JP2014120645A - Substrate processing apparatus and its method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce the burden on an operator during resumption operation after stoppage of the processing, by presetting the resumption operation based on a recipe.SOLUTION: Upon generation of an alarm while processing a substrate W in a chamber 1 based on a recipe, a control unit 53 resumes processing of that substrate W based on the alarm, the step when the alarm is generated, and a resumption operation table. Since the resumption operation is predetermined for each alarm and step, the burden on the operator can be reduced during resumption operation after stoppage of the processing.

Description

  The present invention relates to a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an organic EL substrate, an FED (Field Emission Display) substrate, an optical display substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask substrate. The present invention relates to a substrate processing apparatus and method for processing a substrate and a solar cell substrate (hereinafter simply referred to as a substrate), and more particularly to a technique for resuming processing on a substrate after processing on the substrate is interrupted.

  Conventionally, as an apparatus of this type, an interruption dedicated mode activation unit that activates an interruption dedicated mode for performing a fixed process dedicated to interruption on a substrate on which processing has been interrupted, and processing A process continuation mode activation unit that activates an arbitrary process continuation mode in which processing can be continued from an arbitrary process in the processing procedure for an interrupted substrate, and processing in the processing procedure is interrupted for a substrate in which processing has been interrupted. A processing tank continuation mode activation unit that activates a processing tank continuation mode that can be continued from processing related to a processing tank next to the processing tank, and a processing mode for the interruption, a processing continuation mode, and a processing tank after the processing on the substrate is interrupted. Resuming processing in one of the continuation modes and resuming processing in the suspension-only mode or resuming processing in the processing continuation mode based on the designation by the designation unit A processing resumption request section for requesting one of the processing resumes by processing tank continue mode, are provided with a (e.g., see Patent Document 1).

  Here, the interruption-only mode is, for example, a mode in which the substrate is discharged from the apparatus after the substrate is washed with water and dried. Further, the processing continuation mode is a mode in which the processing on the substrate can be continued from an arbitrary process in the processing procedure, for example. The treatment tank continuation mode is a mode in which, for example, the process in the water washing treatment tank is continued after the treatment in the chemical solution treatment tank.

  According to the above apparatus, based on the designation by the designation unit, any one of the process resumption in the interruption exclusive mode, the process resumption in the arbitrary process continuation mode, and the process resumption in the treatment tank continuation mode for the substrate in which the process is suspended is performed. Therefore, the process is automatically restarted with only a simple designation made by the operator. Therefore, it is possible to efficiently perform the process restart in the stopped apparatus.

JP 2001-223199 A

However, the conventional example having such a configuration has the following problems.
That is, in the conventional apparatus, the operator needs to input any restart command in each mode related to restart. Since the operator needs to select an appropriate restart command based on the process at the time of stoppage, there is a problem that the burden on the operator is heavy.

  The present invention has been made in view of such circumstances, and by setting a restart operation in advance based on a recipe, the burden on the operator during the restart operation after the process is stopped is reduced. It is an object of the present invention to provide a substrate processing apparatus and a method for the same.

In order to achieve such an object, the present invention has the following configuration.
That is, the invention described in claim 1 includes a processing unit for processing a substrate and a plurality of steps that are processing procedures for processing the substrate in a substrate processing apparatus that performs predetermined processing on the substrate. A storage means that stores a recipe and a restart operation table that prescribes a restart operation for each step in response to various alarms, and an alarm is generated when the substrate is processed by the processing unit based on the recipe In this case, the apparatus includes an alarm, a step when the alarm is generated, and a control unit that restarts the processing of the substrate based on the restart operation table.

  [Operation / Effect] According to the first aspect of the present invention, when an alarm is generated when the substrate is processed by the processing unit based on the recipe, the control means is configured to output the alarm and the alarm. The processing of the substrate is resumed based on the step and the resume operation table. Since the restart operation is predetermined for each alarm and step, it is possible to reduce the burden on the operator during the restart operation after the process is stopped.

  In the present invention, it is preferable that the resume operation table defines at least a resume operation for continuing a process on a substrate as it is and a carry-out operation for interrupting and unloading a substrate. ).

  By prescribing the continuation operation and the carry-out operation as the restart operation at least for each alarm, the substrate processing can be appropriately restarted.

