JP2014096319A - Aggregated conductor and coil - Google Patents
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- JP2014096319A JP2014096319A JP2012248513A JP2012248513A JP2014096319A JP 2014096319 A JP2014096319 A JP 2014096319A JP 2012248513 A JP2012248513 A JP 2012248513A JP 2012248513 A JP2012248513 A JP 2012248513A JP 2014096319 A JP2014096319 A JP 2014096319A
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本発明は、複数の素線からなる集合導線とこの集合導線が巻装されてなるコイルに関するものである。 The present invention relates to a collective conducting wire composed of a plurality of strands and a coil formed by winding the collective conducting wire.
モータを構成するステータは、円環状のヨークと、ヨークから径方向内側に突出する複数のティースと、隣接するティース間に形成されるスロットを備えた鋼板が積層されてなるステータコアから形成されており、コイルがこのスロット内に挿入されながら、ティース間に巻装されることによってステータが形成される。このコイル用の巻線は、導線周りに絶縁被膜が形成されてコイル内における導線間の絶縁が図られるとともに、ティースとコイルの間には絶縁性のボビンや絶縁紙等のインシュレータが配設されてコア−コイル間の絶縁が図られている。さらに、たとえば分布巻き方式の巻装形態においては、絶縁紙等のインシュレータで異相コイル間の相間絶縁が図られている。 The stator constituting the motor is formed of a stator core formed by laminating an annular yoke, a plurality of teeth projecting radially inward from the yoke, and a steel plate having a slot formed between adjacent teeth. The stator is formed by being wound between the teeth while the coil is inserted into the slot. The coil winding has an insulating coating formed around the conductors to insulate the conductors in the coil, and an insulator such as an insulating bobbin or insulating paper is disposed between the teeth and the coil. Thus, insulation between the core and the coil is achieved. Further, for example, in a distributed winding type winding form, interphase insulation between different-phase coils is achieved by an insulator such as insulating paper.
従来のコイル形成用の巻線は、たとえば銅素材の導線の周りに、熱硬化性のエナメル樹脂を溶剤に溶かして数μmの厚みで塗布し、熱処理して塗布層を固め、この処理を複数回繰り返して所望厚のエナメル被膜を形成して巻線が製作されている。なお、このエナメル被膜の素材としては、アミドイミド系樹脂やウレタン系樹脂、エステルイミド系樹脂、ポリイミド系樹脂や酸化膜などが一般に用いられている。 For example, a conventional coil forming winding is made by dissolving a thermosetting enamel resin in a solvent and applying it to a thickness of several μm around a copper conductor, and heat-treating it to harden the coating layer. The winding is manufactured by forming the enamel film having a desired thickness by repeating the process. In general, an amidoimide resin, a urethane resin, an esterimide resin, a polyimide resin, an oxide film, or the like is used as a material for the enamel coating.
ところで、上記構成の巻線の渦電流損失対策として、導線の断面を分割して小断面とし、この小断面の導線周りに絶縁被膜を形成して小断面の素線とし、この素線を束ねて形成された集合導線を適用する方法が注目されており、たとえば特許文献１，２にはこの集合導線が開示されている。そして、この集合導線においても、各素線間は各素線の具備する樹脂素材の絶縁被膜や酸化膜にて絶縁が図られている。 By the way, as a countermeasure against eddy current loss of the winding having the above configuration, the cross section of the conducting wire is divided into small cross sections, an insulating coating is formed around the conducting wire of the small cross section to form a small cross section strand, and the strands are bundled. Attention has been paid to a method of applying the collective conducting wire formed in this manner. For example, Patent Literatures 1 and 2 disclose this collective conducting wire. Also in this collective conducting wire, insulation between the strands is achieved by an insulating coating or an oxide film of a resin material included in each strand.
たとえばステータのティース周りに集合導線を巻装してコイルを形成する際には、最後にコイルを形成した集合導線の有する２つの端部同士を溶接して無端状のコイルが形成される。 For example, when forming a coil by winding a collective conducting wire around the teeth of a stator, an endless coil is formed by welding the two end portions of the collective conducting wire that finally formed the coil.
