JP2014006364A - Exposure device and exposure method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To expose a film with a different pattern from two patterns.SOLUTION: An exposure device comprises: a film holding part for holding a film; a mask in which a first pattern and a second pattern separated from the first pattern are formed; and an exposure part for irradiating the mask with a light flux and exposing the film by the light flux having passed the first pattern or the second pattern. The exposure part comprises: a first optical output part for outputting a first light flux irradiating the first pattern; and a second optical output part for outputting a second light flux having a main beam intersecting a main beam of the first light flux outputted from the first optical output part and irradiating the second pattern. The film holding part holds the film at a position closer to the mask than a position at which the first light flux is intersected with the second light flux.

Description

  The present invention relates to an exposure apparatus and an exposure method.

An exposure apparatus that exposes a film with two different patterns is known (see, for example, Patent Document 1).
[Patent Document 1] US Patent Application Publication No. 2011/0217638

  In the above-described exposure apparatus, one end of one pattern and one end of the other pattern are formed at substantially the same position, so that the light transmitted through one pattern and the light transmitted through the other pattern are in front of the film. There was a crosstalk that crossed at. As a result, there is a problem that the film is exposed in a pattern different from the two patterns.

  In the first aspect of the present invention, a film holding portion for holding a film, a mask on which a first pattern and a second pattern separated from the first pattern are formed, and a light beam is applied to the mask. An exposure unit that exposes the film with a light beam that has passed through the first pattern or the second pattern, and the exposure unit outputs a first light beam that irradiates the first pattern; A second light output unit that outputs a second light beam that has a principal ray intersecting with the principal ray of the first light beam output from the first light output unit and irradiates the second pattern; The film holding unit provides an exposure apparatus that holds the film at a position closer to the mask than a position where the first light flux and the second light flux intersect.

  In the second aspect of the present invention, the film holding stage for holding the film, the first pattern, and the mask formed with the second pattern spaced apart from the first pattern are irradiated with light flux, and the first An exposure step of exposing the film with a pattern or a light flux that has passed through the second pattern, wherein the exposure step outputs a first light flux that irradiates the first pattern, and a principal ray of the first light flux; A second light beam having an intersecting principal ray and irradiating the second pattern is output, and in the film holding stage, a position closer to the mask than a position where the first light beam and the second light beam intersect An exposure method for arranging the film is provided.

  It should be noted that the above summary of the invention does not enumerate all the necessary features of the present invention. In addition, a sub-combination of these feature groups can also be an invention.

It is a whole top view of optical film 100 manufactured by this embodiment. It is a longitudinal cross-sectional view along the II-II line of FIG. 1 is an exploded perspective view of a stereoscopic image display device provided with an optical film 100. FIG. 1 is an overall configuration diagram of an exposure apparatus 10 according to the present embodiment. 3 is an enlarged view of an exposure unit 18. FIG. 4 is a bottom view of a mask 38. FIG. It is a longitudinal cross-sectional view of the mask 38 along the VII-VII line of FIG. It is a figure explaining the mask 238 which changed. It is a figure explaining the mask 338 changed. It is a figure explaining the changed polarized light source 434. FIG. It is a figure explaining the changed polarized light source 534. FIG.

  Hereinafter, the present invention will be described through embodiments of the invention, but the following embodiments do not limit the invention according to the claims. In addition, not all the combinations of features described in the embodiments are essential for the solving means of the invention.

  FIG. 1 is an overall plan view of an optical film 100 manufactured according to this embodiment. The optical film 100 is manufactured by an exposure apparatus described later. The optical film 100 is provided on the image output side of the image generation unit of the stereoscopic image display device, and outputs a right-eye image and a left-eye image.

  The optical film 100 is formed in a rectangular shape having a side of several centimeters to several meters. As shown in FIG. 1, the optical film 100 includes a resin base material 102, a first polarization modulation unit 104, and a second polarization modulation unit 106.

The resin base material 102 is formed by cutting a long film made of resin, which will be described later, into a certain length. The resin base material 102 transmits light. An example of the thickness of the resin base material 102 is 50 μm to 100 μm. The resin base material 102 supports the first polarization modulation unit 104 and the second polarization modulation unit 106. The resin base material 102 can be constituted by a cycloolefin-based film. A cycloolefin polymer (= COP) having a coefficient of thermal expansion of 70 × 10 ⁻⁶ / ° C., more preferably a cycloolefin copolymer (═COC), which is a copolymer of cycloolefin polymers, is used as the cycloolefin film. Can do. An example of the COP film is ZEONOR film ZF14 manufactured by Nippon Zeon. Moreover, you may comprise the resin base material 102 by the material containing a triacetyl cellulose (= TAC) whose thermal expansion coefficient is 54 * 10 < ^-6 > / degreeC. Examples of the TAC film include Fujitac T80SZ and TD80UL manufactured by Fuji Photo Film Co., Ltd. In addition, when using a cycloolefin type film, it is preferable to use a high toughness type film from a viewpoint of brittleness.

  The first polarization modulator 104 and the second polarization modulator 106 are formed in the same shape in plan view. The first polarization modulator 104 and the second polarization modulator 106 have a rectangular shape extending along the long side direction of the resin base material 102. The long side direction of the resin base material 102 here is a horizontal direction in the optical film 100 incorporated in the stereoscopic image display. Therefore, the short side direction of the resin base material 102 is the vertical direction in the optical film 100 incorporated in the stereoscopic image display. The first polarization modulator 104 and the second polarization modulator 106 are alternately arranged along the vertical direction in a state where one side is in contact with each other. The first polarization modulator 104 and the second polarization modulator 106 may be alternately arranged along the horizontal direction.

  The first polarization modulator 104 and the second polarization modulator 106 modulate the polarization state of the transmitted polarized light. The first polarization modulation unit 104 and the second polarization modulation unit 106 have a phase difference function of a quarter wavelength plate, for example. The first polarization modulator 104 and the second polarization modulator 106 may have a half-wave plate phase difference function. The first polarization modulator 104 has, for example, an optical axis oriented in a direction parallel to the arrow 110 described at the right end of the first polarization modulator 104 in FIG. Thus, for example, when linearly polarized light having a polarization direction rotated by 45 ° from the arrow 110 is input, the first polarization modulator 104 modulates the polarized light into circularly polarized light having a clockwise polarization direction indicated by the adjacent arrow 112. And output. The second polarization modulator 106 is, for example, an optical axis oriented in a direction parallel to the arrow 114 described at the right end of the second polarization modulator 106 in FIG. 1, and the optical axis of the first polarization modulator 104. Having orthogonal optical axes. Thereby, for example, when the linearly polarized light having the polarization direction rotated by 45 ° from the arrow 110 is input, the second polarization modulator 106 modulates the polarized light into the circularly polarized light having the counterclockwise polarization direction indicated by the adjacent arrow 116. And output. An example of the optical axis is a fast axis or a slow axis. Here, the variation in the orientation angle of the optical axes of the first polarization modulator 104 and the second polarization modulator 106 is ± 0.5 ° or less, more preferably ± 0.2 ° or less. The variation in the orientation angle is a variation from a set value of 0 °.

