JP2013140220A - Optical waveguide and electronic equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an optical waveguide having an identification sign that is recognizable even if reduced in size, and electronic equipment provided with the optical waveguide.SOLUTION: An optical waveguide 1 comprises a plurality of core parts 14 which are parallel to one another; side clad parts 15 each positioned between two consecutive core parts 14; and an identification sign 4 disposed on the side clad parts 15 and consisting of a group of multiple patterns 41 composed of the same material as the core parts 14. The identification sign 4 as the whole group of multiple patterns 41 has an individual identifying function. Further, the identification sign 4 is set in a size recognizable by naked eye. In addition, the patterns 41, as they are composed of the same material as the core parts 14, have a function to scatter light leaking out of the side clad parts 15, so that, when light is brought to incidence on the core parts 14, leaks from the incident light can be prevented from giving rise to crosstalk or generation of light in a clad mode can be inhibited.

Description

  The present invention relates to an optical waveguide and an electronic device.

  An optical communication technique for transferring data using an optical carrier wave has been developed. In recent years, an optical waveguide has been widely used as a means for guiding the optical carrier wave from one point to another point. This optical waveguide has a linear core part and a clad part provided so as to cover the periphery thereof. The core part is made of a material that is substantially transparent to the light of the optical carrier wave, and the cladding part is made of a material having a refractive index lower than that of the core part.

  In the optical waveguide, light introduced from one end of the core portion is conveyed to the other end while being reflected at the boundary with the cladding portion. A light emitting element such as a semiconductor laser is disposed on the incident side of the optical waveguide, and a light receiving element such as a photodiode is disposed on the emission side. Light incident from the light emitting element propagates through the optical waveguide, is received by the light receiving element, and performs communication based on the flickering pattern of the received light or its intensity pattern.

  In order to identify such an individual optical waveguide, it is necessary to write some sort of display by writing an identification symbol on the surface or attaching a label with an identification symbol. However, since these displays all involve work different from the manufacturing of the optical waveguide, the display may be forgotten or mistaken.

  Therefore, Patent Document 1 discloses that an identification symbol is embedded as part of the optical waveguide manufacturing process. As a result, the manufacturing process and the display process of the identification symbol become inseparable, and there is almost no possibility that the display will be forgotten.

  However, the identification symbol disclosed in Patent Document 1 is embedded in a blank portion of the optical waveguide away from the region where the core is formed. For this reason, the optical waveguide needs a blank portion having a certain width corresponding to the identification symbol, which hinders downsizing. On the other hand, there is a strong demand for miniaturization of optical waveguides, and the margins are often cut off when mounted on electronic devices. If the blank portion is cut off, the identification symbol is lost accordingly, and thereafter there is a problem that the individual optical waveguide cannot be identified.

JP 2005-181560 A

  An object of the present invention is to provide an optical waveguide having an identification symbol that can be identified even if it is miniaturized, and an electronic apparatus including the optical waveguide.

Such an object is achieved by the present inventions (1) to (9) below.
(1) An optical waveguide having a plurality of parallel core portions and a side clad portion positioned between the plurality of core portions,
An optical waveguide characterized by having an identification symbol made of a pattern made of the same material as that of the core portion and provided in the side clad portion.

(2) having a plurality of the side clad portions, and the pattern provided on each of the side clad portions,
The optical waveguide according to (1), wherein the plurality of patterns are configured to function as the identification symbol.

(3) having a background part in which the plurality of patterns are uniformly distributed, and a blank part provided in the background part and where the pattern does not exist locally,
The optical waveguide according to (1), wherein the entire blank portion is configured to function as the identification symbol.

  (4) The optical waveguide according to (2) or (3), wherein the identification symbol has a size that can be visually identified.

  (5) The optical waveguide according to any one of (1) to (4), wherein the identification symbol includes a graphic code obtained by converting information into a graphic.

  (6) Each of the core part and the pattern is partially irradiated with light on a layer formed of a material in which a photopolymerizable monomer having a refractive index different from that of the polymer is dispersed in the polymer, The optical waveguide according to any one of the above (1) to (5), which is formed by causing a deviation in refractive index in the layer by moving and unevenly distributing a photopolymerizable monomer.

  (7) The optical waveguide according to (6), wherein the polymer is a (meth) acrylic resin, an epoxy resin, a silicone resin, a polyimide resin, a fluorine resin, or a polyolefin resin.

  (8) When the average width of the plurality of core portions is WCO [μm] and the average width of the plurality of side surface cladding portions is WCL [μm], WCO / WCL is 0.1 to 10, and WCL is 10-250 micrometers, The optical waveguide in any one of said (1) thru | or (7).

  (9) An electronic apparatus comprising the optical waveguide according to any one of (1) to (8).

According to the present invention, an optical waveguide having an identification symbol that can be identified even if it is reduced in size, for example, by cutting off a blank portion is obtained.
Moreover, according to this invention, the electronic device provided with the said optical waveguide is obtained.

1 is a perspective view showing an embodiment of an optical waveguide of the present invention (partially cut out and shown through). It is a top view which shows the core layer of the optical waveguide shown in FIG. 1 is a diagram schematically showing an example of a refractive index distribution when the horizontal axis indicates the position of the core layer thickness in the center line C1 and the vertical axis indicates the refractive index in the XX sectional view shown in FIG. It is. It is a figure which shows an example of intensity distribution of the emitted light when light injects into one of the core parts of the optical waveguide shown in FIG. The figure which cut out a part centering on the core part of XX sectional drawing shown in FIG. 1, and the refractive index on center line C2 which passes the center of the width direction of the core part of XX sectional drawing It is a figure which shows an example of distribution T typically. It is a perspective view which shows the die-coater which obtains a multicolor molded object. It is a longitudinal cross-sectional view which expands and shows a part of die-coater. It is a figure for demonstrating the manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating the manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating the manufacturing method of the optical waveguide shown in FIG. It is a figure for demonstrating a mode that a refractive index difference arises between an irradiation area | region and an unirradiated area | region, and took the position of the width direction of the cross section of a layer on the horizontal axis, and took the refractive index of the cross section on the vertical axis | shaft. It is a figure which shows refractive index distribution at the time. It is a figure which shows refractive index distribution when taking the refractive index of the cross section of an optical waveguide on a horizontal axis, and taking the position of the thickness direction of a cross section on the vertical axis | shaft. It is a figure for demonstrating the method to measure the intensity distribution of the emitted light in the output side end surface of an optical waveguide. It is a figure which shows intensity distribution of the emitted light in the output side end surface of the optical waveguide obtained by Example 1, Reference example 1, and Reference example 2. FIG.

  Hereinafter, the optical waveguide and the electronic device of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.

<Optical waveguide>
First, the optical waveguide of the present invention will be described.

  FIG. 1 is a perspective view showing an embodiment of an optical waveguide according to the present invention (partially cut out and shown through), and FIG. 2 is a plan view showing a core layer of the optical waveguide shown in FIG. In addition, in order to avoid that a figure becomes complicated, in FIG. 1, about two of the eight core parts 14 are shown.

  The optical waveguide 1 shown in FIG. 1 has a plurality of core portions 14 arranged in parallel in a plan view, and side clad portions 15 provided on both sides of each core portion 14. That is, the optical waveguide 1 in FIG. 1 is a so-called multi-channel one.

  Such an optical waveguide 1 is provided with an identification symbol 4 including information such as characters and figures as shown in FIG. Such an identification symbol has been conventionally given to the margin of the optical waveguide. Here, the margin refers to a side clad portion positioned further outside the outermost core portion among a plurality of core portions arranged in parallel.

  Compared to the side clad part located between the core parts, the width of this margin can be made sufficiently wide, so that an identification symbol of a size that can be visually recognized can be given, and visibility There is an advantage that can be increased.

  However, with the demand for miniaturization of the optical waveguide, it has been often attempted to reduce the size by cutting off the margin. As a result, the identification symbol assigned to the margin is lost, and the optical waveguide cannot be identified thereafter.

  On the other hand, in the present invention, as shown in FIG. 1, an identification symbol 4 made of a pattern 41 made of the same material as the core portion 14 is provided on the side cladding portion 15 located between the plurality of core portions 14. It was.

  Since such an identification symbol 4 is provided not between the blank portions but between the core portions 14, it does not hinder downsizing of the optical waveguide 1. For this reason, even if the margin of the optical waveguide 1 is minimized to reduce the size of the optical waveguide 1, the function of the identification symbol 4 is not lost. Therefore, according to the present invention, the optical waveguide 1 that is small in size and easy to identify an individual can be obtained.

Hereinafter, the configuration of each part of the optical waveguide 1 will be sequentially described.
As described above, the optical waveguide 1 illustrated in FIG. 2 includes a plurality of parallel core portions 14, a plurality of side cladding portions 15 adjacent to the core portions 14, and a plurality of side surface cladding portions 15 between the core portions 14. Each has an identification symbol 4 formed of a plurality of patterns 41 that are provided and made of the same material as the core portion 14.

  Here, each of the plurality of patterns 41 shown in FIG. 2A is circular in plan view. The plurality of patterns 41 constitute an aggregate by being arranged in a predetermined pattern, and the entire aggregate is configured to function as a symbol for identifying the optical waveguide 1. In FIG. 2A, a plurality of patterns 41 are aggregated to form three aggregates, and the patterns 41 adjacent to each other in each aggregate are virtually connected to each other, the number “40” and “ The symbol “→” can be recognized.

  In the optical waveguide 1 shown in FIG. 2 (a), since the identification symbol 4 is composed of an assembly of a plurality of patterns 41, the size of the size can be sufficiently visually identified even if the margin is minimized. An identification symbol 4 can be constructed. For this reason, the optical waveguide 1 which is small and can easily identify the individual is obtained. Since each pattern 41 can be made sufficiently smaller than the identification symbol 4, the influence of the pattern 41 on the transmission characteristics of the core portion 14 can be minimized without impeding visibility. Can do.

  The pattern 41 is made of the same material as that of the core portion 14. For this reason, the pattern 41 can be manufactured simultaneously with manufacturing the core part 14, and it is not necessary to provide the process for manufacturing the pattern 41 separately. Therefore, the optical waveguide 1 having such a pattern 41 can be easily manufactured at low cost. Moreover, since it is comprised with the same material as the core part 14, the refractive index of the pattern 41 is higher than the refractive index of the side clad part 15 of the circumference | surroundings. For this reason, the pattern 41 and the side clad portion 15 appear to have different colors from each other, whereby the presence of the pattern 41 can be visually recognized. As a result, the identification symbol 4 can perform its identification function. Note that the same material as the core portion 14 may be a material having the same material system and a higher refractive index than that of the side cladding portion 15. Therefore, if such conditions are satisfied, the core portion 14 and the pattern 41 may be manufactured in different processes. However, as described above, by simultaneously manufacturing in the same process, the material system is the same and refractive The rate is higher than that of the side cladding portion 15 (substantially equal to the core portion 14). In addition, even if it manufactures by the method of modulating a refractive index by changing a part of chemical structure by irradiation of actinic radiation etc. which are mentioned later, even if it manufactures simultaneously in the same process, the core part 14 and the pattern 41 However, even in this case, the refractive index of the pattern 41 is higher than that of the side cladding portion 15.

  The shape of the pattern 41 shown in FIG. 2A is not limited to the perfect circle shown in FIG. 2A, and may be a circle such as an ellipse or an ellipse. Moreover, other shapes, for example, a polygon such as a triangle, a quadrangle, a pentagon, and a hexagon, a star, a rhombus, and the like may be used, and are not limited. Furthermore, the pattern 41 itself may be a character, a symbol, or the like.

  Examples of information indicated by the pattern 41 or the identification symbol 4 include raw materials, production lots, manufacturer names, delivery destinations, production dates, specifications, standards, optical characteristics, usage methods, alignment marks, and the like. Among these, examples of the pattern 41 or the identification symbol 4 indicating the usage method include an arrow symbol for specifying the incident side and the emission side of the optical waveguide 1. Further, examples of the pattern 41 or the identification symbol 4 indicating the alignment mark include a cutting line that is a guideline for cutting the optical waveguide 1 along the side cladding portion 15.

  Although the magnitude | size in planar view of the pattern 41 is set according to the distance between the core parts 14, it does not specifically limit, For example, a maximum diameter is set to about 10-250 micrometers. If the pattern 41 has such a size, the presence of the pattern 41 can be sufficiently recognized, and the pattern 41 can be prevented from affecting the transmission characteristics of the core portion 14. Further, by providing the pattern 41, it is possible to prevent the stress distribution from becoming non-uniform and to prevent the optical waveguide 1 from being warped or bent. The maximum diameter of the pattern 41 is the maximum length that can be taken in the plan view of the pattern 41.

  On the other hand, the identification symbol 4 that is an aggregate of a plurality of patterns 41 is not limited to characters, symbols, and the like as shown in FIG. 2A, and may include, for example, a graphic code formed by converting information into a graphic. By including the graphic code, the identification symbol 4 can store more information and can easily read out the information as electronic data. In addition, even when a part of the plurality of patterns 41 is not visible due to a defect, dirt, or the like, the stored information can be read, and the stability as the identification symbol 4 can be improved. Examples of the graphic code include a one-dimensional code such as a barcode, a two-dimensional code such as a QR code (registered trademark), and the like.

  The size of the identification symbol 4 in plan view is not particularly limited. For example, the maximum diameter is preferably set to 30 μm or more, and more preferably set to 50 μm or more. If it is such a magnitude | size, even if it is visually, the identification symbol 4 can be visually recognized reliably as a character or a symbol.

  Each pattern 41 does not necessarily have to be provided between the core portions 14, and a part of the patterns 41 may be provided in a margin.

  In addition, each pattern 41 is preferably provided so as to be separated from the core portion 14. Thereby, it is possible to prevent the pattern 41 from affecting the transmission characteristics of the core portion 14.

  The distance between each pattern 41 and the core part 14 adjacent thereto, that is, the width of the side clad part 15 between each pattern 41 and the core part 14 adjacent thereto is not particularly limited, but is about 2 to 100 μm. It is preferable that it is about 3-80 micrometers. Thereby, the pattern 41 and the core part 14 can be reliably separated and visually recognized while ensuring the high density of the optical waveguide 1.

  Further, the maximum diameter of each pattern 41 is preferably about 20 to 95% of the width of the side clad portion 15, and more preferably about 30 to 90%. Thereby, the visibility of the identification symbol 4 and the transmission efficiency of the core part 14 can be highly compatible.

  By the way, in the optical waveguide, since the refractive index of the core part is generally higher than that of the cladding part, the light incident on the core part propagates without leaking to the cladding part. However, such behavior is theoretical, and in reality, a slight amount of light leaks into the cladding.

  Also in the optical waveguide 1, it is considered that a part of the light propagating through the core portion 14 leaks to the side cladding portion 15.

  In the present invention, since the pattern 41 is provided in the side cladding 15 as described above, the light leaked to the side cladding 15 (leakage light) interferes with the pattern 41. When the leaked light interferes with the pattern 41, the leaked light is scattered at the interface between the pattern 41 and the side cladding portion 15. As a result, it is possible to prevent leakage light from spreading to another core portion 14 and causing noise (crosstalk). That is, the optical waveguide 1 having the pattern 41 can identify an individual and can perform high-quality optical communication.

  Furthermore, in the optical waveguide, light that propagates through the side cladding instead of the core, so-called cladding mode, is known. If the light receiving element receives the light in the clad mode, the quality of optical communication deteriorates. On the other hand, by providing the pattern 41 between the core portions 14, the pattern 41 can attenuate the cladding mode. As a result, it is possible to prevent quality degradation of optical communication.

Here, another configuration example of the identification symbol 4 will be described.
FIG. 2B is a plan view showing another configuration example of the identification symbol shown in FIG.

  The optical waveguide 1 shown in FIG. 2B is the same as the optical waveguide 1 shown in FIG. 2A except that the arrangement of the plurality of patterns 41 is different.

  The identification symbol 4 shown in FIG. 2B is a background portion 401 that is an area in which a plurality of patterns 41 are uniformly distributed, and the pattern 41 provided inside the background portion 401 does not exist locally. A blank portion 402 which is a portion where a part of the pattern 41 is missing in the background portion 401 where the pattern 41 is uniformly distributed. A plurality of blank portions 402 are gathered to show information such as characters and graphics. That is, it can be said that the identification symbol 4 shown in FIG. 2A is a positive type identification symbol in which a plurality of patterns 41 gather to exert an identification function, while the identification symbol 4 shown in FIG. It can be said that it is a negative type identification symbol in which a plurality of blank portions 402 are gathered to exert an identification function.

  In such an identification symbol 4 shown in FIG. 2B, since the background portion 401 is composed of the pattern 41, more patterns 41 are arranged compared to the identification symbol 4 shown in FIG. It becomes. For this reason, the effect of preventing the occurrence of the above-described crosstalk and cladding modes is more reliably exhibited. As a result, the optical waveguide 1 shown in FIG. 2 (b) has an identification function and can perform particularly high-quality optical communication.

  In the background portion 401, the plurality of patterns 41 need only be uniformly distributed, and the arrangement pattern of the patterns 41 may be regular or irregular.

  Further, when the pattern 41 can include information such as characters, symbols, and graphic codes, the pattern 41 is not composed of the group of the plurality of patterns 41 as described above, but the pattern 41 alone. And may function as the identification symbol 4. In this case, for example, individual information (such as a light propagation direction) can be given to each core unit 14.

(Core layer)
FIG. 3 is a schematic diagram illustrating an example of a refractive index distribution when the horizontal axis indicates the position of the core layer thickness in the center line C1 and the vertical axis indicates the refractive index in the cross-sectional view along the line XX shown in FIG. FIG. 4 and FIG. 4 are diagrams showing an example of an intensity distribution of emitted light when light is incident on one of the core portions of the optical waveguide shown in FIG.

  The optical waveguide 1 shown in FIG. 1 has three layers of a clad layer 11, a core layer 13, and a clad layer 12 from the lower side. Further, the optical waveguide 1 shown in FIG. 1 is sandwiched between a support film 2 from below and a cover film 3 from above.

  In the core layer 13, a refractive index distribution W having a refractive index biased in the width direction is formed. This refractive index distribution W has a relatively high refractive index region (maximum value) and a low region (minimum value), so that incident light is confined and propagated in a high refractive index region. be able to. As a result, transmission loss and blunting of the pulse signal are suppressed, and highly reliable optical communication can be performed even when a large-capacity optical signal is incident.

  For the refractive index distribution W, a step index type distribution in which the refractive index changes discontinuously, a graded index type distribution in which the refractive index changes continuously, or the like is applied. Of these, it is preferable to apply a graded index distribution to the refractive index distribution W from the viewpoint of transmission efficiency and the like. Thereby, the optical waveguide 1 with high transmission efficiency is obtained. Further, by applying a graded index type distribution, even if a large number of patterns 41 are provided, the transmission efficiency is unlikely to decrease, and therefore an excellent individual identification function can be provided.

  Here, the graded index type distribution may include a maximum value and a minimum value and may be a distribution in which the refractive index is continuously changed. It is preferable to be divided into values. Specifically, the local maximum value of the refractive index distribution W includes a relatively high first local maximum value and a relatively low second local maximum value, with the first local maximum value sandwiched therebetween. The local minimum is located. Then, the core portion 14 is positioned corresponding to the first maximum value, and the side clad portion 15 is positioned corresponding to the second maximum value. Thereby, a minimum value is located between the core part 14 and the side cladding part 15, and a large refractive index difference is formed between the first maximum value and the minimum value. From 14, it becomes difficult for light to leak. Further, since the second maximum value lower than the first maximum value is located in the side cladding portion 15, even if light leaks from the core portion 14, the leaked light is confined in the side cladding portion 15. It becomes. Thereby, the crosstalk between the core parts 14 adjacent in the width direction is suppressed. As a result, even when the interval between the core portions 14 in the core layer 13 is reduced to increase the density, high-quality optical communication can be maintained.

  The refractive index distribution W has four minimum values Ws1, Ws2, Ws3, Ws4 and five maximum values Wm1, Wm2, Wm3, Wm4, Wm5 as shown in FIG. The five maximum values include a maximum value (first maximum value) Wm2 and Wm4 having a relatively high refractive index, and a maximum value (second maximum value) Wm1, Wm3 having a relatively low refractive index. Wm5 exists.

  Among these, the maximum value Wm2 and the maximum value Wm4 exist between the minimum value Ws1 and the minimum value Ws2, and between the minimum value Ws3 and the minimum value Ws4.

  In the optical waveguide 1, as shown in FIG. 3, since the maximum value Wm2 having a relatively large refractive index is located between the minimum value Ws1 and the minimum value Ws2, this region becomes the core portion 14, Similarly, since the local maximum value Wm4 is located between the local minimum value Ws3 and the local minimum value Ws4, the core portion 14 is formed. Here, a core portion 141 is defined between the minimum value Ws1 and the minimum value Ws2, and a core portion 142 is defined between the minimum value Ws3 and the minimum value Ws4.

