JP2013151729A - Zinc-nickel alloy plating liquid and nickel supplying method - Google Patents
Zinc-nickel alloy plating liquid and nickel supplying method Download PDFInfo
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- 238000007747 plating Methods 0.000 title claims abstract description 55
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 229910000990 Ni alloy Inorganic materials 0.000 title claims abstract description 22
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 22
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims description 16
- 239000007788 liquid Substances 0.000 title abstract 3
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 150000003839 salts Chemical class 0.000 claims abstract description 10
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- 229960003512 nicotinic acid Drugs 0.000 claims abstract description 9
- 235000001968 nicotinic acid Nutrition 0.000 claims abstract description 9
- 239000011664 nicotinic acid Substances 0.000 claims abstract description 9
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 8
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 7
- 150000008282 halocarbons Chemical class 0.000 claims abstract description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims abstract description 7
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims abstract description 7
- -1 halogen ethers Chemical class 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 4
- 238000007726 management method Methods 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 abstract description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- 239000008139 complexing agent Substances 0.000 description 19
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 18
- 150000001412 amines Chemical class 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 6
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 4
- 239000011975 tartaric acid Substances 0.000 description 4
- 235000002906 tartaric acid Nutrition 0.000 description 4
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 239000000174 gluconic acid Substances 0.000 description 3
- 235000012208 gluconic acid Nutrition 0.000 description 3
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- ZAXCZCOUDLENMH-UHFFFAOYSA-N 3,3,3-tetramine Chemical compound NCCCNCCCNCCCN ZAXCZCOUDLENMH-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000003287 bathing Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
本発明は亜鉛−ニッケル合金めっきに関し、低電部の外観、電流効率、加熱密着性、ランニング性を飛躍的に向上させるニッケル供給剤、光沢剤並びにニッケル供給方法を提供する。 The present invention relates to zinc-nickel alloy plating, and provides a nickel supply agent, a brightening agent, and a nickel supply method that drastically improve the appearance, current efficiency, heating adhesion, and running property of a low electric part.
亜鉛めっきの耐食性を向上する目的で亜鉛合金めっきが広く行われている。その中でも亜鉛−ニッケル合金めっきは自動車部品、特に高温環境下に置かれるエンジン部品や、高い耐食性が要求される部品等に広範囲に使用されている。従来の亜鉛−ニッケル合金めっきは特開昭６３−５３２８５に開示されているようにポリアルケンポリアミン類、アルカノールアミン類といったアミン系の錯化剤で可溶化したニッケルを含有するする電気亜鉛めっき浴で電解めっきを行うことにより亜鉛めっき皮膜中にニッケルを析出させる方法により行われる。錯化剤についてはその後、目的に応じて様々な種類のものが開発されてきた。例えば、特開平０６−１７３０７３、特開２００７−００２２７４には錯化剤としてアミン化合物とエピハロヒドリン等エポキシ基含有化合物の反応生成物を用いるアルカリ性電気亜鉛めっき浴による亜鉛ニッケル合金めっき方法が開示されている。この方法はアミン化合物とグリシジルエーテル類を混合させることにより錯化剤となる反応生成物を得る方法であり、この反応生成物は亜鉛ニッケル合金めっきの錯化剤として現在最も広く用いられている。 Zinc alloy plating is widely performed for the purpose of improving the corrosion resistance of galvanization. Among them, zinc-nickel alloy plating is widely used for automobile parts, particularly engine parts placed in a high temperature environment, parts requiring high corrosion resistance, and the like. Conventional zinc-nickel alloy plating is an electrogalvanizing bath containing nickel solubilized with an amine-based complexing agent such as polyalkene polyamines and alkanolamines as disclosed in JP-A-63-53285. It is performed by a method in which nickel is deposited in the galvanized film by performing electrolytic plating. Various types of complexing agents have since been developed depending on the purpose. For example, JP 06-173073 and JP 2007-002274 disclose a zinc nickel alloy plating method using an alkaline electrogalvanizing bath using a reaction product of an amine compound and an epoxy group-containing compound such as epihalohydrin as a complexing agent. . This method is a method of obtaining a reaction product as a complexing agent by mixing an amine compound and glycidyl ethers, and this reaction product is currently most widely used as a complexing agent for zinc-nickel alloy plating.