  As a result, even if linearly polarized light having the same polarization direction is input to the first polarization modulator 104 and the second polarization modulator 106, the polarization direction of the polarization output from the second polarization modulator 106 and the first polarization modulation The polarization direction of the polarized light output from the unit 104 is different. For example, the polarization direction of the polarized light output from the second polarization modulation unit 106 is circularly polarized light that is reverse to the polarization direction of the polarization output from the first polarization modulation unit 104.

  2 is a longitudinal sectional view taken along line II-II in FIG. As shown in FIG. 2, each first polarization modulator 104 and second polarization modulator 106 includes an alignment film 120 and a liquid crystal film 122.

  The alignment film 120 is formed on the surface of the resin base material 102. A known photo-alignment compound can be applied to the alignment film 120. A photo-alignment compound is a material in which molecules are regularly aligned in the polarization direction of linearly polarized light when irradiated with linearly polarized light such as ultraviolet rays. Further, the photo-alignment compound has a function of aligning the molecules of the liquid crystal film 122 formed on the self along the self-alignment. Examples of the photo-alignment compound include photodecomposition type, photodimerization type, and photoisomerization type compounds. The alignment film 120 has a plurality of first alignment regions 124 and a plurality of second alignment regions 126. The plurality of first alignment regions 124 and the plurality of second alignment regions 126 are alternately arranged along the arrangement direction. The arrangement direction here is parallel to the vertical direction. All the second alignment regions 126 adjacent to the first alignment region 124 are in contact with each other. The first alignment region 124 constitutes a part of the first polarization modulation unit 104. The first alignment region 124 is aligned in a direction corresponding to the optical axis of the first polarization modulator 104. The second alignment region 126 constitutes a part of the second polarization modulation unit 106. The second alignment region 126 is aligned in a direction orthogonal to the alignment direction of the first alignment region 124 and corresponding to the optical axis of the second polarization modulator 106.

  The liquid crystal film 122 is formed on the alignment film 120. The liquid crystal film 122 can be formed of a liquid crystal polymer that can be cured by ultraviolet rays or heating. The liquid crystal film 122 includes a first liquid crystal region 128 and a second liquid crystal region 130. The first liquid crystal region 128 constitutes a part of the first polarization modulation unit 104. The first liquid crystal region 128 is formed on the first alignment region 124. The molecules of the first liquid crystal region 128 are aligned along the alignment of the first alignment region 124. The second liquid crystal region 130 constitutes a part of the second polarization modulation unit 106. The second liquid crystal region 130 is formed on the second alignment region 126. The molecules of the second liquid crystal region 130 are aligned along the alignment of the second alignment region 126.

  FIG. 3 is an exploded perspective view of the stereoscopic image display device provided with the optical film 100. As indicated by an arrow in FIG. 3, the direction in which the user is positioned and the direction in which the image is output is the front of the stereoscopic image display device. As illustrated in FIG. 3, the stereoscopic image display device 150 includes a light source 152, an image output unit 154, the optical film 100, and an optical function film 158.

  The light source 152 irradiates white non-polarized light with substantially uniform intensity in the plane. The light source 152 is disposed at the rear of the stereoscopic image display device 150 as viewed from the user. The light source 152 includes a light source that combines a diffusion plate and a cold cathode fluorescent lamp (CCFL), a light source that combines a prism lens and a light emitting diode (LED), and an organic EL (Electro-Luminescence). A surface light source including

  The image output unit 154 is disposed in front of the light source 152. The image output unit 154 outputs an image using light from the light source 152. The image output unit 154 includes a polarizing plate 164, a holding substrate 166, an image generation unit 168, a holding substrate 170, and a polarizing plate 174.

  The polarizing plate 164 is disposed between the light source 152 and the holding substrate 166. An example of the material constituting the polarizing plate 164 is a resin containing PVA (polyvinyl alcohol). The polarizing plate 164 has a transmission axis inclined by 45 ° from the horizontal direction and an absorption axis perpendicular to the transmission axis. As a result, among the non-polarized light output from the light source 152 and incident on the polarizing plate 164, the component whose vibration direction is parallel to the transmission axis of the polarizing plate 164 is transmitted and the component parallel to the absorption axis is absorbed and blocked. Is done. For this reason, the light output from the polarizing plate 164 becomes linearly polarized light having the transmission axis of the polarizing plate 164 as the polarization direction.

  The holding substrate 166 is disposed between the polarizing plate 164 and the image generation unit 168. The holding substrate 166 can be a transparent glass plate. The holding substrate 166 can be a transparent composite sheet using a transparent composite material including a transparent resin and glass cloth in addition to the glass plate. Thereby, weight reduction and flexibility of the stereoscopic image display device 150 can be achieved. The rear surface of the holding substrate 166 holds the polarizing plate 164 via an adhesive.

  The image generation unit 168 is disposed and held between the holding substrate 166 and the holding substrate 170. The image generation unit 168 includes a plurality of pixels (= pixels) that generate an image. The plurality of pixels are two-dimensionally arranged at a constant pitch in the vertical direction and the horizontal direction. A pixel is a unit for handling an image and outputs color information of tone and gradation. Each pixel has three sub-pixels (= sub-pixels). Each sub-pixel has a liquid crystal part and transparent electrodes formed on the front and back surfaces of the liquid crystal part. The transparent electrode applies a voltage to the liquid crystal part. The liquid crystal portion of the subpixel to which the voltage is applied rotates the polarization direction of the linearly polarized light by 90 °. Each of the three subpixels included in each pixel includes a red color filter, a green color filter, and a blue color filter. By controlling the voltage application of the transparent electrode of the subpixel, the red, green, and blue light output from the subpixel is increased or decreased to form an image.

  As indicated by “R” and “L” in FIG. 3, the image generation unit 168 includes a right-eye image generation unit 178 that generates a right-eye image, and a left-eye image generation unit 180 that generates a left-eye image. Have The right eye image generation unit 178 and the left eye image generation unit 180 are formed in a rectangular shape extending in the horizontal direction. The right-eye image generation unit 178 and the left-eye image generation unit 180 are alternately arranged along the vertical direction.