このコイル形成の最終段階における溶接の際に、絶縁被膜が上記する樹脂素材からなる形態では絶縁被膜が有機物素材ゆえに樹脂内部からガスや炭素が発生し、これらを巻き込んで溶接されるために溶接箇所に気泡が生じ、この気泡による溶接不良が懸念される。また、絶縁被膜が酸化膜からなる場合は、酸化膜の膜厚が薄いと十分な絶縁性を確保できず、集合導線としたにも関わらず渦電流損失低減効果を期待し難いものとなってしまう。そこで、酸化膜の膜厚を厚くすると、今度は酸化膜が脆化してしまい、集合導線を折り曲げた際に絶縁被膜が脱落することが懸念される。なお、上記する特許文献１，２では、集合導線を構成する各素線の絶縁被膜に関し、溶接不良が解決課題として掲げられておらず、したがってこの課題を解決する手段の開示はない。 When welding at the final stage of coil formation, if the insulating coating is made of the above-mentioned resin material, the insulating coating is an organic material, so gas and carbon are generated from the inside of the resin, and these are entrained and welded. There is a concern about the poor welding caused by the bubbles. In addition, when the insulating film is made of an oxide film, if the thickness of the oxide film is thin, sufficient insulation cannot be secured, and it is difficult to expect an effect of reducing eddy current loss despite the fact that it is a collective conducting wire. End up. Therefore, if the thickness of the oxide film is increased, the oxide film becomes brittle this time, and there is a concern that the insulating coating may fall off when the collective conducting wire is bent. In Patent Documents 1 and 2 described above, poor welding is not listed as a problem to be solved with respect to the insulating coating of each of the strands constituting the assembly conductor, and therefore there is no disclosure of means for solving this problem.
本発明は上記する問題に鑑みてなされたものであり、渦電流損失低減効果を奏する集合導線に関し、溶接性に優れた集合導線と、この集合導線を巻装して形成されるコイルを提供することを目的とする。 The present invention has been made in view of the above-described problems, and relates to a collective conducting wire having an effect of reducing eddy current loss, and provides a collective conducting wire excellent in weldability and a coil formed by winding the collective conducting wire. For the purpose.
前記目的を達成すべく、本発明による集合導線は、導線と該導線の周りに形成された絶縁被膜からなる素線が複数本束ねられて形成されている集合導線であって、前記絶縁被膜はシリコーンから形成されており、かつ厚みが10μm以下の範囲にあるものである。 In order to achieve the above object, the collective conducting wire according to the present invention is a collective conducting wire formed by bundling a plurality of strands made of a conducting wire and an insulating coating formed around the conducting wire, the insulating coating comprising: It is made of silicone and has a thickness in the range of 10 μm or less.
本発明の集合導線は、集合導線を構成する各素線の絶縁被膜の素材にシリコーンが適用されていること、さらに、絶縁被膜の厚みが10μm以下の範囲に規定されていることにより、溶接性に優れ、渦損失低減効果も高く、さらには曲げ特性にも優れたものとなっている。 The collective conducting wire of the present invention is weldable by applying silicone to the material of the insulating coating of each strand constituting the collective conducting wire, and further by defining the thickness of the insulating coating within a range of 10 μm or less. It has excellent vortex loss reduction effect and excellent bending characteristics.
シリコーンは、結合の主骨格がSiとOが交互に結びついたシロキサン結合(Si-O-Si)でそこに有機基が結びついて形成されたものであり、ベースモノマー（Si-R3-O(1官能基)、Si-R2-O2(2官能基)、Si-R-O3(3官能基)）が架橋することで形成された組成を有している。なお、本明細書において絶縁被膜素材としてのシリコーンは、SiO2(シリカ)を包含するものである。 Silicone is a siloxane bond (Si-O-Si) in which the main skeleton of the bond is alternately bonded to Si and O, and is formed by connecting organic groups to the base monomer (Si-R 3 -O ( 1 functional group), Si—R 2 —O 2 (2 functional group), Si—RO 3 (3 functional group)) have a composition formed by crosslinking. In this specification, silicone as an insulating coating material includes SiO 2 (silica).
シリコーンは高温、低温のいずれの雰囲気下でも耐久性が高く、紫外線劣化性が低く、ゴム状、ゲル状など、多様な性状を有することができる素材である。 Silicone is a material that has high durability under both high temperature and low temperature atmospheres, low UV deterioration property, and can have various properties such as rubber and gel.
