JP2014059497A - Variable wavelength interference filter, optical filter device, optical module, electronic equipment, and mems device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a variable wavelength interference filter, an optical filter device, an optical module, electronic equipment and a MEMS device in which electrostatic attraction force is generated between electrodes in a well balanced manner.SOLUTION: A variable wavelength interference filter 5 includes, in a movable substrate 51, an annular-shaped inner movable electrode 542, outer movable partial electrodes 543A, 543B which are coaxial with the inner movable electrode 542, inner movable connection wires 545A, 545B extending from the inner movable electrode 542 through between the outer movable partial electrodes 543A, 543B, and outer movable connection wires 546A, 546B extending from the outer movable partial electrodes 543A, 543B. The outer movable connection wires 546A, 546B and the inner movable connection wires 545A, 545B are each arranged at equal angular interval around a center point O of the plane.

Description

  The present invention relates to a tunable interference filter, an optical filter device, an optical module, an electronic apparatus, and a MEMS device.

2. Description of the Related Art Conventionally, there is known a device that includes a pair of opposing substrates and a gap changing unit that changes the gap between the substrates, and is configured to be able to change the gap between the substrates.
An example of such a device is a wavelength variable interference filter that has a pair of reflective films facing each other and changes the distance between the reflective films to extract light of a predetermined wavelength from the light to be measured (for example, , See Patent Document 1).

  The wavelength tunable interference filter described in Patent Document 1 includes a first substrate and a second substrate facing each other, a reflective film disposed on each substrate and facing each other through a gap, and a substrate disposed on each substrate and each other. And an opposing electrode. In such a wavelength tunable interference filter, by applying a voltage between the electrodes, it is possible to deform the second substrate and adjust the gap between the reflective films.

JP 2011-106936 A

By the way, in the wavelength variable interference filter of Patent Document 1, the gap between the reflective films is controlled by electrostatic attraction generated between a pair of electrodes included in one electrostatic actuator composed of a pair of electrodes.
Furthermore, in order to control the gap between the reflection films with higher accuracy using electrostatic attraction, there is a wavelength variable interference filter including two pairs of electrodes, that is, including an electrostatic actuator having a double electrode configuration. As a tunable interference filter having a double electrode configuration, one substrate is provided with an annular inner electrode, a C-shaped outer electrode, and an inner electrode lead line passing through a C-shaped opening of the outer electrode, A configuration is conceivable in which the other substrate is provided with an inner electrode and an outer electrode facing each of the inner electrode and the outer electrode provided on one substrate.

  However, when the potential difference between the pair of inner electrodes is controlled to be different from the potential difference between the pair of outer electrodes, a region including the C-shaped opening portion of the outer electrode provided on one substrate and a plan view of the substrate In the region located on the opposite side of FIG. That is, in the region including the C-shaped opening portion, the lead wire portion having the same potential as the inner electrode and the outer electrode face each other, so that a potential difference different from the opposite region where the pair of outer electrodes face each other is generated. ing. Thereby, there exists a possibility that the balance of the electrostatic attractive force applied between electrodes may worsen.

  An object of the present invention is to provide a variable wavelength interference filter, an optical filter device, an optical module, an electronic apparatus, and a MEMS device that can generate electrostatic attractive force in a balanced manner between substrates.

  The wavelength tunable interference filter of the present invention includes a first substrate, a second substrate facing the first substrate, a first reflective film provided on the first substrate, and provided on the second substrate. In a plan view of the second reflective film facing the one reflective film, the annular first inner electrode provided on the first substrate, and the first substrate and the second substrate viewed from the substrate thickness direction, Outside the first inner electrode of the first substrate, a plurality of first outer electrodes provided along a virtual circle that is concentric with the first inner electrode, and each having the same shape, and the plan view A plurality of outer peripheral edges of the first substrate extending from the outer peripheral edge of the first inner electrode to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A linear first inner connection electrode and an outer side of each first outer electrode in the plan view. A plurality of linear first outer connection electrodes extending from the edge to the outer peripheral side of the first substrate; and provided on the second substrate, and at least the first inner electrode and the first outer electrode in the plan view. A second electrode provided in a region overlapping with, the first inner connection electrode is provided at equiangular intervals with respect to a center point of the first inner electrode, and the first outer connection electrode is The first inner electrode is provided at equiangular intervals with respect to the center point of the first inner electrode.

The wavelength tunable interference filter of the present invention includes an annular first inner electrode, a plurality of first outer electrodes provided along a virtual circle that is concentric with the first inner electrode, and each formed in the same shape; A second electrode provided to face the region overlapping with the one inner electrode and the first outer electrode.
In the tunable interference filter configured as described above, by applying different voltages to the first inner electrode and the first outer electrode, the electrostatic attractive force generated between the first inner electrode and the second electrode, and the first The electrostatic attractive force generated between the one outer electrode and the second electrode can be made different. As a result, the gap between the first reflective film and the second reflective film (the gap between the reflective films) can be accurately changed to a desired gap amount.

Here, in the present invention, the first inner connection electrodes are provided at equiangular intervals with respect to the center of the first inner electrode. The first outer electrode is provided outside the first inner electrode and along a virtual circle that is concentric with the first inner electrode, and these first outer electrodes are formed in the same shape, They are provided at equiangular intervals with respect to the center point of the first inner electrode. Further, the first outer connection electrodes extend outward from the respective first outer electrodes, and these first outer connection electrodes are provided at equiangular intervals with respect to the center point of the first inner electrode. . On the other hand, the second electrode provided on the second substrate is provided in a region overlapping the first inner electrode and the second outer electrode in plan view.
In such a configuration, electrostatic attraction acts between the first inner electrode and the second electrode, and between the first outer electrode and the second electrode, and these regions are the center points of the first inner electrode. The regions are provided at equiangular intervals. In addition, since the first inner connection electrode and the first outer connection electrode are also provided at equiangular intervals, the electrostatic attraction generation regions generated by the connection electrodes are also regions provided at equiangular intervals. Therefore, when the gap between the reflective films is changed by the electrostatic attractive force, the electrostatic attractive force can be applied in a balanced manner to the center point of the first inner electrode. Thereby, the dimension of the gap between reflection films can be changed, maintaining the parallelism between board | substrates. That is, the dimension of the gap between the reflective films can be controlled with higher accuracy while maintaining the parallelism between the substrates.

In addition, internal stress may occur in the electrodes and connection electrodes provided on the substrate. If the internal stress is not balanced in the plan view of the substrate, the substrate bends with a different amount of deflection in the plan view, and the gap between the reflective films becomes non-uniform. There is a possibility that the gap between the reflective films cannot be adjusted with high accuracy.
In contrast, in the present invention, the first inner electrode has an annular shape, and the first outer electrode having the same shape is provided at equiangular intervals with respect to the center point of the first inner electrode. Furthermore, the first inner connection electrode and the first outer connection electrode are provided at equiangular intervals with respect to the center point of the first inner electrode.
In such a configuration, each of the first inner electrode, the first outer electrode, the first inner connection electrode, and the second outer connection electrode is provided in a region having symmetry with respect to the center point of the first inner electrode. Yes. Therefore, even if an internal stress is generated in the electrode or the connection electrode, the internal stress acts on a region having symmetry with respect to the center of the substrate (the center point of the first inner electrode), that is, acts in a balanced state. . Therefore, according to the said structure, the internal stress of each electrode and a connection electrode can be made to act with sufficient balance with respect to a substrate center. As a result, it is possible to suppress a decrease in the accuracy of the dimensional control of the gap between the reflective films due to the influence of the internal stress, and the dimension of the gap between the reflective films can be adjusted with higher accuracy while maintaining the parallelism between the substrates. .

  That is, the wavelength tunable interference filter of the present invention includes an electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode, and the first inner electrode, the first outer electrode, and the first inner connection. The internal stress due to the electrode and the first outer connection electrode can be applied to the substrate in a plan view in a plan view, and the dimension of the gap between the reflective films can be adjusted with higher accuracy while maintaining the parallelism between the substrates. it can.

  In the present invention, a pattern made of a conductor film provided on a substrate is referred to as an electrode. For example, at least one of the plurality of first inner connection electrodes is an extraction electrode for connecting to a power supply source in order to apply a voltage to the first inner electrode, and the other first inner connection electrodes are the extraction electrodes. It is a dummy electrode that does not function as an electrode. In the present invention, a pattern made of a conductor film provided on a substrate including such a dummy electrode is referred to as an electrode.

In the wavelength tunable interference filter of the present invention, the second electrode includes a second inner electrode provided in a region overlapping the first inner electrode, and a second outer electrode provided in a region overlapping the first outer electrode. The second outer electrode is preferably provided in a region that does not overlap the first inner connection electrode.
Thereby, an electrostatic attractive force is not generated between the second electrode and the first inner connection electrode, and regions where no electrostatic attractive force is generated are provided at equal intervals. When an electrostatic attractive force is generated between the first inner connection electrode and the second electrode, the gap between the reflective films is controlled in consideration thereof, that is, a voltage applied to the first inner electrode and the first outer electrode. Need to control. On the other hand, in the present invention, it is not necessary to consider this, and the gap between the reflective films is adjusted using electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode. be able to. Therefore, the gap between the reflective films can be adjusted with high accuracy.

In the variable wavelength interference filter according to the aspect of the invention, it is preferable that the second inner connection electrode is provided in a region that connects the second inner electrode and the second outer electrode and does not overlap the first inner connection electrode.
As described above, when the second inner connection electrode is disposed in the region that does not overlap with the first inner connection electrode, an electrostatic attractive force may be generated between the first inner connection electrode and the second inner connection electrode. In addition, the gap between the reflective films can be adjusted using the electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode. Therefore, the gap between the reflective films can be adjusted with higher accuracy.

In the wavelength tunable interference filter of the present invention, the first substrate is provided with the first reflective film, the first inner electrode, and the first outer electrode, and a movable portion that moves forward and backward with respect to the second substrate; It is preferable to include a holding portion that is connected to an outer peripheral edge of the movable portion and holds the movable portion so as to be movable back and forth with respect to the second substrate.
In this way, the first substrate is configured as a movable substrate having a movable portion that moves forward and backward with respect to the second substrate. As described above, the first substrate, which is a movable substrate, is configured to have symmetry in plan view, and the electrostatic attraction generated between the first inner electrode, the first outer electrode, and the second electrode, and the first Internal stress due to the inner electrode, the first outer electrode, the first inner connection electrode, and the first outer connection electrode acts on a region having symmetry in plan view. Therefore, the electrostatic attractive force and the internal stress can be applied to the substrates in a plan view in a plan view, and the dimension of the gap between the reflective films can be adjusted with higher accuracy while maintaining the parallelism between the substrates.

  The optical filter device of the present invention includes a first substrate, a second substrate facing the first substrate, a first reflective film provided on the first substrate, and provided on the second substrate, In the plan view of the second reflecting film, the first annular inner electrode provided on the first substrate, the first substrate, and the second substrate viewed from the substrate thickness direction, the first substrate of the first substrate Outside the one inner electrode, a plurality of first outer electrodes provided along a virtual circle that is concentric with the first inner electrode and formed in the same shape, respectively, in the plan view, the first substrate A plurality of linear first inner connections extending from the outer peripheral edge of the first inner electrode to the outer peripheral side of the first substrate through between the two first outer electrodes arranged along the virtual circle Electrode, in the plan view, from the outer periphery of each first outer electrode, A plurality of linear first outer connection electrodes extending to the outer peripheral side of the substrate and provided in the second substrate, and provided in a region overlapping at least the first inner electrode and the first outer electrode in the plan view. The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode, and the first outer connection electrode is a center point of the first inner electrode. A wavelength tunable interference filter provided at equiangular intervals, and a housing that houses the wavelength tunable interference filter, and at least partially includes a light guide that guides light to the wavelength tunable interference filter. It is characterized by providing.

  In the present invention, since the wavelength variable interference filter as described above is housed in the housing, the wavelength variable interference filter can be protected from an external impact. In addition, the housing can suppress the entry of charged particles from the outside, and can prevent each electrode and each connection electrode from being charged by the charged particles. Accordingly, it is possible to avoid the disadvantage that the electrostatic attraction balance is lost due to the influence of the Coulomb force due to charging, and to suppress the non-uniformity of the gap between the reflection films.

  The optical module of the present invention includes a first substrate, a second substrate facing the first substrate, a first reflection film provided on the first substrate, and a first reflection film provided on the second substrate. A second reflection film facing the film; an annular first inner electrode provided on the first substrate; and the first substrate and the second substrate in a plan view of the first substrate and the second substrate viewed from the substrate thickness direction. Outside the first inner electrode of the substrate, a plurality of first outer electrodes provided along one virtual circle that is concentric with the first inner electrode and formed in the same shape, and in the plan view, A plurality of linear shapes extending from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. The first inner connection electrode and the outer peripheral edge of each first outer electrode in the plan view A plurality of linear first outer connection electrodes extending to the outer peripheral side of the first substrate and provided on the second substrate, and overlap at least the first inner electrode and the first outer electrode in the plan view. A second electrode provided in a region; and a detection unit that detects light extracted by the first reflective film and the second reflective film, wherein the first inner connection electrode is formed of the first inner electrode. The first outer connection electrodes are provided at equiangular intervals with respect to the center point, and the first outer connection electrodes are provided at equiangular intervals with respect to the center point of the first inner electrode.