また、アミン以外の錯化剤としてクエン酸、酒石酸、グルコン酸、グリコール酸のようなヒドロキシカルボン酸又はその塩が用いられることがある。これらは多量の添加でなければめっきに影響を及ぼさないため、例えばアミン系の錯化剤を使用してニッケルを補給すると錯化剤過剰となってしまう場合にニッケルの錯化剤として用いられるという用途もある。しかし、近年は亜鉛ニッケル合金めっきに用いること自体、ほとんどなくなっている。 In addition, hydroxycarboxylic acids such as citric acid, tartaric acid, gluconic acid, and glycolic acid or salts thereof may be used as a complexing agent other than amine. Since these do not affect plating unless they are added in large amounts, for example, when nickel is replenished using an amine-based complexing agent, it is used as a complexing agent for nickel. There are also uses. In recent years, however, the use of zinc-nickel alloy plating has almost disappeared.
亜鉛−ニッケル合金めっきは低電部や高電部の外観のコントロールが難しく、安定的に良好な外観を得る事が難しかった。 In the zinc-nickel alloy plating, it is difficult to control the appearance of the low electric part and the high electric part, and it is difficult to stably obtain a good appearance.
本発明者は上記の課題を解決するために研究開発を重ねていたが、亜鉛−ニッケル合金めっきで補給時のニッケル供給源を硫酸ニッケル以外にする場合においてはニコチン酸とハロゲン化炭化水素、アルキレンオキシド、エピハロヒドリン及びハロゲン化エーテルからなる群から選ばれる少なくとも１種の化合物との水溶性反応性組成物及びヒドロキシカルボン酸又はその塩が安定的に良好な外観を得るために有効であることを見出した。
すなわち、本発明は、下記のアルカリ性亜鉛ニッケル合金めっきのためのめっき液、
（１）ヒドロキシカルボン酸若しくはその塩、及び（ａ）ニコチン酸と（ｂ）ハロゲン化炭化水素、アルキレンオキシド、エピハロヒドリン及びハロゲンエーテルからなる群から選ばれる少なくとも１種との化合物の水溶性反応性生成物を含有し、ニッケル源に硫酸ニッケルを使用しないことを特徴とするアルカリ性亜鉛ニッケル合金めっき液、
（２）硫酸根を含まないアルカリ性亜鉛ニッケル合金めっき用ニッケル補給剤と併用してめっき外観を向上させる、前記（１）のめっき液、
（３）ヒドロキシカルボン酸若しくはその塩、又は（ａ）ニコチン酸と（ｂ）ハロゲン化炭化水素、アルキレンオキシド、エピハロヒドリン及びハロゲンエーテルからなる群から選ばれる少なくとも１種の化合物との水溶性反応性生成物を定期的に補給し、硫酸根を補給しないことを特徴とするアルカリ性亜鉛ニッケル合金めっき液の管理方法、
（４）前記（３）の管理方法により管理されるめっき液を用いるめっき方法、
（５）前記（４）のめっき方法によりめっきされためっき品、
をそれぞれ提供する。
The present inventor has been researching and developing in order to solve the above-mentioned problems. However, in the case where the nickel supply source other than nickel sulfate is replenished with zinc-nickel alloy plating, nicotinic acid, halogenated hydrocarbon, alkylene It has been found that a water-soluble reactive composition with at least one compound selected from the group consisting of oxides, epihalohydrins and halogenated ethers and hydroxycarboxylic acids or salts thereof are effective for obtaining a stable and good appearance. It was.
