CN110658677B - Imprinting method, imprinting structure and display substrate - Google Patents
Imprinting method, imprinting structure and display substrate Download PDFInfo
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- CN110658677B CN110658677B CN201911103110.XA CN201911103110A CN110658677B CN 110658677 B CN110658677 B CN 110658677B CN 201911103110 A CN201911103110 A CN 201911103110A CN 110658677 B CN110658677 B CN 110658677B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
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Abstract
The invention provides an imprinting method, an imprinting structure and a display substrate, and relates to the technical field of display. According to the invention, the hydrophobic layer is formed on the substrate to be imprinted, the imprinting adhesive layer is formed on the substrate to be imprinted on which the hydrophobic layer is formed, the orthographic projections of the imprinting adhesive layer and the hydrophobic layer on the substrate to be imprinted are not overlapped, and the imprinting template is adopted to imprint the substrate to be imprinted on which the hydrophobic layer and the imprinting adhesive layer are formed, so that an imprinting pattern is formed at the position of the imprinting adhesive layer. Aiming at products with different specifications, after the hydrophobic layer is used for patterning the substrate to be imprinted, the same nano-imprinting template can be adopted for imprinting the required imprinting pattern, so that the products with different specifications can be imprinted by the same nano-imprinting template, the number of the nano-imprinting templates is greatly reduced, and the manufacturing time and the manufacturing cost are greatly reduced.
Description
Technical Field
The invention relates to the technical field of display, in particular to an imprinting method, an imprinting structure and a display substrate.
Background
With the development of display technology, the imprint technology is becoming more mature, and the imprint technology is an important thin film patterning technology besides the photolithography technology.
In the existing imprinting method, the whole surface of a substrate to be imprinted is coated with imprinting glue, then, a patterned nano-imprinting template and the substrate to be imprinted are aligned, the substrate to be imprinted is imprinted by the patterned nano-imprinting template after alignment, and different nano-imprinting templates are required to be manufactured for products with different specifications.
However, the large-sized nano-imprint template is usually manufactured by using an electron beam direct writing or splicing technology, the time consumption and the cost for manufacturing each nano-imprint template are long, and a large amount of time and a large amount of cost are required for manufacturing the nano-imprint templates required by products with different specifications.
Disclosure of Invention
The invention provides an imprinting method, an imprinting structure and a display substrate, and aims to solve the problems that a large amount of time is needed for manufacturing nano-imprinting templates required by products of different specifications and huge cost is needed.
In order to solve the above problems, the present invention discloses an imprint method, including:
forming a hydrophobic layer on a substrate to be imprinted;
forming an imprinting adhesive layer on the substrate to be imprinted, on which the hydrophobic layer is formed, wherein the imprinting adhesive layer and the orthographic projection of the hydrophobic layer on the substrate to be imprinted are not overlapped;
and imprinting the substrate to be imprinted with the hydrophobic layer and the imprinting adhesive layer by adopting an imprinting template so as to form an imprinting pattern at the position of the imprinting adhesive layer.
Optionally, the step of forming a hydrophobic layer on the substrate to be imprinted includes:
coating a hydrophobic material on the substrate to be imprinted;
and patterning the hydrophobic material by adopting a photoetching process to form a hydrophobic layer on the substrate to be imprinted.
Optionally, the imprint template has a plurality of patterns to be printed arranged in an array.
Optionally, a spin coating process is used to coat an imprint glue layer on the substrate to be imprinted on which the hydrophobic layer is formed.
Optionally, the hydrophobic layer has a thickness of 5nm to 100 nm.
Optionally, the material of the hydrophobic layer is any one of polytetrafluoroethylene, fluoroethylene propylene copolymer, perfluoroalkyl compound and ethylene-tetrafluoroethylene copolymer.
Optionally, the material of the imprinting glue layer is acrylate.