  In the present invention, the optical module has the same configuration as the wavelength variable interference filter as described above. Thereby, the electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode, and the first inner electrode, the first outer electrode, the first inner connection electrode and the first outer connection electrode. The internal stress can be applied to the substrates in a balanced manner in a plan view, and the dimension of the gap between the reflective films can be adjusted with higher accuracy while maintaining the parallelism between the substrates.

  The electronic device according to the present invention includes a first substrate, a second substrate facing the first substrate, a first reflective film provided on the first substrate, and provided on the second substrate and facing the first reflective film. The first reflective electrode, the annular first inner electrode provided on the first substrate, the first substrate, and the second substrate in the plan view of the first substrate and the second substrate viewed from the substrate thickness direction. Outside the inner electrode, a plurality of first outer electrodes provided along one virtual circle that is concentric with the first inner electrode and formed in the same shape, respectively, in the plan view, the first substrate A plurality of linear first inner connection electrodes extending from the outer peripheral edge of the first inner electrode to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. The outer peripheral side of the first substrate from the outer peripheral edge of each first outer electrode in the plan view A plurality of linear first outer connection electrodes that extend, and a second electrode that is provided on the second substrate and that is provided in a region overlapping at least the first inner electrode and the first outer electrode in the plan view. The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode, and the first outer connection electrode is equiangular with respect to the center point of the first inner electrode. A variable wavelength interference filter provided at intervals, and a control unit that controls the variable wavelength interference filter are provided.

Here, as an electronic device, based on the light extracted by the first reflective film and the second reflective film, a light measuring device that analyzes the chromaticity, brightness, etc. of the measurement target light, detects the absorption wavelength of the gas. Examples thereof include a gas detection device that inspects the type of gas, and an optical communication device that acquires data contained in light of that wavelength from received light.
In the present invention, the electronic device has the same configuration as the wavelength variable interference filter as described above. Thereby, the electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode, and the first inner electrode, the first outer electrode, the first inner connection electrode and the first outer connection electrode. The internal stress can be applied to the substrates in a plan view in a plan view, and the dimension of the gap between the reflective films can be adjusted with higher accuracy while maintaining the parallelism between the substrates. Can be taken out. Therefore, various high-precision processes can be performed in the electronic device based on such light extracted with high resolution.

  The MEMS device of the present invention includes a first substrate, a second substrate facing the first substrate, an annular first inner electrode provided on the first substrate, the first substrate, and the second substrate. In plan view when viewed from the thickness direction of the substrate, a plurality of them are provided along one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate, and each has the same shape. The formed first outer electrode, and in the plan view, from the outer peripheral edge of the first inner electrode of the first substrate, between the two first outer electrodes arranged along the virtual circle, A plurality of linear first inner connection electrodes extending to the outer peripheral side of the first substrate, and a plurality of straight lines extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate in the plan view First outer connection electrode and the second substrate, the plan view And at least a second electrode provided in a region overlapping with the first inner electrode and the first outer electrode, and the first inner connection electrode is at a center point of the first inner electrode, etc. The first outer connection electrodes are provided at an angular interval, and the first outer connection electrodes are provided at an equal angular interval with respect to a center point of the first inner electrode.

Here, the MEMS device refers to, for example, a gap between the first substrate and the second substrate, such as a mirror device having a reflective film on the surface opposite to the surface facing the second substrate. The device is configured to be able to perform control to change the inter-substrate gap) or adjust the angle and orientation of the other substrate with respect to one substrate.
In the present invention, the MEMS device has the same electrode and connection electrode configuration as the wavelength variable interference filter as described above. Thereby, the electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode, and the first inner electrode, the first outer electrode, the first inner connection electrode and the first outer connection electrode. The internal stress can be applied to the substrate in a balanced manner in plan view. Therefore, the dimension of the gap between the first substrate and the second substrate can be changed uniformly in a plan view, or the angle between the first substrate and the second substrate can be adjusted. The positional relationship can be controlled with high accuracy.

1 is a diagram illustrating a schematic configuration of a color measurement device (electronic device) according to a first embodiment of the invention. The top view which shows schematic structure of the wavelength variable interference filter of 1st embodiment. FIG. 3 is a cross-sectional view of a wavelength tunable interference filter taken along line III-III in FIG. 2. The top view which looked at the movable substrate of the wavelength variable interference filter of the first embodiment from the fixed substrate side. The top view which looked at the fixed board | substrate of the wavelength variable interference filter of 1st embodiment from the movable substrate side. The top view which shows schematic structure of the wavelength variable interference filter of 2nd embodiment. The top view which looked at the movable substrate of the wavelength variable interference filter of the second embodiment from the fixed substrate side. The top view which looked at the fixed board | substrate of the wavelength variable interference filter of 2nd embodiment from the movable board | substrate side. Sectional drawing which shows schematic structure of the optical filter device of 3rd embodiment. Sectional drawing which shows schematic structure of the MEMS device of 4th embodiment. Schematic which shows the gas detection apparatus provided with the wavelength variable interference filter of this invention. The block diagram which shows the structure of the control system of the gas detection apparatus of FIG. The figure which shows schematic structure of the food analyzer provided with the wavelength variable interference filter of this invention. The schematic diagram which shows schematic structure of the spectroscopic camera provided with the wavelength variable interference filter of this invention.

[First embodiment]
Hereinafter, a first embodiment according to the present invention will be described with reference to the drawings.
[Overall configuration of color measuring device]
FIG. 1 is a diagram illustrating a schematic configuration of a color measurement device (electronic device) according to an embodiment of the present invention.
The color measuring device 1 is an electronic apparatus according to the present invention. As shown in FIG. 1, a light source device 2 that emits light to a measuring object A, a color measuring sensor 3 that is an optical module according to the present invention, and a color measuring device. And a control device 4 that controls the overall operation of the device 1. The colorimetric device 1 reflects the light emitted from the light source device 2 by the measurement object A, receives the reflected measurement object light by the colorimetry sensor 3, and outputs the light from the colorimetry sensor 3. This is an apparatus that analyzes and measures the chromaticity of the measurement target light, that is, the color of the measurement target A based on the detection signal.

[Configuration of light source device]
The light source device 2 includes a light source 21 and a plurality of lenses 22 (only one is shown in FIG. 1), and emits white light to the measurement target A. The plurality of lenses 22 may include a collimator lens. In this case, the light source device 2 converts the white light emitted from the light source 21 into parallel light by the collimator lens and measures from the projection lens (not shown). Inject toward A.
In the present embodiment, the colorimetric device 1 including the light source device 2 is illustrated. However, when the measurement target A is a light emitting member such as a liquid crystal panel, the light source device 2 may not be provided.

[Configuration of colorimetric sensor]
The colorimetric sensor 3 constitutes the optical module of the present invention. As shown in FIG. 1, the colorimetric sensor 3 includes a wavelength variable interference filter 5, a detection unit 31 that receives and detects light transmitted through the wavelength variable interference filter 5, and a drive voltage to the wavelength variable interference filter 5. And a voltage control unit 32 to be applied. Further, the colorimetric sensor 3 includes an incident optical lens (not shown) that guides the reflected light (measurement target light) reflected by the measurement target A at a position facing the wavelength variable interference filter 5. In the colorimetric sensor 3, the wavelength variable interference filter 5 separates light having a predetermined wavelength from the measurement target light incident from the incident optical lens, and the detected light is received by the detection unit 31.
The detection unit 31 includes a plurality of photoelectric exchange elements, and generates an electrical signal corresponding to the amount of received light. And the detection part 31 is connected to the control apparatus 4, and outputs the produced | generated electric signal to the control apparatus 4 as a light reception signal.

[Configuration of wavelength tunable interference filter]
FIG. 2 is a plan view showing a schematic configuration of the variable wavelength interference filter 5, and FIG. 3 is a cross-sectional view of the variable wavelength interference filter 5 taken along line III-III in FIG.
As shown in FIG. 2, the variable wavelength interference filter 5 is, for example, a planar square plate-like optical member. As shown in FIG. 3, the variable wavelength interference filter 5 includes a movable substrate 51 that is a first substrate of the present invention and a fixed substrate 52 that is a second substrate of the present invention. These two substrates 51 and 52 are each formed of, for example, various glasses such as soda glass, crystalline glass, quartz glass, lead glass, potassium glass, borosilicate glass, and alkali-free glass, or crystal. . The movable substrate 51 and the fixed substrate 52 are bonded to each other by the first bonding portion 513 of the movable substrate 51 and the second bonding portion 523 of the fixed substrate 52 formed of, for example, a plasma polymerized film mainly containing siloxane. By being joined by the film 53, it is configured integrally.

The movable substrate 51 is provided with a movable reflective film 56 constituting the first reflective film of the present invention, and the fixed substrate 52 is provided with a fixed reflective film 57 constituting the second reflective film of the present invention. Here, the movable reflective film 56 is fixed to the surface of the movable substrate 51 facing the fixed substrate 52, and the fixed reflective film 57 is fixed to the surface of the fixed substrate 52 facing the movable substrate 51. Further, the movable reflective film 56 and the fixed reflective film 57 are arranged to face each other with a predetermined gap G between the reflective films.
Further, an electrostatic actuator 54 used for adjusting the size of the gap G between the movable reflective film 56 and the fixed reflective film 57 is provided between the movable substrate 51 and the fixed substrate 52. The electrostatic actuator 54 includes a movable electrode 541 provided on the movable substrate 51 side and a fixed electrode 551 provided on the fixed substrate 52 side. Here, the electrodes 541 and 551 may be provided directly on the substrate surfaces of the movable substrate 51 and the fixed substrate 52, respectively, or may be provided via other film members.
Further, when the wavelength variable interference filter 5 is viewed from the movable substrate 51 side in the substrate thickness direction of the movable substrate 51 (fixed substrate 52) as shown in FIG. Coincides with the center point of the movable reflective film 56 and the fixed reflective film 57, and coincides with the center point of the movable part 511 described later.
In the following description, the wavelength tunable interference filter 5 was seen from a plan view seen from the thickness direction of the movable substrate 51 or the fixed substrate 52, that is, from the stacking direction of the movable substrate 51, the bonding film 53, and the fixed substrate 52. The plan view is referred to as a filter plan view.

[Configuration of movable substrate]
FIG. 4 is a plan view of the movable substrate 51 in the variable wavelength interference filter 5 of the first embodiment as viewed from the fixed substrate 52 side.
The movable substrate 51 is formed, for example, by processing a glass base material by etching.
Specifically, the movable substrate 51 has a circular movable portion 511 centered on the substrate center point (plane center point O), and coaxial with the movable portion 511 in the filter plan view as shown in FIGS. And a holding portion 512 that holds the movable portion 511.
2 and 4, the movable substrate 51 includes a notch 514 at the position of the vertex T3, and the fixed electrode pad 557P is exposed on the movable substrate 51 side of the wavelength variable interference filter 5.

The movable part 511 is formed to have a thickness dimension larger than that of the holding part 512. For example, in this embodiment, the movable part 511 is formed to have the same dimension as the thickness dimension of the movable substrate 51. The movable portion 511 includes a movable surface 511A parallel to the reflective film installation portion 522, and the movable reflective film 56 and the movable electrode 541 are provided on the movable surface 511A.
The movable substrate 51 may have a configuration in which an antireflection film (AR) is provided at a position corresponding to the movable reflective film 56 on the surface of the movable portion 511 opposite to the fixed substrate 52. This antireflection film is formed by alternately laminating low refractive index films and high refractive index films, and reduces the reflectance of visible light on the surface of the movable substrate 51 and increases the transmittance.

The movable reflective film 56 is provided at the center of the movable surface 511 </ b> A of the movable part 511 so as to face the fixed reflective film 57 with the gap G between the reflective films. As the movable reflective film 56, for example, a metal film such as Ag or an alloy film such as an Ag alloy can be used. For example, a dielectric multilayer film in which the high refractive layer is TiO ₂ and the low refractive layer is SiO ₂ may be used. Further, a reflective film in which a metal film (or alloy film) is laminated on a dielectric multilayer film, a reflective film in which a dielectric multilayer film is laminated on a metal film (or alloy film), a single refractive layer (TiO ₂ or SiO ₂₎ and a metal film (or alloy film) and the like may be used reflective film formed by laminating a.

The holding portion 512 is an annular diaphragm that surrounds the periphery of the movable portion 511, and is formed with less rigidity in the thickness direction than the movable portion 511.
For this reason, the holding part 512 is more easily bent than the movable part 511, and can be bent toward the fixed substrate 52 by a slight electrostatic attraction. At this time, the movable portion 511 has a thickness dimension larger than that of the holding portion 512, and the rigidity is increased. Therefore, even when a force that bends the movable substrate 51 by electrostatic attraction acts, the movable portion 511 is hardly bent. The bending of the movable reflective film 56 formed on the movable portion 511 can also be prevented.

