JP2013176748A - Coating width adjustable slot die - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a slot die capable of adjusting the width of applied slurry.SOLUTION: There is provided a slot die including a first die having a storage part where slurry is stored, a second die coupled to the first die so as to cover the storage part, a fixed spacer interposed between the first die and second die and having an open part formed on one side, at least one moving spacer positioned at the opening part between the first die and second die and determining a width of discharging the slurry, and an adjusting device moving the moving spacer.

Description

  The present invention relates to a slot die with adjustable coating width.

  In many cases, a coating method is used to laminate another material layer on one material layer. For application, the material to be laminated is liquefied by a solvent or a dispersion medium so as to be in the form of a solution or a coating liquid. A die coater or the like can be used as an equipment for applying a solution or coating solution relatively thinly over a large area, and a slot die formed long on one side can be used as the die coater. Such a slot die can form a material layer on a substrate with a certain width.

  Usually, the slot die is coated with a coating liquid (hereinafter, used as a concept of a broadly meaning coating liquid including a solution) from the gap between the two ends of the slot die so that the ink comes out from the tip of the pen tip with a fountain pen, for example. Is discharged. Then, the slot die itself moves, or the base material is moved to apply the coating liquid to the upper end surface of the base material. The coating method using a slot die is superior to other coating methods from the aspect of maintenance and repair and productivity. Until now, the active material has been applied to the current collector by the panel manufacturing of the flat panel display device and the electrode of the secondary battery. Can be used to apply.

  An object of the present invention is to provide a slot die that can automatically adjust the coating width of a slurry to be applied in real time.

  A slot die according to the present invention includes a first die having a storage part in which slurry is stored, a second die coupled to the first die so as to cover the storage part, the first die, and the second die. Between the first die and the second die and at least one that determines the width of the slurry to be discharged. A moving spacer and an adjusting device for moving the moving spacer;

  The first die includes a first surface on which the opening portion is located, a second surface facing the first surface, and a third surface and a fourth surface connecting the first surface and the second surface. The slurry stored in the storage unit can be discharged through the first surface.

  In addition, the moving spacer includes a first moving spacer and a second moving spacer that is symmetrical with the first moving spacer, and the first moving spacer and the second moving spacer can be separated from each other.

  Further, the first moving spacer is formed at the center of the first guide hole made of an ellipse, the first reference hole made of a circle spaced apart from the first guide hole, and the outer periphery of the first reference hole, A first coupling part formed relatively thinner than a thickness of the first moving spacer and a first corner formed at an outer corner of the first moving spacer may be included.

  The first corner may be chamfered, and an angle formed by the first corner may be an acute angle.

  In addition, the second moving spacer is formed at the center of the second guide hole made of an ellipse, the second reference hole made of a circle spaced apart from the second guide hole, and the outer periphery of the second reference hole, A second coupling portion formed relatively thinner than a thickness of the second moving spacer, and a second corner portion formed at an outer corner portion of the second moving spacer, wherein the second coupling portion is the first coupling portion. Can be combined with one connecting part.

  In addition, a chamfer may be formed at the second corner, and an angle formed by the second corner may be an acute angle.

  The adjusting device is coupled to the moving spacer, a reference pin serving as a central axis along which the moving spacer moves, an eccentric pin coupled to the moving spacer and moving the moving spacer, and a drive for rotating the eccentric pin Parts can be included.

  In addition, the eccentric pin is formed on a main pillar penetrating the first die, a support part formed at an upper part of the main pillar, and formed larger than a diameter of the main pillar, and an upper part of the support part, An eccentric part formed smaller than the diameter of the support part can be included.

  In addition, the center of the main pillar and the support part may be the same, and the eccentric part may be formed to be eccentric from the center of the main pillar and the support part to one side.

  The moving spacer is coupled to the eccentric pin and includes an elliptical guide hole and the reference hole. The moving spacer includes a circular reference hole, and the moving spacer moves as the eccentric pin rotates. Can do.

