JP2014075408A - Holding table and holding method - Google Patents

Holding table and holding method Download PDF

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JP2014075408A
JP2014075408A JP2012221057A JP2012221057A JP2014075408A JP 2014075408 A JP2014075408 A JP 2014075408A JP 2012221057 A JP2012221057 A JP 2012221057A JP 2012221057 A JP2012221057 A JP 2012221057A JP 2014075408 A JP2014075408 A JP 2014075408A
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holding
workpiece
height position
suction
holding table
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Takuya Kuga
卓也 久我
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a holding table suitable for holding a workpiece having a thickness variation, and to provide a holding method for holding a workpiece by using the holding table.SOLUTION: In a holding table having a suction holding part for holding a workpiece, the suction holding part is divided into a plurality of small region holding parts for locally holding a workpiece. The holding table includes a plurality of height position changing means for changing the height position of the plurality of small region holding parts, respectively, and a suction path having one end opening to the plurality of small region holding parts, respectively, and the other end connected with a suction source.

Description

本発明は、保持テーブル及び該保持テーブルで被加工物を保持する保持方法に関する。   The present invention relates to a holding table and a holding method for holding a workpiece by the holding table.

半導体デバイスの製造プロセスにおいては、シリコンや化合物半導体からなるウエーハの表面にストリートと呼ばれる格子状の分割予定ラインが形成される。そして、分割予定ラインによって区画された各領域に、ICやLSI等のデバイスが形成される。   In the manufacturing process of a semiconductor device, a grid-like division planned line called street is formed on the surface of a wafer made of silicon or a compound semiconductor. Then, devices such as ICs and LSIs are formed in the respective areas partitioned by the division lines.

これらのウエーハは裏面が研削装置により研削されて所定の厚みへと薄化された後、切削装置又はレーザー加工装置によってストリートに沿って切削され、個々のチップへと分割されることで半導体デバイスが製造される。このようにして製造された半導体デバイスは、携帯電話、パソコン等の各種電気機器に広く利用されている。   These wafers are ground on the back by a grinding machine and thinned to a predetermined thickness, then cut along the streets by a cutting machine or laser processing machine, and divided into individual chips. Manufactured. The semiconductor device manufactured in this way is widely used in various electric devices such as mobile phones and personal computers.

切削装置、研削装置又はレーザー加工装置等の加工装置は、ウエーハ等の被加工物を保持テーブル(チャックテーブル)に保持した状態で被加工物に切削加工、研削加工又はレーザー加工等の加工を施す。   A processing apparatus such as a cutting apparatus, a grinding apparatus, or a laser processing apparatus performs a process such as a cutting process, a grinding process, or a laser process on a workpiece while holding the workpiece such as a wafer on a holding table (chuck table). .

特開平11−254259号公報JP 11-254259 A 特開2001−287141号公報JP 2001-287141 A

しかし、被加工物自体や被加工物に貼着されて被加工物を支持する保護部材等に厚みばらつきがあると、保持テーブルで保持した被加工物の上面は平坦(面一)とならず、例えば以下のような問題が生じる。   However, if the workpiece itself or a protective member attached to the workpiece and supporting the workpiece has a thickness variation, the upper surface of the workpiece held by the holding table is not flat (level). For example, the following problems occur.

切削装置においては、例えば先ダイシング法(Dising Before Grinding)で切削溝を形成するときに切り込み深さにばらつきが発生し、研削によるチップ分割時に分割タイミングがずれ、一部のチップにおいて欠けが発生する。研削装置、研磨装置、又はバイト切削装置においては、研削、研磨、バイト切削後の被加工物の平坦精度が悪化する。   In a cutting machine, for example, when the cutting groove is formed by a dicing before grinding method, the cutting depth varies, the division timing shifts during chip division by grinding, and chipping occurs in some chips. . In a grinding device, a polishing device, or a cutting tool, the flatness accuracy of the workpiece after grinding, polishing, and cutting is deteriorated.

レーザー加工装置を用いてレーザー加工溝や改質層を形成する場合には、一定の深さのレーザー加工溝や被加工物内部の一定高さ位置に改質層を形成できず、分割時に分割不良が生じる恐れがある。   When forming a laser processing groove or modified layer using a laser processing device, a laser processing groove with a certain depth or a modified layer cannot be formed at a certain height inside the work piece, and it is divided when dividing. Defects may occur.

本発明はこのような点に鑑みてなされたものであり、その目的とするところは、厚みばらつきのある被加工物を保持するのに適した保持テーブル及び該保持テーブルを使用して被加工物を保持する保持方法を提供することである。   The present invention has been made in view of these points, and an object of the present invention is to provide a holding table suitable for holding a workpiece having a thickness variation and a workpiece using the holding table. It is providing the holding method which hold | maintains.

