JP2013169474A - Method and apparatus for removing foreign matter - Google Patents

Method and apparatus for removing foreign matter Download PDF

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JP2013169474A
JP2013169474A JP2012032667A JP2012032667A JP2013169474A JP 2013169474 A JP2013169474 A JP 2013169474A JP 2012032667 A JP2012032667 A JP 2012032667A JP 2012032667 A JP2012032667 A JP 2012032667A JP 2013169474 A JP2013169474 A JP 2013169474A
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foreign matter
hole
matter removing
chip
pedestal
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Masayuki Hamada
正幸 濱田
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for removing foreign matter that can efficiently remove foreign matter on the front face, rear face and side faces of a chip.SOLUTION: A method for removing foreign matter includes a process for placing chips on the surface of a pedestal having a plurality of through holes penetrating from a front face to a rear face, and bringing the rear faces of the chips into contact with the pedestal; and a foreign matter removing process for sucking air in the plurality of through holes from the rear face side of the pedestal while blowing air to the chips from the front face side of the chips.

Description

本発明は、チップなどの部品に付着した異物を除去する異物除去方法及び異物除去装置に関する。   The present invention relates to a foreign matter removing method and a foreign matter removing device for removing foreign matter attached to a component such as a chip.

特許文献1には、純水による洗浄後のチップの表面及び裏面に対してエアを吹きつけてチップを乾燥させる技術が開示されている。この技術は、チップの表面及び裏面に対し同時にエアを吹きつけることでチップの表裏を同時に乾燥させるものである。   Patent Document 1 discloses a technique for drying a chip by blowing air to the front and back surfaces of the chip after being cleaned with pure water. In this technique, the front and back surfaces of the chip are simultaneously dried by simultaneously blowing air to the front and back surfaces of the chip.

特開平7−176511号公報Japanese Unexamined Patent Publication No. 7-176511

特許文献1に開示されるようにチップの表面及び裏面に対し同時にエアを吹きつければ、チップの表面と裏面の異物除去に一定の効果がある。しかしながら、異物は、チップの表面や裏面だけでなくチップの側面にも付着していることがある。チップの表面及び裏面に対し同時にエアを吹きつけて異物を除去しようとすると、チップ表面に対するエアとチップ裏面に対するエアが相殺されてチップ側面の異物は除去し難い問題があった。そのため、特許文献1に開示の方法では、チップの異物を十分に除去できないことがあった。   If air is simultaneously blown to the front surface and the back surface of the chip as disclosed in Patent Document 1, there is a certain effect in removing foreign substances on the front surface and the back surface of the chip. However, foreign substances may adhere not only to the front and back surfaces of the chip but also to the side surfaces of the chip. When air is blown simultaneously on the front surface and back surface of the chip to remove the foreign matter, the air on the chip surface and the air on the back surface of the chip cancel each other, and it is difficult to remove the foreign matter on the side surface of the chip. For this reason, the method disclosed in Patent Document 1 may not sufficiently remove the foreign matter on the chip.

本発明は、上述のような課題を解決するためになされたもので、チップの表面、裏面、及び側面の異物を効率よく除去できる異物除去方法、及び異物除去装置を提供することを目的とする。   The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a foreign matter removing method and a foreign matter removing device that can efficiently remove foreign matters on the front surface, back surface, and side surfaces of a chip. .

本願の発明に係る異物除去方法は、表面から裏面まで貫通する複数の貫通孔を有する台座の該表面にチップをのせ、該チップの裏面と該台座を接触させる工程と、該チップの表面側から該チップへエアを吹き付けつつ、該複数の貫通孔の空気を該台座の該裏面側から吸引する異物除去工程と、を備えたことを特徴とする。   The foreign matter removing method according to the present invention includes a step of placing a chip on the surface of a pedestal having a plurality of through holes penetrating from the front surface to the back surface, contacting the back surface of the chip with the pedestal, and from the front surface side of the chip A foreign matter removing step of sucking air from the plurality of through holes from the back side of the pedestal while blowing air to the chip.

本願の発明に係る異物除去装置は、表面から裏面まで貫通する複数の貫通孔を有する台座と、該表面にエアを吹きつけるエア吹きつけ部と、該裏面に取り付けられ、該複数の貫通孔の空気を吸引する吸引部と、を備えたことを特徴とする。   The foreign matter removing apparatus according to the present invention includes a pedestal having a plurality of through holes penetrating from the front surface to the back surface, an air blowing portion for blowing air to the front surface, and attached to the back surface. And a suction part for sucking air.

