JP2014135443A - Roll for electron beam exposure and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a roll for electron beam exposure, suitable for fabricating a roller mold by irradiating an electron beam while rotating the roll for electron beam exposure.SOLUTION: An amorphous plated layer 3 is provided on a surface of a nonmagnetic base material 2, the amorphous plated layer 3 is polished, and then a resist is coated thereon furthermore. The magnetism of the nonmagnetic base material 2 is preferably equal to or less than earth magnetism. The nonmagnetic base material 2 is, for example, austenitic stainless steel. The surface roughness of the amorphous plated layer 3 is preferably less than 10 nm. The amorphous plated layer 3 is, for example, an amorphous Ni-P plated layer.

Description

  The present invention relates to an electron beam exposure roll and a method for manufacturing the roll.

  Conventionally, the characteristics of optical devices have been controlled or improved by creating a periodic structure of the wavelength of light on the surface or inside of an optical device such as an LED or LD. Such a periodic structure is produced by various microfabrication, and among them, one of the most promising technologies is nanoimprint technology. A mold (pressing die) used for nanoimprint pressing transfer is generally manufactured by an optical exposure apparatus.

  Here, as a mold used for the press mold transfer, in addition to a flat plate mold used for a flat plate press, a roller mold (roller mold) capable of continuous transfer to a film while rotating has been developed. . Conventionally, a roller mold is manufactured by attaching a flexible material such as a metal thin film to a roll. However, in this case, since there is a cut in the mold to be attached, a seam is formed in the pattern by one rotation of the roll. May remain. In this regard, according to the technique of exposing the resist applied to the roll surface and drawing the pattern while rotating the electron beam exposure roll, such a problem can be avoided.

  However, considering the exposure by irradiating the electron beam while rotating the electron beam exposure roll, it is considered that the conventional electron beam exposure roll still has problems.

  An object of the present invention is to provide an electron beam exposure roll suitable for producing a roller mold by irradiating an electron beam while rotating the electron beam exposure roll, and a method for producing the same.

  The inventor conducted various studies on the electron beam exposure roll that is the subject of the present invention. In the press-type transfer, printing at a level of several hundreds of nanometers is performed. Therefore, a standard that is suitable for the level of the surface roughness of the roller mold is required. However, when an electron beam exposure roll is irradiated with an electron beam for exposure as in the prior art, it may be difficult to improve the irradiation accuracy. The present inventor who examined this point pays attention to the material of the electron beam exposure roll as a possible reason for this phenomenon, and as a result of further studies, has obtained new knowledge.

  The roll for electron beam exposure according to the present invention based on such knowledge is such that an amorphous plating layer is provided on the surface of a non-magnetic base material, and after the amorphous plating layer is polished, a resist is further applied. It is.

  When irradiating the surface of a roll coated with a resist with an exposure electron beam, it is desirable to irradiate the electron beam with high accuracy as desired. The beam may be deflected. One of the main causes of such a deflection action may be the material of the roll. In this respect, the present invention has a nonmagnetic base material, and an amorphous plating layer is provided on the surface of the nonmagnetic base material. Since the roll is adopted, it is possible to suppress the action of electromagnetic force caused by the material of the base material as much as possible. For this reason, exposure with higher accuracy than conventional can be realized.

  In such an electron beam exposure roll, the magnetism of the nonmagnetic base material is preferably less than the geomagnetism.

  For example, austenitic stainless steel can be used as the nonmagnetic base material of the electron beam exposure roll.

  Furthermore, in the roll for electron beam exposure, the surface roughness of the amorphous plating layer is preferably less than 10 nm.

  In the electron beam exposure roll, the amorphous plating layer is preferably an amorphous Ni-P plating layer.

  Furthermore, the manufacturing method of the electron beam exposure roll according to the present invention is such that an amorphous plating layer is provided on the surface of a non-magnetic base material, and after the amorphous plating layer is polished, a resist is further applied.

  According to the present invention, it is possible to provide an electron beam exposure roll suitable for producing a roller mold by irradiating an electron beam while rotating the electron beam exposure roll.