That is, the present invention provides a plating solution for the following alkaline zinc-nickel alloy plating,
(1) Hydroxycarboxylic acid or a salt thereof, and (a) nicotinic acid and (b) at least one compound selected from the group consisting of halogenated hydrocarbons, alkylene oxides, epihalohydrins and halogen ethers. An alkaline zinc-nickel alloy plating solution characterized by not containing nickel sulfate as a nickel source,
(2) The plating solution according to (1), wherein the plating solution is used in combination with an alkaline zinc-nickel alloy plating nickel replenisher that does not contain sulfate radicals,
(3) Hydroxycarboxylic acid or a salt thereof, or (a) Nicotinic acid and (b) at least one compound selected from the group consisting of halogenated hydrocarbons, alkylene oxides, epihalohydrins, and halogen ethers. A method for managing an alkaline zinc-nickel alloy plating solution, characterized by periodically replenishing materials and not replenishing sulfate radicals,
(4) a plating method using a plating solution managed by the management method of (3),
(5) A plated product plated by the plating method of (4),
Provide each.
以下、本発明の亜鉛−ニッケル合金めっきに関し、詳細に説明する。錯化剤成分についてアミン系の錯化剤が用いられるほか、ヒドロキシカルボン酸又はその塩を錯化剤として用いることも可能である。特にアミンとエポキシ基且つ／又はハロゲンを１分子内に含む有機化合物を反応させて合成されるものが好適である。用いるアミンとしては特に限定はないがポリアルキレンポリアミンが好適であり、特にエチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、トリプロピレンテトラミンが好適である。これとエポキシ基且つ／又はハロゲンを１分子中に含む有機化合物を反応させる。エポキシ基含有化合物としてはグリシジルエーテル類、エポキシ基とハロゲン化合物の両方を含むものとしてエピハロヒドリン類、ハロゲンを含む有機化合物としてハロゲン化アルコール、ハロゲン化エーテルが好適だがこれに限定されない。補給用のニッケル化合物に関しては硫酸根を含有しなければ特に限定はない。酢酸ニッケル、スルファミン酸ニッケルなどは意図しない反応のおそれがあるため塩化ニッケル、炭酸ニッケル、水酸化ニッケルが好適であり、特開平１−３１６４９９の記載より水酸化物イオン以外の含有量を低減させる観点から水酸化ニッケルが最も好適である。電導塩はアルカリ金属イオンと水酸化物イオンの塩であれば特に限定は無いが一般的には苛性ソーダが用いられる。めっき浴の光沢剤は既存の亜鉛−ニッケル合金めっきに用いられるものが全て使用可能であり特に限定は存在しないが、本発明ではニコチン酸とハロゲン化炭化水素、アルキレンオキシド、エピハロヒドリン及びハロゲン化エーテルからなる群から選ばれる少なくとも１種の化合物との水溶性反応性組成物をめっき液に含む必要がある。これは特開２００１−２１４２９４、特開２０１１−８４８２１に示されるようにアルカリ性亜鉛系めっき一般において浴安定性を高める効果がある光沢剤であることについては知られていた。しかし、これを本願の、補給時において硫酸根を含有しないアルカリ性亜鉛ニッケル合金めっきに使用した場合には高電流部と低電流部の外観が向上する効果をも得る事ができる。濃度については、特に限定はないが０．０１〜１０ｍｍｏｌ／Ｌの範囲が好ましい。また、ヒドロキシカルボン酸についてはクエン酸、酒石酸、グルコン酸、グリコール酸などが挙げられるが種類について特に限定は存在しない。低濃度でもその効果が確認できるが高濃度だとアミン系錯化剤の効果に影響を及ぼしめっきの性質が大きく変化するおそれが強くなるため、５ｇ／Ｌ以下が好適であり、より好ましくは１ｇ／Ｌ以下、さら好ましくは０．１ｇ／Ｌ以下である。添加方法は、直接めっき液に添加するほかに錯化剤に添加する方法、光沢剤に添加する方法、ニッケルを錯化させたニッケル供給剤に添加しニッケル補給と同時に添加する方法などがあるが特に限定はない。 Hereinafter, the zinc-nickel alloy plating of the present invention will be described in detail. As the complexing agent component, an amine-based complexing agent may be used, and hydroxycarboxylic acid or a salt thereof may be used as the complexing agent. In particular, those synthesized by reacting an amine with an organic compound containing an epoxy group and / or halogen in one molecule are preferable. The amine to be used is not particularly limited, but a