請求項1記載の発明によると、被加工物を保持する吸引保持部を有する保持テーブルであって、該吸引保持部が被加工物を局所的に保持する複数の小域保持部に分割されており、該複数の小域保持部の高さ位置をそれぞれ変更する複数の高さ位置変更手段と、一端が該複数の小域保持部にそれぞれ開口するとともに他端が吸引源に接続された吸引路と、を備えたことを特徴とする保持テーブルが提供される。   According to the first aspect of the present invention, there is provided a holding table having a suction holding portion for holding a workpiece, wherein the suction holding portion is divided into a plurality of small area holding portions for locally holding the workpiece. A plurality of height position changing means for respectively changing the height positions of the plurality of small area holding portions, and suction with one end opening to each of the plurality of small area holding portions and the other end connected to a suction source And a holding table characterized by comprising a path.

請求項3記載の発明によると、請求項1又は2記載の保持テーブルで被加工物を保持する保持方法であって、被加工物を該保持テーブル上に載置して吸引保持する保持ステップと、該保持テーブルに保持された被加工物の上面高さ位置を複数点において検出する高さ位置検出ステップと、該高さ位置検出ステップを実施した後、前記高さ位置変更手段で前記小域保持部の高さ位置を変更して被加工物の上面高さを面一とする高さ位置変更ステップと、を含むことを特徴とする保持方法が提供される。   According to a third aspect of the present invention, there is provided a holding method for holding a workpiece by the holding table according to the first or second aspect, wherein the workpiece is placed on the holding table and sucked and held. A height position detecting step for detecting the upper surface height position of the workpiece held on the holding table at a plurality of points; and after the height position detecting step is carried out, And a height position changing step of changing the height position of the holding portion to make the upper surface height of the workpiece flush with each other.

本発明の保持テーブルは、吸引保持部が複数の小域保持部に分割され、それぞれの小域保持部で被加工物を局所的に保持する。小域保持部の高さ位置を変更する高さ位置変更手段を有するため、被加工物自体や被加工物に貼着される保護部材等に厚みばらつきがあっても、被加工物の上面を平坦(面一)に保持でき、上述した問題を解決できる。   In the holding table of the present invention, the suction holding unit is divided into a plurality of small region holding units, and the workpiece is locally held by each small region holding unit. Since it has a height position changing means to change the height position of the small area holding part, even if there is a thickness variation in the workpiece itself or the protective member attached to the workpiece, the upper surface of the workpiece is It can be kept flat (flat) and the above-mentioned problems can be solved.

実施形態に係る保持テーブルの平面図である。It is a top view of the holding table concerning an embodiment. 実施形態に係る保持テーブルの縦断面図である。It is a longitudinal cross-sectional view of the holding table which concerns on embodiment. 載置ステップを示す保持テーブルの縦断面図である。It is a longitudinal cross-sectional view of the holding table which shows a mounting step. 吸引保持ステップを示す保持テーブルの縦断面図である。It is a longitudinal cross-sectional view of the holding table which shows a suction holding step. 高さ位置検出ステップを示す拡大断面図である。It is an expanded sectional view which shows a height position detection step. 高さ位置変更ステップを示す拡大断面図である。It is an expanded sectional view which shows a height position change step.

以下、本発明の実施形態を図面を参照して詳細に説明する。図1を参照すると、本発明実施形態に係る保持テーブル(チャックテーブル)2の平面図が示されている。保持テーブル2は、SUS等から形成された枠体4と、枠体4に囲繞される吸引保持部6とから構成される。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Referring to FIG. 1, a plan view of a holding table (chuck table) 2 according to an embodiment of the present invention is shown. The holding table 2 includes a frame body 4 made of SUS or the like and a suction holding section 6 surrounded by the frame body 4.

吸引保持部6は例えばポーラスセラミックス等から形成され、被加工物を局所的に保持する複数の小域保持部8に分割されている。図2の断面図に示すように、各小域保持部8はピエゾアクチュエータ10で支持されている。各小域保持部8の保持面8aで被加工物を局所的に保持する。   The suction holding unit 6 is made of, for example, porous ceramics and is divided into a plurality of small region holding units 8 that locally hold the workpiece. As shown in the sectional view of FIG. 2, each small area holding portion 8 is supported by a piezo actuator 10. The workpiece is locally held by the holding surface 8a of each small area holding unit 8.

各小域保持部8はピエゾアクチュエータ10に形成された吸引路12、共通吸引路14及び電磁切換弁16を介して吸引源18に選択的に接続される。各ピエゾアクチュエータ10は一対の電極20,22を有しており、電極20は電源24の正極側に接続され、電極22は可変抵抗等の印加電圧変更手段26を介して電源24の負極側に接続されている。   Each small area holding unit 8 is selectively connected to a suction source 18 via a suction path 12, a common suction path 14 and an electromagnetic switching valve 16 formed in the piezoelectric actuator 10. Each piezo actuator 10 has a pair of electrodes 20, 22 that are connected to the positive side of the power source 24, and the electrode 22 is connected to the negative side of the power source 24 via an applied voltage changing means 26 such as a variable resistor. It is connected.