As shown in FIG. 4, the movable electrode 541 includes an annular inner movable electrode 542 centered on the plane center point O, and the circumference of one virtual circle P outside the inner movable electrode 542 in the filter plan view. The outer movable electrode 543 is arranged along the outer periphery. The inner movable electrode 542 constitutes the first inner electrode of the present invention, and the outer movable electrode 543 constitutes the first outer electrode of the present invention.
Here, the inner movable electrode 542 is connected to inner movable connection lines 545A and 545B constituting the first inner connection electrode of the present invention. These inner movable connection lines 545A and 545B are arranged along a virtual straight line L1 passing through the plane center point O in the filter plan view, and have a linear shape. In other words, as shown in FIG. 4, the pair of inner movable connection lines 545A and 545B are spaced by 180 degrees along the circumferential direction of the inner movable electrode 542, that is, along the circumferential direction of the inner movable electrode 542. Arranged at equiangular intervals.

The inner movable connection line 545A extends from the outer peripheral edge of the inner movable electrode 542 in the direction of the vertex T1, and a movable electrode pad 547P1 connected to the voltage control unit 32 is provided at the tip.
On the other hand, the inner movable connection line 545B extends from the outer peripheral edge of the outer movable electrode 543 in the direction of the vertex T3, and the tip thereof is located outside the outer edge of the holding portion 512 in the filter plan view. Specifically, the distal end portion of the inner movable connection line 545B protrudes from the outer edge of the reflective film installation portion 522 by a predetermined length, for example, a length about the thickness of the holding portion 512.

Compared to the configuration in which the inner movable connection line 545A is provided over the inside and outside of the holding portion 512, the inner movable connection line 545B is sufficient for the outer peripheral edge of the holding portion 512 or when the inner movable connecting line 545B does not extend to the outside of the holding portion 512. When the holding portion 512 is bent, the restoring force related to the inner movable connection line 545A is different from the restoring force related to the inner movable connection line 545B, and the bending of the holding portion 512 is unbalanced. There is a risk of becoming. On the other hand, in the said structure, when the holding | maintenance part 512 bends, the stress which concerns on the inner side movable connection lines 545A and 545B becomes substantially equivalent, and the holding | maintenance part 512 can be bent with sufficient balance.
That is, the predetermined length is long enough for the restoring force related to the inner movable connecting line 545A provided over the inside and outside of the holding portion 512 and the restoring force related to the inner movable connecting line 545B to be substantially equal. That is, it depends on the thickness of the holding portion 512 and the shape of the inner movable connecting line 545B.

  The inner movable connection line 545B may be drawn to the outer peripheral side of the movable substrate 51, like the inner movable connection line 545A. The inner movable connection line 545B may also be connected to the voltage control unit 32 via the electrode pad on the outer peripheral portion of the movable substrate 51. Further, in this case, for example, one of the inner movable connection lines 545A and 545B may be used as a drive voltage application electrode and the other may be used as a capacitance detection amount electrode.

  Here, although the inner movable connection lines 545A and 545B constitute the first inner connection electrode of the present invention, in this specification, a part of a pattern made of a conductor film provided on each of the substrates 51 and 52 and All are also referred to as electrodes. For example, the inner movable connection line 545A is a lead electrode connected to the movable electrode pad 547P1 in order to apply a voltage to the inner movable electrode 542. On the other hand, the inner movable connection line 545B is a dummy electrode that is not connected to the movable electrode pad 547P1, that is, does not function as an extraction electrode. That is, in this specification, a part and all of the pattern made of the conductor film provided on the substrate including such a dummy electrode is also referred to as an electrode.

The outer movable electrode 543 includes a plurality of arc-shaped outer movable partial electrodes 543A and 543B along the circumference of the virtual circle P with the plane center point O as the center. Each of these outer movable partial electrodes 543A and 543B constitutes a first outer electrode of the present invention. As shown in FIG. 4, the vertex T2 side is the outer movable partial electrode 543A, and the vertex T4 side is the outer movable partial electrode 543B.
In the present embodiment, the outer movable partial electrodes 543A and 543B are formed in the same shape in the filter plan view. Further, the outer movable partial electrodes 543A and 543B are provided so that the respective gravity center points G _a1 and G _b1 are equiangularly spaced (180 degrees apart) on the circumference of the virtual circle P.
Further, on the circumference of the virtual circle P, there are first separation portions 544A and 544B between the outer movable partial electrodes 543A and 543B, and the inner movable connection lines 545A and 545B are not in contact with the outer movable electrode 543, respectively. Is provided. That is, the first separation portion 544A and the first separation portion 544B are present at an interval of 180 degrees along the circumferential direction of the outer movable electrode 543 at a position where the virtual circle P and the virtual straight line L1 intersect.

  The outer movable electrode 543 is connected to outer movable connection lines 546A and 546B constituting the first outer connection electrode of the present invention. The pair of outer movable connection lines 546A and 546B are disposed along a virtual straight line L2 that passes through the plane center point O and is orthogonal to the virtual straight line L1 in the filter plan view, and have a linear shape. In other words, as shown in FIG. 4, the outer movable connection lines 546A and 546B are spaced at an interval of 180 degrees along the circumferential direction of the outer movable electrode 543, that is, equiangular along the circumferential direction of the outer movable electrode 543. Arranged at intervals. The outer movable connection lines 546A and 546B are disposed at positions that divide the angle formed by the inner movable connection line 545A and the inner movable connection line 545B into equal angles (90 degrees), respectively.

The outer movable connection line 546A extends from the outer peripheral edge of the outer movable electrode 543 in the direction of the apex T2, and a movable electrode pad 547P2 connected to the voltage control unit 32 is provided at the tip.
Further, the outer movable connection line 546B extends from the outer peripheral edge of the outer movable electrode 543 toward the vertex T4. A movable electrode pad 547P3 connected to the voltage control unit 32 is provided at the apex T4 at the tip of the outer movable connection line 546B.

In such a configuration, the outer movable partial electrodes 543A and 543B have the same shape and are in a line-symmetric relationship with each other with respect to the virtual straight line L1 passing through the first separation portions 544A and 544B. Each of the outer movable partial electrodes 543A and 543B has a shape that is line-symmetric with respect to the virtual straight line L2.
Further, in the movable region Ar1 including the movable portion 511 and the holding portion 512 where the movable substrate 51 is deformed, the conductor portion composed of the movable electrode 541, the inner movable connection lines 545A and 545B, and the outer movable connection lines 546A and 546B is a filter plane. In view, it has a shape symmetrical about the virtual straight lines L1 and L2 with the plane center point O as the center. The conductor portion has a point-symmetric shape with respect to the plane center point O in the movable region Ar1.
Note that an insulating film (not shown) for preventing discharge between the movable electrode 541 and the fixed electrode 551 is laminated on the movable electrode 541.

[Configuration of fixed substrate]
FIG. 5 is a plan view of the fixed substrate 52 in the variable wavelength interference filter 5 of the first embodiment as viewed from the movable substrate 51 side.
The fixed substrate 52 is formed by processing a glass base material, for example. Specifically, as illustrated in FIG. 3, the electrode placement groove 521 and the reflective film installation portion 522 are formed on the fixed substrate 52 by etching. The fixed substrate 52 is formed to have a thickness larger than that of the movable substrate 51, and the fixed substrate 52 has an electrostatic attraction when a voltage is applied between the movable electrode 541 and the fixed electrode 551 and internal stress of the fixed electrode 551. There is no deflection.
Further, a notch 524 is formed at the apex T1 (see FIG. 2) of the fixed substrate 52, and the movable electrode pad 547P1 is exposed on the fixed substrate 52 side of the variable wavelength interference filter 5. Similarly, notches 524 are formed at the vertices T2 and T4, and the movable electrode pads 547P2 and 547P3 are exposed, respectively.

As shown in FIG. 5, the electrode placement groove 521 is formed in a circular shape centered on the plane center point O of the fixed substrate 52 in the filter plan view. The reflection film installation portion 522 is formed to protrude from the center portion of the electrode placement groove 521 toward the movable substrate 51 in the filter plan view. Here, the groove bottom surface of the electrode placement groove 521 is an electrode installation surface 521A on which the fixed electrode 551 is disposed. Further, the protruding front end surface of the reflection film installation portion 522 becomes a reflection film installation surface 522A.
In addition, the fixed substrate 52 is provided with an electrode extraction groove 521B extending from the electrode arrangement groove 521 toward the vertex T1, the vertex T2, and the vertex T4 of the outer peripheral edge of the fixed substrate 52. Further, an electrode lead-out groove 521C is also provided between the apex T3 and the apex T4.

The electrode placement surface 521A of the electrode placement groove 521 is provided with a fixed electrode 551 that constitutes the second electrode of the present invention.
This fixed electrode 551 has an inner fixed electrode 552 constituting the second inner electrode of the present invention and an outer fixed electrode 553 constituting the second outer electrode of the present invention, and is disposed in a region facing the movable electrode 541. Is done.
As shown in FIG. 5, the inner fixed electrode 552 has an annular shape centered on the plane center point O, and has the same shape as the inner movable electrode 542. The inner fixed electrode 552 is disposed so as to face the inner movable electrode 542.

The outer fixed electrode 553 includes a plurality of arc-shaped outer fixed partial electrodes 553A and 553B along the circumference of the virtual circle P with the plane center point O as the center. Each of these outer fixed partial electrodes 553A and 553B constitutes a second outer electrode of the present invention. As shown in FIG. 5, the vertex T2 side is the outer movable partial electrode 543A, and the vertex T4 side is the outer movable partial electrode 543B.
In the present embodiment, the outer fixed partial electrodes 553A and 553B are formed in the same shape in the filter plan view. Further, the outer fixed partial electrodes 553A and 553B are provided so that the respective center-of-gravity points G _a2 and G _b2 are equiangularly spaced (180 degrees apart) on the circumference of the virtual circle P.
Further, on the circumference of the virtual circle P, the second separation portions 554A and 554B exist between the outer fixed partial electrodes 553A and 553B. That is, the second separation portion 554A and the second separation portion 554B are present at an interval of 180 degrees along the circumferential direction of the outer movable electrode 543 at a position where the virtual circle P and the virtual straight line L1 intersect.

Here, the outer fixed partial electrode 553A and the outer fixed partial electrode 553B are provided to face and overlap the outer movable partial electrode 543A, respectively. Accordingly, the first separation portion 544A and the first separation portion 544B are located at positions overlapping the second separation portion 554A and the second separation portion 554B, respectively.
That is, the inner movable connection lines 545A and 545B provided on the movable substrate 51 extend through the existence areas of the first separation portions 544A and 544B corresponding to the second separation portions 554A and 554B. Accordingly, the outer fixed partial electrode 553A is provided in a region that does not overlap with the inner movable connection lines 545A and 545B.
Note that an insulating film (not shown) for preventing discharge between the movable electrode 541 and the fixed electrode 551 is laminated on these fixed electrodes 551.

  Here, the inner fixed electrode 552 and the outer fixed electrode 553 are connected by inner fixed connection lines 555A and 555B constituting the second inner connection electrode of the present invention. These inner fixed connection lines 555A and 555B have a linear shape along the virtual straight line L2 in the filter plan view, and connect the fixed electrode 551 and the inner fixed electrode 552. In other words, as shown in FIG. 5, the inner fixed connection lines 555A and 555B are arranged at equal angular intervals that are 180 degrees along the circumferential direction of the inner fixed electrode 552. Further, the inner fixed connection lines 555A and 555B are provided in regions (positions that do not face each other) that do not overlap with the inner movable connection lines 545A and 545B disposed on the movable substrate 51 along the virtual straight line L1. The inner movable connection lines 545A and 545B may not be along the virtual straight line L2, and may be provided at least in a region that does not overlap with the inner movable connection lines 545A and 545B.

  The outer fixed electrode 553 is connected to outer fixed connection lines 556A and 556B. The outer fixed connection lines 556A and 556B are arranged along the virtual straight line L2 in the filter plan view and have a straight line shape. In other words, as shown in FIG. 5, the outer fixed connection lines 556 </ b> A and 556 </ b> B are arranged at an interval of 180 degrees along the circumferential direction of the outer fixed electrode 553, that is, at an equal angular interval. The outer fixed connection lines 556A and 556B are disposed at positions facing the outer movable connection lines 546A and 546B disposed on the movable substrate 51 along the virtual straight line L2.

The outer fixed connection line 556 </ b> A extends from the outer peripheral edge of the outer fixed electrode 553 in the direction of the vertex T <b> 2, and the distal end portion thereof is located outside the outer edge of the reflective film installation portion 522 in the filter plan view.
The outer fixed connection line 556B extends from the outer peripheral edge of the outer fixed electrode 553 in the direction of the vertex T4. Further, the outer fixed connection line 556B passes through the electrode lead-out groove 521C and extends from the periphery of the vertex T4 in the direction of the vertex T3. A fixed electrode pad 557P connected to the voltage control unit 32 is provided at the apex T3 at the tip of the outer fixed connection line 556B.

The length of the outer fixed connection line 556A in the virtual straight line L2 direction is not limited to the above length. In the present embodiment, in the movable region Ar1, the outer movable connection line 546A and the outer fixed connection line 556A face each other, the outer movable connection line 546B and the outer fixed connection line 556B face each other, and these are opposed to each other. Should be provided symmetrically, that is, at equiangular intervals.
Further, the outer fixed connection line 556A may be drawn to the outer peripheral side of the fixed substrate 52, similarly to the outer fixed connection line 556B. Also, the outer fixed connection line 556A may be connected to the voltage control unit 32 via the electrode pad on the outer peripheral portion of the fixed substrate 52. Further, in this case, for example, one of the outer fixed connection lines 556A and 556B may be used as the drive voltage application electrode and the other as the capacitance detection amount electrode.