  The holding substrate 170 is disposed between the image generation unit 168 and the polarizing plate 174. The holding substrate 166 and the holding substrate 170 sandwich the image generation unit 168. The holding substrate 170 is made of the same material as the holding substrate 166. The front surface of the holding substrate 170 holds the polarizing plate 174 through an adhesive.

  The polarizing plate 174 is disposed between the holding substrate 170 and the optical film 100. The polarizing plate 174 is attached to the opposite side of the holding substrate 170 from the side where the image generation unit 168 is held with an adhesive. The polarizing plate 174 is made of a resin containing PVA (polyvinyl alcohol). The thickness of the polarizing plate 174 is preferably thinner. The thickness of the polarizing plate 174 is, for example, 100 μm to 200 μm. The polarizing plate 174 has a transmission axis and an absorption axis orthogonal to the transmission axis. The transmission axis of the polarizing plate 174 is orthogonal to the transmission axis of the polarizing plate 164. Accordingly, the linearly polarized light whose polarization direction is rotated by 90 ° by the image generation unit 168 passes through the polarizing plate 174 and becomes image light to form an image. On the other hand, linearly polarized light whose polarization direction has not been rotated by the image generation unit 168 is blocked by the polarizing plate 174. As a result, the image output unit 154 outputs image light composed of polarized light having a polarization direction parallel to the transmission axis of the polarizing plate 174.

  The optical film 100 is attached in front of the polarizing plate 174 of the image output unit 154 with an adhesive. The thickness of the optical film 100 is preferably thinner in order to suppress dimensional changes of the optical film 100. For example, the thickness of the optical film 100 is preferably 50 μm to 200 μm.

  The first polarization modulator 104 and the second polarization modulator 106 of the optical film 100 are arranged on the rear surface of the resin base material 102. The first polarization modulator 104 has substantially the same shape as the right-eye image generator 178 of the image generator 168. The first polarization modulator 104 is disposed in front of the right-eye image generator 178. As a result, right-eye image light that is output from the right-eye image generation unit 178 and transmitted through the polarizing plate 174 enters the first polarization modulation unit 104. The first polarization modulator 104 modulates the incident image light for the right eye into clockwise circularly polarized light and outputs it. The second polarization modulator 106 has substantially the same shape as the left-eye image generator 180 of the image generator 168. The second polarization modulator 106 is disposed in front of the left eye image generator 180. As a result, the left-eye image light that is output from the left-eye image generation unit 180 and transmitted through the polarizing plate 174 enters the second polarization modulator 106. The second polarization modulator 106 modulates the incident image light for the left eye into counterclockwise circularly polarized light and outputs it. Accordingly, the first polarization modulation unit 104 and the second polarization modulation unit 106 convert the linearly polarized light having the same polarization direction constituting the right-eye image and the left-eye image into circularly polarized light having different polarization directions and output the circularly-polarized light.

  The optical function film 158 is disposed on the front surface of the optical film 100. An example of the optical function film 158 is a reflection reduction film or an antireflection film that reduces or suppresses reflection of light output from external illumination or the like. Thereby, the optical function film 158 provides the user with an image with little external light contamination. Other examples of the optical functional film 158 include an antiglare film that suppresses glare and a hard coat film that prevents scratches on the surface. The optical function film 158 may be omitted.

  Polarized glasses 190 used when a user views a stereoscopic image has a right-eye modulation unit 192 and a left-eye modulation unit 194. The right-eye modulation unit 192 transmits only clockwise circularly polarized light. The left-eye modulator 194 transmits only counterclockwise circularly polarized light. Accordingly, the user's right eye visually recognizes only the image for the right eye output from the first polarization modulator 104, and the user's left eye visually recognizes only the image for the left eye output from the second polarization modulator 106. To do. As a result, the user can see a stereoscopic image.

  FIG. 4 is an overall configuration diagram of the exposure apparatus 10 according to the present embodiment. FIG. 5 is an enlarged view of the exposure unit 18. The up and down directions indicated by arrows in FIG. Further, upstream and downstream are upstream and downstream in the transport direction. The transport direction is the same as the longitudinal direction of the long film 90 and is orthogonal to the arrangement direction and the width direction.

  As shown in FIGS. 4 and 5, the exposure apparatus 10 includes a delivery roll 12, a cleaning unit 13, an alignment film application unit 14, an alignment film drying unit 16, an exposure unit 18, and a liquid crystal film application unit 20. , A liquid crystal film alignment unit 22, a liquid crystal film curing unit 24, a separate film supply unit 26, a take-up roll 28, a mask 38, and a holding roll 48.

  The delivery roll 12 is disposed on the most upstream side of the transport path of the film 90. A supply film 90 is wound around the outer periphery of the delivery roll 12. The delivery roll 12 is rotatably supported. Thereby, the delivery roll 12 can hold | maintain the film 90 so that delivery is possible. The delivery roll 12 may be configured to be rotatable by a drive mechanism such as a motor, or may be configured to be driven in accordance with the rotation of the take-up roll 28. Or you may provide the mechanism which drives the film 90 in the middle of a conveyance path | route.

  The cleaning unit 13 is disposed between the delivery roll 12 and the alignment film application unit 14. The cleaning unit 13 cleans the film 90 which is fed from the feed roll 12 and before the alignment film 120 is applied.

  The alignment film application unit 14 is disposed downstream of the delivery roll 12 and upstream of the exposure unit 18. The alignment film application unit 14 is disposed above the conveyance path of the film 90 to be conveyed. The alignment film application unit 14 supplies and applies a liquid alignment film 120, which is an example of an exposure material, to the upper surface of the film 90.

  The alignment film drying unit 16 is disposed on the downstream side of the alignment film application unit 14. The alignment film drying unit 16 dries the alignment film 120 applied on the film 90 passing through the inside by heating, light irradiation, or air blowing.

  The exposure unit 18 irradiates the mask 38 with a light flux to expose the film 90 being conveyed. An area on the film 90 exposed by the exposure unit 18 is defined as an exposure area. The exposure unit 18 is disposed on the downstream side of the alignment film drying unit 16. The exposure unit 18 includes a polarized light source 34, a mask holding unit 40 that holds the mask 38, and a pair of upstream tension roll 44 and downstream tension roll 46. The exposure unit 18 irradiates the alignment film 120 applied on the film 90 with the polarized light output from the polarized light source 34 through the mask 38. Thereby, the exposure unit 18 aligns the alignment film 120 to form a pattern. An example of polarized light output from the polarized light source 34 is ultraviolet light having a wavelength of 280 nm to 340 nm.

