JP2014095122A5 - - Google Patents

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Publication number
JP2014095122A5
JP2014095122A5 JP2012247222A JP2012247222A JP2014095122A5 JP 2014095122 A5 JP2014095122 A5 JP 2014095122A5 JP 2012247222 A JP2012247222 A JP 2012247222A JP 2012247222 A JP2012247222 A JP 2012247222A JP 2014095122 A5 JP2014095122 A5 JP 2014095122A5
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Japan
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forming
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JP2012247222A
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English (en)
Japanese (ja)
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JP2014095122A (ja
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Priority to JP2012247222A priority Critical patent/JP2014095122A/ja
Priority claimed from JP2012247222A external-priority patent/JP2014095122A/ja
Publication of JP2014095122A publication Critical patent/JP2014095122A/ja
Publication of JP2014095122A5 publication Critical patent/JP2014095122A5/ja
Pending legal-status Critical Current

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JP2012247222A 2012-11-09 2012-11-09 マグネトロンスパッタ装置 Pending JP2014095122A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012247222A JP2014095122A (ja) 2012-11-09 2012-11-09 マグネトロンスパッタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012247222A JP2014095122A (ja) 2012-11-09 2012-11-09 マグネトロンスパッタ装置

Publications (2)

Publication Number Publication Date
JP2014095122A JP2014095122A (ja) 2014-05-22
JP2014095122A5 true JP2014095122A5 (th) 2015-11-26

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ID=50938439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012247222A Pending JP2014095122A (ja) 2012-11-09 2012-11-09 マグネトロンスパッタ装置

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JP (1) JP2014095122A (th)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7379027B2 (ja) 2019-09-04 2023-11-14 Hoya株式会社 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108923019B (zh) * 2018-06-30 2021-05-25 深圳市神火照明有限责任公司 基于磁控溅射方法的锂离子电池正极材料的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4892633A (en) * 1988-11-14 1990-01-09 Vac-Tec Systems, Inc. Magnetron sputtering cathode
JP2007169705A (ja) * 2005-12-21 2007-07-05 Kobe Steel Ltd 非平衡マグネトロンスパッタ用カソード
JP2008121077A (ja) * 2006-11-14 2008-05-29 Hitachi Metals Ltd マグネトロンスパッタリング用磁気回路
JP4999602B2 (ja) * 2007-08-16 2012-08-15 株式会社アルバック 成膜装置
JP4843582B2 (ja) * 2007-08-17 2011-12-21 株式会社アルバック リン酸リチウム焼結体の製造方法およびスパッタリングターゲット
JP2009179867A (ja) * 2008-01-31 2009-08-13 Ulvac Japan Ltd 平行平板型マグネトロンスパッタ装置、固体電解質薄膜の製造方法、及び薄膜固体リチウムイオン２次電池の製造方法
TWI510361B (zh) * 2008-04-29 2015-12-01 Agency Science Tech & Res 無機性多層阻隔薄膜及其製備方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7379027B2 (ja) 2019-09-04 2023-11-14 Hoya株式会社 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法

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