JP2014022705A - Semiconductor light-emitting device and manufacturing method of the same - Google Patents

Semiconductor light-emitting device and manufacturing method of the same Download PDF

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JP2014022705A
JP2014022705A JP2012163415A JP2012163415A JP2014022705A JP 2014022705 A JP2014022705 A JP 2014022705A JP 2012163415 A JP2012163415 A JP 2012163415A JP 2012163415 A JP2012163415 A JP 2012163415A JP 2014022705 A JP2014022705 A JP 2014022705A
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semiconductor light
light emitting
metal electrode
emitting device
emitting element
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JP5995579B2 (en
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Megumi Horiuchi
恵 堀内
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Citizen Holdings Co Ltd
Citizen Electronics Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

Abstract

PROBLEM TO BE SOLVED: To provide an LED device which can be easily formed even when an LED die is flip-chip mounted on an FPC board provided with a metal electrode layer only on an undersurface, and provide a manufacturing method of the LED device.SOLUTION: A semiconductor light-emitting device manufacturing method comprises: preparing a large-size FPC board 40 composed of a polyimide film 41 in which a plurality of openings are formed and a metal electrode layer 42; flip-chip mounting LED dies 34 on the large-size FPC board 40; coating top faces of the LED die 34 and the large-size FPC board 40 with a white reflective component 46 and a fluorescence component 47; and finally singulating the large-size FPC board 40 to obtain LED devices 20.

Description

本発明は、回路基板に半導体発光素子をフリップチップ実装し、この半導体発光素子を被覆部材により被覆した半導体発光装置に関する。   The present invention relates to a semiconductor light emitting device in which a semiconductor light emitting element is flip-chip mounted on a circuit board, and the semiconductor light emitting element is covered with a covering member.

ウェハーから切り出された半導体発光素子(以後とくに断らない限りLEDダイと呼ぶ)を回路基板に実装し、樹脂やガラス等の被覆部材で被覆してパッケージ化した半導体発光装置(以後とくに断らない限りLED装置と呼ぶ)が普及している。このLED装置は、使用状況によりさまざまな形態をとるが、このなかで放熱性、薄さ、作り易さ、部材費用削減を重視し、LEDダイをFPC(フレキシブル・プリンテッド・サーキット)基板に実装することがある。   A semiconductor light-emitting device cut out from a wafer (hereinafter referred to as an LED die unless otherwise specified) is mounted on a circuit board and covered with a coating member such as resin or glass, and then packaged. Called the device). This LED device takes various forms depending on the use situation, but in this, the LED die is mounted on an FPC (Flexible Printed Circuit) board with emphasis on heat dissipation, thinness, ease of manufacture, and material cost reduction. There are things to do.

例えば特許文献1の図4にはFPC基板上にLEDダイが実装される様子が示されている。そこで特許文献1の図4を図7に再掲示し、LEDダイの実装状況を説明する。なお図7はFPC基板(フレキシブル基板100)へLEDダイ(LED102)を接合させる工程を示す断面図であるため、LEDダイ(LED102)を被覆する被覆部材は図示されていない。   For example, FIG. 4 of Patent Document 1 shows a state in which an LED die is mounted on an FPC board. Then, FIG. 4 of patent document 1 is reposted in FIG. 7, and the mounting condition of LED die is demonstrated. Note that FIG. 7 is a cross-sectional view illustrating a process of bonding the LED die (LED 102) to the FPC board (flexible substrate 100), and thus a covering member that covers the LED die (LED 102) is not illustrated.

フレキシブル基板100上のパッド204にはスタッドバンプ202が取り付けられている。このスタッドバンプ202にLED102の接続用電極であるコンタクト220a及び220bが位置合わせされている。なおコンタクト220aはn型層102aと接続し、同様にコンタクト220bはp型層102bと電気的に接続している。またn型層102a及びp型層102bの間には活性領域102cが介在している。ここでLED102はフレキシブル基板100にサーモソニック結合される。すなわちフレキシブル基板100を加熱した状態で、LED102は矢印224によって示される方向に結合ツール222で加圧される。このとき矢印226により示されるように超音波振動が印加される。   A stud bump 202 is attached to the pad 204 on the flexible substrate 100. Contacts 220 a and 220 b that are connection electrodes of the LED 102 are aligned with the stud bump 202. Contact 220a is connected to n-type layer 102a, and similarly, contact 220b is electrically connected to p-type layer 102b. An active region 102c is interposed between the n-type layer 102a and the p-type layer 102b. Here, the LED 102 is thermosonic coupled to the flexible substrate 100. That is, the LED 102 is pressed by the coupling tool 222 in the direction indicated by the arrow 224 while the flexible substrate 100 is heated. At this time, ultrasonic vibration is applied as indicated by an arrow 226.

図7に示されるLED装置に含まれるフレキシブル基板100は、上面側にパッド204が図示されていることから、上面側と下面側にそれぞれ金属電極層を有する2層FPC基板であるものと考えられる。この2層FPC基板は、上下の金属電極層の間に絶縁層を必要とし、さらにこの絶縁層に上下の金属電極層を接続するためのスルーホールを必要とする。つまり2層FPC基板は、この絶縁層による放熱性の悪化や、複雑な構造による製造工程の長期化が課題となる。そこで、例えば特許文献2の図1に示されるように、FPC基板の金属電極層を1層化することが提案されるようになった。   The flexible substrate 100 included in the LED device illustrated in FIG. 7 is considered to be a two-layer FPC substrate having a metal electrode layer on each of the upper surface side and the lower surface side because the pads 204 are illustrated on the upper surface side. . This two-layer FPC board requires an insulating layer between the upper and lower metal electrode layers, and further requires a through hole for connecting the upper and lower metal electrode layers to the insulating layer. That is, the two-layer FPC board has a problem of deterioration of heat dissipation due to the insulating layer and a long manufacturing process due to a complicated structure. Therefore, for example, as shown in FIG. 1 of Patent Document 2, it has been proposed to form one metal electrode layer on the FPC board.