  The polarized light source 34 is disposed above the transport path of the film 90. The polarization light source 34 includes a first polarization output unit 50 and a second polarization output unit 52. The first polarization output unit 50 and the second polarization output unit 52 are disposed between the upstream tension roll 44 and the downstream tension roll 46. The second polarization output unit 52 is disposed on the downstream side of the first polarization output unit 50.

  The first polarization output unit 50 outputs a first light flux 70 that is a first polarized light flux having a polarization direction corresponding to the orientation of the first orientation region 124. The second polarized light output unit 52 outputs a second light beam 72 that is a second polarized light beam having a polarization direction corresponding to the orientation of the second alignment region 126. Both the first polarized light and the second polarized light are linearly polarized light. The polarization direction of the second polarization output from the second polarization output unit 52 is orthogonal to the polarization direction of the first polarization output from the first polarization output unit 50. The polarization direction of the second polarization output from the second polarization output unit 52 and the polarization direction of the first polarization output from the first polarization output unit 50 may intersect at an arbitrary angle.

  The first polarization output unit 50 outputs the first light beam 70 of the first polarization downstream and downward. The second polarized light output unit 52 outputs the second light beam 72 of the second polarized light upstream and downward. Therefore, the first principal ray 74 of the first light flux 70 and the second principal ray 76 of the second light flux 72 approach each other and intersect. The principal ray is a ray that passes through the center of the light beam.

  The first polarization output unit 50 outputs the first light flux 70 toward the region where the film 90 is in close contact with the holding roll 48. The second polarization output unit 52 outputs the second light beam 72 toward the region where the film 90 is in close contact with the holding roll 48.

  The first polarization output unit 50 outputs the first light flux 70 so that the first light flux 70 enters the film 90 perpendicularly. Further, the second polarization output unit 52 outputs the second light beam 72 so as to enter the film 90 perpendicularly. The first polarized light output unit 50 and the second polarized light output unit 52 may be configured such that the first light beam 70 and the second light beam 72 are incident on the film 90 with an inclination. Thereby, after the first light beam 70 and the second light beam 72 are reflected by the film 90 and the holding roll 48, the first light beam 70 and the second light beam 72 are returned to the alignment film 120 applied to the film 90 even when reflected by the peripheral equipment or the like. This can be suppressed. As a result, it is possible to prevent the reflected first and second light beams 70 and 72 from irradiating unscheduled portions on the film 90 to disturb the orientation.

The illuminance of the first polarization output from the first polarization output unit 50 and the illuminance of the second polarization output from the second polarization output unit 52 are equal. Illuminance here refers to the energy per unit area of the output polarized light, and the unit is mW / cm ² . When the output polarized light is ultraviolet light having a wavelength of 280 nm to 340 nm, the illuminance is UV illuminance. An example of the illuminance of the first polarized light and the second polarized light is 20 mW / cm ² or more. The exposure method may be changed as appropriate. For example, the first polarized light and the second polarized light of the polarized light source 34 may be irradiated along the vertical direction. The up-down direction here is the up-down direction indicated by the arrow in FIG.

  A light shielding wall extending in the vertical direction to the mask 38 is preferably provided between the first polarization output unit 50 and the second polarization output unit 52. As a result, the light shielding walls shield each other's polarized light. In this case, the light shielding wall is preferably black in order to suppress reflection of the first polarized light and the second polarized light.

  The mask holding unit 40 holds the mask 38. The mask holding unit 40 is held so as to be relatively movable with respect to the film 90 in the width direction orthogonal to the transport direction. Thereby, the mask 38 is moved together with the mask holding unit 40 by a motor or an actuator or the like, and the position in the width direction is adjusted.

  The upstream tension roll 44 is disposed downstream of the alignment film drying unit 16 and upstream of the holding roll 48, the polarization light source 34, and the mask 38. The upstream tension roll 44 is disposed above the transport path of the film 90. The upstream tension roll 44 presses the film 90 being conveyed downward.

  The downstream tension roll 46 is disposed upstream of the liquid crystal film application unit 20 and downstream of the holding roll 48, the polarization light source 34, and the mask 38. The downstream tension roll 46 is disposed above the transport path of the film 90. Further, the downstream tension roll 46 presses the film 90 being conveyed downward.

  The upstream tension roll 44 and the downstream tension roll 46 are rotatably supported. The upstream tension roll 44 and the downstream tension roll 46 rotate in accordance with the film 90 conveyed below. The upstream tension roll 44 and the downstream tension roll 46 may be configured to rotate by a drive motor or the like, or may be configured to be driven by a driving force of the take-up roll 28 or the like.

  The liquid crystal film application unit 20 is disposed on the downstream side of the exposure unit 18. The liquid crystal film application unit 20 is disposed above the transport path of the film 90. The liquid crystal film application unit 20 supplies and applies the liquid crystal film 122 onto the alignment film 120 formed on the film 90.

  The liquid crystal film alignment unit 22 is disposed on the downstream side of the liquid crystal film application unit 20. The liquid crystal film alignment unit 22 dries the liquid crystal film 122 formed on the alignment film 120 that passes through the liquid crystal film alignment section 120 along the alignment direction of the alignment film 120 by heating, light irradiation, or air blowing. .

  The liquid crystal film curing unit 24 is disposed on the downstream side of the liquid crystal film alignment unit 22. The liquid crystal film curing unit 24 cures the liquid crystal film 122 by irradiating ultraviolet rays. Thereby, the alignment of the molecules of the liquid crystal film 122 aligned along the alignment of the alignment film 120 is fixed.

  The separate film supply unit 26 is disposed between the liquid crystal film curing unit 24 and the take-up roll 28. The separate film supply unit 26 supplies and separates the separate film 92 onto the liquid crystal film 122 of the film 90. The separate film 92 facilitates separation between the wound films 90. Note that the separate film supply unit 26 may be omitted.

  The take-up roll 28 is an example of a transport unit. The take-up roll 28 is disposed on the downstream side of the liquid crystal film curing unit 24 and on the most downstream side of the transport path. The take-up roll 28 is supported so as to be rotatable. The winding roll 28 winds the film 90 on which the alignment film 120 and the liquid crystal film 122 are formed and patterned. Thereby, the winding roll 28 conveys the elongate film 90 in a conveyance direction.

  The mask 38 is held by the mask holding unit 40 and is disposed between the polarized light source 34, the film 90, and the holding roll 48. As an example, the mask 38 is disposed several hundred μm above the film 90. The mask 38 includes a mask base material 56 and a light shielding layer 58 described later.