以下、本実施形態の保持テーブル2の作用について説明する。図3に示すように、ウエーハ等の被加工物11を保持テーブル2の吸引保持部6上に載置する。この時、電磁切換弁16は遮断位置に位置付けられ、吸引保持部6には負圧が作用していない状態である。   Hereinafter, the operation of the holding table 2 of the present embodiment will be described. As shown in FIG. 3, a workpiece 11 such as a wafer is placed on the suction holding unit 6 of the holding table 2. At this time, the electromagnetic switching valve 16 is positioned at the cutoff position, and no negative pressure is applied to the suction holding unit 6.

図4に示すように、電磁切換弁16を接続位置に切り替えると、電磁切換弁16、共通吸引路14及び吸引路12を介して吸引保持部6の各小域保持部8に負圧が作用し、被加工物11は保持テーブル2により吸引保持される。   As shown in FIG. 4, when the electromagnetic switching valve 16 is switched to the connection position, negative pressure acts on each small area holding portion 8 of the suction holding portion 6 via the electromagnetic switching valve 16, the common suction path 14, and the suction path 12. The workpiece 11 is sucked and held by the holding table 2.

次いで、図5に示すように、非接触式の高さ位置検出器28で被加工物11の上面11aをスキャンして、保持テーブル2で保持された被加工物11の上面11aの高さ位置を複数点において検出する(高さ位置検出ステップ)。   Next, as shown in FIG. 5, the upper surface 11 a of the workpiece 11 is scanned by the non-contact type height position detector 28, and the height position of the upper surface 11 a of the workpiece 11 held by the holding table 2. Are detected at a plurality of points (height position detection step).

検出した複数点の高さ位置は保持テーブル2を備えた加工装置のメモリに格納する。非接触式の高さ位置検出器としては、公知のレーザー式高さ位置検出器又は超音波式の高さ位置検出器を使用することができる。   The detected height positions of the plurality of points are stored in the memory of the processing apparatus provided with the holding table 2. As the non-contact type height position detector, a known laser height position detector or ultrasonic height position detector can be used.

高さ位置検出ステップ実施後、被加工物11の上面11aを平坦(面一)にするのに必要な位置のピエゾアクチュエータ10を、印加電圧変更手段26を制御して制御された駆動電圧で駆動し、図6に示すように、被加工物11の上面11aの高さ位置を符号11a´で示されているように面一にする(高さ位置変更ステップ)。   After performing the height position detection step, the piezoelectric actuator 10 at a position necessary for flattening the upper surface 11a of the workpiece 11 is driven with a drive voltage controlled by controlling the applied voltage changing means 26. Then, as shown in FIG. 6, the height position of the upper surface 11a of the workpiece 11 is made flush as indicated by reference numeral 11a '(height position changing step).

この高さ位置変更ステップでは、各小域保持部8の下に配設されたピエゾアクチュエータ10を全て駆動する必要はなく、高さ位置検出ステップで検出された被加工物11の上面11aの高さ位置に応じて、その高さ位置を面一にするのに必要なピエゾアクチュエータ10を印加電圧変更手段26で制御された印加電圧で駆動する。   In this height position changing step, it is not necessary to drive all of the piezo actuators 10 disposed under the respective small area holding sections 8, and the height of the upper surface 11a of the workpiece 11 detected in the height position detecting step. In accordance with the position, the piezo actuator 10 necessary to make the height position flush with each other is driven with the applied voltage controlled by the applied voltage changing means 26.

従って、被加工物11自体や被加工物11に貼着されて被加工物を支持する保護部材等に厚みばらつきがあっても、被加工物11の上面11aを平坦(面一)に保持することができる。   Therefore, even when the workpiece 11 itself or a protective member that is attached to the workpiece 11 and supports the workpiece has a thickness variation, the upper surface 11a of the workpiece 11 is held flat (equal). be able to.