  Further, the drive unit can rotate the eccentric pin by a gear box and a motor to which a worm gear reducer is applied.

  In addition, the adjusting device can monitor the width of the slurry coated in real time, and can automatically feedback control the moving spacer if the width of the slurry applied (measured value) is different from a set value. Alternatively, the feedback control may be performed by giving a certain range to the set value and depending on whether or not the measured value is within the range (deviation). Furthermore, the feedback control may be performed depending on whether or not the difference between the measured value and the set value is within a predetermined range (deviation).

  In addition, the adjusting device may adjust the eccentric pin according to the speed at which the slurry is coated, the moving accuracy of the moving spacer, the extent to which the coating width deviates, the time interval check, and / or the same direction count. Of course, an appropriate combination of these may be used.

  In addition, the moving spacer may be an integral type. In addition, the moving spacer is formed to be relatively thinner than the first moving spacer, the second moving spacer that is symmetrical with the first moving spacer, and the width of the first moving spacer and the second moving spacer. A deformation part may be included.

  In addition, the moving spacer may include a hole that is long in a lateral direction, and the deforming part may be formed on both sides of the hole. Further, the first moving spacer and the second moving spacer can move when the deforming portion is warped.

  A slot die according to an embodiment of the present invention includes a moving spacer interposed between a first die and a second die, and the slurry applied to the substrate is moved by moving the moving spacer inward or outward. The coating width can be adjusted automatically in real time.

  In addition, the slot die according to an embodiment of the present invention includes an eccentric pin eccentric to one side from the center, and the moving spacer can be moved inward or outward by rotating the eccentric pin.

FIG. 4 is an exploded perspective view showing a slot die according to an embodiment of the present invention. FIG. 5 is a side view showing a slot die according to an embodiment of the present invention. FIG. 2 is a plan view of the first die shown in FIG. 1. It is a top view which shows the form with which the slurry discharged from the slot die by one Example of this invention is apply | coated to a base material. It is a side view which shows the form with which the slurry discharged from the slot die by one Example of this invention is apply | coated to a base material. It is an enlarged view of A part shown by FIG. It is a top view of the movement spacer shown by FIG. It is a top view of the movement spacer shown by FIG. It is a top view which shows a movement of a movement spacer. It is a top view which shows a movement of a movement spacer. FIG. 2 is a perspective view and a plan view of an eccentric pin shown in FIG. 1. FIG. 2 is a perspective view and a plan view of an eccentric pin shown in FIG. 1. It is a top view of the movement spacer by other examples of the present invention.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily implement the present invention.

  FIG. 1 is an exploded perspective view showing a slot die according to an embodiment of the present invention. FIG. 2 is a side view showing a slot die according to an embodiment of the present invention. FIG. 3 is a plan view of the first die shown in FIG. 4a and 4b are a plan view and a side view showing a mode in which slurry discharged from a slot die according to an embodiment of the present invention is applied to a substrate. FIG. 5 is an enlarged view of a portion A shown in FIG. 6a and 6b are plan views of the moving spacer shown in FIG. 7a and 7b are plan views showing the movement of the moving spacer. 8a and 8b are a perspective view and a plan view of the eccentric pin shown in FIG.

  1 to 5, the slot die 100 according to an embodiment of the present invention includes a first die 110, a second die 120, a fixed spacer 130, a moving spacer 140, and an adjusting device 150.

  The first die 110 has a substantially hexahedral shape, and has a flat upper surface 110a and a flat lower surface 110b. The upper surface 110a of the first die 110 has a substantially rectangular shape, and a storage part 115, which is a groove for storing slurry, is formed at the center. Accordingly, the upper surface 110a of the first die 110 is formed in a rectangular belt shape along the outer peripheral edge of the storage unit 115, is formed in the length direction of the first die 110, and the first side surface 111 facing each other and The second side surface 112 includes a third side surface 113 and a fourth side surface 114 that connect the first side surface 111 and the second side surface 112 and face each other.