絶縁被膜の素材に無機高分子のシリコーン（無機のシリカ含む）を適用したことで、そのシロキサン結合に依拠して炭素が少なく、溶接時にガスや炭素が発生し難いことから、溶接箇所に気泡が生じ難くなり、溶接時の気泡による溶接不良の問題が効果的に解消される。 By applying inorganic polymer silicone (including inorganic silica) as the material of the insulation coating, there is less carbon depending on the siloxane bond, and gas and carbon are less likely to be generated during welding. It becomes difficult to occur, and the problem of poor welding due to bubbles during welding is effectively solved.
なお、溶接不良解消の観点で言えば、集合導線を巻装してコイルを形成した際に溶接される集合導線の端部領域のみ、素線を構成する絶縁被膜にシリコーン素材のものを適用し、その他の領域の集合導線においては構成要素である素線の絶縁被膜に従来一般のエナメル被膜等が適用された形態の集合導線であってもよいが、高い渦損失低減効果をも加味して総合的に見ると、集合導線の全領域において構成要素である素線の絶縁被膜がシリコーンから形成された集合導線であるのが望ましい。 From the viewpoint of eliminating welding defects, only the end region of the collective conductor that is welded when the collective conductor is wound to form a coil is applied to the insulating coating that constitutes the strand made of a silicone material. In the other areas of the collective conductor, it may be a collective conductor of a form in which a conventional general enamel coating is applied to the insulating coating of the element wire, but also taking into account the high eddy loss reduction effect When viewed comprehensively, it is desirable that the insulating film of the element wire, which is a constituent element, in the entire region of the collective conducting wire is a collective conducting wire formed from silicone.
シリコーン素材の絶縁被膜は絶縁性にも優れており、たとえば銅素材の導線との接着性が良好であり、集合導線を曲げた際の耐剥離性に優れている。 Silicone insulating coatings are also excellent in insulating properties, for example, have good adhesion to copper conductive wires, and have excellent peel resistance when the collective conducting wires are bent.
本発明の集合導線では、各素線を構成する絶縁被膜がシリコーンから形成されていることに加えて、その厚みが10μm以下の範囲に規定されている。 In the collective conducting wire of the present invention, in addition to the insulating coating constituting each element wire being formed from silicone, the thickness is defined within a range of 10 μm or less.
本発明者等の検証によれば、絶縁被膜の素材にシリコーンを適用するのみならず、絶縁被膜の厚みを10μm以下の範囲に規定した場合に、溶接性に優れ、渦損失低減効果が高いことに加えて、曲げ特性に優れた絶縁被膜を具備する素線から構成された集合導線となることが特定されている。 According to the verification by the present inventors, not only the silicone is applied to the material of the insulating coating, but also when the thickness of the insulating coating is defined within a range of 10 μm or less, the weldability is excellent and the eddy loss reduction effect is high. In addition to the above, it has been specified that it is a collective conducting wire composed of strands having an insulating film with excellent bending characteristics.
なお、集合導線を構成する各導線はその断面視形状が円形のものを適用できるが、素線の断面視形状が矩形の平角導線からなり、前記素線が平角線であり、前記集合導線が平角線である形態の場合には、占積率の高いコイルを形成できることから好ましい。 In addition, although each cross-sectional shape of the conductive wire constituting the collective conducting wire can be a circular shape, the cross-sectional shape of the strand is a rectangular rectangular conductor, the strand is a rectangular wire, and the collective conducting wire is In the case of a flat wire, it is preferable because a coil with a high space factor can be formed.
以上の説明から理解できるように、本発明の集合導線とこの集合導線が巻装されて形成されたコイルによれば、構成要素である複数の素線の絶縁被膜がシリコーンから形成され、かつ絶縁被膜の厚みが10μm以下の範囲にある集合導線であることによって、溶接性と絶縁性に優れ、さらにはコイル形成の際並びにコイル形成後に重要である曲げ特性にも優れた集合導線とこの集合導線からなるコイルを提供することができる。 As can be understood from the above description, according to the collective conducting wire of the present invention and the coil formed by winding the collective conducting wire, the insulating film of the plurality of strands as the constituent elements is formed from silicone and insulated. The collective conductor having a coating thickness in the range of 10 μm or less is superior in weldability and insulation, and also has excellent bending characteristics that are important during and after coil formation and the collective conductor. The coil which consists of can be provided.