  Further, the region on the left side of the minimum value Ws1, the region between the minimum value Ws2 and the minimum value Ws3, and the region on the right side of the minimum value Ws4 are regions adjacent to both side surfaces of the core portion 14, respectively. It becomes. Here, the region on the left side of the minimum value Ws1 is the side cladding portion 151, the region between the minimum value Ws2 and the minimum value Ws3 is the side surface cladding portion 152, and the region on the right side of the minimum value Ws4 is the side surface cladding portion 153. .

  That is, the refractive index distribution W should have at least a region in which the second maximum value, the minimum value, the first maximum value, the minimum value, and the second maximum value are arranged in this order. In addition, this area | region is repeatedly provided according to the number of core parts, and when there are two core parts 14 like FIG. 3, the refractive index distribution W has 2nd maximum value, minimum value, 1st The local maximum value and the local minimum value are alternately arranged like the local maximum value, the local minimum value, the second local maximum value, the local minimum value, the first local maximum value, the local minimum value, and the second local maximum value. It is only necessary to have a region in which the local maximum value and the second local maximum value are alternately arranged.

  The plurality of local minimum values, the plurality of first local maximum values, and the plurality of second local maximum values are preferably substantially the same as each other, but the local minimum values are the first local maximum value and the second local maximum value. As long as the relationship that the second maximum value is smaller than the first maximum value and the second maximum value is smaller than the first maximum value is maintained, the values may be slightly different from each other. In that case, it is preferable that the amount of deviation is suppressed within 10% of the average value of the plurality of minimum values.

  Further, as described above, the optical waveguide 1 has an elongated strip shape, but the refractive index distribution W as described above is maintained substantially the same in the entire longitudinal direction of the optical waveguide 1.

  Along with the refractive index distribution W as described above, the core layer 13 shown in FIG. 1 has two elongated core portions 14 and three side clad portions 15 adjacent to both side surfaces of the core portions 14. Will be formed.

  More specifically, the core layer 13 shown in FIG. 1 is provided with two parallel core parts 141 and 142 and three side clad parts 151, 152, and 153 arranged in parallel. Thereby, each core part 141 and 142 will be in the state surrounded by each side cladding part 151,152,153 and each cladding layer 11,12, respectively. Here, since the refractive indexes of the core portions 141 and 142 are higher than the refractive indexes of the side cladding portions 151, 152, and 153, the core portions 141 and 142 and the side cladding portions 151, 152, and 153 It is possible to cause light reflection at the interface. In addition, a dense dot is attached | subjected to each core part 14 shown in FIG. 1, and a sparse dot is attached | subjected to each side clad part 15. FIG.

  In the optical waveguide 1, the light incident on one end of the core part 14 is reflected at the interface between the core part 14 and the clad part (the clad layers 11 and 12 and the side clad parts 15) and propagates to the other. By doing so, it can be taken out from the other end of the core part 14.

  1 has a quadrangular shape (rectangular shape) such as a square or a rectangle, but this shape is not particularly limited. For example, a perfect circle, an ellipse, or an oval The shape may be a circle such as a triangle, a triangle, a pentagon, or a polygon such as a hexagon.

  The width and height of the core part 14 (thickness of the core layer 13) are not particularly limited, but each is preferably about 1 to 200 μm, more preferably about 5 to 100 μm, and about 20 to 70 μm. More preferably.

  Here, each of the four minimum values Ws1, Ws2, Ws3, and Ws4 is less than the average refractive index WA in the adjacent side cladding portion 15. As a result, a region having a smaller refractive index than the side cladding portion 15 exists at the boundary between each core portion 14 and each side cladding portion 15. As a result, a steeper refractive index gradient is formed in the vicinity of each local minimum value Ws1, Ws2, Ws3, and Ws4. This suppresses light leakage from each core portion 14, thereby reducing transmission loss. The optical waveguide 1 is obtained.

  Further, the refractive index distribution W changes continuously as a whole. Thereby, compared with an optical waveguide having a step index type refractive index profile, the effect of confining light in the core portion 14 is further enhanced, so that transmission loss can be further reduced.

  Further, in the refractive index distribution W, since the refractive index has a maximum value and the refractive index continuously changes, the speed of light increases as the distance from the center increases due to the property that the speed of light is inversely proportional to the refractive index. It is difficult for a difference in propagation time to occur. For this reason, the transmission waveform does not easily collapse, and for example, even when the transmission light includes a pulse signal, it is possible to suppress blunting of the pulse signal (spreading of the pulse signal). As a result, the optical waveguide 1 that can further improve the quality of optical communication is obtained.

  Note that the refractive index continuously changing in the refractive index distribution W is a state in which the curve of the refractive index distribution W is rounded in each part and the curve is differentiable.

  In addition, when the core portion 14 and the side cladding portion 15 are formed in the core layer 13 as in the present embodiment, the core portion 14 and the side surface are generally limited due to the restrictions associated with the principle of forming a refractive index difference. Although the average refractive index difference from the clad portion 15 cannot be made sufficiently large, according to the present invention, since the maximum value and the minimum value are alternately arranged, the average refractive index of the core portion 14 and Even if the difference from the average refractive index of the side cladding 15 is small, light can be reliably confined in the core 14. For this reason, in the optical waveguide 1 manufactured by the method of forming the core part 14 and the side clad part 15 from the same layer, the present invention particularly exhibits the effect. That is, according to the present invention, since the core portion 14 and the side cladding portion 15 can be formed in the same layer, the optical waveguide 1 that is easy to manufacture and has high dimensional accuracy can be obtained.

  Further, in the refractive index distribution W, the maximum values Wm2 and Wm4 are located in the core portions 141 and 142 as shown in FIG. 3, but the core portions 141 and 142 are located in the central portion of the width. It is preferable. Thereby, in each core part 141 and 142, the probability that transmission light will gather in the center part of the width of core part 141 and 142 becomes high, and the probability that it will leak to side cladding parts 151, 152, and 153 becomes relatively low. As a result, the transmission loss of the core parts 141 and 142 can be further reduced.

  The central portion of the width of the core portion 141 is a region having a distance of 30% of the width of the core portion 141 on both sides from the midpoint between the minimum value Ws1 and the minimum value Ws2.

  In addition, the positions of the maximum values Wm2 and Wm4 are not necessarily the center, but if they are located in the vicinity of the edges of the cores 141 and 142 (near the interfaces with the side clad parts 151, 152, and 153). , A significant decline in properties is avoided. That is, the transmission loss of the core parts 141 and 142 can be suppressed to some extent.

  In addition, the edge part vicinity of the core part 141 is an area | region of 5% of the width | variety of the core part 141 inside the edge part mentioned above inside.

  On the other hand, the maximum values Wm1, Wm3, and Wm5 of the refractive index distribution W are located in the side cladding portions 151, 152, and 153 as shown in FIG. It is preferable to be located other than the vicinity of the edge (near the interface with the cores 141 and 142). As a result, the local maximum values Wm2, Wm4 in the core portions 141, 142 and the local maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are sufficiently separated from each other. , 142 can sufficiently reduce the probability that the transmitted light leaks into the side clad parts 151, 152, 153. As a result, the transmission loss of the core parts 141 and 142 can be reduced.

  Note that the vicinity of the edges of the side cladding portions 151, 152, and 153 is a region having a distance of 5% of the width of the side cladding portions 151, 152, and 153 from the above-described edge portion to the inside.

  In addition, the local maximum values Wm1, Wm3, Wm5 are located at the center of the width of the side cladding portions 151, 152, 153, and the local minimum values Ws1, Ws2, Ws3, which are adjacent to the local maximum values Wm1, Wm3, Wm5. It is preferable that the refractive index continuously decreases toward Ws4. As a result, the maximum distances between the maximum values Wm2, Wm4 in the core portions 141, 142 and the maximum values Wm1, Wm3, Wm5 in the side cladding portions 151, 152, 153 are secured, and the maximum values Wm1, Since light can be reliably confined in the vicinity of Wm3 and Wm5, leakage of transmission light from the core portions 141 and 142 described above can be more reliably suppressed.

  Furthermore, the local maximum values Wm1, Wm3, and Wm5 are smaller in refractive index than the local maximum values Wm2 and Wm4 located in the core portions 141 and 142 described above. Although it does not have, since the refractive index is higher than the surroundings, it has a slight light transmission property. As a result, the side clad parts 151, 152, and 153 have an effect of preventing transmission to other core parts by confining transmission light leaked from the core parts 141 and 142. That is, the presence of the maximum values Wm1, Wm3, and Wm5 can suppress crosstalk.

  Note that the minimum values Ws1, Ws2, Ws3, and Ws4 are less than the average refractive index WA of the adjacent side cladding portions 15 as described above, but the difference is desirably within a predetermined range. Specifically, the difference between the minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding portion 15 is the minimum value Ws1, Ws2, Ws3, Ws4 and the maximum value Wm2 in the core portions 141, 142. It is preferably about 3 to 80% of the difference from Wm4, more preferably about 5 to 50%, and still more preferably about 7 to 20%. As a result, the side clad portion 15 has a light transmission property necessary and sufficient for suppressing crosstalk. If the difference between the minimum value Ws1, Ws2, Ws3, Ws4 and the average refractive index WA of the side cladding 15 is below the lower limit, the light transmission in the side cladding 15 is too small and crosstalk is sufficient. If the value exceeds the upper limit, the light transmission property of the side cladding portion 15 is too large, and the light transmission properties of the core portions 141 and 142 may be adversely affected.

  The difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm1, Wm3, Wm5 is about 6 to 90% of the difference between the minimum values Ws1, Ws2, Ws3, Ws4 and the maximum values Wm2, Wm4. Is more preferable, about 10 to 70% is more preferable, and about 14 to 40% is further preferable. As a result, the balance between the refractive index height of the side cladding portion 15 and the refractive index height of the core portion 14 is optimized, and the optical waveguide 1 has particularly excellent optical transmission properties and more reliably suppresses crosstalk. It will be possible.

  The difference in refractive index between the minimum values Ws1, Ws2, Ws3, and Ws4 and the maximum values Wm2 and Wm4 in the core portions 141 and 142 is preferably as large as possible, but is about 0.005 to 0.07. Preferably, it is about 0.007 to 0.05, more preferably about 0.01 to 0.03. Thereby, the above-described difference in refractive index becomes necessary and sufficient for confining light in the core portions 141 and 142.

  The ratio (WCO / WCL) of the average width WCO of the core portion 14 to the average width WCL of the side cladding portions 15 is preferably about 0.1 to 10, and is preferably about 0.3 to 5. More preferably, it is about 0.5-4. By optimizing the width ratio between the core portion 14 and the side clad portion 15, each effect described above can be enhanced.

  Moreover, it is preferable that the average width WCL of the side clad part 15 is 5-250 micrometers, It is more preferable that it is 10-200 micrometers, It is further more preferable that it is 10-120 micrometers. Thereby, each effect mentioned above can each be advanced. Moreover, the pattern 41 of the magnitude | size which can visually recognize presence can be provided.

  FIG. 4 is a diagram showing the intensity distribution of the emitted light when light enters the core portion 141 of the optical waveguide 1. This intensity distribution is the intensity distribution of the emitted light at the other end portion when light is incident on the end portion of the core portion 141 among the plurality of core portions 141 and 142 of the optical waveguide 1.

  When light is incident on the core part 141, the intensity of the emitted light is highest at the center part of the emission end of the core part 141. The intensity of the emitted light decreases as the distance from the central portion of the core portion 141 decreases. However, in the optical waveguide 1, an intensity distribution is obtained such that a minimum value is obtained in the core portion 142 adjacent to the core portion 141. As described above, the minimum value of the intensity distribution of the emitted light matches the position of the core part 142, so that the crosstalk in the core part 142 can be suppressed to be extremely small. As a result, it is possible to obtain the optical waveguide 1 that can reliably prevent the occurrence of interference even when the density is increased.

  In the conventional optical waveguide, the intensity distribution of the emitted light does not take the minimum value in the core portion adjacent to the core portion where the light is incident, but rather takes the maximum value, which causes a crosstalk problem. It was. On the other hand, the intensity distribution of the emitted light as described above is extremely useful for suppressing crosstalk.

  Although the detailed reason why such an intensity distribution is obtained in the optical waveguide of the present invention is not clear, one of the reasons is that the optical waveguide has minimum values Ws1, Ws2, Ws3, Ws4 and the entire refractive index distribution W. The characteristic refractive index distribution W that the refractive index continuously changes is the side surface adjacent to the core portion 142, which indicates the intensity distribution of the emitted light, which conventionally had a maximum value in the core portion 142. For example, the clad portion 153 may be shifted. That is, the crosstalk is reliably suppressed by the shift of the intensity distribution.

  Further, the intensity distribution of the emitted light as described above is not necessarily observed, and it is clear depending on the NA (numerical aperture) of the incident light, the cross-sectional area of the core part 141, the pitch of the core parts 141 and 142, and the like. In some cases, the minimum value is not observed, or the position of the minimum value deviates from the core portion 142. Even in such a case, the crosstalk is sufficiently suppressed.

  Further, in the refractive index distribution W shown in FIG. 3B, when the average refractive index in the side cladding portion 15 is WA, the refractive index in the vicinity of the maximum values Wm2 and Wm4 is continuously equal to or higher than the average refractive index WA. Is a [μm], and the width of the portion where the refractive index in the vicinity of the minimum values Ws1, Ws2, Ws3, and Ws4 is continuously less than the average refractive index WA is b [μm]. At this time, b is preferably about 0.01a to 1.2a, more preferably about 0.03a to 1a, and further preferably about 0.1a to 0.8a. As a result, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 become necessary and sufficient for providing the above-described functions and effects. That is, when b is below the lower limit value, the substantial widths of the minimum values Ws1, Ws2, Ws3, and Ws4 are too narrow, and the action of confining light in the core portions 141 and 142 may be reduced. On the other hand, when b exceeds the upper limit value, the substantial widths of the local minimum values Ws1, Ws2, Ws3, and Ws4 are too wide, and the width and pitch of the core portions 141 and 142 are limited accordingly, and transmission is performed. There is a possibility that the efficiency is lowered and the high density is hindered.

  The average refractive index WA in the side cladding 15 can be approximated at the midpoint between the maximum value Wm1 and the minimum value Ws1.

  Further, each local maximum value Wm1, Wm2, Wm3, Wm4, Wm5 may include a flat portion in which the refractive index is not substantially changed in the vicinity of the top. Even if the refractive index distribution W has such a shape in the vicinity of the top of each local maximum value, the optical waveguide of the present invention exhibits the above-described actions and effects. Here, the flat portion where the refractive index does not substantially change is a region where the refractive index fluctuation is less than 0.001, and the refractive index continuously decreases on both sides thereof. Say.

  Although the length of a flat part is not specifically limited, Preferably it is 100 micrometers or less, More preferably, it is 20 micrometers or less, More preferably, you may be 10 micrometers or less.

  Moreover, although this embodiment demonstrated the case where the core layer 13 had the two core parts 14, the number of the core parts 14 is not specifically limited, Three or more may be sufficient. In this case, when the number of core portions 14 increases to 3, 4, 5,..., The number of local minimum values of the refractive index distribution W increases to 6, 8, 10,. It becomes.

  The constituent material (main material) of the core layer 13 as described above is not particularly limited as long as the refractive index difference is generated as described above. For example, acrylic resin, methacrylic resin, polycarbonate, polystyrene, epoxy resin, Cyclic ether resin such as oxetane resin, polyamide, polyimide, polybenzoxazole, polysilane, polysilazane, silicone resin, fluorine resin, polyurethane, polyolefin resin, polybutadiene, polyisoprene, polychloroprene, PET and PBT Polyester, polyethylene succinate, polysulfone, polyether, various resin materials such as cyclic olefin resins such as benzocyclobutene resin and norbornene resin, and glass materials such as quartz glass and borosilicate glass It can be used. Note that the resin material may be a composite material obtained by combining materials having different compositions.

  Among these, (meth) acrylic resins, epoxy resins, silicone resins, polyimide resins, fluorine resins, or polyolefin resins are preferable, and (meth) acrylic resins or epoxy resins are more preferable. Since these resin materials have high light transmittance, the optical waveguide 1 with particularly small transmission loss can be obtained.

  Note that a high-refractive index region similar to the first maximum value is also formed in the pattern 41 made of the same material as the core portion 14. A minimum value of the refractive index exists near the interface between the pattern 41 and the side cladding 15. For this reason, when the optical waveguide 1 is viewed in plan, there is a large refractive index difference between the first maximum value in the pattern 41 and this minimum value, and the presence of the outline of the pattern 41 based on this refractive index difference. (Difference in color between the pattern 41 and the side cladding 15) becomes clear. Therefore, the optical waveguide 1 having the refractive index distribution W as described above has the identification symbol 4 that enables clearer and more reliable identification.

  The difference between the maximum refractive index in the pattern 41 and the average refractive index of the side cladding 15 is not particularly limited, but is preferably about 0.002 to 0.05, and is about 0.003 to 0.04. More preferably.

(Clad layer)
The clad layers 11 and 12 constitute clad portions located at the lower and upper portions of the core layer 13, respectively.

  The average thickness of the cladding layers 11 and 12 is preferably about 0.05 to 1.5 times the average thickness of the core layer 13 (the average height of each core portion 14), and 0.1 to 1. More preferably, the average thickness of the clad layers 11 and 12 is not particularly limited, but is usually preferably about 1 to 200 μm and about 3 to 100 μm, respectively. More preferably, it is about 5 to 60 μm. Thereby, the function as a clad part is suitably exhibited while preventing the optical waveguide 1 from becoming unnecessarily large (thickened).

  Further, as the constituent material of the cladding layers 11 and 12, for example, the same material as the constituent material of the core layer 13 described above can be used, but in particular, (meth) acrylic resin, epoxy resin, silicone resin, A polyimide resin, a fluorine resin, or a polyolefin resin is preferable, and a (meth) acrylic resin or an epoxy resin is more preferable.

  Further, when selecting the constituent material of the core layer 13 and the constituent materials of the clad layers 11 and 12, the material may be selected in consideration of the refractive index difference between them. Specifically, in order to reflect light reliably at the boundary between the core portion 14 and the cladding layers 11 and 12, the material may be selected so that the refractive index of the constituent material of the core portion 14 is sufficiently large. As a result, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 1, and light can be prevented from leaking from the respective core portions 14 to the cladding layers 11 and 12.

  From the viewpoint of suppressing light attenuation, it is also important that the adhesiveness (affinity) between the constituent material of the core layer 13 and the constituent materials of the cladding layers 11 and 12 is high.

  On the other hand, the refractive index distribution T in the thickness direction of the optical waveguide 1 is not particularly limited as long as the refractive index of the core portion 14 is high and the refractive indexes of the cladding layers 11 and 12 are low (for example, step index type, gray level). However, it is preferable that the core portion 14 has a maximum value and has a minimum value near the boundary between the core portion 14 and the cladding layers 11 and 12.

  FIG. 5A is a diagram in which a part centered on the core portion of the XX sectional view shown in FIG. 1 is cut out, and FIG. 5B is a diagram of the core portion of the XX sectional view. It is a figure which shows typically an example of the refractive index distribution T on the centerline C2 which passes the center of the width direction. FIG. 5B is a diagram illustrating an example of the refractive index distribution T when the horizontal axis indicates the refractive index and the vertical axis indicates the position on the center line C2.

  As described above, the optical waveguide 1 is divided into the clad layer 11, the core layer 13, and the clad layer 12. Of the cross section, the refractive index distribution T in the thickness direction in the core portion 14 is the center portion. And local minimum values Ts1 and Ts2 positioned on both sides of the local maximum value Tm. Note that the minimum value positioned below the maximum value Tm is Ts1, and the maximum value positioned above the maximum value Tm is Ts2.

  In the optical waveguide 1, as shown in FIG. 5, the region between the local minimum value Ts <b> 1 and the local minimum value Ts <b> 2 includes the local maximum value Tm.

  On the other hand, the region below the minimum value Ts1 becomes the cladding layer 11, and the region above the minimum value Ts2 becomes the cladding layer 12. That is, the refractive index distribution T only needs to have at least a region in which the minimum value, the maximum value, and the minimum value are arranged in this order.

  This region is repeatedly provided according to the number of core layers 13 stacked. For example, when two core layers 13 are provided via a cladding layer, in the refractive index distribution T, a minimum value and a maximum value are alternately displayed. Will be lined up. In this case, it is preferable that the relatively large first maximum value and the relatively small second maximum value are alternately arranged. In other words, the second maximum value, the minimum value, the first maximum value, the minimum value, the second maximum value, the minimum value, the first maximum value, and the like may be arranged.