In such a configuration, the outer fixed partial electrodes 553A and 553B have the same shape, and are in a line-symmetric relationship with each other with respect to the virtual straight line L1 passing through the second separation portions 554A and 554B. Also, each of the outer fixed partial electrodes 553A and 553B has a shape that is line-symmetric with respect to the virtual straight line L2.
Further, in the movable region Ar1, the conductor portion composed of the fixed electrode 551, the inner fixed connection lines 555A and 555B, and the outer fixed connection lines 556A and 556B is centered on the plane center point O in the filter plan view, and the virtual straight line L1, It has a line-symmetric shape with respect to L2. The conductor portion has a point-symmetric shape with respect to the plane center point O in the movable region Ar1.
Note that an insulating film (not shown) for preventing discharge between the movable electrode 541 and the fixed electrode 551 is laminated on these fixed electrodes 551.

  As described above, the reflection film installation portion 522 is formed in a columnar shape that is coaxial with the electrode arrangement groove 521 and has a smaller diameter than the electrode arrangement groove 521. In the present embodiment, as shown in FIG. 3, an example in which the reflective film installation surface 522A facing the movable substrate 51 of the reflective film installation unit 522 is formed closer to the movable substrate 51 than the electrode installation surface 521A is formed. However, it is not limited to this. The height positions of the electrode installation surface 521A and the reflection film installation surface 522A are the dimensions of the gap G between the reflection films, the dimensions between the movable electrode 541 and the fixed electrode 551, the thickness dimensions of the movable reflection film 56 and the fixed reflection film 57, and the measurement. It is set as appropriate depending on the target wavelength range. Therefore, for example, a configuration in which the electrode installation surface 521A and the reflection film installation surface 522A are formed on the same surface, or a reflection film fixing groove on the cylindrical concave groove is formed at the center of the electrode installation surface 521A. A configuration in which a reflecting film fixing surface is formed on the bottom surface of the groove may be employed.

A fixed reflective film 57 formed in a circular shape is fixed to the reflective film installation surface 522A. As the fixed reflection film 57, a reflection film having the same configuration as that of the movable reflection film 56 described above is used.
Further, similarly to the movable substrate 51, the fixed substrate 52 may be provided with an antireflection film (AR) at a position corresponding to the fixed reflective film 57 on the surface opposite to the surface facing the movable substrate 51. . This antireflection film is formed by alternately laminating low refractive index films and high refractive index films, and reduces the reflectance of visible light on the surface of the fixed substrate 52 and increases the transmittance.

  Of the surface of the fixed substrate 52 that faces the movable substrate 51, the surface on which the electrode placement groove 521, the reflective film installation portion 522, the electrode extraction groove 521B, and the electrode extraction groove 521C are not formed by etching is the second bonding portion. 523 is configured. As described above, the second bonding portion 523 is bonded to the first bonding portion 513 of the movable substrate 51 via the bonding film 53.

[Configuration of voltage control means]
The voltage control unit 32 controls the voltage applied to the electrostatic actuator 54 based on the control signal input from the control device 4. Specifically, the voltage control unit 32 sets the fixed electrode 551 to the ground potential and applies a driving voltage to the movable electrode 541.

[Configuration of control device]
The control device 4 controls the overall operation of the color measurement device 1.
As the control device 4, for example, a general-purpose personal computer, a portable information terminal, other color measurement dedicated computer, or the like can be used.
As shown in FIG. 1, the control device 4 includes a light source control unit 41, a colorimetric sensor control unit 42, a colorimetric processing unit 43 that constitutes an analysis processing unit of the present invention, and the like.
The light source control unit 41 is connected to the light source device 2. Then, the light source control unit 41 outputs a predetermined control signal to the light source device 2 based on, for example, a user setting input, and causes the light source device 2 to emit white light with a predetermined brightness.
The colorimetric sensor control unit 42 is connected to the colorimetric sensor 3. The colorimetric sensor control unit 42 sets a wavelength of light received by the colorimetric sensor 3 based on, for example, a user's setting input, and outputs a control signal for detecting the amount of light received at this wavelength. Output to the colorimetric sensor 3. Accordingly, the voltage control unit 32 of the colorimetric sensor 3 sets the voltage applied to the electrostatic actuator 54 so as to transmit only the wavelength of light desired by the user, based on the control signal.
The colorimetric processing unit 43 analyzes the chromaticity of the measurement target A from the amount of received light detected by the detection unit 31.

[Operational effects of the first embodiment]
As described above, the variable wavelength interference filter 5 according to the embodiment includes the electrostatic actuator 54 that generates an electrostatic attractive force for moving the movable portion 511 toward and away from the fixed substrate 52. The electrostatic actuator 54 includes a movable electrode 541 provided on the movable substrate 51 and a fixed electrode 551 provided on the fixed substrate 52. In addition, the movable electrode 541 includes an annular inner movable electrode 542 and a plurality of outer movable partial electrodes 543A and 543B that are provided along a concentric circle with the inner movable electrode 542 and have the same shape. The fixed electrode 551 is provided so as to face a region overlapping with the movable electrode 541.
In the tunable interference filter 5 configured as described above, the fixed electrode 551 is set to the ground potential, the drive voltage is applied to the movable electrode 541, and the drive voltage is applied between the movable electrode 541 and the fixed electrode 551. An electrostatic attractive force is generated between the movable electrode 541 and the fixed electrode 551. By this electrostatic attraction, the inter-reflection film gap G between the movable reflection film 56 and the fixed reflection film 57 is changed. At this time, by applying different voltages to the inner movable electrode 542 and the outer movable electrode 543, electrostatic attraction generated between the inner movable electrode 542 and the fixed electrode 551, and between the outer movable electrode 543 and the fixed electrode 551. The electrostatic attractive force generated between them can be made different. As a result, the gap G between the reflection films can be accurately changed to a desired gap amount.

Here, in the wavelength variable interference filter 5, the linear inner movable connection lines 545 A and 545 B extending from the inner movable electrode 542 are provided at equal angular intervals with respect to the plane center point O. The linear outer movable connection lines 546A and 546B extending from the outer movable electrode 543 are provided at equal angular intervals with respect to the plane center point O. The fixed electrode 551 is provided so as to face a region overlapping with the movable electrode 541.
In such a configuration, between the inner movable electrode 542 and the fixed electrode 551, between the outer movable electrode 543 and the fixed electrode 551, between the outer movable connection line 546A and the outer fixed connection line 556A, and between the outer movable connection line 546B and the outer side. An electrostatic attractive force acts between the fixed connection lines 556B. The regions where the electrostatic attractive force is generated are regions provided at equiangular intervals with respect to the plane center point O (the center point of the inner movable electrode 542). Therefore, when the dimension of the gap G between the reflection films is changed by the electrostatic attractive force, the electrostatic attractive force can be applied to the plane center point O in a balanced manner. Thereby, the dimension of the gap G between reflection films can be changed, maintaining the parallelism between board | substrates. That is, the dimension of the gap G between the reflection films can be controlled with higher accuracy while maintaining the parallelism between the substrates.

  By the way, internal stress may occur in each electrode and connection line formed on the movable substrate 51. If this internal stress is not balanced in the plan view of the movable substrate 51, the holding portion 512 of the movable substrate 51 may be bent with different deflection amounts in the plan view, and the gap G between the reflection films may be non-uniform. is there. That is, since the internal stress acts on the unbalance in a plan view, the gap G between the reflection films may not be adjusted with high accuracy while maintaining the parallelism between the substrates.

On the other hand, in the variable wavelength interference filter 5, the inner movable electrode 542 has an annular shape, and the outer movable partial electrodes 543A and 543B having the same shape are provided at equal angular intervals with respect to the plane center point O. Further, the inner movable connection lines 545A and 545B and the outer movable connection lines 546A and 546B are provided at equiangular intervals with respect to the plane center point O.
In such a configuration, each of the inner movable electrode 542, the outer movable partial electrodes 543A and 543B, the inner movable connection lines 545A and 545B, and the outer movable connection lines 546A and 546B has symmetry with respect to the plane center point O. It is provided in the area. Therefore, even if an internal stress is generated in each electrode or connection line, the internal stress acts on a region having symmetry with respect to the plane center point O, resulting in a balanced state. Therefore, the internal stress of each electrode or connection electrode can be applied to the plane center point O in a balanced manner. As a result, it is possible to suppress a decrease in the accuracy of dimensional control of the gap G between the reflection films due to the influence of internal stress, and to adjust the dimension of the gap G between the reflection films with higher accuracy while maintaining the parallelism between the substrates. Can do.

  That is, in the wavelength variable interference filter 5, the electrostatic attractive force generated between the inner movable electrode 542 and the outer movable partial electrodes 543A and 543B and the fixed electrode 551, and the inner movable electrode 542 and the outer movable partial electrodes 543A and 543B. The internal stress caused by the inner movable connection lines 545A and 545B and the outer movable connection lines 546A and 546B can be applied to the substrates in a plan view in a balanced manner, and the gap G between the reflective films is maintained while maintaining the parallelism between the substrates. Can be adjusted with higher accuracy.

  Further, in the colorimetric sensor 3 provided with such a variable wavelength interference filter 5, the detection unit 31 can detect light that has been dispersed with high resolution, and an accurate light amount detection result can be obtained. Furthermore, the colorimetric device 1 can perform highly accurate colorimetric processing by performing colorimetry on the measuring object A based on the amount of light detected by the colorimetric sensor 3.

In the wavelength tunable interference filter 5, the outer fixed electrode 553 of the fixed electrode 551 has the second separation portions 554 </ b> A and 554 </ b> B in a region overlapping with the inner movable connection lines 545 </ b> A and 545 </ b> B.
Here, the inner movable connection lines 545A and 545B have the same potential as the inner movable electrode 542 facing the inner fixed electrode 552. That is, the inner movable connection lines 545A and 545B and the outer fixed electrode 553 are not in a relationship that should generate electrostatic attraction. On the other hand, since the electrostatic attraction force is not generated between the outer fixed electrode 553 and the inner movable connection lines 545A and 545B, it is not necessary to generate the electrostatic attraction by the above-described configuration. A desired electrostatic attractive force can be generated in the meantime, and the gap G between the reflection films can be adjusted with higher accuracy.

In the variable wavelength interference filter 5, the fixed electrode 551 includes an inner fixed electrode 552 provided in a region overlapping the inner movable electrode 542 and an outer fixed electrode 553 provided in a region overlapping the outer movable electrode 543. The outer fixed electrode 553 is provided in a region that does not overlap with the inner movable connection lines 545A and 545B.
Thereby, electrostatic attraction is not generated between the second electrode and the first inner connection line, and the electrostatic attraction generated between the first inner electrode and the first outer electrode and the second electrode is used. Thus, the gap G between the reflection films can be adjusted. Therefore, the gap G between the reflection films can be adjusted with high accuracy.
Thereby, since electrostatic attraction is not generated between the fixed electrode 551 and the inner movable connection lines 545A and 545B, it is possible to suppress generation of unbalanced electrostatic attraction between the substrates in plan view. it can.

  The wavelength variable interference filter 5 includes outer fixed connection lines 556A and 556B, and the outer fixed connection lines 556A and 556B are disposed in regions overlapping the outer movable connection lines 546A and 546B. Here, the outer movable connection lines 546A and 546B are arranged so as to divide the angle formed by the inner movable connection lines 545A and 545B into equal angular intervals, and have a shape that is line symmetric with respect to the virtual straight lines L1 and L2. . Similarly, the outer fixed connection lines 556A and 556B also have shapes that are line symmetric with respect to the virtual straight lines L1 and L2. The region of electrostatic attraction generated between the outer movable connection lines 546A and 546B and the outer fixed connection lines 556A and 556B also has symmetry in the filter plan view, so that the electrostatic attraction force is generated in a balanced manner in the plan view. Can do.

The variable wavelength interference filter 5 includes inner fixed connection lines 555A and 555B that connect the inner fixed electrode 552 and the outer fixed electrode 553 and are provided in a region that does not overlap with the inner movable connection lines 545A and 545B.
Thus, electrostatic attraction is not generated between the inner movable connection lines 545A and 545B and the inner fixed connection lines 555A and 555B, and the balance is achieved between the inner movable electrode 542 and the outer movable electrode 543 and the fixed electrode 551. Electrostatic attractive force can be generated well. Therefore, the gap G between the reflection films can be adjusted with higher accuracy.

The wavelength variable interference filter 5 includes a movable part 511 and a holding part 512.
As described above, the movable substrate 51 has a symmetrical electrode arrangement in plan view, the electrostatic attractive force generated between the inner movable electrode 542 and the outer movable partial electrodes 543A and 543B, and the fixed electrode 551, and the inner Internal stress on the movable substrate 51 by the movable electrode 542, the outer movable partial electrodes 543A and 543B, the inner movable connection lines 545A and 545B, and the outer movable connection lines 546A and 546B acts on a region having symmetry in plan view. Therefore, the electrostatic attractive force and the internal stress can be applied to the movable substrate 51 in a balanced manner in a plan view, and the dimension of the gap G between the reflection films can be adjusted with higher accuracy while maintaining the parallelism between the substrates. it can.