以下、図面を参照して本発明の集合導線の実施の形態を説明する。なお、図示例の集合導線は、その構成要素である素線も集合導線もともに平角線からなる形態であるが、丸線からなる素線から構成された集合導線であってもよいことは勿論のことである。 Hereinafter, embodiments of the collective conducting wire of the present invention will be described with reference to the drawings. Note that the assembly conductor in the illustrated example is a form in which both the element wire and the assembly conductor, which are constituent elements thereof, are rectangular wires, but it may of course be an assembly conductor composed of element wires made of round wires. That is.
図１は本発明の集合導線の模式図である。図示する集合導線１０は、銅素材の平角導線１とこの平角導線１の周りに形成された絶縁被膜２からなる素線３が複数本（図示例は６本）束ねられて形成されている。集合導線１０は各素線３同士が密着して形成されているが、さらに不図示のシリコーンからなる外被膜で各素線３が一体に形成されてもよい。たとえばこの集合導線１０がモータを構成するステータのティース周りにボビン等を介して巻装されることで、不図示のコイルが形成される。
FIG. 1 is a schematic view of the collective conducting wire of the present invention. The collective conducting
絶縁被膜２はシリコーンから形成されている。より具体的には、ベースモノマーである、Si-R3-O(1官能基)、Si-R2-O2(2官能基)、Si-R-O3(3官能基)が多様な組み合わせ形態で架橋することで形成された組成を有している。なお、絶縁被膜２がSiO2(シリカ)から形成されていてもよい。 The insulating coating 2 is made of silicone. More specifically, the base monomers Si-R 3 -O (1 functional group), Si-R 2 -O 2 (2 functional group), and Si-RO 3 (3 functional group) are in various combinations. It has the composition formed by bridge | crosslinking with. The insulating coating 2 may be formed from SiO 2 (silica).
絶縁被膜２が無機高分子のシリコーンから形成されていることで、そのシロキサン結合に依拠して炭素が少なく、溶接時にガスや炭素が発生し難いことから、溶接箇所に気泡が生じ難くなり、溶接時の気泡による溶接不良の問題が効果的に解消され、溶接性に優れた絶縁被膜２を具備する集合導線１０となる。
Since the insulating coating 2 is formed of inorganic polymer silicone, there is little carbon depending on the siloxane bond, and gas and carbon are less likely to be generated during welding. The problem of poor welding due to air bubbles is effectively eliminated, and the
また、シリコーンからなる絶縁被膜２の厚みtは10μm以下の範囲に設定されている。後述する本発明者等による検証結果でも示すように、絶縁被膜２がシリコーンから形成されるとともに厚みが上記数値範囲に規定されていることで、溶接性と絶縁性に優れ、さらにはコイル形成の際並びにコイル形成後に重要である曲げ特性（曲げた際の耐剥離性）にも優れた集合導線１０となる。
Further, the thickness t of the insulating coating 2 made of silicone is set in a range of 10 μm or less. As shown in the verification results by the present inventors, which will be described later, since the insulating coating 2 is formed of silicone and the thickness is defined within the above numerical range, it is excellent in weldability and insulation, and further in coil formation. As a result, the
[本発明の集合導線の効果確認実験とその結果]
本発明者等は、本発明の集合導線の効果確認実験として、以下の製作方法で本発明の集合導線（実施例1〜3）と従来の集合導線（比較例1〜3）を製作し、各試験体に対して溶接性の評価試験、渦損失低減性評価試験、および曲げ特性評価試験をそれぞれ実施した。
[Experiment to confirm the effect of the collective conducting wire of the present invention and its results]
The present inventors manufactured the collective conductors of the present invention (Examples 1 to 3) and the conventional collective conductors (Comparative Examples 1 to 3) by the following production method as an effect confirmation experiment of the collective conductor of the present invention. Each specimen was subjected to a weldability evaluation test, a vortex loss reduction evaluation test, and a bending property evaluation test.
（実施例および比較例の製作方法）
＜実施例1＞
銅素材の導線にシリコーンレジンであるKR251(信越化学工業社製)をディップコーターで浸漬した後、230℃の熱処理炉内に30分載置して硬化させ、導線周りにシリコーンからなる絶縁被膜(膜厚3μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、実施例1にかかる集合導線を作成した。
(Production method of Examples and Comparative Examples)
<Example 1>
After immersing KR251 (manufactured by Shin-Etsu Chemical Co., Ltd.), a silicone resin, in a copper conductor with a dip coater, it is placed in a heat treatment furnace at 230 ° C for 30 minutes to cure, and an insulating coating made of silicone around the conductor ( A wire was prepared by depositing a film thickness of 3 μm. The produced six strands were bundled to form a coating around them, and a collective conducting wire according to Example 1 was produced.