特許文献2の図1を図8に再掲示しその様子を説明する。図8は従来のLED装置10の断面図である。LED装置10はフレキシブルプリント基板4(FPC基板)にLED素子3(LEDダイ)を実装し、LED素子3をシリコーン樹脂17で被覆している。フレキシブルプリント基板4は、ポリイミドフィルム18と、金属パターン11,12からなり、凹部1,2を備えている。凹部1,2はポリイミドフィルム18に設けられた貫通孔と、その貫通孔の下面の開口部を塞ぐ金属パターン11,12とからなる。LED素子3に含まれるサファイヤ基板16は金属パターン11にダイボンディングされ、半導体層15の二つの電極(アノードとカソード)はワイヤ13により金属パターン11,12と接続されている。LED素子3及びフレキシブルプリント基板4の上部は蛍光体を含有するシリコーン樹脂17により被覆されている。   FIG. 1 of Patent Document 2 is shown again in FIG. 8 and the state thereof will be described. FIG. 8 is a cross-sectional view of a conventional LED device 10. In the LED device 10, an LED element 3 (LED die) is mounted on a flexible printed circuit board 4 (FPC board), and the LED element 3 is covered with a silicone resin 17. The flexible printed circuit board 4 includes a polyimide film 18 and metal patterns 11 and 12, and includes recesses 1 and 2. The recesses 1 and 2 are formed of through holes provided in the polyimide film 18 and metal patterns 11 and 12 that block the openings on the lower surface of the through holes. A sapphire substrate 16 included in the LED element 3 is die-bonded to the metal pattern 11, and two electrodes (anode and cathode) of the semiconductor layer 15 are connected to the metal patterns 11 and 12 by wires 13. Upper portions of the LED element 3 and the flexible printed circuit board 4 are covered with a silicone resin 17 containing a phosphor.

特開2005−322937号公報 (図4)Japanese Patent Laying-Open No. 2005-322937 (FIG. 4) 特開2012−64841号公報 (図1)JP 2012-64841 A (FIG. 1)

図7に示した工程で製造されるLED装置は、半導体層(n型層102a、p型層102b)がFPC基板(フレキシブル基板100)と直接的に接続するフリップチップ実装を採用しているため、フリップチップ実装による発光効率の良さ及び放熱性の良さを享受している。とはいっても前述したようにこのLED装置は放熱性を損なう2層FPC基板を使っているので、フリップチップ実装の長所を十分には発揮できていない。またこの2層FPC基板は製造工程を長くしている。   The LED device manufactured in the process shown in FIG. 7 employs flip chip mounting in which the semiconductor layers (n-type layer 102a and p-type layer 102b) are directly connected to the FPC board (flexible board 100). In addition, it enjoys good luminous efficiency and good heat dissipation by flip chip mounting. However, as described above, since this LED device uses a two-layer FPC board that impairs heat dissipation, the advantages of flip chip mounting cannot be fully exhibited. In addition, this two-layer FPC board lengthens the manufacturing process.

これに対し図8に示したLED装置10に含まれるFPC基板(フレキシブルプリント基板4)は、金属電極層(金属パターン11,12)を下面にのみ備えているので放熱性が良く、さらに構造が簡単なため製造工程の長期化を招くこともない。しかしながらLED装置10は、ダイボンディングとワイヤボンディングを使用するいわゆるフェイスアップ実装を採用しているため、ワイヤ14の影による発光効率の低下や、サファイヤ基板16による放熱性の悪化が課題となっている。   On the other hand, the FPC board (flexible printed circuit board 4) included in the LED device 10 shown in FIG. 8 has a metal electrode layer (metal patterns 11 and 12) only on the lower surface, so that heat dissipation is good and the structure is further improved. Since it is simple, the manufacturing process is not prolonged. However, since the LED device 10 employs so-called face-up mounting using die bonding and wire bonding, reduction in light emission efficiency due to the shadow of the wire 14 and deterioration in heat dissipation due to the sapphire substrate 16 are problems. .

以上の理由から、放熱性や発光効率を改善するには下面にのみ金属電極層を備えたFPC基板にLEDダイをフリップチップ実装したLED装置が望まれる。しかしながらこのようなLED装置を実用化するには、このLED装置を容易に製造できなければならないという課題が発生する。   For the above reasons, an LED device in which an LED die is flip-chip mounted on an FPC board having a metal electrode layer only on the lower surface is desired to improve heat dissipation and light emission efficiency. However, in order to put such an LED device into practical use, there arises a problem that the LED device must be easily manufactured.

そこで本発明は、この課題を解決するため、下面にのみ金属電極層を備えたFPC基板にLEDダイをフリップチップ実装しても、製造が容易なLED装置及びそのLED装置を容易に製造できる製造方法を提供することを目的とする。   Therefore, in order to solve this problem, the present invention can easily manufacture an LED device that can be easily manufactured even if an LED die is flip-chip mounted on an FPC board having a metal electrode layer only on the lower surface. It aims to provide a method.

上記課題を解決するため本発明の半導体発光装置の製造方法は、下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装する半導体発光装置の製造方法において、
予め複数の開口部を形成した大判のポリイミドフィルムを準備するポリイミドフィルム準備工程と、
前記ポリイミドフィルムを金属箔に貼りつけ、該金属箔のパターニングにより前記金属電極層を形成し大判FPC基板を作成する大判FPC基板作成工程と、
前記ポリイミドフィルムの前記開口部から露出した前記金属電極層に複数の半導体発光素子をフリップ実装するフリップチップ実装工程と、
前記半導体発光素子の側面及び上面並びに前記大判FPC基板の上面を被覆部材で被覆する被覆工程と、
前記大判FPC基板を個片化して個別の半導体発光装置を得る個片化工程と
を有することを特徴とする。
In order to solve the above problems, a method for manufacturing a semiconductor light-emitting device according to the present invention is a method for manufacturing a semiconductor light-emitting device in which a semiconductor light-emitting element is flip-chip mounted on an FPC board having a metal electrode layer only on a lower surface.
A polyimide film preparation step of preparing a large-sized polyimide film in which a plurality of openings are formed in advance;
The polyimide film is attached to a metal foil, and a large-format FPC substrate creating step of forming the metal electrode layer by patterning the metal foil to create a large-format FPC substrate;
A flip chip mounting step of flip mounting a plurality of semiconductor light emitting elements on the metal electrode layer exposed from the opening of the polyimide film;
A coating step of coating a side surface and an upper surface of the semiconductor light emitting element and an upper surface of the large format FPC substrate with a coating member;
And dividing the large FPC board into individual pieces to obtain individual semiconductor light emitting devices.