  The plurality of local minimum values, the plurality of first local maximum values, and the plurality of second local maximum values are preferably substantially the same as each other, but the local minimum values are the first local maximum value and the second local maximum value. If the relationship that the second maximum value is smaller than the first maximum value and the second maximum value is smaller than the first maximum value is maintained, the values may be slightly different from each other. In that case, it is preferable that the amount of deviation is suppressed within 10% of the average value of a plurality of minimum values.

  Further, the optical waveguide 1 has an elongated strip shape, and the refractive index distribution T as described above is maintained substantially the same distribution in the entire longitudinal direction of the optical waveguide 1.

  Here, the minimum value Ts1 is less than the average refractive index TA in the cladding layer 11, and the minimum value Ts2 is less than the average refractive index TA in the cladding layer 12. As a result, a region having a smaller refractive index than the clad layers 11 and 12 exists between the core portion 14 and the clad layers 11 and 12. As a result, a steeper refractive index gradient is formed in the vicinity of the local minimum values Ts1 and Ts2, thereby suppressing light leakage from the respective core portions 14 to the respective cladding layers 11 and 12. An optical waveguide 1 with low loss is obtained.

  Further, the refractive index distribution T continuously changes in refractive index as a whole. Thereby, compared with an optical waveguide having a step index type refractive index profile, the effect of confining light in the core portion 14 is further enhanced, so that transmission loss can be further reduced.

  Further, in the refractive index distribution T, since the refractive index continuously changes while having the above-described minimum values Ts1 and Ts2, the speed of light is inversely proportional to the refractive index. The distance from the center increases and the difference in propagation time for each optical path hardly occurs. For this reason, the transmission waveform does not easily collapse, and for example, even when the transmission light includes a pulse signal, it is possible to suppress blunting of the pulse signal (spreading of the pulse signal). As a result, the optical waveguide 1 that can further improve the quality of optical communication is obtained.

  Note that the refractive index continuously changing in the refractive index distribution T is a state in which the curve of the refractive index distribution T is rounded at each part and the curve is differentiable.

  Further, in the refractive index distribution T, the maximum value Tm is located in the core portion 14 as shown in FIG. 5, but is located in the center portion of the thickness among the core portions 14. Thereby, in the core part 14, the probability that transmission light will gather in the center part of the thickness of the core part 14 will become high, and the probability that it will leak to each clad layer 11 and 12 relatively becomes low. As a result, the transmission loss of the core parts 141 and 142 can be further reduced.

  The central portion of the thickness of the core portion 14 is a region having a distance of 30% of the thickness of the core portion 14 on both sides from the midpoint between the minimum value Ts1 and the minimum value Ts2.

  Further, the position of the maximum value Tm is not necessarily the central portion, but may be located in the vicinity of the edge portion of the core portion 14 (near the interface with the clad layers 11 and 12). Thereby, the transmission loss of the core part 14 can be suppressed to some extent.

  In addition, the edge part vicinity of the core part 14 is an area | region of 5% of the thickness of the core part 14 inside from the edge part mentioned above inside.

  On the other hand, in the refractive index distribution T, the refractive index of each cladding layer 11 and 12 changes so as to be the highest except for the vicinity of the interface with the core portion 14 and the lowest in the vicinity of the interface with the core portion 14. As a result, the maximum value Tm in the core portion 14 and the high refractive index region in each of the cladding layers 11 and 12 are sufficiently separated from each other. The probability of leaking into the layers 11, 12 can be made sufficiently low. As a result, the transmission loss of the core unit 14 can be reduced.

  Note that the vicinity of the interface with the core portion 14 in each of the cladding layers 11 and 12 is a region having a distance of 5% of the thickness of each of the cladding layers 11 and 12 inward from the interface.

  Further, the average refractive index TA in each of the cladding layers 11 and 12 can be approximated at the midpoint between the minimum values Ts1 and Ts2 and the maximum value in each of the cladding layers 11 and 12.

  As described above, when the plurality of core layers 13 are stacked, the relatively large first maximum value is located in the core portion, and the relatively small second maximum value is located in the cladding layer. Will be. In this case, it is preferable that the second maximum value is located at the center of the thickness of the cladding layer. Thereby, the separation distance between the first maximum value located in the core portion and the second maximum value located in the cladding layer is ensured to the maximum, and the light leaking from the core portion can be It becomes possible to confine in the clad layer so as not to enter the core portion. Thereby, even when the several core layer 13 is laminated | stacked, the crosstalk between layers can be suppressed reliably.

  Further, as described above, the minimum values Ts1 and Ts2 are less than the average refractive index TA of each of the cladding layers 11 and 12, but it is desirable that the difference between them is within a predetermined range. Specifically, the difference between the minimum values Ts1 and Ts2 and the average refractive index TA of the cladding layers 11 and 12 is about 3 to 80% of the difference between the minimum values Ts1 and Ts2 and the maximum value Tm in the core portion 14. It is preferably about 5 to 50%, more preferably about 7 to 30%. As a result, each of the cladding layers 11 and 12 has a light transmission property necessary and sufficient to suppress crosstalk. When the difference between the minimum values Ts1 and Ts2 and the average refractive index TA of each of the cladding layers 11 and 12 is less than the lower limit value, the optical transmission in each of the cladding layers 11 and 12 is too small, and crosstalk is sufficient. If the value exceeds the upper limit, the light transmission properties of the clad layers 11 and 12 may be too large, and the light transmission properties of the core portion 14 may be adversely affected.

  Further, the difference in refractive index between the minimum values Ts1 and Ts2 and the maximum value Tm in the core portion 14 is preferably as large as possible, but is preferably about 0.005 to 0.07, preferably 0.007 to 0.00. It is more preferably about 05, and further preferably about 0.01 to 0.05. Thereby, the above-described refractive index difference becomes necessary and sufficient for confining light in the core portion 14.

(Support film)
A support film 2 as shown in FIG. 1 may be laminated on the lower surface of the optical waveguide 1 as necessary.

  The support film 2 supports the lower surface of the optical waveguide 1 to protect and reinforce it. Thereby, the reliability and mechanical characteristics of the optical waveguide 1 can be improved.

  Examples of the constituent material of the support film 2 include various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, and metal materials such as copper, aluminum and silver. It is done. In the case of a metal material, a metal foil is preferably used as the support film 2.

  Moreover, although the average thickness of the support film 2 is not specifically limited, It is preferable that it is about 5-200 micrometers, and it is more preferable that it is about 10-100 micrometers. Thereby, since the support film 2 has moderate rigidity, the optical waveguide 1 is reliably supported and the flexibility of the optical waveguide 1 is difficult to be hindered.

  The support film 2 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like.

  Among these, as an adhesive layer, various hot-melt-adhesives (polyester type | system | group, modified olefin type | system | group) etc. are mentioned other than an acrylic adhesive, a urethane type adhesive agent, a silicone type adhesive agent, for example. Moreover, as a thing with especially high heat resistance, thermoplastic polyimide adhesive agents, such as a polyimide, a polyimide amide, a polyimide amide ether, a polyester imide, a polyimide ether, are used preferably. Since the adhesive layer made of such a material is relatively flexible, even if the shape of the optical waveguide 1 changes, the change can be freely followed. As a result, it is possible to reliably prevent peeling due to the shape change.

  The average thickness of such an adhesive layer is not particularly limited, but is preferably about 1 to 100 μm, and more preferably about 5 to 60 μm.

(Cover film)
On the other hand, you may make it laminate | stack the cover film 3 as shown in FIG. 1 on the upper surface of the optical waveguide 1 as needed.

  The cover film 3 protects the optical waveguide 1 and supports the optical waveguide 1 from above. Thereby, the optical waveguide 1 is protected from dirt and scratches, and the reliability and mechanical characteristics of the optical waveguide 1 can be improved.

  As a constituent material of such a cover film 3, it is the same as the constituent material of the support film 2. For example, in addition to various resin materials such as polyethylene terephthalate (PET), polyolefin such as polyethylene and polypropylene, polyimide and polyamide, Metal materials, such as copper, aluminum, silver, are mentioned. In the case of a metal material, a metal foil is preferably used as the cover film 3. Further, when a mirror is formed in the middle of the optical waveguide 1, light is transmitted through the cover film 3, so that the constituent material of the cover film 3 is preferably substantially transparent.

  Moreover, although the average thickness of the cover film 3 is not specifically limited, It is preferable that it is about 3-50 micrometers, and it is more preferable that it is about 5-30 micrometers. By setting the thickness of the cover film 3 within the above range, the cover film 3 has sufficient light transmittance in optical communication, and has sufficient rigidity to reliably protect the optical waveguide 1.

  Note that the cover film 3 and the optical waveguide 1 are bonded or bonded, and examples of the method include thermocompression bonding, bonding with an adhesive or a pressure sensitive adhesive, and the like. Of these, the adhesive described above can be used.

<Optical waveguide manufacturing method>
Next, an example of a method for producing the optical waveguide of the present invention will be described.

  The optical waveguide 1 can be manufactured by sequentially forming a composition for forming the cladding layer 11, a composition for forming the core layer 13, and a composition for forming the cladding layer 12. However, it can also be produced by simultaneously extruding the three compositions into three layers. The latter method will be described below.

  6 and 7 are diagrams showing an apparatus used for manufacturing the optical waveguide 1, and FIGS. 8 to 10 are diagrams for explaining a method of manufacturing the optical waveguide 1 shown in FIG. In the following description, the upper side in FIGS. 8 to 10 is referred to as “upper” and the lower side is referred to as “lower”.

  In the manufacturing method of the optical waveguide 1, [1] First, two types of optical waveguide forming compositions 901 and 902 (first composition and second composition) are extruded on a support substrate 951 in layers. Layer 910 is obtained. [2] Next, a portion of the layer 910 is irradiated with actinic radiation to cause a difference in refractive index, whereby the optical waveguide 1 is obtained.

Hereinafter, each process will be described sequentially.
[1] First, optical waveguide forming compositions 901 and 902 are prepared.
The optical waveguide forming compositions 901 and 902 each contain a polymer 915 and an additive 920 (including at least a monomer in the present embodiment), but the compositions thereof are different.

  Of the two types of compositions, the optical waveguide forming composition 901 is a material mainly for forming the core layer 13, and at least active monomer reaction occurs in the polymer 915 upon irradiation with actinic radiation, This is a material that causes a change in the refractive index distribution. That is, in the optical waveguide forming composition 901, the refractive index distribution changes due to the deviation in the ratio of the polymer 915 and the monomer, and as a result, the core portion 14 and the side cladding portion 15 are formed in the core layer 13. It is a material that can be used.

  On the other hand, the optical waveguide forming composition 902 is mainly a material for forming the cladding layers 11 and 12 and is made of a material having a lower refractive index than that of the optical waveguide forming composition 901.

  The difference in refractive index between the optical waveguide forming composition 901 and the optical waveguide forming composition 902 is determined by setting the composition of the polymer 915, the composition of the monomer, the abundance ratio of the polymer 915 and the monomer, and the like. It can be adjusted appropriately.

  For example, when the refractive index of the monomer is lower than that of the polymer 915, the content of the monomer in the composition is higher in the optical waveguide forming composition 902 than in the optical waveguide forming composition 901. On the other hand, when the refractive index of the monomer is higher than that of the polymer 915, the content of the monomer in the composition is higher in the optical waveguide forming composition 901 than in the optical waveguide forming composition 902. In other words, the composition of the polymer 915 and the additive 920 in each of the optical waveguide forming compositions 901 and 902 is appropriately selected according to the refractive indexes of the polymer 915 and the monomer.

  Further, in the optical waveguide forming composition 901 and the optical waveguide forming composition 902, it is preferable that the compositions are set so that the monomer contents are substantially equal to each other. By setting in this way, the difference in monomer content between the optical waveguide forming composition 901 and the optical waveguide forming composition 902 becomes small, so that the diffusion movement of the monomer triggered by this is suppressed. The As described above, the diffusion movement of the monomer is useful in forming the refractive index difference. However, when the content difference is large, it may be unavoidable that the monomer moves in an undesirable direction. In the multicolor extrusion molding method to be described later, since the refractive index distribution in the thickness direction of the layer 910 can be freely formed, the diffusion movement of the monomer may be suppressed at least in the thickness direction. Rather, it is preferable that unintentional monomer diffusion transfer in the thickness direction is suppressed. By suppressing the unintended diffusion movement of the monomer, the optical waveguide 1 having the refractive index distribution T having the target shape can be reliably manufactured.

  When the monomer content is substantially equal, the conditions of the polymer 915 or the monomer may be different between the optical waveguide forming composition 901 and the optical waveguide forming composition 902. Specifically, the composition of the polymer 915 to be used is different between the optical waveguide forming composition 901 and the optical waveguide forming composition 902, and the molecular weight and the degree of polymerization are different even if the composition is the same. Good. Further, the composition of the monomer used, that is, the refractive index may be varied. In this way, the optical waveguide forming composition 901 and the optical waveguide forming composition 902 have substantially the same monomer content, and a refractive index difference is formed between the two while suppressing the diffusion movement of the monomer. can do.

  Next, the optical waveguide forming compositions 901 and 902 are formed in layers on the support substrate 951 by a multicolor extrusion molding method.

  In the multicolor extrusion molding method, the optical waveguide forming composition 901 is extruded in three layers, and the optical waveguide forming composition 902 is extruded between these layers, thereby forming a multicolor molded body 914 having five layers at a time. To do. Specifically, in the multicolor molded body 914, an optical waveguide forming composition 901, an optical waveguide forming composition 902, an optical waveguide forming composition 901, an optical waveguide forming composition 902, and an optical waveguide forming composition. Since the object 901 is simultaneously extruded in this order from below, the optical waveguide forming composition 901 and the optical waveguide forming composition 902 are slightly turbid at the boundary between the compositions. Therefore, in the vicinity of the boundary between the compositions, a part of the optical waveguide forming composition 901 and a part of the optical waveguide forming composition 902 are mixed, and the mixing ratio continuously changes along the thickness direction. A region is formed. As a result, in the multicolor molded body 914, from the lower side of FIG. 8A, the first molded layer 914a mainly composed of the optical waveguide forming composition 901, the optical waveguide forming composition 901, and the optical waveguide forming composition. A second molding layer 914b made of a mixture of 902, a third molding layer 914c mainly made of an optical waveguide forming composition 902, and a fourth molding made of a mixture of the optical waveguide forming composition 901 and the optical waveguide forming composition 902. A layer 914d, a fifth molded layer 914e mainly composed of the optical waveguide forming composition 901, a sixth molded layer 914f composed mainly of a mixture of the optical waveguide forming composition 901 and the optical waveguide forming composition 902, and mainly formed an optical waveguide. A seventh molding layer 914g made of the composition 902, an eighth molding layer 914h made of a mixture of the optical waveguide forming composition 901 and the optical waveguide forming composition 902, and an optical waveguide type Ninth shaping layer 914i comprising a use composition 901, and which are laminated in this order.

  And the solvent in the obtained multicolor molded object 914 is evaporated (desolvation), and the layer 910 is obtained (refer FIG.8 (b)).

  The obtained layer 910 includes a clad layer 11 formed from a layer lower than the center portion of the third molding layer 914c and a seventh layer above the center portion of the third molding layer 914c from the lower side of FIG. This is a laminate of the core layer 13 formed from the layer below the center of the molding layer 914g and the clad layer 12 formed from the layer above the center of the seventh molding layer 914g.

  In the resulting layer 910, the polymer (matrix) 915 is present substantially uniformly and randomly, and the additive 920 is substantially uniformly and randomly dispersed in the polymer 915. Thereby, the additive 920 is substantially uniformly and randomly dispersed in the layer 910.

  The average thickness of the layer 910 is appropriately set according to the thickness of the optical waveguide 1 to be formed and is not particularly limited, but is preferably about 10 to 500 μm, and more preferably about 20 to 300 μm.

  For the support substrate 951, for example, a silicon substrate, a silicon dioxide substrate, a glass substrate, a polyethylene terephthalate (PET) film, or the like is used.

  By the way, the multicolor molded body 914 for obtaining such a layer 910 is manufactured using a die coater (multicolor extrusion molding apparatus) 800 as described below.

  FIG. 6 is a perspective view showing a die coater for obtaining a multicolor molded body 914, and FIG. 7 is an enlarged longitudinal sectional view showing a part of the die coater.

  As shown in FIG. 6, the die coater 800 has a die head 810 including an upper lip portion 811 and a lower lip portion 812 provided below the upper lip portion 811.

  The upper lip portion 811 and the lower lip portion 812 are each formed of a long block body and are overlapped with each other. A hollow manifold 820 is formed on the mating surfaces. The width of the manifold 820 is continuously expanded so as to increase toward the right side of the die head 810. On the other hand, the thickness of the manifold 820 is continuously reduced so as to decrease toward the right side of the die head 810. At the right end of the manifold 820, the width of the cavity is the maximum and the thickness is the minimum, and the slit 821 is formed.

  The die head 810 can extrude the optical waveguide forming compositions 901 and 902 supplied from the left side of the manifold 820 while forming the optical waveguide forming compositions 901 and 902 from the slit 821 to the right side. That is, the width and thickness of the multicolor molded body 914 are determined according to the shape of the slit 821.

  A mixing unit 830 is provided on the left side of the die head 810. The mixing unit 830 is configured by combining three systems of pipes for supplying the optical waveguide forming compositions 901 and 902 to the die head 810, respectively, and the first optical waveguide forming composition 902 is supplied to the die head 810. Supply pipe 831, and a second supply pipe 832 and a third supply pipe 833 that supply the optical waveguide forming composition 901 to the die head 810.

  In addition, the optical waveguide forming compositions 901 and 902 supplied from the first supply pipe 831, the second supply pipe 832, and the third supply pipe 833 merge at the connection portion 835 that is responsible for connection with the die head 810. , And supplied to the manifold 820 of the die head 810. Note that the second supply pipe 832 is branched into two in the middle, and is connected to the uppermost layer portion and the lowermost layer portion of the connection portion 835, respectively. On the other hand, the third supply pipe 833 is connected to the middle layer portion of the connection portion 835. Further, the first supply pipe 831 is also branched into two in the middle, between the uppermost layer portion and the middle layer portion (upper layer portion) of the connection portion 835 and between the lowermost layer portion and the middle layer portion (lower layer). Part).

  That is, in the connection part 835, the flow of one layer composed of the optical waveguide forming composition 901 is merged so as to be sandwiched between the two upper and lower layer flows composed of the optical waveguide forming composition 902. The outside is merged so as to be sandwiched between two upper and lower layers composed of the optical waveguide forming composition 901.

  At this time, the flow rate of the second supply pipe 832 connected to the uppermost layer and the lowermost layer is set to be smaller than that of the third supply pipe 833. Thereby, the first molding layer 914a and the ninth molding layer 914i are sufficiently thinner than the fifth molding layer e, and the refractive index of the lowermost layer portion and the lowermost layer portion is higher than the refractive index of the middle layer portion. Can be prevented.

  Further, the mixing unit 830 has a plurality of pins 836 provided at the junction of the first supply pipe 831 and the second supply pipe 832. These pins 836 have a long cylindrical shape, and are arranged so that the axes thereof and the extending directions of the first supply pipe 831 and the second supply pipe 832 are substantially orthogonal. In FIG. 7, these pins 836 are connected between the uppermost layer portion and the upper layer portion of the connection portion 835, between the upper layer portion and the middle layer portion, between the middle layer portion and the lower layer portion, and between the lower layer portion and the uppermost layer portion. Each is provided between the lower layer and the like. The number of pins 836 is not particularly limited, but is preferably 2 or more, more preferably about 3 to 10. Further, the pin 836 can be replaced with another structure (for example, mesh, punching metal, etc.) as long as it can cause turbulent flow between the optical waveguide forming compositions 901 and 902.

  On the right side of the die head 810, a transport unit 840 that transports the multicolor molded body 914 that has been subjected to multicolor extrusion molding is provided. The transport unit 840 includes a roller 841 and a transport film 842 that moves along the roller 841. The transport film 842 is transported from the lower side of FIG. 6 to the right side by the rotation of the roller 841. At that time, the multicolor molded body 914 is stacked on the roller 841. Thereby, it can convey to the right side, hold | maintaining the shape of the multicolor molded object 914. FIG.

Next, the operation of the die coater 800 will be described.
When the optical waveguide forming compositions 901 and 902 are simultaneously supplied to the mixing unit 830, a five-layer laminar flow is formed at the connection portion 835. When the optical waveguide forming compositions 901 and 902 merge at the connecting portion 835, the flow of the optical waveguide forming compositions 901 and 902 is disturbed by the action of the plurality of pins 836 provided in the merge portion. This disturbance obscures the boundary between the laminar flows, and a region where the optical waveguide forming composition 901 and the optical waveguide forming composition 902 are mixed is formed at the boundary.

