JP2013208510A - Method for treating large-sized instrument contaminated with pcb and treatment device to be used for the same - Google Patents

Method for treating large-sized instrument contaminated with pcb and treatment device to be used for the same Download PDF

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JP2013208510A
JP2013208510A JP2012078524A JP2012078524A JP2013208510A JP 2013208510 A JP2013208510 A JP 2013208510A JP 2012078524 A JP2012078524 A JP 2012078524A JP 2012078524 A JP2012078524 A JP 2012078524A JP 2013208510 A JP2013208510 A JP 2013208510A
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JP5907776B2 (en
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Mikio Shimojo
幹雄 下条
Satoru Kanamori
悟 金森
Tetsutaro Furuhashi
鉄太郎 古橋
Hitoshi Ogawa
仁 小川
Koichi Ito
鉱一 伊藤
Shigeru Otsuki
茂 大槻
Toshiharu Kusunoki
敏治 楠
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Tokyo Energy and Systems Inc
Tokyo Electric Power Company Holdings Inc
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Tokyo Energy and Systems Inc
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Abstract

PROBLEM TO BE SOLVED: To provide a method for treating a container that can be treated in a storage place in a large-sized high concentration instrument that is not easy to carry and is extremely hard to treat, and to provide a treatment device.SOLUTION: A method for treating a large-sized instrument contaminated with PCB is characterized by performing in parallel: a cleaning step of, while performing the circular cleaning of the inside of the large-sized instrument 1 contaminated with PCB by using a cleaning liquid, suitably extracting a predetermined amount of the cleaning liquid into a first buffer tank 2 from the cleaning liquid in use for cleaning, and newly supplying the cleaning liquid to the large-sized instrument 1 after the cleaning liquid is extracted to perform the circular cleaning; and a decomposition treatment step of transferring a part of the extracted cleaning liquid from the first buffer tank 2 to a feed liquid tank 3 for storing the cleaning liquid, adding an alkali to the cleaning liquid in the feed liquid tank 3, and then, while circulating the cleaning liquid through a catalyst filled device 4 that is filled with a PCB decomposition catalyst, irradiating the cleaning liquid with a microwave by a microwave treatment device 5 to decompose the PCB in the cleaning liquid, and returning the cleaning liquid circulated through the catalyst filled device to a treated liquid tank 6. A treatment device is used for the method for treating the large-sized instrument contaminated with PCB.

Description

本発明は、PCBで汚染された大型機器の容器内部を洗浄する処理方法及びそれに用いる分解、組み立て可能な処理装置に関する。   The present invention relates to a processing method for cleaning the inside of a container of a large device contaminated with PCB, and a disassembling and assembling processing apparatus used therefor.

各種PCBのなかでも、ポリ塩化ビフェニール(PCB)は、人体を含む生体に極めて有害であることから、PCBを含有する絶縁油の入ったトランス等は、PCB特別措置法により、適正な管理・保管が義務付けられている。それらの絶縁油及びPCBで汚染された機器については、国や電力会社等により設けられた処理施設で順次無害化処理が実施されつつある。   Among various PCBs, polychlorinated biphenyls (PCBs) are extremely harmful to living bodies including the human body, so transformers containing insulating oil containing PCBs are properly managed and stored according to the PCB Special Measures Law. Is required. About the equipment contaminated with those insulating oil and PCB, the detoxification process is being carried out one by one in the processing facility provided by the country or the electric power company.

しかしながら、処理施設が受け入れることができる機器の大きさには制限があるため、持ち運びが容易でない大型機器については、処理技術が確立されておらず、特に、大型高濃度機器の容器処理は困難を極め、これまでに処理に成功した例はない。   However, because there is a limit to the size of equipment that can be accepted by the processing facility, no processing technology has been established for large equipment that is not easy to carry, and in particular, it is difficult to handle containers for large, high-concentration equipment. There have been no examples of successful processing so far.

また、マイクロ波抽出分解法によって処理する場合(例えば、特許文献1〜2を参照)、洗浄液中のPCBを触媒反応槽でそのまま分解すると、液中のアルカリ等により触媒が固着し、分解反応が進まなくなるため、触媒槽を交換しなければならないという問題がある。   Further, when processing by the microwave extraction decomposition method (see, for example, Patent Documents 1 and 2), if the PCB in the cleaning liquid is decomposed as it is in the catalytic reaction tank, the catalyst is fixed by alkali in the liquid and the decomposition reaction is caused. There is a problem that the catalyst tank has to be replaced because it does not progress.

さらに、交換した触媒には未分解のPCBが残るため、このPCBを別途分解処理する必要がある。   Furthermore, since undecomposed PCB remains in the exchanged catalyst, this PCB needs to be separately decomposed.

特開2009−233654号公報JP 2009-233654 A 特開2009−183838号公報JP 2009-183838 A

本発明は、前記の課題に鑑みてなされたものであり、持ち運びが容易でなく極めて処理が困難な大型高濃度機器について、保管場所で処理可能な容器処理方法及び処理装置を提供することを課題とする。   The present invention has been made in view of the above problems, and it is an object of the present invention to provide a container processing method and a processing apparatus that can be processed at a storage place for large-scale high-concentration equipment that is not easy to carry and extremely difficult to process. And

本発明者らは、前記課題を解決するため鋭意検討した結果、大型機器の洗浄液循環による洗浄工程と、洗浄工程を経た洗浄液中のPCBを分解するPCB分解処理工程と、を並行して実施することにより、触媒の固着がなくなり、PCB分解処理が連続で可能となることを見出し、本発明に到達した。   As a result of intensive studies to solve the above-mentioned problems, the present inventors carry out in parallel a cleaning step by circulating a cleaning liquid of a large device and a PCB decomposition processing step for decomposing PCB in the cleaning liquid that has undergone the cleaning step. As a result, it was found that the catalyst was not fixed and the PCB decomposition treatment was continuously possible, and the present invention was achieved.

すなわち、本発明は以下のとおりである。   That is, the present invention is as follows.

1)洗浄液を用いてPCBで汚染された大型機器の内部を循環洗浄しながら、洗浄中の洗浄液から所定量の洗浄液を第1バッファタンクに適宜に抜き出し、洗浄液抜き出し後の大型機器に新たに洗浄液を入れて循環洗浄する洗浄工程と、抜き出した洗浄液の一部を、第1バッファタンクから、洗浄液を貯留する供給液タンクに移送し、供給液タンク内の洗浄液にアルカリを添加した後、該洗浄液をPCB分解触媒を充填した触媒充填装置に流通させながらマイクロ波を照射して洗浄液中のPCBを分解し、触媒充填装置流通後の洗浄液を処理液タンクに戻す分解処理工程と、を並行して実施することを特徴とするPCBで汚染された大型機器の処理方法、
2)洗浄工程を複数回実施した後、該洗浄工程の替わりに、洗浄液抜き出し後の大型機器に新たな洗浄液を入れて大型機器と第1バッファタンクとの間で循環洗浄する後洗浄工程を実施することを特徴とする1)に記載のPCBで汚染された大型機器の処理方法、
3)処理液タンクに戻された処理液に対してPCB濃度を測定し、規制値を満たさない処理液は、再び、供給液タンクに戻し、満たす処理液は第2バッファタンクに移送することを特徴とする1)又は2)に記載のPCBで汚染された大型機器の処理方法、
4)大型機器に入れる新たな洗浄液を、タンクローリーから供給することを特徴とする1)〜3)のいずれかに記載のPCBで汚染された大型機器の処理方法、
5)大型機器に入れる洗浄液が、イソプロピルアルコールであることを特徴とする1)〜4)のいずれかに記載のPCBで汚染された大型機器の処理方法、
6)洗浄工程を経た大型機器の部品を解体して部材を得る解体工程と、その後、該部材に対して拭き取り試験、洗浄液試験又は部材採取試験を行い、規制値を満たす該部材はリサイクル又は廃棄し、満たさない該部材は前記分解処理工程で得られた処理液に浸漬してPCBを処理液に溶解させる溶解工程とをさらに含むことを特徴とする1)〜5)のいずれかに記載のPCBで汚染された大型機器の処理方法。
1) While circulating and washing the inside of the large equipment contaminated with PCB using the cleaning liquid, a predetermined amount of cleaning liquid is appropriately extracted from the cleaning liquid being cleaned into the first buffer tank, and the cleaning liquid is newly added to the large equipment after the cleaning liquid is extracted. A cleaning process for circulating and cleaning, and a part of the extracted cleaning liquid is transferred from the first buffer tank to a supply liquid tank for storing the cleaning liquid, and after adding alkali to the cleaning liquid in the supply liquid tank, the cleaning liquid In parallel with a decomposition treatment step of decomposing PCB in the cleaning liquid by irradiating microwaves while circulating the catalyst through the catalyst filling apparatus filled with the PCB decomposition catalyst, and returning the cleaning liquid after distribution to the processing liquid tank to the processing liquid tank A method of treating large equipment contaminated with PCB, characterized by:
2) After performing the cleaning process multiple times, instead of the cleaning process, a new cleaning liquid is added to the large equipment after the cleaning liquid is extracted, and the post-cleaning process is performed to circulate and wash between the large equipment and the first buffer tank. A method for treating a large-scale device contaminated with PCB according to 1),
3) The PCB concentration is measured with respect to the treatment liquid returned to the treatment liquid tank, and the treatment liquid that does not satisfy the regulation value is returned to the supply liquid tank again, and the filled treatment liquid is transferred to the second buffer tank. A method for treating large equipment contaminated with PCB as described in 1) or 2),
4) A method for treating a large device contaminated with PCB according to any one of 1) to 3), wherein a new cleaning liquid to be placed in the large device is supplied from a tank lorry.
5) A method for treating a large-sized device contaminated with PCB according to any one of 1) to 4), wherein the cleaning liquid to be placed in the large-sized device is isopropyl alcohol.
6) A dismantling process for disassembling parts of large equipment that has undergone a cleaning process to obtain a member, and then performing a wiping test, a cleaning liquid test or a member sampling test on the member, and recycling or discarding the member that satisfies the regulation value The member that is not filled further includes a dissolution step of immersing the member in the treatment liquid obtained in the decomposition treatment step to dissolve the PCB in the treatment solution. A processing method for large equipment contaminated with PCB.