本発明の半導体発光装置の製造方法で使用する大判FPC基板は、上層が金属電極層を連結するポリイミドフィルム、下層がパターニングした金属電極層だけからなり、極めて単純な構造となっている。またこの製造方法では、前記大判FPC基板に半導体発光素子をフリップ実装したら半導体発光素子の側面及び上面並びに大判FPC基板上面を被覆部材で被覆し、最後に被覆部材で被覆された大判FPC基板を切断することにより個片化した半導体発光素子を得ている。すなわち被覆部材は半導体発光素子を保護しその発光を調
整する部材であるとともに、硬化により大判FPC基板を支持する部材としても機能する。
The large-format FPC substrate used in the method for manufacturing a semiconductor light emitting device of the present invention has an extremely simple structure consisting of only a polyimide film connecting the metal electrode layers as an upper layer and a patterned metal electrode layer as a lower layer. In this manufacturing method, when the semiconductor light emitting element is flip-mounted on the large format FPC board, the side and top surfaces of the semiconductor light emitting element and the upper surface of the large format FPC board are covered with a covering member, and finally the large format FPC board covered with the covering member is cut. As a result, a semiconductor light emitting device separated into pieces is obtained. That is, the covering member is a member that protects the semiconductor light emitting element and adjusts its light emission, and also functions as a member that supports the large format FPC board by curing.

前記ポリイミドフィルム準備工程において前記開口部をプレスにより形成しても良い。   In the polyimide film preparation step, the opening may be formed by pressing.

前記大判FPC基板作成工程において前記金属箔のパターニング前にポリイミドフィルム側から前記金属箔を支持する支持フィルムの貼付又は支持用樹脂の塗布を行っても良い。   In the large-format FPC substrate creation step, a support film for supporting the metal foil or a support resin may be applied from the polyimide film side before patterning the metal foil.

前記大判FPC基板作成工程において前記金属箔を帯状にパターニングしても良い。   The metal foil may be patterned into a strip shape in the large FPC substrate creation process.

前記被覆工程において前記被覆部材により前記半導体発光素子の底面を被覆しても良い。   In the covering step, the bottom surface of the semiconductor light emitting element may be covered with the covering member.

前記被覆工程において前記被覆部材が上層と下層を有し、前記下層の被覆部材が白色反射部材であり、前記上層の被覆部材が蛍光部材であり、前記白色反射部材により前記半導体発光素子の側面を被覆し、前記蛍光部材により前記半導体発光素子の上面を被覆しても良い。   In the covering step, the covering member has an upper layer and a lower layer, the lower layer covering member is a white reflecting member, the upper layer covering member is a fluorescent member, and the side surface of the semiconductor light emitting element is covered by the white reflecting member. The upper surface of the semiconductor light emitting element may be covered with the fluorescent member.

前記被覆工程において前記蛍光部材が蛍光体シートであり、該蛍光体シートを前記半導体発光素子の上面に貼り付けても良い。   In the covering step, the fluorescent member may be a fluorescent sheet, and the fluorescent sheet may be attached to the upper surface of the semiconductor light emitting element.

上記課題を解決するため本発明の半導体発光装置は、下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装した半導体発光装置において、
平面的に配列し間隙を有する一対の金属電極層と、
前記一対の金属電極層を連結し、且つ前記一対の金属電極層の上面周辺部で前記一対の金属電極層と接着するポリイミドフィルムと、
前記間隙を跨ぐようにして前記一対の金属電極層にフリップ実装された半導体発光素子と、
前記半導体発光素子の側面及び上面並びに前記一対の金属電極層の上面を被覆する被覆部材と
を備えることを特徴としている。
In order to solve the above problems, a semiconductor light-emitting device of the present invention is a semiconductor light-emitting device in which a semiconductor light-emitting element is flip-chip mounted on an FPC board having a metal electrode layer only on the lower surface.
A pair of metal electrode layers arranged in a plane and having a gap;
A polyimide film that connects the pair of metal electrode layers and adheres to the pair of metal electrode layers at a periphery of an upper surface of the pair of metal electrode layers;
A semiconductor light emitting device flip-mounted on the pair of metal electrode layers so as to straddle the gap;
The semiconductor light emitting device includes a covering member that covers a side surface and an upper surface of the semiconductor light emitting element and an upper surface of the pair of metal electrode layers.

本発明の半導体発光装置に含まれるFPC基板は、上層が金属電極層を連結するポリイミドフィルム、下層がパターニングされた金属電極層だけからなり、極めて単純な構造となっている。また本発明の半導体発光装置に含まれる被覆部材は、FPC基板にフリップ実装した半導体発光素子及びFPC基板上面の被覆において、半導体発光素子の保護及び発光特性の調整を行っているとともにFPC基板を補強している。   The FPC substrate included in the semiconductor light emitting device of the present invention has an extremely simple structure consisting of only a polyimide film that connects the metal electrode layers as an upper layer and a patterned metal electrode layer as a lower layer. Further, the covering member included in the semiconductor light emitting device of the present invention reinforces the FPC board while protecting the semiconductor light emitting element and adjusting the light emission characteristics in the semiconductor light emitting element flip-mounted on the FPC board and the coating on the upper surface of the FPC board. doing.

前記ポリイミドフィルムが前記一対の金属電極層の対向する2辺にのみあっても良い。   The polyimide film may be provided only on two opposing sides of the pair of metal electrode layers.

前記被覆部材が白色反射部材と蛍光部材を含み、前記半導体発光素子の側面を前記白色反射部材により被覆し、前記半導体発光素子の上面を前記蛍光部材で被覆しても良い。   The covering member may include a white reflecting member and a fluorescent member, a side surface of the semiconductor light emitting element may be covered with the white reflecting member, and an upper surface of the semiconductor light emitting element may be covered with the fluorescent member.

前記蛍光部材が蛍光体シートであっても良い。   The fluorescent member may be a phosphor sheet.

前記金属電極層が長方形であり、前記間隙に沿わない前記金属電極層の三辺が前記FPC基板の端部と一致していても良い。   The metal electrode layer may be rectangular, and three sides of the metal electrode layer that do not follow the gap may coincide with an end of the FPC board.