  The laminar flow thus formed is expanded in the width direction and compressed in the thickness direction in the manifold 820 of the die head 810. As a result, as described above, the first molded layer 914a, the second molded layer 914b, the third molded layer 914c, the fourth molded layer 914d, the fifth molded layer 914e, the sixth molded layer 914f, the seventh molded layer 914g, A multicolor molded body 914 in which the eighth molded layer 914h and the ninth molded layer 914i are laminated in this order from below is formed. By using such a multicolor molded body 914, the optical waveguide 1 having the refractive index distribution T in the thickness direction described above is finally obtained.

  In addition, although the multicolor molded object 914 is formed on the conveyance film 842, this conveyance film 842 can also be utilized as the support substrate 951 mentioned above as it is further as the support film 2. FIG.

  In addition, the die coater 800 shown in FIG. 6 can form a layer 910 including one core layer 13, but if a plurality of core layers 13 are provided, the structure of the mixing unit 830 can be changed accordingly. Good. Specifically, the number of branches of the first supply pipe 831, the second supply pipe 832, and the third supply pipe 833 may be increased according to the number of core layers 13.

  The multicolor extrusion molding method and the die coater are examples of a method and an apparatus for producing a multicolor molded body 914. If the method and the apparatus can cause turbidity of the composition between layers, for example, an injection molding method is used. Various methods (apparatus) such as (apparatus), coating method (apparatus), and printing method (apparatus) can also be used.

Next, the polymer 915 and the additive 920 will be described.
(polymer)
The polymer 915 is a base polymer for the optical waveguide 1.

  The polymer 915 has sufficiently high transparency (colorless and transparent) and is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later. There are preferably used those having sufficient transparency even after the monomer is polymerized.

  Here, “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the polymer 915 in the optical waveguide forming compositions 901 and 902 or in the layer 910.

  Examples of such a polymer 915 include acrylic resins, methacrylic resins, polycarbonates, polystyrenes, cyclic ether resins such as epoxy resins and oxetane resins, polyamides, polyimides, polybenzoxazoles, polysilanes, polysilazanes, and silicones. Resin, fluorine resin, polyurethane, polyolefin resin, polybutadiene, polyisoprene, polychloroprene, polyester such as PET and PBT, polyethylene succinate, polysulfone, polyether, benzocyclobutene resin and norbornene resin, etc. These can be used in combination of one or more of them (polymer alloy, polymer blend (mixture), copolymer, etc.).

  Among these, (meth) acrylic resins, epoxy resins, silicone resins, polyimide resins, fluorine resins, or polyolefin resins are preferred, and (meth) acrylic resins or epoxy resins are preferred. A resin-based material is more preferable. By using these resins as the polymer 915, the optical waveguide 1 having excellent optical transmission performance can be obtained. Hereinafter, these resins will be described in detail.

((Acrylic polymer))
(Meth) acrylic polymers are acrylic monomers such as acrylic acid and acrylic esters, methacrylic monomers such as methacrylic acid and methacrylic esters, or derivatives thereof (for example, alkoxy derivatives, caprolactone derivatives, etc.) Is a polymer (including resin and rubber) obtained by polymerizing this raw material monomer.

  Therefore, as the (meth) acrylic polymer, a homopolymer obtained by polymerizing one of the raw material monomers, a copolymer obtained by polymerizing two or more different raw material monomers, the raw material monomer and another raw material monomer Examples thereof include copolymers formed by polymerization.

  Examples of such raw material monomers include monofunctional (meth) acrylate, bifunctional (meth) acrylate, trifunctional or higher polyfunctional (meth) acrylate, and the like.

  Examples of monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, and s-butyl. (Meth) acrylate, t-butyl (meth) acrylate, butoxyethyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, heptyl (meth) acrylate, octyl heptyl (meth) ) Acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, lauryl (meth) acrylate, tridecyl (meth) acrylate, tetradecyl (meth) acrylate Rate, pentadecyl (meth) acrylate, hexadecyl (meth) acrylate, stearyl (meth) acrylate, behenyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-chloro-2- Aliphatic (meth) acrylates such as hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, cyclopentyl (meth) acrylate, dicyclopentanyl (meth) Acrylate, dicyclopentenyl (meth) acrylate, isobornyl (meth) acrylate, 3-methyl-3-oxetanylmethyl (meth) acrylate, 1-adamantyl (meth) acrylate Cycloaliphatic (meth) acrylates such as salt, phenyl (meth) acrylate, nonylphenyl (meth) acrylate, p-cumylphenyl (meth) acrylate, o-biphenyl (meth) acrylate, 1-naphthyl (meth) acrylate, 2-naphthyl (meth) acrylate, benzyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 2-hydroxy-3- (o-phenylphenoxy) propyl (meth) acrylate, 2-hydroxy-3 -(1-naphthoxy) propyl (meth) acrylate, aromatic (meth) acrylate such as 2-hydroxy-3- (2-naphthoxy) propyl (meth) acrylate, 2-tetrahydrofurfuryl (meth) acrylate, N- (Meth) acryloyloxye And heterocyclic (meth) acrylates such as tilhexahydrophthalimide and 2- (meth) acryloyloxyethyl-N-carbazole.

  Examples of the bifunctional (meth) acrylate include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, and polyethylene glycol di ( (Meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tetrapropylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, 1,3 -Butanediol di (meth) acrylate, 2-methyl-1,3-propanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, ne Pentyl glycol di (meth) acrylate, 3-methyl-1,5-pentanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 2-butyl-2-ethyl-1,3-propanediol Fats such as di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, 1,10-decanediol di (meth) acrylate, glycerin di (meth) acrylate, tricyclodecane dimethanol (meth) acrylate Alicyclic (meth) acrylate, cyclohexanedimethanol (meth) acrylate, tricyclodecane dimethanol (meth) acrylate, hydrogenated bisphenol A di (meth) acrylate, hydrogenated bisphenol F di (meth) acrylate ( (Meth) acrylate, bispheno Such as aromatic A (meth) acrylate such as di- (meth) acrylate, bisphenol F di (meth) acrylate, bisphenol AF di (meth) acrylate, fluorene type di (meth) acrylate, and isocyanuric acid di (meth) acrylate And heterocyclic (meth) acrylates.

  Examples of the trifunctional or higher polyfunctional (meth) acrylates include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and pentaerythritol tetra (meth) acrylate. And aliphatic (meth) acrylates such as dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and heterocyclic (meth) acrylates such as isocyanuric acid tri (meth) acrylate.

  In addition, although it does not specifically limit as another raw material monomer superposed | polymerized with the said raw material monomer, For example, an acrylonitrile etc. are mentioned, When acrylic acid (methacrylic acid) type monomer is selected as said raw material monomer, these are superposed | polymerized. By doing so, an acrylic rubber is obtained.

  Examples of the raw material monomer include MMA monomer (manufactured by Kuraray or Mitsubishi Rayon), acrylate monomer (manufactured by Daicel Cytec), Blemmer (manufactured by NOF), acrylate monomer (manufactured by Nippon Shokubai), photocurability. Monomers / oligomers (manufactured by Shin-Nakamura Chemical Co., Ltd.), etc.

The weight average molecular weight of the (meth) acrylic polymer is not particularly limited, but is preferably about 2 × 10 ^{4 to} 3 × 10 ⁵ , and more preferably about 3 × 10 ⁴ to 2 × 10 ⁵ . By using such a (meth) acrylic polymer having a weight average molecular weight, compatibility with the monomer described later can be improved, and strength and flexibility of the core layer 13 can be improved.

  Here, the refractive index of each part of the core layer 13 is determined according to the relative magnitude relationship between the refractive index of the (meth) acrylic polymer and the refractive index of the monomer and the abundance ratio in each part. Therefore, the refractive index of each part of the core layer 13 can be adjusted by appropriately selecting the type of monomer to be used and the type of the (meth) acrylic polymer.

  In addition, the refractive index difference between the core portion 14 and the side cladding portion 15 can be easily adjusted by designing the structure of the (meth) acrylic polymer. For example, the (meth) acrylic polymer is designed to have a chemical structure having a main chain and a leaving group that is released from the main chain by actinic radiation 930 described later. In the (meth) acrylic polymer having such a chemical structure, the leaving group can be detached from the main chain by irradiation with the active radiation 930, and the refractive index thereof is changed.

  Examples of such a leaving group include those having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is sufficiently cleaved from the main chain by the action of actinic radiation 930 and easily separated from the main chain, but the molecular structure can be cleaved more easily by utilizing the action of a cation.

  Among these, as the leaving group that causes a decrease in the refractive index of the (meth) acrylic polymer by leaving, at least one of -Si-diphenyl structure and -O-Si-diphenyl structure is preferable.

  Moreover, as another leaving group, the substituent which has an acetophenone structure at the terminal is mentioned, for example. The molecular structure of this leaving group is sufficiently cleaved by the action of actinic radiation 930 and is easily detached from the main chain, but the molecular structure is more easily cleaved using the action of free radicals.

  The amount (number) of the leaving group is not particularly limited, but is preferably 10 to 80% by mass, and more preferably 20 to 60% by mass with respect to the total mass of the (meth) acrylic polymer. When the amount of the leaving group is within the above range, a (meth) acrylic polymer having an excellent refractive index modulation function (an effect of changing the refractive index difference) can be obtained, and the formed core layer 13 can be formed. Flexibility can also be improved.

  Such a (meth) acrylic polymer having a leaving group can be easily obtained by polymerizing the raw material monomer described above and a monomer having a leaving group introduced into the raw material monomer.

  Furthermore, a (meth) acrylic polymer having an epoxy group can also be used. By using such a (meth) acrylic polymer, it is possible to form the core layer 13 having excellent adhesion to the cladding layers 11 and 12.

  When obtaining this (meth) acrylic polymer, examples of the raw material monomer include glycidyl (meth) acrylate, α-ethylglycidyl (meth) acrylate, α-propylglycidyl (meth) acrylate, and α-butylglycidyl (meth) acrylate. 2-methylglycidyl (meth) acrylate, 2-ethylglycidyl (meth) acrylate, 2-propylglycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, 3,4-epoxyheptyl (meth) acrylate, α-ethyl-6,7-epoxyheptyl (meth) acrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, 3,4-epoxycyclohexylmethyl (meth) acryl , 3,4-epoxycyclohexylethyl (meth) acrylate, 3,4-epoxycyclohexylpropyl (meth) acrylate, 3,4-epoxycyclohexylbutyl (meth) acrylate, etc. Can be used.

  Further, as the raw material monomer, for example, EBECRYL (manufactured by Daicel Cytec), Denacol acrylate (manufactured by Nagase ChemteX), Neopol (manufactured by Nippon Iupika) and the like can be used. Furthermore, as the (meth) acrylic polymer having an epoxy group, for example, Blemmer (manufactured by NOF Corporation) can be used.

  Moreover, a fluorine-containing (meth) acrylic polymer can also be used. As a raw material monomer for obtaining this polymer, for example, METHACRYLATES CAS No. 1799-84-4 (2- (perfluorobutyl) ethyl methacrylate) manufactured by Daikin Industries Ltd., Unimatec Cheminox and the like can be used.

  Furthermore, a maleimide-modified acrylic polymer can also be used. As this polymer, for example, Aron Tac (manufactured by Toagosei) or the like can be used, and as a raw material monomer, for example, Aronix (manufactured by Toagosei) or the like can be used.

  In addition, as (meth) acrylic polymer, Sumipex MHF (manufactured by Sumitomo Chemical), silicone graft (meth) acrylic polymer, Cymac US-352 (manufactured by Toagosei), UV curable (meth) acrylic polymer 8KX-018C (manufactured by Taisei Fine Chemical Co., Ltd.) can be used.

  In addition, as raw material monomers, terminal acrylic polyether, Denacol acrylate DA-931 (manufactured by Nagase ChemteX), terminal methacryl silicone oil, BY167-152C (manufactured by Toray Dow Corning), aqueous acrylate, RD-180 (Manufactured by Mutual Chemical Industries), ABE-300 as bisphenol A diacrylate, A-BPEF (above, Shin-Nakamura Chemical Co., Ltd.) as full orange acrylate, Miramer HR-3700 (manufactured by Toyo Chemicals), benzyl A (meth) acrylate (made by Hitachi Chemical Co., Ltd.) etc. can be used.

((Epoxy polymer))
Epoxy polymers are particularly used as a polymer in the present invention because they are highly transparent, have excellent light transmission properties, and have excellent heat resistance and adhesion. In addition, the epoxy-based polymer is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later, and is sufficient even after the monomer reacts. Those having transparency are preferably used.

  Here, “having compatibility” means that at least a monomer is mixed and does not cause phase separation with the epoxy-based polymer in the optical waveguide forming compositions 901 and 902 and the layer 910.

  Furthermore, the epoxy polymer is a norbornene epoxy monomer, a silicon-containing epoxy monomer, an alicyclic epoxy monomer, a bisphenol type epoxy monomer, a fluorinated epoxy monomer, an aliphatic epoxy monomer, a naphthalene ring-containing epoxy monomer, an aromatic ring-containing epoxy monomer. A polymer (including resin and rubber) obtained by polymerizing this raw material monomer using an epoxy monomer or a derivative thereof as a raw material monomer.

  Therefore, as an epoxy polymer, a homopolymer obtained by polymerizing one of the above raw material monomers, a copolymer obtained by polymerizing two or more different raw material monomers, and the above raw material monomer and another raw material monomer are polymerized. And the like.

  Among such raw material monomers, examples of the norbornene-based epoxy monomer include those represented by the following formula (1).

  In addition, the compound represented by Formula (1) is epoxy norbornene, For example, ProNBAS EpNB can be used as such a compound. In addition, HP-7200HHH manufactured by DIC can be used as the dicyclopentadiene type epoxy monomer.

  Moreover, as a silicon-containing epoxy monomer, what is represented by the following formula | equation (2) or Formula (3) is mentioned, for example.

  In addition, the compound represented by Formula (2) is (gamma) -glycidoxy propyl trimethoxysilane, As this compound, Toray Dow Corning Z-6040 can be used, for example. Moreover, the compound represented by Formula (3) is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, and as this compound, for example, E0327 manufactured by Tokyo Chemical Industry can be used. In addition, SF8413, BY16-839, and SF8421 manufactured by Toray Dow Corning can be used.

  Furthermore, as an alicyclic epoxy monomer, what is represented by the following formula | equation (4)-Formula (6) is mentioned, for example.

  The compound represented by the formula (4) is 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate, and as this compound, for example, Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd. is used. can do. Further, the compound represented by the formula (5) is 1,2-epoxy-4-vinylcyclohexane. As this compound, for example, Celoxide 2000 manufactured by Daicel Chemical Industries, Ltd. can be used. Further, the compound represented by the formula (6) is 1,2: 8,9 diepoxy limonene, and as this compound, for example, (Celoxide 3000 manufactured by Daicel Chemical Industries, Ltd.) can be used. In addition, Celoxide 2081 manufactured by Daicel Chemical Industries, Ltd. can also be used.

  Examples of the bisphenol type epoxy monomer include bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, and those represented by the following formula (7).

In addition, as a compound represented by Formula (7), specifically, for example, bisphenoxyethanol fluorenediglycidyl ether (in Formula (7), n = 1, and R _{1 to} R ₆ are all hydrogen atoms) Bisphenol fluorenediglycidyl ether (in formula (7), n = 0, R _{1 to} R ₆ are all hydrogen atoms), and the like. In addition, YS-128S and YD-020G manufactured by Nippon Steel Chemical Co., Ltd. can be used as bis A type epoxy monomers, and ST-3000 and ST-4000D manufactured by Nippon Steel Chemical Co., Ltd. can be used as hydrogenated bis A type epoxy monomers. .

  Furthermore, as a fluorinated epoxy monomer, what is represented by the following formula | equation (8) is mentioned, for example. In addition, Daikin Industries 'EPOXIDES CAS No.74328-56-6 (1,6-bis (2', 3'-epoxypropyl) -perfluoro-n-hexane), EPOXIDES CAS No.791-22-0 (1, 4-bis (2 ′, 3′-epoxypropyl) -perfluoro-n-butane) can also be used.

  Moreover, as an aliphatic epoxy monomer, what is represented by the following formula | equation (9) is mentioned, for example. In addition, Denasel EX-850L and Denacol EX-216L manufactured by Nagase ChemteX can be used as the polyfunctional aliphatic epoxy monomer.

  Furthermore, as a naphthalene ring containing epoxy monomer, what is represented by the following formula | equation (10) is mentioned, for example.

［式（７）中、Ｒ_１〜Ｒ_４は、それぞれ独立して、水素原子または炭素数１〜６のアルキル基である。また、Ｒ_５、Ｒ_６は、それぞれ独立して、水素原子またはメチル基である。さらに、各ｎは、それぞれ独立して、０〜１０の整数を表わす。］

[In Formula (7), R < ₁ > -R < ₄ > is a hydrogen atom or a C1-C6 alkyl group each independently. R ₅ and R ₆ are each independently a hydrogen atom or a methyl group. Further, each n independently represents an integer of 0 to 10. ]

［式（８）中、ｎは、２〜１０の整数を表わす。］

[In Formula (8), n represents the integer of 2-10. ]

［式（９）中、ｎは、２〜１０の整数を表わす。］

[In formula (9), n represents an integer of 2 to 10. ]

［式（１０）中、Ｒは、水素原子、炭素数１〜４のアルキル基、またはフェニル基を表わす。］

[In Formula (10), R represents a hydrogen atom, a C1-C4 alkyl group, or a phenyl group. ]

  In addition to the above, as an epoxy polymer or raw material monomer, Epicoat (manufactured by Japan Epoxy Resin), phenoxy resin YP series, novolac type epoxy resin YDCN series (above, manufactured by Nippon Steel Chemical Co., Ltd.), Ogsol EG (Osaka Gas) Chemical), Biphenyl type epoxy resin YX-4000H (Mitsubishi Chemical), Rica Resin (Nippon Nippon Chemical Co., Ltd.), Silicone modified epoxy (Shin-Etsu Chemical or Toray Dow Corning), Denacol (Nagase ChemteX), Fluorine Epoxy (made by Daikin Industries), ARUFON UG-4000, 4035, 4040 (made by Toagosei), Aron Oxetane OXT-213, 221, 211 (made by Toagosei) and the like can be used.

  When the epoxy polymer is a copolymer obtained by polymerizing the raw material monomer and another raw material monomer, the other raw material monomer is not particularly limited as long as it is of a different type from the raw material monomer, For example, what is illustrated with the monomer contained in the additive 920 mentioned later can be used.

The weight average molecular weight of the epoxy-based polymer is not particularly limited, is preferably from 2 × ¹⁰ 4 ~3 × ¹⁰ about ^5, more preferably 3 × ¹⁰ 4 ~2 × ¹⁰ about ^5. By using an epoxy-based polymer having such a weight average molecular weight, compatibility with a monomer described later can be enhanced, and strength and flexibility of the core layer 13 can be improved.

  Here, the refractive index of each part of the core layer 13 is determined according to the relative size relationship between the refractive index of the epoxy polymer and the refractive index of the monomer and the abundance ratio in each part. Therefore, the refractive index of each part of the core layer 13 can be adjusted by appropriately selecting the type of monomer to be used and the type of epoxy polymer.

  Also, the refractive index difference between the core portion 14 and the side cladding portion 15 can be easily adjusted by designing the structure of the epoxy polymer. For example, the epoxy polymer is designed to have a chemical structure having a main chain and a leaving group that is released from the main chain by actinic radiation 930 described later. In an epoxy polymer having such a chemical structure, the leaving group can be detached from the main chain by irradiation with actinic radiation 930, and its refractive index changes.

  Examples of such a leaving group include those having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is sufficiently cleaved from the main chain by the action of actinic radiation 930 and easily separated from the main chain, but the molecular structure can be cleaved more easily by utilizing the action of a cation.

  Among these, as the leaving group that causes a decrease in the refractive index of the epoxy-based polymer by leaving, at least one of -Si-diphenyl structure and -O-Si-diphenyl structure is preferable.

  Moreover, as another leaving group, the substituent which has an acetophenone structure at the terminal is mentioned, for example. The molecular structure of this leaving group is sufficiently cleaved by the action of actinic radiation 930 and is easily detached from the main chain, but the molecular structure is more easily cleaved using the action of free radicals.

  The amount (number) of the leaving group is not particularly limited, but is preferably 10 to 80% by weight and more preferably 20 to 60% by weight based on the total weight of the epoxy polymer. When the amount of the leaving group is within the above range, an epoxy polymer having an excellent refractive index modulation function (an effect of changing the refractive index difference) can be obtained, and the flexibility of the core layer 13 to be formed can be improved. Improvements can also be made.

  Such an epoxy-based polymer having a leaving group can be easily obtained by polymerizing the raw material monomer described above and a monomer having a leaving group introduced into the raw material monomer.

  Furthermore, an epoxy-based polymer having an epoxy group can also be used. By using such an epoxy polymer, it becomes possible to form the core layer 13 having excellent adhesion to the cladding layers 11 and 12.

