JP2013196996A5 - - Google Patents

Download PDF

Info

Publication number
JP2013196996A5
JP2013196996A5 JP2012064918A JP2012064918A JP2013196996A5 JP 2013196996 A5 JP2013196996 A5 JP 2013196996A5 JP 2012064918 A JP2012064918 A JP 2012064918A JP 2012064918 A JP2012064918 A JP 2012064918A JP 2013196996 A5 JP2013196996 A5 JP 2013196996A5
Authority
JP
Japan
Prior art keywords
superconducting material
layer
rare earth
earth element
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012064918A
Other languages
English (en)
Other versions
JP5411958B2 (ja
JP2013196996A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2012064918A external-priority patent/JP5411958B2/ja
Priority to JP2012064918A priority Critical patent/JP5411958B2/ja
Priority to EP13764121.3A priority patent/EP2829641B1/en
Priority to ES13764121.3T priority patent/ES2584857T3/es
Priority to US14/381,255 priority patent/US9242433B2/en
Priority to PCT/JP2013/057984 priority patent/WO2013141272A1/ja
Priority to KR1020147029107A priority patent/KR101621642B1/ko
Publication of JP2013196996A publication Critical patent/JP2013196996A/ja
Publication of JP2013196996A5 publication Critical patent/JP2013196996A5/ja
Publication of JP5411958B2 publication Critical patent/JP5411958B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (2)

  1. 中間層は、少なくともバリア層及びキャップ層を有し、前記バリア層は、ジルコニウム酸化物を含む酸化物からなり、前期キャップ層は、希土類元素酸化物又は希土類元素を含む複合酸化物からなる請求項6記載の超電導材料
  2. 超電導材層は、RE系超電導材料である請求項6又は請求項7記載の超電導材料
JP2012064918A 2012-03-22 2012-03-22 エピタキシャル膜形成用配向基板及びその製造方法 Active JP5411958B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012064918A JP5411958B2 (ja) 2012-03-22 2012-03-22 エピタキシャル膜形成用配向基板及びその製造方法
PCT/JP2013/057984 WO2013141272A1 (ja) 2012-03-22 2013-03-21 エピタキシャル膜形成用配向基板及びその製造方法
ES13764121.3T ES2584857T3 (es) 2012-03-22 2013-03-21 Sustrato de alineamiento para formar una película epitaxial y procedimiento para producir el mismo
US14/381,255 US9242433B2 (en) 2012-03-22 2013-03-21 Textured substrate for epitaxial film formation, and method for manufacturing the same
EP13764121.3A EP2829641B1 (en) 2012-03-22 2013-03-21 Alignment substrate for forming epitaxial film, and process for producing same
KR1020147029107A KR101621642B1 (ko) 2012-03-22 2013-03-21 에피택셜막 형성용 배향 기판 및 그 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012064918A JP5411958B2 (ja) 2012-03-22 2012-03-22 エピタキシャル膜形成用配向基板及びその製造方法

Publications (3)

Publication Number Publication Date
JP2013196996A JP2013196996A (ja) 2013-09-30
JP2013196996A5 true JP2013196996A5 (ja) 2013-11-14
JP5411958B2 JP5411958B2 (ja) 2014-02-12

Family

ID=49222729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012064918A Active JP5411958B2 (ja) 2012-03-22 2012-03-22 エピタキシャル膜形成用配向基板及びその製造方法

Country Status (6)

Country Link
US (1) US9242433B2 (ja)
EP (1) EP2829641B1 (ja)
JP (1) JP5411958B2 (ja)
KR (1) KR101621642B1 (ja)
ES (1) ES2584857T3 (ja)
WO (1) WO2013141272A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5763718B2 (ja) * 2013-08-01 2015-08-12 中部電力株式会社 エピタキシャル膜形成用配向基板及びその製造方法
CN106816227B (zh) * 2016-12-16 2018-08-24 上海超导科技股份有限公司 第二代高温超导带材金属韧性模板的制备方法
RU2719388C1 (ru) * 2017-05-12 2020-04-17 Фудзикура Лтд. Сверхпроводящий провод и сверхпроводящая катушка

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4398582B2 (ja) * 2000-11-15 2010-01-13 古河電気工業株式会社 酸化物超電導線材およびその製造方法
EP1271666A3 (en) * 2001-06-22 2006-01-25 Fujikura Ltd. Oxide superconductor layer and its production method
JP4568894B2 (ja) * 2003-11-28 2010-10-27 Dowaエレクトロニクス株式会社 複合導体および超電導機器システム
JP5074083B2 (ja) 2007-04-17 2012-11-14 中部電力株式会社 エピタキシャル薄膜形成用のクラッド配向金属基板及びその製造方法
JP5324763B2 (ja) * 2007-08-21 2013-10-23 中部電力株式会社 エピタキシャル膜形成用配向基板及びエピタキシャル膜形成用配向基板の表面改質方法
JP5400416B2 (ja) * 2009-02-20 2014-01-29 中部電力株式会社 超電導線材

Similar Documents

Publication Publication Date Title
USD808997S1 (en) Display device with a create new dialog box for a graphical user interface
JP2013512737A5 (ja)
JP2015532461A5 (ja)
JP2012256838A5 (ja)
EP3089229A4 (en) Metal oxide thin film, organic electroluminescence element provided with thin film, solar cell, and organic solar cell
JP2013140343A5 (ja)
JP2015024862A5 (ja)
EP2990109A4 (en) ELECTRODE AND FUEL CELL ELECTRODE CATALYST LAYER CONTAINING SAME
PL3065202T3 (pl) Organiczna/nieorganiczna kompozytowa porowata membrana oraz zawierająca ją struktura separatora i elektrody
BR302012004277S1 (pt) "configuração aplicada à cápsula"
EP3020407A4 (en) Traditional chinese medicine composition, and preparation and application thereof
JP2012030068A5 (ja)
JP2013242517A5 (ja)
JP2015005731A5 (ja) 酸化物半導体膜
EP2990105A4 (en) CATALYST AND ELECTRODE CATALYST LAYER, FILM ELECTRODE ARRANGEMENT AND FUEL CELL WITH THIS CATALYST
BR302012004271S1 (pt) "configuração aplicada à cápsula"
JP2014507659A5 (ja)
BR302012004275S1 (pt) "configuração aplicada à cápsula"
BR302012004276S1 (pt) "configuração aplicada à cápsula"
MX2016006911A (es) Composiciones de titanato de aluminio, articulos de ceramica que comprenden el mismo y metodo de fabricación de los mismos.
GB2529084B (en) Swellable packer with reinforcement and anti-extrusion features
JP2015512855A5 (ja)
JP2014520393A5 (ja)
JP2014507563A5 (ja)
EP3017136A4 (en) Composite tapes and rods having embedded sensing elements