JP2014126546A5 - - Google Patents

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JP2014126546A5
JP2014126546A5 JP2012286077A JP2012286077A JP2014126546A5 JP 2014126546 A5 JP2014126546 A5 JP 2014126546A5 JP 2012286077 A JP2012286077 A JP 2012286077A JP 2012286077 A JP2012286077 A JP 2012286077A JP 2014126546 A5 JP2014126546 A5 JP 2014126546A5
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sample
polished
polishing
adhesive
fragile
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JP5633078B2 (en
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すなわち、上記課題を解決するための本発明は、以下のとおりである。
[1]天然に存在する鉱物のうち加熱に弱いあるいは水・油によって膨潤してしまう脆弱試料を用いて、上下面が研磨された薄片試料を作製する方法であって、脆弱試料を樹脂により包理固化し、直方体に整形切断した後、該試料の研磨される面と直行する4面、又はさらに研磨される一方の面と反対側の面を加えた5面に、岩石又は鉱物を貼り付け研磨を行うことを特徴とする薄片試料の作製方法。
[2]前記岩石又は鉱物の干渉色を、偏光顕微鏡を用いて観察することにより、薄片試料の厚さ調製を行うことを特徴とする[1]に記載の薄片試料の作製方法。
[3]前記樹脂として、常温あるいは低温で硬化が可能でかつ硬化時間が短い樹脂を用いることを特徴とする[1]又は[2]に記載の薄片試料の作製方法。
[4]アルミナ粉末を含浸させたシルククロスを用いた研磨を行うことを特徴とする[1]〜[3]のいずれかに記載の薄片試料の作製方法。
[5][1]〜[4]のいずれかに記載の方法で作製された薄片試料を用いて、走査型電子顕微鏡、エネルギー分散X線分光法、電子線マイクロアナライザー、又は反射顕微鏡による観察・分析を行うことを特徴とする脆弱試料の観察・分析方法。
That is, the present invention for solving the above-described problems is as follows.
[1] A method for producing a thin sample whose upper and lower surfaces are polished using a weak sample that is weak to heating or swelled by water or oil among naturally occurring minerals, and the weak sample is encapsulated with a resin. After solidifying and shaping and cutting into a rectangular parallelepiped, a rock or mineral is pasted on 5 surfaces including the 4 surfaces orthogonal to the polished surface of the sample or the surface opposite to the one surface to be polished. A method for producing a thin piece sample, characterized by performing polishing.
[2] The method for producing a flake sample according to [1], wherein the thickness of the flake sample is prepared by observing the interference color of the rock or mineral using a polarizing microscope.
[3] The method for producing a thin sample according to [1] or [2], wherein a resin that can be cured at normal temperature or low temperature and has a short curing time is used as the resin.
[4] The method for producing a flake sample according to any one of [1] to [3], wherein polishing is performed using a silk cloth impregnated with alumina powder.
[5] Observation with a scanning electron microscope, energy dispersive X-ray spectroscopy, electron beam microanalyzer, or reflection microscope using the flake sample prepared by the method according to any one of [1] to [4] A method for observing and analyzing fragile samples characterized by performing analysis.

<接着面の研磨>
試料をスライドガラスへ貼り付けるための基準となる面を研磨するが、試料に水分や油分が浸透するとイモゴライト等が膨潤することから、ここでも乾式法の研磨とする。
13)可変式自動研磨機の上に粘着シートを貼り、精密研磨専用の円形耐水研磨紙を粘着シートに貼る。耐水研磨紙の番砥については、320番→500番→800番→1200番→2400番→4000番の順に使用するが、使用前に番砥粒子の大きさを均等にするため、同番砥またはそれよりも粒子の細かい番砥の研磨紙によるすり合わせを行い、その後洗浄し乾燥させる。
14)前記の研磨する試料を耐水研磨紙の中央に置き、円を低速回転(40〜50回転/分程度)させ、研磨紙の中心から外へまたは外から中心へ、試料が一度通過した研磨紙の上を繰り返し通過することが無いように研磨を行う。細かい番砥の研磨紙を用いた際には、試料の研磨面に残っている磨き屑をエアーガンにて吹き飛ばす。また研磨面に試料の脱落が見られる場合には、シアノアクリレート系接着剤を滴下して補強を行う。
研磨の工程においては、研磨面に前の段階の研磨材の磨き屑が残らないようにブラッシングとエアーガンによるクリーニング作業を施すこと、試料の縁だけが減りすぎて起こる“縁だれ”が生じないようにすること、さらには硬さの異なる鉱物や樹脂の境界に段差が生じないように平滑に研磨することに注意する。
<Polishing the adhesive surface>
The reference surface for attaching the sample to the slide glass is polished. However, when moisture or oil penetrates the sample, imogolite and the like swell, so that the dry method is used here as well.
13) variable automatic polishing machine board on joining the adhesive sheet, put a circular waterproof abrasive paper precision polishing dedicated to the adhesive sheet. For water-resistant abrasive paper, use 320, 500, 800, 1200, 1200, 2400, and 4000 in order. Alternatively, grinding is performed with abrasive paper having finer grain than that, and then washed and dried.
14) Place the polished sample in the center of the waterproof abrasive paper, the circular plate low speed (about 40 to 50 rev / min) is, to the center from the outer or outward from the center of the abrasive paper, the sample has passed once Polishing is performed so as not to repeatedly pass over the polishing paper. When using a fine-grinded abrasive paper, blow off the scraps remaining on the polished surface of the sample with an air gun. In addition, when a sample is dropped on the polished surface, a cyanoacrylate adhesive is dropped to reinforce.
In the polishing process, brushing and cleaning with an air gun are performed so that the abrasive scraps from the previous stage do not remain on the polishing surface. In addition, care should be taken to ensure smooth polishing so that there is no step at the boundary between minerals and resins with different hardness.