  Further, in the present invention, it further comprises an instruction means for an operator to instruct resumption of operation after the occurrence of an alarm, and the control means interrupts the processing by the processing section when an alarm occurs, and the instruction means It is preferable to determine the resuming operation after the operation is performed.

  Since the control means interrupts the processing after the alarm is generated, the instruction means can instruct resumption after the operator confirms the situation. Therefore, it is possible to cope with the situation of interruption.

  Moreover, in this invention, it is preferable to further provide the display means which displays the progress of the process by the recipe in the said process part (Claim 4).

  Since the progress of processing is displayed on the display means, the operator can check the situation at the time of alarm occurrence.

  In the present invention, it is preferable that the display means displays an alarm content when an alarm is generated, and displays a progress of processing and a restart operation corresponding to the alarm.

  The contents of the alarm, the progress status of the process, and the restart operation corresponding to the alarm are displayed on the display means, so that the operator can determine the treatment by looking at them.

  According to a sixth aspect of the present invention, in the substrate processing method for performing a predetermined process on a substrate, the processing unit processes the substrate based on a recipe including a plurality of steps which are processing procedures for processing the substrate. The process of interrupting the processing by the processing unit due to the occurrence of an alarm, the alarm, the step when the alarm occurred when instructed to resume, and the process is resumed at each step according to various alarms The method includes a step of determining a restart operation of the substrate based on a restart operation table that defines the operation, and a step of executing the determined restart operation.

  [Operation / Effect] According to the invention described in claim 6, when the substrate is processed by the processing unit based on the recipe, the processing by the processing unit is interrupted by the occurrence of an alarm, and the restart operation is instructed The restart operation is determined based on the table, and the restart operation is executed. Therefore, it is possible to reduce the burden on the operator during the restarting operation after the processing is stopped.

  According to the substrate processing apparatus of the present invention, the control means refers to the restart operation table and responds to the alarm in advance when an alarm is generated when the processing unit processes the substrate based on the recipe. The processing of the substrate is resumed by the resume operation. Since the restart operation is predetermined for each alarm and step, it is possible to reduce the burden on the operator during the restart operation after the process is stopped.

It is a figure which shows schematic structure of the substrate processing apparatus which concerns on an Example. It is a schematic diagram which shows a recipe and a restart operation | movement table. It is a schematic diagram which shows the state which displayed the progress status example of the process. It is a schematic diagram which shows the example of an alarm display at the time of alarm occurrence. It is a schematic diagram which shows the state which displayed the restart operation example at the time of alarm generation. It is a flowchart which shows operation | movement of a substrate processing apparatus.

An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a diagram illustrating a schematic configuration of a substrate processing apparatus according to an embodiment.

  The substrate processing apparatus according to the present embodiment is an apparatus for performing various processes on the substrate W. The substrate processing apparatus includes, for example, two chambers 1 and 2. However, in order to facilitate understanding of the invention, only the chamber 1 is described in detail, and the chamber 2 is simplified. Each of the chambers 1 and 2 is a single wafer processing unit that performs processing while rotating the substrate W. Actually, a member for partitioning the chambers 1 and 2 is disposed between the chambers 1 and 2, but the illustration thereof is omitted.

  The chamber 1 includes a spin base 3, a scattering prevention cup 5, an atmosphere blocking plate 7, and a supply unit 9. The spin base 3 includes a spin chuck 11, a rotation shaft 13, and a rotation motor 15. The spin chuck 11 holds the substrate W in a horizontal posture. The rotary shaft 13 has one end connected to the lower surface of the spin chuck 11 and the other end connected to the rotary motor 15. The rotation motor 15 rotates the rotation shaft 13 to rotate the substrate W together with the spin chuck 11 in a horizontal plane.

  The anti-scattering cup 5 is disposed so as to surround the side of the spin chuck 11. The anti-scattering cup 5 has an opening in the upper part, and receives and collects the processing liquid scattered from the rotating substrate W to the surroundings by an inclined surface on the inner side that is formed on the side. The spin base 3 described above is configured to be movable up and down over a “delivery position” protruding from the anti-scattering cup 5 and a “processing position” accommodated in the anti-scattering cup 5.

  The atmosphere blocking plate 7 is configured to be movable up and down to an “upper position” that is greatly separated above the spin chuck 11 and a “proximity position” that is close to the upper surface of the substrate W held by the spin chuck 11. The atmosphere blocking plate 7 is configured to be rotatable in the same direction as the rotation shaft 13. Further, the atmosphere blocking plate 7 has a nozzle 17 formed at the center of the lower surface.