本発明によれば、チップの外周に沿った空気の流れを生じさせるため、チップの表面、裏面、及び側面の異物を効率よく除去できる。   According to the present invention, since air flows along the outer periphery of the chip, foreign substances on the front surface, back surface, and side surfaces of the chip can be efficiently removed.

本発明の実施の形態1に係る異物除去装置の部品である台座の斜視図である。It is a perspective view of the base which is components of the foreign material removal apparatus which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る異物除去装置を示す断面図である。It is sectional drawing which shows the foreign material removal apparatus which concerns on Embodiment 1 of this invention. チップを台座にのせたことを示す断面図である。It is sectional drawing which shows having put the chip | tip on the base. チップに付着した異物を除去することを示す断面図である。It is sectional drawing which shows removing the foreign material adhering to a chip | tip. 本発明の実施の形態2に係る異物除去装置の台座を示す斜視図である。It is a perspective view which shows the base of the foreign material removal apparatus which concerns on Embodiment 2 of this invention. 本発明の実施の形態3に係る異物除去装置を示す断面図である。It is sectional drawing which shows the foreign material removal apparatus which concerns on Embodiment 3 of this invention. 異物除去工程において第1貫通孔をフィルタで塞いだことを示す断面図である。It is sectional drawing which shows having closed the 1st through-hole with the filter in the foreign material removal process. 異物除去工程において第2貫通孔をフィルタで塞いだことを示す断面図である。It is sectional drawing which shows having closed the 2nd through-hole with the filter in the foreign material removal process.

実施の形態1.
図1は、本発明の実施の形態1に係る異物除去装置の部品である台座の斜視図である。台座10は、表面12と裏面14を有している。台座10には、表面12から裏面14まで貫通する複数の貫通孔16が形成されている。台座10は、ゴム系素材で形成されている。
Embodiment 1 FIG.
FIG. 1 is a perspective view of a pedestal that is a part of a foreign matter removing apparatus according to Embodiment 1 of the present invention. The pedestal 10 has a front surface 12 and a back surface 14. A plurality of through holes 16 penetrating from the front surface 12 to the back surface 14 are formed in the base 10. The pedestal 10 is made of a rubber material.

図2は、本発明の実施の形態1に係る異物除去装置を示す断面図である。台座10の表面12側には、表面12にエアを吹きつけるエア吹きつけ部50が形成されている。エア吹きつけ部50は、台座10の表面12に対して斜めにエアを吹きつけるように配置されている。   FIG. 2 is a cross-sectional view showing the foreign matter removing apparatus according to Embodiment 1 of the present invention. On the surface 12 side of the pedestal 10, an air blowing portion 50 that blows air onto the surface 12 is formed. The air blowing portion 50 is disposed so as to blow air obliquely with respect to the surface 12 of the base 10.

台座10の裏面14には、吸引部52が取り付けられている。吸引部52は、台座10を支持しつつ複数の貫通孔16の空気を吸引するものである。吸引部52は、真空ポンプ52aにより貫通孔16の空気を吸引する。   A suction part 52 is attached to the back surface 14 of the base 10. The suction part 52 sucks air from the plurality of through holes 16 while supporting the base 10. The suction part 52 sucks the air in the through hole 16 by the vacuum pump 52a.

続いて、本発明の実施の形態1に係る異物除去装置を用いた異物除去方法を説明する。まず、チップを台座10にのせる。図3は、チップを台座にのせたことを示す断面図である。チップ60は台座10の表面12にのせる。これにより、チップ60の裏面と台座10が接触する。チップ60の表面、裏面、及び側面には異物62が付着している。   Subsequently, a foreign matter removing method using the foreign matter removing apparatus according to Embodiment 1 of the present invention will be described. First, the chip is placed on the base 10. FIG. 3 is a cross-sectional view showing that the chip is placed on the pedestal. The chip 60 is placed on the surface 12 of the base 10. Thereby, the back surface of the chip 60 and the base 10 come into contact. Foreign matter 62 adheres to the front surface, back surface, and side surface of the chip 60.