7)大型機器内部の洗浄液を循環させる液循環手段、
大型機器から抜き出した洗浄液を貯留する第1バッファタンク、
第1バッファタンクから移送した洗浄液を貯留する供給液タンク、触媒充填装置、マイクロ波処理装置、分解処理後の処理液を貯留する処理液タンク及び液循環手段を備えたマイクロ波装置ユニット、
分解処理工程を経た処理液を貯留する第2バッファタンク、及び、
洗浄液、処理液を移送する送液手段、
を具備することを特徴とする分解、組み立て可能な処理装置、
8)規制値を満たさない部材を浸漬する洗浄槽と、該洗浄槽へ前記処理液タンクの処理液を移送する送液手段と、をさらに有することを特徴とする7)に記載の分解、組み立て可能な処理装置。
7) Liquid circulation means for circulating the cleaning liquid inside the large equipment,
A first buffer tank for storing a cleaning liquid extracted from a large-sized device;
A supply liquid tank for storing the cleaning liquid transferred from the first buffer tank, a catalyst filling apparatus, a microwave processing apparatus, a processing liquid tank for storing the processing liquid after the decomposition treatment, and a microwave apparatus unit including a liquid circulation means,
A second buffer tank for storing the treatment liquid that has undergone the decomposition treatment step; and
Liquid feeding means for transferring cleaning liquid and processing liquid,
A disassembling and assembling processing device characterized by comprising:
8) The disassembly and assembly according to 7), further comprising: a cleaning tank that immerses a member that does not satisfy the regulation value; and a liquid feeding means that transfers the processing liquid in the processing liquid tank to the cleaning tank. Possible processing equipment.

本発明によれば、大型機器の内部のPCBを洗浄液中に溶出させた後、適宜洗浄液を抜き出し、新たに洗浄液を入れて大型機器は循環洗浄し、その一方で、抜き出した洗浄液にアルカリを添加して分解処理するので、抜き出す洗浄液中のPCB濃度をコントロールすることができる。その結果、分解処理時にPCB分解反応の副生物(KCl等)が多量に生成し、該副生物が触媒上に蓄積されることによって触媒が固着するという現象が起こり難くなり、PCB分解処理を連続で長時間行うことが可能となる。一方では、洗浄液抜き出し後に、新たに洗浄液を入れ、大型機器の内部を循環洗浄することができるので、容器の洗浄とPCB分解処理を、並行して数回行うことにより処理を終了することができる。
分解処理工程では、供給液タンクと処理液タンクを別個に設けているため、抜き出した洗浄液の受け入れと、分解処理後の処理液のバッファタンクへの移送を同時に行うことができる。PCB分解処理が終了した洗浄液は、順次バッファタンクに移送し、最後に卒業判定を実施した後に特別管理産業廃棄物として払い出し・処分する。
According to the present invention, after the PCB inside the large equipment is eluted in the cleaning liquid, the cleaning liquid is appropriately extracted, the cleaning liquid is newly added, the large equipment is circulated and washed, and the alkali is added to the extracted cleaning liquid. Therefore, the PCB concentration in the extracted cleaning liquid can be controlled. As a result, a large amount of PCB decomposition reaction by-products (KCl, etc.) are generated during the decomposition treatment, and the phenomenon that the by-product accumulates on the catalyst makes it difficult for the catalyst to stick, and the PCB decomposition treatment continues. Can be performed for a long time. On the other hand, since the cleaning liquid can be added and the inside of the large equipment can be circulated and cleaned after draining the cleaning liquid, the processing can be completed by performing the container cleaning and the PCB decomposition process several times in parallel. .
In the decomposition processing step, since the supply liquid tank and the processing liquid tank are provided separately, it is possible to simultaneously receive the extracted cleaning liquid and transfer the processing liquid after the decomposition processing to the buffer tank. The cleaning liquid that has been subjected to the PCB decomposition process is sequentially transferred to the buffer tank, and after the final graduation judgment is carried out, it is dispensed and disposed as specially controlled industrial waste.

また、持ち運びが容易でなく処理が極めて困難な大型高濃度機器について、保管場所で処理装置を組み立て、処理を行うことができるため、処理装置を保管場所ごとに移動して処理することができる。   In addition, since a processing device can be assembled and processed at a storage location for a large and high concentration device that is not easy to carry and extremely difficult to process, the processing device can be moved to each storage location for processing.

本発明に係るPCBで汚染された大型機器の処理方法の一例を示す処理フロー図である。It is a processing flowchart which shows an example of the processing method of the large sized apparatus contaminated with PCB which concerns on this invention. 従来のPCBで汚染された大型機器の処理方法を示す処理フロー図である。It is a processing flowchart which shows the processing method of the large sized equipment contaminated with the conventional PCB. 実施例及び比較例におけるPCB分解処理日数とPCB濃度の関係を示すグラフである。It is a graph which shows the relationship between the PCB decomposition processing days and PCB density | concentration in an Example and a comparative example.

以下、本発明に係るPCBで汚染された大型機器の処理方法及び処理装置について、図面を参照しながら詳細に説明する。   Hereinafter, a processing method and a processing apparatus for large equipment contaminated with PCB according to the present invention will be described in detail with reference to the drawings.

なお、本発明で洗浄の対象とするPCBで汚染された大型機器は、大型機器に入っていたPCBを含有する絶縁油が、排油口抜き、ポンプ上抜き、傾倒排油等の任意の方法で抜き出された後、コイル等の内部部品が使用時の状態で存在し、PCBを含有する絶縁油が少量程度残っている状態のもの、又は予備洗浄後の残渣にPCBが少量程度残っている状態のものである。   Note that the large equipment contaminated with the PCB to be cleaned in the present invention is an arbitrary method in which the insulating oil containing PCB contained in the large equipment is drained, pumped, tilted drained, etc. In the state where the internal parts such as the coil are in use and the insulation oil containing PCB remains in a small amount, or a small amount of PCB remains in the residue after preliminary cleaning. It is a state of being.

上記大型機器としては、柱上トランス、大型トランス等が挙げられるが、ここで大型トランスとは絶縁油容量が100L〜1万Lのものが主体である。   Examples of the large equipment include a pole transformer, a large transformer, and the like. Here, the large transformer mainly has an insulating oil capacity of 100L to 10,000L.