2 保持テーブル(チャックテーブル)
4 枠体
6 吸引保持部
8 小域保持部
10 ピエゾアクチュエータ
12 吸引路
14 共通吸引路
16 電磁切換弁
18 吸引源
20,22 電極
24 電源
26 印加電圧変更手段
28 高さ位置検出器
2 Holding table (chuck table)
4 Frame body 6 Suction holding section 8 Small area holding section 10 Piezo actuator 12 Suction path 14 Common suction path 16 Electromagnetic switching valve 18 Suction source 20, 22 Electrode 24 Power supply 26 Applied voltage changing means 28 Height position detector

Claims (3)

被加工物を保持する吸引保持部を有する保持テーブルであって、
該吸引保持部が被加工物を局所的に保持する複数の小域保持部に分割されており、
該複数の小域保持部の高さ位置をそれぞれ変更する複数の高さ位置変更手段と、
一端が該複数の小域保持部にそれぞれ開口するとともに他端が吸引源に接続された吸引路と、
を備えたことを特徴とする保持テーブル。
A holding table having a suction holding unit for holding a workpiece,
The suction holding unit is divided into a plurality of small region holding units that locally hold the workpiece,
A plurality of height position changing means for respectively changing the height positions of the plurality of small area holding units;
A suction path having one end opened to each of the plurality of small area holding portions and the other end connected to a suction source;
A holding table characterized by comprising:
前記高さ位置検出手段はピエゾアクチュエータから構成される請求項1記載の保持テーブル。   The holding table according to claim 1, wherein the height position detecting means is constituted by a piezo actuator. 請求項1又は2記載の保持テーブルで被加工物を保持する保持方法であって、
被加工物を該保持テーブル上に載置して吸引保持する保持ステップと、
該保持テーブルに保持された被加工物の上面高さ位置を複数点において検出する高さ位置検出ステップと、
該高さ位置検出ステップを実施した後、前記高さ位置変更手段で前記小域保持部の高さ位置を変更して被加工物の上面高さを面一とする高さ位置変更ステップと、
を含むことを特徴とする保持方法。
A holding method for holding a workpiece with the holding table according to claim 1 or 2,
A holding step of placing the workpiece on the holding table and holding the workpiece by suction;
A height position detecting step for detecting the upper surface height position of the workpiece held by the holding table at a plurality of points;
After performing the height position detecting step, the height position changing step of changing the height position of the small area holding portion by the height position changing means to make the upper surface height of the workpiece flush with each other,
The holding method characterized by including.
JP2012221057A 2012-10-03 2012-10-03 Holding table and holding method Pending JP2014075408A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017054973A (en) * 2015-09-10 2017-03-16 株式会社ディスコ Processing device
JP2019107729A (en) * 2017-12-18 2019-07-04 株式会社ディスコ Holding table and polishing device provided with holding table
CN110193774A (en) * 2018-02-27 2019-09-03 株式会社迪思科 Processing unit (plant)
JP2019160860A (en) * 2018-03-08 2019-09-19 株式会社ディスコ Chuck table and machining apparatus having the same

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JPS61292918A (en) * 1985-06-21 1986-12-23 Hitachi Ltd Sheet flattening chuck
JPS6386430A (en) * 1986-09-30 1988-04-16 Toshiba Corp Pattern transferring method
JPS63260129A (en) * 1987-04-17 1988-10-27 Hitachi Electronics Eng Co Ltd Aligner
JPH07174993A (en) * 1993-07-21 1995-07-14 Daewoo Electron Co Ltd Electro-displacive actuated mirror array used in optical-projection type system
JP2004087943A (en) * 2002-08-28 2004-03-18 Sony Corp Chucking apparatus and method for semiconductor wafer
JP2011097027A (en) * 2009-09-29 2011-05-12 Denso Corp Method and device for forming metal electrode of semiconductor device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61292918A (en) * 1985-06-21 1986-12-23 Hitachi Ltd Sheet flattening chuck
JPS6386430A (en) * 1986-09-30 1988-04-16 Toshiba Corp Pattern transferring method
JPS63260129A (en) * 1987-04-17 1988-10-27 Hitachi Electronics Eng Co Ltd Aligner
JPH07174993A (en) * 1993-07-21 1995-07-14 Daewoo Electron Co Ltd Electro-displacive actuated mirror array used in optical-projection type system
JP2004087943A (en) * 2002-08-28 2004-03-18 Sony Corp Chucking apparatus and method for semiconductor wafer
JP2011097027A (en) * 2009-09-29 2011-05-12 Denso Corp Method and device for forming metal electrode of semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017054973A (en) * 2015-09-10 2017-03-16 株式会社ディスコ Processing device
JP2019107729A (en) * 2017-12-18 2019-07-04 株式会社ディスコ Holding table and polishing device provided with holding table
JP7104512B2 (en) 2017-12-18 2022-07-21 株式会社ディスコ Polishing device with holding table and holding table
CN110193774A (en) * 2018-02-27 2019-09-03 株式会社迪思科 Processing unit (plant)
JP2019160860A (en) * 2018-03-08 2019-09-19 株式会社ディスコ Chuck table and machining apparatus having the same
JP7184525B2 (en) 2018-03-08 2022-12-06 株式会社ディスコ Chuck table and processing equipment with chuck table

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