  The holding roll 48 is an example of a film holding unit. The holding roll 48 is formed in a roll shape. An example of the diameter of the holding roll 48 is 600 mm to 800 mm. The width of the holding roll 48 is larger than the width of the film 90. The holding roll 48 is rotatably supported. Thereby, the holding roll 48 rotates as the film 90 is conveyed. The surface of the holding roll 48 is preferably coated in black in order to suppress reflection of light from the polarized light source 34.

  The holding roll 48 is disposed at a position facing the polarized light source 34. The holding roll 48 is disposed on the opposite side of the polarized light source 34 across the conveyance path of the film 90. The holding roll 48 is disposed below the conveyance path of the film 90. The holding roll 48 is disposed above the upstream tension roll 44 and the downstream tension roll 46. Accordingly, the upper surface of the holding roll 48 is held in close contact with the film 90 pressed downward by the upstream tension roll 44 and the downstream tension roll 46, so that wrinkles generated in the film 90 are suppressed. The wrinkle of the film 90 here is a shape that extends in the conveying direction and undulates in the width direction. Here, the exposure unit 18 exposes the film 90 in a region where the holding roll 48 is in close contact. The upper surface of the holding roll 48 is disposed closer to the mask 38 than the position where the first light beam 70 and the second light beam 72 intersect. Thereby, the holding roll 48 holds the film 90 at a position closer to the mask 38 than a position where the first light flux 70 and the second light flux 72 intersect.

  FIG. 6 is a bottom view of the mask 38. FIG. 7 is a longitudinal sectional view of the mask 38 taken along line VII-VII in FIG. As shown in FIGS. 6 and 7, the mask 38 includes a mask base material 56 and a light shielding layer 58.

The mask base material 56 is formed in a rectangular plate shape. The mask base material 56 is made of quartz glass having a thermal expansion coefficient of 5.6 × 10 ⁻⁷ / ° C. The mask base material 56 may be made of soda lime glass having a thermal expansion coefficient of 85 × 10 ⁻⁷ / ° C. The length of the mask base material 56 in the transport direction is about 200 mm. The length of the mask base material 56 in the width direction is appropriately set according to the width of the film 90.

  The light shielding layer 58 is formed on the lower surface of the mask base material 56. The light shielding layer 58 is made of a material capable of shielding light such as chromium. In the light shielding layer 58, a plurality of openings functioning as the first transmission region 62 and a plurality of openings functioning as the second transmission region 64 are formed. The region where the first transmission region 62 is formed is the first pattern region 80, and the region where the second transmission region 64 is formed is the second pattern region 82. A light shielding region 81 is formed between the first pattern region 80 and the second pattern region 82. The first transmission region 62 is formed at a position different from the second transmission region 64 in the transport direction. That is, both the first pattern region 80 and the second pattern region 82 are formed on the same mask base material 56 at positions separated from each other.

  Further, the first transmission region 62 is formed at a position different from the second transmission region 64 in the width direction orthogonal to the transport direction. An extension line of one side along the transport direction of the first transmission region 62 coincides with one side of the second transmission region 64 along the transport direction.

  The first transmission region 62 is disposed in the output direction of the first polarized light output from the first polarized light output unit 50. Accordingly, the first pattern region 80 is irradiated with the first polarized light beam 70 output from the first polarization output unit 50 of the exposure unit 18. Thereby, the film 90 is exposed by the first polarized light beam 70 having passed through the first pattern region 80. The second transmission region 64 is arranged in the output direction of the second polarized light output from the second polarized light output unit 52. Therefore, the second light beam 72 of the second polarization output from the second polarization output unit 52 of the exposure unit 18 is irradiated to the second pattern region 82. Thereby, the film 90 is exposed by the second polarized light beam 72 having passed through the second pattern region 82. On the other hand, the polarized light reaching the region other than the first transmission region 62 and the second transmission region 64 is shielded by the light shielding layer 58 including the light shielding region 81. As a result, the alignment film 120 of the film 90 is exposed to either the first polarized light or the second polarized light, and the first pattern region 80 by the first transmission region 62 and the second pattern region 82 by the second transmission region 64 are exposed. The overlaid pattern is exposed.

  An example of the length in the width direction of the first transmission region 62 and the second transmission region 64 is 0.2 mm. An example of an interval in the width direction between the adjacent first transmission regions 62 and between the adjacent second transmission regions 64 is 0.2 mm. An example of the length of the first transmission region 62 and the second transmission region 64 in the transport direction is about 30 mm. The distance in the transport direction between the first pattern region 80 and the second pattern region 82, that is, the upper limit of the length of the light-shielding region 81 in the transport direction is determined in consideration of deviation due to meandering during transport. Is preferred. Here, when the optical film is transported by 500 mm, the amount of meandering in the width direction of the optical film is 20 μm or less, and the overlapping width of the first pattern region 80 and the second pattern region 82 in the width direction is 5 μm or less. Set. While satisfying this condition, the efficiency of the arrangement space of the first transmission region 62 and the second transmission region 64 in the mask 38 is considered. Considering these points, the distance in the transport direction between the first pattern region 80 and the second pattern region 82, that is, the upper limit of the length of the light shielding region 81 in the transport direction is preferably 100 mm. An example of the upper limit is 30 mm.

On the other hand, the lower limit D of the distance in the transport direction between the first pattern region 80 and the second pattern region 82 is the first light flux 70 and the first light flux 70 emitted from the first polarization output unit 50 and the second polarization output unit 52. Since the collimation angle θ of the two light beams 72 and the distance H between the polarization output port of the exposure unit 18 and the mask 38 are effective, it is preferable to approach from the angle θ, the distance H, and the like. An example of the lower limit D is calculated by the following equation.
D = H × tan θ
The first polarized light emitted from the polarization output port of the first polarization output unit 50 is irradiated at least up to a position shifted in the transport direction by the lower limit D of the distance from the above formula. Therefore, it is necessary to separate the first pattern region 80 and the second pattern region 82 by the lower limit D of the distance. When the collimation angle θ is 2 degrees and the distance H from the first polarization output unit 50 and the second polarization output unit 52 to the mask 38 is 30 mm, an example of the lower limit D is 1 mm. Thereby, the first polarized light and the second polarized light can be prevented from overlapping on the film 90. Considering these upper and lower limits, the distance in the transport direction between the first pattern region 80 and the second pattern region 82 is preferably 10 mm. The numerical values of the first transmission region 62, the second transmission region 64, the first pattern region 80, the light shielding region 81, and the second pattern region 82 may be changed as appropriate.

  Next, the manufacturing method of the optical film 100 is demonstrated. First, a long film 90 wound around the feed roll 12 is prepared. Here, an example of the total length of the film 90 is about 1000 m. An example of the width of the film 90 is about 500 mm. Thereafter, one end of the film 90 is fixed to the take-up roll 28 in the holding stage. In this state, the film 90 is passed through the lower surfaces of the upstream tension roll 44 and the downstream tension roll 46 and is held in a state of being held on the upper surface of the holding roll 48.