((Silicone polymer))
Silicone polymers are used as the polymers in the present invention because they are particularly highly transparent, have excellent light transmission properties, and have excellent heat resistance, light stability, and electrical insulation. In addition, the silicone polymer has compatibility with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later, and is sufficient even after the monomer reacts. Those having transparency are preferably used.

  Here, “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the silicone polymer in the optical waveguide forming compositions 901 and 902 and the layer 910.

  Furthermore, the silicone-based polymer is a polymer (including resin and rubber) obtained by polymerizing (hydrolyzing / condensing or condensing) this raw material monomer using organoalkoxysilane or a derivative thereof as a raw material monomer.

  Therefore, as a silicone polymer (polyorganosiloxane), a homopolymer obtained by polymerizing one of the above raw material monomers, a copolymer obtained by polymerizing two or more different raw material monomers, the above raw material monomer and other raw material monomers And a copolymer obtained by polymerizing and the like.

  The organoalkoxysilane used as a raw material monomer (silicone monomer) is not particularly limited, and examples thereof include those represented by the following formula (11).

［式（１１）中、Ｒ^１、Ｒ^３は、それぞれ独立して、一価の有機基である。また、Ｒ^２は、アルキル基またはアルコキシアルキル基である。さらに、ｍは、０または１であり、ｎは、０〜３の整数を表わす。］

[In Formula (11), R ¹ and R ³ are each independently a monovalent organic group. R ² is an alkyl group or an alkoxyalkyl group. Furthermore, m is 0 or 1, and n represents an integer of 0 to 3. ]

In formula (11), R ¹ and R ³ (monovalent organic group) are each independently an alkyl group such as a methyl group, an ethyl group, a propyl group or a butyl group, vinyl Group, alkenyl group such as allyl group, aryl group such as phenyl group and tolyl group, aralkyl group such as naphthyl group and phenethyl group, halogenated alkyl group, halogenated aryl group and carbon atoms in these organic groups Examples thereof include a nitrogen atom, an oxygen atom, a silicon atom, a sulfur atom, a phosphorus atom, or an atomic group containing these atoms.

R ² is specifically an alkyl group such as a methyl group, an ethyl group, a propyl group, or a butyl group, a methoxymethyl group, an ethoxymethoxy group, a propoxymethoxy group, a methoxyethoxy group, an ethoxyethoxy group, or a propoxyethoxy group. And an alkoxyalkyl group such as a butoxyethoxy group.

  Specific examples of the organoalkoxysilane represented by the above formula (11) include isopropyltrimethoxysilane, neopentyltrimethoxysilane, allyltrimethoxysilane, 4-vinylphenyltrimethoxysilane, and trimethylsilylmethyl. Trimethoxysilane, isobutyltriethoxysilane, ethynyltrimethoxysilane, diethynyldimethoxysilane, 4-vinylphenyltriethoxysilane, trimethylsilylmethyltriethoxysilane, isopropyltripropoxysilane, cyclopentyltriisopropoxysilane, neopentylriboxysilane, Isopropylmethyldimethoxysilane, methylneopentyldimethoxysilane, cyclohexylmethyldimethoxysilane, methylcyclopentyldimeth Sisilane, allylmethyldimethoxysilane, (4-chlorophenyl) methyldimethoxysilane, ethylpropyldimethoxysilane, ethylisopentyldimethoxysilane, ethylneopentyldimethoxysilane, ethylcyclopentyldimethoxysilane, phenylethyldimethoxysilane, ethyl-3,3,3 -Trifluoropropyldimethoxysilane, butylpropyldimethoxysilane, sec-butylpropyldimethoxysilane, pentylpropyldimethoxysilane, hexylpropyldimethoxysilane, 3-chloropropylpropyldimethoxysilane, 3-bromopropylpropyldimethoxysilane, isopropyl-sec-butyl Dimethoxysilane, isopropylcyclopentyldimethoxysilane, isopropylvinyldimethoxy Run, cyclopentylisobutyldimethoxysilane, dihexyldimethoxysilane, dicyclopentyldimethoxysilane, bis (trimethylsilylmethyl) dimethoxysilane, 3,3,3-trifluoropropylhexyldimethoxysilane, sec-butylmethyldiethoxysilane, ethylpropyldiethoxysilane , Ethyl-tert-butyldiethoxysilane, dipropyldiethoxysilane, diisopropyldiethoxysilane, diisopropylbutylethoxysilane, dicyclopentyldiethoxysilane, 4-methoxyphenylvinyldiethoxysilane, isobutyldimethylmethoxysilane, tert-butyldimethyl Methoxysilane, (4-chlorophenyl) dimethylmethoxysilane, dimethyl-2-thienylmethoxysilane, Propylmethoxysilane, tributylmethoxysilane, isobutyldimethylethoxysilane, allyldimethylethoxysilane, triethylethoxysilane, phenyldiethylethoxysilane, dipropylisobutylethoxysilane, diphenylmethylethoxysilane, allyldimethylpropoxysilane, triethylpropoxysilane, diphenylmethyl Butoxysilane, 1,4-bis (methyldimethoxysilyl) phenylene, 2-aminoethylaminomethyltrimethoxysilane, 3-aminopropyldimethylethoxysilane, 2- (2-aminoethylthioethyl) triethoxysilane, β- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, and the like.

  When the silicone polymer is a copolymer obtained by polymerizing the raw material monomer (organoalkoxysilane) and another raw material monomer, the other raw material monomer may be of a different type from the raw material monomer, Although it does not specifically limit, For example, what is illustrated with the monomer contained in the additive 920 mentioned later can be used.

The weight average molecular weight of the silicone-based polymer is not particularly limited, is preferably from 2 × ¹⁰ 4 ~3 × ¹⁰ about ^5, more preferably 3 × ¹⁰ 4 ~2 × ¹⁰ about ^5. By using a silicone-based polymer having such a weight average molecular weight, compatibility with the monomer described later can be enhanced, and strength and flexibility of the core layer 13 can be improved.

  Here, the refractive index of each part of the core layer 13 is determined in accordance with the relative magnitude relationship between the refractive index of the silicone-based polymer and the refractive index of the monomer and the abundance ratio in each part. Therefore, the refractive index of each part of the core layer 13 can be adjusted by appropriately selecting the type of monomer used and the type of silicone polymer.

  Further, as described above, the silicone-based polymer is obtained by hydrolysis / condensation or condensation of an organoalkoxysilane or a derivative thereof. Therefore, in the molecular structure, an —O— structure, an —Si-aryl structure is included. And at least one of —O—Si— structures. Therefore, the portion having such a structure functions as a leaving group that is released from the main chain by actinic radiation 930 described later, and the refractive index can be changed by the elimination of the leaving group from the main chain. Therefore, also from this point, the refractive index difference between the core portion 14 and the side cladding portion 15 can be adjusted.

  The leaving group that causes a decrease in the refractive index of the silicone polymer upon leaving is preferably at least one of -Si-diphenyl structure and -O-Si-diphenyl structure.

  Moreover, as another leaving group, the substituent which has an acetophenone structure at the terminal is mentioned, for example. The molecular structure of this leaving group is sufficiently cleaved by the action of actinic radiation 930 and is easily detached from the main chain, but the molecular structure is more easily cleaved using the action of free radicals.

  The amount (number) of the leaving group is not particularly limited, but is preferably 10 to 80% by weight, more preferably 20 to 60% by weight based on the total weight of the silicone polymer. When the amount of the leaving group is within the above range, a silicone polymer having an excellent refractive index modulation function (effect of changing the refractive index difference) can be obtained, and the flexibility of the core layer 13 to be formed can be improved. Improvements can also be made.

  In addition, when the thing which has an epoxy group is used as a silicone type polymer, it becomes possible to form the core layer 13 excellent in adhesiveness with respect to the cladding layers 11 and 12. FIG.

((Polyimide polymer))
The polyimide polymer is particularly high in transparency, has excellent light transmission properties, and further has excellent heat resistance, light stability, mechanical properties, adhesion, and electrical insulation. Used as In addition, the polyimide-based polymer is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later, and is sufficient even after the monomer reacts. Those having transparency are preferably used.

  Here, “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the polyimide polymer in the optical waveguide forming compositions 901 and 902 and the layer 910.

  Furthermore, a polyimide-type polymer is a polymer containing the polyimide (oligomer) formed by heating and hardening (imidation) the polyamic acid obtained by making tetracarboxylic anhydride and diamine react.

  Therefore, as the polyimide polymer, a homopolymer obtained by polymerizing one kind of the above polyimide, a block copolymer obtained by polymerizing two or more kinds of the above polyimide, a block copolymer obtained by polymerizing the above polyimide and another oligomer, etc. Is mentioned.

  Although it does not specifically limit as a tetracarboxylic anhydride and diamine used in order to obtain such a polyimide, For example, the following are mentioned.

  That is, examples of the tetracarboxylic acid anhydride include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, and 2,2-bis (2,3-dicarboxyphenyl). ) Propane dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3,4-dicarboxyphenyl) sulfone Those having no fluorine atom in the molecule such as acid dianhydride, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 4,4-bis (3,4- Dicarboxytrifluorophenoxy) tetrafluorobenzene dianhydride, 1,4-bis (3,4-dicarboxytrifluorophenoxy) tetrafluorobenzene dianhydride, Fluoromethyl) bimellitic dianhydride, di (trifluoromethyl) pyromellitic dianhydride, di (heptafluoropropyl) pyromellitic dianhydride containing fluorine atoms in the molecule Of these, one or two or more of these can be used in combination.

  Examples of the diamine include m-phenylenediamine, 4,4′-diaminodiphenyl ether, 3,3′-diaminodiphenyl ether, bis (3-aminophenyl) sulfide, and (3-aminophenyl) (4-aminophenyl). Sulfide, bis (3-aminophenyl) sulfoxide, (3-aminophenyl) (4-aminophenyl) sulfoxide, bis (4-aminophenyl) sulfone, (3-aminophenyl) (4-aminophenyl) sulfone, 3, 4′-diaminobenzophenone, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 4,4′-bis (3-aminophenoxy) biphenyl, bis [4- (4-Aminophenoxy) phenyl] ketone, bis [4- (3-aminophenoxy) ) Phenyl] sulfide, bis [4- (3-aminophenoxy) phenyl] sulfoxide, bis [4- (3-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] ether, 4,4 '-Diamino-5,5'-diphenoxybenzophenone, 3,3'-diamino-4-phenoxybenzophenone, 3,4'-diamino-4,5'-dibiphenoxybenzophenone, 3,3'-diamino-4- Biphenoxybenzophenone, such as those containing no fluorine atom in the molecule, 2,2′-bis (trifluoromethyl) -4,4′-diaminobiphenyl, 2-trifluoromethyl-4,4′- Diaminodiphenyl ether, 2′-trifluoromethyl-3,4′-diaminodiphenyl ether, 2,2-bis (3-aminopheny ) -1,1,1,3,3,3-hexafluoropropane, 1,3-bis (3-aminophenoxy) -4-trifluoromethylbenzene, 1,3-bis (3-amino-5- Trifluoromethylphenoxy) benzene, 1,3-bis (3-amino-5-trifluoromethylphenoxy) -5-trifluoromethylbenzene, 1,4-bis (4-amino-2-trifluoromethylphenoxy) benzene , 2,2-bis [4- (3-aminophenoxy) phenyl) -1,1,1,3,3,3-hexafluoropropane and the like containing a fluorine atom in the molecule, etc. One or more of these can be used in combination.

  In addition, when the polyimide-based polymer is a block copolymer obtained by polymerizing the polyimide (oligomer) and another oligomer, the other oligomer is not particularly limited as long as it is of a type different from the polyimide, For example, at least one of (meth) acrylic oligomers, epoxy oligomers, and silicone oligomers (organosiloxane oligomers) can be used.

The weight average molecular weight of the polyimide-based polymer is not particularly limited, is preferably from 2 × ¹⁰ 4 ~1 × ¹⁰ about ^6, more preferably 2 × ¹⁰ 5 ~4 × ¹⁰ about ^5. By using a polyimide polymer having such a weight average molecular weight, compatibility with the monomer described later can be enhanced, and strength and flexibility of the core layer 13 can be improved.

  Here, the refractive index of each part of the core layer 13 is determined in accordance with the relative magnitude relationship between the refractive index of the polyimide-based polymer and the refractive index of the monomer in each part and the existence ratio thereof. Therefore, the refractive index of each part of the core layer 13 can be adjusted by appropriately selecting the type of monomer used and the type of polyimide-based polymer.

  In addition, the refractive index difference between the core portion 14 and the side cladding portion 15 can be easily adjusted by designing the structure of the polyimide polymer. For example, the polyimide polymer is designed to have a chemical structure having a main chain and a leaving group that is released from the main chain by actinic radiation 930 described later. In a polyimide polymer having such a chemical structure, the leaving group can be detached from the main chain by irradiation with actinic radiation 930, and its refractive index changes.

  Examples of such a leaving group include those having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is sufficiently cleaved from the main chain by the action of actinic radiation 930 and easily separated from the main chain, but the molecular structure can be cleaved more easily by utilizing the action of a cation.

  Among these, as the leaving group that causes a decrease in the refractive index of the polyimide-based polymer by leaving, at least one of the -Si-diphenyl structure and the -O-Si-diphenyl structure is preferable.

  Moreover, as another leaving group, the substituent which has an acetophenone structure at the terminal is mentioned, for example. The molecular structure of this leaving group is sufficiently cleaved by the action of actinic radiation 930 and is easily detached from the main chain, but the molecular structure is more easily cleaved using the action of free radicals.

  The amount (number) of the leaving group is not particularly limited, but is preferably 10 to 80% by weight, more preferably 20 to 60% by weight based on the total weight of the polyimide polymer 915. When the amount of the leaving group is within the above range, the polyimide polymer 915 having an excellent refractive index modulation function (an effect of changing the refractive index difference) can be obtained, and the flexibility of the core layer 13 to be formed is provided. Can also be improved.

  Such a polyimide-based polymer having a leaving group can be easily obtained by, for example, using this as a block copolymer obtained by polymerizing the above polyimide (oligomer) and an organosiloxane oligomer as another oligomer.

((Fluoropolymer))
The fluorine-based polymer is particularly used as a polymer in the present invention because it has high transparency, excellent light transmission properties, and excellent mechanical properties and moisture absorption resistance. In addition, the fluorine-based polymer is compatible with the monomer described later, and among them, the monomer can react (polymerization reaction or crosslinking reaction) as described later, and is sufficient even after the monomer reacts. Those having transparency are preferably used.

  Here, “having compatibility” means that at least the monomer is mixed and does not cause phase separation with the fluoropolymer in the optical waveguide forming compositions 901 and 902 or in the layer 910.

  Further, the fluorine-based polymer is a polymer containing a fluorine atom in its molecular structure. In the present invention, the fluorine-based polymer includes an aliphatic ring structure, an imide ring structure, a triazine ring structure, a benzoxazole structure, and It has at least one kind of ring structure among aromatic ring structures, and preferably contains a fluorine atom in the structure. Among these, a polymer having an aliphatic ring structure as a main chain is particularly preferable. Thereby, the layer 910 obtained from the optical waveguide forming compositions 901 and 902 can have a more uniform film thickness.

  A polymer having an aliphatic ring structure as a main chain (hereinafter sometimes referred to as “fluorinated aliphatic ring structure polymer”) is a monomer having a ring structure containing a fluorine atom, a fluorine atom and two or more fluorine atoms. A monomer having a polymerizable unsaturated bond can be used as a raw material monomer to polymerize this raw material monomer.

  Therefore, the fluorine-containing aliphatic ring structure polymer includes a homopolymer obtained by polymerizing one of the raw material monomers, a copolymer obtained by polymerizing two or more different raw material monomers, the raw material monomer and other raw material monomers. And the like.

  In the present specification, the fluorine-containing aliphatic ring structure polymer is mainly composed of a plurality of aliphatic ring structures, and one or more carbon atoms constituting this aliphatic ring structure. A fluorine atom or an atomic group containing a fluorine atom is bonded.

  Specific examples of such a fluorinated alicyclic polymer include those having structural units (repeating units) as listed in the following formulas (12) to (16) in the main chain.

［上記各式中、ｌは０〜５、ｍは０〜４、ｎは０〜１、ｌ＋ｍ＋ｎは１〜６、ｏ、ｐ、ｑは、それぞれ独立して、０〜５、ｏ＋ｐ＋ｑは１〜６であり、Ｒ^１、Ｒ^２およびＲ^３は、それぞれ独立して、Ｆ、Ｃｌ、ＣＦ_３、Ｃ_２Ｆ_５、Ｃ_３Ｆ_７またはＯＣＦ_３であり、Ｘ^１およびＸ^２は、それぞれ独立して、ＦまたはＣｌである。］

[In the above formulas, l is 0-5, m is 0-4, n is 0-1, 1 + m + n is 1-6, o, p, q are each independently 0-5, o + p + q is 1-6. 6, R ¹ , R ² and R ³ are each independently F, Cl, CF ₃ , C ₂ F ₅ , C ₃ F ₇ or OCF ₃ , and X ¹ and X ² are each independently F or Cl. ]

  In order to obtain the fluorine-containing aliphatic ring structure polymer having such a configuration, examples of the monomer (monomer) having a ring structure containing a fluorine atom include perfluoro (2,2-dimethyl-1,3-dioxole). , Perfluoro (2-methyl-1,3-dioxole), perfluoro (2-ethyl-2propyl-1,3-dioxole), perfluoro (2,2-dimethyl-4methyl-1,3-dioxole), etc. Those having perfluorodioxoles in which a fluorine-substituted alkyl group such as a fluorine atom, a trifluoromethyl group, a pentafluoroethyl group or a heptafluoropropyl group is bonded to a dioxole ring member carbon, or perfluoro (4-methyl-2 -Methylene-1,3-dioxolane), perfluoro (2-methyl-1,4-dioxin) and the like Such as those comprising a fluorine alicyclic structure and the like, can be used singly or in combination of two or more of them.

  Moreover, as a monomer (monomer) provided with a fluorine atom and two or more polymerizable unsaturated bonds, for example, perfluoro (3-oxa-1,5-hexadiene), perfluoro (3-oxa-1,6- Heptadiene), perfluoro (4-methyl-3-oxa-1,6-heptadiene), perfluoro (4-chloro-3-oxa-1,6-heptadiene), perfluoro (4-methoxy-3-oxa-1,6) -Heptadiene), perfluoro (5-methyl-3-oxa-1,6-heptadiene), and the like, and one or more of these can be used in combination.

  In addition, the fluorine-containing aliphatic ring structure polymer uses, as a raw material monomer, both a monomer having a ring structure containing a fluorine atom and a monomer having a fluorine atom and two or more polymerizable unsaturated bonds, These can also be obtained by copolymerizing them.

  Further, when the fluorine-containing aliphatic ring structure polymer is a copolymer obtained by polymerizing the above raw material monomer and another raw material monomer, examples of the other raw material monomer include tetrafluoroethylene, chlorotrifluoroethylene, perfluoro In addition to radically polymerizable monomers such as (methyl vinyl ether), those exemplified as monomers contained in the additive 920 described later can be used.

The weight average molecular weight of the fluorine-based polymer is not particularly limited, is preferably from 2 × ¹⁰ 4 ~3 × ¹⁰ about ^5, more preferably 3 × ¹⁰ 4 ~2 × ¹⁰ about ^5. By using such a fluorine-based polymer having a weight average molecular weight, compatibility with the monomer described later can be enhanced, and strength and flexibility of the core layer 13 can be improved.

  Here, the refractive index of each part of the core layer 13 is determined according to the relative magnitude relationship between the refractive index of the fluorine-based polymer and the refractive index of the monomer and the abundance ratio in each part. Therefore, the refractive index of each part of the core layer 13 can be adjusted by appropriately selecting the type of monomer used and the type of fluoropolymer.

  Also, the refractive index difference between the core portion 14 and the side cladding portion 15 can be easily adjusted by designing the structure of the fluoropolymer. For example, the fluorine-based polymer is designed to have a chemical structure having a main chain and a leaving group that is released from the main chain by actinic radiation 930 described later. In the fluorine-based polymer having such a chemical structure, the leaving group can be detached from the main chain by irradiation with actinic radiation 930, and its refractive index changes.

  Examples of such a leaving group include those having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in a molecular structure. Such a leaving group is sufficiently cleaved from the main chain by the action of actinic radiation 930 and easily separated from the main chain, but the molecular structure can be cleaved more easily by utilizing the action of a cation.

  Among these, as the leaving group that causes a decrease in the refractive index of the fluoropolymer upon leaving, at least one of a -Si-diphenyl structure and an -O-Si-diphenyl structure is preferable.

  Moreover, as another leaving group, the substituent which has an acetophenone structure at the terminal is mentioned, for example. The molecular structure of this leaving group is sufficiently cleaved by the action of actinic radiation 930 and is easily detached from the main chain, but the molecular structure is more easily cleaved using the action of free radicals.

