glass as a substrate and applying 100 parts of silver on the light-reflective substrate having a thickness of 100 nm deposited on the light reflective substrate, the above-mentioned solution A was applied using a bar coater with a wet thickness of 12 μm. The water on the surface was removed and dried. Thereafter, 1% by mass of the above-mentioned B solution was applied, and then allowed to stand at 70 ° C. for 5 minutes to remove water as a solvent to obtain a light reflecting substrate having a layered silicate compound layer on the surface. In addition, wet thickness is the thickness immediately after application | coating of the surface treating agent before removing a solvent.
<発光装置への表面処理剤塗布> <Application of surface treatment agent to light emitting device>
上記光反射基板上に、発光波長467.5nm〜470nm、キャビティー容量3.7μLの発光ダイオードチップを金ワイヤで接続し、発光装置を作製した。その後、発光装置上に、上記A液をポッティング法、すなわちマイクロピペットで3μL滴下し、70℃で5分間乾燥して溶媒である水を除去し、さらに、1質量%の上記B液をポッティング法、すなわちマイクロピペットで3μL滴下し、70℃で5分間乾燥して溶媒である水を除去し、層状ケイ酸化合物層を表面に具備する発光装置を得た。 On the light reflection substrate, a light emitting diode chip having an emission wavelength of 467.5 nm to 470 nm and a cavity capacity of 3.7 μL was connected with a gold wire to produce a light emitting device. Thereafter, 3 μL of the solution A was dropped on the light emitting device with a micropipette, and the solvent was removed by drying at 70 ° C. for 5 minutes. Further, 1% by mass of the solution B was potted. That is, 3 μL was dropped with a micropipette and dried at 70 ° C. for 5 minutes to remove water as a solvent to obtain a light emitting device having a layered silicate compound layer on the surface.
<表面処理剤を塗布した光反射基板の硫化水素ガス耐性評価>
まず、上記の方法で作製した光反射基板の波長550nmの可視光反射率を、分光光度計(日本分光、V−570)を用いて測定し、[硫化水素暴露前反射率(%)]とした。上記光反射基板を、10ppm硫化水素ガス気流、40℃、90%RH(相対湿度)中に96時間静置した後、波長550nmの可視光反射率を測定し、[硫化水素暴露後反射率(%)]とした。
<Hydrogen sulfide gas resistance evaluation of a light reflective substrate coated with a surface treatment agent>
First, the visible light reflectance at a wavelength of 550 nm of the light reflecting substrate produced by the above method was measured using a spectrophotometer (JASCO, V-570), and [reflectance before hydrogen sulfide exposure (%)] did. The light reflecting substrate was allowed to stand in a 10 ppm hydrogen sulfide gas stream, 40 ° C., 90% RH (relative humidity) for 96 hours, and then the visible light reflectance at a wavelength of 550 nm was measured. %)].
[硫化水素暴露前反射率]−[硫化水素暴露後反射率]=[反射低下率(%)]とし、反射低下率が20%以内である場合を硫化水素ガス耐性「有り」、20%を超える場合を硫化水素ガス耐性「無し」と評価した。 [Reflectivity before exposure to hydrogen sulfide]-[Reflectivity after exposure to hydrogen sulfide] = [Reflectance reduction rate (%)]. When the reflection reduction rate is within 20%, the resistance to hydrogen sulfide gas is "Yes", and 20% The case where it exceeded was evaluated as "no hydrogen sulfide gas resistance".
<表面処理剤を塗布した発光装置の硫化水素ガス耐性評価>
上記の方法で表面処理剤を塗布した発光装置を、順電流20mA、順電圧3.3Vで発光させ、マルチ測光計(大塚電子社製、MCPD−3700)を用いて露光時間30ミリ秒で発光強度を測定し、[硫化水素暴露前発光強度]とした。上記発光装置を、10ppm硫化水素ガス気流、40℃、90%RH(相対湿度)中に96時間静置した後、順電流20mA、順電圧3.3Vで発光させ、マルチ測光計を用いて露光時間30ミリ秒で発光強度を測定し、[硫化水素暴露後発光強度]とした。
<Hydrogen sulfide gas resistance evaluation of light emitting device coated with surface treatment agent>
The light emitting device coated with the surface treatment agent by the above method emits light at a forward current of 20 mA and a forward voltage of 3.3 V, and emits light with an exposure time of 30 milliseconds using a multiphotometer (MCPD-3700, manufactured by Otsuka Electronics Co., Ltd.). The intensity was measured and was defined as [emission intensity before exposure to hydrogen sulfide]. The light emitting device was allowed to stand in a 10 ppm hydrogen sulfide gas stream, 40 ° C., 90% RH (relative humidity) for 96 hours, and then emitted with a forward current of 20 mA and a forward voltage of 3.3 V, and exposed using a multiphotometer. The luminescence intensity was measured at a time of 30 milliseconds and was defined as [luminescence intensity after exposure to hydrogen sulfide].
([硫化水素暴露後発光強度]/[硫化水素暴露前発光強度])×100=[発光強度維持率(%)]とし、発光強度維持率が80%以上である場合を硫化水素ガス耐性「有り」、80%未満である場合を硫化水素ガス耐性「無し」と評価した。 ([Emission intensity after exposure to hydrogen sulfide] / [Emission intensity before exposure to hydrogen sulfide]) × 100 = [Emission intensity maintenance rate (%)], and when the emission intensity maintenance rate is 80% or more, hydrogen sulfide gas resistance “ The case of “Yes” and less than 80% was evaluated as “No” for hydrogen sulfide gas resistance.