polyalkylene polyamine is preferable, and ethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, and tripropylenetetramine are particularly preferable. This is reacted with an organic compound containing an epoxy group and / or halogen in one molecule. Suitable epoxy group-containing compounds include glycidyl ethers, epihalohydrins containing both epoxy groups and halogen compounds, and halogenated alcohols and halogenated ethers as halogen-containing organic compounds, but are not limited thereto. The nickel compound for replenishment is not particularly limited as long as it does not contain a sulfate group. Nickel acetate, nickel sulfamate, and the like are preferably used because nickel chloride, nickel carbonate, and nickel hydroxide are preferred because there is a risk of an unintended reaction. From the viewpoint of JP-A-1-316499, the viewpoint of reducing the content other than hydroxide ions. To nickel hydroxide is most preferred. The conductive salt is not particularly limited as long as it is a salt of an alkali metal ion and a hydroxide ion, but generally caustic soda is used. As the brightener for the plating bath, any one used for existing zinc-nickel alloy plating can be used, and there is no particular limitation. In the present invention, however, nicotinic acid and halogenated hydrocarbon, alkylene oxide, epihalohydrin and halogenated ether are used. It is necessary to include in the plating solution a water-soluble reactive composition with at least one compound selected from the group consisting of: It has been known that this is a brightener having an effect of enhancing bath stability in alkaline zinc plating in general as disclosed in JP-A Nos. 2001-214294 and 2011-84821. However, when this is used for alkaline zinc-nickel alloy plating that does not contain sulfate radicals at the time of replenishment of the present application, the effect of improving the appearance of the high current portion and the low current portion can also be obtained. Although there is no limitation in particular about a density | concentration, the range of 0.01-10 mmol / L is preferable. Examples of the hydroxycarboxylic acid include citric acid, tartaric acid, gluconic acid, and glycolic acid, but there is no particular limitation on the type. The effect can be confirmed even at a low concentration, but if it is a high concentration, the effect of the amine complexing agent will be affected, and the possibility that the properties of the plating will be greatly changed is strong, so 5 g / L or less is preferred, more preferably 1 g. / L or less, more preferably 0.1 g / L or less. Addition methods include direct addition to plating solution, addition to complexing agent, addition to brightener, addition to nickel complexed nickel supply and addition at the same time as nickel replenishment. There is no particular limitation.