以上のように本発明の半導体発光装置の製造方法は、極めて単純な構造の大判FPC基板を使い、同時に大判FPC基板を被覆する被覆部材が補強用の部材並びに保護用及び光学用の部材として機能しているため、構成する部材が少なくなり、下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装した半導体発光装置を容易に製造できる。   As described above, the method for manufacturing a semiconductor light emitting device according to the present invention uses a large-format FPC board having an extremely simple structure, and at the same time, a covering member that covers the large-format FPC board functions as a reinforcing member and a protective and optical member. Therefore, the number of constituent members is reduced, and a semiconductor light emitting device in which a semiconductor light emitting element is flip-chip mounted on an FPC substrate having a metal electrode layer only on the lower surface can be easily manufactured.

以上のように本発明の半導体発光装置は、下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装していても、極めて単純な構造のFPC基板と複数の機能を果たす被覆部材を含む構造であるため、構成する部材が少なくなり製造し易い。   As described above, the semiconductor light emitting device of the present invention has an extremely simple FPC board and a coating that performs a plurality of functions even when the semiconductor light emitting element is flip-chip mounted on the FPC board having the metal electrode layer only on the lower surface. Since it is a structure including members, the number of members to be formed is reduced and it is easy to manufacture.

本発明の実施形態におけるLED装置の外形図。The external view of the LED apparatus in embodiment of this invention. 図1のLED装置の内部構造を示す斜視図。The perspective view which shows the internal structure of the LED apparatus of FIG. 図1のLED装置の内部構造を示す平面図と断面図。The top view and sectional drawing which show the internal structure of the LED device of FIG. 図1のLED装置の製造に用いる大判FPC基板の平面図。The top view of the large format FPC board used for manufacture of the LED device of FIG. 図1のLED装置に対する製造方法の説明図。Explanatory drawing of the manufacturing method with respect to the LED device of FIG. 図1のLED装置に対する製造方法の説明図。Explanatory drawing of the manufacturing method with respect to the LED device of FIG. 従来のLED装置の断面図。Sectional drawing of the conventional LED device. 従来のLED装置の断面図。Sectional drawing of the conventional LED device.

以下、添付図1〜6を参照しながら本発明の好適な実施形態について詳細に説明する。なお図面の説明において、同一または相当要素には同一の符号を付し、重複する説明は省略する。また説明のため部材の縮尺は適宜変更している。さらに特許請求の範囲に記載した発明特定事項との関係をカッコ内に記載している。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to FIGS. In the description of the drawings, the same or equivalent elements will be denoted by the same reference numerals, and redundant description will be omitted. For the sake of explanation, the scale of the members is changed as appropriate. Furthermore, the relationship with the invention specific matter described in the claims is described in parentheses.

図1により本発明の実施形態におけるLED装置20(半導体発光装置)の外形を説明する。図1はLED装置20の外形図であり、(a)が平面図、(b)が正面図、(c)が底面図、(d)が右側面図である。(a)に示すように、LED装置20を上部から眺めると長方形の蛍光部材21(被覆部材)のみが見える。(b)に示すようにLED装置20を正面から眺めると、蛍光部材21の下に白色反射部材22、ポリイミドフィルム23、接続電極(金属電極層)24,25が見え、接続電極24,25の間隙27にも白色反射部材22が存在する。(c)に示すようにLED装置20を底面から眺めると、長方形の接続電極24,25と、その間隙27に充填された白色反射部材22が見える。(d)に示すようにLED装置20を右側面から眺めると、蛍光部材21の下に白色反射部材22、ポリイミドフィルム23,26、接続電極25が見え、ポリイミドフィルム23,26が接続電極25の上面の両端部にあることが分かる。   The outer shape of the LED device 20 (semiconductor light emitting device) in the embodiment of the present invention will be described with reference to FIG. 1A and 1B are external views of the LED device 20, wherein FIG. 1A is a plan view, FIG. 1B is a front view, FIG. 1C is a bottom view, and FIG. As shown in (a), when the LED device 20 is viewed from above, only the rectangular fluorescent member 21 (covering member) is visible. When the LED device 20 is viewed from the front as shown in (b), the white reflecting member 22, the polyimide film 23, and the connection electrodes (metal electrode layers) 24 and 25 can be seen under the fluorescent member 21. The white reflective member 22 is also present in the gap 27. When the LED device 20 is viewed from the bottom as shown in (c), the rectangular connecting electrodes 24 and 25 and the white reflecting member 22 filled in the gap 27 can be seen. When the LED device 20 is viewed from the right side as shown in (d), the white reflecting member 22, the polyimide films 23 and 26, and the connection electrode 25 are seen under the fluorescent member 21, and the polyimide films 23 and 26 are connected to the connection electrode 25. It can be seen that it is at both ends of the upper surface.

次に図2により、図1に示したLED装置20の内部構造を説明する。図2はLED装置20から蛍光部材21と白色反射部材22を取り去った状態を示す斜視図である。FPC基板28は接続電極24,25とポリイミドフィルム23,26からなる。すなわちFPC基板28は、上層にポリイミドフィルム23,26があり、ポリイミドフィルム23,26が下層の接続電極24,25を連結している。以上のようにFPC基板28は極めて単純な構造となっている。またポリイミドフィルム23,26は一対の接続電極24,25の対向する2辺に沿って接続電極24,25に接着している。LEDダイ34は接続電極24,25の間隙を跨ぐようにして接続電極24,25にフリップ実装されている。なおLEDダイ34はその上部を占めるサファイヤ基板31のみが見えている(後述する図3(b)参照)。   Next, the internal structure of the LED device 20 shown in FIG. 1 will be described with reference to FIG. FIG. 2 is a perspective view showing a state in which the fluorescent member 21 and the white reflecting member 22 are removed from the LED device 20. The FPC board 28 includes connection electrodes 24 and 25 and polyimide films 23 and 26. That is, the FPC board 28 has polyimide films 23 and 26 in the upper layer, and the polyimide films 23 and 26 connect the connection electrodes 24 and 25 in the lower layer. As described above, the FPC board 28 has a very simple structure. The polyimide films 23 and 26 are bonded to the connection electrodes 24 and 25 along two opposing sides of the pair of connection electrodes 24 and 25. The LED die 34 is flip-mounted on the connection electrodes 24 and 25 across the gap between the connection electrodes 24 and 25. Note that only the sapphire substrate 31 occupying the LED die 34 is visible (see FIG. 3B described later).