分解処理対象であるPCBとしては、例えば、ポリ塩化ビフェニール(PCB)類やダイオキシン類等を挙げることができ、その種類は特に限定されるものではない。PCB類には、ダイオキシン類を含有するPCB類も含まれる。PCB類の市販品としては、例えば、鐘淵化学(株)のKC−200(主成分:2塩化ビフェニール)、KC−300(主成分:3塩化ビフェニール)、KC−400(主成分:4塩化ビフェニール)、KC−500(主成分:5塩化ビフェニール)、KC−600(主成分:6塩化ビフェニール)、KC−1000(KC−500+3塩化ベンゼン)、KC−1300(KC−300+2塩化ベンゼン+4塩化ベンゼン)や、三菱モンサイト(株)のアロクロール1254(54% Chlorine)等を挙げることができる。   Examples of PCBs to be decomposed include polychlorinated biphenyls (PCBs) and dioxins, and the types thereof are not particularly limited. PCBs include PCBs containing dioxins. Examples of commercially available PCBs include KC-200 (main component: biphenyl dichloride), KC-300 (main component: biphenyl trichloride), KC-400 (main component: tetrachloride) manufactured by Kaneka Chemical Co., Ltd. Biphenyl), KC-500 (main component: biphenyl pentachloride), KC-600 (main component: biphenyl bichloride), KC-1000 (KC-500 + benzene trichloride), KC-1300 (KC-300 + dichlorobenzene + tetrachlorobenzene) And Arochlor 1254 (54% Chlorine) manufactured by Mitsubishi Monsite Corporation.

図1は、本発明に係るPCBで汚染された大型機器の処理方法の一実施形態を示す処理フロー図である。図1において、1はPCBで汚染された大型機器、2は大型機器から抜き出した洗浄液を貯留する第1バッファタンク、7は分解処理工程を経た処理液を貯留する第2バッファタンク、20は第1バッファタンク2から移送した洗浄液を貯留する供給液タンク3と、触媒充填装置4と、マイクロ波処理装置5と、分解処理後の処理液を貯留する処理液タンク6と、ポンプ13a、13b、配管13c、13等の液循環手段13を備えたマイクロ波装置ユニット、11はポンプ11a、配管11b等の大型機器1の内部に洗浄液を循環させる液循環手段、11c、12、14、15、17及び19は洗浄液や処理液を移送する送液手段を示す。   FIG. 1 is a process flow diagram showing an embodiment of a method for treating a large device contaminated with PCB according to the present invention. In FIG. 1, 1 is a large device contaminated with PCB, 2 is a first buffer tank that stores cleaning liquid extracted from the large device, 7 is a second buffer tank that stores processing liquid that has undergone a decomposition process, and 20 is a first buffer tank. 1 supply liquid tank 3 for storing the cleaning liquid transferred from the buffer tank 2, catalyst filling device 4, microwave processing device 5, processing liquid tank 6 for storing the processing liquid after decomposition processing, pumps 13 a, 13 b, A microwave apparatus unit having a liquid circulation means 13 such as pipes 13c and 13; 11 is a liquid circulation means for circulating a cleaning liquid inside the large-sized device 1 such as a pump 11a and a pipe 11b; 11c, 12, 14, 15, 17 Reference numerals 19 and 19 denote liquid feeding means for transferring the cleaning liquid and the processing liquid.

図1の処理フローに示すように、先ず、PCBで汚染された大型機器である、充填されていたPCB絶縁油を抜き取った後の高圧トランス(以下、「トランス」と言う)1に、液循環手段11である循環ポンプ11a及び循環用配管11b、並びに、第1バッファタンク2との間の送液手段である配管19、ポンプ2a及びオーバーフロー配管10を接続する。トランス1からの洗浄液抜き出し用に、配管11bとオーバーフロー配管10とを接続する配管11cを設け、各配管を接続する切替弁を操作し、洗浄液抜き出し時以外は配管11cを閉じる。続いて、トランス1内に洗浄液を入れる。洗浄液は、トランス1内が満たされるまで入れ、オーバーフローした洗浄液は、オーバーフロー配管10を介して、第1バッファタンク2に貯留する。その後、トランス1内部を、液循環手段11を使用して循環洗浄し、トランス1内部のPCBを洗浄液に溶出させることにより、洗浄工程を開始する。   As shown in the processing flow of FIG. 1, first, liquid circulation is performed in a high-pressure transformer (hereinafter referred to as “transformer”) 1 after removing the filled PCB insulating oil, which is a large device contaminated with PCB. The circulation pump 11 a and the circulation pipe 11 b which are means 11, and the pipe 19, the pump 2 a and the overflow pipe 10 which are liquid feeding means between the first buffer tank 2 are connected. For extracting the cleaning liquid from the transformer 1, a pipe 11c that connects the pipe 11b and the overflow pipe 10 is provided, the switching valve that connects each pipe is operated, and the pipe 11c is closed except when the cleaning liquid is extracted. Subsequently, a cleaning solution is put into the transformer 1. The cleaning liquid is charged until the transformer 1 is filled, and the overflowed cleaning liquid is stored in the first buffer tank 2 via the overflow pipe 10. Thereafter, the inside of the transformer 1 is circulated and washed using the liquid circulating means 11 and the PCB inside the transformer 1 is eluted into the washing liquid to start the washing process.

洗浄液は、保管場所に移動したタンクローリー9から、送液手段(配管)18を介して、トランス1に供給することが好ましい。これにより、容器処理に必要な、保管場所に運び込む装置ユニット数を最低限度に抑えることができる。   The cleaning liquid is preferably supplied to the transformer 1 from the tank lorry 9 moved to the storage location via the liquid feeding means (pipe) 18. Thereby, the number of apparatus units carried to the storage place required for container processing can be suppressed to the minimum.

トランス1に入れる洗浄液としては、イソプロピルアルコール等の水素供与性の溶剤をベースとするものが好ましい。洗浄液中のPCBを還元分解するには、水素が必要であるが、別途水素を供給するとなると、防爆装置が必要となり安全性も懸念される。しかし、洗浄液に水素供与体が含まれていれば別途水素を供給する必要がない。したがって、洗浄液には、PCBを溶解させる溶剤としての機能と、PCBを分解させるための水素供与体としての機能との、2つの機能が求められる。水素供与性の溶剤としては、イソプロピルアルコールが最も好ましい。   As the cleaning liquid to be put into the transformer 1, a liquid based on a hydrogen donating solvent such as isopropyl alcohol is preferable. In order to reduce and decompose the PCB in the cleaning liquid, hydrogen is required. However, if hydrogen is supplied separately, an explosion-proof device is required and there is a concern about safety. However, if the cleaning liquid contains a hydrogen donor, it is not necessary to supply hydrogen separately. Therefore, the cleaning liquid is required to have two functions: a function as a solvent for dissolving PCB and a function as a hydrogen donor for decomposing PCB. As the hydrogen donating solvent, isopropyl alcohol is most preferable.

循環洗浄を実施するにつれて、洗浄液中のPCB濃度が徐々に増加する。そして、PCB分解処理に好適な、適宜なPCB濃度になった段階で、洗浄工程中の洗浄液から所定量の洗浄液をポンプ11a及び配管11b、11c、10を通して、第1バッファタンク2に抜き出す。洗浄液抜き出し後のトランス1には、タンクローリー9から新たに洗浄液を入れ、液循環手段11により循環洗浄しながら、洗浄工程を継続して実施する。新たに入れる洗浄液は、抜き出した洗浄液の量とほぼ同量にする。   As the circulation cleaning is performed, the PCB concentration in the cleaning liquid gradually increases. Then, when an appropriate PCB concentration suitable for PCB decomposition processing is reached, a predetermined amount of cleaning liquid is extracted from the cleaning liquid in the cleaning process to the first buffer tank 2 through the pump 11a and the pipes 11b, 11c, and 10. A cleaning liquid is newly added from the tank lorry 9 to the transformer 1 after the cleaning liquid is extracted, and the cleaning process is continuously performed while being circulated and cleaned by the liquid circulation means 11. The amount of the newly added cleaning solution is approximately the same as the amount of the extracted cleaning solution.

このような第1バッファタンク2への洗浄液の抜き出しと、トランス1内への新たな洗浄液の添加は、洗浄工程中に数回程度実施することが好ましい。新たな洗浄液が添加されることにより、トランス1内を循環する洗浄液中のPCB濃度は一端低下するが、循環洗浄が継続するにつれ再び増加する。このように、洗浄液の抜き取り回数を重ねるに連れて、洗浄液中のPCB濃度は増減を繰り返しながら漸次低下していく。   The extraction of the cleaning liquid into the first buffer tank 2 and the addition of a new cleaning liquid into the transformer 1 are preferably performed about several times during the cleaning process. By adding a new cleaning solution, the PCB concentration in the cleaning solution circulating in the transformer 1 decreases once, but increases again as the circulating cleaning continues. As described above, as the number of times the cleaning liquid is extracted is increased, the PCB concentration in the cleaning liquid gradually decreases while increasing and decreasing.