It is a whole view of the roll for electron beam exposure which shows one Embodiment of this invention. FIG. 2 is an enlarged view of a circled portion of the electron beam exposure roll shown in FIG. 1.

  Hereinafter, the configuration of the present invention will be described in detail based on an example of an embodiment shown in the drawings.

  1 and 2 show an example of an electron beam exposure roll 1 according to the present invention. The roll 1 for electron beam exposure according to the present embodiment is made of a composite material in which an amorphous plating layer 3 is provided on the surface of a non-magnetic base material 2, and after the amorphous plating layer 3 is polished, a resist is further applied. It will be.

  The nonmagnetic base material 2 preferably has a magnetism that is equal to or less than the geomagnetism. By adopting the base material 2 having such a material, it is possible to suppress the action of electromagnetic force caused by the material of the base material as much as possible, and to suppress the deflection of the exposure electron beam during exposure. As a suitable example of the nonmagnetic base material 2, for example, austenitic stainless steel can be cited.

  The amorphous plating layer 3 is a plating layer applied to the surface of the base material 2 (see FIG. 2). In the present embodiment, an amorphous Ni—P plating layer is employed as the amorphous plating layer 3, but this is only a preferred example, and a plating layer of other materials can also be employed. The thickness of the amorphous plating layer 3 forming the outer layer of the electron beam exposure roll 1 is, for example, about 10 to 100 μm (see FIG. 2).

  The amorphous plating layer 3 is polished after being applied to the surface of the base material 2. In the present embodiment, the surface of the amorphous plating layer 3 is polished so that the surface roughness of the amorphous plating layer 3 is less than 10 nm, preferably about several nm, and a so-called super mirror roll having an extremely fine mirror surface is obtained.

  According to such an electron beam exposure roll 1, it is possible to suppress the deflection of the exposure electron beam when performing exposure while rotating the electron beam exposure roll 1, so that the irradiation accuracy is improved. More accurate exposure can be realized. In addition, since printing at a level of several hundreds of nanometers is performed in the press-type transfer, the surface roughness of the roller mold is required to have a standard corresponding to the level, and is made of a composite material as in this embodiment and is amorphous. According to the electron beam exposure roll 1 in which the surface roughness of the plating layer 3 is less than 10 nm, a roller mold having an accuracy commensurate with the level can be produced.

  The above-described embodiment is an example of a preferred embodiment of the present invention, but is not limited thereto, and various modifications can be made without departing from the scope of the present invention.

  By using austenitic stainless steel as the base material 2 and providing an amorphous Ni-P plating layer on the surface of the base material 2, a roll having a surface roughness of several nanometers and a geomagnetism or less was manufactured.

  By using an aluminum material for the base material 2 and providing an amorphous Ni-P plating layer on the surface layer of the base material 2, a roll having a surface roughness of several nanometers and a geomagnetism or less was manufactured.

  In order to make a mold, a material suitable for etching was laminated on the outermost layer.

  The present invention is suitable for application when a coating solution such as an electron beam resist solution is applied to the surface of a coating object such as a roller mold.

DESCRIPTION OF SYMBOLS 1 ... Electron beam exposure roll 2 ... Base material 3 ... Amorphous plating layer

Claims (6)

  An electron beam exposure roll in which an amorphous plating layer is provided on the surface of a non-magnetic base material, and after the amorphous plating layer is polished, a resist is further applied.   The roll for electron beam exposure according to claim 1, wherein the magnetism of the nonmagnetic base material is equal to or less than geomagnetism.   The roll for electron beam exposure according to claim 2, wherein the nonmagnetic base material is austenitic stainless steel.   The roll for electron beam exposure according to claim 3, wherein the surface roughness of the amorphous plating layer is less than 10 nm.   The roll for electron beam exposure according to claim 4, wherein the amorphous plating layer is an amorphous Ni-P plating layer.   A method for manufacturing an electron beam exposure roll, wherein an amorphous plating layer is provided on the surface of a nonmagnetic base material, the amorphous plating layer is polished, and then a resist is applied.

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