  Further, in the variable wavelength interference filter 5, the movable portion 511 has a circular shape and the holding portion 512 has an annular shape around the plane center point O in the filter plan view, and the inner movable connection lines 545A, 545B, and The outer movable connection lines 546A and 546B extend from the outer peripheral edge of the holding portion 512 so as to protrude at least by a predetermined length.

As described above, the movable portion 511 and the holding portion 512 are configured to be point-symmetric with respect to the plane center point O. Thereby, the restoring force from the holding | maintenance part 512 accompanying the displacement of the board | substrate thickness direction of the movable part 511 can be made to act with sufficient balance in filter planar view.
In the wavelength tunable interference filter 5, the inner movable connection lines 545 A and 545 B and the outer movable connection lines 546 A and 546 B are extended from the outer peripheral edge of the holding portion 512 by at least a predetermined length. The predetermined length is long enough for the restoring force related to the inner movable connecting line 545A provided over the inside and outside of the holding portion 512 and the restoring force related to the inner movable connecting line 545B to be substantially equal. is there.
Thereby, the position and magnitude | size of the internal stress provided with respect to the holding | maintenance part 512 from inner side movable connection line 545A, 545B and outer side movable connection line 546A, 546B are comprised so that it may have symmetry in filter planar view. can do.
Therefore, in the variable wavelength interference filter 5, electrostatic attractive force, internal stress, and restoring force having high symmetry in the filter plan view can be applied to the movable portion 511 and the holding portion 512. For this reason, the dimension of the gap G between the reflection films can be suppressed while maintaining the parallel relationship between the substrates, and a reduction in resolution can be suppressed.

[Second Embodiment]
Next, a second embodiment of the present invention will be described based on the drawings.
In the wavelength tunable interference filter 5 of the first embodiment described above, the outer movable electrode is composed of two partial electrodes, and each of the inner movable electrode 542, the outer movable electrode 543, the inner fixed electrode 552, and the outer fixed electrode 553 has two. A configuration with connecting lines is shown.
On the other hand, in the variable wavelength interference filter 5A of the second embodiment, the outer movable electrode includes three partial electrodes, and the inner movable electrode, the outer movable electrode, the inner fixed electrode, and the outer fixed electrode each have three connection lines. Is provided. Hereinafter, the configuration of such a wavelength variable interference filter 5A will be described in detail.
FIG. 6 is a plan view showing a schematic configuration of a variable wavelength interference filter 5A of the second embodiment. FIG. 7 is a plan view of the movable substrate 51 of the wavelength tunable interference filter 5A as viewed from the fixed substrate 52 side. FIG. 8 is a plan view of the fixed substrate 52 of the variable wavelength interference filter 5A as viewed from the movable substrate 51 side. In addition, about the structure same as said 1st embodiment, the same code | symbol is attached | subjected and the description is abbreviate | omitted or simplified.

[Configuration of movable substrate]
The movable substrate 51 of the variable wavelength interference filter 5A is provided with a movable electrode 581 on the movable surface 511A of the movable substrate 51.
As shown in FIG. 7, the movable electrode 581 includes an annular inner movable electrode 582 centered on the plane center point O, and outside the inner movable electrode 582 in the filter plan view, along the circumference of the virtual circle P. The outer movable electrode 583 is provided.

  The inner movable electrode 582 is connected to three inner movable connection lines 585A, 585B, and 585C. Specifically, the inner movable connection lines 585A, 585B, and 585C are arranged at intervals of 120 degrees along the circumferential direction of the inner movable electrode 582, that is, at equal angular intervals. The inner movable connection line 585A is disposed along a virtual straight line L3 passing through the plane center point O in the filter plan view, and the inner movable connection line 585B has an angle of 60 degrees counterclockwise with respect to the virtual straight line L3. The inner movable connection line 585C is disposed along a virtual straight line L5 that forms an angle of 60 degrees counterclockwise with respect to the virtual straight line L4, and has a linear shape.

The inner movable connection lines 585A and 585B extend to the outside of the outer edge of the holding portion 512 in the filter plan view.
Note that the distal end portions of the inner movable connection lines 585A and 585B protrude from the outer edge of the reflective film installation portion 522 by a predetermined length, for example, the length of the thickness of the holding portion 512.
The inner movable connection line 585C extends from the outer peripheral edge of the inner movable electrode 582 in the direction of the vertex T2, and forms a movable electrode pad 587P1 connected to the voltage control unit 32 at the vertex T2.

The outer movable electrode 583 includes a plurality of arc-shaped outer movable partial electrodes 583A, 583B, and 583C along the circumference of the virtual circle P with the plane center point O as the center. Each of these outer movable partial electrodes 583A, 583B, 583C constitutes a first outer electrode of the present invention.
In the present embodiment, the outer movable partial electrodes 583A, 583B, and 583C are formed in the same shape in the filter plan view. Further, the outer movable partial electrodes 583A, 583B, 583C are provided such that the respective gravity center points G _a3 , G _b3 , G _c3 are equiangularly spaced (120 degree intervals) on the circumference of the virtual circle P.
Further, on the circumference of the virtual circle P, there are first separating portions 584A, 584B, 584C between the outer movable partial electrodes 583A, 583B, 583C, and the inner movable connection lines 585A, 585B, 585C are respectively present. The outer movable partial electrodes 583A, 583B and 583C are provided in a non-contact manner.

  Here, the outer movable connection lines 586A, 586B, and 586C are connected to the outer movable partial electrodes 583A, 583B, and 583C, respectively. The outer movable connection line 586A is disposed along the virtual straight line L3, the outer movable connection line 586B is disposed along the virtual straight line L4, and the outer movable connection line 586C is disposed along the virtual straight line L5 in the filter plan view. Arranged along each of them, each having a linear shape. These outer movable connection lines 586A, 586B, and 586C are arranged at intervals of 120 degrees along the circumferential direction of the outer movable electrode 583, that is, at equal angular intervals. The outer movable connection lines 586A, 586B, and 586C are disposed at positions that divide the angle formed by the adjacent inner connection lines among the inner movable connection lines 585A, 585B, and 585C into equal angles. That is, the outer movable connection line 586A has an angle formed by the inner movable connection line 585B and the inner movable connection line 585C, and the outer movable connection line 586B has an angle formed by the inner movable connection line 585C and the inner movable connection line 585A. The connection line 586C is disposed at a position that divides the angle formed by the inner movable connection line 585A and the inner movable connection line 585B into equal angles (60 degrees).

The outer movable connection lines 586A and 586B are connected to each other outside the movable region Ar1, are provided at the vertex T4, and are connected to the movable electrode pad 587P2 connected to the voltage control unit 32.
The outer movable connection line 586C extends from the outer peripheral edge of the outer movable electrode 583 in the direction of the vertex T4 and is connected to the movable electrode pad 587P1.

In such a configuration, the outer movable partial electrodes 583A, 583B, and 583C have the same shape, and the outer movable electrode 583 has a line-symmetric shape with respect to the virtual straight lines L3, L4, and L5. Further, the outer movable partial electrode 583A has a shape symmetrical with respect to the virtual straight line L3, the outer movable partial electrode 583B has a shape symmetrical with respect to the virtual straight line L4, and the outer movable partial electrode 583C has a shape symmetrical with respect to the virtual straight line L5.
Further, in the movable region Ar1, the conductor portion composed of the movable electrode 581, the inner movable connection lines 585A, 585B, 585C, and the outer movable connection lines 586A, 586B, 586C is centered on the plane center point O in the filter plan view, It has a shape symmetrical with respect to the virtual straight lines L3, L4, and L5. The conductor portion has rotational symmetry with respect to the plane center point O in the movable region Ar1.
Note that an insulating film (not shown) for preventing discharge between the movable electrode 581 and the fixed electrode 591 is stacked on the movable electrode 581.

[Configuration of fixed substrate]
In the fixed substrate 52, an electrode arrangement groove 521 and a reflection film installation part 522 are formed. In addition, the fixed substrate 52 is provided with an electrode extraction groove 521D extending from the electrode arrangement groove 521 toward the vertex T2, the vertex T3, and the vertex T4 of the outer peripheral edge of the fixed substrate 52. In addition, an electrode lead-out groove 521E for routing the outer movable connection line 586A and the outer movable connection line 586B toward the movable electrode pad 587P2 provided at the vertex T4 is provided.

A fixed electrode 591 facing the movable electrode 581 is provided on the electrode placement surface 521A of the electrode placement groove 521. The fixed electrode 591 has an inner fixed electrode 592 and an outer fixed electrode 593 and is provided in a region facing the movable electrode 581.
As shown in FIG. 8, the inner fixed electrode 592 has an annular shape centered on the plane center point O, and has the same width as the inner movable electrode 582. The inner fixed electrode 592 is disposed so as to face the inner movable electrode 582.

As shown in FIG. 8, the outer fixed electrode 593 is composed of a plurality of arc-shaped outer fixed partial electrodes 593A, 593B, and 593C along the circumference of the virtual circle P with the plane center point O as the center. Each of these outer fixed partial electrodes 593A, 593B, and 593C constitutes a second outer electrode of the present invention.
In the present embodiment, the outer fixed partial electrodes 593A, 593B, and 593C are formed in the same shape in the filter plan view. Further, the outer fixed partial electrodes 593A, 593B, and 593C are provided so that the respective center of gravity points G _a4 , G _b4 , and G _c4 are equiangularly spaced (120 degree intervals) on the circumference of the virtual circle P.
Further, on the circumference of the virtual circle P, there are second separation portions 594A, 594B, 594C between the outer fixed partial electrodes 593A, 593B, 593C. That is, the second separation portion 594A is at a position where the virtual circle P and the virtual straight line L3 intersect, the second separation portion 594B is at a position where the virtual circle P and the virtual straight line L4 intersect, and the second separation portion 594C is the virtual circle. At the position where P and the virtual line L5 cross each other, there are intervals of 120 degrees along the circumferential direction of the outer fixed electrode 593.

The outer fixed partial electrode 593A, the outer fixed partial electrode 593B, the outer movable partial electrode 583B, and the outer fixed partial electrode 593C are provided so as to face and overlap the outer movable partial electrode 583C, respectively. . Accordingly, the first separation portion 584A and the first separation portion 584B overlap with the second separation portion 594A, the second separation portion 594B, and the first separation portion 584C, respectively.
That is, the inner movable connection lines 585A, 585B, 585C provided on the movable substrate 51 are extended through the existence regions of the first separation portions 584A, 584B, 584C corresponding to the second separation portions 594A, 594B, 594C. The outer fixed electrode 593 is provided in a region that does not overlap with the inner movable connection lines 585A, 585B, and 585C.

  Here, the inner fixed electrode 592 and the outer fixed electrode 593 are connected by inner fixed connection lines 595A, 595B, and 595C. In the filter plan view, the inner fixed connection line 595A is disposed along the virtual straight line L3, and connects the inner movable electrode 582 and the outer fixed partial electrode 593A. Similarly, the inner fixed connection line 595B is disposed along the virtual straight line L4 and connects the inner movable electrode 582 and the outer fixed partial electrode 593B. 595C is disposed along the virtual straight line L5, and connects the inner movable electrode 582 and the outer fixed partial electrode 593C. These inner fixed connection lines 595A, 595B, 595C are arranged at intervals of 120 degrees along the circumferential direction of the inner movable electrode 582, that is, at equal angular intervals. Further, the inner fixed connection lines 595A, 595B, and 595C are disposed at positions that do not face the inner movable connection lines 585A, 585B, and 585C disposed on the movable substrate 51.

  The outer fixed electrode 593 is connected to outer fixed connection lines 596A, 596B, 596C. These outer fixed connection lines 596A, 596B, 596C are arranged at intervals of 120 degrees along the circumferential direction of the outer fixed electrode 593, that is, at equal angular intervals. Specifically, the outer fixed connection line 596A is disposed along the virtual straight line L3, the outer fixed connection line 596B is disposed along the virtual straight line L4, and the outer fixed connection line 596C is And arranged along the virtual straight line L5, each having a straight line shape.

The outer fixed connection line 596A extends from the outer peripheral edge of the outer fixed partial electrode 593A in the direction of the vertex T3, and forms a fixed electrode pad 597P connected to the voltage control unit 32 at the vertex T3.
The outer fixed connection line 596B extends from the outer peripheral edge of the outer fixed partial electrode 593B toward one side of the fixed substrate 52 between the vertex T1 and the vertex T2. Further, the outer fixed connection line 596C extends in the direction of the apex T4 from the outer peripheral edge of the outer fixed partial electrode 593C. The distal ends of the outer fixed connection line 596B and the outer fixed connection line 596C are located outside the outer edge of the holding part 512 in the filter plan view.

In such a configuration, the outer fixed partial electrodes 593A, 593B, and 593C have the same shape, and the outer fixed electrode 593 has an imaginary straight line L3, L4, L5 passing through each of the second spacing portions 594A, 594B, 594C. Each has a line-symmetric shape. Further, the outer fixed partial electrode 593A has a shape symmetrical with respect to the virtual straight line L3, the outer fixed partial electrode 593B has a shape symmetrical with respect to the virtual straight line L4, and the outer fixed partial electrode 593C has a shape symmetrical with respect to the virtual straight line L5.
In the movable region Ar1, the conductor portion composed of the fixed electrode 591, the inner fixed connection lines 595A, 595B, 595C, and the outer fixed connection lines 596A, 596B, 596C is centered on the plane center point O in the filter plan view. It has a shape symmetrical with respect to the virtual straight lines L3, L4, and L5. The conductor portion has rotational symmetry with respect to the plane center point O in the movable region Ar1.