洗浄工程を実施しながら、第1バッファタンク2に抜き出した洗浄液の一部を、ポンプ2a、送液手段(配管)12を用いて、供給液タンク3に移送する。そして、供給液タンク3に移送した洗浄液には、所定量のアルカリを添加する。   While performing the cleaning process, a part of the cleaning liquid extracted into the first buffer tank 2 is transferred to the supply liquid tank 3 using the pump 2a and the liquid supply means (pipe) 12. A predetermined amount of alkali is added to the cleaning liquid transferred to the supply liquid tank 3.

アルカリとしては、脱ハロゲン化効率が高く、コストおよびハンドリング性に優れている点より、KOH又はNaOHが好ましく、単独または2種以上を任意に組み合わせて使用することができる。アルカリは、PCBの分解により脱離した塩素を中和する中和剤となるため、中和剤の量が多すぎても経済性に劣り、少なすぎると反応速度が低下することになる。アルカリは、洗浄液中のPCBのハロゲンに対し1.0〜1.5倍当量(より好ましくは1.1〜1.2倍当量)とするのが良い。   The alkali is preferably KOH or NaOH from the viewpoint of high dehalogenation efficiency and excellent cost and handling properties, and can be used alone or in combination of two or more. Alkali serves as a neutralizing agent that neutralizes chlorine released by the decomposition of PCB. Therefore, even if the amount of the neutralizing agent is too large, the economy is inferior, and when it is too small, the reaction rate decreases. The alkali is preferably 1.0 to 1.5 times equivalent (more preferably 1.1 to 1.2 times equivalent) to the halogen of PCB in the cleaning liquid.

そして、アルカリを添加した供給液タンク3内の洗浄液を、PCB分解触媒を充填した触媒充填装置4に流通させながら、マイクロ波処理装置5よりマイクロ波を照射して洗浄液中のPCBを分解する、分解処理工程を実施する。分解処理工程は、持ち運び、組み立て、分解可能な、マイクロ波装置ユニット20を用いて実施する。   Then, while circulating the cleaning liquid in the supply liquid tank 3 to which the alkali has been added to the catalyst filling device 4 filled with the PCB decomposition catalyst, the microwave in the cleaning liquid is irradiated with microwaves to decompose the PCB in the cleaning liquid. A decomposition process step is performed. The decomposition process is performed using a microwave device unit 20 that can be carried, assembled, and disassembled.

マイクロ波装置ユニット20は、供給液タンク3、マイクロ波処理装置5を備えた触媒充填装置4、処理液タンク6、及び、ポンプ13a、13b、配管13c、13d等を備える液循環手段13から構成される。一つのユニットには、複数のマイクロ波処理装置5を備えた触媒充填装置4を配備することが、処理効率向上の点より好ましい。また、分解処理工程では、一つ又は複数のマイクロ波装置ユニット20を用いることもできる。   The microwave device unit 20 includes a supply liquid tank 3, a catalyst filling device 4 including a microwave processing device 5, a processing liquid tank 6, and a liquid circulation means 13 including pumps 13a and 13b, pipes 13c and 13d, and the like. Is done. One unit is preferably provided with a catalyst filling device 4 including a plurality of microwave processing devices 5 from the viewpoint of improving processing efficiency. In the decomposition process, one or a plurality of microwave device units 20 can be used.

分解処理工程では、供給液タンク3の洗浄液を、ポンプ13aを使用して、触媒充填装置4に流通させながら、マイクロ波処理装置5によりマイクロ波を照射し、常圧、60℃で洗浄液中のPCBを分解するのが良い(特開2009−233654号公報)。洗浄液を触媒充填装置4に流通させる際に、該触媒充填装置4内で洗浄液にマイクロ波を照射することによって、PCBの分解を促進することができる。マイクロ波は連続的または断続的に照射すればよい。この場合、マイクロ波の出力、周波数は、設定する洗浄条件に応じて適宜決定することができるが、周波数1〜300GHzのマイクロ波を電気的に制御しながら、10W〜20kWの範囲で照射することが好ましい。洗浄時の液温は、常温以上、60℃以下が好ましい。常温未満ではPCBの分解が遅いため処理時間が長くなり、温度が高すぎると副生物やダイオキシン類が生成しやすくなるからである。   In the decomposition processing step, the cleaning liquid in the supply liquid tank 3 is irradiated to the microwave by the microwave processing apparatus 5 while being circulated through the catalyst filling apparatus 4 using the pump 13a, and the cleaning liquid in the cleaning liquid at normal pressure and 60 ° C. PCB should be disassembled (Japanese Patent Laid-Open No. 2009-233654). When the cleaning liquid is circulated through the catalyst filling device 4, the decomposition of the PCB can be promoted by irradiating the cleaning liquid with microwaves in the catalyst filling device 4. The microwave may be irradiated continuously or intermittently. In this case, the output and frequency of the microwave can be appropriately determined according to the cleaning conditions to be set, but irradiation is performed in the range of 10 W to 20 kW while electrically controlling the microwave of frequency 1 to 300 GHz. Is preferred. The liquid temperature at the time of washing is preferably normal temperature or higher and 60 ° C. or lower. This is because if the temperature is lower than normal temperature, the decomposition time of the PCB is slow, so that the processing time becomes long.

触媒充填装置4に充填する触媒としては、PCBの脱ハロゲン化反応を促進しうるものであれば制限なく使用することができ、その種類は特に限定されない。無機系触媒は、触媒寿命が長く、かつ、アルカリ化合物存在下でも安定であるため、有機系触媒よりも好ましい。無機系触媒としては、脱ハロゲン化効率を高める観点より、複合金属酸化物、炭素結晶化合物、金属担持炭素化合物、金属担持酸化物、金属担持複合金属酸化物及び金属酸化物等が好ましく、その中でも、アルカリ性雰囲気で安全性が高く、マイクロ波吸収性の高い、金属担持炭素化合物が特に好ましい。これらの触媒は、単独又は2種以上を任意に組合せて使用することができ、使用後に再生された再生触媒であっても良い。   Any catalyst can be used for the catalyst filling device 4 as long as it can accelerate the dehalogenation reaction of PCB, and the type thereof is not particularly limited. An inorganic catalyst is preferable to an organic catalyst because it has a long catalyst life and is stable even in the presence of an alkali compound. The inorganic catalyst is preferably a composite metal oxide, a carbon crystal compound, a metal-supported carbon compound, a metal-supported oxide, a metal-supported composite metal oxide, or a metal oxide from the viewpoint of increasing the dehalogenation efficiency. Particularly preferred are metal-supported carbon compounds that are highly safe in an alkaline atmosphere and have high microwave absorption. These catalysts can be used alone or in any combination of two or more, and may be regenerated catalysts regenerated after use.

金属担持炭素化合物は、金属を担持した炭素化合物であれば良いが、金属担持量は触媒全量に対して0.1〜20wt%が好ましく、より好ましくは0.1〜10wt%である。担持される金属としては、鉄、銀、白金、ルテニウム、パラジウム、ロジウム等が挙げられるが、脱ハロゲン化効率を高める観点からは、パラジウム、ルテニウム、白金が好ましく、パラジウムが特に好ましい。金属担持炭素化合物の具体例としては、Pd/C(パラジウム担持炭素化合物)、Ru/C(ルテニウム担持炭素化合物)、Pt/C(白金担持炭素化合物)等が挙げられる。   The metal-supported carbon compound may be a carbon compound supporting a metal, but the metal support amount is preferably 0.1 to 20 wt%, more preferably 0.1 to 10 wt% with respect to the total amount of the catalyst. Examples of the supported metal include iron, silver, platinum, ruthenium, palladium, and rhodium. From the viewpoint of increasing the dehalogenation efficiency, palladium, ruthenium, and platinum are preferable, and palladium is particularly preferable. Specific examples of the metal-supported carbon compound include Pd / C (palladium-supported carbon compound), Ru / C (ruthenium-supported carbon compound), Pt / C (platinum-supported carbon compound), and the like.