次いで、チップ60に付着した異物62を除去する異物除去工程へ処理を進める。図4は、チップに付着した異物を除去することを示す断面図である。異物除去工程では、エア吹きつけ部50によりチップ60の表面側からチップ60へエアを吹き付けつつ、吸引部52により複数の貫通孔16の空気を台座10の裏面14側から吸引する。このとき、吸引部52が貫通孔16に及ぼす吸引圧によりチップ60は台座10に真空吸着する。   Next, the process proceeds to a foreign matter removing process for removing the foreign matter 62 attached to the chip 60. FIG. 4 is a cross-sectional view showing the removal of foreign matter adhering to the chip. In the foreign matter removing step, air is blown from the front surface side of the chip 60 to the chip 60 by the air blowing portion 50, and air in the plurality of through holes 16 is sucked from the back surface 14 side of the base 10 by the suction portion 52. At this time, the chip 60 is vacuum-adsorbed to the base 10 by the suction pressure exerted on the through-hole 16 by the suction part 52.

異物除去工程では、エア吹きつけ部50と吸引部52により、図4の矢印で示す方向の空気の流れを発生させる。すなわち、エア吹きつけ部50から出された空気がチップ60の表面と側面を経由して貫通孔16へ流れる。この空気の流れによりチップ60の表面及び側面の異物を除去できる。また、チップ60の裏面の異物は貫通孔16を通じて除去できる。従って、本発明の実施の形態1に係る異物除去方法によれば、チップの表面、裏面、及び側面の異物を一括して効率よく除去できる。   In the foreign matter removing step, the air blowing part 50 and the suction part 52 generate an air flow in the direction indicated by the arrow in FIG. That is, the air discharged from the air blowing part 50 flows to the through hole 16 via the surface and side surfaces of the chip 60. Foreign matter on the surface and side surfaces of the chip 60 can be removed by this air flow. Further, foreign matters on the back surface of the chip 60 can be removed through the through holes 16. Therefore, according to the foreign matter removing method according to the first embodiment of the present invention, foreign matters on the front surface, the back surface, and the side surface of the chip can be efficiently removed collectively.

また、エア吹きつけ部50が台座10の表面12に対して斜めにエアを吹きつけることで、チップ60の側面の異物を効率的に除去できる。さらに、台座10にはゴム系素材を用いたので、チップ60の脱落を防止できる。   Further, the air blowing portion 50 blows air obliquely with respect to the surface 12 of the pedestal 10, whereby foreign matters on the side surfaces of the chip 60 can be efficiently removed. Further, since the rubber material is used for the base 10, the chip 60 can be prevented from falling off.

ところで、本発明の実施の形態1に係る異物除去装置は様々な変形が可能である。例えば、台座10はゴム系素材以外の材料で形成してもよい。また、台座10は、表面から裏面に向かう方向に通気性を有すれば図1の台座とは異なる形状でもよい。   By the way, the foreign material removing apparatus according to Embodiment 1 of the present invention can be variously modified. For example, the pedestal 10 may be formed of a material other than a rubber-based material. Further, the pedestal 10 may have a shape different from the pedestal of FIG. 1 as long as it has air permeability in the direction from the front surface to the back surface.

実施の形態2.
本発明の実施の形態2に係る異物除去装置と異物除去方法については、実施の形態1との相違点を中心に説明する。図5は、本発明の実施の形態2に係る異物除去装置の台座を示す斜視図である。台座70には、表面72から裏面74まで貫通する複数の貫通孔76が形成されている。また、台座70は平面視でハニカム構造となるように形成されている。
Embodiment 2. FIG.
The foreign matter removing apparatus and the foreign matter removing method according to the second embodiment of the present invention will be described with a focus on differences from the first embodiment. FIG. 5 is a perspective view showing a base of the foreign matter removing apparatus according to Embodiment 2 of the present invention. A plurality of through holes 76 penetrating from the front surface 72 to the back surface 74 are formed in the base 70. The pedestal 70 is formed to have a honeycomb structure in plan view.

台座70をハニカム構造とすることにより、台座70の強度を維持しつつ台座70の隔壁を薄くすることができる。台座70の隔壁を薄くすると、チップと台座70の接触面積が減りチップの裏面の大部分を貫通孔76に露出させることができる。よって、異物除去効率を高めることができる。また、チップと台座70の接触面積を減らすことにより、チップの傷を防止することもできる。   By making the base 70 have a honeycomb structure, the partition wall of the base 70 can be made thin while maintaining the strength of the base 70. When the partition wall of the pedestal 70 is thinned, the contact area between the chip and the pedestal 70 is reduced, and most of the back surface of the chip can be exposed to the through hole 76. Therefore, the foreign matter removal efficiency can be increased. Further, by reducing the contact area between the chip and the pedestal 70, the chip can be prevented from being damaged.

