JP2013250478A5 - - Google Patents

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Publication number
JP2013250478A5
JP2013250478A5 JP2012126114A JP2012126114A JP2013250478A5 JP 2013250478 A5 JP2013250478 A5 JP 2013250478A5 JP 2012126114 A JP2012126114 A JP 2012126114A JP 2012126114 A JP2012126114 A JP 2012126114A JP 2013250478 A5 JP2013250478 A5 JP 2013250478A5
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JP
Japan
Prior art keywords
light source
range
line
exposure apparatus
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2012126114A
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Japanese (ja)
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JP2013250478A (en
JP6093117B2 (en
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Publication date
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Priority claimed from JP2012126114A external-priority patent/JP6093117B2/en
Priority to JP2012126114A priority Critical patent/JP6093117B2/en
Priority to TW102117083A priority patent/TWI475316B/en
Priority to TW104136941A priority patent/TWI605300B/en
Priority to TW104101989A priority patent/TWI516857B/en
Priority to KR1020130059063A priority patent/KR101528973B1/en
Priority to CN201310208301.9A priority patent/CN103454851B/en
Priority to CN201510763096.1A priority patent/CN105573046B/en
Publication of JP2013250478A publication Critical patent/JP2013250478A/en
Priority to KR1020140080183A priority patent/KR101999412B1/en
Publication of JP2013250478A5 publication Critical patent/JP2013250478A5/ja
Publication of JP6093117B2 publication Critical patent/JP6093117B2/en
Application granted granted Critical
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Anticipated expiration legal-status Critical

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Description

本発明の転写方法においては、標準的なＬＣＤ用露光装置を用いることができる。この場合、例えば、開口数ＮＡを０．０６〜０．１０、コヒレンスσを０．５〜１．０の範囲とすることができる。こうした露光装置は、一般に、３μm程度を解像限界としている。露光光源としては、３６５〜４３６nm（ｉ線〜ｇ線）を含む光源を用いることが好ましい。 In the transfer method of the present invention, a standard LCD exposure apparatus can be used. In this case, for example, the numerical aperture NA can be in the range of 0.06 to 0.10, and the coherence σ can be in the range of 0.5 to 1.0. Such an exposure apparatus generally has a resolution limit of about 3 μm. As the exposure light source, a light source including 365 to 436 nm (i-line to g-line) is preferably used.

JP2012126114A 2012-06-01 2012-06-01 Photomask, photomask manufacturing method, and pattern transfer method Active JP6093117B2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2012126114A JP6093117B2 (en) 2012-06-01 2012-06-01 Photomask, photomask manufacturing method, and pattern transfer method
TW102117083A TWI475316B (en) 2012-06-01 2013-05-14 A method of manufacturing a mask and a mask, and a method of transferring the pattern
TW104136941A TWI605300B (en) 2012-06-01 2013-05-14 Photomask, pattern transfer method, flat panel display manufacturing method, and blank mask
TW104101989A TWI516857B (en) 2012-06-01 2013-05-14 A flat panel display manufacturing mask, a pattern transfer method, and a method of manufacturing a flat panel display
KR1020130059063A KR101528973B1 (en) 2012-06-01 2013-05-24 Photomask, method for manufacturing the photomask and pattern transfer method
CN201510763096.1A CN105573046B (en) 2012-06-01 2013-05-30 Photomask, method for manufacturing photomask, and method for transferring pattern
CN201310208301.9A CN103454851B (en) 2012-06-01 2013-05-30 The manufacture method of photomask, photomask and the printing transferring method of pattern
KR1020140080183A KR101999412B1 (en) 2012-06-01 2014-06-27 Photomask, method for manufacturing the photomask and pattern transfer method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012126114A JP6093117B2 (en) 2012-06-01 2012-06-01 Photomask, photomask manufacturing method, and pattern transfer method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016196977A Division JP6322250B2 (en) 2016-10-05 2016-10-05 Photomask blank

Publications (3)

Publication Number Publication Date
JP2013250478A JP2013250478A (en) 2013-12-12
JP2013250478A5 true JP2013250478A5 (en) 2015-03-19
JP6093117B2 JP6093117B2 (en) 2017-03-08

Family

ID=49737384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012126114A Active JP6093117B2 (en) 2012-06-01 2012-06-01 Photomask, photomask manufacturing method, and pattern transfer method

Country Status (4)

Country Link
JP (1) JP6093117B2 (en)
KR (2) KR101528973B1 (en)
CN (2) CN105573046B (en)
TW (3) TWI475316B (en)

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