  Next, rotation of the take-up roll 28 is started. As a result, the film 90 is sent out from the delivery roll 12, and the film 90 is transported along the transport direction. An example of the conveyance speed of the film 90 is 2 m / min to 10 m / min. As the film 90 starts to be transported, the upstream tension roll 44, the downstream tension roll 46, and the holding roll 48 rotate.

  The fed film 90 is washed by the washing unit 13 and then passes below the alignment film application unit 14. As a result, the alignment film 120 is applied to the upper surface of the film 90 by the alignment film application unit 14 over substantially the entire region in the width direction. The application of the alignment film 120 is continuously performed while the film 90 is conveyed. Therefore, the alignment film 120 is continuously applied to the upper surface of the film 90 over the entire length in the transport direction except for a part of both ends.

  The film 90 coated with the alignment film 120 is transported and passes through the alignment film drying unit 16. Thereby, the alignment film 120 applied to the upper surface of the film 90 is dried. Thereafter, the film 90 passes through the lower surface of the upstream tension roll 44.

  Thereafter, in the exposure stage, the film 90 in the area where the alignment film 120 is applied passes below the first transmission area 62, thereby entering the first alignment stage. In the first alignment stage, the alignment film 120 in the region passing below the first transmission region 62 is output from the first polarization output unit 50 and the first transmission region of the mask 38 in a state where the transport of the film 90 is continued. The first light beam 70 of the first polarized light that has passed through 62 is exposed. Here, the film 90 is exposed while being continuously conveyed at a constant speed by the take-up roll 28. Therefore, the alignment film 120 that passes below the first transmission region 62 is exposed to the first polarized light output from the first polarized light output unit 50 continuously along the transport direction. As a result, the alignment film 120 in the region that has passed under the first transmission region 62 is exposed in a strip shape having the same width as the first transmission region 62 and extending in the transport direction. Further, since the alignment film 120 in the region is exposed by the first polarized light, the alignment film 120 in the region is aligned corresponding to the first polarized light to be exposed. As a result, a plurality of first alignment regions 124 are formed in the alignment film 120.

  Thereafter, the film 90 in the region where the alignment film 120 is applied is transported and passes below the second transmission region 64 to enter the second alignment stage. In the second alignment stage, the second polarized light beam 72 of the second polarization output from the second polarization output unit 52 is transmitted through the second transmission region 64 of the mask 38 in a state where the transport stage is continued, and the second transmission is performed. The alignment film 120 of the film 90 formed in a region passing under the region 64 is irradiated. Since the conveyance of the film 90 is continued, the alignment film 120 in the region is exposed in a strip shape extending in the conveyance direction having the same width as the second transmission region 64. Further, since the alignment film 120 in the region is exposed by the second polarized light, the alignment film 120 in the region is aligned corresponding to the second polarized light to be exposed. Thereby, a plurality of second alignment regions 126 are formed in the alignment film 120.

  Here, the second transmission region 64 is formed at a position different from the first transmission region 62 in the width direction. Thereby, the second polarized light is irradiated to the alignment film 120 in a region different from the region irradiated by the first transmission region 62. As a result, the second polarized light is irradiated between the first alignment region 124 aligned by the first polarization and the adjacent first alignment region 124, and all the regions of the alignment film 120 in the width direction Oriented by one polarized light or second polarized light.

  The polarization direction of the second polarization output from the second polarization output unit 52 is orthogonal to the polarization direction of the first polarization output from the first polarization output unit 50. Thereby, the alignment direction of the region aligned by the first polarized light and the alignment direction of the region aligned by the second polarized light are orthogonal to each other. As a result, a pattern in which two regions including different orientations corresponding to the first polarization modulator 104 and the second polarization modulator 106 are alternately arranged is formed on the alignment film 120.

  The film 90 in the exposure region is held in close contact with the holding roll 48 while being pressed downward by the upstream tension roll 44 and the downstream tension roll 46. Thereby, since the tension | tensile_strength of a conveyance direction is provided to the film 90 from the holding | maintenance roll 48 between the upstream tension | tensile_strength roll 44 and the downstream tension | tensile_strength roll 46, the wrinkle of the film 90 is reduced. The first polarized light output unit 50 and the second polarized light output unit 52 are in close contact with each other by the holding roll 48 and output the first polarized light beam 70 and the second polarized light beam 72 to the film 90 in a region with little wrinkles. And expose.

  The first polarized light output unit 50 and the second polarized light output unit 52 output the first light beam 70 and the second light beam 72 in directions approaching each other. However, the holding roll 48 holds the film 90 on the mask 38 side from the position where the first light beam 70 and the second light beam 72 intersect. Thereby, the film 90 is exposed by the first light flux 70 and the second light flux 72 that do not overlap each other. Further, the distance between the area on the film 90 exposed by the first light flux 70 and the area on the film 90 exposed by the second light flux 72 is such that the mask 38 has a distance between the first pattern area 80 and the second pattern area 82. Shorter than the distance between.

  Thereafter, the film 90 on which the alignment film 120 has been exposed passes under the downstream tension roll 46 and reaches below the liquid crystal film application unit 20. Thereby, the liquid crystal film 122 is applied to the upper surface of the alignment film 120. Since the liquid crystal film 122 is continuously applied to the upper surface of the alignment film 120 of the film 90 being conveyed, the liquid crystal film 122 is applied over the entire length of the film 90 in the conveyance direction. Thereafter, the film 90 coated with the liquid crystal film 122 is conveyed and passes through the liquid crystal film alignment unit 22. As a result, the liquid crystal film 122 is heated by the liquid crystal film alignment unit 22, and the molecules of the liquid crystal film 122 are dried while being aligned along the alignment of the alignment film 120 formed on the lower surface.

  Next, the film 90 on which the applied liquid crystal film 122 is oriented passes through the liquid crystal film curing unit 24. Thereby, the liquid crystal film 122 is irradiated with ultraviolet rays, and the liquid crystal film 122 is cured in an aligned state. As a result, the molecules of the liquid crystal film 122 are aligned corresponding to the first alignment region 124 and the second alignment region 126, so that the first liquid crystal region 128 and the second liquid crystal region 130 are formed. As shown in FIGS. 1 and 2, the first polarization modulator 104 and the second polarization modulator 106 formed by the alignment film 120 and the liquid crystal film 122 are alternately formed in the width direction of the film 90. Next, a separate film 92 is supplied to the upper surface of the liquid crystal film 122 and pasted. Then, the film 90 with the separate film 92 attached to the upper surface is taken up by the take-up roll 28.