実施の形態3.
本発明の実施の形態3に係る異物除去装置と異物除去方法については、実施の形態1との相違点を中心に説明する。図6は、本発明の実施の形態3に係る異物除去装置を示す断面図である。異物除去装置100は、複数の貫通孔16のうちの第1貫通孔16aにおける吸引圧と、第1貫通孔16aに隣接する第2貫通孔16bにおける吸引圧との大小関係を変化させ続けるための吸引圧調整部102を備えている。吸引圧調整部102は、フィルタ102aとフィルタ移動部102bを有している。
Embodiment 3 FIG.
The foreign matter removing apparatus and the foreign matter removing method according to the third embodiment of the present invention will be described focusing on differences from the first embodiment. FIG. 6 is a cross-sectional view showing a foreign matter removing apparatus according to Embodiment 3 of the present invention. The foreign matter removing apparatus 100 is for continuously changing the magnitude relationship between the suction pressure in the first through hole 16a of the plurality of through holes 16 and the suction pressure in the second through hole 16b adjacent to the first through hole 16a. A suction pressure adjusting unit 102 is provided. The suction pressure adjusting unit 102 includes a filter 102a and a filter moving unit 102b.

フィルタ102aは、複数の貫通孔16の各貫通孔を1つおきに塞ぐように形成されている。フィルタ102aは、吸引部52による空気の吸引圧を低減するものである。よってフィルタ102aで塞がれた貫通孔における吸引圧は、フィルタ102aに塞がれていない貫通孔における吸引圧より小さくなる。   The filter 102a is formed so as to block every other through hole of the plurality of through holes 16. The filter 102a reduces the suction pressure of air by the suction part 52. Therefore, the suction pressure in the through hole blocked by the filter 102a is smaller than the suction pressure in the through hole not blocked by the filter 102a.

フィルタ移動部102bは、フィルタ102aを台座10に対してスライドさせるものである。フィルタ移動部102bは、第1貫通孔16aの吸気経路と第2貫通孔16bの吸気経路を交互に塞ぐようにフィルタ102aを移動させるものである。すなわち、フィルタ移動部102bは、所定の周期で図6の左右方向に移動可能に構成されている。   The filter moving part 102b slides the filter 102a with respect to the base 10. The filter moving part 102b moves the filter 102a so as to alternately block the intake path of the first through hole 16a and the intake path of the second through hole 16b. That is, the filter moving unit 102b is configured to be movable in the left-right direction in FIG. 6 at a predetermined cycle.

続いて、異物除去装置100を用いた異物除去方法を説明する。図7は、異物除去工程において第1貫通孔をフィルタで塞いだことを示す断面図である。第1貫通孔16aをフィルタ102aで塞ぐと、第1貫通孔16aにおける吸引圧は第2貫通孔16bにおける吸引圧より小さくなる。この状態を第1状態と称する。   Subsequently, a foreign matter removing method using the foreign matter removing apparatus 100 will be described. FIG. 7 is a cross-sectional view showing that the first through hole is blocked with a filter in the foreign matter removing step. When the first through hole 16a is closed with the filter 102a, the suction pressure in the first through hole 16a is smaller than the suction pressure in the second through hole 16b. This state is referred to as a first state.

次いで、フィルタ移動部102bでフィルタ102aを移動させて第2貫通孔16bをフィルタ102aで塞ぐ。図8は、異物除去工程において第2貫通孔をフィルタで塞いだことを示す断面図である。第2貫通孔16bをフィルタ102aで塞ぐと、第2貫通孔16bにおける吸引圧は第1貫通孔16aにおける吸引圧より小さくなる。この状態を第2状態と称する。   Next, the filter 102a is moved by the filter moving part 102b, and the second through hole 16b is closed by the filter 102a. FIG. 8 is a cross-sectional view showing that the second through hole is blocked with a filter in the foreign matter removing step. When the second through hole 16b is closed with the filter 102a, the suction pressure in the second through hole 16b is smaller than the suction pressure in the first through hole 16a. This state is referred to as a second state.