  The first side surface 111 (hereinafter referred to as the first surface 111) is a surface from which slurry is discharged, the second side surface 112 (hereinafter referred to as the second surface 112), and the third side surface 113 (hereinafter referred to as the second surface 112). , A third surface 113) and a fourth side surface 114 (hereinafter referred to as a fourth surface 114) are surfaces to which the fixed spacer 130 is coupled.

  Here, a moving spacer 140 is coupled to the first surface 111. As shown in FIG. 5, a coupling hole is formed in the first surface 111, and the reference pin 151 and the eccentric pin 152 of the adjusting device 150 are fitted into the coupling hole. The adjusting spacer 150 is coupled to the moving spacer 140 coupled to the moving device 140. The coupling hole may be formed with a total of three holes, one hole into which the reference pin 151 is inserted and two holes into which the eccentric pin 152 is inserted, separated from each other by a certain distance. Here, two holes are formed so that only one reference pin 151 and one eccentric pin 152 are inserted into each of the coupling holes formed at both ends of the first surface 111.

  The storage unit 115 is formed with an inlet 116 through which slurry is injected. The slurry injected through the injection port 116 is stored in the storage unit 115 and discharged to the outside through the first surface 111.

  The second die 120 is formed to face the first die 110 and is coupled to the first die 110 so as to cover the storage unit 115. The second die 120 has a flat upper surface 120a and a flat lower surface 120b, and the lower surface 120b is formed to face the upper surface 110a of the first die 110. That is, the lower surface 120b of the second die 120 and the upper surface 110a of the first die 110 face each other.

  The fixed spacer 130 is interposed between the first die 110 and the second die 120. The fixed spacer 130 is formed in a form corresponding to a form in which the second surface 112, the third surface 113, and the fourth surface 114 of the first die 110 are connected, and an open part 131 is formed on one side. That is, the fixing spacer 130 is formed in a substantially “U” shape and is fixedly coupled to the upper surface 110 a of the first die 110. The thickness of the fixed spacer 130 is related to the amount of the slurry applied. As the thickness of the fixed spacer 130 increases, the distance between the first die 110 and the second die 120 increases, and the amount of slurry discharged through the first surface 111 increases, and the thickness of the fixed spacer 130 increases. The thinner the gap, the narrower the gap between the first die 110 and the second die 120, and the smaller the amount of slurry discharged through the first surface 111. That is, the fixed spacer 130 determines the thickness at which the slurry is applied to the substrate 10.

  The moving spacer 140 is interposed between the first die 110 and the second die 120. The moving spacer 140 is formed on the first surface 111 of the first die 110 and is positioned in the opening 131 of the fixed spacer 130. A plurality of the moving spacers 140 may be formed on the first surface 111 to be spaced apart from each other. As shown in FIG. 3, the width W of the slurry applied to the substrate 10 (shown in FIG. 4 a) is determined by the separation interval of the moving spacer 140. Further, the moving spacer 140 is formed to have the same thickness as the fixed spacer 130. The slurry stored in the storage unit 115 is spouted to the separated portion between the moving spacers 140. FIG. 3 shows that the three moving spacers 140 are formed and the slurry is discharged from two places. However, the moving spacer 140 is more than three places, for example, four places, five places, It can be formed at 6 places ... n places (n is an integer) or as few as 2 places.

  Referring to FIGS. 6 a and 6 b, the moving spacer 140 includes a first moving spacer 141 and a second moving spacer 142. Here, the first moving spacer 141 and the second moving spacer 142 are separated from each other and formed symmetrically. Also, as shown in FIGS. 7a and 7b, the moving spacer 140 adjusts the width at which the slurry is discharged by narrowing the first moving spacer 141 and the second moving spacer 142 inward or widening outward. be able to.

  The first moving spacer 141 includes a first reference hole 141a, a first guide hole 141b, a first coupling part 141c, and a first corner part 141d.

  The first reference hole 141a has a circular shape, and the reference pin 151 of the adjusting device 150 is fitted into the first reference hole 141a. The first reference hole 141a is formed to have the same diameter as the reference pin 151. In order to adjust the discharge width of the slurry, when the first moving spacer 141 is moved inward or outward, it functions as a central axis.

