JP6660452B2 - Forming apparatus, forming method and article manufacturing method - Google Patents

Description

The present invention relates to a forming apparatus , a forming method, and an article manufacturing method.

  The imprint material is placed on the substrate, and the pattern of the mold is transferred to the imprint material by curing the imprint material by irradiating the imprint material with light while the mold is in contact with the imprint material. Imprint technology has attracted attention. The degree of curing of the imprint material depends on the amount of light irradiation on the imprint material. Patent Document 1 describes that in a double-sided imprint apparatus, the irradiation time of a UV light source provided on a lower stamper device is shorter than the irradiation time of a UV light source provided on an upper stamper device. I have. According to this double-sided imprint apparatus, since the force required for peeling depends on the irradiation time, the transfer body can be peeled from the upper stamper apparatus after the transfer body has been peeled from the lower stamper apparatus. Non-Patent Document 2 describes that the reaction rate of a radical polymerization type resist is proportional to the square root of illuminance.

JP 2012-099197 A

"UV / EB technology", Japan, General Technology Center, October 1982, p.160

  In a conventional imprint apparatus, the time of light irradiation on the imprint material is optimized in advance, and the light irradiation on the imprint material is controlled according to the irradiation time to cure the imprint material. Therefore, for example, when the illuminance is reduced due to, for example, deterioration of the light source, the imprint material may be insufficiently cured. In a conventional imprint apparatus, it has been customary to automatically adjust the photopolymerization degree (degree of curing) of the imprint material to a target value such that the photochemical reaction rate is proportional to the square root of the illuminance of the irradiated light. Did not.

The present invention provides an advantageous technique for favorably controlling the degree of photopolymerization of a composition in a forming apparatus using a composition in which the photochemical reaction rate is proportional to the square root of the illuminance of the irradiated light.

One aspect of the present invention is to form a film by curing a composition by irradiating the composition with a composition in which the rate of photochemical reaction is proportional to the square root of the illuminance of the illuminated light. According to the forming apparatus, the forming apparatus includes an irradiation unit that irradiates the composition with light for curing the composition, and a control unit that controls the irradiation unit, and the control unit includes the irradiation unit After irradiating the composition with light, the composition obtains information regarding that the composition has not been cured so as to fall within a predetermined range of the target degree of polymerization, and the composition by the irradiation unit after acquiring the information. When irradiating light to the composition, the irradiation time of light to the composition by the irradiation unit is determined based on the square root of the illuminance of light applied to the composition, and the composition is irradiated with light at the determined irradiation time. The irradiation unit is controlled so as to irradiate.

According to the present invention, an advantageous technique is provided for favorably controlling the degree of photopolymerization of a composition in a forming apparatus using a composition in which the photochemical reaction rate is proportional to the square root of the illuminance of the irradiated light.

FIG. 1 is a diagram illustrating a configuration of an imprint apparatus according to an embodiment of the present invention. FIG. 1 is a diagram illustrating a configuration of an imprint apparatus according to an embodiment of the present invention. FIG. 4 is a diagram illustrating an operation of the imprint apparatus according to the first embodiment of the present invention. FIG. 9 is a diagram illustrating an operation of the imprint apparatus according to the second embodiment of the present invention. The figure which shows the correlation (a) of a mold release force and a polymerization degree, the correlation (b) of a mold release impulse and a polymerization degree, and the correlation (c) of a defect density and a polymerization degree. The figure which shows the principle which judges the success or failure of imprint based on the correlation (a) of a mold release force and a polymerization degree, and the correlation (c) of a defect density and a polymerization degree.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  FIGS. 1 and 2 are views showing a configuration of an imprint apparatus 100 according to one embodiment of the present invention. 1 and 2 show the configuration of the same imprint apparatus 100, but show different states from each other. The imprint apparatus 100 cures the imprint material IM by irradiating the imprint material IM with light while the mold M is in contact with the imprint material IM arranged on the substrate S, thereby imprinting the imprint material IM. A pattern made of the material IM is formed. The imprint material IM can be a photoradical polymerizable composition containing a photopolymerization initiator (photoradical generator) and a radical polymerizable compound. The photo-radical polymerizable compound is a compound that reacts with a polymerization factor (radical or the like) generated by irradiating a photo-polymerization initiator with light to form a film made of a polymer compound by a chain reaction (polymerization reaction). The photochemical reaction rate of the imprint material IM is proportional to the square root of the illuminance of light applied to the imprint material IM.