本発明の実施の形態3に係る異物除去工程では、第1状態と第2状態を交互に繰り返す。そうすると、第1貫通孔16aにおける吸引圧と、第2貫通孔16bにおける吸引圧との大小関係が変化し続けて、チップ60が振動する。この振動によりチップ60の異物除去効率を高めることができる。チップ60を振動させることにより、特にチップ60の裏面に付着した異物の除去を促進できる。そして、フィルタ移動部102bの動きを制御することでチップ60の振動を任意に変化させることができる。   In the foreign substance removal step according to Embodiment 3 of the present invention, the first state and the second state are alternately repeated. Then, the magnitude relationship between the suction pressure in the first through hole 16a and the suction pressure in the second through hole 16b continues to change, and the chip 60 vibrates. This vibration can increase the foreign matter removal efficiency of the chip 60. By vibrating the chip 60, it is possible to promote the removal of foreign matters adhering particularly to the back surface of the chip 60. And the vibration of the chip | tip 60 can be changed arbitrarily by controlling the motion of the filter moving part 102b.

このように本発明の実施の形態3に係る異物除去工程では、実施の形態1で示したようにチップ60の周りに空気の流れを発生させつつチップ60に振動を与えるためチップ60に付着した異物を効率的に除去できる。本発明の実施の形態3に係る異物除去方法は、この特徴を失わない限りにおいて様々な変形が可能である。例えば、吸引圧調整部102は、貫通孔における吸引圧を時間変化させるものであればよく、上述の構成に限定されない。また、実施の形態2、3に係る異物除去方法、及び異物除去装置は、少なくとも実施の形態1と同程度の変形が可能である。なお、各実施の形態に係る異物除去方法、及び異物除去装置の特徴を適宜組み合わせてもよい。   As described above, in the foreign matter removing process according to the third embodiment of the present invention, as shown in the first embodiment, the air flow is generated around the chip 60 and attached to the chip 60 to give vibration to the chip 60. Foreign matter can be removed efficiently. The foreign matter removing method according to Embodiment 3 of the present invention can be variously modified as long as this feature is not lost. For example, the suction pressure adjusting unit 102 only needs to change the suction pressure in the through hole with time, and is not limited to the above-described configuration. Further, the foreign substance removal method and the foreign substance removal apparatus according to the second and third embodiments can be modified at least as much as the first embodiment. In addition, you may combine suitably the characteristic of the foreign material removal method and foreign material removal apparatus which concern on each embodiment.

10 台座、 12 表面、 14 裏面、 16 貫通孔、 16a 第1貫通孔、 16b 第2貫通孔、 50 エア吹き付け部、 52 吸引部、 52a 真空ポンプ、 60 チップ、 62 異物、 70 台座、 72 表面、 74 裏面、 76 貫通孔、 100 異物除去装置、 102 吸引圧調整部、 102a フィルタ、 102b フィルタ移動部   10 pedestal, 12 surface, 14 back surface, 16 through hole, 16a first through hole, 16b second through hole, 50 air blowing part, 52 suction part, 52a vacuum pump, 60 chip, 62 foreign material, 70 pedestal, 72 surface, 74 back surface, 76 through-hole, 100 foreign matter removing device, 102 suction pressure adjusting unit, 102a filter, 102b filter moving unit

Claims (8)