Note that an insulating film (not shown) for preventing discharge between the movable electrode 581 and the fixed electrode 591 is laminated on the fixed electrodes 591.
The configurations of the reflective film installation part 522 and the fixed reflective film 57 are the same as those in the first embodiment, and a description thereof is omitted here.

[Effects of Second Embodiment]
In the wavelength tunable interference filter 5A of the second embodiment, the movable substrate 51, the movable electrode 581 having an axisymmetric shape with respect to the virtual straight lines L3, L4, and L5 in the filter plan view in the movable region Ar1, are connected to the inner movable connection. Lines 585A, 585B, 585C and outer movable connection lines 586A, 586B, 586C are provided. Further, fixed electrode 591, inner fixed connection lines 595 </ b> A, 595 </ b> B, 595 </ b> C, and outer fixed have a shape symmetrical with respect to virtual lines L <b> 3, L <b> 4, and L <b> 5 in the filter planar view in movable region Ar <b> 1. Connection lines 596A, 596B, and 596C are provided. In addition, the fixed electrode 591 is provided opposite to a region overlapping the movable electrode 581. The inner fixed connection lines 595A, 595B, 595C are provided at positions that do not face the inner movable connection lines 585A, 585B, 585C, and the outer movable connection lines 586A, 586B, 586C are the outer fixed connection lines 596A, 596B, 596C. It is provided in the position which opposes.

For this reason, as in the first embodiment, it occurs between the movable electrode 581 and the fixed electrode 591 and between the outer movable connection lines 586A, 586B, and 586C and the outer fixed connection lines 596A, 596B, and 596C facing each other. The electrostatic attraction and the internal stress due to each electrode and each connecting line provided on the movable substrate 51 can be applied to the substrate in a plan view in a balanced manner, and the reflection film is maintained while maintaining the parallelism between the substrates. The dimension of the gap G can be adjusted with higher accuracy.
Further, in the colorimetric sensor 3 provided with such a variable wavelength interference filter 5A, the detection unit 31 can detect the light dispersed with high resolution, and an accurate light amount detection result can be obtained. Furthermore, the colorimetric device 1 can perform highly accurate colorimetric processing by performing colorimetry on the measuring object A based on the amount of light detected by the colorimetric sensor 3.

  In the tunable interference filter 5A of the second embodiment, the movable substrate 51, each electrode, and each connection line are symmetrical with respect to the virtual straight lines L3, L4, L5 in the filter plan view in the movable region Ar1. Have. That is, it has a configuration with higher symmetry having three symmetry axes. Therefore, the parallel relationship between the movable substrate 51 and the fixed substrate 52 can be more reliably maintained.

[Third embodiment]
Next, a third embodiment of the present invention will be described based on the drawings.
In the color measurement device 1 of the first embodiment, the wavelength variable interference filter 5 is directly provided to the color measurement sensor 3 that is an optical module. However, some optical modules have a complicated configuration, and it may be difficult to directly provide the variable wavelength interference filter 5 particularly for a miniaturized optical module. In the present embodiment, an optical filter device that enables the wavelength variable interference filter 5 to be easily installed even for such an optical module will be described below. In the present embodiment, the colorimetric sensor 3 is described as a configuration using the wavelength variable interference filter 5, but may be configured to use the wavelength variable interference filter 5A of the second embodiment.
FIG. 9 is a cross-sectional view showing a schematic configuration of the optical filter device according to the third embodiment of the present invention.

As shown in FIG. 9, the optical filter device 600 includes a wavelength tunable interference filter 5 and a housing 601 that houses the wavelength tunable interference filter 5.
The housing 601 includes a base substrate 610, a lid 620, a base side glass substrate 630, and a lid side glass substrate 640.

  The base substrate 610 is configured by, for example, a single layer ceramic substrate. On the base substrate 610, the movable substrate 51 of the variable wavelength interference filter 5 is installed. As the installation of the movable substrate 51 on the base substrate 610, for example, it may be disposed through an adhesive layer or the like, and may be disposed by being fitted to another fixing member or the like. There may be. In addition, a light passage hole 611 is formed in the base substrate 610 in a region facing the reflective film (the movable reflective film 56 and the fixed reflective film 57) of the wavelength variable interference filter 5. And the base side glass substrate 630 is joined so that this light passage hole 611 may be covered. As a method for joining the base side glass substrate 630, for example, glass frit joining using a glass frit that is a piece of glass that has been melted at a high temperature and rapidly cooled, adhesion by an epoxy resin, or the like can be used.

An inner terminal portion 615 connected to each electrode pad 547P1, 547P2, 547P3, 557P of the wavelength variable interference filter 5 is provided on the base inner side surface 612 of the base substrate 610 facing the lid 620. For example, FPC (Flexible Printed Circuits) 615A can be used for connection between the electrode pads 547P1, 547P2, 547P3, 557P and the inner terminal portion 615, for example, Ag paste, ACF (Anisotropic Conductive Film), ACP (Anisotropic). Join with Conductive Paste etc. In addition, when maintaining the internal space 650 in a vacuum state, it is preferable to use an Ag paste with less degas (gas release). Further, the connection is not limited to the connection by the FPC 615A, and wiring connection by wire bonding or the like may be performed, for example.
In addition, the base substrate 610 has through holes 614 corresponding to positions where the respective inner terminal portions 615 are provided, and the respective inner terminal portions 615 are interposed via conductive members filled in the through holes 614. The base substrate 610 is connected to an outer terminal portion 616 provided on the base outer surface 613 opposite to the base inner surface 612.
A base joint 617 that is joined to the lid 620 is provided on the outer periphery of the base substrate 610.

As shown in FIG. 9, the lid 620 includes a lid joint 624 that is joined to the base joint 617 of the base substrate 610, a side wall 625 that continues from the lid joint 624 and rises in a direction away from the base substrate 610, A top surface portion 626 that is continuous from the side wall portion 625 and covers the fixed substrate 52 side of the wavelength variable interference filter 5 is provided. The lid 620 can be formed of an alloy such as Kovar or a metal, for example.
The lid 620 is tightly bonded to the base substrate 610 by bonding the lid bonding portion 624 and the base bonding portion 617 of the base substrate 610.
As this joining method, for example, in addition to laser welding, soldering using silver brazing, sealing using a eutectic alloy layer, welding using low melting glass, glass adhesion, glass frit bonding, epoxy resin Adhesion etc. are mentioned. These bonding methods can be appropriately selected depending on the materials of the base substrate 610 and the lid 620, the bonding environment, and the like.

  The top surface portion 626 of the lid 620 is parallel to the base substrate 610. In the top surface portion 626, a light passage hole 621 is formed in a region facing each reflective film 56, 57 of the wavelength variable interference filter 5. And the lid side glass substrate 640 is joined so that this light passage hole 621 may be covered. As a method for bonding the lid-side glass substrate 640, for example, glass frit bonding, adhesion using an epoxy resin, or the like can be used as in the case of bonding the base-side glass substrate 630.

[Operational effects of the third embodiment]
In the optical filter device 600 of the present embodiment, since the wavelength tunable interference filter 5 is protected by the housing 601, it is possible to prevent changes in the characteristics of the wavelength tunable interference filter 5 due to foreign matters, gases contained in the atmosphere, and the like. It is possible to prevent the wavelength tunable interference filter 5 from being damaged due to mechanical factors. In addition, since intrusion of charged particles can be prevented, charging of the movable electrode 541 and the fixed electrode 551 can be prevented. Therefore, the generation of Coulomb force due to charging can be suppressed, and the parallel relationship between the reflective films 56 and 57 can be more reliably maintained.

For example, when the wavelength tunable interference filter 5 manufactured in a factory is transported to an assembly line for assembling an optical module or an electronic device, the wavelength tunable interference filter 5 protected by the optical filter device 600 is transported safely. It becomes possible.
In addition, since the optical filter device 600 is provided with the outer terminal portion 616 exposed on the outer peripheral surface of the housing 601, wiring can be easily performed even when the optical filter device 600 is incorporated into an optical module or an electronic device. Become.

[Fourth embodiment]
Next, a fourth embodiment of the present invention will be described based on the drawings.
As an example of the MEMS device of the present invention, in the wavelength tunable interference filter 5 of the first embodiment, the movable substrate 51 and the fixed substrate 52 have a surface opposite to the surface facing the fixed substrate instead of the reflective film. A mirror device having a reflective film will be described in detail.
FIG. 10 is a cross-sectional view showing a schematic configuration of the mirror device 6 of the fourth embodiment. The mirror device 6 of the present embodiment is the same as that of the first embodiment except that the movable reflective film 56 and the fixed reflective film 57 are not provided, and the reflective film installation portion 522 is not formed on the fixed substrate. Since it has a structure, the same code | symbol is attached | subjected about the same structure and the description is abbreviate | omitted or simplified.

[Configuration of mirror device]
As shown in FIG. 10, the mirror device 6 includes a movable substrate 51A that is a first substrate of the present invention and a fixed substrate 52A that is a second substrate of the present invention. The movable substrate 51A and the fixed substrate 52A are integrally configured by bonding the first bonding portion 513 of the movable substrate 51A and the second bonding portion 523 of the fixed substrate 52A by the bonding film 53.

  A reflective film 61 is provided on the movable substrate 51A. Between the movable substrate 51A and the fixed substrate 52A, an electrostatic actuator 54 used for adjusting the dimension of the gap between the substrates and the angle of the movable substrate 51A with respect to the fixed substrate 52A is provided. As in the first embodiment, the electrostatic actuator 54 includes a movable electrode 541 provided on the movable substrate 51A side and a fixed electrode 551 provided on the fixed substrate 52A side.

[Configuration of movable substrate]
As shown in FIG. 10, the movable substrate 51 </ b> A includes a movable portion 511 and a holding portion 512 that holds the movable portion 511.
The movable portion 511 includes a movable surface 511B on the opposite side of the surface facing the fixed substrate 52A, and the reflective film 61 is provided on the movable surface 511B.
The reflective film 61 is provided at the center of the movable surface 511 </ b> B of the movable part 511. As the reflective film 61, for example, a metal film such as Ag or an alloy film such as an Ag alloy can be used.
The holding portion 512 is an annular diaphragm that surrounds the periphery of the movable portion 511.

The movable electrode 541 has a configuration similar to that of the first embodiment (see FIG. 4). The inner movable connection lines 545A and 545B and the outer movable connection lines 546A and 546B connected to the movable electrode 541 have the same configuration as that of the first embodiment (see FIG. 4).
That is, also in the present embodiment, the movable electrode 541, the pair of inner movable connection lines 545A and 545B, and the pair of outer movable connection lines 546A and 546B are imaginary straight lines L1 and L2 in the movable region Ar1 in the filter plan view. On the other hand, it has a line-symmetric shape. The movable electrode 541, the pair of inner movable connection lines 545A and 545B, and the pair of outer movable connection lines 546A and 546B have a point-symmetric shape with respect to the plane center point O in the movable region Ar1.

[Configuration of fixed substrate]
Similar to the first embodiment, the fixed substrate 52A is formed with a circular electrode arrangement groove 521 centered on the plane center point O in the filter plan view. In the present embodiment, as described above, the reflective film installation portion 522 is not formed.
The fixed substrate 52A is provided with an electrode lead-out groove 521B extending from the electrode arrangement groove 521 toward the vertex T1, vertex T2, and vertex T4 of the outer peripheral edge of the fixed substrate 52A. Further, an electrode lead-out groove 521C is also provided between the apex T3 and the apex T4.

A fixed electrode 551 is provided on the electrode placement surface 521A of the electrode placement groove 521.
The fixed electrode 551 has a configuration similar to that of the first embodiment (see FIG. 5). Also, the inner fixed connection lines 555A and 555B and the outer fixed connection lines 556A and 556B connected to the fixed electrode 551 have the same configuration as that of the first embodiment (see FIG. 5).
That is, also in this embodiment, the fixed electrode 551, the pair of inner fixed connection lines 555A and 555B, and the pair of outer fixed connection lines 556A and 556B are movable regions Ar1 centered on the plane center point O in the filter plan view. In FIG. 2, the shape has line symmetry with respect to the virtual straight lines L1 and L2. The fixed electrode 551, the pair of inner fixed connection lines 555A and 555B, and the pair of outer fixed connection lines 556A and 556B have a point-symmetric shape with respect to the plane center point O in the movable region Ar1.

[Effects of the fourth embodiment]
In the mirror device 6 of the fourth embodiment, similarly to the first embodiment, the movable electrode 541 having a line-symmetric shape with respect to the virtual straight lines L1 and L2 in the filter plan view in the movable region Ar1 of the movable substrate 51A, Inner movable connection lines 545A and 545B and outer movable connection lines 546A and 546B are provided. Further, in the filter plan view in the movable region Ar1 of the fixed substrate 52A, the fixed electrode 551, the inner fixed connection lines 555A and 555B, and the outer fixed connection lines 556A and 556B having a shape symmetrical with respect to the virtual straight lines L1 and L2 are provided. Provided. In addition, the fixed electrode 551 is provided to face the region overlapping with the movable electrode 541. The inner fixed connection lines 555A and 555B are provided at positions that do not face the inner movable connection lines 545A and 545B, and the outer movable connection lines 546A and 546B are provided at positions that face the outer fixed connection lines 556A and 556B.

