JP2013526777A5 - - Google Patents
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- Publication number
- JP2013526777A5 JP2013526777A5 JP2013510126A JP2013510126A JP2013526777A5 JP 2013526777 A5 JP2013526777 A5 JP 2013526777A5 JP 2013510126 A JP2013510126 A JP 2013510126A JP 2013510126 A JP2013510126 A JP 2013510126A JP 2013526777 A5 JP2013526777 A5 JP 2013526777A5
- Authority
- JP
- Japan
- Prior art keywords
- structured
- polyether
- nonionic surfactant
- type nonionic
- binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005296 abrasive Methods 0.000 claims 14
- 239000002736 nonionic surfactant Substances 0.000 claims 7
- 239000002245 particle Substances 0.000 claims 6
- 239000004721 Polyphenylene oxide Substances 0.000 claims 4
- 239000011230 binding agent Substances 0.000 claims 4
- 238000005498 polishing Methods 0.000 claims 4
- 229920000570 polyether Polymers 0.000 claims 4
- 229920005596 polymer binder Polymers 0.000 claims 4
- 239000002491 polymer binding agent Substances 0.000 claims 4
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive Effects 0.000 claims 2
- 125000000129 anionic group Chemical group 0.000 claims 2
- 150000002148 esters Chemical class 0.000 claims 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 1
- 229920001451 Polypropylene glycol Polymers 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K [O-]P([O-])([O-])=O Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33335110P | 2010-05-11 | 2010-05-11 | |
US61/333,351 | 2010-05-11 | ||
PCT/US2011/034439 WO2011142986A1 (en) | 2010-05-11 | 2011-04-29 | Fixed abrasive pad with surfactant for chemical mechanical planarization |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013526777A JP2013526777A (ja) | 2013-06-24 |
JP2013526777A5 true JP2013526777A5 (pt) | 2014-06-19 |
Family
ID=44383031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013510126A Pending JP2013526777A (ja) | 2010-05-11 | 2011-04-29 | 化学機械平坦化用の界面活性剤を含む固定研磨パッド |
Country Status (7)
Country | Link |
---|---|
US (1) | US20130059506A1 (pt) |
JP (1) | JP2013526777A (pt) |
KR (1) | KR20130081229A (pt) |
CN (1) | CN102892553B (pt) |
SG (1) | SG185523A1 (pt) |
TW (1) | TWI532597B (pt) |
WO (1) | WO2011142986A1 (pt) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104822495A (zh) * | 2012-09-21 | 2015-08-05 | 3M创新有限公司 | 向固定磨料幅材中引入添加剂以改善cmp性能 |
WO2014189086A1 (ja) * | 2013-05-24 | 2014-11-27 | Jsr株式会社 | 化学機械研磨パッドおよびそれを用いた化学機械研磨方法 |
US20150104940A1 (en) * | 2013-10-11 | 2015-04-16 | Air Products And Chemicals Inc. | Barrier chemical mechanical planarization composition and method thereof |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
KR102436416B1 (ko) | 2014-10-17 | 2022-08-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
US11351654B2 (en) | 2014-11-26 | 2022-06-07 | 3M Innovative Properties Company | Abrasive articles, assemblies, and methods with gripping material |
SI3237147T1 (sl) * | 2014-12-23 | 2021-01-29 | Saint-Gobain Ceramics&Plastics, Inc. | Oblikovani abrazivni deli in metoda oblikovanja istih |
US9914864B2 (en) | 2014-12-23 | 2018-03-13 | Saint-Gobain Ceramics & Plastics, Inc. | Shaped abrasive particles and method of forming same |
WO2016172450A1 (en) | 2015-04-23 | 2016-10-27 | The University Of Florida Research Foundation, Inc. | Hybrid tool with both fixed-abrasive and loose-abrasive phases |
CN113103145B (zh) | 2015-10-30 | 2023-04-11 | 应用材料公司 | 形成具有期望ζ电位的抛光制品的设备与方法 |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
USD850041S1 (en) * | 2017-07-31 | 2019-05-28 | 3M Innovative Properties Company | Scouring pad |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
KR20220062419A (ko) | 2017-10-04 | 2022-05-16 | 생-고뱅 어브레이시브즈, 인코포레이티드 | 연마 물품 및 이의 형성 방법 |
KR20210042171A (ko) | 2018-09-04 | 2021-04-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 진보한 폴리싱 패드들을 위한 제형들 |
US11331767B2 (en) | 2019-02-01 | 2022-05-17 | Micron Technology, Inc. | Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods |
US11851570B2 (en) * | 2019-04-12 | 2023-12-26 | Applied Materials, Inc. | Anionic polishing pads formed by printing processes |
USD934573S1 (en) * | 2019-12-19 | 2021-11-02 | 3M Innovative Properties Company | Sponge with surface pattern |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5152917B1 (en) * | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
US5435816A (en) | 1993-01-14 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
SG64333A1 (en) | 1993-09-13 | 1999-04-27 | Minnesota Mining & Mfg | Abrasive article method of manufacture of same method of using same for finishing and a production tool |
US5454844A (en) | 1993-10-29 | 1995-10-03 | Minnesota Mining And Manufacturing Company | Abrasive article, a process of making same, and a method of using same to finish a workpiece surface |
DE69511068T2 (de) | 1994-02-22 | 2000-04-06 | Minnesota Mining And Mfg. Co. | Schleifartikel, verfahren zum herstellen derselben, und verfahren zum anwenden desselben bei endbearbeitung |
US5958794A (en) * | 1995-09-22 | 1999-09-28 | Minnesota Mining And Manufacturing Company | Method of modifying an exposed surface of a semiconductor wafer |
JP3732267B2 (ja) * | 1996-01-29 | 2006-01-05 | 大日本印刷株式会社 | 研磨テープの製造方法 |
US5692950A (en) | 1996-08-08 | 1997-12-02 | Minnesota Mining And Manufacturing Company | Abrasive construction for semiconductor wafer modification |
US6475253B2 (en) * | 1996-09-11 | 2002-11-05 | 3M Innovative Properties Company | Abrasive article and method of making |
US5876268A (en) * | 1997-01-03 | 1999-03-02 | Minnesota Mining And Manufacturing Company | Method and article for the production of optical quality surfaces on glass |
US5833724A (en) * | 1997-01-07 | 1998-11-10 | Norton Company | Structured abrasives with adhered functional powders |
US5851247A (en) | 1997-02-24 | 1998-12-22 | Minnesota Mining & Manufacturing Company | Structured abrasive article adapted to abrade a mild steel workpiece |
FR2766106B1 (fr) * | 1997-07-18 | 2001-09-07 | Coatex Sa | Utilisation d'un copolymere a structure tensio-active comme agent dispersant et/ou d'aide au broyage |
US6139594A (en) * | 1998-04-13 | 2000-10-31 | 3M Innovative Properties Company | Abrasive article with tie coat and method |
US6458018B1 (en) * | 1999-04-23 | 2002-10-01 | 3M Innovative Properties Company | Abrasive article suitable for abrading glass and glass ceramic workpieces |
US20030017797A1 (en) * | 2001-03-28 | 2003-01-23 | Kendall Philip E. | Dual cured abrasive articles |
US7150771B2 (en) * | 2004-06-18 | 2006-12-19 | 3M Innovative Properties Company | Coated abrasive article with composite tie layer, and method of making and using the same |
DK1868770T3 (da) * | 2005-04-14 | 2010-11-22 | Saint Gobain Abrasives Inc | Fremgangsmåde til dannelse af en struktureret slibeartikel |
US7497885B2 (en) | 2006-12-22 | 2009-03-03 | 3M Innovative Properties Company | Abrasive articles with nanoparticulate fillers and method for making and using them |
US8083820B2 (en) * | 2006-12-22 | 2011-12-27 | 3M Innovative Properties Company | Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same |
US8348723B2 (en) * | 2009-09-16 | 2013-01-08 | 3M Innovative Properties Company | Structured abrasive article and method of using the same |
-
2011
- 2011-04-29 US US13/696,908 patent/US20130059506A1/en not_active Abandoned
- 2011-04-29 JP JP2013510126A patent/JP2013526777A/ja active Pending
- 2011-04-29 WO PCT/US2011/034439 patent/WO2011142986A1/en active Application Filing
- 2011-04-29 CN CN201180023624.XA patent/CN102892553B/zh not_active Expired - Fee Related
- 2011-04-29 KR KR1020127031934A patent/KR20130081229A/ko not_active Application Discontinuation
- 2011-04-29 SG SG2012083150A patent/SG185523A1/en unknown
- 2011-05-10 TW TW100116384A patent/TWI532597B/zh not_active IP Right Cessation
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