めっきの対象部材は鉄素材のものが用いられる。最適な実施形態であるニッケル源に水酸化ニッケルのみを使用する場合、すなわち硫酸イオンフリーかつ錯化剤由来以外の塩化物イオンフリーの場合、建浴時のめっき浴組成は下表１の通りである。
亜鉛イオン濃度については高すぎると必要な光沢剤量が多くなってしまい、非経済的である。さらに皮膜の均一性が低下し、複雑な形状の部材においては低電流部へのツキマワリが弱くなってしまう。低すぎるとめっき速度が低下する。ニッケルイオン濃度については高すぎても低すぎても皮膜中のニッケル共析率が適切な値にならず、めっき皮膜の外観並びに化成皮膜処理後の外観が悪化する上、必要な耐食性が得られない。特に赤錆発生が早くなる傾向がある。水酸化物イオン濃度が高すぎると光沢剤分子を破壊し、必要な光沢剤量が多くなってしまうことが知られており、非経済的である。低すぎると皮膜の均一性、めっきのつきまわりが悪化する。錯化剤濃度が高すぎると電流効率が低下するほか、補給量も多くなってしまい、排水処理の手間も増大し非経済的である。低すぎると皮膜の均一性が悪化し、めっき皮膜の外観はもとより、化成皮膜処理後の外観も悪化する。 If the zinc ion concentration is too high, the required amount of brightener increases, which is uneconomical. Furthermore, the uniformity of the film is lowered, and in a member having a complicated shape, the tension to the low current portion is weakened. If it is too low, the plating rate will decrease. If the nickel ion concentration is too high or too low, the nickel eutectoid rate in the film will not be an appropriate value, the appearance of the plating film and the appearance after the chemical conversion film will deteriorate, and the necessary corrosion resistance will be obtained. Absent. In particular, red rust tends to occur more quickly. It is known that if the hydroxide ion concentration is too high, the brightener molecules are destroyed and the required amount of brightener increases, which is uneconomical. If it is too low, the uniformity of the film and the plating coverage will deteriorate. If the concentration of the complexing agent is too high, the current efficiency is reduced and the amount of replenishment is increased, which increases the labor for wastewater treatment and is uneconomical. If it is too low, the uniformity of the film deteriorates, and not only the appearance of the plating film but also the appearance after the chemical conversion film treatment is deteriorated.
最適なめっき条件は錯化剤の種類や濃度、または使用する光沢剤の種類や濃度により異なるが、通常、電流密度が静止めっきで電流密度１〜６Ａ／ｄｍ2、バレルめっきで０．５〜１．５Ａ／ｄｍ2、めっき温度が１５〜５０℃の範囲で行われる。 Optimum plating conditions vary depending on the type and concentration of the complexing agent or the type and concentration of the brightener used. Usually, the current density is 1 to 6 A / dm 2 for static plating and 0.5 to 0.5 for barrel plating. 1.5 A / dm 2 , and the plating temperature is 15 to 50 ° C.
以下、実施例及び比較例により本発明を説明する。以下に示す各実施例の条件に従い０．２Ａ−２０分及び２Ａ−２０分、めっき浴温２５℃でハルセル試験を行った。以下の実施例では特に断りのない場合、陽極にはニッケル板を用い、錯化剤はトリエチレンテトラミンとエピクロルヒドリンの反応物を用いた。光沢剤としてニコチン酸とエピクロルヒドリンを反応させた水溶性組成物（Ａ）、イミダゾールとエピクロルヒドリンを反応させた水溶性組成物（Ｂ）を適量、用いた。外観は、低電部の灰色化と高電部のもや、及び全体の総合評価を行った。 Hereinafter, the present invention will be described with reference to examples and comparative examples. The hull cell test was conducted at 0.2A-20 minutes and 2A-20 minutes at a plating bath temperature of 25 ° C. in accordance with the conditions of the following examples. In the following examples, unless otherwise specified, a nickel plate was used as the anode, and a reaction product of triethylenetetramine and epichlorohydrin was used as the complexing agent. An appropriate amount of a water-soluble composition (A) obtained by reacting nicotinic acid and epichlorohydrin and a water-soluble composition (B) obtained by reacting imidazole and epichlorohydrin were used as brighteners. As for the appearance, the gray of the low electric part, the haze of the high electric part, and the overall evaluation were performed.