  In the accompanying drawings and the specification, directions are shown in an XYZ coordinate system in which the surface on which the substrate S is arranged is an XY plane. The imprint apparatus 100 includes an irradiation unit 110 that irradiates the imprint material IM on the substrate S with light, and a control unit 200. The irradiating section 110 causes a photochemical reaction (photopolymerization) on the imprint material IM by irradiating the imprint material IM with light, thereby curing the imprint material IM. The irradiating unit 110 includes a light source 112, a shutter 114 that passes or blocks light from the light source 112 in order to control the irradiation time of the light on the imprint material IM, and a illuminance of the light that is irradiated on the imprint material IM. And an adjusting unit 116 for adjusting. The shutter 114 controls the irradiation time of light from the irradiation unit 110 to the imprint material IM according to the irradiation time instructed by the control unit 200. The adjustment unit 116 may include, for example, a plurality of ND filters. The adjustment unit 116 controls the illuminance of light emitted to the imprint material IM according to the illuminance instructed from the control unit 200. The illuminance can be adjusted by adjusting the number of ND filters arranged between the light source 112 and the substrate S, or by changing the combination of a plurality of ND filters having different dimming effects.

  The imprint apparatus 100 may further include a supply unit 141 that arranges or supplies the imprint material IM on the substrate S. The supply unit 141 may include, for example, a tank that stores the imprint material IM, and a discharge head that discharges the imprint material supplied from the tank from a discharge port.

  The imprint apparatus 100 further includes a substrate holding unit 130 that holds the substrate S, a substrate driving mechanism 131 that drives the substrate S by driving the substrate holding unit 130, and a mold driving mechanism 140 that holds and drives the mold M. Can be provided. The substrate driving mechanism 131 is configured to drive the substrate S about the X, Y, and θZ axes by driving the substrate holding unit 130 about the X, Y, and θZ axes (rotation about the Z axis), for example. Can be done. The mold driving mechanism 140 holds the mold M and drives about six axes, for example, X axis, Y axis, Z axis, θX axis (rotation around X axis), θY axis (rotation around Y axis), and θZ axis. It can be configured to Driving of the mold M about the Z axis by the mold driving mechanism 140 includes an operation of contacting and separating the imprint material IM on the substrate S from the mold M. The operation of contacting and separating the imprint material IM and the mold M on the substrate S may be performed by the substrate driving mechanism 131. The substrate driving mechanism 131 and the mold driving mechanism 140 constitute a driving mechanism DRV that controls the relative distance between the imprint material IM (or the substrate S) and the mold M. The irradiation unit 110 cures the imprint material IM such that the imprint material IM is hardened while the relative distance is controlled by the drive mechanism DRV so that the mold M comes into contact with the imprint material IM supplied on the substrate S. Is irradiated with light to cure the imprint material IM. Then, the relative distance is controlled by the drive mechanism DRV so that the cured imprint material IM and the mold M are separated from each other.

  The mold driving mechanism 140 may include a mold release force detection unit 142 that detects a mold release force required to separate the cured imprint material IM on the substrate S from the mold M. The release force detected by the release force detection unit 142 may be provided to the control unit 200. The control unit 200 acquires the product (impulse) of the time during which the release force is applied to the mold M and the release force based on the time-series data of the release force detected by the release force detection unit 142. be able to. The time or impulse during which the release force is applied to the mold M may be acquired by the release force detection unit 142 and provided to the control unit 200.

  The imprint apparatus 100 can further include an illuminance detection unit 132 that detects the illuminance of light emitted from the irradiation unit 110 to the imprint material IM. The illuminance detection unit 132 can be mounted on, for example, the substrate holding unit 130 or the substrate driving mechanism 131. As illustrated in FIG. 2, by arranging the illuminance detection unit 132 in the irradiation area of the light by the irradiation unit 110, it is possible to detect the illuminance of the light irradiated on the imprint material IM by the irradiation unit 110. . The illuminance detection unit 132 may be incorporated in, for example, the irradiation unit 110, may be incorporated in the mold driving mechanism 140, or may be arranged at another position. Illuminance detection section 132 includes, for example, a light receiving sensor, and can obtain illuminance based on information output from the light receiving sensor. The illuminance may be calculated in the control unit 200 based on information provided from the illuminance detection unit 132.

  The imprint apparatus 100 may further include an alignment scope (measurement instrument) 150. The alignment scope 150 detects a mark formed on the substrate S and a mark formed on the mold M. The alignment between the mold M and the substrate W can be performed based on the detection result by the alignment scope 150. The alignment scope 150 may be, for example, an automatic adjustment scope (AAS). The imprint apparatus 100 may further include, as another alignment mechanism, an off-axis scope 152 (OAS) that detects a mark formed on the substrate S without using the mold M. The off-axis scope 152 may be configured to detect a reference mark provided on a predetermined portion of the substrate holding unit 130 or the substrate driving mechanism 131 (a part whose positional relationship with the substrate holding unit 130 is unchanged). The alignment scope 150 and the off-axis scope 152 can be supported by the frame 151.