Optionally, before the step of forming a hydrophobic layer on the substrate to be imprinted, the method further includes:
forming a patterning layer on a substrate to obtain the substrate to be imprinted; the patterned layer is superposed with the orthographic projection of the imprinting glue layer on the substrate.
In order to solve the problems, the invention also discloses an embossing structure which is manufactured by adopting the embossing method.
In order to solve the above problem, the present invention further discloses a display substrate including the above imprinting structure.
Compared with the prior art, the invention has the following advantages:
the method comprises the steps of forming a hydrophobic layer on a substrate to be imprinted, forming an imprinting adhesive layer on the substrate to be imprinted, wherein the hydrophobic layer is formed on the substrate to be imprinted, enabling the imprinting adhesive layer and the orthographic projection of the hydrophobic layer on the substrate to be imprinted not to overlap, and imprinting the substrate to be imprinted, which is formed with the hydrophobic layer and the imprinting adhesive layer, by adopting an imprinting template so as to form an imprinting pattern at the position of the imprinting adhesive layer. The method comprises the steps of carrying out imaging processing on a substrate to be imprinted through a hydrophobic layer, then coating imprinting glue on the substrate to be imprinted with the hydrophobic layer, wherein the imprinting glue is difficult to deposit on the surface of the hydrophobic layer, so that an imprinting glue layer is formed only on the substrate to be imprinted at the position of a non-hydrophobic layer, and when a nano imprinting template is subsequently adopted for imprinting the substrate to be imprinted, because the imprinting glue layer does not exist on the hydrophobic layer, even if the nano imprinting template has the pattern to be imprinted at the position of the hydrophobic layer, the imprinting pattern cannot be imprinted on the hydrophobic layer, and the imprinting pattern can be imprinted only at the position of the imprinting glue layer, therefore, aiming at products with different specifications, after the substrate to be imprinted is imaged through the hydrophobic layer, the required imprinting pattern can be imprinted through the same nano imprinting template, so that the products with different specifications can be imprinted through the same nano imprinting, the number of nano-imprint templates is greatly reduced, and the manufacturing time and cost are greatly reduced.
Drawings
FIG. 1 shows a flow chart of an imprinting method of an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a substrate to be imprinted according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram illustrating the application of a hydrophobic material on a substrate to be imprinted according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram illustrating a hydrophobic material patterned to form a hydrophobic layer on a substrate to be imprinted according to an embodiment of the present invention;
FIG. 5 is a schematic structural diagram illustrating a process of forming an imprinting adhesive layer on a substrate to be imprinted, on which a hydrophobic layer is formed, according to an embodiment of the present invention;
FIG. 6 shows a schematic structural view of an imprint template of an embodiment of the present invention;
fig. 7 shows a schematic structural diagram of an embodiment of the present invention, which uses an imprint template to imprint a substrate to be imprinted, on which a hydrophobic layer and an imprint glue layer are formed, so as to form an imprint pattern at a position of the imprint glue layer.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
Example one
Referring to fig. 1, a flowchart of an imprinting method according to an embodiment of the present invention is shown, which may specifically include the following steps:
In the embodiment of the present invention, first, the substrate to be imprinted 21 as shown in fig. 2 is provided, and then, a hydrophobic layer is formed on the substrate to be imprinted 21.
The substrate to be imprinted 21 includes a substrate 211 and a patterned layer 212 formed on the substrate 211, and the manufacturing process includes: a patterned layer 212 is formed on the base substrate 211, resulting in the substrate 21 to be imprinted.
The patterned layer 212 refers to an etching object when etching is performed by using an imprint pattern to be formed later, and after the imprint template is used to imprint the substrate 21 to be imprinted, the imprint pattern may be formed, and the patterned layer 212 is etched based on the formed imprint pattern to form a desired structure.
As shown in fig. 2, the substrate to be imprinted 21 further includes an alignment mark 213 disposed on the substrate base 211, and the alignment mark 213 is used for alignment when a hydrophobic layer is formed on the substrate to be imprinted 21.