次に図3によりLED装置20の内部構造をさらに詳しく説明する。図3はLED装置
20の内部構造を示す平面図と断面図であり、(a)が図1に示したLED装置20から蛍光部材21と白色反射部材22を取り去った状態を示す平面図、(b)が図1(a)のAA線に沿って描いた断面図、(c)が図1(a)のBB線に沿って描いた断面図である。(a)に示すように接続電極24,25の間には間隙27が存在し、LEDダイ34が接続電極24,25の間隙27を跨ぐようにしてフリップ実装されている。
Next, the internal structure of the LED device 20 will be described in more detail with reference to FIG. 3A and 3B are a plan view and a cross-sectional view showing the internal structure of the LED device 20, and FIG. 3A is a plan view showing a state where the fluorescent member 21 and the white reflecting member 22 are removed from the LED device 20 shown in FIG. 2B is a cross-sectional view drawn along the line AA in FIG. 1A, and FIG. 2C is a cross-sectional view drawn along the line BB in FIG. As shown in (a), there is a gap 27 between the connection electrodes 24 and 25, and the LED die 34 is flip-mounted so as to straddle the gap 27 between the connection electrodes 24 and 25.

図3(b)の断面図では、突起電極33上に半導体層32とサファイヤ基板31が積層したLEDダイ34が示されている。突起電極33はアノードとカソードであり、Au−Sn共晶や高融点半田等で接続電極24,25と接続している。またLEDダイ34は、側面と底面が白色反射部材22で被覆され、上面が蛍光部材21で被覆されている。蛍光部材21は白色反射部材22の上面も被覆している。   In the cross-sectional view of FIG. 3B, the LED die 34 in which the semiconductor layer 32 and the sapphire substrate 31 are stacked on the protruding electrode 33 is shown. The protruding electrodes 33 are an anode and a cathode, and are connected to the connection electrodes 24 and 25 by Au—Sn eutectic or high melting point solder. In addition, the LED die 34 is coated with the white reflecting member 22 on the side surface and the bottom surface, and with the fluorescent member 21 on the top surface. The fluorescent member 21 also covers the upper surface of the white reflecting member 22.

図3(c)の断面図では、接続電極25上の左右の端部にポリイミドフィルム23,26が積層し、中央部にLEDダイ34が積層している様子が示されている。またLEDダイ34は、側面が白色反射部材22で被覆され、LEDダイ34及び白色反射部材22の上面が蛍光部材21で被覆されている。   3C shows a state in which polyimide films 23 and 26 are stacked on the left and right ends on the connection electrode 25, and an LED die 34 is stacked on the center. Further, the LED die 34 is covered with the white reflecting member 22 on the side surface, and the upper surfaces of the LED die 34 and the white reflecting member 22 are covered with the fluorescent member 21.

ポリイミドフィルム23,26は厚さが12〜50μmである。接続電極24,25は銅箔にNi−Au又はSnをメッキしたものであり、銅箔の厚さが18〜70μm、メッキの厚さが1〜6μmである。蛍光部材21は、シリコーン樹脂に蛍光体微粒子を混練したシートを貼り付けたものであり、厚さが約100μmである。白色反射部材22はシリコーン樹脂にアルミナや酸化チタン等の反射性微粒子を混練し硬化させたものである。   The polyimide films 23 and 26 have a thickness of 12 to 50 μm. The connection electrodes 24 and 25 are obtained by plating Ni—Au or Sn on a copper foil. The thickness of the copper foil is 18 to 70 μm and the thickness of the plating is 1 to 6 μm. The fluorescent member 21 is obtained by attaching a sheet obtained by kneading phosphor fine particles to a silicone resin, and has a thickness of about 100 μm. The white reflective member 22 is obtained by kneading and curing reflective fine particles such as alumina and titanium oxide in a silicone resin.

白色反射部材22はLEDダイ34の側面から出射しようとする光をLEDダイ34内に戻し、最終的にLEDダイ34の上方に向かわせようとしている。蛍光部材21はLEDダイ34の発光の一部を波長変換するものである。また白色反射部材22と蛍光部材21でFPC基板28を補強し、LED装置20全体の強度を保っている。   The white reflecting member 22 returns the light to be emitted from the side surface of the LED die 34 into the LED die 34 and is finally directed toward the upper side of the LED die 34. The fluorescent member 21 converts the wavelength of part of the light emitted from the LED die 34. Further, the FPC board 28 is reinforced by the white reflecting member 22 and the fluorescent member 21, and the strength of the entire LED device 20 is maintained.

LEDダイ34はサファイヤ基板31及び半導体層32、突起電極33を含む。サファイヤ基板31の厚さは80〜150μm、半導体層32の厚さは10μm弱、突起電極33の厚さは10〜30μm程度である。半導体層32は、GaNバッファ層とn型GaN層を含むn型半導体層と、p型GaN層とともに反射層や原子拡散防止層などの金属多層膜を含むp型半導体層とからなる。なお発光層はp型半導体層とn型半導体層の境界部にある。突起電極33はAu又はCuをコアとするバンプであり電解メッキ法で形成する。   The LED die 34 includes a sapphire substrate 31, a semiconductor layer 32, and a protruding electrode 33. The thickness of the sapphire substrate 31 is 80 to 150 μm, the thickness of the semiconductor layer 32 is less than 10 μm, and the thickness of the protruding electrode 33 is about 10 to 30 μm. The semiconductor layer 32 includes an n-type semiconductor layer including a GaN buffer layer and an n-type GaN layer, and a p-type semiconductor layer including a p-type GaN layer and a metal multilayer film such as a reflective layer or an atomic diffusion prevention layer. The light emitting layer is at the boundary between the p-type semiconductor layer and the n-type semiconductor layer. The protruding electrode 33 is a bump having Au or Cu as a core, and is formed by an electrolytic plating method.

