JP2014096400A5 - - Google Patents
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- Publication number
- JP2014096400A5 JP2014096400A5 JP2012245316A JP2012245316A JP2014096400A5 JP 2014096400 A5 JP2014096400 A5 JP 2014096400A5 JP 2012245316 A JP2012245316 A JP 2012245316A JP 2012245316 A JP2012245316 A JP 2012245316A JP 2014096400 A5 JP2014096400 A5 JP 2014096400A5
- Authority
- JP
- Japan
- Prior art keywords
- flux
- workpiece
- simulation method
- processing
- scattering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000004907 flux Effects 0.000 claims 48
- 238000000034 method Methods 0.000 claims 18
- 238000004088 simulation Methods 0.000 claims 14
- 238000004364 calculation method Methods 0.000 claims 5
- 230000010365 information processing Effects 0.000 claims 2
- 238000004969 ion scattering spectroscopy Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 1
- 230000007547 defect Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 230000005484 gravity Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000006557 surface reaction Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012245316A JP5974840B2 (ja) | 2012-11-07 | 2012-11-07 | シミュレーション方法、シミュレーションプログラム、シミュレータ、加工装置、半導体装置の製造方法 |
| CN201310507750.3A CN103809462A (zh) | 2012-11-07 | 2013-10-24 | 模拟方法及程序、模拟器、加工设备和制造半导体装置的方法 |
| US14/067,538 US9881104B2 (en) | 2012-11-07 | 2013-10-30 | Simulating shape of a workpiece based on a flux |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012245316A JP5974840B2 (ja) | 2012-11-07 | 2012-11-07 | シミュレーション方法、シミュレーションプログラム、シミュレータ、加工装置、半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014096400A JP2014096400A (ja) | 2014-05-22 |
| JP2014096400A5 true JP2014096400A5 (cg-RX-API-DMAC7.html) | 2015-11-12 |
| JP5974840B2 JP5974840B2 (ja) | 2016-08-23 |
Family
ID=50623163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012245316A Active JP5974840B2 (ja) | 2012-11-07 | 2012-11-07 | シミュレーション方法、シミュレーションプログラム、シミュレータ、加工装置、半導体装置の製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9881104B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5974840B2 (cg-RX-API-DMAC7.html) |
| CN (1) | CN103809462A (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5685762B2 (ja) * | 2011-03-07 | 2015-03-18 | みずほ情報総研株式会社 | プラズマ加工形状シミュレーション装置及びプログラム |
| US20170062286A1 (en) | 2015-09-01 | 2017-03-02 | Kabushiki Kaisha Toshiba | Semiconductor manufacturing method and semiconductor manufacturing apparatus |
| US10599789B2 (en) * | 2015-11-25 | 2020-03-24 | Synopsys, Inc. | Topography simulation of etching and/or deposition on a physical structure |
| US10197908B2 (en) * | 2016-06-21 | 2019-02-05 | Lam Research Corporation | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework |
| JP2018067677A (ja) * | 2016-10-21 | 2018-04-26 | ソニーセミコンダクタソリューションズ株式会社 | ダメージ予測方法、プログラム、および半導体加工システム |
| CN108663990B (zh) * | 2018-04-16 | 2019-11-22 | 华中科技大学 | 一种基于两级体素化模型的多轴加工干涉检测与处理方法 |
| CN108932922B (zh) * | 2018-07-03 | 2021-05-14 | 京东方科技集团股份有限公司 | 一种修复能力测试装置及方法 |
| US10677586B2 (en) * | 2018-07-27 | 2020-06-09 | Kla-Tencor Corporation | Phase revealing optical and X-ray semiconductor metrology |
| US11610297B2 (en) * | 2019-12-02 | 2023-03-21 | Kla Corporation | Tomography based semiconductor measurements using simplified models |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2888240B1 (ja) * | 1998-03-26 | 1999-05-10 | 日本電気株式会社 | スパッタ形状シミュレーション方法 |
| JP2002050553A (ja) | 2000-07-31 | 2002-02-15 | Toshiba Corp | 形状シミュレーション方法および形状シミュレーションを行うプログラムを記憶したコンピュータ読み取り可能な記憶媒体 |
| US9037445B2 (en) * | 2007-07-10 | 2015-05-19 | University of Pittsburgh—of the Commonwealth System of Higher Education | Flux balance analysis with molecular crowding |
| JP5087386B2 (ja) * | 2007-12-18 | 2012-12-05 | オリンパス株式会社 | 顕微鏡 |
| JP5428450B2 (ja) * | 2009-03-30 | 2014-02-26 | ソニー株式会社 | イオン照射ダメージの予測方法とイオン照射ダメージのシミュレータ、およびイオン照射装置とイオン照射方法 |
| IL218588A (en) * | 2011-03-23 | 2015-09-24 | Asml Netherlands Bv | A method and system for calculating the electromagnetic scattering properties of a structure and for reconstructing approximate structures |
-
2012
- 2012-11-07 JP JP2012245316A patent/JP5974840B2/ja active Active
-
2013
- 2013-10-24 CN CN201310507750.3A patent/CN103809462A/zh active Pending
- 2013-10-30 US US14/067,538 patent/US9881104B2/en active Active
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