Specifically, step 101 may include sub-step a1 and sub-step a 2:
substep a1, coating a hydrophobic material on the substrate to be imprinted;
sub-step a2, patterning the hydrophobic material using a photolithography process to form a hydrophobic layer on the substrate to be imprinted.
As shown in fig. 3, firstly, a spin coating process may be used to coat the entire surface of the substrate to be imprinted 21 with a hydrophobic material 220, wherein the hydrophobic material 220 covers not only the substrate base 211 but also the patterned layer 212 on the substrate base 211; then, as shown in fig. 4, the hydrophobic material 220 is patterned by using a photolithography process, so as to form the hydrophobic layer 22 on the substrate 21 to be imprinted, specifically, coating a photoresist on the hydrophobic material 220, placing the mask between the lithography apparatus and the substrate 21 to be imprinted, aligning with the lithography apparatus through the alignment mark 213 in the substrate 21 to be imprinted, after the alignment is successful, the photoetching equipment emits ultraviolet light which irradiates the photoresist through a light transmission area on the mask plate, so as to realize the exposure of the photoresist, develop the photoresist after the exposure is finished, remove the area irradiated by the ultraviolet light in the photoresist, and etching the hydrophobic material 220 according to the exposed and developed photoresist pattern, so as to form a hydrophobic layer 22 on the substrate 21 to be imprinted, wherein the formed hydrophobic layer 22 and the patterned layer 212 are not overlapped in the orthographic projection of the substrate 211, and finally, the residual photoresist is removed.
It should be noted that, the hydrophobic material 220 may be etched by dry etching or wet etching; in addition, the method for patterning the photoresist is directed at a positive photoresist, and of course, the photoresist may also be a negative photoresist, at this time, the negative photoresist after exposure is developed, and a region of the negative photoresist which is not irradiated by ultraviolet light may be removed, and in an actual manufacturing process, a corresponding mask plate and the photoresist are selected according to actual needs to etch to form the hydrophobic layer 22, which is not limited in the embodiment of the present invention.
The thickness of the hydrophobic layer 22 is 5nm to 100nm, and the thickness of the hydrophobic layer 22 refers to the thickness in the direction perpendicular to the substrate 211, for example, the thickness of the hydrophobic layer 22 may be 5nm, 20nm, 50nm, 100nm, or the like; the material of the water-repellent layer 22 is any one of polytetrafluoroethylene, fluoroethylene propylene copolymer, perfluoroalkyl compound, and ethylene-tetrafluoroethylene copolymer.
102, forming an imprinting adhesive layer on the substrate to be imprinted on which the hydrophobic layer is formed, wherein orthographic projections of the imprinting adhesive layer and the hydrophobic layer on the substrate to be imprinted do not overlap.
In the embodiment of the present invention, after forming the hydrophobic layer 22 on the substrate to be imprinted 21, as shown in fig. 5, an imprint glue layer 23 is formed on the substrate to be imprinted 21 on which the hydrophobic layer 22 is formed.
In the actual manufacturing process, the entire surface of the substrate 21 to be imprinted, on which the hydrophobic layer 22 is formed, is coated with the imprint glue, and since the imprint glue is difficult to deposit on the surface of the hydrophobic layer 22, the imprint glue layer 23 is formed only on the substrate 21 to be imprinted at the position of the non-hydrophobic layer, that is, the orthographic projections of the imprint glue layer 23 and the hydrophobic layer 22 on the substrate 21 to be imprinted do not overlap, so that it can be seen that the orthographic projections of the patterning layer 212 and the imprint glue layer 23 on the substrate 211 coincide.
The imprinting adhesive layer 23 is made of acrylate, and since functional groups such as carbon-carbon double bonds and carboxyl exist in the acrylate and a fluorine-containing functional group exists in the material of the hydrophobic layer 22, the imprinting adhesive layer 23 is difficult to deposit on the surface of the fluorine-containing functional group-containing hydrophobic layer 22.