次に図4により大判FPC基板40について説明する。図4は大判FPC基板40の平面図である。大判FPC基板40は、それぞれ帯状のポリイミドフィルム41と金属電極層42により格子を為しており、個片化すると多数のFPC基板28が得られる。そこで参考のため図中に一個のFPC基板28が得られる領域を破線で示した。また図示していないが帯状のポリイミドフィルム41の左右の端部は連結している。隣接する金属電極層42の間には間隙43があり、間隙43は個片化すると間隙27(図3(a)参照)となる。同様に金属電極層42は個片化すると接続電極24,25(図3(a)参照)となる。   Next, the large format FPC board 40 will be described with reference to FIG. FIG. 4 is a plan view of the large format FPC board 40. The large-format FPC board 40 has a lattice formed of a strip-like polyimide film 41 and a metal electrode layer 42, and a large number of FPC boards 28 can be obtained when separated into individual pieces. Therefore, for reference, a region where one FPC board 28 is obtained is indicated by a broken line in the drawing. Although not shown, the left and right ends of the strip-shaped polyimide film 41 are connected. There is a gap 43 between the adjacent metal electrode layers 42, and the gap 43 becomes a gap 27 (see FIG. 3A) when separated. Similarly, when the metal electrode layer 42 is separated, the connection electrodes 24 and 25 (see FIG. 3A) are obtained.

次に図5と図6によりLED装置20の製造方法を説明する。図5、図6は図1のLED装置に対する製造方法の説明図であり、図5が図4で示した大判FPC基板40を得るまでの工程を示し、図6がその後LED装置20を得るまでの工程を示している。なお実際の製造工程では、多数のLEDダイ実装領域を有する大判FPC基板40を用いて多数のLED装置20を同時並行的に製造している。しかしながら図5、図6の説明では、各工程に対し概ね一個分のLED装置20について特徴的な状態の断面図を示した。また図
中、左側が正面から見た断面図、右側が右側面方向から見た断面図であり、それぞれ図3(b)、(c)に対応する。
Next, a method for manufacturing the LED device 20 will be described with reference to FIGS. FIGS. 5 and 6 are explanatory views of a manufacturing method for the LED device of FIG. These steps are shown. In an actual manufacturing process, a large number of LED devices 20 are manufactured in parallel using a large format FPC board 40 having a large number of LED die mounting regions. However, in description of FIG. 5, FIG. 6, sectional drawing of the characteristic state about the LED apparatus 20 for about one piece was shown with respect to each process. In the drawing, the left side is a cross-sectional view seen from the front, and the right side is a cross-sectional view seen from the right side direction, and corresponds to FIGS. 3B and 3C, respectively.

図5(a)は予め複数の開口部を形成した大判のポリイミドフィルム41を準備するポリイミドフィルム準備工程を示している。ポリイミドフィルム41の開口は、平板状のポリイミドシートをプレス加工することにより形成する。このとき同時に平板状の金属箔42aを準備する。   FIG. 5A shows a polyimide film preparation process for preparing a large-sized polyimide film 41 in which a plurality of openings are formed in advance. The opening of the polyimide film 41 is formed by pressing a flat polyimide sheet. At the same time, a flat metal foil 42a is prepared.

図5(b)〜(e)は、大判のポリイミドフィルム41を金属箔42aに貼りつけ、金属箔42aのパターニングにより金属電極層42を形成し大判FPC基板40を作成する大判FPC作成工程を示している。まず(b)に示すように大判のポリイミドフィルム41を接着剤で金属箔42aに貼り付ける。次に(c)に示すように支持用樹脂51を上面側に塗布し、支持用樹脂51を硬化させる。次に(d)で示すように金属箔42aをエッチングし、帯状の金属電極層42を形成(パターニング)する。最後に(e)で示すように支持用樹脂51を除去し、金属電極層42をメッキする。なお支持用樹脂51の塗布は支持用フィルムの貼付に置き換えることが可能である。この支持用フィルムはポリイミドフィルム41側から金属箔42aに貼り付け、金属箔42aのパターニング後剥がす。   FIGS. 5B to 5E show a large-format FPC creation process in which a large-format FPC substrate 40 is formed by attaching a large-size polyimide film 41 to a metal foil 42a and forming a metal electrode layer 42 by patterning the metal foil 42a. ing. First, as shown in (b), a large polyimide film 41 is attached to the metal foil 42a with an adhesive. Next, as shown in (c), the supporting resin 51 is applied to the upper surface side, and the supporting resin 51 is cured. Next, as shown in (d), the metal foil 42a is etched to form (pattern) a band-shaped metal electrode layer 42. Finally, as shown in (e), the supporting resin 51 is removed and the metal electrode layer 42 is plated. The application of the supporting resin 51 can be replaced with the application of a supporting film. This supporting film is attached to the metal foil 42a from the polyimide film 41 side, and is peeled off after patterning the metal foil 42a.

図6(a)は、大判FPC基板40に含まれる金属電極層42に複数のLEDダイ34をフリップ実装するフリップチップ実装工程を示している。LEDダイ34はポリイミドフィルム41の開口部から露出した金属電極層42にフリップチップ実装する。なお金属電極層42の下面には支持フィルム(図示せず)を貼り付けておく(以下同様)。LEDダイ34を一個ずつ大判FPC基板40上に配列させても良いが、予め電極面を上にして複数のLEDダイ34を粘着シート上に配列させておき、この粘着シートを上下反転し一回的に多数のLEDダイ34を大判FPC基板40に接合するのが好ましい。この接合はAu−Sn共晶か高融点半田で行う。   FIG. 6A shows a flip chip mounting process in which a plurality of LED dies 34 are flip mounted on the metal electrode layer 42 included in the large format FPC board 40. The LED die 34 is flip-chip mounted on the metal electrode layer 42 exposed from the opening of the polyimide film 41. A support film (not shown) is attached to the lower surface of the metal electrode layer 42 (the same applies hereinafter). The LED dies 34 may be arranged one by one on the large format FPC board 40, but a plurality of LED dies 34 are arranged on the adhesive sheet in advance with the electrode surface facing up, and the adhesive sheet is turned upside down once. In particular, it is preferable to bond a large number of LED dies 34 to the large format FPC board 40. This bonding is performed using Au-Sn eutectic or high melting point solder.