The supply unit 9 supplies various gases and processing liquids to the spin base 3 side. One end of the gas supply pipe 19 is connected to the nozzle 17 of the atmosphere blocking plate 7 and the other end is connected to the nitrogen gas supply source. The gas supply pipe 19 is provided with a control valve 21 for adjusting the supply and flow rate of nitrogen gas. One end side of the ozone water supply pipe 23 is connected to the base end portion of the supply nozzle 25, and the other end side is connected to an ozone water supply source (O ₃ supply source in the drawing). The ozone water supply source mixes ozone (O ₃ ) and pure water and supplies them to the ozone water supply pipe 23. The ozone water supply pipe 23 is provided with a control valve 27 for adjusting the supply and flow rate of the ozone water. One end side of the carbonated water supply pipe 29 is connected to the supply nozzle 31, and the other end side is connected to a carbonated water supply source (CO ₂ supply source in the drawing). The carbonated water supply source supplies carbonated water in which carbon dioxide (CO ₂ ) is dissolved in pure water to the carbonated water supply pipe 29. The carbonated water supply pipe 29 is provided with a control valve 33 for adjusting the supply and flow rate of carbonated water. One end side of the hydrofluoric acid supply pipe 35 is connected to the supply nozzle 37, and the other end side is connected to a hydrofluoric acid supply source (HF supply source in the drawing). A control valve 39 for adjusting the supply and flow rate of hydrofluoric acid is attached to the hydrofluoric acid supply pipe 35. One end of the IPA (isopropyl alcohol) supply pipe 41 is connected to the supply nozzle 43 and the other end is connected to the IPA supply source. The IPA supply pipe 41 is provided with a control valve 44 for adjusting the supply and flow rate of IPA.

  The chamber 2 has the same configuration as the supply unit 9 of the chamber 1 described above. Here, in order to facilitate understanding of the invention, it is assumed that only the SC1 supply system is provided. The SC1 supply pipe 45 has one end connected to the supply nozzle 47 and the other end connected to the SC1 supply source. The SC1 supply source supplies a cleaning liquid composed of ammonium hydroxide and hydrogen peroxide as SC1 liquid. The SC1 supply pipe 45 is provided with a control valve 49 for adjusting the supply and flow rate of the SC1 liquid.

  The chambers 1 and 2 described above correspond to the “processing section” in the present invention.

  Each of the supply nozzles 25, 31, 37, 43, 47 described above is configured to be able to advance and retract over a “supply position” that is above the rotation center of the spin base 3 and a “standby position” that is laterally away from the supply position. ing.

  A transport arm 51 is provided to transport the substrate W between the chambers 1 and 2 and a processing unit or mounting table (not shown). The transport arm 51 contacts the lower surface of the substrate W and transports the substrate W in a horizontal posture. The transport arm 51 is configured to be able to advance and retract over a “standby position” that is laterally separated from the anti-scattering cup 5 and a “delivery position” that is above the opening of the anti-scattering cup 5.

  Each part mentioned above is controlled by the control part 53 centralizedly. The control unit 53 is configured by a CPU and a memory. A storage unit 55 is connected to the control unit 53. The storage unit 55 stores a recipe and a restart operation table in advance. The recipe includes a plurality of steps which are processing procedures for processing the substrate W. As will be described in detail later, the restart operation table is configured in such a manner that alarms and recipe steps when an alarm occurs are arranged in a matrix, and the restart operation is defined for each alarm and step. Examples of the resuming operation in this example include a “continuation operation” in which the processing on the substrate W is continued as it is and a “carrying out operation” in which the processing of the substrate W is interrupted and carried out.

  The control unit 53 described above arrives at the “control unit” in the present invention, and the storage unit 55 corresponds to the “storage unit” in the present invention.

  The alarm detection unit 57 detects an alarm related to an abnormality that has occurred in each unit, and reports it to the control unit 53.

  The control unit 53 described above interrupts the operation of each unit after receiving from the alarm detection unit 57 that an alarm such as a warning has occurred. Next, the restart operation is determined based on the alarm, the step when the alarm is generated, and the restart operation table, and the processing of the substrate W is restarted by the restart operation after waiting for the operator's instruction.