  The control unit 200 may include, for example, a processing unit 210, a user interface 220, an external device interface 230, and a memory 240. The processing unit 210 can be configured by a computer in which a program is embedded. The user interface 220 is an interface between the processing unit 210 and the user, and may include, for example, an input device (for example, a keyboard, a touch panel, a pointing device, and the like) and an output device (for example, a display). The external device interface 230 is an interface for connecting to another device (for example, a defect inspection device) via a communication medium such as a network. The memory 240 stores data provided to the control unit 200 through the user interface 220 or the external device interface 230.

FIG. 3 shows an operation of the imprint apparatus 100 according to the first embodiment. This operation is controlled by the control unit 200, more specifically, by the processing unit 210. In step S301, the processing unit 210 converts the illuminance I _c (W / m ² ) and the target degree of polymerization PD ((√ (W / m ² )) · sec) via the user interface 220 or the external device interface 230, for example. get. Here, the user can also input the target degree of polymerization PD ((√ (W / m ² )) · sec) via the user interface 220 or the external device interface 230. Here, the illuminance I _c, rather than as information indicating the illuminance I _c directly, for example, is provided as information necessary to determine the illuminance I _c by calculation or the like, is acquired based on the provided information Is also good. Similarly, the target degree of polymerization PD is not provided as information directly indicating the target degree of polymerization PD, but is provided, for example, as information necessary for calculating the target degree of polymerization PD by calculation or the like, and based on the provided information. May be obtained. Illuminance I _c and the target polymerization degree of PD it is, for example, be provided by the recipe file for controlling the imprint process (control information group). In step S302, the processing unit 210 sets the illuminance _{I c} to the adjustment unit 116 of the illumination unit 110. Adjustment unit 116, in accordance with this setting, the light irradiating the imprint material IM for adjusting the illumination intensity such that the intensity I _c. Here, the processing unit 210, by detecting the illuminance by the illuminance detection unit 132 may verify that the detected illuminance is coincident with the illumination I _c. Alternatively, the illuminance detected by the illuminance detection unit 132 may be an illuminance I _c to be considered in the determination of the irradiation time t _c to be described later.

In step S303, the processing unit 210, based on the illuminance _{I c} and the target polymerization degree of PD, according to equation (1), determines a light exposure time of _t c (sec) for the imprint material IM. Here, the target polymerization degree PD is an index indicating the target degree of curing of the imprint material IM. k is a coefficient, which is determined in advance through experiments and the like. Also, _{t c} is the light irradiation time for the imprint material IM (sec).

PD = k × (√I _c ) × t _c Equation (1)
More specifically, in step S303, processing unit 201 determines the irradiation time _{t c} according to equation (2).

t _c = PD / (k × (√I _c )) Equation (2)
Here, equation (1) will be described. Equation (1) is an equation obtained as follows from equation (3) indicating the degree of polymerization PF as the photochemical reaction rate.

PF = (√I) × t Expression (3)
Here, PF is the degree of polymerization ((√ (W / m ² )) · sec), I is the illuminance (W / m ² ) of light to the imprint material IM, and t is the irradiation time of light to the imprint material IM ( sec). Equation (3) shows that the degree of polymerization PF as the photochemical reaction rate is proportional to the square root of the illuminance I of light and is proportional to the irradiation time t. Target degree of polymerization PD may be defined by the irradiation time _{t p} at a certain illuminance _{I p.} Target polymerization degree of PD, illuminance _{I p,} the irradiation time _{t p,} illuminance _{I c,} during the time of illumination _{t c,} the relationship of Equation (4) holds.

PD = (√I _p ) × t _p = k × (√I _c ) × t _c Equation (4)
Illuminance _{I p} is the intensity of a condition when a targeted degree of polymerization PD (W / ^{m 2),} the irradiation time _{t p,} the irradiation time as a condition when a targeted degree of polymerization PD (sec) It is. The coefficient k is a coefficient determined by the type, the type M, the process, and the like of the imprint material IM. The coefficient k may be 1 or may not be 1. Further, illuminance _{I c} is the illuminance of the light irradiated to the imprint material IM during imprinting (W / ^{m 2).} Further, t _c is an irradiation time (sec) required to satisfy the target degree of polymerization PD under the illuminance I _c during imprint. Equation (1) is a simplified version of equation (4).