  The amount (number) of the leaving group is not particularly limited, but is preferably 10 to 80% by weight, and more preferably 20 to 60% by weight with respect to the total weight of the fluoropolymer. When the amount of the leaving group is within the above range, a fluorine-based polymer having an excellent refractive index modulation function (an effect of changing the refractive index difference) can be obtained, and the flexibility of the core layer 13 to be formed can be improved. Improvements can also be made.

  In addition, such a fluorine-based polymer having a leaving group can be easily obtained by polymerizing the raw material monomer described above and a monomer having a leaving group introduced into the raw material monomer.

((Polyolefin polymer))
Examples of the polyolefin polymer include ethylene, propylene, 1-butene, cis-2-butene, trans-2-butene, isobutene, 1-pentene, 2-pentene, 2-methyl-1-butene, and 3-methyl-1. -Monoolefin monomers such as butene, 2,3-dimethyl-2-butene, 1-butene, 1-hexene, 1-octene, 1-nonene, 1-decene, allene, methylallene, butadiene, 2,3 -Polymers (including resins and rubbers) obtained by polymerizing raw material monomers using diene monomers such as dimethylbutadiene, 1,3-pentadiene, 1,4-pentadiene, chloroprene and 1,5-hexadiene. .)

  The polyolefin-based polymer includes a homopolymer obtained by polymerizing one of the raw material monomers, a copolymer obtained by mixing two or more different raw material monomers, and the raw material monomer and another raw material monomer. And the like.

  Further, other raw material monomers to be polymerized with the above raw material monomers are not particularly limited. For example, styrene, α-methyl styrene, o-methyl styrene, p-methyl styrene, m-methyl styrene, o-ethyl styrene, p -Aromatic vinyl monomers such as t-butylstyrene, chlorostyrene, chloromethylstyrene, bromostyrene, (meth) acrylonitrile, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, (meth ) Vinyl monomers such as butyl acrylate, allyl (meth) acrylate, N-phenylmaleimide, N-methylmaleimide, butyl acetate, vinyl acetate, isopropenyl acetate, vinyl chloride and vinyl ether.

  Examples of the polymer obtained by polymerizing the above raw material monomers include polystyrene, styrene-butadiene copolymer, vinyl acetate or a hydrolyzate thereof, polyvinyl alcohol, polyacetal, polybutyral, polyvinyl chloride, vinyl chloride / vinyl acetate copolymer. Examples include coalescence.

  Another raw material monomer may be a monomer having a chemical structure that is partially photoisomerized or photodimerized by irradiation with actinic radiation 930. In a polyolefin-based polymer having such a chemical structure, irradiation with actinic radiation 930 causes photoisomerization or photodimerization, and its refractive index changes. Photoisomerization is a phenomenon in which cis-trans isomerization, photo-Fries rearrangement, and decarboxylation are caused by irradiation with actinic radiation, and photodimerization is a phenomenon in which bonds are formed between adjacent double bonds. .

  Examples of such a chemical structure for photoisomerization or photodimerization include N = N group such as azobenzene group, azonaphthalene group, aromatic heterocyclic azo group, bisazo group, formazan group, maleimide group, indene group, C = C groups such as coumarin groups, cinnamate groups, polyene groups, stilbene groups, stilbazole groups, stilbazolium groups, cinnamoyl groups, hemithioindigo groups, chalcone groups, aromatic Schiff bases, and aromatic hydrazone structures. Examples thereof include C═O groups such as N group, benzophenone group and anthraquinone group, ester groups such as allyl ester group, acylphenol structure and the like, and at least one of them is used. In particular, at least one of an azobenzene group, a maleimide group, a coumarin group, a cinnamoyl group, and an indene group is preferably used.

  Examples of the compound having the above chemical structure include, for example, Imilex (manufactured by Nippon Shokubai), aliphatic bismaleimide (manufactured by DMI), Aronix (manufactured by Toagosei), bismaleimides (manufactured by Kay Aikasei), methylcinnamate (Inoue Fragrance Factory), 2-methoxyhexyl paramethoxycinnamate and the like.

(Additive)
In the present embodiment, the additive 920 includes a monomer in both the optical waveguide forming composition 901 and the optical waveguide forming composition 902. In the present embodiment, the additive 920 in the optical waveguide forming composition 901 further includes a polymerization initiator, while the additive 920 in the optical waveguide forming composition 902 includes a polymerization initiator. Not.

((monomer))
The monomer (photopolymerizable monomer) reacts in the irradiated region by irradiation with actinic radiation, which will be described later, to form a reaction product, and the monomer diffuses and moves with it, so that the layer 910 has an irradiated region and an unirradiated region. It is a compound that can cause a difference in refractive index between them.

  As a reaction product of the monomer, a polymer (polymer) formed by polymerizing the monomer in the polymer 915, a cross-linked structure in which the monomer cross-links the polymers 915, and a polymer 915 obtained by polymerizing the monomer to the polymer 915. At least one of the branched structures branched from.

  By the way, the difference in refractive index generated between the irradiated region and the non-irradiated region is generated based on the difference between the refractive index of the polymer 915 and the refractive index of the monomer. Is selected in consideration of the magnitude relationship with the refractive index.

  Specifically, in the layer 910, when it is desired that the refractive index of the irradiated region be high, a polymer 915 having a relatively low refractive index and a monomer having a high refractive index with respect to the polymer 915 are included. Used in combination. On the other hand, when it is desired that the refractive index of the irradiated region be low, a polymer 915 having a relatively high refractive index and a monomer having a low refractive index with respect to the polymer 915 are used in combination.

  Note that “high” or “low” in the refractive index does not mean an absolute value of the refractive index but means a relative relationship between certain materials.

  The minimum value of the refractive index distribution W corresponds to a region where the refractive index of the irradiated region is reduced in the layer 910 due to the reaction of the monomer (generation of a reaction product), and the region where the refractive index of the irradiated region is increased is refracted. The maximum value of the rate distribution W corresponds.

  As the monomer, a monomer having compatibility with the polymer 915 and having a refractive index difference with the polymer 915 of 0.01 or more is preferably used.

  Such a monomer is not particularly limited as long as it is a compound having a polymerizable portion in the molecular structure, and the monomers mentioned as the raw material of the polymer 915 are used. For example, acrylic acid (methacrylic acid) Monomers, epoxy monomers, oxetane monomers, norbornene monomers, vinyl ether monomers, styrene monomers, photodimerization monomers, and the like can be used, and one or more of these can be used in combination.

  Among these monomers, by using the same type of monomer as the polymer 915, the monomer can be more uniformly dispersed in the polymer 915. Therefore, the characteristics of the optical waveguide forming compositions 901 and 902 should be homogenized. Can do.

  Further, unsaturated hydrocarbons are particularly preferably used as the polymerizable portion. A compound containing an unsaturated hydrocarbon easily causes a polymerization reaction such as radical polymerization or cationic polymerization, and is suitable as a monomer used in the present invention.

  Here, as the acrylic acid (methacrylic acid) -based monomer and epoxy-based monomer, the same monomers as those cited as the raw material of the polymer 915 can be used.

  Further, since the ring opening of the cyclic ether group is likely to occur, a monomer or oligomer having a cyclic ether group such as an oxetanyl group and an epoxy group can react rapidly. Therefore, by using such a monomer, it is possible to shorten the time for forming the core layer 13 and hence the time for manufacturing the optical waveguide 1.

  The molecular weight (weight average molecular weight) of the monomer having a cyclic ether group or the molecular weight (weight average molecular weight) of the oligomer is preferably 100 or more and 400 or less, respectively.

  Examples of vinyl ether monomers include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, n-pentyl vinyl ether, n-hexyl vinyl ether, and n-octyl. Examples thereof include alkyl vinyl ethers such as vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl vinyl ether, and cycloalkyl vinyl ethers, and one or more of these can be used in combination.

  Moreover, as a styrene-type monomer, styrene, divinylbenzene, etc. are mentioned, for example, These 1 type or 2 types can be used in combination.

  Further, examples of the photodimerization monomer include monomers having a chemical structure that can be photodimerized as described above, and specifically, 4,4′-diphenylmethane bismaleimide, bis- (3-ethyl-5-methyl-4-methyl). Maleimidophenyl) methane, 2,2′-bis- [4- (4-maleimidophenoxy) phenyl] propane and the like can be mentioned, and one or two of these can be used in combination.

  In addition, the combination of these monomers and the polymer 915 mentioned above is not specifically limited, Any combination may be sufficient.

  Further, as the monomer, the above-mentioned various monomers, that is, monomers such as acrylic acid (methacrylic acid) monomer, epoxy monomer, oxetane monomer, norbornene monomer, vinyl ether monomer, styrene monomer, photodimerization monomer, and the like are the same. -Two or more types may be used in combination regardless of non-same type. Among these combinations, it is preferable to use two or more of a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group in combination.

  Monomers having an oxetanyl group and oligomers having an oxetanyl group have a slow initiation reaction but a fast growth reaction. On the other hand, a monomer having an epoxy group and an oligomer having an epoxy group have a fast initiation reaction for initiating polymerization, but have a slow growth reaction. Therefore, by using a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group, when irradiated with light, between the irradiated region and the unirradiated region A difference in refractive index can be reliably generated.

  As the monomer having an oxetanyl group, for example, Aron oxetane (manufactured by Toagosei Co., Ltd.) can be used.

  Further, at least a part of the monomer may be oligomerized as described above.

  The addition amount of these monomers is preferably 1 part by mass or more and 50 parts by mass or less, and more preferably 2 parts by mass or more and 40 parts by mass or less with respect to 100 parts by mass of the polymer 915. Thereby, the refractive index modulation between the core part 14 and the side clad part 15 can be caused more reliably.

  The monomer contained between the optical waveguide forming composition 901 and the optical waveguide forming composition 902 may be the same or different. In addition, since the mutual movement of a mutual monomer arises reliably by using the thing of the same composition, the refractive index distribution T mentioned above can be clarified more. As a result, the optical waveguide 1 having excellent characteristics can be obtained.

  Further, the optical waveguide forming composition 901 may contain a monomer, while the optical waveguide forming composition 902 may contain no monomer. In this case, in each of the cladding layers 11 and 12, the monomer diffusion movement in the layer does not occur, so that the refractive index in each of the cladding layers 11 and 12 can be made uniform.

((Polymerization initiator))
The polymerization initiator acts on the monomer with irradiation of actinic radiation and promotes the reaction of the monomer.

  The polymerization initiator to be used is appropriately selected according to the type of monomer polymerization reaction or crosslinking reaction. For example, radical polymerization initiators are preferably used exclusively for acrylic acid (methacrylic acid) monomers and styrene monomers, and cationic polymerization initiators are preferably used exclusively for epoxy monomers, oxetane monomers, and vinyl ether monomers.

  Examples of the radical polymerization initiator include benzophenones and acetophenones. Specifically, Irgacure 651, Irgacure 184 (above, manufactured by BASF Japan) and the like can be mentioned.

  On the other hand, examples of the cationic polymerization initiator include a Lewis acid generating type such as a diazonium salt, and a Bronsted acid generating type such as an iodonium salt and a sulfonium salt. Specifically, Adekaoptomer SP-170 (manufactured by ADEKA), Sun-Aid SI-100L (manufactured by Sanshin Chemical Industry), Rhodorsil 2074 (manufactured by Rhodia Japan) and the like can be mentioned.

  In particular, when a monomer having a cyclic ether group is used as the monomer, the following cationic polymerization initiator (photoacid generator) is preferably used.

  For example, sulfonium salts such as triphenylsulfonium trifluoromethanesulfonate, tris (4-t-butylphenyl) sulfonium-trifluoromethanesulfonate, diazonium salts such as p-nitrophenyldiazonium hexafluorophosphate, ammonium salts, phosphonium salts, diphenyliodonium Trifluoromethanesulfonate, iodonium salts such as (triccumyl) iodonium-tetrakis (pentafluorophenyl) borate, quinonediazides, diazomethanes such as bis (phenylsulfonyl) diazomethane, 1-phenyl-1- (4-methylphenyl) sulfonyloxy- Sulfones such as 1-benzoylmethane and N-hydroxynaphthalimide-trifluoromethanesulfonate Esters, disulfones such as diphenyldisulfone, tris (2,4,6-trichloromethyl) -s-triazine, 2- (3.4-methylenedioxyphenyl) -4,6-bis- (trichloromethyl)- Compounds such as triazines such as s-triazine are used as photoacid generators. These photoacid generators may be used alone or in combination.

  In addition, various crosslinking agents can be used. For example, carbodilite V-02-L2 (manufactured by Nisshinbo Chemical Co., Ltd.) can be used as a crosslinking agent for aqueous (meth) acrylates for crosslinking of (meth) acrylic monomers.

  The content of the polymerization initiator is preferably 0.01 parts by mass or more and 0.3 parts by mass or less, more preferably 0.02 parts by mass or more and 0.2 parts by mass or less with respect to 100 parts by mass of the polymer. . Thereby, there exists an effect of a reactive improvement.

  In the present embodiment, as described above, the additive 920 in the optical waveguide forming composition 901 includes a polymerization initiator, while the additive 920 in the optical waveguide forming composition 902 is a polymerization initiator. Therefore, the monomer polymerization reaction is accelerated only in the core layer 13, and the monomer polymerization reaction is not accelerated in the cladding layers 11 and 12. Therefore, in the cladding layers 11 and 12, the change in the refractive index is suppressed, and the refractive index within the layer can be made relatively uniform.

  However, the addition of the polymerization initiator is not limited to the above case, and both the optical waveguide forming composition 901 and the optical waveguide forming composition 902 may contain a polymerization initiator. In this case, since it is preferable to suppress the polymerization reaction of the monomer as much as possible in the cladding layers 11 and 12, the types and addition amounts of the polymerization initiators included in the optical waveguide forming composition 901 and the optical waveguide forming composition 902 are different. You can make it. Specifically, a polymerization initiator contained in the optical waveguide forming composition 902 is used as the polymerization initiator contained in the optical waveguide forming composition 901 which is highly reactive with the wavelength of the actinic radiation 930 described later. As described above, those having low reactivity with respect to the wavelength of actinic radiation 930 described later may be used. Further, when the same type of polymerization initiator is used, the amount added to the optical waveguide forming composition 902 may be less than that of the optical waveguide forming composition 901.

  Furthermore, a photoacid generator may be used as the polymerization initiator contained in the optical waveguide forming composition 901, and a thermal acid generator may be used as the polymerization initiator contained in the optical waveguide forming composition 902. Thereby, with the irradiation of the active radiation 930, the polymerization reaction of the monomer is promoted mainly only in the core layer 13 and the refractive index distribution W is formed. On the other hand, the polymerization reaction of the monomer is performed in the cladding layers 11 and 12. Not promoted. After the refractive index profile W is formed, heat is applied to the layer 910 to accelerate the monomer polymerization reaction in the cladding layers 11 and 12 in this case. As a result, in the layer 910, the refractive index distribution T in the thickness direction is fixed.

  Examples of the thermal acid generator include sulfonium salt type compounds such as triphenylsulfonium trifluoromethanesulfonic acid and triphenylsulfonium nonafluorobutanesulfonic acid, diphenyliodonium trifluoromethanesulfonic acid, and diphenyliodonium nonafluorobutanesulfonic acid. Examples thereof include iodonium salt type compounds, phosnium salt type compounds such as pentaphenylphosnium trifluoromethanesulfonic acid, pentaphenylphosnium nonafluorobutanesulfonic acid, and the like.

Further, the additive 920 may contain a sensitizer and the like in addition to the monomer and the polymerization initiator.
Among these, the sensitizer increases the sensitivity of the polymerization initiator to light and is suitable for the function of reducing the time and energy required for the activation (reaction or decomposition) of the polymerization initiator and for the activation of the polymerization initiator. It has a function of changing the wavelength of light to a wavelength.

  Such a sensitizer is appropriately selected according to the sensitivity of the polymerization initiator and the peak wavelength of absorption of the sensitizer, and is not particularly limited. For example, 9,10-dibutoxyanthracene (CAS No. 76275) is selected. 14-4) anthracenes, xanthones, anthraquinones, phenanthrenes, chrysene, benzpyrenes, fluoranthenes, rubrenes, pyrenes, indanthrines, thioxanthen-9-ones (Thioxanthen-9-ones) and the like, and these can be used alone or as a mixture.

  Specific examples of the sensitizer include, for example, 2-isopropyl-9H-thioxanthen-9-one, 4-isopropyl-9H-thioxanthen-9-one, 1-chloro-4-propoxythioxanthone, phenothiazine. Or a mixture thereof.

  The content of the sensitizer is preferably 0.01% by mass or more, more preferably 0.5% by mass or more in the optical waveguide forming compositions 901 and 902, and more preferably 1% by mass or more. More preferably. In addition, it is preferable that an upper limit is 5 mass% or less.

  In addition, the additive 920 includes a catalyst precursor, a co-catalyst, an antioxidant, an ultraviolet absorber, a light stabilizer, a silane coupling agent, a coating surface improver, a thermal polymerization inhibitor, a leveling agent, and a surfactant. , Colorants, storage stabilizers, plasticizers, lubricants, fillers, inorganic particles, anti-aging agents, wettability improvers, antistatic agents, and the like.

  The layer 910 containing the polymer 915 and the additive 920 as described above has a predetermined refractive index due to the action of the additive 920 that is uniformly dispersed in the polymer 915.

  [2] Next, a mask (masking) 935 in which an opening (window) 9351 is formed is prepared, and the layer 910 is irradiated with active radiation 930 through the mask 935 (see FIG. 9).

  Below, the case where what has a refractive index lower than the polymer 915 is used as a monomer is demonstrated to an example. Correspondingly, in the optical waveguide forming compositions 901 and 902 used to form the layer 910, the composition of the polymer 915 is (refractive index of the optical waveguide forming composition 901)> (optical waveguide The refractive index of the forming composition 902 is set so as to satisfy the relationship. As a result, in the layer 910, the refractive index has the highest refractive index at the center in the thickness direction, there are local minimum values between the front and back surfaces of the layer 910, and the refractive index continuously changes. A rate distribution is formed.

  In the example shown here, the irradiation region 925 of the active radiation 930 is mainly the side cladding portion 15.

  Therefore, in the example shown here, an opening (window) 9351 equivalent to the pattern of the side cladding portion 15 to be formed is mainly formed in the mask 935. The opening 9351 has a transmission part through which the active radiation 930 to be irradiated passes. In addition, since the pattern of the core part 14 and the side clad part 15 is determined based on the refractive index distribution W formed according to irradiation of the active radiation 930, the pattern of the opening 9351 and the pattern of the side clad part 15 are completely There is a case in which there is a slight deviation between the two patterns.

  The mask 935 may be formed in advance (separately formed) (for example, plate-shaped) or may be formed on the layer 910 by, for example, a vapor deposition method or a coating method.

  Preferred examples of the mask 935 include a photomask made of quartz glass or a PET base material, a stencil mask, a metal thin film formed by a vapor deposition method (evaporation, sputtering, etc.), etc. Among these, it is particularly preferable to use a photomask or a stencil mask. This is because a fine pattern can be formed with high accuracy, and handling is easy, which is advantageous in improving productivity.

  Further, in FIG. 9, the opening (window) 9351 of the mask 935 is shown by partially removing the mask along the pattern of the irradiation region 925 of the active radiation 930. However, the quartz glass, the PET base material, etc. In the case of using the photomask manufactured in (1), it is also possible to use a photomask provided with a shielding portion of active radiation 930 made of a shielding material made of metal such as chromium. In this mask, the part other than the shielding part is the window (transmission part).

  The actinic radiation 930 to be used is not particularly limited as long as it can cause a photochemical reaction (change) with respect to the polymerization initiator and can release the leaving group contained in the polymer 915. For example, visible light, In addition to ultraviolet light, infrared light, and laser light, electron beams, X-rays, and the like can also be used.

  Among these, the actinic radiation 930 is appropriately selected depending on the type of the sensitizer when it contains a polymerization initiator, a leaving group type, and a sensitizer, and is not particularly limited, but has a wavelength of 200 to 450 nm. It is preferable to have a peak wavelength in the range. As a result, the polymerization initiator can be activated relatively easily and the leaving group can be removed relatively easily.

The irradiation dose of the actinic radiation 930 is preferably in the range of about 0.1~9J / cm ^2, more preferably about ^{0.2~6J / cm 2, 0.2~3J / cm} 2 of about More preferably.