本発明の硫酸フリーニッケル補給法及び既存の硫酸ニッケルを用いる補給法についてランニング試験を行った。建浴時は全て硫酸フリーの亜鉛ニッケル合金めっき液を用いた。そして、酒石酸の有無によるめっき状態の変化を観察した。ランニング中もクエン酸の補給を行い、一定濃度を保つように調整した。ランニング試験中のニッケル濃度をニッケル共析率が建浴直後のプラスマイナス２％の範囲内に保たれるように適宜調整した。また、光沢剤についても適宜補給した。光沢剤（Ａ）の濃度はニコチン酸及びニコチン酸誘導体の、光沢剤（Ｂ）はイミダゾール及びイミダゾール誘導体の濃度である。実施例および比較例の組成は表２の通りである。
・ランニング条件
・ Running conditions
・ランニング後評価
１５０ＡＨ／Ｌ電解後の実施例及び比較例についてハルセル試験を行い、光沢を評価した。評価ポイントは(1)０．２Ａ−２０分ハルセル試験における低電流部の灰色化(2)２Ａ−２０分ハルセル試験における高電流部のコゲ、モヤを見た。評価は(1)は灰色化が無いのが、(2)はコゲ、モヤがないのが高評価として５〜１の５段階評価（５が良くて１が劣る）において行った。また、ランニング前についてハルセル試験を行ったところ、全ての実施例及び比較例において(1)、(2)ともに５の評価となった。
この結果より、Ｎｉ補給剤に硫酸ニッケルを用いた場合には光沢剤（Ａ）またはクエン酸を加えても高電流部や低電流部のめっき状態に対して効果がないが、硫酸ニッケル以外を用いた場合は光沢剤（Ａ）、クエン酸ともに効果があり、併用した場合、更に効果が増大することが分かる。光沢剤（Ｂ）は比較例２のようにあまり効果がない。 From this result, when nickel sulfate is used as the Ni replenisher, adding brightener (A) or citric acid has no effect on the plating state of the high current part and low current part. When used, both the brightener (A) and citric acid are effective, and when used in combination, the effect is further increased. The brightener (B) is not very effective as in Comparative Example 2.
実施例１〜９では錯化剤としてトリエチレンテトラミンとエピクロルヒドリンの反応物を用いたが、トリエチレンテトラミンの代わりにエチレンジアミン、ジエチレントリアミン、テトラエチレンペンタミン、トリプロピレンテトラミンを用いて、実施例１〜９と同様に錯化剤を合成した。実施例８と同様の条件でランニング試験を実施したところ、以下の結果となった。
光沢剤（Ａ）を合成するのに、これまでの実施例ではエピクロルヒドリンを用いていたが、その代わりにｎ−エチルブロマイド、ジクロルエチルエーテルを用いた場合について実施例８と同様の条件でランニング試験を実施したところ、以下の結果となった。
有機酸について、クエン酸の代わりに酒石酸、グルコン酸、グリコール酸を用いて実施例８と同様の条件でランニング試験を実施したところ、以下の結果となった。
建浴時のめっき液に硫酸根を２、５、１０ｇ／Ｌ添加して実施例１〜１８、比較例１〜５の補給方法を実施したが５ｇ／Ｌ以下では１５０ＡＨ／Ｌランニング後の試験結果において硫酸根を最初から含まない場合と違いがなかった。初期においては硫酸根を含んでいても補給において含まないことが本発明の実施においては重要である。 The replenishment method of Examples 1 to 18 and Comparative Examples 1 to 5 was performed by adding 2, 5, and 10 g / L of sulfate to the plating solution at the time of building bath, but the test after 150 AH / L running at 5 g / L or less. In the results, there was no difference from the case where the sulfate radical was not included from the beginning. In the practice of the present invention, it is important that the sulfate radical is included in the initial stage but not in the replenishment.
本発明の実施例８及び比較例３〜５について、めっきを亜鉛めっきにして実施した。硫酸根濃度を０のもの、３０ｇ／Ｌのものの両方についてランニング中、維持するものの両方を行った。１５０ＡＨ／Ｌランニングを行ったが、全て極めて良好な外観を維持し、本発明を亜鉛めっきに適用しても効果が無いことが分かった。 About Example 8 and Comparative Examples 3-5 of this invention, plating was implemented by making zinc plating. Both the sulfate radical concentration of 0 and 30 g / L were maintained during running. Although 150 AH / L running was performed, it was found that all of them maintained a very good appearance and had no effect even when the present invention was applied to galvanizing.
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