JP2014120604A5

JP2014120604A5 -

Info

Publication number: JP2014120604A5
Application number: JP2012274580A
Authority: JP
Filing date: 2012-12-17
Publication date: 2016-02-12

Description

本発明のインプリント装置は、基板上のインプリント材に型を用いてパターンを形成するインプリント装置であって、前記型と接触した状態の前記インプリント材に該インプリント材を硬化させるエネルギーを供給する供給部と、前記型と前記インプリント材とが最初に離型する領域に供給するエネルギーよりも、前記型と前記インプリント材とが最後に離型する領域に供給するエネルギーが多くなるように、前記供給部から前記インプリント材に供給されるエネルギーを調整する調整部と、を備えることを特徴とする。 Imprint apparatus of the present invention is a imprint apparatus for forming a pattern using a mold imprint material on a substrate, energy curing the imprint material to the imprint material contact with the mold More energy is supplied to the area where the mold and the imprint material are finally released than the energy supplied to the area where the mold and the imprint material are released first. The adjustment part which adjusts the energy supplied to the said imprint material from the said supply part is provided.

モールドＭには、ウエハＷに対向する表面に凹凸形状のパターンＰが形成されている。ウエハステージ４は、ウエハチャック３に保持されたウエハＷをＸＹ平面で移動させることができる。ウエハステージ４は、ウエハＷをＺ方向に移動させることができるようにしても良い。ディスペンサ５（塗布機構）はウエハＷ上に樹脂６（インプリント材）を供給する。ウエハＷはウエハステージ４によってモールドＭに形成されたパターンＰの下方の所定の位置に移動したり、ディスペンサ５の下方に移動したりする。 In the mold M, an uneven pattern P is formed on the surface facing the wafer W. The wafer stage 4 can move the wafer W held by the wafer chuck 3 on the XY plane. The wafer stage 4 may be configured to move the wafer W in the Z direction. The dispenser 5 (application mechanism) supplies the resin 6 (imprint material) onto the wafer W. The wafer W moves to a predetermined position below the pattern P formed on the mold M by the wafer stage 4 or moves below the dispenser 5.

上述したいずれの実施形態のインプリント装置も、エネルギーを供給する供給部として紫外線を照射する光源を用い、樹脂（インプリント材）には光硬化樹脂を用いたインプリント装置について説明をした。しかし本発明は、熱を用いてインプリントを行うインプリント装置であっても良い。 The imprint apparatus according to any of the embodiments described above has described the imprint apparatus that uses a light source that emits ultraviolet rays as a supply unit that supplies energy, and uses a photo-curing resin as a resin (imprint material) . However, the present invention may be an imprint apparatus that performs imprint using heat.

樹脂（インプリント材）には熱硬化性樹脂を用いても良いし、熱可塑性樹脂を用いても良い。使用する樹脂に応じて最後に離型する領域３１で発生する内部応力の大きさが、最初に離型する領域３２の内部応力よりも大きくなるように熱エネルギーを供給する。 As the resin (imprint material) , a thermosetting resin may be used, or a thermoplastic resin may be used. Thermal energy is supplied so that the internal stress generated in the region 31 to be released last according to the resin to be used is larger than the internal stress in the region 32 to be released first.

Claims

An imprint apparatus for forming a pattern using a mold on an imprint material on a substrate,
A supply unit for supplying energy for curing the imprint material to the imprint material in contact with the mold;
From the supply unit, the energy supplied to the area where the mold and the imprint material are finally released is larger than the energy supplied to the area where the mold and the imprint material are released first. An adjustment unit for adjusting energy supplied to the imprint material ;
An imprint apparatus comprising:

The supply unit has a light source that emits exposure light that cures the imprint material ,
The imprint apparatus according to claim 1, wherein the adjustment unit adjusts an exposure amount by the exposure light.

The adjustment unit adjusts the exposure light so that the light intensity in the last releasing region is higher than the light intensity in the first releasing region. The imprint apparatus described.

The adjustment unit is a filter having a higher transmittance for the exposure light in a portion corresponding to the region to be released last than in a portion corresponding to the region to be released first. The imprint apparatus according to 2 or 3.

The adjusting unit adjusts the supply unit so that the time for supplying energy in the last releasing region is longer than the time for supplying energy in the first releasing region. The imprint apparatus according to claim 1.

The supply unit has a light source that emits exposure light that cures the imprint material ,
A light shielding plate for shielding the exposure light;
The adjustment unit drives the light shielding plate so as to shield the exposure light that irradiates the first release region in a state where the exposure light is irradiated to the last release region. The infeed according to claim 5, wherein the supply unit is adjusted so that a time for supplying energy to the last region to be released becomes longer than a time for supplying energy to the region to be released. Printing device.

The exposure amount of the region to be released last is 1.2 times or more and 3 times or less than the region to be released first. Printing device.

The adjustment unit, after the mold and said imprint material is curing the imprint material is irradiated with the exposure light in a state of contact, the exposure light when separating the said imprint material and the type The imprint apparatus according to claim 2, wherein the imprint apparatus is a control unit that controls the light source so as to be irradiated.

An imprint apparatus for forming a pattern using a mold on an imprint material on a substrate,
A supply unit for supplying energy to cure the imprint material to the imprint material,
When the mold and the imprint material are in contact with each other, the mold and the resin are supplied to the region where the mold and the resin are finally released rather than the energy supplied to the region where the mold and the imprint material are released first. A control unit that controls to supply energy from the supply unit to the imprint material so that more energy is generated;
An imprint apparatus comprising:

An imprint apparatus for forming a pattern using a mold on an imprint material on a substrate,
A supply unit for supplying energy for curing the imprint material to the imprint material in contact with the mold;
The imprint material is supplied from the supply unit so that more energy is supplied to a region where the density of the pattern formed on the substrate is higher than a region where the density of the pattern formed on the substrate is low. An adjustment unit for adjusting the supplied energy;
An imprint apparatus comprising:

The imprint apparatus according to any one of claims 1 to 10, wherein the imprint material is a photo-curing resin that is cured by exposure light supplied from the supply unit.

The supply unit has a heat source for supplying heat for curing the imprint material ,
The imprint material is a thermosetting resin or a thermoplastic resin that is cured by heat supplied from the heat source,
The imprint apparatus according to claim 1, wherein the adjustment unit adjusts an amount of heat supplied from the heat source.

Forming the pattern on the substrate using the imprint apparatus according to any one of claims 1 to 12 ,
Processing the substrate on which the pattern is formed in the step;
A device manufacturing method comprising:

A mold for use in imprint apparatus according to any one of claims 1 to 12, wherein said different depending on the amount of the energy supplied to the imprint material imprint material from the supply unit by the adjustment unit A mold used for an imprint apparatus, wherein the uneven shape of the pattern portion formed on the mold differs based on the shrinkage amount of the mold.