  The first guide hole 141b has an elliptical shape, and the eccentric pin 152 of the adjusting device 150 is fitted into the first guide hole 141b. The first guide hole 141b is formed to be larger than the diameter of the eccentric pin 152, and allows the eccentric pin 152 to move smoothly.

  The first coupling part 141c is a region formed at the outer peripheral edge of the first reference hole 141a, and the first coupling part 141c is formed to be relatively thinner than the thickness of the first moving spacer 141. Here, since the first coupling part 141c is coupled to the second coupling part 142c of the second moving spacer 142, the total thickness when the first coupling part 142c is coupled is formed to be thin.

  The first corner 141d is formed on the outer periphery of the first moving spacer 141. A chamfer is formed on the first corner 141d, and an angle formed by the first corner 141d is an acute angle. In addition, when the slurry is discharged, the first corner portion 141d can prevent the slurry from moving on the moving spacer and maintain a constant width for applying the slurry. In particular, as shown in FIG. 7b, a chamfer is formed in the first corner portion 141d, so that the first moving spacer 141 and the second moving spacer 142 of the moving spacer 140 are mutually or either one of them. When one side is opened outward and the angle of the two moving spacers 141 and 142 around the central axis is increased to reduce the width of the slurry discharged, the slurry moves on the moving spacer 140. Can be prevented. Of course, as shown in FIG. 7a, the angle of the two moving spacers 141 and 142 around the central axis can be narrowed, or the space between them can be closed to widen the width of the slurry discharged. In this manner, the moving spacer 140 can maintain the same width to which the slurry is applied by forming a chamfer at the first corner 141d.

  The second moving spacer 142 includes a second reference hole 142a, a second guide hole 142b, a second coupling part 142c, and a second corner part 142d. The second moving spacer 142 is shaped like the first moving spacer 141 turned upside down, and the second moving spacer 142 and the first moving spacer 141 are bilaterally symmetric. Therefore, description of the second moving spacer 142 is omitted.

  The width at which the slurry is discharged is an interval between adjacent moving spacers 140. This will be described in more detail with reference to the three moving spacers shown in FIG. In the following description, the first (left side), the second (center), and the third (right side) are identified from the left moving spacer as viewed in FIG. The width of the slurry discharged is the width W from the first corner 141d of the first moving spacer 141 to the second corner 142d of the second moving spacer 142 among the second moving spacers. Say. Similarly, the width W from the first corner 141d of the first moving spacer 141 of the second moving spacer to the second corner 142d of the second moving spacer 142 of the third moving spacer is referred to.

  Therefore, as shown in FIG. 7a, when the first moving spacer 141 and the second moving spacer 142 are narrowed inward, the width of the slurry discharged becomes wide. Further, as shown in FIG. 7b, when the first moving spacer 141 and the second moving spacer 142 are widened outwardly, the width of the slurry discharged is narrowed.

  The adjusting device 150 is coupled to the moving spacer 140 through a coupling hole formed in the first die 110, and adjusts the moving spacer 140 inward or outward to determine a width of the slurry discharged. The adjusting device 150 includes a reference pin 151, an eccentric pin 152, and a driving unit 153.

  The reference pin 151 passes through the first die 110 and fits into the first reference hole 141 a of the first moving spacer 141 and the second reference hole 142 a of the second moving spacer 142. At this time, the first reference hole 141a and the second reference hole 142a overlap each other. The reference pin 151 is fixed to the first die 110 and serves as a central axis through which the moving spacer 140 can move.

  The eccentric pin 152 passes through the first die 110 and fits into the first guide hole 141 b of the first moving spacer 141 and the second guide hole 142 b of the second moving spacer 142. The eccentric pin 152 rotates to create the first moving spacer 141 and the second moving spacer 142 of the moving spacer 140 with the reference pin 151 as a central axis and the central axis and the two moving spacers 141 and 142. It moves to the outside so that the angle widens or to the inside so that the angle becomes narrow. Two pairs of the eccentric pins 152 may be connected to the first moving spacer 141 and the second moving spacer 142. In addition, one eccentric pin 152 may be formed on each end of the first surface 111 of the first die 110. Referring to FIGS. 8a and 8b, the eccentric pin 152 includes a main pillar 152a, a support part 152b, and an eccentric part 153c.