In step S304, the processing unit 210 controls the supply unit 141 and the substrate driving mechanism 131 such that the supply unit 141 supplies the imprint material IM to the shot area of the substrate S to be imprinted. In step S305, the processing unit 210 controls the substrate driving mechanism 131 so that the imprint target shot area of the substrate S is positioned below the mold M. In step S306, the processing unit 210 controls the mold driving mechanism 140 such that the mold M comes into contact with the imprint material IM on the shot area to be imprinted. In step S307, the processing section 210 waits until the imprint material IM is sufficiently filled in the concave portion of the pattern region of the mold M, and then irradiates the imprint material M through the mold M so that light is emitted. The unit 110 is controlled to start irradiating the imprint material IM with light. Specifically, the processing unit 210 controls the shutter 114 so that light passes therethrough, thereby starting irradiation of light to the imprint material IM. In step S308, the processing unit 210 controls the irradiation unit 110 so that the irradiation light is completed for imprint material IM by irradiation time _{t c} determined in step S303. Specifically, the processing unit 210 controls the shutter 114 so as to block the light, thereby terminating the irradiation of the imprint material IM with the light. Thereby, the imprint material IM is cured so as to reach the target degree of polymerization PD. In step S309, the processing unit 210 controls the mold driving mechanism 140 so as to separate the cured imprint material IM from the mold M. Separating the cured imprint material IM from the mold M is referred to as mold release.

Steps S310 and S311 can be optionally performed. The release force F (N) required to separate the cured imprint material IM from the mold M has a correlation with the degree of polymerization PF. Further, the product of the release force F (N) and the time t _dm (sec) during which the release force F is applied to the mold M, that is, the impulse (hereinafter, release impulse) is also a function of the polymerization degree PF. Have correlation. Further, the defect density DD in the pattern of the imprint material IM remaining after the mold release also has a correlation with the degree of polymerization PF. Thus, by utilizing such a correlation, it can be determined whether or not the imprint material IM has been cured to reach the target degree of polymerization PD (that is, whether or not the curing has been successful). FIG. 5A shows the correlation between the release force F and the degree of polymerization PF, and FIG. 5B shows the correlation between the release force F × t and the degree of polymerization PF. 5 (c) shows a correlation between the defect density DD and the degree of polymerization PF. Each of these correlations shows a linear relationship (proportional relationship), but this is merely an example, and the correlation is not necessarily linear.

  Assuming that the target degree of polymerization PD = PF11, if the release force detected by the release force detecting unit 142 at the time of release falls within an allowable range including F11, the imprint material IM is adjusted to the target degree of polymerization PD. It can be determined that it has been cured to be within the range. Assuming that the target degree of polymerization PD = PF21, if the release impulse obtained at the time of release using the release force detection unit 142 falls within an allowable range including FT21, the imprint material IM will have the target degree of polymerization. It can be determined that the resin has been cured so as to be within the appropriate range of the PD. Assuming that the target degree of polymerization PD = PF31, if the defect density DD measured using an inspection device (not shown) falls within the allowable range including DD31, the imprint material IM falls within the appropriate range of the target degree of polymerization PD. It can be determined that it has been cured to fit.

In step S311, the processing unit 210 verifies the imprint material IM within an appropriate range of the target degree of polymerization PD in the verification of the items represented by the release force F, the release impulse F × t, and the defect density DD. To determine if it has been cured. When it is determined that the imprint material IM has been cured so as to be within the appropriate range of the target polymerization degree PD, the process proceeds to step S312, and otherwise returns to step S302. When returning to step S302, that is, when the imprint material IM has not been cured so as to be within the appropriate range of the target degree of polymerization PD, the cause may be that the illuminance is not set or adjusted correctly. In step S302, the illuminance is reset or readjusted. In step S303, the irradiation time is re-determined according to the reset or readjusted illuminance. The processing in step S302 is included illuminance detection by the illuminance detection unit 132, in step S303, the irradiation time _{t c} in accordance with the _{I c} the detected illuminance as _{I c} is re-determined.

  In step S312, the processing unit 210 determines whether imprint has been completed for all shot areas of the substrate S to be imprinted. If there is a shot area to be imprinted, the process returns to step S304, and imprint is performed on the remaining shot area. Here, the target polymerization degree PD can be set for each shot area. In this case, the process returns from step S312 to step S301.

  In step S310, when it takes an unacceptably long time for the inspection of the defect density, for example, when the processing of one substrate S is completed, when the processing of the first substrate of the lot is completed, or the last substrate of the lot is performed. The step S310 may be performed at the time when the processing of the above is completed or the like.