触媒使用量は、洗浄対象物(大型機器)の種類や汚染度合によって、適宜決定すればよい。触媒が少なすぎると、PCBの分解効率が悪くなるため洗浄時間が長くなったり、洗浄途中で触媒を取り換える必要が生じたりするため却って非効率となる。一方、触媒が多すぎると不経済である。通常、触媒(重量)は、洗浄液(容積)に対して0.5〜5.0%程度使用することが好ましい。   The amount of catalyst used may be appropriately determined depending on the type of cleaning object (large equipment) and the degree of contamination. If the amount of the catalyst is too small, the decomposition efficiency of the PCB is deteriorated, so that the cleaning time becomes longer or the catalyst needs to be replaced during the cleaning, which is inefficient. On the other hand, too much catalyst is uneconomical. Usually, it is preferable to use about 0.5 to 5.0% of the catalyst (weight) with respect to the cleaning liquid (volume).

分解処理工程においては、一旦処理液タンク6に循環させた処理液は、PCB濃度を測定する。そして、規制値を満たさない処理液は、ポンプ13bを使用し、配管13dを介して、供給液タンク3に戻すことで、再び、触媒充填装置4に循環させる。かかる連続分解処理は、洗浄液中のPCB濃度が規制値(0.5ppm)以下になるまで実施する。   In the decomposition processing step, the PCB concentration of the processing liquid once circulated to the processing liquid tank 6 is measured. And the process liquid which does not satisfy | fill a regulation value is made to circulate through the catalyst filling apparatus 4 again by returning to the supply liquid tank 3 via the piping 13d using the pump 13b. Such a continuous decomposition treatment is performed until the PCB concentration in the cleaning liquid becomes a regulation value (0.5 ppm) or less.

供給液タンク3と処理液タンク6を別々に設けておくことで、洗浄工程中の洗浄液の受入れと、PCB分解処理が終了した処理液の移送と、を同時に行うことができるので、PCBの分解処理を連続で実施することができる。   By providing the supply liquid tank 3 and the treatment liquid tank 6 separately, the reception of the washing liquid during the washing process and the transfer of the treatment liquid after the PCB decomposition process can be performed at the same time. Processing can be carried out continuously.

すなわち、分解処理によりPCB濃度が規制値以下になった処理液は、処理液タンク6から、ポンプ13bを使用し、送液手段(配管)14を介して、第2バッファタンク7に移送される。この間に、第1バッファタンク2から所定量の洗浄液を抜き出し、ポンプ2a、配管12を介して、供給液タンク3に移送し、アルカリを添加する操作が行えるので、マイクロ波装置ユニット20により洗浄液中のPCBの分解処理を引き続いて実施することができる。   That is, the processing liquid whose PCB concentration has become equal to or lower than the regulation value by the decomposition processing is transferred from the processing liquid tank 6 to the second buffer tank 7 through the liquid supply means (pipe) 14 using the pump 13b. . During this time, a predetermined amount of cleaning liquid is extracted from the first buffer tank 2, transferred to the supply liquid tank 3 via the pump 2 a and the pipe 12, and an operation of adding alkali can be performed. The PCB decomposition process can be carried out subsequently.

上記で説明した、洗浄工程中のトランス1からの第1バッファタンク2への洗浄液の抜き出し、抜き出し後のトランス1内への新たな洗浄液の添加及び循環洗浄、並びに、供給液タンク3へ移送した洗浄液中のPCB分解処理は、トランス1内を循環させる洗浄液中のPCB濃度が所定濃度(約10ppm)以下になるまで、トランス1の容量に応じて、数回程度実施する。   Extraction of the cleaning liquid from the transformer 1 to the first buffer tank 2 during the cleaning process described above, addition of new cleaning liquid into the transformer 1 after the extraction and circulation cleaning, and transfer to the supply liquid tank 3 The PCB decomposition treatment in the cleaning liquid is performed several times according to the capacity of the transformer 1 until the PCB concentration in the cleaning liquid circulating in the transformer 1 becomes a predetermined concentration (about 10 ppm) or less.

このように、本発明の処理装置においては、トランス1内の洗浄液を循環する液循環手段11(循環ポンプ11aと循環用配管11bで構成)ならびにPCBの分解処理を終了した洗浄液を貯留する第2バッファタンク7を備えているので、トランス1内の洗浄液の循環と、洗浄液中のPCBの分解処理を、それぞれ並行して連続して実施することができるため、PCBの処理効率が向上する。さらに、トランス1の循環洗浄に際して、未使用の洗浄液を追加することができ、トランス1の洗浄効率も向上するので、この点からもPCBの処理効率の向上が図れる。
これに対して、例えば図2に示すような、第1バッファタンク2のみを有する従来の装置では、第1バッファタンク2内の洗浄液を一部抜き出して、供給液タンク3に移送しPCB分解処理を行う場合には、第1バッファタンク2からの洗浄液の抜き出しを行っている間、トランス1の循環洗浄を停止せざるを得ない。また、PCBの分解処理が終了した処理液は第1バッファタンク2に戻されるため、未使用の洗浄液を追加してトランス1の循環洗浄を行うことが難しい。
As described above, in the processing apparatus of the present invention, the liquid circulating means 11 (which includes the circulation pump 11a and the circulation pipe 11b) that circulates the cleaning liquid in the transformer 1 and the second cleaning liquid that has finished the PCB decomposition process are stored. Since the buffer tank 7 is provided, since the circulation of the cleaning liquid in the transformer 1 and the decomposition process of the PCB in the cleaning liquid can be performed in parallel, the PCB processing efficiency is improved. Further, when the transformer 1 is circulated and cleaned, an unused cleaning solution can be added, and the cleaning efficiency of the transformer 1 is improved. From this point, the PCB processing efficiency can be improved.
On the other hand, in the conventional apparatus having only the first buffer tank 2 as shown in FIG. 2, for example, a part of the cleaning liquid in the first buffer tank 2 is extracted and transferred to the supply liquid tank 3 to be subjected to PCB decomposition processing. When performing the above, the circulation cleaning of the transformer 1 must be stopped while the cleaning liquid is being extracted from the first buffer tank 2. In addition, since the processing liquid after the PCB decomposition process is returned to the first buffer tank 2, it is difficult to circulate and clean the transformer 1 by adding an unused cleaning liquid.

第2バッファタンク7に貯留された処理液には、洗浄液の他に、添加したアルカリやPCB分解処理により副生したビフェニール、アセトン、ベンゼン、水、中和塩(KCl等)等を含むので、卒業判定を実施した後に、最終的には特別管理産業廃棄物として払い出し・処分される。   Since the processing liquid stored in the second buffer tank 7 contains, in addition to the cleaning liquid, biphenyl, acetone, benzene, water, neutralized salts (KCl, etc.) that are by-produced by the added alkali or PCB decomposition process, After the graduation judgment, it will eventually be dispensed and disposed as specially managed industrial waste.

なお、第2バッファタンク7に貯留された処理液は、ポンプ7aにより配管12を介して供給液タンク3に供給することで、第1バッファタンク2から抜き出して分解処理工程に送り出される洗浄液中のPCB濃度を調節するのに用いることができる。あるいは、ポンプ7aにより配管15を介して、洗浄槽8に供給し、後述する解体部材の洗浄に用いることもできる。   The processing liquid stored in the second buffer tank 7 is supplied to the supply liquid tank 3 through the pipe 12 by the pump 7a, so that the processing liquid is extracted from the first buffer tank 2 and sent to the decomposition processing step. Can be used to adjust PCB concentration. Or it can supply to the washing tank 8 via the piping 15 with the pump 7a, and can also be used for washing | cleaning of the disassembly member mentioned later.

洗浄工程を数回程度実施することにより、PCB初期濃度が低下した後は、上記の洗浄工程を実施する替わりに、洗浄液抜き出し後のトランス1に新たな洗浄液を入れてトランス1と第1バッファタンク2との間で循環洗浄する後洗浄工程を実施することができる。該後洗浄工程においても、洗浄液の一部を抜き出し、抜き出した洗浄液の一部を、第1バッファタンク2から、洗浄液を貯留する供給液タンク3に移送し、供給液タンク3内の洗浄液にアルカリを添加した後、該洗浄液をPCB分解触媒を充填した触媒充填装置4に流通させながらマイクロ波処理装置5よりマイクロ波を照射して洗浄液中のPCBを分解し、触媒充填装置4流通後の洗浄液を処理液タンク6に戻す分解処理工程と、を並行して実施する。   After the initial concentration of PCB is lowered by performing the cleaning process several times, instead of performing the above-described cleaning process, a new cleaning liquid is put into the transformer 1 after the cleaning liquid is extracted, and the transformer 1 and the first buffer tank A post-cleaning step of circulating cleaning with 2 can be performed. Also in the post-cleaning step, a part of the cleaning liquid is extracted, and a part of the extracted cleaning liquid is transferred from the first buffer tank 2 to the supply liquid tank 3 that stores the cleaning liquid, and the cleaning liquid in the supply liquid tank 3 is alkalinized. Is added to the catalyst filling device 4 filled with the PCB decomposition catalyst, microwaves are irradiated from the microwave treatment device 5 to decompose PCB in the cleaning solution, and the cleaning solution after the catalyst filling device 4 is distributed. The decomposition treatment step for returning the liquid to the treatment liquid tank 6 is performed in parallel.