  The main pillar 152a is formed through the first die 110, a support part 152b and an eccentric part 152c are formed at the upper part, and a driving part 153 is coupled to the lower part. The main pillar 152a is rotated by a driving unit 153 coupled to a lower portion.

  The support 152b is formed on the main pillar 152a and is larger than the diameter of the main pillar 152a. The support portion 152b is a portion that supports and fixes the moving spacer 140.

  The eccentric part 152c is formed on an upper part of the support part 152b and is smaller than the diameter of the support part 152b. The eccentric part 152c is formed so as to be offset from the center of the support part 152b to one side. Accordingly, the center of the support part 152b and the center of the eccentric part 152c do not coincide with each other, and the center of the eccentric part 152c is eccentric to one side from the center of the support part 152, so that a distance difference D1 occurs. To do. Here, the main pillar 152a and the center of the support portion 152b coincide with each other. The eccentric portion 152c is fitted into the guide holes 141b and 142b of the moving spacer 140, and the moving spacer 140 moves inward or outward depending on the rotation radius of the eccentric portion 152c. Here, since the eccentric portion 152c is eccentric from the center of the main column 152a and the support portion 152b, the moving spacer 140 can move inward or outward even when the eccentric pin 152 rotates at its own position. . That is, the moving range of the moving spacer 140 is determined by the amount of eccentricity of the eccentric portion 152c.

  The driving unit 153 is coupled to a lower portion of the eccentric pin 152 and rotates the eccentric pin 152. The driving unit 153 is formed of a gear box and a motor to which a worm gear reducer is applied, and can rotate the eccentric pin 152. Since the driving unit 153 is driven to rotate the eccentric pin 152, the moving spacer 140 can be moved inward or outward.

  The adjusting device 150 monitors the width of the slurry coated on the substrate in real time and compares it with a set value set inside. The adjusting device 150 automatically feedback-adjusts the moving spacer 140 when the coating width of the slurry is different from a set value. A method for adjusting the moving spacer by the adjusting device will be briefly described as follows.

  First, the moving spacer 140 is set in a direction orthogonal to the first surface 111 of the first die 110. In this state, the slot die 100 discharges the slurry stored in the storage unit 115. The adjusting device 150 monitors the width of the slurry coated on the substrate 10 in real time. Further, the adjusting device 150 measures the coating width of the slurry, stores the measured value, and compares it with the value set inside. If a difference between the measured value (coating width) of the measured slurry and the set value occurs, the adjusting device 150 rotates the eccentric pin 152 so that the coating width of the slurry becomes the same as the set value. The moving spacer 140 is moved. Here, the rotational direction of the eccentric pin 152 is determined by the difference between the measured value and the set value of the coating width of the slurry. Further, the rotation range of the eccentric pin 152 is determined by the coating speed of the slurry, the moving accuracy of the moving spacer 140 and the degree of difference between the set value and the measured value. That is, if the slurry coating speed is fast or the difference between the set value and the measured value is large, the rotation range of the eccentric pin 152 becomes large. On the contrary, when the slurry coating speed is low and the difference between the set value and the measured value is small, the adjusting device 150 reduces the rotation range of the eccentric pin 152 in order to perform precise control. Further, the adjusting device 150 can check the coating width at regular time intervals and adjust the eccentric pin 152 according to the number of times the difference in the coating width occurs. Further, the direction in which the difference in the coating width is generated may be detected, and the eccentric pin 152 may be adjusted according to the direction.

  Furthermore, the set value may have a certain range, and the feedback control may be performed according to whether or not the measured value is within the range (deviation). Furthermore, the feedback control may be performed depending on whether or not the difference between the measured value and the set value is within a predetermined range (deviation).