FIG. 4 illustrates an operation of the imprint apparatus 100 according to the second embodiment. This operation is controlled by the control unit 200, more specifically, by the processing unit 210. In step S401, the processing unit 210 acquires the irradiation time t _c (sec) and the target degree of polymerization PD via the user interface 220 or the external device interface 230. Here, the user can also input the target degree of polymerization PD ((√ (W / m ² )) · sec) via the user interface 220 or the external device interface 230. Here, the irradiation time t _c, not as information indicating the irradiation time t _c directly, for example, is provided as information required to determine by calculation or the like irradiation time t _c, based on the provided information May be obtained. Similarly, the target degree of polymerization PD is not provided as information directly indicating the target degree of polymerization PD, but is provided, for example, as information necessary for calculating the target degree of polymerization PD by calculation or the like, and based on the provided information. May be obtained. Irradiation time t _c and the target polymerization degree of PD is, for example, be provided by the recipe file for controlling the imprint process (control information group). In step S402, the processing unit 210, based on the irradiation time acquired _{t c} and the target polymerization degree of PD in step S401, in accordance with equation (1), more specifically according to Formula (5), adjustment of the irradiation unit 110 116 to determine the illuminance _{I c.}

I _c = (PD / t _c ) ² ... Equation (5)
In step S403, the processing unit 210, the irradiation unit 110 so as illuminance _{I c} determined in step S402 is obtained for adjusting the illumination intensity of light irradiated on the imprint material IM. This adjustment can be performed, for example, by the processing unit 210 controlling the adjustment unit 116 of the irradiation unit 110. For example, when the adjusting unit 116 includes a plurality of ND filters, the number of ND filters arranged between the light source 112 and the substrate S is adjusted, or a combination of a plurality of ND filters having different light-hardening from each other. The illuminance can be adjusted by changing. Here, the processing unit 210, by detecting the illuminance by the illuminance detection unit 132 may verify that the detected illuminance is coincident with the illumination I _c.

In step S404, the processing unit 210 controls the supply unit 141 and the substrate driving mechanism 131 so that the supply unit 141 supplies the imprint material IM to the shot area of the substrate S to be imprinted. In step S405, the processing unit 210 controls the substrate driving mechanism 131 so that the imprint target shot area of the substrate S is positioned below the mold M. In step S406, the processing unit 210 controls the mold driving mechanism 140 such that the mold M comes into contact with the imprint material IM on the shot area to be imprinted. In step S407, the processing unit 210 waits until the imprint material IM is sufficiently filled in the concave portions of the pattern area of the mold M, and then irradiates the imprint material M via the mold M so that light is emitted. The unit 110 is controlled to start irradiating the imprint material IM with light. Specifically, the processing unit 210 controls the shutter 114 so that light passes therethrough, thereby starting irradiation of light to the imprint material IM. In step S408, the processing unit 210 controls the irradiation unit 110 so that the irradiation light is completed for imprint material IM by irradiation time _{t c} obtained in step S401. Specifically, the processing unit 210 controls the shutter 114 so as to block the light, thereby terminating the irradiation of the imprint material IM with the light. Thereby, the imprint material IM is cured so as to reach the target degree of polymerization PD. In step S409, the processing unit 210 controls the mold driving mechanism 140 so as to separate the cured imprint material IM from the mold M.

Steps S410 and S411 can be optionally performed. In step S410, the same verification as in step S310 in FIG. 3 can be performed. In step S411, the processing unit 210 determines that the imprint material IM falls within an appropriate range of the target degree of polymerization PD in verification of items represented by the release force F, the release impulse F × t, and the defect density DD. Determine if it has been cured. When it is determined that the imprint material IM has been cured so as to be within the appropriate range of the target polymerization degree PD, the process proceeds to step S412, and otherwise returns to step S403. When returning to step S403, if the imprint material IM has not been cured so as to be within the appropriate range of the target polymerization degree PD, the cause may be that the illuminance is not properly adjusted. In step S4 0 3, illumination is readjusted to match the illuminance IC.

  In step S412, the processing unit 210 determines whether imprint has been completed for all shot areas of the substrate S to be imprinted. If there is a shot area to be imprinted, the process returns to step S404, and imprint is performed on the remaining shot area. Here, the target degree of polymerization PD can be set for each of one or a plurality of shot areas. In this case, the process returns from step S412 to step S401. In step S410, when it takes an unacceptably long time for the inspection of the defect density, for example, when the processing of one substrate S is completed, when the processing of the first substrate of the lot is completed, or at the end of the lot Step S410 may be performed at the time when the processing of the substrate is completed or the like.