  A display unit 59 and an instruction unit 61 are connected to the control unit 53 described above. When the control unit 53 controls each unit based on the recipe, the display unit 59 displays the step that is being executed among the steps or the number of steps in the total number of steps that are being executed. To display the progress of the process. The display unit 59 displays all the alarms detected by the alarm detection unit 57 or displays a restart operation corresponding to the alarm instructed by the operator using the instruction unit 61. The instruction unit 61 in this embodiment is constituted by a touch panel integrally formed on the display surface of the display unit 59, for example. In addition, the instruction unit 61 is operated by an operator in order to issue an instruction to resume processing interrupted by the occurrence of an alarm.

  The display unit 59 described above comes to the “display unit” in the present invention, and the instruction unit 61 corresponds to the “instruction unit” in the present invention.

  Reference is now made to FIG. FIG. 2 is a schematic diagram showing a recipe and a restart operation table. The recipe and the restart operation table relate to the processing of the substrate W in the chamber 1.

  In the recipe in this example, the total number of steps is 25, and time 1, time 2, rotation number 1, rotation number 2, chemical solution 1, and chemical solution 2 are defined for each step. Time 1 is an acceleration / deceleration time until the rotational speed 1 is reached, and time 2 is a time for maintaining the rotational speed 1. Further, the rotation speed 1 is the rotation speed of the spin base 3, and the rotation speed 2 is the rotation speed of the atmosphere blocking plate 7. The chemical liquids 1 and 2 represent processing liquids supplied to the substrate W.

  Briefly explain the recipe. In this recipe, the substrate W is cleaned. First, in steps 1 and 2, ozone water is supplied from the supply nozzle 25 while rotating the substrate W, and the surface of the substrate W is oxidized to form a thin oxide film. In steps 3 to 5, carbonated water is supplied from the supply nozzle 31 while rotating the substrate W. In steps 6 and 7, hydrofluoric acid is supplied from the supply nozzle 37 while rotating the substrate W, and the thin oxide film is removed. In steps 8 to 15, carbonated water is supplied from the supply nozzle 31 in order to suppress adverse effects on the device due to generation of static electricity, and the rotation speed of the substrate W is gradually decreased to reach 10 rpm. Stop supplying. In Steps 16 to 20, while supplying IPA from the supply nozzle 43, the rotational speed of the substrate W is gradually increased, and after reaching 500 rpm, the supply of IPA is stopped, and carbonated water is replaced with IPA. In step 21, the atmosphere blocking plate 7 is lowered to the close position. In steps 22 to 25, while the nitrogen gas is supplied from the atmosphere blocking plate 7, the rotation speed of the substrate W is temporarily increased, and then the rotation of the substrate W is stopped in step 24, and the supply of nitrogen gas is performed in step 25. Stop and dry the surface of the substrate W.

  The restart operation table in this example includes, as alarms, spin base speed abnormality, HF temperature rise abnormality, IPA thermometer abnormality, and SC1 supply failure. The spin base speed abnormality is, for example, a case where the rotational speed 1 of the rotary motor 15 specified in the recipe cannot be maintained or a state where the rotary motor 15 cannot be controlled according to the acceleration / deceleration time. The HF temperature rise abnormality is, for example, a case where the temperature exceeds a temperature adjustment range in a temperature adjustment unit (not shown) for adjusting the temperature of hydrofluoric acid. The IPA thermometer abnormality is, for example, a case where an abnormality has occurred in a thermometer in a temperature control unit (not shown) that controls the temperature of the IPA. The SC1 supply impossibility is, for example, a case where a failure occurs in a pump (not shown) that pumps SC1 liquid into the SC1 supply pipe 45.

  In the restart operation table, as shown on the right side of FIG. 2, each alarm is configured in a matrix for each recipe step. In the figure, “◯” and “×” represent the restart operation. Here, “◯” is a “continuation operation” in which the processing for the substrate W is continued as it is, and the processing is resumed from the middle of the step interrupted by the alarm or from the next step. “X” is a “carrying-out operation” for interrupting the processing on the substrate W, and carrying out all steps after the step interrupted by the alarm is carried out. Here, the resume operation includes only the continuation operation and the carry-out operation. However, as the resume operation, for example, when the chemical liquid treatment step is interrupted, the carry-out operation is performed after the pure water treatment. Such an unloading operation after cleaning may be added.

  Reference is now made to FIGS. 3 is a schematic diagram showing a state in which an example of the progress of processing is displayed, FIG. 4 is a schematic diagram showing an example of an alarm display when an alarm is generated, and FIG. 5 is an example of a restart operation when an alarm is generated. It is a schematic diagram which shows the state which displayed.