  Thereafter, the film 90 is conveyed by the take-up roll 28 and the exposure of the film 90 is continued until the supply of the film 90 wound around the feed roll 12 is completed. And the exposure process in which all the films 90 wound around the delivery roll 12 are supplied is complete | finished. The film 90 may be continuously exposed by connecting the rear end of the completed film 90 to the front end of the next new film 90. Finally, the film 90 is cut to a predetermined length to complete the optical film 100 shown in FIGS.

  As described above, in the exposure apparatus 10, by separating the first pattern region 80 and the second pattern region 82 of the mask 38, the first light flux 70 transmitted through the first pattern region 80 and the second pattern region 82 and Crosstalk in which the second light flux 72 overlaps can be suppressed. Thereby, the exposure apparatus 10 can accurately expose the alignment film 120 with the patterns of the first pattern region 80 and the second pattern region 82.

  In the exposure apparatus 10, the first light beam 70 and the second light beam 72 are irradiated in a direction crossing each other, that is, in a direction approaching each other. Further, the holding roll 48 holds the film 90 at a position closer to the mask 38 than a position where the first light beam 70 and the second light beam 72 intersect. Thereby, the crosstalk can be prevented while bringing the exposure areas on the film 90 exposed by the first light beam 70 and the second light beam 72 close to each other. By bringing the exposure area close in this way, even if the film 90 meanders between the exposure area by the first light flux 70 and the exposure area by the second light flux 72, the influence of meandering can be reduced, so that the pattern is disturbed. In addition, disturbance in the orientation direction can be reduced.

  In the exposure apparatus 10, the first pattern region 80 and the second pattern region 82 are formed on the same mask base material 56. Thereby, the process of aligning the first pattern region 80 and the second pattern region 82 with each other can be omitted.

  In the exposure apparatus 10, since the holding roll 48 is in close contact and holds the film 90, wrinkles of the film 90 can be suppressed. Furthermore, since the exposure unit 18 exposes the film 90 in the close contact area, the influence of wrinkles can be reduced.

  In the exposure apparatus 10, since the holding roll 48 rotates as the film 90 is transported, the resistance to the film 90 during transport can be reduced.

  In the exposure apparatus 10, the areas exposed by the first pattern area 80 and the second pattern area 82 do not overlap. Therefore, unlike the case where one of the patterns is a solid shape continuous in the width direction and a part of the exposed region overlaps, both the first light flux 70 and the second light flux 72 can be set to the maximum illuminance, and the orientation The film 120 can be exposed with the lower limit exposure energy capable of orientation. Thereby, even if the conveyance speed of the film 90 is increased, the alignment film 120 can be aligned, so that the production efficiency of the optical film 100 can be improved.

  Next, an embodiment in which a part of the above-described embodiment is changed will be described.

  FIG. 8 is a diagram for explaining the changed mask 238. As shown in FIG. 8, the mask 238 includes a mask base material 256 and a light shielding layer 258 formed on the lower surface of the mask base material 256. In the light shielding layer 258, the first pattern region 80 and the second pattern region 82 described above are formed.

  The lower surface, which is the surface on the film 90 side of the mask 238, is formed in an arc shape in a side view. Further, the upper surface of the mask 238 on the side opposite to the film 90 and on the first polarized light output unit 50 and the second polarized light output unit 52 side is formed in an arc shape in a side view. The center of the arc-shaped surfaces of the upper surface and the lower surface of the mask 238 is the same position as the center 260 of the roll-shaped holding roll 48. Therefore, the distance between the upper surface of the mask 238 and the film 90 held on the holding roll 48 is constant in the transport direction. Similarly, the distance between the lower surface of the mask 238 and the film 90 held on the holding roll 48 is constant in the transport direction. As a result, the first light beam 70 transmitted through the first pattern region 80 of the mask 238 reaches the film 90 at the same distance at any position in the transport direction. As a result, the pattern of the first pattern region 80 is accurately transferred to the alignment film 120. Further, the pattern can be accurately transferred even in the second light flux 72 transmitted through the second pattern region 82.

  The distance between the upper surface and the lower surface of the mask 238, that is, the thickness is constant in the transport direction. As a result, the first light beam 70 and the second light beam 72 are transmitted through the mask 238 by the same distance in all regions, and thus are affected by the mask 238 by the same amount. As a result, the unevenness in the intensity of the first light flux 70 and the second light flux 72 reaching the film 90 can be suppressed.

  FIG. 9 is a diagram for explaining the changed mask 338. As shown in FIG. 9, the mask 338 includes a mask base material 356 and a light shielding layer 358 formed on the lower surface of the mask base material 356. In the light shielding layer 358, the first pattern region 80 and the second pattern region 82 described above are formed.

  The lower surface of the mask 338 is formed in an arc shape in a side view. The center of the arc on the lower surface of the mask 338 is the same position as the center 260 of the holding roll 48. Accordingly, since the first light flux 70 and the second light flux 72 transmitted through the first pattern area 80 and the second pattern area 82 of the mask 338 reach the film 90 at the same distance, the above-described effects can be obtained.

  FIG. 10 is a diagram for explaining the changed polarized light source 434. The polarized light source 434 includes a first polarization output unit 450 and a second polarization output unit 452. The first polarization output unit 450 includes a first polarizer 451. The first polarizer 451 is provided in the vicinity of the output port of the first polarization output unit 450. The first polarizer 451 transmits light having the same vibration direction as the transmission axis of the first polarizer 451. Accordingly, the first polarization output unit 450 outputs the first polarization. The second polarization output unit 452 includes a second polarizer 453. The second polarizer 453 is provided in the vicinity of the output port of the second polarization output unit 452. The second polarizer 453 transmits light having the same vibration direction as the transmission axis of the second polarizer 453. Thereby, the second polarized light output unit 452 outputs the second polarized light.

  FIG. 11 is a diagram illustrating the changed polarized light source 534. As illustrated in FIG. 11, the polarized light source 534 includes a first light source unit 550, a second light source unit 552, and a polarizing member 555. The first light source unit 550 and the second light source unit 552 are integrated and output unpolarized light. The polarizing member 555 is disposed between the first light source unit 550 and the second light source unit 552 and the mask 38. The polarizing member 555 includes a first polarizer 551, a light shielding unit 557, and a second polarizer 553.

  The first polarizer 551, the light shielding unit 557, and the second polarizer 553 are integrally configured. The first polarizer 551 is disposed on the most upstream side of the polarizing member 555. The first polarizer 551 is disposed between the first pattern region 80 of the mask 38 and the film 90. The first polarizer 551 transmits light having the same vibration direction as the polarization direction of the first polarization.