  As described above, according to the first and second embodiments, in an imprint apparatus using an imprint material whose photochemical reaction speed is proportional to the square root of the illuminance of the irradiated light, the degree of photopolymerization of the imprint material is It can be controlled so that it falls within the allowable range of the target photopolymerization degree PD.

  Hereinafter, a method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) using the above-described imprint apparatus. Further, the manufacturing method may include a step of processing (eg, etching) the substrate on which the pattern is formed. In the case of manufacturing another article such as a patterned medium (recording medium) or an optical element, the manufacturing method may include another process of processing a substrate on which a pattern is formed, instead of etching. The article manufacturing method of this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article, as compared with the conventional method.

(Example 1)
In Example 1, the condition illuminance I _c and the target polymerization degree of PD, determine the irradiation time t _c corresponding thereto, illuminance I _c, to cure the imprint material irradiation time t _c, good imprint results It was confirmed that it could be obtained. Specifically, an imprint material having a coefficient k of 1 is used, and the illuminance I _c = 5000 (W / m ² ) and the target degree of polymerization PD = 7.07 ((√ (W / m ² )) · sec) Was input from the user interface 220 as a condition. Then, according to the equation (1), the irradiation time t _c was determined to be 0.1 (sec). Based on this, when the imprint material was irradiated with light at an illuminance I _c = 5000 (W / m ² ) and an irradiation time t _c = 0.1 (sec), a good imprint result (that is, a cured imprint) was obtained. A good pattern made of a printing material) was obtained.

(Example 2)
In Example 2, an imprint material of k = 1 was used, and as a condition for obtaining the target degree of polymerization PD, the illuminance I _p (W / m ² ) and the recommended illuminance I _p (W / m ² ) were used. It acquires the exposure amount ^{_{E p (J / m 2)}} , was determined irradiation time _t p (sec) according to equation (6).

_{t p = E p / I p} ··· formula (6)
The illuminance during imprint was I _c (W / m ² ). Based on I _p , tp _and I _c , the irradiation time t _c was determined according to equation (4). Then, when the imprint material was irradiated with light at I _c and t _c , a good imprint result (that is, a good pattern made of the cured imprint material) was obtained.

(Example 3)
In Example 3, an imprint material of k = 1 was used, and as a condition for obtaining the target degree of polymerization PD, the illuminance I _p (W / m ² ) and the recommended illuminance I _p (W / m ² ) were used. It acquires the exposure amount ^{_{E p (J / m 2)}} , was determined irradiation time _t p (sec) according to equation (6).

_{t p = E p / I p} ··· formula (6)
The irradiation time at the time of imprint was set to t _c (sec). Based on I _p , tp _and t _c , the illuminance I _c was determined according to the equation (4), and the adjustment unit 116 of the irradiation unit 110 was adjusted so that the illuminance I _c was obtained. Then, when the imprint material was irradiated with light at I _c and t _c , a good imprint result (that is, a good pattern made of the cured imprint material) was obtained.

(Example 4)
In Example 4, the validity of steps S310 and S410 (verification) was confirmed. Data showing a correlation between the releasing force F and the degree of polymerization PF as shown in FIG. 6A was prepared. Light is irradiated to the imprint material at the target degree of polymerization PD = PF42 has changed intentionally illuminance I _c from the illuminance I _c and the irradiation time t _p, which is determined so as to obtain conditions to cure the imprint material . When the release force detection unit 142 detected the release force F when the mold M was released from the imprint material, F = F41. The allowable range of the releasing force F at PD = PF42 is AR1 including F = F42. Since F = F41 is out of the allowable range AR1, it is determined that the curing of the imprint material is not appropriate. Was carried out by imprinting again adjusting the illumination intensity I _c to the correct value, the releasing force F is within the allowable range AR1 comprising F = F 42.

(Example 5)
In Example 5, the validity of steps S310 and S410 (verification) was confirmed. Data showing a correlation between the defect density DD and the degree of polymerization PF as shown in FIG. 6B was prepared. Light is irradiated to the imprint material at the target degree of polymerization PD = PF51 has changed intentionally illuminance I _c from the illuminance I _c and the irradiation time t _p, which is determined so as to obtain conditions, to cure the imprint material Got the pattern. When the defect density DD of this pattern was inspected by an inspection device, DD = DD52. The allowable range of the defect density DD at PD = PF51 is AR2 including DD = DD51. Since DD = DD52 is out of the allowable range AR2, it is determined that the curing of the imprint material is not appropriate. Was subjected to imprinting and re-adjusting the illumination intensity I _c to the correct value, the defect density DD is within the allowable range AR2 containing DD = D51.