＜実施例2＞
銅素材の導線にシリコーンレジンであるTSR1122(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)をディップコーターで浸漬した後、150℃の熱処理炉内に30分載置して硬化させ、導線周りにシリコーンからなる絶縁被膜(膜厚0.1μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、実施例2にかかる集合導線を作成した。
<Example 2>
After immersing the silicone resin TSR1122 (made by Momentive Performance Materials Japan GK) in a dip coater on a copper conductive wire, place it in a heat treatment furnace at 150 ° C for 30 minutes to cure, and around the wire An insulating film (thickness: 0.1 μm) made of silicone was deposited to prepare a strand. The produced six strands were bundled to form a coating around them, and a collective conducting wire according to Example 2 was produced.
＜実施例3＞
銅素材の導線にシリコーンレジンであるKR251(信越化学工業社製)をディップコーターで浸漬した後、230℃の熱処理炉内に30分載置して硬化させ、導線周りにシリコーンからなる絶縁被膜(膜厚7μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、実施例3にかかる集合導線を作成した。
<Example 3>
After immersing KR251 (manufactured by Shin-Etsu Chemical Co., Ltd.), a silicone resin, in a copper conductor with a dip coater, it is placed in a heat treatment furnace at 230 ° C for 30 minutes to cure, and an insulating coating made of silicone around the conductor ( A wire was prepared by depositing a film thickness of 7 μm. The produced six strands were bundled to form a coating around them, and a collective conducting wire according to Example 3 was produced.
＜比較例1＞
銅素材の導線を300℃で30分熱処理し、導線周りに酸化膜を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、実施例1にかかる集合導線を作成した。
<Comparative Example 1>
Copper wires were heat-treated at 300 ° C. for 30 minutes, and an oxide film was deposited around the wires to create a strand. The produced six strands were bundled to form a coating around them, and a collective conducting wire according to Example 1 was produced.
＜比較例2＞
銅素材の導線にポリアミドイミド系のエナメル被膜としてKMK22A(日立マグネットワイヤ社製)を塗布し、230℃で15分、さらに400℃で15分焼成してエナメル被膜(膜厚3μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、比較例2にかかる集合導線を作成した。
<Comparative Example 2>
KMK22A (manufactured by Hitachi Magnet Wire Co., Ltd.) is applied as a polyamide-imide-based enamel coating to a copper conductive wire, and calcined at 230 ° C for 15 minutes and further at 400 ° C for 15 minutes to deposit an enamel coating (film thickness 3μm) A strand was created. The produced six strands were bundled to form a coating around them, and an assembly conductor according to Comparative Example 2 was created.
＜比較例3＞
銅素材の導線にポリアミドイミド系のエナメル被膜としてKMK22A(日立マグネットワイヤ社製)を塗布し、230℃で15分、さらに400℃で15分焼成してエナメル被膜(膜厚20μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、比較例3にかかる集合導線を作成した。
<Comparative Example 3>
Apply KMK22A (manufactured by Hitachi Magnet Wire Co., Ltd.) as a polyamide-imide-based enamel coating on a copper conductor, and baked at 230 ° C for 15 minutes and further at 400 ° C for 15 minutes to deposit an enamel coating (film thickness 20μm) A strand was created. The prepared six wires were bundled to form a coating around them, and a collective conducting wire according to Comparative Example 3 was prepared.
＜比較例4＞
銅素材の導線にシリコーンレジンであるTSR1122(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)をディップコーターで浸漬した後、150℃の熱処理炉内に30分載置して硬化させ、導線周りにシリコーンからなる絶縁被膜(膜厚20μm)を析出させて素線を作成した。作成された6本の素線を束ねて周囲に被膜を形成し、比較例4にかかる集合導線を作成した。
<Comparative Example 4>
After immersing the silicone resin TSR1122 (made by Momentive Performance Materials Japan GK) in a dip coater on a copper conductive wire, place it in a heat treatment furnace at 150 ° C for 30 minutes to cure, and around the wire An insulating coating (thickness 20 μm) made of silicone was deposited to prepare a strand. The produced six strands were bundled to form a coating around them, and a collective conducting wire according to Comparative Example 4 was produced.