In an alternative embodiment of the present invention, a spin coating process is used to coat a layer 23 of imprint glue on the substrate 21 to be imprinted on which the hydrophobic layer 22 is formed.
And 103, imprinting the substrate to be imprinted with the hydrophobic layer and the imprinting adhesive layer by using an imprinting template to form an imprinting pattern at the position of the imprinting adhesive layer.
In the embodiment of the present invention, after forming the imprinting glue layer 23 on the substrate 21 to be imprinted on which the hydrophobic layer 22 is formed, the substrate 21 to be imprinted on which the hydrophobic layer 22 and the imprinting glue layer 23 are formed is imprinted using the imprinting template 30 shown in fig. 6 to form an imprinting pattern 231 at the position of the imprinting glue layer 23, thereby obtaining the structure shown in fig. 7.
The imprint template 30 has a plurality of patterns 31 to be printed arranged in an array, specifically, the imprint template 30 includes an imprint substrate 32 and a plurality of patterns 31 to be printed arranged in an array formed on the imprint substrate 32, the plurality of patterns 31 to be printed may be uniformly distributed on the imprint substrate 32, and optionally, the patterns 31 to be printed are uniformly distributed on the entire surface of the imprint substrate 32. The imprint template 30 may be fabricated using electron beam direct writing or stitching techniques.
It should be noted that the imprint template 30 according to the embodiment of the present invention refers to a nano-imprint template, which can be imprinted when manufacturing products with different specifications, where the products with different specifications refer to the same structure of the required imprint pattern, but different specifications of the products (such as the size of the products).
For example, products to be manufactured include a product 1 and a product 2, where the structures of the imprint patterns required for the product 1 and the product 2 are the same, and the structures of the imprint patterns required for the product 1 and the product 2 are both 5nm, but the size of the product 1 is 14 inches, and the size of the product 2 is 16 inches, then, by using the embodiment of the present invention, after patterning the substrate to be imprinted 21 through the hydrophobic layer 22, the required imprint patterns can be imprinted by using the same nano-imprint template, so that the 14-inch product 1 and the 16-inch product 2 can be imprinted by using the same nano-imprint template.
After the imprinting template 30 shown in fig. 6 is used to imprint the substrate 21 to be imprinted, on which the hydrophobic layer 22 and the imprinting adhesive layer 23 are formed, the imprinting template 30 is separated from the imprinted substrate 21 to be imprinted, an imprinting pattern 231 is formed at the position of the imprinting adhesive layer 23 on the substrate 21 to be imprinted, the imprinting pattern 231 is matched with the pattern 31 to be imprinted on the imprinting template 30, and then the patterning layer 212 on the substrate 21 to be imprinted, which has the imprinting pattern 231, is etched based on the formed imprinting pattern 231 to form a desired structure, where the structure formed after etching the patterning layer 212 may be a via hole or other structures in a display substrate manufacturing process.
When a desired structure is formed after the patterning layer 212 is etched, a portion of the imprint pattern 231 on the patterning layer 212 is etched, and then the remaining imprint pattern 231 may be removed, and after the remaining imprint pattern 231 is removed, whether to remove the hydrophobic layer 22 on the substrate 21 to be imprinted may be determined according to actual process requirements.
At present, for large-size nano imprinting, imprinting glue is coated on the whole surface of a substrate to be imprinted, and then before a patterned nano imprinting template is contacted with the substrate to be imprinted, aligning the patterned nano-imprinting template with a substrate to be imprinted, mechanically moving the aligned nano-imprinting template, so that the nano-imprinting template and the substrate to be imprinted are bonded together, the alignment precision of the nano-imprinting template and the substrate to be imprinted is reduced due to the mechanical movement of the nano-imprinting template, then the substrate to be imprinted is imprinted by using the nano-imprinting template, in the imprinting process, the nano-imprinting template and the substrate to be imprinted also undergo relative displacement, so that the alignment precision of the nano-imprinting template and the substrate to be imprinted is further reduced, and the precision of an imprinted pattern formed after imprinting is affected, wherein the alignment precision of the existing nano-imprinting mode is usually greater than 10 μm.