図6(b)〜(c)は被覆工程を示し、このうち(b)がLEDダイ34の側面及び底面並びに大判FPC基板40を白色反射部材46で被覆する工程であり、(c)がLEDダイ34の上面及び白色反射部材46の上面を蛍光部材47で被覆する工程である。(b)の工程ではLEDダイ34の上面を覆わないように硬化前の白色反射部材46をディスペンサで大判FPC基板40上に塗布する。(c)の工程ではこの大判FPC基板40を加熱し白色反射部材46を硬化させたらシート状の蛍光部材47を貼り付ける。なお(b)の工程でスキージにより白色反射部材46を塗布する場合は、塗布後白色反射部材46の上面を研磨しLEDダイ34の上面を露出させる。また蛍光部材47は、硬化前のシリコーン樹脂に蛍光体を混練した蛍光樹脂を塗布し、その後加熱により硬化させて形成しても良い。   6 (b) to 6 (c) show the covering step, in which (b) is a step of covering the side and bottom surfaces of the LED die 34 and the large FPC board 40 with the white reflecting member 46, and (c) is the LED. This is a step of covering the upper surface of the die 34 and the upper surface of the white reflecting member 46 with the fluorescent member 47. In the step (b), the white reflecting member 46 before curing is applied onto the large FPC board 40 with a dispenser so as not to cover the upper surface of the LED die 34. In the step (c), when the large-format FPC board 40 is heated to cure the white reflecting member 46, a sheet-like fluorescent member 47 is attached. In addition, when apply | coating the white reflective member 46 with a squeegee at the process of (b), the upper surface of the white reflective member 46 is grind | polished after application | coating and the upper surface of the LED die 34 is exposed. Alternatively, the fluorescent member 47 may be formed by applying a fluorescent resin obtained by kneading a phosphor to a silicone resin before being cured, and then curing by heating.

図6(d)は、被覆し終わった大判FPC基板40を個片化して個別のLED装置20を得る個片化工程を示している。切断はダイシングで行う。このとき(a)で示した支持フィルムを切断しないようにし、個片化後LED装置20を支持フィルムから拾い上げる。   FIG. 6D shows an individualization step for obtaining individual LED devices 20 by dividing the large FPC board 40 that has been coated. Cutting is performed by dicing. At this time, the support film shown in (a) is not cut, and the LED device 20 is picked up from the support film after separation.

なお、本実施形態のLED装置20では、FPC基板28において接続電極24,25を連結する部材がポリイミドフィルム23,26であった(図2参照)。しかしながら接続電極24,25を連結させる部材はポリイミドフィルムに限られず、例えば予め開口を形成した薄いガラエポ基板を金属箔に貼り付け、その後金属箔をパターニングして接続電極を形成しても良い。しかしながらポリイミドフィルムは加工性が良く、プレス加工で開口を形成する際にバリが出にくいという特徴がある。   In addition, in the LED device 20 of this embodiment, the member which connects the connection electrodes 24 and 25 in the FPC board | substrate 28 was the polyimide films 23 and 26 (refer FIG. 2). However, the member for connecting the connection electrodes 24 and 25 is not limited to the polyimide film. For example, a thin glass substrate having an opening formed in advance may be attached to the metal foil, and then the metal foil may be patterned to form the connection electrode. However, the polyimide film has a good workability and has a feature that burrs are not easily generated when an opening is formed by pressing.

また本実施形態のLED装置20ではポリイミドフィルム23,26がFPC基板28の長辺に沿って2本配置されていた(図3参照)が、ポリイミドフィルムがFPC基板28の周囲を一周するようにしても良い。また本実施形態のLED装置20では接続電極24,25の3辺がFPC基板28の外形と一致していた(図3参照)が、接続電極の3辺をFPC基板の内側に収まるようにしても良い。この場合FPC基板の外形はポリイミドフィルムの外形と一致する。しかしながら実施形態20のようにポリイミドフィルム23,26を配置し、金属電極層が接続電極24,25の形状をとることで大判FPC基板40(図4参照)の構造が単純化し製造が容易になる。   In the LED device 20 of the present embodiment, two polyimide films 23 and 26 are arranged along the long side of the FPC board 28 (see FIG. 3), but the polyimide film makes a round around the FPC board 28. May be. Further, in the LED device 20 of the present embodiment, the three sides of the connection electrodes 24 and 25 coincide with the outer shape of the FPC board 28 (see FIG. 3), but the three sides of the connection electrodes are placed inside the FPC board. Also good. In this case, the outer shape of the FPC board matches the outer shape of the polyimide film. However, the polyimide films 23 and 26 are arranged as in the embodiment 20, and the metal electrode layer takes the shape of the connection electrodes 24 and 25, thereby simplifying the structure of the large FPC board 40 (see FIG. 4) and facilitating manufacture. .

また本実施形態のLED装置20では被覆部材が白色反射部材22と蛍光部材21からなっていた(図3参照)が、被覆部材全体を蛍光部材としても良い。この場合はLED装置の側方にも光が出射する。   In the LED device 20 of this embodiment, the covering member is composed of the white reflecting member 22 and the fluorescent member 21 (see FIG. 3), but the entire covering member may be a fluorescent member. In this case, light is emitted also to the side of the LED device.

20…LED装置(半導体発光装置)、
21,47…蛍光部材(被覆部材)、
22,46…白色反射部材(被覆部材)、
23,26,41…ポリイミドフィルム、
24,25…接続電極
27,43…間隙、
28…FPC基板、
31…サファイヤ基板、
32…半導体層、
33…突起電極、
34…LEDダイ(半導体発光素子)、
40…大判FPC基板、
42…金属電極層、
42a…金属箔、
51…支持用樹脂。
20 ... LED device (semiconductor light emitting device),
21, 47... Fluorescent member (coating member),
22, 46 ... White reflective member (coating member),
23, 26, 41 ... polyimide film,
24, 25 ... connection electrode 27, 43 ... gap,
28 ... FPC board,
31 ... Sapphire substrate,
32 ... Semiconductor layer,
33 ... protruding electrode,
34 ... LED die (semiconductor light emitting element),
40 ... Large FPC board,
42 ... Metal electrode layer,
42a ... metal foil,
51: Supporting resin.