  When the process is executed based on the recipe, the display unit 59 displays the number of executed steps with respect to the total number of steps of the recipe in the progress display area 71 (FIG. 3). In addition, the display unit 59 displays, in the recipe display area 73, a step that is currently being executed among the steps of the recipe by highlight display (hatched area in FIG. 3).

  When an alarm occurs, the display unit 59 displays all the alarms detected by the alarm detection unit 57 in the alarm display area 75 (FIG. 4). The alarm display area 75 also displays the names and generation times of the processing units provided in the substrate processing apparatus such as the chambers 1 and 2 where the alarm is generated. At this time, the display unit 59 displays a detailed information display 77 and a system restart 79. These are operated by the operator, and when the detailed information display 77 is touched, the display is switched to the display shown in FIG. Then, the display unit 59 displays the contents of the alarm in the alarm details display area 81. Further, the progress status and the restart operation are displayed in the restart operation display area 83. When the operator touches the system restart 79 in the state displayed on the display unit 59 in this way, the suspended processing is restarted by the restart operation.

  Next, the operation of the above-described substrate processing apparatus will be described with reference to FIG. FIG. 6 is a flowchart showing the operation of the substrate processing apparatus. In the following description, the case where the substrate W is processed in the chamber 1 will be described as an example.

Step S1
The control unit 53 reads the recipe from the storage unit 55 and starts the operation of each unit so as to sequentially execute from step 1 to step 25.

Step S2
The control unit 53 waits for an alarm from the alarm detection unit 57.

Step S3
Here, for example, as shown in FIG. 3, it is assumed that an alarm of spin base speed abnormality as shown in FIG. 4 occurs during execution of step 3 of the chamber 1. The control unit 53 stops the rotary motor 15 and interrupts the supply of carbonated water from the supply nozzle 31.

Step S4
Here, for example, as shown in FIG. 4, it is assumed that the control unit 53 waits for an operator instruction in a state where the display on the display unit 59 is switched to the alarm display. At this time, the control unit 53 refers to the restart operation table in the storage unit 55 and determines the restart operation based on the correspondence between the interrupted step 3 and the alarm. In this case, the spin base speed abnormality in step 3 is a carry-out operation in which the restart operation is “x”. Therefore, the control unit 53 determines the restart operation as the carry-out operation.

Step S5
After determining the restart operation as the carry-out operation, the control unit 53 waits until the system restart 79 is operated by the operator while the display in FIG. 5 or 6 is displayed on the display unit 59.

Step S6
When the system restart 79 is operated by the operator, the control unit 53 causes the carry-out operation that is the restart operation determined based on the restart operation table. Specifically, the spin base 3 is raised from the processing position to the standby position, and the substrate W placed on the spin chuck 11 is unloaded by the transfer arm 51.

  If an alarm indicating a spin base speed abnormality occurs between steps 1 to 25 of the recipe, since this recipe is a process that involves a rotation operation, all the restart operations are carried out as “x” carry-out operations. ing. Therefore, when the system restart 79 is operated in this case, the control unit 53 causes the substrate W to be carried out.

  Further, if the alarm is an abnormality in HF temperature rise during steps 1 to 7 of the recipe, the restart operation is “x” because it is a step until hydrofluoric acid is supplied or a step during the supply. It is said that it is an unloading operation. Therefore, the control unit 53 unloads the substrate W being processed. On the other hand, if the alarm is that the HF temperature has risen abnormally during steps 8 to 25 of the recipe, since the supply of hydrofluoric acid has already been completed, the restart operation is Has been. Therefore, the control unit 53 starts processing from the interrupted step or the next step.

  If the alarm is an IPA thermometer abnormality between steps 1 to 20 of the recipe, the restart operation is “x” unloading operation because it is a step until supplying IPA or a step during supply. It is said that. Therefore, the control unit 53 unloads the substrate W being processed. On the other hand, if the alarm is an IPA thermometer abnormality during steps 21 to 25 of the recipe, since the IPA has already been supplied, the restart operation is a continuous operation of “◯”. Therefore, the control unit 53 starts processing from the interrupted step or the next step.

  If an alarm indicating that SC1 cannot be supplied occurs between steps 1 to 25 of the recipe, the SC1 solution is not used in the chamber 1, so that the restart operation is a continuous operation of “◯”. Therefore, when the system restart 79 is operated in this case, the control unit 53 starts processing from the interrupted step or the next step.