後洗浄工程中における洗浄液の抜き出し、抜き出し後のトランス1内への新たな洗浄液の添加及び循環洗浄、並びに、供給液タンク3へ移送した洗浄液中のPCB分解処理は、トランス1内を循環させる洗浄液中のPCB濃度が所定濃度(約10ppm)以下になるまで実施する。   In the post-cleaning step, the cleaning liquid is extracted, the cleaning liquid added to the transformer 1 after the extraction and circulation cleaning, and the PCB decomposition process in the cleaning liquid transferred to the supply liquid tank 3 are circulated in the transformer 1. This is carried out until the PCB concentration in the inside becomes a predetermined concentration (about 10 ppm) or less.

上記の洗浄工程又は後洗浄工程を経たトランス1は、洗浄液をトランス1から抜き出し、洗浄液を液切りした後、鉄製の容器と内部に存在する部品に解体する。コイル等の内部部品は、鉄芯とコイル(銅線)と碍子とに分解し、コイルは破砕した後に銅と紙・木等とに分解して部材を得る。その後、部材に対して拭き取り試験、洗浄液試験又は部材採取試験を行い、規制値を満たす部材はリサイクル又は廃棄する。一方、規制値を満たさない部材は、上記の分解処理工程で得られた処理液に浸漬し、PCBを処理液に溶解させる。PCBを溶解させた処理液は、再び、供給液タンク3に戻し、PCB分解処理工程を経て第2バッファタンク7に入れる。   The transformer 1 that has undergone the above-described cleaning process or post-cleaning process draws the cleaning liquid from the transformer 1, drains the cleaning liquid, and then disassembles it into an iron container and the components that are present inside. Internal parts such as coils are broken down into iron cores, coils (copper wires), and insulators, and the coils are crushed and then broken down into copper, paper, wood, etc. to obtain members. Thereafter, the member is subjected to a wiping test, a cleaning liquid test or a member sampling test, and a member satisfying the regulation value is recycled or discarded. On the other hand, a member that does not satisfy the regulation value is immersed in the treatment liquid obtained in the above decomposition treatment step to dissolve PCB in the treatment liquid. The processing liquid in which PCB is dissolved is returned again to the supply liquid tank 3 and is put into the second buffer tank 7 through the PCB decomposition processing step.

規制値を満たさない部材の浸漬には洗浄槽8を使用する。洗浄槽8(5000L程度)への処理液の供給は、処理液タンク6内の処理液を、ポンプ13bで抜き出し、送液手段(配管)16を介して行う。あるいは、第2バッファタンク7内の処理液を、ポンプ7aで抜き出し、送液手段(配管)15を介して行う。部材の浸漬洗浄は、ポンプ8a、送液手段(配管)17を使用して、洗浄槽8内の処理液を循環させると、更に洗浄効率がよい。洗浄後の各部材は、部材ごとに所定の卒業基準値を満たしているかどうかを、分析により確認する。規制値を満たす部材はリサイクル又は廃棄する。   A cleaning tank 8 is used for dipping a member that does not satisfy the regulation value. The processing liquid is supplied to the cleaning tank 8 (about 5000 L) by extracting the processing liquid in the processing liquid tank 6 with the pump 13 b and via the liquid feeding means (piping) 16. Alternatively, the processing liquid in the second buffer tank 7 is extracted by the pump 7 a and is supplied via the liquid feeding means (pipe) 15. In the immersion cleaning of the member, if the processing liquid in the cleaning tank 8 is circulated using the pump 8a and the liquid feeding means (pipe) 17, the cleaning efficiency is further improved. Each member after cleaning is checked by analysis to determine whether or not each member satisfies a predetermined graduation standard value. Members that meet the regulatory values are recycled or discarded.

本発明の容器処理方法で用いる処理装置は、持ち運び、組み立て、分解可能な複数のユニットから構成されており、第1バッファタンク2は洗浄工程中の洗浄液を貯留し、マイクロ波装置ユニット20は洗浄液中のPCBを分解処理し、第2バッファタンク7は分解処理工程を経た処理液を貯留し、洗浄槽8は規制値を満たさない部材を浸漬洗浄するためのものである。そして、本発明では、各装置ユニットを、PCBで汚染された大型機器の保管場所に運搬し、該保管場所において、各装置ユニットに、洗浄液を循環させる液循環手段、洗浄液や処理液を移送する送液手段を取り付け、その他、必要な装置を配備し、組み立てることで、処理装置を構築する。   The processing apparatus used in the container processing method of the present invention is composed of a plurality of units that can be carried, assembled, and disassembled. The first buffer tank 2 stores cleaning liquid during the cleaning process, and the microwave apparatus unit 20 includes cleaning liquid. The PCB inside is decomposed, the second buffer tank 7 stores the processing solution that has undergone the decomposition processing step, and the cleaning tank 8 is for dip cleaning a member that does not satisfy the regulation value. And in this invention, each apparatus unit is conveyed to the storage place of the large sized equipment contaminated with PCB, and the liquid circulation means to circulate the cleaning liquid, the cleaning liquid and the processing liquid are transferred to each apparatus unit at the storage place. A processing apparatus is constructed by installing and assembling other necessary apparatuses by attaching liquid feeding means.

容器処理終了後は、第2バッファタンク7の処理液を、特別管理産業廃棄物として払い出し・処分する。また、処理装置は、分解した後、別の保管場所に運んで組み立て、その保管場所に存在するPCBで汚染された大型機器の容器処理に使用する。   After the container processing is completed, the processing liquid in the second buffer tank 7 is dispensed and disposed as special management industrial waste. Further, after disassembling, the processing apparatus is transported and assembled to another storage location, and used for container processing of large equipment contaminated with PCB present in the storage location.

次に、本発明を実施例により具体的に説明するが、本発明は以下の実施例にのみ限定されるものではない。また、以下の実施例等において、特に言及する場合を除き、「質量%」は「%」と略記する。   EXAMPLES Next, although an Example demonstrates this invention concretely, this invention is not limited only to a following example. In the following examples and the like, “mass%” is abbreviated as “%” unless otherwise specified.

(比較例)
図2に示す処理フローに従い容器処理を実施した。なお、図2のマイクロ波装置ユニット20を構成する供給液タンク3、処理液タンク6、触媒充填装置4、マイクロ波処理装置5は、図1と同じ仕様である。
(Comparative example)
Container processing was performed according to the processing flow shown in FIG. The supply liquid tank 3, the processing liquid tank 6, the catalyst filling device 4, and the microwave processing device 5 constituting the microwave device unit 20 in FIG. 2 have the same specifications as those in FIG.

予めPCB絶縁油を排油した2500L容大型高圧トランス1(残油量は約70L(絶縁紙等への含浸量を含む))に、第1バッファタンク2との間の配管19、ポンプ2a及びオーバーフロー配管10を接続した。   The piping 19 between the first buffer tank 2, the pump 2 a, and the 2500 L large-sized high-pressure transformer 1 (with a residual oil amount of about 70 L (including the amount of impregnation into insulating paper)) from which PCB insulating oil has been drained in advance The overflow pipe 10 was connected.

続いて、予め第1バッファタンクに受け入れたイソプロピルアルコール(IPA)を、高圧トランス1内に、配管19及び循環ポンプ2aを介して入れ、高圧トランス内がIPAで満たされるようにした。その後、高圧トランス1と第1バッファタンク2の間で循環運転を行うと同時に、循環洗浄液の一部を抜き出し、供給液タンク3に移送し、供給液タンクに所定量のKOHを加え(KOHはあらかじめ適量のIPAに溶解)、マイクロ波装置ユニット20に移送してPCBを分解処理した後、処理液タンク6及び配管14を介して第1バッファタンク2へ戻した。   Subsequently, isopropyl alcohol (IPA) previously received in the first buffer tank was put into the high-pressure transformer 1 through the pipe 19 and the circulation pump 2a so that the inside of the high-pressure transformer was filled with IPA. Thereafter, a circulation operation is performed between the high-pressure transformer 1 and the first buffer tank 2, and at the same time, a part of the circulating cleaning liquid is extracted, transferred to the supply liquid tank 3, and a predetermined amount of KOH is added to the supply liquid tank (KOH is After being dissolved in an appropriate amount of IPA in advance and transferred to the microwave device unit 20 to decompose the PCB, it was returned to the first buffer tank 2 via the treatment liquid tank 6 and the pipe 14.