表面から裏面まで貫通する複数の貫通孔を有する台座の前記表面にチップをのせ、前記チップの裏面と前記台座を接触させる工程と、
前記チップの表面側から前記チップへエアを吹き付けつつ、前記複数の貫通孔の空気を前記台座の前記裏面側から吸引する異物除去工程と、を備えたことを特徴とする異物除去方法。
Placing the chip on the surface of the pedestal having a plurality of through holes penetrating from the front surface to the back surface, and contacting the back surface of the chip and the pedestal;
A foreign matter removing method comprising: a foreign matter removing step of sucking air from the plurality of through holes from the back side of the pedestal while blowing air from the front side of the tip to the tip.
前記異物除去工程では、
前記複数の貫通孔のうちの第1貫通孔における吸引圧と、前記第1貫通孔に隣接する第2貫通孔における吸引圧との大小関係を変化させ続けて、前記チップを振動させることを特徴とする請求項1に記載の異物除去方法。
In the foreign matter removing step,
The chip is vibrated by continuously changing the magnitude relationship between the suction pressure in the first through hole of the plurality of through holes and the suction pressure in the second through hole adjacent to the first through hole. The foreign matter removing method according to claim 1.
表面から裏面まで貫通する複数の貫通孔を有する台座と、
前記表面にエアを吹きつけるエア吹きつけ部と、
前記裏面に取り付けられ、前記複数の貫通孔の空気を吸引する吸引部と、を備えたことを特徴とする異物除去装置。
A pedestal having a plurality of through holes penetrating from the front surface to the back surface;
An air blowing section for blowing air onto the surface;
A foreign matter removing apparatus comprising: a suction portion attached to the back surface and sucking air from the plurality of through holes.
前記台座は、ゴム系素材で形成されたことを特徴とする請求項3に記載の異物除去装置。   The foreign matter removing apparatus according to claim 3, wherein the pedestal is formed of a rubber-based material. 前記エア吹きつけ部は、前記台座の前記表面に対して斜めにエアを吹きつけることを特徴とする請求項3又は4に記載の異物除去装置。   The foreign matter removing apparatus according to claim 3, wherein the air blowing unit blows air obliquely with respect to the surface of the pedestal. 前記台座は平面視でハニカム構造となるように形成されたことを特徴とする請求項3乃至5のいずれか1項に記載の異物除去装置。   6. The foreign matter removing apparatus according to claim 3, wherein the pedestal is formed to have a honeycomb structure in a plan view. 前記複数の貫通孔のうちの第1貫通孔における吸引圧と、前記第1貫通孔に隣接する第2貫通孔における吸引圧との大小関係を変化させ続ける吸引圧調整部を備えたことを特徴とする請求項3乃至6のいずれか1項に記載の異物除去装置。   A suction pressure adjusting unit that continuously changes a magnitude relationship between a suction pressure in a first through hole of the plurality of through holes and a suction pressure in a second through hole adjacent to the first through hole is provided. The foreign matter removing apparatus according to any one of claims 3 to 6. 前記吸引圧調整部は、
前記第1貫通孔又は前記第2貫通孔の吸気経路を塞ぎ吸引圧を低下させるフィルタと、
前記第1貫通孔の吸気経路と前記第2貫通孔の吸気経路を交互に塞ぐように前記フィルタを移動させるフィルタ移動部と、を備えたことを特徴とする請求項7に記載の異物除去装置。
The suction pressure adjusting unit is
A filter that closes the intake path of the first through hole or the second through hole and reduces the suction pressure;
The foreign matter removing apparatus according to claim 7, further comprising: a filter moving unit that moves the filter so as to alternately block the intake path of the first through hole and the intake path of the second through hole. .
JP2012032667A 2012-02-17 2012-02-17 Method and apparatus for removing foreign matter Pending JP2013169474A (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120268A (en) * 1974-03-06 1975-09-20
JPS61172337A (en) * 1985-01-26 1986-08-04 Nec Kansai Ltd Removing process of foreign matters
JPS61204941A (en) * 1985-03-08 1986-09-11 Hitachi Ltd Conveying tray for washing apparatus
JPH02103933A (en) * 1988-10-13 1990-04-17 Supiide Fuamu Clean Syst Kk Method of drying work by air and device therefor
JPH02114637A (en) * 1988-10-25 1990-04-26 Matsushita Electric Works Ltd Removal of foreign substance on surface of semiconductor chip
JP2004006855A (en) * 2002-04-30 2004-01-08 Asm Assembly Automation Ltd Ultrasonic cleaning module
JP2007029945A (en) * 2005-06-22 2007-02-08 Ricoh Co Ltd Dry cleaning device and dry cleaning method
JP2007317700A (en) * 2006-05-23 2007-12-06 Sekisui Chem Co Ltd Surface-treating apparatus and surface treatment method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50120268A (en) * 1974-03-06 1975-09-20
JPS61172337A (en) * 1985-01-26 1986-08-04 Nec Kansai Ltd Removing process of foreign matters
JPS61204941A (en) * 1985-03-08 1986-09-11 Hitachi Ltd Conveying tray for washing apparatus
JPH02103933A (en) * 1988-10-13 1990-04-17 Supiide Fuamu Clean Syst Kk Method of drying work by air and device therefor
JPH02114637A (en) * 1988-10-25 1990-04-26 Matsushita Electric Works Ltd Removal of foreign substance on surface of semiconductor chip
JP2004006855A (en) * 2002-04-30 2004-01-08 Asm Assembly Automation Ltd Ultrasonic cleaning module
JP2007029945A (en) * 2005-06-22 2007-02-08 Ricoh Co Ltd Dry cleaning device and dry cleaning method
JP2007317700A (en) * 2006-05-23 2007-12-06 Sekisui Chem Co Ltd Surface-treating apparatus and surface treatment method

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