(実施例2)
平均長辺長さ950nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 2)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 950 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例3)
平均長辺長さ780nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 3)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 780 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例4)
平均長辺長さ190nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
Example 4
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 190 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例5)
平均長辺長さ178nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 5)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 178 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例6)
平均長辺長さ140nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 6)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 140 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例7)
平均長辺長さ124nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 7)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 124 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例8)
平均長辺長さ120nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 8)
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 120 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例9)
平均長辺長さ100nmのスメクタイトを使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
Example 9
A surface treatment agent was prepared in the same manner as in Example 1 except that smectite having an average long side length of 100 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例10)
合成例で得られた、平均長辺長さ1007nmのスチーブンサイトを含む0.99gを層状ケイ酸化合物として、リチウムシリケート(日産化学社製、LSS35)0.01gを、層状ケイ酸化合物以外のケイ酸化合物としてそれぞれ使用した以外は実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 10)
0.99 g containing a steven site having an average long side length of 1007 nm obtained in the synthesis example was used as a layered silicate compound, and 0.01 g of lithium silicate (manufactured by Nissan Chemical Industries, Ltd., LSS35) was added to a silica other than the layered silicate compound. A surface treatment agent was prepared in the same manner as in Example 1 except that each was used as an acid compound, and evaluation was performed in the same manner as in Example 1.
(実施例11)
平均長辺長さ190nmのスメクタイトを使用した以外は実施例10と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 11)
A surface treatment agent was prepared in the same manner as in Example 10 except that smectite having an average long side length of 190 nm was used, and evaluation was performed in the same manner as in Example 1.
(実施例12)
平均長辺長さ100nmのスメクタイトを使用した以外は実施例10と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Example 12)
A surface treatment agent was prepared in the same manner as in Example 10 except that smectite having an average long side length of 100 nm was used, and evaluation was performed in the same manner as in Example 1.
(比較例1)
A液を用いずに、B液を直接塗布した以外は、実施例1と同様にして表面処理剤を作製し、実施例1と同様に評価を行った。
(Comparative Example 1)
A surface treatment agent was prepared in the same manner as in Example 1 except that the B solution was directly applied without using the A solution, and evaluation was performed in the same manner as in Example 1.
評価の結果、実施例1〜12は、光反射基板の硫化水素ガス耐性、発光装置の硫化水素ガス耐性が全て「有り」であったのに対して、比較例では全て「無し」であった。また、実施例1〜12全てにおいて、光反射基板上の表面処理剤から形成された処理層には、クラック及びひび割れがないことが観察により確認された。 As a result of evaluation, in Examples 1 to 12, the hydrogen sulfide gas resistance of the light reflecting substrate and the hydrogen sulfide gas resistance of the light emitting device were all “present”, whereas in the comparative examples, all were “none”. . Further, in all of Examples 1 to 12, it was confirmed by observation that the treatment layer formed from the surface treatment agent on the light reflecting substrate was free from cracks and cracks.
本発明によれば、各種銀又は銀合金、例えば電子部品、発光ダイオード等の照明機器などに使用される銀又は銀合金の変色(腐食)防止性に優れ、特に銀めっき面へ優れた耐変色性を与えることのできる、表面処理剤を提供することが可能となる。また、基板と、該基板上に設けられた銀又は銀合金からなる光反射層と、を備え、光反射層の表面に、銀又は銀合金の表面処理剤から形成された処理層が設けられている、光反射基板を提供することが可能である。さらにはその光反射基板と、発光ダイオードと、を備える発光装置を提供することが可能となる。 According to the present invention, various silver or silver alloys, for example, silver or silver alloys used for lighting devices such as electronic parts and light-emitting diodes, etc. have excellent discoloration (corrosion) prevention properties, and particularly excellent discoloration resistance to silver-plated surfaces. It becomes possible to provide a surface treatment agent capable of imparting properties. Further, a substrate and a light reflecting layer made of silver or a silver alloy provided on the substrate are provided, and a treatment layer made of a surface treatment agent of silver or a silver alloy is provided on the surface of the light reflecting layer. It is possible to provide a light reflecting substrate. Furthermore, it is possible to provide a light emitting device including the light reflecting substrate and the light emitting diode.
1…基板、3…光反射層、5…処理層、7…発光ダイオード、10…封止層、20…発光装置。
DESCRIPTION OF
Claims (16)
層状ケイ酸化合物を含有するB液と、からなる、銀又は銀合金の表面処理剤。 Liquid A containing a cationic electrolyte polymer;
A surface treatment agent of silver or a silver alloy, comprising a liquid B containing a layered silicate compound.
前記光反射層上に、前記表面処理剤のA液及びB液を順次接触させ、カチオン性電解質ポリマー層及び層状ケイ酸化合物層を形成する、発光装置の製造方法。 It is a manufacturing method which manufactures the light-emitting device as described in any one of Claims 11-14,
A method for manufacturing a light emitting device, wherein a cationic electrolyte polymer layer and a layered silicate compound layer are formed by sequentially contacting the surface treatment agent A solution and the B solution on the light reflection layer.
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