容器洗浄処理を行っている期間中、洗浄液中のPCB濃度を測定し、PCB濃度が所定値(約10ppm)以下になるまで容器洗浄処理を実施した。処理日数とPCB濃度の関係を図3のRun1に示す。   During the period during which the container cleaning process is being performed, the PCB concentration in the cleaning liquid was measured, and the container cleaning process was performed until the PCB concentration reached a predetermined value (about 10 ppm) or less. The relationship between the number of treatment days and the PCB concentration is shown in Run 1 of FIG.

なお、PCB濃度は、ポリシロキサンDB−5MS(カラム長さ30m)(Agilent Technologies社製)をキャピラリーカラムとする島津製作所製のガスクロマトグラフィー質量分析計QP5050Aを用いて分析した。   The PCB concentration was analyzed using a gas chromatography mass spectrometer QP5050A manufactured by Shimadzu Corporation using polysiloxane DB-5MS (column length: 30 m) (manufactured by Agilent Technologies) as a capillary column.

(実施例)
図1に示す処理フローに従い容器処理を実施した。
(Example)
Container processing was performed according to the processing flow shown in FIG.

予めPCB絶縁油を排油した2500L容大型高圧トランス1(残油量は約70L(絶縁紙等への含浸量を含む))の本体側に、循環用配管11b及び循環ポンプ11a、ならびに第1バッファタンク2との間の配管19、ポンプ2a及びオーバーフロー配管10を接続した。また、循環用配管11bとオーバーフロー配管10を繋ぐ配管11cを設けた。   On the main body side of the 2500 L large-sized high-pressure transformer 1 (residual oil amount is approximately 70 L (including the amount of impregnation into insulating paper)) from which PCB insulating oil has been drained in advance, the circulation pipe 11 b, the circulation pump 11 a, and the first A pipe 19 between the buffer tank 2, a pump 2 a, and an overflow pipe 10 were connected. In addition, a pipe 11c that connects the circulation pipe 11b and the overflow pipe 10 is provided.

続いて、トランス1内に、洗浄液としてイソプロピルアルコール(IPA)3500Lを入れ、トランス内をIPAで満たし、余分のIPAはオーバーフロー配管10を介して第1バッファタンク2に貯留した。その後、トランス1内のIPAを、循環ポンプ11a、循環用配管11bを介して、適宜循環した。   Subsequently, 3500 L of isopropyl alcohol (IPA) as a cleaning liquid was put into the transformer 1, the inside of the transformer was filled with IPA, and excess IPA was stored in the first buffer tank 2 via the overflow pipe 10. Thereafter, the IPA in the transformer 1 was appropriately circulated through the circulation pump 11a and the circulation pipe 11b.

IPA中のPCB濃度が約10000ppmになった段階で、トランス1内の洗浄液4000Lを第1バッファタンク2(5000L容)に抜き出した。また、トランス1内には、抜き出した洗浄液の量とほぼ同量の新しいIPAをタンクローリー9から直接投入し、循環ポンプ11a、循環用配管11bによる循環を継続した。   When the PCB concentration in the IPA reached about 10,000 ppm, 4000 L of the cleaning liquid in the transformer 1 was extracted into the first buffer tank 2 (5000 L capacity). In addition, new IPA of approximately the same amount as the amount of the extracted cleaning liquid was directly fed into the transformer 1 from the tank lorry 9, and the circulation by the circulation pump 11a and the circulation pipe 11b was continued.

一方、第1バッファタンク2に抜き出した洗浄液は、その一部を200L容の供給液タンク3に移送した。また、供給液タンク3に、洗浄液250Lに対してKOH5000gになるようにKOHを添加した。   On the other hand, a part of the cleaning liquid extracted into the first buffer tank 2 was transferred to the 200-L supply liquid tank 3. Further, KOH was added to the supply liquid tank 3 so that the amount of KOH was 5000 g with respect to 250 L of the cleaning liquid.

続いて、供給液タンク3の外部に設置した6台の処理装置へ、循環量6L/分のマイクロ波分解用循環ポンプ13aを用いて通液した。当該処理装置は、触媒充填装置4とマイクロ波処理装置5から構成されており、マイクロ波力は最大1kWで、処理槽容量は合計で約50Lである。処理装置において、各マイクロ波処理装置5によりマイクロ波を照射させながら、パラジウムを担持した活性炭触媒を充填した触媒充填装置4(触媒量2kg×6台)を通過させた後、洗浄液は200L容の処理液タンク6にまとめ、帰還ポンプ13bを使用して供給液タンク3内に戻すことで、循環運転を行った。分解処理においては処理温度を60℃に保ちながらマイクロ波を照射して液を循環させた。循環させる液中のPCB濃度が0.5ppm以下になった段階で、循環運転を止め、ポンプ13bを使って、処理液を第2バッファタンク7(5000L容)に移送した。   Subsequently, liquid was passed through six treatment apparatuses installed outside the supply liquid tank 3 using a circulation pump 13a for microwave decomposition at a circulation rate of 6 L / min. The said processing apparatus is comprised from the catalyst filling apparatus 4 and the microwave processing apparatus 5, microwave power is a maximum of 1 kW, and a processing tank capacity | capacitance is about 50L in total. In the processing apparatus, each microwave processing apparatus 5 was allowed to pass through a catalyst filling apparatus 4 (catalyst amount 2 kg × 6 units) filled with activated carbon catalyst supporting palladium while irradiating microwaves, and then the cleaning liquid was 200 L in volume. A circulation operation was performed by collecting the liquid in the treatment liquid tank 6 and returning it to the supply liquid tank 3 using the feedback pump 13b. In the decomposition treatment, the liquid was circulated by irradiation with microwaves while maintaining the treatment temperature at 60 ° C. When the PCB concentration in the circulated liquid became 0.5 ppm or less, the circulation operation was stopped, and the treatment liquid was transferred to the second buffer tank 7 (5000 L capacity) using the pump 13b.

第1バッファタンク2への洗浄液の抜き出し、供給液タンク3でのKOH添加(段落番号[0056]記載)、並びに、マイクロ波装置ユニット20を用いたPCB分解処理(段落番号[0057]記載)を繰り返し行い、第1バッファタンク2の洗浄液を全て処理した。また、PCB分解処理工程を実施している間、トランス1内の洗浄液を循環ライン11b及び循環ポンプ11aで循環させる洗浄工程を継続して実施した。   Extraction of the cleaning liquid into the first buffer tank 2, addition of KOH in the supply liquid tank 3 (described in paragraph number [0056]), and PCB decomposition processing (described in paragraph number [0057]) using the microwave device unit 20 Repeatedly, all the cleaning liquid in the first buffer tank 2 was processed. During the PCB decomposition treatment process, the cleaning process for circulating the cleaning liquid in the transformer 1 through the circulation line 11b and the circulation pump 11a was continued.

新しい洗浄液(IPA)を入れた際の、トランス1内の洗浄液中のPCB濃度が100ppm程度になった段階で、洗浄液の循環をトランス1と第1バッファタンク2との間の循環に切り替え、後洗浄工程を実施した。循環洗浄しながら、洗浄液の抜き出し、供給液タンク3でのKOH添加、並びに、マイクロ波装置ユニット20を用いたPCB分解処理を繰り返し行い、洗浄液を全て処理した。   When the PCB concentration in the cleaning liquid in the transformer 1 reaches about 100 ppm when a new cleaning liquid (IPA) is added, the circulation of the cleaning liquid is switched to the circulation between the transformer 1 and the first buffer tank 2. A washing step was performed. While circulating cleaning, the cleaning liquid was extracted, the KOH addition in the supply liquid tank 3 and the PCB decomposition process using the microwave device unit 20 were repeated to process all the cleaning liquid.

トランス1内の洗浄液の抜き出し、供給液タンク3への移送は、循環させる液中のPCB濃度が所定値(約10ppm)以下になるまで行った。分解処理後の処理液は、全て第2バッファタンク7に移送した。   The cleaning liquid in the transformer 1 was extracted and transferred to the supply liquid tank 3 until the PCB concentration in the circulating liquid became a predetermined value (about 10 ppm) or less. All the treatment liquid after the decomposition treatment was transferred to the second buffer tank 7.