100: imprint apparatus, S: substrate, M: mold, 110: irradiation unit, 112: light source, 114: shutter, 116: adjustment unit, 132: illuminance detection unit, 142: release force detection unit

Claims (17)

A forming apparatus for forming a film by curing the composition by irradiation with light in a state where the photochemical reaction rate contacting the mold a composition proportional to the square root of the illuminance of the irradiation light,
The light for curing the set Narubutsu an irradiation unit for irradiating the composition,
A control unit that controls the irradiation unit,
The control unit acquires information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after finishing irradiation of the composition with light by the irradiation unit , and acquires the information. determine the light irradiation time for the composition according to the irradiation unit on the basis of the illuminance of the square root of light irradiated to the composition when performing irradiation of light to the irradiation unit by that composition after, Controlling the irradiation unit to irradiate the composition with light at the determined irradiation time,
A forming apparatus characterized by the above-mentioned. A forming apparatus for forming a film by curing the composition by irradiation with light in a state contacting the mold in the composition of radical polymerization type,
The light for curing the set Narubutsu an irradiation unit for irradiating the composition,
A control unit that controls the irradiation unit,
Wherein the control unit obtains information about the cured have such Ikoto as the composition falls within a predetermined range of the target degree of polymerization after finishing the irradiation of light to the composition by the irradiation unit, the information determine the light irradiation time for the composition according to the irradiation unit on the basis of the illuminance of the square root of light irradiated to the composition when performing irradiation of light to the that by the irradiation unit composition after obtaining Controlling the irradiation unit to irradiate the composition with light at the determined irradiation time,
A forming apparatus characterized by the above-mentioned. Wherein, by performing a process of dividing the target value relating to the polymerization of the set formed product by a square root of the illuminance, determining the irradiation time, that the formation apparatus according to claim 1 or 2, characterized in. Wherein the control unit, illuminance I _c of the light irradiated to the set formed product by the irradiation _portion, the irradiation time t _c for the set formed product by the irradiation _portion, the coefficient k, the by light irradiation for the set formed product 3. The forming apparatus according to claim 1, wherein when the target photopolymerization degree of the composition is PD, the irradiation time is determined in accordance with PD = k × (√I _c ) × t _c . 4. Further comprising an illuminance detection unit for detecting the illuminance of the light to be irradiated on the set formed product by the irradiation unit,
Wherein the control unit, the illuminance detected by the illuminance detection unit as I _c,
PD = k × (√I _c ) × t _c
Determine the irradiation time according to
The forming apparatus according to claim 4, wherein: A driving mechanism for changing the relative distance between the pair Narubutsu and the type,
A release force detecting unit that detects the release force required in order to separate the paired Narubutsu and the mold,
Additionally and a illuminance detection unit for detecting the illuminance of the light to be irradiated on the set formed product by the irradiation unit,
By the irradiation unit so that the composition is cured in a state where the relative distance is set by the drive mechanism so that the mold contacts the pair forming material supplied onto the base plate is light in the composition is irradiated, then the relative distance is changed by the drive mechanism such that the mold and the composition is disengaged,
Wherein the control unit obtains information about said release force when the relative distance is changed by the drive mechanism such that the mold and the composition is separated is out of the allowable range, the information the illuminance detection unit is detecting the illuminance, determines the irradiation time based on the square root of the illuminance detected by the illuminance detection unit after obtaining the,
The release force being out of the allowable range indicates that the composition has not been cured to fall within the predetermined range of the target degree of polymerization,
The forming apparatus according to any one of claims 1 to 4, wherein: A driving mechanism for changing the relative distance between the pair Narubutsu and the type,
A release force detecting unit that detects the release force required in order to separate the paired Narubutsu and the mold,
Additionally and a illuminance detection unit for detecting the illuminance of light that will be emitted to the set formed product by the irradiation unit,
By the irradiation unit so that the composition is cured in a state where the relative distance is set by the drive mechanism so that the mold contacts the pair forming material supplied onto the base plate is light in the composition is irradiated, then the relative distance is changed by the drive mechanism such that the mold and the composition is disengaged,
The control unit is configured to multiply a product of the release force and the time during which the release force is applied to the mold when the relative distance is changed by the drive mechanism so as to separate the composition and the mold. There obtains information about that is out of the allowable range, the illuminance detection unit is detecting the illuminance, determines the irradiation time based on the square root of the illuminance detected by the illuminance detection unit after acquiring the information ,
The fact that the product is out of the allowable range indicates that the composition has not been cured to fall within the predetermined range of the target degree of polymerization,
The forming apparatus according to any one of claims 1 to 4, wherein: Further comprising an illuminance detection unit for detecting the illuminance of light that will be emitted to the set formed product by the irradiation unit,