  As described above, the slot die 100 according to the embodiment of the present invention includes the moving spacer 140 interposed between the first die 110 and the second die 120, and adjusting the moving spacer 140, The coating width of the applied slurry can be adjusted.

  In addition, the slot die 100 according to an embodiment of the present invention includes an eccentric pin 152 that is eccentric to one side from the center, so that the eccentric pin 152 rotates and the movement of the moving spacer 140 can be adjusted.

  Next, a moving spacer according to another embodiment of the present invention will be described. FIG. 9 is a plan view of a moving spacer according to another embodiment of the present invention. The moving spacer 240 shown in FIG. 9 is similar to the moving spacer 140 shown in FIGS. 6a and 6b. Only the differences will be described below.

  Referring to FIG. 9, the moving spacer 240 according to another embodiment of the present invention includes a first moving spacer 241, a second moving spacer 242 and a deforming part 243. Here, the moving spacer 240 is the same as the moving spacer 140 shown in FIGS. 6a and 6b, except that the first moving spacer 241 and the second moving spacer 242 are integrally formed without the first and second coupling portions 141c and 142c. It is a thing.

  Guide holes 241a and 242a are formed in the first moving spacer 241 and the second moving spacer 242, respectively, and the eccentric pin 152 of the adjusting device 150 is coupled thereto. In addition, a reference hole 240b is formed at the center of the lower end of the moving spacer 240, and the reference pin 151 of the adjusting device 150 is coupled. That is, the moving spacer 240 has guide holes 241a and 242a and a reference hole 240b formed at portions corresponding to the guide holes 141a and 142a and the reference holes 141b and 142b of the moving spacer 140 shown in FIGS. 6a and 6b. Yes. However, since the moving spacer 240 is integrally formed, only one reference hole 240b is formed. In addition, corners 241d and 242d are formed on the outer peripheral edges of the first moving spacer 241 and the second moving spacer 242, and chamfers are formed in the corners 241d and 242d.

  The deformable portions 243 are portions formed on both sides of the moving spacer 240 and formed relatively thinner than the widths of the first moving spacer 241 and the second moving spacer 242. In addition, the deformed portion 243 is formed with a width smaller than the width of the first moving spacer 241 and the second moving spacer 242 by a hole 243 a formed in the lateral direction in the center of the moving spacer 240.

  When the moving spacer 240 moves inward or outward, the deforming part 243 can adjust the width of the slurry discharged by bending. The eccentric pin 152 is inserted into the first guide hole 241a of the first moving spacer 241 and the second guide hole 242a of the second moving spacer 242 through the first die 110 and coupled. The eccentric pin 152 rotates to move the first moving spacer 241 and the second moving spacer 242 of the moving spacer 240 around the reference pin 151 fitted in the reference hole as a central axis and two movements. The spacers 241 and 242 are moved outward so that the angle created by the spacers 241 and 242 is widened, or moved inward so that the angle is narrowed.

  The angle of the two moving spacers 241 and 242 around the central axis is widened outwardly to reduce the width of the slurry being discharged, and the angle of the two moving spacers 241 and 242 around the central axis is set. It can be narrowed inward or closed between them to increase the width at which the slurry is expelled.

  What has been described above is merely one example for carrying out the slot die according to the present invention, and the present invention is not limited to the above-described example, and is claimed in the following claims. Any person who has ordinary knowledge in the field to which the present invention pertains can make various modifications without departing from the gist of the present invention.