  For this reason, as in the first embodiment, the electrostatic attraction generated between the movable electrode 541 and the fixed electrode 551 and the internal stress due to each electrode and each connection line provided on the movable substrate 51A are viewed in a plan view. In this case, the substrate can be balanced. Therefore, in the mirror device 6, the gap between the substrates can be changed while maintaining the parallel relationship between the movable substrate 51A and the fixed substrate 52A. Further, by applying different driving voltages to the two outer movable partial electrodes 543A and 543B, the inclination of the movable substrate 51A with respect to the fixed substrate 52A can be adjusted. That is, in the mirror device 6, it is possible to suppress the electrostatic attraction generated between the substrates and the internal stress due to each electrode and each connection line from acting on an imbalance other than the difference caused according to the desired voltage control, The positional relationship between the movable substrate 51A and the fixed substrate 52A can be controlled with high accuracy.

  In the present embodiment, the mirror device 6 has the same configuration as that of the first embodiment, but may be configured similarly to the second embodiment. That is, on the movable substrate 51A, the movable electrode 581, the inner movable connection lines 585A, 585B, 585C, and the outer movable body having a line-symmetric shape with respect to the virtual straight lines L3, L4, L5 in the filter plan view in the movable area Ar1. Connection lines 586A, 586B, 586C are provided. Further, fixed electrode 591, inner fixed connection lines 595 </ b> A, 595 </ b> B, 595 </ b> C, and outer fixed are formed on fixed substrate 52 </ b> A having a shape symmetrical with respect to virtual straight lines L <b> 3, L <b> 4, L <b> 5 in the filter plan view in movable region Ar <b> 1. Connection lines 596A, 596B, and 596C are provided. In addition, the fixed electrode 591 is provided opposite to a region overlapping the movable electrode 581. The inner fixed connection lines 595A, 595B, 595C are provided at positions that do not face the inner movable connection lines 585A, 585B, 585C, and the outer movable connection lines 586A, 586B, 586C are the outer fixed connection lines 596A, 596B, 596C. It is good also as a structure provided in the position which opposes.

When configured in this manner, as in the second embodiment, the movable substrate 51A, each electrode, and each connection line are line-symmetric with respect to the virtual straight lines L3, L4, and L5 in the filter plan view in the movable region Ar1. Has a shape. That is, it can be set as the structure which has three symmetry axes and has higher symmetry. Therefore, the positional relationship between the movable substrate 51A and the fixed substrate 52A can be controlled with higher accuracy.
The movable electrode 581 has three outer movable partial electrodes 583A, 583B, and 583C. That is, the direction of the movable substrate 51A can be controlled by individually controlling the drive voltages applied to the three outer movable partial electrodes 583A, 583B, and 583C.
That is, by adopting the same configuration as that of the second embodiment, the positional relationship between the movable substrate 51A and the fixed substrate 52A can be controlled with high accuracy, and the orientation of the movable substrate 51A can be adjusted with a high degree of freedom. can do.

[Other Embodiments]
It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.

  For example, in each of the above embodiments, the movable portion 511 is provided on the movable substrate 51 that is the first substrate, and the movable portion 511 of the movable substrate 51 is displaced toward the fixed substrate 52 that is the second substrate. However, the present invention is not limited to this. For example, the fixed substrate 52 may be configured as a first substrate and the movable substrate 51 may be configured as a second substrate. That is, the movable electrode 541 provided on the movable substrate 51 side and the electrodes and connection lines having the configuration described in detail as each connection line may be disposed on the fixed substrate, and the fixed substrate may be the first substrate. Conversely, the fixed electrode 551 provided on the fixed substrate 52 side and the electrodes and connection lines having the configuration described in detail as each connection line may be disposed on the movable substrate, and the movable substrate may be the second substrate. In this case, a driving voltage is applied to the fixed electrode provided on the fixed substrate side, and the voltage is controlled so that the movable electrode provided on the movable substrate side is set to the ground potential.

Moreover, although the said embodiment demonstrated the structure arrange | positioned so that a fixed electrode and each connection line may have symmetry, this invention is not limited to this. That is, the thickness of the fixed substrate can be appropriately set so that the internal substrate does not bend with respect to the internal stress of each electrode or each connection line. Therefore, the fixed electrode and each connection line do not necessarily have a symmetric configuration.
Specifically, in the first embodiment, any configuration may be used as long as at least the fixed electrode 551 is provided in a region overlapping the movable electrode 541. The inner fixed connection lines 555A and 555B may be provided at arbitrary positions along the outer periphery of the inner fixed electrode 552 as long as they do not overlap with the inner movable connection lines 545A and 545B.
Similarly, in the second embodiment, any configuration may be used as long as the fixed electrode 591 is provided in a region overlapping the movable electrode 581. Further, at least the inner fixed connection lines 595A, 595B, and 595C may be provided at arbitrary positions along the outer periphery of the inner fixed electrode 592 as long as they do not overlap the inner movable connection lines 585A, 585B, and 585C.

  In each of the above embodiments, the outer fixed connection line is disposed at a position facing the outer movable connection line. However, the present invention is not limited to this, and the outer fixed connection line is the outer movable connection line. It is good also as a structure arrange | positioned in the position which does not oppose. When such a configuration is desired, the electrostatic attraction between the substrates can be generated only in the region where the movable electrode and the fixed electrode overlap. Thereby, the symmetry of the electrostatic attractive force with respect to the plane center point O can be improved in the filter plan view, and the gap between the substrates (the gap between the reflection films) can be controlled with high accuracy.

In each of the above embodiments, one outer movable electrode is arranged at a position that bisects the angle formed by adjacent inner movable connection lines, but the present invention is not limited to this. In other words, a plurality of outer movable connection lines may be arranged so as to divide the angle formed by the adjacent inner movable electrodes into equal angular intervals.
Furthermore, in each said embodiment, although it was set as the structure provided with two or three inner side movable connection lines, this invention is not limited to this, It is good also as a structure provided with four or more inner side movable connection lines.

  In each of the above embodiments, the outer movable electrode is configured such that the first separation portion exists at the position where the inner movable connection line is disposed. However, the present invention is not limited to this, and the inner movable connection line is disposed. It is good also as a structure in which a 1st separation part exists besides a position. In this case, the first separation portions exist at equiangular intervals along the circumferential direction of the outer movable electrode. An outer movable connection line is disposed on each of the plurality of outer movable partial electrodes.

  In each of the above embodiments, the movable substrates 51 and 51A include the movable portion 511 and the holding portion 512, but the present invention is not limited to this. For example, the movable substrate may be a plate-like member having a uniform thickness in which the holding portion 512 is not provided. In this case, it is preferable that an electrostatic actuator is provided so that the movable substrate bends toward the fixed substrate with the central point of the movable reflective film 56 as a center in a plan view of the movable substrate viewed from the substrate thickness direction. That is, it is preferable to set the plane center point O as the center point of the movable reflective film 56.

Moreover, in each said embodiment, although the diaphragm-shaped holding | maintenance part 512 is illustrated, as a structure etc. with which the holding part which has the some beam structure arrange | positioned at equal angular intervals with respect to the center of a movable part is provided, for example. Also good.
In this case, by adopting a configuration in which the beam-shaped holding portions are arranged at equal angular intervals, the stress balance when the holding portion is bent can be made uniform, and the inclination of the movable portion can be suppressed. In this case, the electrostatic actuator may be configured such that each connection line is arranged corresponding to the position of each beam-shaped holding portion.

Moreover, although the colorimetric apparatus 1 has been exemplified in the first embodiment as the electronic apparatus of the present invention, the wavelength variable interference filter, the optical filter device, the optical module, and the electronic apparatus of the present invention may be used in various other fields. it can.
For example, it can be used as a light-based system for detecting the presence of a specific substance. As such a system, for example, an in-vehicle gas leak detector that detects a specific gas with high sensitivity by adopting a spectroscopic measurement method using the variable wavelength interference filter of the present invention, or a photoacoustic rare gas detection for a breath test. A gas detection device such as a vessel can be exemplified.
An example of such a gas detection device will be described below with reference to the drawings.

FIG. 11 is a schematic diagram illustrating an example of a gas detection device including a wavelength variable interference filter.
FIG. 12 is a block diagram showing a configuration of a control system of the gas detection device of FIG.
As shown in FIG. 11, the gas detection apparatus 100 includes a sensor chip 110, a flow path 120 including a suction port 120A, a suction flow path 120B, a discharge flow path 120C, and a discharge port 120D, a main body 130, It is configured with.
The main body unit 130 includes a sensor unit cover 131 having an opening through which the flow channel 120 can be attached, a discharge unit 133, a housing 134, an optical unit 135, a filter 136, a wavelength variable interference filter 5, a light receiving element 137 (detection unit), and the like. And a control unit 138 that processes the detected signal and controls the detection unit, a power supply unit 139 that supplies power, and the like. The optical unit 135 emits light, and a beam splitter 135B that reflects light incident from the light source 135A toward the sensor chip 110 and transmits light incident from the sensor chip toward the light receiving element 137. And lenses 135C, 135D, and 135E. Instead of the variable wavelength interference filter 5, a variable wavelength interference filter 5A or an optical filter device 600 may be disposed.
As shown in FIG. 12, an operation panel 140, a display unit 141, a connection unit 142 for interface with the outside, and a power supply unit 139 are provided on the surface of the gas detection device 100. When the power supply unit 139 is a secondary battery, a connection unit 143 for charging may be provided.
Further, as shown in FIG. 12, the control unit 138 of the gas detection device 100 controls a signal processing unit 144 configured by a CPU or the like, a light source driver circuit 145 for controlling the light source 135A, and the variable wavelength interference filter 5. Voltage control unit 146, a light receiving circuit 147 that receives a signal from the light receiving element 137, a sensor chip detection that reads a code of the sensor chip 110 and receives a signal from a sensor chip detector 148 that detects the presence or absence of the sensor chip 110 A circuit 149, a discharge driver circuit 150 for controlling the discharge means 133, and the like are provided.

Next, operation | movement of the above gas detection apparatuses 100 is demonstrated below.
A sensor chip detector 148 is provided inside the sensor unit cover 131 at the upper part of the main body unit 130, and the sensor chip detector 148 detects the presence or absence of the sensor chip 110. When the signal processing unit 144 detects the detection signal from the sensor chip detector 148, the signal processing unit 144 determines that the sensor chip 110 is attached, and displays a display signal for displaying on the display unit 141 that the detection operation can be performed. put out.

  For example, when the operation panel 140 is operated by the user and an instruction signal to start the detection process is output from the operation panel 140 to the signal processing unit 144, the signal processing unit 144 first sends the signal processing unit 144 to the light source driver circuit 145. A light source activation signal is output to activate the light source 135A. When the light source 135A is driven, laser light having a single wavelength and stable linear polarization is emitted from the light source 135A. The light source 135A includes a temperature sensor and a light amount sensor, and the information is output to the signal processing unit 144. When the signal processing unit 144 determines that the light source 135A is stably operating based on the temperature and light quantity input from the light source 135A, the signal processing unit 144 controls the discharge driver circuit 150 to operate the discharge unit 133. Thereby, the gas sample containing the target substance (gas molecule) to be detected is guided from the suction port 120A to the suction channel 120B, the sensor chip 110, the discharge channel 120C, and the discharge port 120D. The suction port 120A is provided with a dust removal filter 120A1 to remove relatively large dust, some water vapor, and the like.

The sensor chip 110 is a sensor that incorporates a plurality of metal nanostructures and uses localized surface plasmon resonance. In such a sensor chip 110, an enhanced electric field is formed between the metal nanostructures by the laser light, and when gas molecules enter the enhanced electric field, Raman scattered light and Rayleigh scattered light including information on molecular vibrations are generated. Occur.
These Rayleigh scattered light and Raman scattered light enter the filter 136 through the optical unit 135, and the Rayleigh scattered light is separated by the filter 136, and the Raman scattered light enters the wavelength variable interference filter 5. Then, the signal processing unit 144 controls the voltage control unit 146 to adjust the voltage applied to the wavelength variable interference filter 5, and causes the wavelength variable interference filter 5 to split the Raman scattered light corresponding to the gas molecule to be detected. . Thereafter, when the dispersed light is received by the light receiving element 137, a light reception signal corresponding to the amount of received light is output to the signal processing unit 144 via the light receiving circuit 147.
The signal processing unit 144 compares the spectrum data of the Raman scattered light corresponding to the gas molecule to be detected obtained as described above and the data stored in the ROM, and determines whether or not the target gas molecule is the target gas molecule. To determine the substance. Further, the signal processing unit 144 displays the result information on the display unit 141 or outputs the result information from the connection unit 142 to the outside.

  11 and 12 exemplify the gas detection device 100 that performs gas detection from the Raman scattered light obtained by spectrally dividing the Raman scattered light with the variable wavelength interference filter 5. You may use as a gas detection apparatus which specifies gas classification by detecting the light absorbency of. In this case, a gas sensor that allows gas to flow into the sensor and detects light absorbed by the gas in the incident light is used as the optical module of the present invention. A gas detection device that analyzes and discriminates the gas flowing into the sensor by such a gas sensor is an electronic apparatus of the present invention. Even in such a configuration, it is possible to detect a gas component using the wavelength variable interference filter.