Wherein the control unit obtains information regarding the defect density of the resulting pattern by curing the composition is out of the allowable range, to detect the illuminance on the illumination detection unit after acquiring the information, determining the irradiation time on the basis of the square root of the illuminance detected by the illuminance detection unit,
The fact that the defect density of the pattern is out of the allowable range indicates that the composition has not been cured to fall within the predetermined range of the target degree of polymerization,
The forming apparatus according to any one of claims 1 to 4, wherein: A forming apparatus for forming a film by curing the composition by irradiation with light in a state where the photochemical reaction rate contacting the mold a composition proportional to the square root of the illuminance of the irradiation light,
The light for curing the set Narubutsu an irradiation unit for irradiating the composition,
A control unit that controls the irradiation unit,
The irradiation unit includes an adjusting unit for adjusting the illumination intensity of light irradiated to the set formed product,
The control unit acquires information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after finishing irradiation of the composition with light by the irradiation unit , and acquires the information. for adjusting the illumination intensity of light by the adjusting unit based on the square of the irradiation time of the light irradiated to the composition in performing the said irradiation light by the irradiation unit to set Narubutsu after,
A forming apparatus characterized by the above-mentioned. A forming apparatus for forming a film by curing the composition by irradiation with light in a state contacting the mold in the composition of radical polymerization type,
An irradiation unit for irradiating light for curing the set Narubutsu the set formed product,
A control unit that controls the irradiation unit,
The irradiation unit includes an adjusting unit for adjusting the illumination intensity of light irradiated to the set formed product,
The control unit acquires information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after finishing irradiation of the composition with light by the irradiation unit , and acquires the information. for adjusting the illumination intensity of light by the adjusting unit based on the square of the irradiation time of the light irradiated to the composition in performing the said irradiation light by the irradiation unit to set Narubutsu after,
A forming apparatus characterized by the above-mentioned. Wherein, by performing a process of dividing the target value relating to the polymerization of the set formed product with the square of the irradiation time, forming apparatus according to claim 9 or 10 wherein the determining the illuminance, it is characterized. Wherein the control unit, illuminance I _c of the light irradiated to the set formed product by the irradiation _portion, the irradiation time t _c for the set formed product by the irradiation _portion, the coefficient k, the by light irradiation for the set formed product the target photopolymerization of the composition when the PD, PD = k × (√I c) × determining said illuminance according t _c, forming apparatus according to claim 9 or 10, characterized in that. A step of forming a film on a substrate using the forming apparatus according to any one of claims 1 to 12,
Processing the substrate on which the film is formed in the step,
And producing an article from the processed substrate. A method for forming a film by curing the composition by irradiating light with the mold in contact with a composition whose photochemical reaction rate is proportional to the square root of the illuminance of the irradiated light,
An irradiation step of irradiating the composition with light for curing the composition,
An acquisition step of acquiring information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after the irradiation step,
When performing light irradiation on the composition after the obtaining step, a determining step of determining the light irradiation time for the composition based on the square root of the illuminance of the light applied to the composition,
Irradiating the composition with light at the irradiation time determined in the determining step,
A forming method comprising: A method for forming a film by curing the composition by irradiating light with the radical polymerization type composition in contact with the mold,
An irradiation step of irradiating the composition with light for curing the composition,
An acquisition step of acquiring information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after the irradiation step,
When performing light irradiation on the composition after the obtaining step, a determining step of determining the light irradiation time for the composition based on the square root of the illuminance of the light applied to the composition,
Irradiating the composition with light at the irradiation time determined in the determining step,
A forming method comprising: A method for forming a film by curing the composition by irradiating light with the mold in contact with a composition whose photochemical reaction rate is proportional to the square root of the illuminance of the irradiated light,
An irradiation step of irradiating the composition with light for curing the composition,
An acquisition step of acquiring information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after the irradiation step,
An adjustment step of adjusting the illuminance of light based on the square of the irradiation time of light applied to the composition when irradiating the composition with light after the obtaining step,
An irradiation step of irradiating the composition with light at the illuminance adjusted in the adjustment step,
A forming method comprising: A method for forming a film by curing the composition by irradiating light with the radical polymerization type composition in contact with the mold,
An irradiation step of irradiating the composition with light for curing the composition,
An acquisition step of acquiring information regarding that the composition has not been cured so as to fall within a predetermined range of a target degree of polymerization after the irradiation step,
An adjustment step of adjusting the illuminance of light based on the square of the irradiation time of light applied to the composition when irradiating the composition with light after the obtaining step,
An irradiation step of irradiating the composition with light at the illuminance adjusted in the adjustment step,
A forming method comprising:

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