  The light shielding unit 557 is disposed between the first polarizer 551 and the second polarizer 553. In other words, the light shielding portion 557 is disposed between the first pattern region 80 and the second pattern region 82 of the mask 38 in plan view. The light shielding unit 557 absorbs and blocks light output from the first light source unit 550 and the second light source unit 552 without reflecting.

  The second polarizer 553 is disposed on the most downstream side of the polarizing member 555. The second polarizer 553 is disposed between the second pattern region 82 of the mask 38 and the film 90. The second polarizer 553 transmits light having the same vibration direction as the polarization direction of the second polarization.

  As a result, of the non-polarized light output from the first light source unit 550 and the second light source unit 552, the upstream luminous flux is converted into the first polarized light by the first polarizer 551 and then transmitted through the first pattern region 80. Then, the film 90 is exposed. In addition, after the non-polarized light, the downstream light beam is converted into the second polarized light by the second polarizer 553, and then transmitted through the second pattern region 82 to expose the film 90. Further, light that reaches the light shielding portion 557 among the non-polarized light is shielded and the film 90 is not exposed. In the present embodiment, the first light source unit 550 and the first polarizer 551 are examples of a first light output unit, and the second light source unit 552 and the second polarizer 553 are examples of a second light output unit.

  The arrangement, shape, number, and the like of each component of the above-described embodiment may be changed as appropriate. Moreover, you may combine each embodiment mentioned above.

  For example, although the example which exposes the elongate film 90 was shown in embodiment mentioned above, you may expose the film of the same magnitude | size as the optical film 100. FIG.

  In the embodiment described above, the film 90 being conveyed is exposed, but exposure and conveyance may be alternately repeated, and the film 90 may be stopped during the exposure.

  As mentioned above, although this invention was demonstrated using embodiment, the technical scope of this invention is not limited to the range as described in the said embodiment. It will be apparent to those skilled in the art that various modifications or improvements can be added to the above-described embodiment. It is apparent from the scope of the claims that the embodiments added with such changes or improvements can be included in the technical scope of the present invention.

  The order of execution of each process such as operations, procedures, steps, and stages in the apparatus, system, program, and method shown in the claims, the description, and the drawings is particularly “before” or “prior to”. It should be noted that the output can be realized in any order unless the output of the previous process is used in the subsequent process. Regarding the operation flow in the claims, the description, and the drawings, even if it is described using “first”, “next”, etc. for convenience, it means that it is essential to carry out in this order. It is not a thing.

  DESCRIPTION OF SYMBOLS 10 Exposure apparatus, 12 Delivery roll, 13 Cleaning part, 14 Alignment film application part, 16 Alignment film drying part, 18 Exposure part, 20 Liquid crystal film application part, 22 Liquid crystal film orientation part, 24 Liquid crystal film hardening part, 26 Separate film supply Part, 28 winding roll, 34 polarized light source, 38 mask, 40 mask holding part, 44 upstream tension roll, 46 downstream tension roll, 48 holding roll, 50 first polarization output part, 52 second polarization output part, 56 Mask base material, 58 light shielding layer, 62 first transmission region, 64 second transmission region, 70 first light beam, 72 second light beam, 74 first chief ray, 76 second chief ray, 80 first pattern region 81 light shielding area, 82 second pattern area, 90 film, 92 separate film, 100 optical film, 102 resin substrate, 104 first polarization modulation section, 106 second polarization modulation section, 110 arrow, 112 arrow, 114 arrow, 116 arrow, 120 alignment film, 122 liquid crystal film, 124 first alignment region, 126 second alignment region, 128 first liquid crystal region, 130 second liquid crystal region, 150 stereoscopic image display device, 152 light source, 154 image output unit, 158 Optical functional film, 164 polarizing plate, 166 holding substrate, 168 image generation unit, 170 holding substrate, 174 polarizing plate, 178 image for right eye 190, left eye image generation unit, 190 polarized glasses, 192 right eye modulation unit, 194 left eye modulation unit, 238 mask, 256 mask base material, 258 light shielding layer, 260 center, 338 mask, 356 mask base material, 358 Light-shielding layer, 434 polarized light source, 450 first polarized light output unit, 451 first polarizer, 452 second polarized light output unit, 453 second polarizer, 534 polarized light source, 551 first polarizer, 550 first light source unit, 553 2nd polarizer, 552 2nd light source part, 555 polarizing member, 557 light-shielding part

Claims (10)

A film holder for holding the film;
A mask on which a first pattern and a second pattern spaced from the first pattern are formed;
An exposure unit that irradiates the mask with a light beam and exposes the film with the light beam that has passed through the first pattern or the second pattern;
The exposure unit includes a first light output unit that outputs a first light beam that irradiates the first pattern, and a principal ray that intersects with the principal ray of the first light beam output from the first light output unit. And a second light output unit for outputting a second light beam for irradiating the second pattern,
The exposure apparatus that holds the film at a position closer to the mask than a position where the first light flux and the second light flux intersect each other. The exposure apparatus according to claim 1, wherein the mask has a mask base material on which both the first pattern and the second pattern are formed. Further comprising a transport unit for transporting the film,
The film is elongated,
The exposure apparatus according to claim 1, wherein the exposure unit exposes the film being conveyed. The film holding part has a roll shape that holds the film on the surface,
The exposure apparatus according to claim 3, wherein the exposure unit exposes the film in a region in close contact with the roll-shaped film holding unit. The exposure apparatus according to claim 4, wherein the film holding unit rotates as the film is conveyed. 6. The exposure apparatus according to claim 4, wherein the film side surface of the mask is formed in an arc shape.   The exposure apparatus according to claim 6, wherein the center of the arc-shaped surface on the film side of the mask is the same position as the center of the roll-shaped film holding unit. The exposure apparatus according to claim 4, wherein a surface of the mask opposite to the film is formed in an arc shape.   The exposure apparatus according to claim 8, wherein the center of the arc-shaped surface of the mask opposite to the film is at the same position as the center of the roll-shaped film holding unit. A film holding stage for holding the film;
An exposure step of irradiating a light flux on a mask on which a first pattern and a second pattern spaced apart from the first pattern are formed, and exposing the film with the light flux that has passed through the first pattern or the second pattern; With
In the exposure step, a first light beam that irradiates the first pattern is output, and a second light beam that has a principal ray intersecting with the principal ray of the first light beam and irradiates the second pattern is output. ,
In the film holding step, an exposure method in which the film is arranged at a position closer to the mask than a position where the first light flux and the second light flux intersect.

Images