JP2013143549A5 - - Google Patents
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- Publication number
- JP2013143549A5 JP2013143549A5 JP2012004282A JP2012004282A JP2013143549A5 JP 2013143549 A5 JP2013143549 A5 JP 2013143549A5 JP 2012004282 A JP2012004282 A JP 2012004282A JP 2012004282 A JP2012004282 A JP 2012004282A JP 2013143549 A5 JP2013143549 A5 JP 2013143549A5
- Authority
- JP
- Japan
- Prior art keywords
- refrigerant
- heat exchanger
- heat
- coolant
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003507 refrigerant Substances 0.000 claims 13
- 238000005530 etching Methods 0.000 claims 7
- 239000000243 solution Substances 0.000 claims 6
- 239000002826 coolant Substances 0.000 claims 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 4
- 239000002210 silicon-based material Substances 0.000 claims 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910017604 nitric acid Inorganic materials 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- 150000001298 alcohols Chemical class 0.000 claims 1
- 230000002528 anti-freeze Effects 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012004282A JP5816562B2 (ja) | 2012-01-12 | 2012-01-12 | 熱交換器およびシリコン系材料用エッチング液の除熱方法 |
| PCT/JP2013/000097 WO2013105512A1 (ja) | 2012-01-12 | 2013-01-11 | 熱交換器およびシリコン系材料用エッチング液の除熱方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012004282A JP5816562B2 (ja) | 2012-01-12 | 2012-01-12 | 熱交換器およびシリコン系材料用エッチング液の除熱方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013143549A JP2013143549A (ja) | 2013-07-22 |
| JP2013143549A5 true JP2013143549A5 (cg-RX-API-DMAC7.html) | 2014-01-23 |
| JP5816562B2 JP5816562B2 (ja) | 2015-11-18 |
Family
ID=48781461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012004282A Active JP5816562B2 (ja) | 2012-01-12 | 2012-01-12 | 熱交換器およびシリコン系材料用エッチング液の除熱方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5816562B2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2013105512A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6329920B2 (ja) * | 2015-04-14 | 2018-05-23 | 信越化学工業株式会社 | 多結晶シリコン塊の評価方法 |
| WO2017157533A1 (de) * | 2016-03-16 | 2017-09-21 | Linde Aktiengesellschaft | Sicherheitswärmeübertrager zur temperatureinstellung |
| JP7752465B1 (ja) * | 2025-01-16 | 2025-10-10 | 直江津電子工業株式会社 | 半導体ウエハの製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08117619A (ja) * | 1994-10-19 | 1996-05-14 | Miura Co Ltd | 恒温装置 |
| JPH09327669A (ja) * | 1996-06-11 | 1997-12-22 | Ibiden Co Ltd | 蒸気洗浄装置 |
| JP2000124184A (ja) * | 1998-10-14 | 2000-04-28 | Sony Corp | 薬液用冷却水恒温装置 |
| JP2000292040A (ja) * | 1999-04-06 | 2000-10-20 | Hitachi Building Systems Co Ltd | アンモニア漏洩の危害を防止する方法、および、同危害防止装置 |
-
2012
- 2012-01-12 JP JP2012004282A patent/JP5816562B2/ja active Active
-
2013
- 2013-01-11 WO PCT/JP2013/000097 patent/WO2013105512A1/ja not_active Ceased
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