JP2013254723A5 - - Google Patents
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- Publication number
- JP2013254723A5 JP2013254723A5 JP2012209582A JP2012209582A JP2013254723A5 JP 2013254723 A5 JP2013254723 A5 JP 2013254723A5 JP 2012209582 A JP2012209582 A JP 2012209582A JP 2012209582 A JP2012209582 A JP 2012209582A JP 2013254723 A5 JP2013254723 A5 JP 2013254723A5
- Authority
- JP
- Japan
- Prior art keywords
- processing apparatus
- plasma processing
- gas supply
- recess
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000006698 induction Effects 0.000 claims 3
- 238000000034 method Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012209582A JP2013254723A (ja) | 2012-05-11 | 2012-09-24 | プラズマ処理装置 |
| US13/743,748 US20130299091A1 (en) | 2012-05-11 | 2013-01-17 | Plasma processing apparatus |
| KR1020130005786A KR20130126458A (ko) | 2012-05-11 | 2013-01-18 | 플라즈마 처리 장치 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012109063 | 2012-05-11 | ||
| JP2012109063 | 2012-05-11 | ||
| JP2012209582A JP2013254723A (ja) | 2012-05-11 | 2012-09-24 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013254723A JP2013254723A (ja) | 2013-12-19 |
| JP2013254723A5 true JP2013254723A5 (cg-RX-API-DMAC10.html) | 2015-03-12 |
Family
ID=49547716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012209582A Withdrawn JP2013254723A (ja) | 2012-05-11 | 2012-09-24 | プラズマ処理装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20130299091A1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP2013254723A (cg-RX-API-DMAC10.html) |
| KR (1) | KR20130126458A (cg-RX-API-DMAC10.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5617817B2 (ja) * | 2011-10-27 | 2014-11-05 | パナソニック株式会社 | 誘導結合型プラズマ処理装置及び誘導結合型プラズマ処理方法 |
| JP2015138602A (ja) * | 2014-01-21 | 2015-07-30 | 株式会社アルバック | プラズマ処理用整合器、プラズマ処理装置、および、プラズマ処理用整合器の駆動方法 |
| US20160118284A1 (en) * | 2014-10-22 | 2016-04-28 | Panasonic Intellectual Property Management Co., Ltd. | Plasma processing apparatus |
| JP2017045916A (ja) * | 2015-08-28 | 2017-03-02 | パナソニックＩｐマネジメント株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| GB201603581D0 (en) * | 2016-03-01 | 2016-04-13 | Spts Technologies Ltd | Plasma processing apparatus |
| CN105931940B (zh) | 2016-06-01 | 2018-09-21 | 京东方科技集团股份有限公司 | 一种电感耦合等离子体装置 |
| TWI733021B (zh) | 2017-05-15 | 2021-07-11 | 美商應用材料股份有限公司 | 電漿源組件、處理腔室與處理基板的方法 |
| US10763085B2 (en) | 2017-12-15 | 2020-09-01 | Applied Materials, Inc. | Shaped electrodes for improved plasma exposure from vertical plasma source |
| CN108121004B (zh) * | 2018-01-05 | 2019-05-24 | 北京航空航天大学 | 法拉第探针 |
| CN110660635B (zh) * | 2018-06-29 | 2022-08-16 | 北京北方华创微电子装备有限公司 | 工艺腔室和半导体处理设备 |
| CN110416053B (zh) * | 2019-07-30 | 2021-03-16 | 江苏鲁汶仪器有限公司 | 一种电感耦合等离子体处理系统 |
| JP7768135B2 (ja) * | 2021-06-17 | 2025-11-12 | 株式会社レゾナック | リチウムイオン二次電池用負極材、リチウムイオン二次電池用負極及びリチウムイオン二次電池 |
| JP7760389B2 (ja) | 2022-01-24 | 2025-10-27 | 東京エレクトロン株式会社 | プラズマ処理装置 |
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2012
- 2012-09-24 JP JP2012209582A patent/JP2013254723A/ja not_active Withdrawn
-
2013
- 2013-01-17 US US13/743,748 patent/US20130299091A1/en not_active Abandoned
- 2013-01-18 KR KR1020130005786A patent/KR20130126458A/ko not_active Ceased