In addition, the system for detecting the presence of a specific substance is not limited to the detection of the gas as described above, but a non-invasive measuring device for saccharides by near-infrared spectroscopy and non-invasive information on food, living body, minerals, etc. A substance component analyzer such as a measuring device can be exemplified.
Hereinafter, a food analyzer will be described as an example of the substance component analyzer.

FIG. 13 is a diagram illustrating a schematic configuration of a food analyzer that is an example of an electronic apparatus using the wavelength variable interference filter 5.
As shown in FIG. 13, the food analysis apparatus 200 includes a detector 210 (optical module), a control unit 220, and a display unit 230. The detector 210 includes a light source 211 that emits light, an imaging lens 212 into which light from the measurement target is introduced, a wavelength variable interference filter 5 that splits the light introduced from the imaging lens 212, and the dispersed light. And an imaging unit 213 (detection unit) for detecting. Instead of the variable wavelength interference filter 5, a variable wavelength interference filter 5A or an optical filter device 600 may be disposed.
In addition, the control unit 220 controls the light source control unit 221 that controls the turning on / off of the light source 211 and the brightness control at the time of lighting, the voltage control unit 222 that controls the wavelength variable interference filter 5, and the imaging unit 213. , A detection control unit 223 that acquires a spectral image captured by the imaging unit 213, a signal processing unit 224, and a storage unit 225.

  In the food analyzer 200, when the system is driven, the light source 211 is controlled by the light source control unit 221, and light is irradiated from the light source 211 to the measurement object. Then, the light reflected by the measurement object enters the wavelength variable interference filter 5 through the imaging lens 212. The variable wavelength interference filter 5 is applied with a voltage capable of dispersing a desired wavelength under the control of the voltage control unit 222, and the dispersed light is imaged by an imaging unit 213 configured by, for example, a CCD camera. The captured light is accumulated in the storage unit 225 as a spectral image. In addition, the signal processing unit 224 controls the voltage control unit 222 to change the voltage value applied to the wavelength tunable interference filter 5, and acquires a spectral image for each wavelength.

Then, the signal processing unit 224 performs arithmetic processing on the data of each pixel in each image accumulated in the storage unit 225, and obtains a spectrum at each pixel. In addition, the storage unit 225 stores, for example, information related to food components with respect to the spectrum, and the signal processing unit 224 analyzes the obtained spectrum data based on the information related to food stored in the storage unit 225. The food component contained in the detection target and its content are obtained. Moreover, a food calorie, a freshness, etc. are computable from the obtained food component and content. Furthermore, by analyzing the spectral distribution in the image, it is possible to extract a portion of the food to be inspected that has reduced freshness, and to detect foreign substances contained in the food. Can also be implemented.
Then, the signal processing unit 224 performs processing for causing the display unit 230 to display information such as the components and contents of the food to be examined, the calories, and the freshness obtained as described above.

FIG. 13 shows an example of the food analysis apparatus 200, but it can also be used as a non-invasive measurement apparatus for other information as described above with a substantially similar configuration. For example, it can be used as a biological analyzer for analyzing biological components such as measurement and analysis of body fluid components such as blood. As such a bioanalytical device, for example, a device that detects ethyl alcohol as a device that measures a body fluid component such as blood, it can be used as a drunk driving prevention device that detects the drunk state of the driver. Further, it can also be used as an electronic endoscope system provided with such a biological analyzer.
Furthermore, it can also be used as a mineral analyzer for performing component analysis of minerals.

Furthermore, the variable wavelength interference filter, the optical module, and the electronic apparatus of the present invention can be applied to the following apparatuses.
For example, it is possible to transmit data using light of each wavelength by changing the intensity of light of each wavelength over time. In this case, light of a specific wavelength is transmitted by a wavelength variable interference filter provided in the optical module. The data transmitted by the light of the specific wavelength can be extracted by separating the light and receiving the light at the light receiving unit, and the electronic data having such a data extraction optical module can be used to extract the light data of each wavelength. By processing, optical communication can be performed.

Further, the electronic apparatus can be applied to a spectroscopic camera, a spectroscopic analyzer, or the like that captures a spectroscopic image by dispersing light with the variable wavelength interference filter of the present invention. An example of such a spectroscopic camera is an infrared camera incorporating a wavelength variable interference filter.
FIG. 14 is a schematic diagram showing a schematic configuration of the spectroscopic camera. As shown in FIG. 14, the spectroscopic camera 300 includes a camera main body 310, an imaging lens unit 320, and an imaging unit 330 (detection unit).
The camera body 310 is a part that is gripped and operated by a user.
The imaging lens unit 320 is provided in the camera body 310 and guides incident image light to the imaging unit 330. As shown in FIG. 14, the imaging lens unit 320 includes an objective lens 321, an imaging lens 322, and a wavelength variable interference filter 5 provided between these lenses. Instead of the variable wavelength interference filter 5, a variable wavelength interference filter 5A or an optical filter device 600 may be disposed.
The imaging unit 330 includes a light receiving element, and images the image light guided by the imaging lens unit 320.
In such a spectroscopic camera 300, a spectral image of light having a desired wavelength can be captured by transmitting light having a wavelength to be imaged by the variable wavelength interference filter 5.

Furthermore, the wavelength tunable interference filter of the present invention may be used as a bandpass filter. For example, only light in a narrow band centered on a predetermined wavelength out of light in a predetermined wavelength range emitted from the light emitting element can be wavelength-variable. It can also be used as an optical laser device that spectrally transmits through an interference filter.
In addition, the tunable interference filter of the present invention may be used as a biometric authentication device, and can be applied to authentication devices such as blood vessels, fingerprints, retinas, and irises using light in the near infrared region and visible region.

  Furthermore, an optical module and an electronic device can be used as a concentration detection device. In this case, the infrared energy (infrared light) emitted from the substance is spectrally analyzed by the variable wavelength interference filter, and the analyte concentration in the sample is measured.

  As described above, the tunable interference filter, the optical module, and the electronic device of the present invention can be applied to any device that splits predetermined light from incident light. Since the wavelength tunable interference filter according to the present invention can split a plurality of wavelengths with one device as described above, it is possible to accurately measure a spectrum of a plurality of wavelengths and detect a plurality of components. it can. Therefore, compared with the conventional apparatus which takes out a desired wavelength with a plurality of devices, it is possible to promote downsizing of the optical module and the electronic apparatus, and for example, it can be suitably used as a portable or in-vehicle optical device.

  Moreover, although the said 4th embodiment demonstrated the mirror device 6 as an example of a MEMS device, the MEMS device of this invention is not limited to this. For example, a device that includes at least a pair of substrates facing each other and electrodes disposed on the opposing surfaces of the pair of substrates and controls the gap between the substrates by electrostatic attraction generated between the electrodes may be used. Therefore, the present invention can be applied to such arbitrary devices.

  In addition, the specific structure in the implementation of the present invention may be configured by appropriately combining the above-described embodiments and modifications as long as the object of the present invention can be achieved. It may be changed.

  DESCRIPTION OF SYMBOLS 1 ... Color measuring apparatus as electronic equipment, 3 ... Color measuring sensor as optical module, 5, 5A ... Wavelength variable interference filter, 6 ... Mirror device as MEMS device, 31 ... Detection part, 51 ... 1st board | substrate Movable substrate, 52... Fixed substrate as second substrate, 56... Movable reflective film as first reflective film, 57... Fixed reflective film as second reflective film, 100. Food analyzer as device, 300 ... spectral camera as electronic device, 511 ... movable part, 512 ... holding part, 541 ... movable electrode as first electrode, 542 ... inner movable electrode as first inner electrode, 543A, 543B: outer movable partial electrode as the first outer electrode, 545A, 545B ... inner movable connection line as the first inner connection line, 546A, 546B ... as the first outer connection line Side movable connection line, 551... Fixed electrode as second electrode, 552... Inner fixed electrode as second inner electrode, 553... Outer fixed electrode as second outer electrode, 555A, 555B. Inner fixed connection line, 600 ... optical filter device, 601 ... housing

Claims (8)

A first substrate;
A second substrate facing the first substrate;
A first reflective film provided on the first substrate;
A second reflective film provided on the second substrate and facing the first reflective film;
An annular first inner electrode provided on the first substrate;
In a plan view of the first substrate and the second substrate viewed from the substrate thickness direction, along the one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate. A plurality of first outer electrodes each formed in the same shape;
In the plan view, it extends from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A plurality of linear first inner connection electrodes
In the plan view, a plurality of linear first outer connection electrodes extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate;
A second electrode provided on the second substrate and provided in a region overlapping at least the first inner electrode and the first outer electrode in the plan view;
The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode,
The tunable interference filter according to claim 1, wherein the first outer connection electrode is provided at equal angular intervals with respect to a center point of the first inner electrode. The tunable interference filter according to claim 1,
The second electrode includes a second inner electrode provided in a region overlapping the first inner electrode, and a second outer electrode provided in a region overlapping the first outer electrode,
The wavelength tunable interference filter, wherein the second outer electrode is provided in a region that does not overlap the first inner connection electrode. The tunable interference filter according to claim 2,
A wavelength tunable interference filter, comprising: a second inner connection electrode connected to the second inner electrode and the second outer electrode and provided in a region not overlapping the first inner connection electrode. In the wavelength variable interference filter according to any one of claims 1 to 3,
The first substrate is provided with the first reflective film, the first inner electrode, and the first outer electrode, and a movable portion that moves forward and backward with respect to the second substrate;
A holding unit connected to an outer peripheral edge of the movable unit, and holding the movable unit so as to be movable back and forth with respect to the second substrate;
A wavelength tunable interference filter comprising: First substrate,
A second substrate facing the first substrate;
A first reflective film provided on the first substrate;
A second reflective film provided on the second substrate and facing the first reflective film;
An annular first inner electrode provided on the first substrate;
In a plan view of the first substrate and the second substrate viewed from the substrate thickness direction, along the one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate. A plurality of first outer electrodes each having the same shape,
In the plan view, it extends from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A plurality of linear first inner connection electrodes,
In the plan view, a plurality of linear first outer connection electrodes extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate, and provided on the second substrate, in the plan view, A second electrode provided in a region overlapping at least the first inner electrode and the first outer electrode;
The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode,
The first outer connection electrode is a wavelength variable interference filter provided at equiangular intervals with respect to the center point of the first inner electrode;
A housing that houses the wavelength tunable interference filter, and at least partially includes a light guide that guides light to the wavelength tunable interference filter;
An optical filter device comprising: A first substrate;
A second substrate facing the first substrate;
A first reflective film provided on the first substrate;
A second reflective film provided on the second substrate and facing the first reflective film;
An annular first inner electrode provided on the first substrate;
In a plan view of the first substrate and the second substrate viewed from the substrate thickness direction, along the one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate. A plurality of first outer electrodes each formed in the same shape;
In the plan view, it extends from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A plurality of linear first inner connection electrodes
In the plan view, a plurality of linear first outer connection electrodes extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate;
A second electrode provided on the second substrate and provided in a region overlapping at least the first inner electrode and the first outer electrode in the plan view;
A detection unit for detecting light extracted by the first reflective film and the second reflective film,
The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode,
The optical module, wherein the first outer connection electrode is provided at equiangular intervals with respect to a center point of the first inner electrode. First substrate,
A second substrate facing the first substrate;
A first reflective film provided on the first substrate;
A second reflective film provided on the second substrate and facing the first reflective film;
An annular first inner electrode provided on the first substrate;
In a plan view of the first substrate and the second substrate viewed from the substrate thickness direction, along the one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate. A plurality of first outer electrodes each having the same shape,
In the plan view, it extends from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A plurality of linear first inner connection electrodes,
In the plan view, a plurality of linear first outer connection electrodes extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate, and provided on the second substrate, in the plan view, A second electrode provided in a region overlapping at least the first inner electrode and the first outer electrode;
The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode,
The first outer connection electrode is a wavelength variable interference filter provided at equiangular intervals with respect to the center point of the first inner electrode;
A control unit for controlling the variable wavelength interference filter;
An electronic device comprising: A first substrate;
A second substrate facing the first substrate;
An annular first inner electrode provided on the first substrate;
In a plan view of the first substrate and the second substrate viewed from the substrate thickness direction, along the one virtual circle that is concentric with the first inner electrode outside the first inner electrode of the first substrate. A plurality of first outer electrodes each formed in the same shape;
In the plan view, it extends from the outer peripheral edge of the first inner electrode of the first substrate to the outer peripheral side of the first substrate through the space between the two first outer electrodes arranged along the virtual circle. A plurality of linear first inner connection electrodes
In the plan view, a plurality of linear first outer connection electrodes extending from the outer peripheral edge of each first outer electrode to the outer peripheral side of the first substrate;
A second electrode provided on the second substrate and provided in a region overlapping at least the first inner electrode and the first outer electrode in the plan view;
The first inner connection electrode is provided at equiangular intervals with respect to the center point of the first inner electrode,
The MEMS device, wherein the first outer connection electrode is provided at equiangular intervals with respect to a center point of the first inner electrode.

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