<試料のスライドグラスへの接着と2次切断>
15)エポキシ系常温硬化型の2液混合接着剤(セメダインスーパー60分硬化型)を用いて、前記の接着面が研磨された試料をスライドガラスに貼り付ける。スライドガラスについては、55mm×78mmを用いる。
16)エポキシ系常温硬化型の2液混合接着剤の厚さを均一にし、試料がずれて接着されないようにジグで固定し、常温の状態で一昼夜放置して接着剤を硬化させる。
17)接着硬化後の試料を、専用のチャックホルダーに固定し、10)で使用したバンドソーを使用し慎重に時間をかけて乾式切断する。スライドガラスに接着された切断後の試料の厚さは、約0.8mmとする。
18)切断面の試料の脱落を防ぐために、シアノアクリレート系接着剤にて試料表面を固結させる。
<Adhesion of sample to slide glass and secondary cutting>
15) Using an epoxy-based room temperature curing type two-component mixed adhesive (cemedine super 60 minute curing type), the sample having the polished adhesive surface is affixed to a slide glass. For slide glass, use 55mm x 78mm.
16) Make the thickness of the epoxy-based room temperature curable two-component mixed adhesive uniform, fix it with a jig so that the sample does not slip and adhere, and let it stand at room temperature for 24 hours to cure the adhesive.
17) Fix the adhesive-cured sample to a dedicated chuck holder, and carefully dry-cut it using the band saw used in 10) over time. The thickness of the cut sample adhered to the slide glass is about 0.8 mm.
18) In order to prevent the sample from falling off the cut surface, the sample surface is solidified with a cyanoacrylate adhesive.

<仕上げ研磨>
19)13)・14)での乾式法による接着面の研磨作業工程と同様に、40〜50回転にてスライドガラスを指先で押さえながら試料を擦り減らす。耐水研磨紙の番砥は、320番→500番→800番→1200番→2400番→4000番の順で、試料の厚さが約35ミクロンになるまで研磨する。その後にアルミナ粒子が蒸着されたラッピングフィルム6000番(1,5μm)で研磨する。
各研磨工程での試料の厚さの目安は、320番で100μm、500番で80μm、800番で60μm、1200番で40μm、2400番と4000番で35μm、ラッピングフィルム6000番で31μmとする。必要であれば320番で研磨を終え100μm厚となった時点でシアノアクリレート系接着剤による試料面の固結を図る。
20)最終研磨として、アルミナ粉末(φ1μm)にエチルアルコールを加え、ペースト状にした後、可変型自動研磨装置の回転に取り付けたシルククロス円上に、回転を回転させながらアルミナのペーストを平らに塗布する。図3は、アルミナ粉末を含浸させたシルククロスの写真である。回転台の回転数をあげ、アルコールを蒸発させる。その後、スライドガラスを保持具に取り付け、50回転にて30μmになるまで研磨する。
図4は、脆弱試料の、高度な平滑面を有する薄片試料の写真である。
<Finishing polishing>
19) In the same manner as the polishing process of the adhesive surface by the dry method in 13) and 14), the sample is scraped off while pressing the slide glass with a fingertip at 40 to 50 revolutions. The water-resistant abrasive paper is polished in the order of 320 → 500 → 800 → 1200 → 2400 → 4000 until the thickness of the sample is about 35 microns. Then, polishing is performed with a wrapping film No. 6000 (1,5 μm) on which alumina particles are deposited.
The standard thickness of the sample in each polishing step is 100 μm for 320, 80 μm for 500, 60 μm for 800, 40 μm for 1200, 35 μm for 2400 and 4000, and 31 μm for lapping film 6000. If necessary, the sample surface is solidified with a cyanoacrylate adhesive when polishing is finished at No. 320 and the thickness becomes 100 μm.
20) as a final polishing, ethyl alcohol was added to the alumina powder (1 [mu] m), after a paste, variable silk cloth circle board on which is mounted a rotating disk of an automatic polishing apparatus to rotate the turntable with alumina paste Apply evenly. FIG. 3 is a photograph of a silk cloth impregnated with alumina powder. Raise the rotation speed of the turntable and evaporate the alcohol. After that, a slide glass is attached to the holder and polished to 50 μm at 50 revolutions.
FIG. 4 is a photograph of a fragile sample, a flake sample having a highly smooth surface.