100 slot die 110 first die 111 first surface 112 second surface 113 third surface 114 fourth surface 115 storage portion 116 inlet 120 second die 130 fixed spacer 140, 240 moving spacer 141, 241 first moving spacer 141a first 1st reference hole 141b 1st guide hole 141c 1st coupling part 141d 1st corner part 142, 242 2nd moving spacer 142a 2nd reference hole 142b 2nd guide hole 142c 2nd coupling part 142d 2nd corner part 243 Deformation part 150 Adjustment Device 151 Reference pin 152 Eccentric pin 152a Main pillar 152b Supporting part 152c Eccentric part 153 Drive part

Claims (18)

A first die having a reservoir in which the slurry is stored;
A second die coupled to the first die to cover the reservoir;
A fixed spacer interposed between the first die and the second die and having an open portion on one side;
At least one moving spacer located in the open portion between the first die and the second die and determining a width at which the slurry is discharged;
A slot die comprising an adjusting device for moving the moving spacer. The first die includes a first surface on which the opening portion is located, a second surface facing the first surface, a third surface and a fourth surface connecting the first surface and the second surface,
The slot die according to claim 1, wherein the slurry stored in the storage unit is discharged through the first surface. The moving spacer is
Including a first moving spacer and a second moving spacer that is symmetrical with the first moving spacer;
The slot die according to claim 1, wherein the first moving spacer and the second moving spacer are separated from each other. The first moving spacer is
A first guide hole having an elliptical shape in the center;
A first reference hole that is separated from the first guide hole and has a circular shape;
A first coupling part formed on an outer peripheral edge of the first reference hole and formed relatively thinner than a thickness of the first moving spacer;
The slot die according to claim 3, further comprising a first corner formed at an outer corner of the first moving spacer.   5. The slot die according to claim 4, wherein a chamfer is formed at the first corner, and an angle formed by the first corner is an acute angle. The second moving spacer is
A second guide hole having an elliptical shape in the center;
A second reference hole which is separated from the second guide hole and has a circular shape;
A second coupling portion formed at an outer peripheral edge of the second reference hole and formed relatively thinner than a thickness of the second moving spacer; and a second corner portion formed at an outer corner of the second moving spacer. Including
The slot die according to claim 4, wherein the second coupling part is coupled to the first coupling part.   The slot die according to claim 6, wherein a chamfer is formed at the second corner, and an angle formed by the second corner is an acute angle. The adjusting device comprises:
A reference pin coupled to the moving spacer and serving as a central axis along which the moving spacer moves;
An eccentric pin coupled to the moving spacer and moving the moving spacer;
The slot die according to claim 1, further comprising a drive unit that rotates the eccentric pin. The eccentric pin is
A main pillar penetrating the first die;
A support portion formed on an upper portion of the main pillar and formed larger than a diameter of the main pillar;
9. The slot die according to claim 8, further comprising an eccentric portion formed on an upper portion of the support portion and formed smaller than a diameter of the support portion. The center of the main pillar and the support part is the same,
The slot die according to claim 9, wherein the eccentric portion is formed to be eccentric to one side from a center of the main pillar and the support portion. The moving spacer is
A guide hole made of an ellipse, coupled to the eccentric pin;
The reference hole is combined with the reference hole, and includes a circular reference hole,
The slot die according to claim 8, wherein the moving spacer moves by rotation of the eccentric pin.   The slot die according to claim 8, wherein the drive unit rotates the eccentric pin by a gear box and a motor to which a worm gear reducer is applied.   9. The adjustment device according to claim 8, wherein the adjusting device monitors the width of the slurry coated in real time and automatically feedback-controls the moving spacer when the width of the slurry applied is different from a set value. Slot die.   The adjusting device adjusts the eccentric pin according to the speed at which the slurry is coated, the moving accuracy of the moving spacer, the degree of difference between the set value and the measured value of the coating width, the time interval check, and / or the same direction count. The slot die according to claim 8.   The slot die according to claim 1, wherein the moving spacer is integrally formed. The moving spacer is
A first moving spacer;
A second moving spacer that is symmetrical with the first moving spacer;
The slot die according to claim 15, further comprising a deformed portion formed to be relatively thinner than a width of the first moving spacer and the second moving spacer. The moving spacer includes a hole formed in a lateral direction,
The slot die according to claim 16, wherein the deformed portion is formed on both sides of the hole.   The slot die according to claim 16, wherein the deforming portion of the first moving spacer and the second moving spacer moves due to warpage.

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