Claims (12)

下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装する半導体発光装置の製造方法において、
予め複数の開口部を形成した大判のポリイミドフィルムを準備するポリイミドフィルム準備工程と、
前記ポリイミドフィルムを金属箔に貼りつけ、該金属箔のパターニングにより前記金属電極層を形成し大判FPC基板を作成する大判FPC基板作成工程と、
前記ポリイミドフィルムの前記開口部から露出した前記金属電極層に複数の半導体発光素子をフリップ実装するフリップチップ実装工程と、
前記半導体発光素子の側面及び上面並びに前記大判FPC基板の上面を被覆部材で被覆する被覆工程と、
前記大判FPC基板を個片化して個別の半導体発光装置を得る個片化工程と
を有することを特徴とする半導体発光装置の製造方法。
In a method of manufacturing a semiconductor light emitting device in which a semiconductor light emitting element is flip-chip mounted on an FPC board having a metal electrode layer only on the lower surface,
A polyimide film preparation step of preparing a large-sized polyimide film in which a plurality of openings are formed in advance;
The polyimide film is attached to a metal foil, and a large-format FPC substrate creating step of forming the metal electrode layer by patterning the metal foil to create a large-format FPC substrate;
A flip chip mounting step of flip mounting a plurality of semiconductor light emitting elements on the metal electrode layer exposed from the opening of the polyimide film;
A coating step of coating a side surface and an upper surface of the semiconductor light emitting element and an upper surface of the large format FPC substrate with a coating member;
A method of manufacturing a semiconductor light emitting device, comprising: a step of dividing the large FPC substrate into individual pieces to obtain individual semiconductor light emitting devices.
前記ポリイミドフィルム準備工程において前記開口部をプレスにより形成することを特徴とする請求項1に記載の半導体発光装置の製造方法。   The method for manufacturing a semiconductor light emitting device according to claim 1, wherein the opening is formed by pressing in the polyimide film preparation step. 前記大判FPC基板作成工程において前記金属箔のパターニング前にポリイミドフィルム側から前記金属箔を支持する支持フィルムの貼付又は支持用樹脂の塗布を行うことを特徴とする請求項1又は2に記載の半導体発光装置の製造方法。   3. The semiconductor according to claim 1, wherein in the large-format FPC board creation step, a support film for supporting the metal foil is applied from a polyimide film side or a support resin is applied before patterning the metal foil. Manufacturing method of light-emitting device. 前記大判FPC基板作成工程において前記金属箔を帯状にパターニングすることを特徴とする請求項1から3のいずれか一項に記載の半導体発光装置の製造方法。   4. The method for manufacturing a semiconductor light emitting device according to claim 1, wherein the metal foil is patterned into a strip shape in the large-format FPC substrate creation step. 5. 前記被覆工程において前記被覆部材により前記半導体発光素子の底面を被覆することを特徴とする請求項1から4のいずれか一項に記載の半導体発光装置の製造方法。   5. The method of manufacturing a semiconductor light emitting device according to claim 1, wherein a bottom surface of the semiconductor light emitting element is covered with the covering member in the covering step. 前記被覆工程において前記被覆部材が上層と下層を有し、前記下層の被覆部材が白色反射部材であり、前記上層の被覆部材が蛍光部材であり、前記白色反射部材により前記半導体発光素子の側面を被覆し、前記蛍光部材により前記半導体発光素子の上面を被覆することを特徴とする請求項1から5のいずれか一項に記載の半導体発光装置の製造方法。   In the covering step, the covering member has an upper layer and a lower layer, the lower layer covering member is a white reflecting member, the upper layer covering member is a fluorescent member, and the side surface of the semiconductor light emitting element is covered by the white reflecting member. 6. The method of manufacturing a semiconductor light emitting device according to claim 1, wherein the semiconductor light emitting element is covered and the upper surface of the semiconductor light emitting element is covered with the fluorescent member. 前記被覆工程において前記蛍光部材が蛍光体シートであり、該蛍光体シートを前記半導体発光素子の上面に貼り付けることを特徴とする請求項1から6のいずれか一項に記載の半導体発光装置の製造方法。   The semiconductor light emitting device according to claim 1, wherein the fluorescent member is a phosphor sheet in the covering step, and the phosphor sheet is attached to an upper surface of the semiconductor light emitting element. Production method. 下面にのみ金属電極層を備えたFPC基板に半導体発光素子をフリップチップ実装した半導体発光装置において、
平面的に配列し間隙を有する一対の金属電極層と、
前記一対の金属電極層を連結し、且つ前記一対の金属電極層の上面周辺部で前記一対の金属電極層と接着するポリイミドフィルムと、
前記間隙を跨ぐようにして前記一対の金属電極層にフリップ実装された半導体発光素子と、
前記半導体発光素子の側面及び上面並びに前記一対の金属電極層の上面を被覆する被覆部材と
を備えることを特徴とする半導体発光装置。
In a semiconductor light emitting device in which a semiconductor light emitting element is flip-chip mounted on an FPC board having a metal electrode layer only on the lower surface,
A pair of metal electrode layers arranged in a plane and having a gap;
A polyimide film that connects the pair of metal electrode layers and adheres to the pair of metal electrode layers at a periphery of an upper surface of the pair of metal electrode layers;
A semiconductor light emitting device flip-mounted on the pair of metal electrode layers so as to straddle the gap;
A semiconductor light-emitting device comprising: a side surface and an upper surface of the semiconductor light-emitting element; and a covering member that covers the upper surfaces of the pair of metal electrode layers.
前記ポリイミドフィルムが前記一対の金属電極層の対向する2辺にのみあることを特徴とする請求項8に記載の半導体発光装置。   The semiconductor light emitting device according to claim 8, wherein the polyimide film is only on two opposing sides of the pair of metal electrode layers. 前記被覆部材が白色反射部材と蛍光部材を含み、前記半導体発光素子の側面を前記白色反射部材により被覆し、前記半導体発光素子の上面を前記蛍光部材で被覆することを特徴とする請求項8又は9に記載の半導体発光装置。   The said covering member contains a white reflective member and a fluorescent member, the side surface of the said semiconductor light emitting element is coat | covered with the said white reflective member, and the upper surface of the said semiconductor light emitting element is coat | covered with the said fluorescent member. 9. The semiconductor light emitting device according to 9. 前記蛍光部材が蛍光体シートであることを特徴とする請求項8から10のいずれか一項に記載の半導体発光装置。   The semiconductor light emitting device according to claim 8, wherein the fluorescent member is a phosphor sheet. 前記金属電極層が長方形であり、前記間隙に沿わない前記金属電極層の三辺が前記FPC基板の端部と一致していていることを特徴とする請求項8から11のいずれか一項に記載の半導体発光装置。   12. The metal electrode layer according to claim 8, wherein the metal electrode layer has a rectangular shape, and three sides of the metal electrode layer not along the gap coincide with an end portion of the FPC board. The semiconductor light-emitting device as described.
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