  When the layer 910 is irradiated with the active radiation 930 through the mask 935, the polymerization initiator is activated in the irradiation region 9253 in the core layer 13 in the irradiation region 925. Thereby, the monomer is polymerized in the irradiation region 9253. When the monomer is polymerized, the amount of monomer in the irradiated region 9253 decreases, and accordingly, in the unirradiated region 940, the monomer in the unirradiated region 9403 in the core layer 13 diffuses and moves to the irradiated region 9253. As described above, since the polymer 915 and the monomer are appropriately selected so that a difference in refractive index occurs between them, the refractive index between the irradiated region 9253 and the non-irradiated region 9403 of the core layer 13 is increased with the diffusion and movement of the monomer. There is a difference. On the other hand, since the irradiation regions 9251 and 9252 in the cladding layers 11 and 12 do not contain a polymerization initiator, the polymerization reaction of the monomer is suppressed.

  FIG. 11 is a diagram for explaining a state in which a difference in refractive index occurs between the irradiated region 9253 and the non-irradiated region 9403 of the core layer 13. The horizontal axis indicates the position in the width direction of the cross section of the layer 910. It is a figure which shows refractive index distribution when taking the refractive index of a cross section on the vertical axis | shaft.

  In this embodiment, since a monomer having a refractive index smaller than that of the polymer 915 is used as the monomer, the refractive index of the unirradiated region 9403 increases and the refractive index of the irradiated region 9253 decreases as the monomer diffuses and moves ( (See FIG. 11 (a)).

  It is considered that the monomer diffusion movement is caused by the consumption of the monomer in the irradiation region 9253 and the concentration gradient of the monomer formed accordingly. For this reason, the monomers in the entire unirradiated region 9403 do not move toward the irradiated region 9253 all at once, but gradually move from a portion close to the irradiated region 9253, and outward from the center of the unirradiated region 9403 to compensate for this. Monomer migration also occurs. As a result, as shown in FIG. 11A, the high refractive index portion H on the non-irradiation region 9403 side and the low refractive index portion L on the irradiation region 9253 side across the boundary between the irradiation region 9253 and the non-irradiation region 9403. Is formed. Since the high refractive index portion H and the low refractive index portion L are formed in accordance with the diffusion movement of the monomer as described above, they are necessarily constituted by smooth curves.

  The refractive index of the polymer obtained by polymerizing the monomers as described above is almost the same as the refractive index of the monomer before polymerization (difference in refractive index is about 0 to 0.001). As the polymerization proceeds, the refractive index decreases according to the amount of the monomer and the amount of the substance derived from the monomer. Therefore, the shape of the refractive index distribution W can be controlled by appropriately adjusting the amount of monomer or polymerization initiator relative to the polymer.

  On the other hand, in the unirradiated region 9403, since the polymerization initiator is not activated, the polymerization of the monomer is not promoted.

  In addition, in the irradiation region 9253, the ease of monomer diffusion transfer gradually decreases as the polymerization of the monomer proceeds. As a result, in the irradiated region 9253, the closer to the unirradiated region 9403, the higher the concentration of the monomer and the greater the amount of decrease in the refractive index. As a result, the distribution shape of the low refractive index portion L formed in the irradiated region 9253 tends to be asymmetrical, and the gradient on the non-irradiated region 9403 side becomes steeper. Thereby, the refractive index distribution W is formed.

  The polymer 915 preferably has a leaving group as described above. This leaving group is released upon irradiation with actinic radiation 930 and decreases the refractive index of the polymer 915. Therefore, when the irradiation region 9253 is irradiated with the actinic radiation 930, the above-described diffusion and movement of the monomer is started, the leaving group is released from the polymer 915, and the refractive index of the irradiation region 9253 decreases from before the irradiation. (See FIG. 11B).

  Since this decrease in refractive index occurs uniformly in the entire irradiation region 9253, the above-described difference in refractive index between the high refractive index portion H and the low refractive index portion L is further enlarged. As a result, a refractive index distribution W shown in FIG. 11B is obtained. Note that the change in refractive index in FIG. 11A and the change in refractive index in FIG. 11B occur almost simultaneously. Such a refractive index change further expands this refractive index difference.

  In addition, the refractive index difference and the shape of the refractive index distribution to be formed can be controlled by adjusting the irradiation amount of the active radiation 930. For example, the refractive index difference can be enlarged by increasing the irradiation amount. Can do. Further, the layer 910 may be dried before the irradiation with the active radiation 930, but the shape of the refractive index distribution can be controlled by adjusting the degree of drying at that time. For example, by increasing the degree of drying, the diffusion transfer amount of the monomer can be suppressed.

  In the irradiation region 9253, not only the diffusion movement of the monomer from the unirradiated region 9403 in the core layer 13 but also the monomer from the irradiation region 9251 in the cladding layer 11 and the irradiation region 9252 in the cladding layer 12 in the irradiation region 925. Also occurs. As a result, the refractive index further decreases in the irradiation region 9253. On the other hand, in the irradiation region 9251 and the irradiation region 9252, the refractive index increases with the diffusion and movement of the monomer. In this region, the composition of the polymer 915 is set so that the refractive index is originally lowered. Even if this rises, the function of the optical waveguide 1 is not impaired.

  Further, in the irradiation region 9251 in the cladding layer 11 and the irradiation region 9252 in the cladding layer 12, the leaving group is detached as in the irradiation region 9253 in the core layer 13, and the refractive index of the polymer 915 is lowered. As a result, the refractive index further decreases in the irradiation region 9251 and the irradiation region 9252.

  Based on the above principle, the optical waveguide 1 having the refractive index distribution W is obtained (see FIG. 10). Such an optical waveguide 1 partially irradiates actinic radiation 930 to a layer 910 composed of a composition for forming an optical waveguide in which a monomer is dispersed in a polymer 915, thereby diffusing and moving the monomer. Thus, the layer 910 has a refractive index distribution W that causes a refractive index bias. Further, such an optical waveguide 1 can be formed by simply irradiating a part of the active radiation 930 and has a high transmission efficiency. Therefore, the width and pitch of the core part 14 and the side cladding part 15 can be reduced. Even if it is narrow, high-quality optical communication is possible. Therefore, the optical waveguide 1 can be easily densified.

  In the refractive index distribution W, there are minimum values Ws1, Ws2, Ws3, and Ws4 converted from the low refractive index portion L (see FIG. 3B), and the positions of these minimum values are the core portion 14. This corresponds to the interface between the side cladding portion 15 and the side cladding portion 15.

  In addition, when a monomer having a higher refractive index than that of the polymer 915 is used as the monomer, the refractive index of the movement destination increases with the diffusion movement of the monomer. The irradiation area 940 may be set.

  The Shore D hardness of the polymer 915 is preferably about 50 to 95, more preferably about 55 to 90, and further preferably about 60 to 85. The polymer 915 having such hardness contributes to the formation of a sufficient refractive index difference by reliably diffusing and moving the monomer while providing the optical waveguide 1 with necessary and sufficient flexibility and bending resistance. Therefore, the obtained optical waveguide 1 has sufficient flexibility and mechanical strength suitable for bending use, and has excellent optical characteristics even in a bent state.

  Similarly, the Rockwell hardness of the polymer 915 is preferably about 50 to 125 on the M scale, more preferably about 60 to 115, and still more preferably about 70 to 110.

  In addition, the softening point of the polymer 915 is preferably 90 ° C. or higher, and more preferably 100 to 130 ° C. Thereby, the obtained optical waveguide 1 can reliably form the refractive index distribution W and can maintain the formed refractive index distribution W for a long period of time, and prevents disconnection even when used in a bent state. It has sufficient mechanical strength. Therefore, the optical waveguide 1 has excellent optical characteristics and high reliability. The softening point of the polymer 915 is the glass transition temperature or melting point of the polymer 915, and when both are present, it indicates the lower one.

  Note that the irradiation with the active radiation 930 may be performed in an inert gas atmosphere such as a nitrogen atmosphere or an argon atmosphere as necessary. Thereby, the oxidation and modification of the polymer 915 and the monomer can be suppressed, and the optical waveguide 1 having higher optical characteristics can be obtained.

  On the other hand, as shown in FIG. 12A, a refractive index distribution T ′ is formed in the thickness direction of the layer 910 before being irradiated with the active radiation 930. As described above, the refractive index distribution T ′ is formed by using the optical waveguide forming composition 901 and the optical waveguide forming composition 902 having different refractive indexes and obtaining the layer 910 by the multicolor molding method. It has been done.

  Here, when the layer 910 is irradiated with the active radiation 930 through the mask 935, if there is a difference in monomer content between the optical waveguide forming composition 901 and the optical waveguide forming composition 902, the unirradiated region 9403 Since the above monomer diffuses and moves to the irradiation region 9253, the refractive index of the region corresponding to the core portion 14 also increases in the refractive index distribution T ′ in the thickness direction of the core portion 14. On the other hand, since the refractive index does not change in the clad layers 11 and 12 positioned above and below the core portion 14, the refractive index difference between the core portion 14 and the upper and lower clad layers 11 and 12 increases as a result. It will be.

  Based on the principle as described above, the optical waveguide 1 having the refractive index distribution T having a large refractive index difference between the maximum value and the minimum value is obtained (see FIG. 12B). If the refractive index distribution T ′ has already realized a refractive index distribution shape that is sufficiently effective, the above-described change from the refractive index distribution T ′ to the refractive index distribution T is omitted. May be.

  The refractive index distribution W has a certain correlation with the monomer-derived structure concentration in the core layer 13. Therefore, it is possible to indirectly specify the refractive index distribution W of the optical waveguide 1 by measuring the concentration of the monomer-derived structure.

  Similarly, the refractive index distribution T has a certain correlation with the monomer-derived structure concentration in the optical waveguide 1. Therefore, it is possible to indirectly specify the refractive index distribution T of the optical waveguide 1 by measuring the concentration of the monomer-derived structure.

  The monomer-derived structure refers to a structure formed by reaction of an unreacted monomer or a monomer such as a monomer, an oligomer obtained by reacting the monomer, and a polymer obtained by reacting the monomer.

  The concentration of the structure can be measured using, for example, FT-IR, TOF-SIMS line analysis, surface analysis, or the like.

  Further, the refractive index distribution W and the refractive index distribution T can be obtained by utilizing the fact that the intensity distribution of the emitted light from the optical waveguide 1 has a certain correlation with the refractive index distribution W or the refractive index distribution T. It can be specified indirectly.

  In addition, for example, (1) a method of observing a refractive index dependent interference fringe using a dual-beam interference microscope and calculating a refractive index distribution from the interference fringe, (2) a refractive near field method ( It is possible to measure directly by means of a refractionated near field method (RNF). Among these, the refractive near field method can employ the measurement conditions described in, for example, JP-A-5-332880. On the other hand, the interference microscope is preferably used in that the refractive index distribution can be easily measured.

  Hereinafter, an example of a procedure for measuring the refractive index distribution using an interference microscope will be described. First, the optical waveguide is sliced in the cross-sectional direction (width direction) to obtain an optical waveguide fragment. For example, the optical waveguide is sliced so that the length is 200 to 300 μm. Next, a chamber filled with oil having a refractive index of 1.536 is produced in a space surrounded by two glass slides. And a measurement sample part and a blank sample part which does not put an optical waveguide fragment are produced by inserting an optical waveguide fragment in a space in the chamber. Next, using an interference microscope, the measurement sample portion and the blank sample portion are respectively irradiated with the light divided into two, and then the transmitted light is integrated to obtain an interference fringe photograph. Since the interference fringes are generated with the refractive index distribution (phase distribution) of the optical waveguide fragment, the refractive index distribution W in the width direction of the optical waveguide is obtained by image analysis of the obtained interference fringe photograph. Can do. In addition, when acquiring the refractive index distribution W, the accuracy of the refractive index distribution W can be improved by image analysis of a plurality of interference fringe photographs. When obtaining a plurality of interference fringe photographs, it is only necessary to change the optical path length by moving the prism in the interference microscope to obtain photographs having different interference fringe spacings and interference fringe spots. Further, when image analysis is performed on the interference fringe photograph, for example, analysis points may be set at intervals of 2.5 μm.

  In addition, when light having high directivity such as laser light is used as the active radiation 930, the use of the mask 935 may be omitted.

  Next, heat treatment is performed on the layer 910 as necessary. In this heat treatment, the monomer in the irradiated region 9253 of the core layer 13 irradiated with light is further polymerized.

  The heating temperature in this heat treatment is not particularly limited, but is preferably about 30 to 180 ° C, and more preferably about 40 to 160 ° C.

  Further, the heating time is preferably set so that the polymerization reaction of the monomer in the irradiation region 925 is almost completed. Specifically, the heating time is preferably about 0.1 to 2 hours, preferably 0.1 to 1 hour. More preferred is the degree.

Note that this heat treatment may be performed as necessary and may be omitted.
Thus, the optical waveguide 1 is obtained.

  Thereafter, if necessary, the optical waveguide 1 is peeled from the support substrate 951, the support film 2 is laminated on the lower surface of the optical waveguide 1, and the cover film 3 is laminated on the upper surface.

  Further, when the layer 910 is formed so as to include a plurality of core layers 13, when the active radiation 930 is irradiated on the layer 910, the core portions 14 and the side cladding portions 15 are collectively applied to the plurality of core layers 13 by one irradiation. Can be formed. For this reason, the optical waveguide 1 having a plurality of core layers 13 can be manufactured with a small number of steps. In this case, the core portion 14 can hardly be displaced between the plurality of core layers 13. Therefore, the optical waveguide 1 with extremely high dimensional accuracy can be obtained. Such an optical waveguide 1 has a particularly high optical coupling efficiency when optically coupling with a light emitting / receiving element or the like.

  The pattern 41 constituting the identification symbol 4 can also be formed by the same method as that for forming the core portion 14. That is, an unirradiated region corresponding to the pattern 41 to be formed may be set when irradiating with actinic radiation. Thereby, the pattern 41 comprised with the same material as the core part 14 is formed.

  Moreover, since the core part 14 and the identification symbol 4 can be formed simultaneously only by appropriately selecting a photomask pattern to be used, the optical waveguide 1 having an individual identification function can be manufactured by a simple process. Can do.

<Electronic equipment>
The optical waveguide of the present invention as described above has an individual identification function, and can avoid work errors and the like when mounted on an electronic device. For this reason, a highly reliable electronic device is obtained. Further, by providing the optical waveguide having the refractive index distribution W as described above, an electronic device (electronic device of the present invention) capable of performing high-quality optical communication between two points can be obtained.

  Examples of the electronic device including the optical waveguide of the present invention include electronic devices such as a mobile phone, a game machine, a router device, a WDM device, a personal computer, a television, and a home server. In any of these electronic devices, it is necessary to transmit a large amount of data at high speed between an arithmetic device such as an LSI and a storage device such as a RAM. Therefore, by providing such an electronic device with the optical waveguide of the present invention, problems such as noise and signal degradation peculiar to electrical wiring are eliminated, and a dramatic improvement in performance can be expected.

  In addition, the amount of heat generated in the optical waveguide portion is greatly reduced compared to electrical wiring. For this reason, the electric power required for cooling can be reduced and the power consumption of the whole electronic device can be reduced.

  Further, an optical waveguide having a refractive index distribution W has little transmission loss and pulse signal dullness, and interference does not easily occur even when the number of channels is increased and the density is increased. For this reason, an optical waveguide with high density and small area and high reliability can be obtained, and the reliability and size of electronic devices can be improved.

  Although the optical waveguide and the electronic device of the present invention have been described above, the present invention is not limited to this, and for example, an arbitrary component may be added to the optical waveguide.

  In addition, the method for producing the optical waveguide of the present invention is not limited to the above method. For example, a method of cutting molecular bonds by irradiation with actinic radiation to change the refractive index (photo bleach method), and forming a core layer A composition comprising a photocrosslinkable polymer having an unsaturated bond capable of photoisomerization or photodimerization, and irradiating with active radiation to change the molecular structure and change the refractive index (photoisomerization method) A method such as a photodimerization method can also be used.

  In these methods, since the amount of change in the refractive index can be adjusted according to the irradiation amount of the active radiation, the irradiation amount of the active radiation applied to each part of the layer according to the shape of the target refractive index distribution W is set. By making them different, a core layer having a refractive index distribution W can be formed.

Next, examples of the present invention will be described.
1. Production of optical waveguide (Example 1)
(1) Production of Cladding Layer Forming Resin Composition Daicel Chemical Industries, Ltd. Alicyclic Epoxy Resin, Celoxide 2081 20 g, ADEKA Co., Ltd. Cationic Polymerization Initiator, Adekaoptomer SP-170 0.6 g A solution was prepared by stirring and mixing 80 g of methyl isobutyl ketone.

  Subsequently, the obtained solution was filtered through a PTFE filter having a pore size of 0.2 μm to obtain a clean and colorless and transparent resin composition E1 for forming a cladding layer.

(2) Production of photosensitive resin composition As an epoxy polymer, phenoxy resin manufactured by Nippon Steel Chemical Co., Ltd., 20 g of YP-50S, 5 g of Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd. as a monomer, and a polymerization initiator Adekaoptomer SP-170 (0.4 g) manufactured by ADEKA Co., Ltd. was charged into 80 g of methyl isobutyl ketone, and dissolved by stirring to prepare a solution.

  Subsequently, the obtained solution was filtered with a PTFE filter having a pore size of 0.2 μm to obtain a clean and colorless photosensitive resin composition F1.

(3) Production of lower clad layer The clad layer-forming resin composition E1 was uniformly applied onto a polyimide film having a thickness of 25 µm by a doctor blade, and then placed in a dryer at 50 ° C for 10 minutes. After completely removing the solvent, the entire surface was irradiated with ultraviolet rays with a UV exposure machine to cure the applied resin composition E1. As a result, a colorless and transparent lower cladding layer having a thickness of 10 μm was obtained. The cumulative amount of ultraviolet light was 500 mJ / cm ² .

(4) Production of core layer After the photosensitive resin composition F1 was uniformly applied by a doctor blade on the produced lower clad layer, it was put into a dryer at 50 ° C for 10 minutes. After completely removing the solvent to form a film, on the obtained film, a linear shielding portion (width 50 μm) corresponding to the core portion to be formed and a linear shape corresponding to the side cladding portion to be formed. A photomask having a transmission part (width 50 μm) was pressure-bonded. Then, ultraviolet rays were irradiated from above the photomask with a parallel exposure machine. The cumulative amount of ultraviolet light was 500 mJ / cm ² .

  Next, the photomask was removed and placed in an oven at 150 ° C. for 30 minutes. Upon removal from the oven, it was confirmed that a clear waveguide pattern and circular pattern appeared on the coating. Table 1 shows the average width WCO of the core portion and the average width WCL of the side cladding portion. Further, the thickness of the obtained core layer was 50 μm, and the number of core portions was eight.

(5) Production of upper clad layer On the produced core layer, the clad layer forming resin composition E1 was applied in the same manner as in (3) to obtain a colorless and transparent upper clad layer having a thickness of 10 µm. An optical waveguide was obtained as described above.

(6) Evaluation of refractive index distribution And about the cross section of the core layer of the obtained optical waveguide, the refractive index distribution W of the width direction was acquired with the interference microscope. As a result, the refractive index distribution W had a plurality of minimum values and maximum values, and the refractive index changed continuously.

(Examples 2 to 16)
The composition of the polymer, the composition and content of the monomer, and the cumulative amount of ultraviolet light are set as shown in Table 1, and the average width WCO of the core portion and the average width WCL of the side cladding portions are the values shown in Table 1, respectively. An optical waveguide was obtained in the same manner as in Example 1 except that the photomask pattern was set as described above. In Table 1, the softening point of the polymer YX-4000H described in Examples 13 to 16 is the melting point.

(Example 17)
(1) Synthesis of (meth) acrylic polymer 20.0 g of methyl methacrylate (MMA), 30.0 g of benzyl methacrylate (BzMA), and 450 g of methyl isobutyl ketone were put into a separable flask and mixed with stirring. To prepare a monomer solution.

  On the other hand, 0.25 g of azobisisobutyronitrile as a polymerization initiator was dissolved in 10 g of methyl isobutyl ketone and then substituted with nitrogen gas to prepare an initiator solution.

  And the said initiator solution was added to the said monomer solution using the syringe, stirring the said monomer solution in the state heated at 80 degreeC. The mixture was stirred at 80 ° C. for 1 hour and then cooled to prepare a polymer solution. Thereafter, 5 L of isopropanol was prepared in a beaker, and the polymer solution was dropped into the beaker while stirring at room temperature with a stirrer. After completion of dropping, the mixture was further stirred for 30 minutes, and then the precipitated polymer was taken out and dried at 60 ° C. under reduced pressure for 8 hours in a vacuum dryer. Thereby, acrylic polymer A1 was obtained.

(2) Manufacture of resin composition for forming clad layer 20 g of aqueous acrylate resin solution RD-180 manufactured by Kyoyo Chemical Industry Co., Ltd., 20 g of isopropanol, and Nisshinbo Chemical Co., Ltd. Carbodilite V-02-L2 4 g was stirred and mixed to prepare a solution.

  Subsequently, the obtained solution was filtered with a PTFE filter having a pore size of 0.2 μm to obtain a clean, colorless and transparent resin composition B1 for forming a cladding layer.