（溶接性の評価試験）
実施例、比較例の各集合導線に対し、それぞれ2本の集合導線をTIG溶接機(ミヤチテクノス社製のMAW-300)で溶接し、溶接球の観察と断面観察による気泡の有無を確認した。
(Weldability evaluation test)
For each assembly conductor of the example and comparative example, two assembly conductors were welded with a TIG welding machine (MAW-300 manufactured by Miyachi Technos Co., Ltd.), and the presence or absence of bubbles was confirmed by observation of the weld ball and cross-sectional observation. .
（渦損失低減性評価試験）
図２ａで示す各実施例および比較例の集合導線モデルＭ１０（導線モデルＭ１，絶縁被膜モデルＭ２，素線モデルＭ３）の周りにコイルＣを配設し、磁場ＭＦ中に載置し、発生した渦電流を計測機ＭＭ（サーチコイル）で測定した。なお、実施例および比較例の集合導線モデルＭ１０の測定結果と対比する対比モデルとして、図２ｂで示すように集合導線モデルＭ１０と同じ断面積の１本の銅素材の導線モデルＭ４，絶縁被膜モデルＭ５からなる１本導線モデルＭ２０を作成し、同様にその周りにコイルＣを配設し、磁場ＭＦ中に載置し、発生した渦電流を計測機ＭＭ（サーチコイル）で測定した。１本導線モデルＭ２０の測定結果に対する実施例、比較例の各集合導線モデルＭ１０の測定結果から渦損失低減効果の有無を評価した。なお、渦損低減効果の有無の判断方法は、１本導線モデルに比べて70%以上の低減効果がある場合に「低減効果有り」、70%未満の場合は「低減効果なし」としている。
(Vortex loss reduction evaluation test)
The coil C is disposed around the collective conducting wire model M10 (the conducting wire model M1, the insulating coating model M2, the wire model M3) of each of the examples and comparative examples shown in FIG. 2a, and is generated by being placed in the magnetic field MF. Eddy current was measured with a measuring instrument MM (search coil). In addition, as a comparison model to compare with the measurement result of the collective conducting wire model M10 of the example and the comparative example, as shown in FIG. A single conductor model M20 made of M5 was created, and similarly, a coil C was arranged around it, placed in the magnetic field MF, and the generated eddy current was measured with a measuring instrument MM (search coil). The presence / absence of a vortex loss reduction effect was evaluated from the measurement results of each of the collective conductor models M10 of the example and the comparative example with respect to the measurement result of the single conductor model M20. In addition, the determination method of the presence or absence of the eddy loss reduction effect is “no reduction effect” when there is a reduction effect of 70% or more compared to the single conductor model, and “no reduction effect” when it is less than 70%.
（曲げ特性評価試験）
実施例および比較例の各集合導線に対して、屈曲試験機にて3Rの折り曲げ試験をおこない、各集合導線の素線周りの絶縁被膜の剥離の有無を観察した。
(Bending characteristic evaluation test)
Each assembly conductor of the example and the comparative example was subjected to a 3R bending test with a bending tester, and the presence or absence of peeling of the insulating coating around the strand of each assembly conductor was observed.
（実験結果）
上記する溶接性の評価試験、渦損失低減性評価試験および曲げ特性評価試験の結果を以下の表１に示す。
(Experimental result)
The results of the above-described weldability evaluation test, eddy loss reduction evaluation test, and bending property evaluation test are shown in Table 1 below.
[表１]
表１より、実施例1〜3においては、集合導線を構成する素線の絶縁被膜がシリコーンから形成され、その膜厚が1〜7μmにおいて、溶接性、渦損失低減性、および曲げ特性の全ての確認試験で良好な結果が得られた。 From Table 1, in Examples 1 to 3, the insulation film of the strands constituting the collective conducting wire is formed from silicone, and when the film thickness is 1 to 7 μm, all of weldability, vortex loss reduction, and bending characteristics are obtained. Good results were obtained in the confirmation test.