Claims (1)

天然に存在する鉱物のうち加熱に弱いあるいは水・油によって膨潤してしまう脆弱試料を用いて、上下面が研磨された薄片試料を作製する方法であって、
前記脆弱試料を樹脂により包理固化し、直方体に成形切断した後、該試料の研磨される面と直行する4面、又はさらに研磨される一方の面と反対側の面を加えた5面に、岩石又は鉱物を貼り付け研磨を行うことを特徴とする薄片試料の作製方法。
It is a method of making a flake sample whose upper and lower surfaces are polished using a fragile sample that is vulnerable to heating or swells with water or oil among naturally occurring minerals,
After embedding and solidifying the fragile sample with resin, forming and cutting into a rectangular parallelepiped, the four surfaces perpendicular to the surface to be polished of the sample, or five surfaces including the surface opposite to the one surface to be polished the method for manufacturing a thin sample which is characterized in that the polishing paste rock or mineral.
JP2012286077A 2012-12-27 2012-12-27 Fabrication of fragile specimen flakes by dry polishing Active JP5633078B2 (en)

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JP6304657B2 (en) * 2014-06-27 2018-04-04 国立研究開発法人産業技術総合研究所 Preparation method of biological flake sample by dry polishing method and observation / analysis method using the sample
CN104330056B (en) * 2014-10-23 2017-02-15 西南大学 Method of accurately measuring cross section area of single silk and application thereof
CN105092340B (en) * 2015-09-16 2018-03-16 成都理工大学 A kind of rock sample microcell draws a circle to approve system
CN107305169A (en) * 2016-04-19 2017-10-31 中国石油化工股份有限公司 A kind of method for preparing hydrocarbon source rock kerogen light thin slice
CN105823663B (en) * 2016-05-11 2018-07-03 中国海洋大学 Make the mold and production method of rocks test specimen of the semi-disc with fissure-plane
CN106153421A (en) * 2016-07-29 2016-11-23 温州医科大学 A kind of diatom machinery breaks machine processing means
CN110579381A (en) * 2018-06-08 2019-12-17 中国石油化工股份有限公司 Preparation method of shale cylindrical sample
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CN110320122B (en) * 2019-06-12 2022-06-10 华北水利水电大学 Accurate detection method for rock mineral abrasiveness
JP7452267B2 (en) * 2020-06-08 2024-03-19 住友金属鉱山株式会社 Abrasive paper for preparing observation samples for mineral analysis and polishing method using the same
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JPS5586946U (en) * 1978-12-11 1980-06-16
JPS5978958U (en) * 1982-11-18 1984-05-28 三洋電機株式会社 Embedding for cross-sectional structure analysis
JPS63105845U (en) * 1986-12-27 1988-07-08
JPH01164547A (en) * 1987-12-22 1989-06-28 Marutoo:Kk Polishing machine for preparing thin microsection
JPH082596Y2 (en) * 1989-03-30 1996-01-29 工業技術院長 Thin Sample Polishing Holder with Polarized Illumination for Polarizing Microscope Sample Maker
JPH10132716A (en) * 1996-10-31 1998-05-22 Sumitomo Wiring Syst Ltd Method and apparatus for forming cross-section of sample
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JP2005195638A (en) * 2003-12-26 2005-07-21 Mitsumi Electric Co Ltd Optical waveguide device and method of manufacturing same

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