容器洗浄処理を行っている期間中、トランス1内の洗浄液中のPCB濃度を測定した。処理日数とPCB濃度の関係を図3のRun2に示す。   During the container cleaning process, the PCB concentration in the cleaning liquid in the transformer 1 was measured. The relationship between the number of treatment days and PCB concentration is shown in Run 2 of FIG.

図3より、本発明の容器処理方法によれば、従来の約1/2の処理日数で、PCBで汚染された大型機器の容器処理を終了できることがわかる。   FIG. 3 shows that according to the container processing method of the present invention, the container processing of the large equipment contaminated with PCB can be completed in about half the conventional processing days.

本発明に係る処理方法および処理装置は、分解、組み立て可能で、保管場所ごとに移動して処理できるので、持ち運びが容易でないPCBで汚染された大型機器の容器処理に極めて優れた効果を発揮する。   The processing method and processing apparatus according to the present invention can be disassembled and assembled, and can be moved and processed at each storage location. Therefore, the processing method and the processing apparatus according to the present invention exhibit extremely excellent effects on the container processing of large equipment contaminated with PCB that is not easy to carry. .

1 PCBで汚染された大型機器(高圧トランス)
2 第1バッファタンク
2a ポンプ
3 供給液タンク
4 触媒充填装置
5 マイクロ波処理装置
6 処理液タンク
7 第2バッファタンク
7a ポンプ
8 洗浄槽
8a ポンプ
9 タンクローリー
10 オーバーフロー配管
11 液循環手段
11a ポンプ
11b 配管
11c 配管
12 配管
13 液循環手段
13a、13b ポンプ
13c、13d 配管
14 配管
15 配管
16 配管
17 配管
18 配管
19 配管
20 マイクロ波装置ユニット
1 Large equipment (high voltage transformer) contaminated with PCB
2 1st buffer tank 2a Pump 3 Supply liquid tank 4 Catalyst filling device 5 Microwave treatment device 6 Treatment liquid tank 7 Second buffer tank 7a Pump 8 Washing tank 8a Pump 9 Tank lorry 10 Overflow piping 11 Liquid circulation means 11a Pump 11b Piping 11c Piping 12 Piping 13 Liquid circulating means 13a, 13b Pumps 13c, 13d Piping 14 Piping 15 Piping 16 Piping 17 Piping 18 Piping 19 Piping 20 Microwave device unit

Claims (8)

洗浄液を用いてPCBで汚染された大型機器の内部を循環洗浄しながら、洗浄中の洗浄液から所定量の洗浄液を第1バッファタンクに適宜に抜き出し、洗浄液抜き出し後の大型機器に新たに洗浄液を入れて循環洗浄する洗浄工程と、抜き出した洗浄液の一部を、第1バッファタンクから、洗浄液を貯留する供給液タンクに移送し、供給液タンク内の洗浄液にアルカリを添加した後、該洗浄液をPCB分解触媒を充填した触媒充填装置に流通させながらマイクロ波を照射して洗浄液中のPCBを分解し、触媒充填装置流通後の洗浄液を処理液タンクに戻す分解処理工程と、を並行して実施することを特徴とするPCBで汚染された大型機器の処理方法。   While circulating and cleaning the inside of the large equipment contaminated with PCB using the cleaning liquid, a predetermined amount of cleaning liquid is appropriately extracted from the cleaning liquid being cleaned into the first buffer tank, and the cleaning liquid is newly added to the large equipment after the cleaning liquid is extracted. The cleaning process for circulating cleaning and a part of the extracted cleaning liquid are transferred from the first buffer tank to the supply liquid tank for storing the cleaning liquid, and after adding alkali to the cleaning liquid in the supply liquid tank, the cleaning liquid is added to the PCB. In parallel with the decomposition process step, the PCB in the cleaning liquid is decomposed by irradiating microwaves while circulating through the catalyst filling apparatus filled with the decomposition catalyst, and the cleaning liquid after distribution through the catalyst filling apparatus is returned to the processing liquid tank. A method for treating large equipment contaminated with PCB. 洗浄工程を複数回実施した後、該洗浄工程の替わりに、洗浄液抜き出し後の大型機器に新たな洗浄液を入れて大型機器と第1バッファタンクとの間で循環洗浄する後洗浄工程を実施することを特徴とする請求項1に記載のPCBで汚染された大型機器の処理方法。   After performing the cleaning process a plurality of times, instead of the cleaning process, a new cleaning liquid is put into the large equipment after the cleaning liquid is extracted, and a post-cleaning process is performed for circulating cleaning between the large equipment and the first buffer tank. The processing method of the large sized equipment contaminated with PCB of Claim 1 characterized by these. 処理液タンクに戻された処理液に対してPCB濃度を測定し、規制値を満たさない処理液は、再び、供給液タンクに戻し、満たす処理液は第2バッファタンクに移送することを特徴とする請求項1又は2に記載のPCBで汚染された大型機器の処理方法。   The PCB concentration is measured with respect to the treatment liquid returned to the treatment liquid tank, the treatment liquid that does not satisfy the regulation value is returned to the supply liquid tank again, and the filled treatment liquid is transferred to the second buffer tank. A method for treating a large device contaminated with PCB according to claim 1 or 2. 大型機器に入れる新たな洗浄液を、タンクローリーから供給することを特徴とする請求項1〜3のいずれかに記載のPCBで汚染された大型機器の処理方法。   The method for treating a large device contaminated with PCB according to any one of claims 1 to 3, wherein a new cleaning liquid to be introduced into the large device is supplied from a tank lorry. 大型機器に入れる洗浄液が、イソプロピルアルコールであることを特徴とする請求項1〜4のいずれかに記載のPCBで汚染された大型機器の処理方法。   The method for treating a large-sized device contaminated with PCB according to any one of claims 1 to 4, wherein the cleaning liquid put into the large-sized device is isopropyl alcohol. 洗浄工程を経た大型機器の部品を解体して部材を得る解体工程と、その後、該部材に対して拭き取り試験、洗浄液試験又は部材採取試験を行い、規制値を満たす該部材はリサイクル又は廃棄し、満たさない該部材は前記分解処理工程で得られた処理液に浸漬してPCBを処理液に溶解させる溶解工程とをさらに含むことを特徴とする請求項1〜5のいずれかに記載のPCBで汚染された大型機器の処理方法。   A dismantling process for disassembling parts of large equipment that has undergone a cleaning process to obtain a member, and thereafter performing a wiping test, a cleaning liquid test or a member sampling test on the member, and recycling or discarding the member that satisfies the regulation value, The PCB according to any one of claims 1 to 5, further comprising a dissolving step in which the unsatisfied member is immersed in the treatment liquid obtained in the decomposition treatment step and the PCB is dissolved in the treatment liquid. How to handle contaminated large equipment. 大型機器内部の洗浄液を循環させる液循環手段、
大型機器から抜き出した洗浄液を貯留する第1バッファタンク、
第1バッファタンクから移送した洗浄液を貯留する供給液タンク、触媒充填装置、マイクロ波処理装置、分解処理後の処理液を貯留する処理液タンク及び液循環手段を備えたマイクロ波装置ユニット、
分解処理工程を経た処理液を貯留する第2バッファタンク、及び、
洗浄液、処理液を移送する送液手段、
を具備することを特徴とする分解、組み立て可能な処理装置。
Liquid circulation means for circulating cleaning liquid inside large equipment,
A first buffer tank for storing a cleaning liquid extracted from a large-sized device;
A supply liquid tank for storing the cleaning liquid transferred from the first buffer tank, a catalyst filling apparatus, a microwave processing apparatus, a processing liquid tank for storing the processing liquid after the decomposition treatment, and a microwave apparatus unit including a liquid circulation means,
A second buffer tank for storing the treatment liquid that has undergone the decomposition treatment step; and
Liquid feeding means for transferring cleaning liquid and processing liquid,
A disassembling and assembling processing apparatus characterized by comprising:
規制値を満たさない部材を浸漬する洗浄槽と、該洗浄槽へ前記処理液タンクの処理液を移送する送液手段と、をさらに有することを特徴とする請求項7に記載の分解、組み立て可能な処理装置。   The disassembly and assembly according to claim 7, further comprising: a cleaning tank that immerses a member that does not satisfy the regulation value; and a liquid feeding unit that transfers the processing liquid in the processing liquid tank to the cleaning tank. Processing equipment.
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