一方、比較例2、3、4では溶接箇所に気泡が確認され、溶接性が不良であることが分かった、特に比較例4は絶縁被膜がシリコーンから形成されたものであるが、その膜厚が20μmと厚すぎたことが原因であると考えられる。実施例3と比較例4の結果より、シリコーンから形成される絶縁被膜の膜厚の上限値としては10μmが溶接可能性を高い確率で保証できると推察されることから、この10μmをシリコーン製絶縁被膜の膜厚の上限値に規定することとした。 On the other hand, in Comparative Examples 2, 3, and 4, bubbles were confirmed in the welded part, and it was found that the weldability was poor.In particular, Comparative Example 4 was an insulating film formed from silicone, but its film thickness Is thought to be caused by the thickness of 20 μm being too thick. From the results of Example 3 and Comparative Example 4, it is inferred that the upper limit of the film thickness of the insulating coating formed from silicone can be guaranteed with a high probability that 10 μm can be welded. The upper limit value of the film thickness was defined.
また、絶縁被膜に酸化膜を適用した比較例1では、渦損失低減効果がほとんどなく、曲げ特性でも剥離が生じる結果となった。 Further, in Comparative Example 1 in which the oxide film was applied to the insulating film, there was almost no vortex loss reduction effect, and peeling occurred even in the bending characteristics.
一方、最小膜厚0.1μmの絶縁被膜を有する素線から構成された実施例2の集合導線においても、渦損失低減性、曲げ特性ともに良好な結果が得られており、したがって、シリコーンから形成される絶縁被膜の膜厚の下限値を、好ましくは0.1μmに規定することができる。 On the other hand, also in the collective conducting wire of Example 2 composed of a strand having an insulation film with a minimum film thickness of 0.1 μm, good results were obtained in both vortex loss reduction and bending characteristics, and therefore it was formed from silicone. The lower limit value of the thickness of the insulating coating is preferably set to 0.1 μm.
以上、本発明の実施の形態を図面を用いて詳述してきたが、具体的な構成はこの実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲における設計変更等があっても、それらは本発明に含まれるものである。 The embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration is not limited to this embodiment, and there are design changes and the like without departing from the gist of the present invention. They are also included in the present invention.
１…導線（平角導線）、２…絶縁被膜、３…素線、１０…集合導線 DESCRIPTION OF SYMBOLS 1 ... Conductive wire (flat rectangular wire), 2 ... Insulating film, 3 ... Elementary wire, 10 ... Collective conducting wire
Claims (3)
前記絶縁被膜はシリコーンから形成されており、かつ厚みが10μm以下の範囲にある集合導線。 An assembly conductor formed by bundling a plurality of strands made of a conductor and an insulating film formed around the conductor,
The collective conducting wire in which the insulating coating is made of silicone and has a thickness of 10 μm or less.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019188777A1 (en) | 2018-03-30 | 2019-10-03 | 古河電気工業株式会社 | Insulated electric wire material, method for manufacturing insulated electric wire material, coil, and electric/electronic device |
| WO2019188776A1 (en) | 2018-03-30 | 2019-10-03 | 古河電気工業株式会社 | Insulated electric wire material, method for manufacturing insulated electric wire material, coil, and electric/electronic device |
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| JP2001338531A (en) * | 2000-05-26 | 2001-12-07 | Hitachi Cable Ltd | Heat-resistant insulated cable |
| JP2007227266A (en) * | 2006-02-24 | 2007-09-06 | Mitsubishi Cable Ind Ltd | Assembled conductor |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS5713619A (en) * | 1980-06-28 | 1982-01-23 | Nippon Denso Co | Overload resistant insulated wire |
| JP2001338531A (en) * | 2000-05-26 | 2001-12-07 | Hitachi Cable Ltd | Heat-resistant insulated cable |
| JP2007227266A (en) * | 2006-02-24 | 2007-09-06 | Mitsubishi Cable Ind Ltd | Assembled conductor |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019188777A1 (en) | 2018-03-30 | 2019-10-03 | 古河電気工業株式会社 | Insulated electric wire material, method for manufacturing insulated electric wire material, coil, and electric/electronic device |
| WO2019188776A1 (en) | 2018-03-30 | 2019-10-03 | 古河電気工業株式会社 | Insulated electric wire material, method for manufacturing insulated electric wire material, coil, and electric/electronic device |
| US11670436B2 (en) | 2018-03-30 | 2023-06-06 | Furukawa Electric Co., Ltd. | Insulated wire material and method of manufacturing the same, and coil and electrical/electronic equipment |
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