In the embodiment of the invention, firstly, the whole surface of the substrate 21 to be imprinted is coated with the hydrophobic material 220, the hydrophobic material 220 is subjected to patterning treatment by adopting a photoetching process so as to form the hydrophobic layer 22 on the substrate 21 to be imprinted, because the imprint glue is difficult to deposit on the surface of the hydrophobic layer 22, when the substrate 21 to be imprinted with the hydrophobic layer 22 is coated with the imprint glue, the imprint glue layer 23 is formed only on the substrate 21 to be imprinted at the position of the non-hydrophobic layer, and when the substrate 21 to be imprinted is subsequently imprinted by adopting the nano-imprint template, the alignment is not required, the substrate 21 to be imprinted is directly imprinted to form the imprint pattern 231, the alignment precision of the embodiment of the invention is mainly determined by the capacity of the photoetching process when the hydrophobic material 220 is subjected to patterning treatment, and even if the nano-imprint template 30 and the substrate 21 to be imprinted are subjected to relative displacement in the imprinting process after the hydrophobic material 220 is subjected to patterning treatment, the alignment precision of the nano-imprinting template 30 and the substrate 21 to be imprinted is not affected, the final alignment precision is less than 10 μm, and preferably, the alignment precision can reach less than 1 μm, so that the precision of the imprinted pattern 231 formed after imprinting is improved.
In addition, aiming at products with different specifications, the mask plate used in the photoetching process is only required to be changed, the same nano-imprinting template can be used for imprinting in the imprinting process, and the manufacturing cost and time of the mask plate are short, so that the development cost and time of the nano-imprinting template are greatly reduced.
In the embodiment of the invention, the substrate to be imprinted is subjected to patterning treatment through the hydrophobic layer, then the substrate to be imprinted with the hydrophobic layer is coated with the imprinting adhesive, because the imprinting adhesive is difficult to deposit on the surface of the hydrophobic layer, a imprinting adhesive layer is formed only on the substrate to be imprinted at the position of the non-hydrophobic layer, when the substrate to be imprinted is subsequently imprinted by adopting the nano-imprinting template, because the imprinting adhesive layer does not exist on the hydrophobic layer, even if the nano-imprinting template has the pattern to be imprinted at the position of the hydrophobic layer, the imprinting pattern cannot be imprinted on the hydrophobic layer, and the imprinting pattern can be imprinted only at the position of the imprinting adhesive layer, therefore, for products with different specifications, after the substrate to be imprinted is subjected to patterning through the hydrophobic layer, the required imprinting pattern can be imprinted by adopting the same nano-imprinting template, so that products with different specifications can be imprinted by adopting the same nano-, the number of nano-imprint templates is greatly reduced, and the manufacturing time and cost are greatly reduced.
Example two
The embodiment of the invention provides an imprinting structure which is manufactured by adopting the imprinting method in the first embodiment.
The imprint structure refers to a structure formed after etching the patterning layer 212 based on the formed imprint pattern 231 after forming the structure shown in fig. 7, and the structure formed after etching the patterning layer 212 may be a via or other structure in a display substrate manufacturing process.
In addition, for the specific description of the imprinting method, reference may be made to the description of the first embodiment, which is not repeated herein.
The embodiment of the invention also provides a display substrate which comprises the stamping structure.
The display substrate can be an array substrate in a display device, and in the process of manufacturing the display substrate, the imprinting method of the first embodiment can be adopted to manufacture an imprinting structure, so that the manufactured imprinting structure is higher in precision.