  According to the above-described embodiment, when an alarm is generated when the substrate W is processed by the chamber 1 based on the recipe, the control unit 53 generates an alarm, a step when the alarm is generated, and a restart operation table. Then, the processing of the substrate W is resumed. Since the restart operation is predetermined for each alarm and step, it is possible to reduce the burden on the operator during the restart operation after the process is stopped.

  In the restart operation table, the substrate processing can be appropriately restarted by defining the continuous operation and the carry-out operation as the restart operation at least for each alarm.

  Furthermore, since the control unit 53 interrupts the processing after the occurrence of the alarm, the restart can be instructed by the system restart 79 after the operator confirms the situation. Therefore, it is possible to cope with the situation of interruption.

  Further, since the progress of the process is displayed on the display unit 59, the operator can check the situation when the alarm is generated. Further, since the alarm content, the progress of the process, and the restart operation corresponding to the alarm are displayed on the display unit 59 when the alarm is generated, the operator can determine the treatment by looking at them.

  The present invention is not limited to the above embodiment, and can be modified as follows.

  (1) In the above-described embodiment, the chambers 1 and 2 serving as the processing units have been described as performing single-wafer processing, but the processing units in the present invention are not limited to single-wafer processing. For example, the present invention can be applied to a batch type processing unit that collectively processes a plurality of substrates W.

  (2) In the above-described embodiment, the restart operation table shown in FIG. 2 is taken as an example, but the present invention is not limited to such a restart operation table.

  (3) In the above-described embodiment, when the processing is interrupted due to the occurrence of an alarm, the resuming operation is executed after waiting for an instruction from the instruction unit 61 that is an instruction means. However, after notifying an alarm for a predetermined time (for example, 30 seconds) after the occurrence of the alarm, the corresponding resuming operation may be automatically performed.

  (4) In the above-described embodiment, the display unit 59 as the display unit and the instruction unit 61 are integrated. However, the present invention is not limited to such a configuration. That is, the display unit 59 and the instruction unit 61 may be configured separately.

W ... Substrate 1, 2 ... Chamber 3 ... Spin base 9 ... Supply section 19 ... Gas supply pipe 25, 31, 37, 43 ... Supply nozzle 29 ... Carbonated water supply pipe 35 ... Hydrofluoric acid supply pipe 51 ... Transfer arm 53 ... Control part 55 ... Storage part 57 ... Alarm detection part 59 ... Display part 61 ... Instruction part

Claims (6)

In a substrate processing apparatus that performs predetermined processing on a substrate,
A processing unit for processing the substrate;
Storage means for storing in advance a recipe including a plurality of steps that are processing procedures for processing a substrate, and a restart operation table that defines a restart operation for each step according to various alarms,
If an alarm is generated while processing the substrate by the processing unit based on the recipe, the processing of the substrate is restarted based on the alarm, the step when the alarm is generated, and the restart operation table. Control means for causing
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 1,
The substrate processing apparatus characterized in that the resumption operation table defines at least a resumption operation as a continuation operation to continue the processing on the substrate as it is and a carry-out operation to suspend and carry out the substrate processing. The substrate processing apparatus according to claim 1 or 2,
Further comprising an instruction means for an operator to instruct resumption of operation after the occurrence of an alarm;
The substrate processing apparatus, wherein when an alarm is generated, the control unit interrupts the processing by the processing unit, and determines a restart operation after the instruction unit is operated. In the substrate processing apparatus according to claim 1,
A substrate processing apparatus, further comprising display means for displaying a progress status of processing by a recipe in the processing section. The substrate processing apparatus according to claim 4,
The substrate processing apparatus, wherein the display means displays the contents of the alarm when an alarm is generated, displays the progress of the process, and the restart operation corresponding to the alarm. In a substrate processing method for performing predetermined processing on a substrate,
Based on a recipe including a plurality of steps that are processing procedures for processing a substrate, a process of processing a substrate in a processing unit;
A process of interrupting the processing by the processing unit due to the occurrence of an alarm;
When the restart is instructed, the restart operation of the board is determined based on the alarm, the step when the alarm occurred, and the restart operation table that defines the restart operation for each step according to various alarms. The process of
Performing the determined resuming operation;
A substrate processing method characterized by comprising:

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