(3) Production of photosensitive resin composition 20 g of synthesized acrylic polymer A1, 5 g of cyclohexyl methacrylate as a monomer, 0.4 g of Irgacure 651 manufactured by BASF Japan Ltd. as a polymerization initiator, in 80 g of methyl isobutyl ketone The solution was stirred and dissolved to prepare a solution.

  Subsequently, the obtained solution was filtered with a PTFE filter having a pore size of 0.2 μm to obtain a clean and colorless photosensitive resin composition C1.

(4) Production of lower clad layer The clad layer-forming resin composition B1 was uniformly applied onto a polyimide film having a thickness of 25 µm by a doctor blade, and then placed in a dryer at 80 ° C for 10 minutes. After completely removing the solvent, it was further put into an oven at 150 ° C. for 10 minutes and cured to obtain a colorless and transparent lower clad layer having a thickness of 10 μm.

(5) Production of core layer After the photosensitive resin composition C1 was uniformly applied by a doctor blade on the produced lower clad layer, it was put into a dryer at 50 ° C for 10 minutes. After completely removing the solvent to form a film, on the obtained film, a linear shielding portion (width 50 μm) corresponding to the core portion to be formed and a linear shape corresponding to the side cladding portion to be formed. A photomask having a transmission part (width 50 μm) was pressure-bonded. Then, ultraviolet rays were irradiated from above the photomask with a parallel exposure machine. The cumulative amount of ultraviolet light was 500 mJ / cm ² .

  Next, the photomask was removed and placed in an oven at 150 ° C. for 30 minutes. Upon removal from the oven, it was confirmed that a clear waveguide pattern and circular pattern appeared on the coating. Table 2 shows the average width WCO of the core portion and the average width WCL of the side cladding portions. Further, the thickness of the obtained core layer was 50 μm, and the number of core portions was eight.

(6) Production of upper clad layer On the produced core layer, the clad layer-forming resin composition B1 was applied in the same manner as in (4) to obtain a colorless and transparent upper clad layer having a thickness of 10 µm. An optical waveguide was obtained as described above.

(7) Evaluation of refractive index distribution And about the cross section of the core layer of the obtained optical waveguide, the refractive index distribution W of the width direction was acquired with the interference microscope. As a result, the refractive index distribution W had a plurality of minimum values and maximum values, and the refractive index changed continuously.

(Examples 18 to 20)
The composition and content of the monomer and the integrated light quantity of ultraviolet rays are set as shown in Table 2, and the photomask is set so that the average width WCO of the core portion and the average width WCL of the side cladding portions are the values shown in Table 2, respectively. An optical waveguide was obtained in the same manner as in Example 17 except that the above pattern was set.

(Example 21)
In the synthesis of the (meth) acrylic polymer, 2- (perfluorohexyl) ethyl methacrylate (PHEM) is used instead of benzyl methacrylate (BzMA), and the average width WCO of the core portion and the average width WCL of the side cladding portions are An optical waveguide was obtained in the same manner as in Example 17 except that the photomask pattern was set so as to have the values shown in Table 2, respectively.

(Examples 22 to 24)
The composition and content of the monomer and the integrated light quantity of ultraviolet rays are set as shown in Table 2, and the photomask is set so that the average width WCO of the core portion and the average width WCL of the side cladding portions are the values shown in Table 2, respectively. An optical waveguide was obtained in the same manner as in Example 21 except that the above pattern was set.

(Reference Example 1)
(1) Synthesis of norbornene-based resin having a leaving group In a glove box filled with dry nitrogen in which the water and oxygen concentrations are both controlled to 1 ppm or less, 7.2 g (40.1 mmol) of hexylnorbornene (HxNB) Then, 12.9 g (40.1 mmol) of diphenylmethylnorbornenemethoxysilane was weighed into a 500 mL vial, 60 g of dehydrated toluene and 11 g of ethyl acetate were added, and the top was sealed with a silicon sealer.

  Next, 1.56 g (3.2 mmol) of Ni catalyst and 10 mL of dehydrated toluene were weighed in a 100 mL vial, and a stirrer chip was placed and sealed, and the catalyst was thoroughly stirred to dissolve completely.

  When 1 mL of this Ni catalyst solution was accurately weighed with a syringe, and quantitatively injected into the vial bottle in which the two kinds of norbornene were dissolved and stirred at room temperature for 1 hour, a marked increase in viscosity was confirmed. At this point, the stopper was removed, 60 g of tetrahydrofuran (THF) was added, and the mixture was stirred to obtain a reaction solution.

  In a 100 mL beaker, 9.5 g of acetic anhydride, 18 g of hydrogen peroxide (concentration 30%) and 30 g of ion-exchanged water were added and stirred to prepare an aqueous solution of peracetic acid on the spot. Next, the total amount of this aqueous solution was added to the above reaction solution and stirred for 12 hours to reduce Ni.

  Next, the treated reaction solution was transferred to a separatory funnel, the lower aqueous layer was removed, and then 100 mL of a 30% aqueous solution of isopropyl alcohol was added and vigorously stirred. The aqueous layer was removed after standing and completely separating the two layers. After repeating this water washing process three times in total, the oil layer was dropped into a large excess of acetone to reprecipitate the polymer produced, separated from the filtrate by filtration, and then in a vacuum dryer set at 60 ° C. Polymer # 1 was obtained by heating and drying for 12 hours. The molecular weight distribution of the polymer # 1 was Mw = 100,000 and Mn = 40,000 by GPC measurement. The molar ratio of each structural unit in polymer # 1 was 50 mol% for the hexylnorbornene structural unit and 50 mol% for the diphenylmethylnorbornenemethoxysilane structural unit, as determined by NMR.

(2) Production of composition for forming core layer 10 g of the purified polymer # 1 was weighed into a 100 mL glass container, and 40 g of mesitylene, 0.01 g of an antioxidant Irganox 1076 (manufactured by Ciba Geigy), and a polymerization initiator (light) Acid generator) Rhodorsil Photoinitiator 2074 (manufactured by Rhodia, CAS # 178233-72-2) (0.01 g in 0.1 mL of ethyl acetate) was added and dissolved uniformly, and then filtered through a 0.2 μm PTFE filter. A clean composition for forming a core layer was obtained. In addition, this composition differs from the photosensitive resin composition as described in each Example by the point in which a monomer is not contained. On the other hand, the polymer # 1 has a function of releasing a leaving group upon irradiation with actinic radiation, and a so-called photobleaching phenomenon occurs. The polymerization initiator is expressed as PI 2074 in Table 1.

(3) Manufacture of the composition for forming a clad layer The molar ratio of each structural unit of the purified polymer # 1 was changed to hexylnorbornene structural unit 80 mol% and diphenylmethylnorbornenemethoxysilane structural unit 20 mol%, respectively. A cladding layer forming composition was obtained in the same manner as the core layer forming composition except that it was used in place of polymer # 1.

(4) Production of lower clad layer The clad layer forming composition was uniformly applied onto a polyimide film having a thickness of 25 µm by a doctor blade, and then placed in a dryer at 50 ° C for 10 minutes. After completely removing the solvent, the entire surface was irradiated with UV light by a UV exposure machine to cure the applied composition. As a result, a colorless and transparent lower cladding layer having a thickness of 10 μm was obtained. The cumulative amount of ultraviolet light was 500 mJ / cm ² .

(5) Preparation of core layer After apply | coating the core layer resin composition uniformly with a doctor blade on the produced lower clad layer, it injected | thrown-in to the 50 degreeC drying machine for 10 minutes. After completely removing the solvent to form a film, on the obtained film, a linear shielding portion (width 50 μm) corresponding to the core portion to be formed and a linear shape corresponding to the side cladding portion to be formed. A photomask having a transmission part (width 50 μm) was pressure-bonded. Then, ultraviolet rays were irradiated from above the photomask with a parallel exposure machine. The integrated light quantity of ultraviolet rays was 1300 mJ / cm ² .

  Next, the photomask was removed and placed in an oven at 150 ° C. for 30 minutes. Upon removal from the oven, it was confirmed that a clear waveguide pattern appeared on the coating. The thickness of the obtained core layer was 50 μm. The number of core portions was eight.

(6) Production of upper clad layer On the produced core layer, the clad layer-forming resin composition E1 was applied in the same manner as in (3) to obtain a colorless and transparent upper clad layer having a thickness of 10 µm. An optical waveguide was obtained as described above.

(7) Evaluation of refractive index distribution And about the cross section of the core layer of the obtained optical waveguide, the refractive index distribution of the width direction was acquired with the interference microscope. As a result, the refractive index distribution was a so-called step index (SI) type distribution.

(Reference Example 2)
The optical waveguide was formed in the same manner as in Reference Example 1 except that exposure (graded exposure) was performed using a photomask whose transmittance was continuously changed so that the exposure amount continuously changed during exposure. Obtained.

  In the obtained optical waveguide, the refractive index of the side clad portion was substantially constant, while the refractive index of the core portion continuously decreased from the central portion toward the periphery. That is, the refractive index distribution of the core layer of the obtained optical waveguide was a so-called graded index (GI) type.

(Reference Example 3)
The optical waveguide was formed in the same manner as in Reference Example 1 except that exposure (graded exposure) was performed using a photomask whose transmittance was continuously changed so that the exposure amount continuously changed during exposure. Obtained.

  In the obtained optical waveguide, the refractive index distribution has a plurality of minimum values and maximum values, and the refractive index of the core portion continuously decreases from the central portion toward the periphery, reaching a minimum value. In the side cladding portion, the refractive index continuously increased as the distance from the minimum value increased. At the minimum value, the shape of the refractive index distribution was V-shaped, and the change in the refractive index in the vicinity thereof was discontinuous.

  Tables 1 and 2 show the manufacturing conditions for the optical waveguides obtained in each of the above Examples and Reference Examples.

2. 2. Evaluation of optical waveguide 2.1 Visibility of identification symbol In place of the photomask used in Example 1, a linear shielding part (width 50 μm), a linear transmission part (width 50 μm), and FIG. An optical waveguide provided with an identification symbol in the same manner as in Example 1 except that a photomask provided with a circular shielding portion (diameter 40 μm) corresponding to the pattern 41 of the identification symbol 4 shown in FIG. Obtained.

  For other examples and reference examples, an optical waveguide provided with an identification symbol in the same manner as in Example 1 except that a circular pattern having a diameter of 80% of the width of the side cladding portion is formed. Got.

  Next, the visual visibility of the identification symbols formed on the obtained optical waveguide was evaluated. As a result, in all of the optical waveguides obtained in each example and each reference example, it was possible to visually recognize that the identification symbol was a number and a symbol from the difference in pattern and surrounding color.

2.2 Refractive index distribution of optical waveguide About the cross section of the core layer of the obtained optical waveguide, the refractive index distribution is measured by an interference microscope along the center line in the thickness direction, and the width direction of the cross section of the core layer is measured. A refractive index profile was obtained. In addition, since the obtained refractive index distribution has the same refractive index distribution pattern repeated for every core part, a part was cut out from the obtained refractive index distribution, and this was made into the refractive index distribution W.

  Among the refractive index distributions W, the shape of the distribution of “W type” in Tables 1 and 2 was a shape in which four local minimum values and five local maximum values were alternately arranged as shown in FIG. From this W-type refractive index distribution W, each minimum value Ws1, Ws2, Ws3, Ws4 and each maximum value Wm1, Wm2, Wm3, Wm4, Wm5 were obtained, and an average refractive index WA in the cladding part was obtained.

Further, in this W-type refractive index distribution W, the width a [μm] of the portion where the refractive index in the vicinity of the maximum values Wm2 and Wm4 formed in the core portion is equal to or greater than the average refractive index WA, and The width b [μm] of the portion where the refractive index in the vicinity of each local minimum value Ws1, Ws2, Ws3, Ws4 has a value less than the average refractive index WA was measured.
The above measurement results are shown in Tables 3 and 4.

  As a result, the refractive index distribution W in the width direction of the optical waveguide obtained in each example and each reference example had a continuous change in refractive index as a whole.

  The refractive index distribution W in the width direction of the optical waveguide obtained in Reference Example 1 was a step index type. The refractive index distribution W in the width direction of the optical waveguide obtained in Reference Example 2 was a graded index type. Further, the refractive index distribution W in the width direction of the optical waveguide obtained in Reference Example 3 has a plurality of minimum values and maximum values, and the refractive index is discontinuous between the core portion and the side cladding portion. Had changed.

  On the other hand, the refractive index distribution T in the thickness direction of the optical waveguide obtained in each example and each reference example was a step index type.

2.3 Transmission loss of optical waveguide Light emitted from an 850 nm VCSEL (surface emitting laser) is introduced into the optical waveguide obtained in each example and each reference example via a 50 μmφ optical fiber, and the emitted light is 200 μmφ. The light was received by an optical fiber and the light intensity was measured. Note that the cutback method was used to measure the transmission loss. Then, when the measured values were plotted with the longitudinal direction of the optical waveguide taken on the horizontal axis and the insertion loss on the vertical axis, the measured values were arranged on a straight line. Therefore, the transmission loss was calculated from the slope of the straight line.

2.4 Retention of pulse signal waveform A pulse signal having a pulse width of 1 ns was incident on the obtained optical waveguide from a laser pulse light source, and the pulse width of the emitted light was measured.

  Then, with respect to the measured pulse width of the emitted light, a relative value is calculated when the measured value of the optical waveguide (step index type optical waveguide) obtained in Reference Example 1 is set to 1, and this is used as the following evaluation criteria. Therefore, it was evaluated.

<Evaluation criteria for pulse width>
A: Relative value of pulse width is less than 0.5 B: Relative value of pulse width is 0.5 or more and less than 0.8 Δ: Relative value of pulse width is 0.8 or more and less than 1 ×: The relative value of the pulse width is 1 or more. Tables 5 and 6 show the evaluation results of 2.3 and 2.4.

  As is clear from Tables 5 and 6, it is recognized that the transmission loss and the blunting of the pulse signal are suppressed in the optical waveguide obtained in each example, compared with the optical waveguide obtained in each reference example. It was.

2.5 Intensity Distribution of Emitted Light from Optical Waveguide Further, the intensity distribution of the emitted light when the light was incident on one of the eight core portions was measured on the emission side end face of the obtained optical waveguide.

The intensity distribution of the emitted light was measured as follows.
FIG. 13 is a diagram for explaining a method of measuring the intensity distribution of outgoing light on the outgoing side end face of the optical waveguide.

  In the method shown in FIG. 13, first, the incident-side optical fiber 21 having a diameter of 50 μm is disposed so as to face one of the core portions 14 of the incident-side end face 1a of the optical waveguide 1 to be measured. The incident-side optical fiber 21 is connected to a light emitting element (not shown) for making light incident on the optical waveguide 1, and is arranged so that the optical axis thereof coincides with the optical axis of the core portion 14. Yes.

  On the other hand, an exit side optical fiber 22 having a diameter of 62.5 μm is disposed on the exit side end face 1b of the optical waveguide 1 so as to face the end surface 1b. The emission-side optical fiber 22 is connected to a light receiving element (not shown) for receiving the emitted light emitted from the optical waveguide 1, and its optical axis is the center in the thickness direction of the core layer of the optical waveguide 1. It is aligned with the line. The exit-side optical fiber 22 is configured to be able to scan the plane including this center line while maintaining a constant distance from the exit-side end face 1b.

  Then, the emission side optical fiber 22 is scanned while the light is incident on one of the core portions from the incident side optical fiber 21. Then, by measuring the intensity of the emitted light measured by the light receiving element with respect to the position of the emission side optical fiber 22, the intensity distribution of the emitted light with respect to the position of the emission side end face 1b can be obtained.

  FIG. 14 shows the intensity distribution of the emitted light measured as described above. FIG. 14 representatively shows the intensity distribution of the emitted light measured by the optical waveguides obtained in Example 1, Reference Example 1 and Reference Example 2.

  As is clear from FIG. 14, it was confirmed that the crosstalk was sufficiently suppressed in the optical waveguide obtained in Example 1. Further, in the optical waveguide obtained in Example 1, the intensity of the emitted light in the core part 14 adjacent to the core part 14 (the core part 14 in the center of FIG. 14) where the light is incident is adjacent to the core part 14. It was confirmed that the intensity of the emitted light was smaller than that of the side clad portion 15 located on the side opposite to the core portion 14 where the light was incident. This is because, in the optical waveguide obtained in Example 1, the side cladding portion 15 has a maximum value smaller than the core portion 14 and the refractive index distribution continuously changes. It is inferred that light that leaked to the adjacent core portions 14 and caused “crosstalk” in the past gathered in the side cladding portions 15 and consequently prevented the occurrence of crosstalk. Therefore, in the optical waveguide obtained in Example 1, it is possible to prevent interference between channels.

  In the optical waveguide obtained in Example 1, it was observed that a part of the emitted light was collected in the side clad portion 15. Usually, the light receiving elements connected to the optical waveguide are each core portion 14. Are connected so as to face the end surface of the light-emitting side, and are not connected to the side clad portion 15. Therefore, even if light gathers in the side cladding part 15, crosstalk does not occur and interference is suppressed.

  Although not shown, the crosstalk in the width direction was sufficiently suppressed in the optical waveguides obtained in the other examples as in the first example.

  On the other hand, in the optical waveguides obtained in Reference Examples 1 and 2, the maximum value of the intensity distribution of the emitted light is located in the core portion 14 adjacent to the core portion 14 where the light is incident, that is, the leaked light, Crosstalk was observed.

  Although not shown, crosstalk was also observed in the optical waveguide obtained in Reference Example 3.

  Furthermore, the degree of crosstalk was also evaluated for optical waveguides manufactured in the same manner as in each reference example except that a photomask added with a pattern forming an identification symbol in 2.1 was used. As a result, the degree of crosstalk was lower than that of the optical waveguide manufactured in each reference example (using a photomask not including an identification symbol). From this, it has been clarified that the occurrence of crosstalk can be suppressed by providing the identification symbol.

DESCRIPTION OF SYMBOLS 1 Optical waveguide 11, 12 Clad layer 13 Core layer 14 Core part 141, 142 Core part 15 Side surface clad part 151, 152, 153 Side surface clad part 2 Support film 3 Cover film 4 Identification symbol 41 Pattern 800 Die coater (multicolor extrusion molding) apparatus)
810 Die head 811 Upper lip part 812 Lower lip part 820 Manifold 821 Slit 830 Mixing unit 831 First supply pipe 832 Second supply pipe 833 Third supply pipe 835 Connection part 836 Pin 840 Conveyance part 841 Roller 842 Conveyance film 901 902 Optical waveguide forming composition 910 layer 914 multicolor molded body 914a first molded layer 914b second molded layer 914c third molded layer 914d fourth molded layer 914e fifth molded layer 914f sixth molded layer 914g seventh molded layer 914h Eighth molding layer 914i Ninth molding layer 915 Polymer 920 Additive 930 Actinic radiation 935 Mask (masking)
9351 opening (window)
925 Irradiation area 9251, 9252, 9253 Irradiation area 940 Non-irradiation area 9403 Non-irradiation area 951 Support substrate 21 Incident side optical fiber 22 Emission side optical fiber C1, C2 Center line W Refractive index distribution WA Average refractive index T, T ′ Refraction Index distribution H High refractive index part L Low refractive index part

Claims (9)

An optical waveguide having a plurality of parallel core portions and a side cladding portion positioned between the plurality of core portions,
An optical waveguide characterized by having an identification symbol made of a pattern made of the same material as that of the core portion and provided in the side clad portion. A plurality of the side clad portions, and the pattern provided on each of the side clad portions,
The optical waveguide according to claim 1, wherein the plurality of patterns are configured to function as the identification symbol. A background portion in which the plurality of patterns are uniformly distributed, and a blank portion that is provided in the background portion and the pattern does not exist locally,
The optical waveguide according to claim 1, wherein the entire blank portion is configured to function as the identification symbol.   The optical waveguide according to claim 2, wherein the identification symbol has a size that can be visually identified.   The optical waveguide according to claim 1, wherein the identification symbol includes a graphic code obtained by converting information into a graphic.   Each of the core part and the pattern is partially irradiated with light on a layer formed of a material in which a photopolymerizable monomer having a refractive index different from that of the polymer is dispersed in the polymer. 6. The optical waveguide according to claim 1, wherein the optical waveguide is formed by causing a deviation in refractive index in the layer by moving and unevenly distributing the monomer.   The optical waveguide according to claim 6, wherein the polymer is a (meth) acrylic resin, an epoxy resin, a silicone resin, a polyimide resin, a fluorine resin, or a polyolefin resin.   When the average width of the plurality of core portions is WCO [μm] and the average width of the plurality of side cladding portions is WCL [μm], WCO / WCL is 0.1 to 10, and WCL is 10 The optical waveguide according to claim 1, which has a thickness of ˜250 μm.   An electronic apparatus comprising the optical waveguide according to claim 1.

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