Note that the imprinted structure is not limited to the imprinted structure produced in the process of producing the display substrate, and may be an imprinted structure produced in the process of producing a WGP (Wire grid Polarizer).
In the embodiment of the invention, the substrate to be imprinted is subjected to patterning treatment through the hydrophobic layer, then the substrate to be imprinted with the hydrophobic layer is coated with the imprinting adhesive, because the imprinting adhesive is difficult to deposit on the surface of the hydrophobic layer, a imprinting adhesive layer is formed only on the substrate to be imprinted at the position of the non-hydrophobic layer, when the substrate to be imprinted is subsequently imprinted by adopting the nano-imprinting template, because the imprinting adhesive layer does not exist on the hydrophobic layer, even if the nano-imprinting template has the pattern to be imprinted at the position of the hydrophobic layer, the imprinting pattern cannot be imprinted on the hydrophobic layer, and the imprinting pattern can be imprinted only at the position of the imprinting adhesive layer, therefore, for products with different specifications, after the substrate to be imprinted is subjected to patterning through the hydrophobic layer, the required imprinting pattern can be imprinted by adopting the same nano-imprinting template, so that products with different specifications can be imprinted by adopting the same nano-imprinting template, the number of nano-imprint templates is greatly reduced, and the manufacturing time and cost are greatly reduced.
For simplicity of explanation, the foregoing method embodiments are described as a series of acts or combinations, but it should be understood by those skilled in the art that the present invention is not limited by the order of acts or acts described, as some steps may occur in other orders or concurrently with other steps in accordance with the invention. Further, those skilled in the art should also appreciate that the embodiments described in the specification are preferred embodiments and that the acts and modules referred to are not necessarily required by the invention.
The embodiments in the present specification are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.
Finally, it should also be noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
The imprinting method, the imprinting structure, and the display substrate provided by the present invention are described in detail above, and the principles and embodiments of the present invention are described herein by using specific examples, which are only used to help understand the method and the core concept of the present invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (8)
1. An imprinting method, comprising:
forming a hydrophobic layer on a substrate to be imprinted;
forming an imprinting adhesive layer on the substrate to be imprinted, on which the hydrophobic layer is formed, wherein the imprinting adhesive layer and the orthographic projection of the hydrophobic layer on the substrate to be imprinted are not overlapped;
and imprinting the substrate to be imprinted with the hydrophobic layer and the imprinting adhesive layer by adopting an imprinting template so as to form an imprinting pattern at the position of the imprinting adhesive layer.
2. The method according to claim 1, wherein the step of forming a hydrophobic layer on the substrate to be imprinted comprises:
coating a hydrophobic material on the substrate to be imprinted;
and patterning the hydrophobic material by adopting a photoetching process to form a hydrophobic layer on the substrate to be imprinted.
3. The method of claim 1, wherein the imprint template has a plurality of patterns to be printed arranged in an array.
4. The method of claim 1, wherein a spin coating process is used to coat a layer of imprinting glue on the substrate to be imprinted on which the hydrophobic layer is formed.
5. The method of claim 1, wherein the hydrophobic layer has a thickness of 5nm to 100 nm.
6. The method of claim 1, wherein the material of the hydrophobic layer is any one of polytetrafluoroethylene, fluoroethylene propylene copolymer, perfluoroalkyl compound, and ethylene-tetrafluoroethylene copolymer.
7. The method of claim 1, wherein the material of the imprinting glue layer is an acrylate.
8. The method according to any of claims 1 to 7, characterized in that it further comprises, before the step of forming a hydrophobic layer on the substrate to be imprinted:
forming a patterning layer on a substrate to obtain the substrate to be imprinted; the patterned layer is superposed with the orthographic projection of the imprinting glue layer on the substrate.
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| WO2009004560A2 (en) * | 2007-07-04 | 2009-01-08 | Koninklijke Philips Electronics N.V. | A method for forming a patterned layer on a substrate |
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