JP2013123071A - Electronic component package and manufacturing method of the same - Google Patents

Electronic component package and manufacturing method of the same Download PDF

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JP2013123071A
JP2013123071A JP2013012824A JP2013012824A JP2013123071A JP 2013123071 A JP2013123071 A JP 2013123071A JP 2013012824 A JP2013012824 A JP 2013012824A JP 2013012824 A JP2013012824 A JP 2013012824A JP 2013123071 A JP2013123071 A JP 2013123071A
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metal layer
space
bottomed hole
electronic component
lid
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JP5578246B2 (en
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Takafumi Kashiwagi
隆文 柏木
Yasuhiro Sugaya
康博 菅谷
Ryoichi Takayama
了一 高山
Atsushi Takano
敦 鷹野
Mitsuhiro Furukawa
光弘 古川
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Panasonic Corp
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Panasonic Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/162Disposition
    • H01L2924/16235Connecting to a semiconductor or solid-state bodies, i.e. cap-to-chip

Abstract

PROBLEM TO BE SOLVED: To propose new package structure and a manufacturing method which can achieve both of package thinning and high reliability in an electronic component package where a hollow part is formed and sealed on a functional element.SOLUTION: A resin layer 4 provided with space on a functional region 2 and a metal layer are stacked. The metal layer is formed so that the same material is separated into a portion 6 forming a lid having a projection for covering the space and supporting external pressure and a portion 7 forming an external terminal. After plating the entire surface so as to fill a space part and a patterned upper resin layer 9 that is provided on lower-layer resin 4 with a through hole 8 formed, the same structure can be easily obtained by cutting into predetermined thickness.

Description

本発明は、高周波電子回路に使用される表面弾性波フィルタに代表される、機能素子上が中空状態で封止されてなる電子部品パッケージおよびその製造方法に関するものである。   The present invention relates to an electronic component package represented by a surface acoustic wave filter used in a high-frequency electronic circuit, in which a functional element is sealed in a hollow state, and a manufacturing method thereof.

表面弾性波フィルタに代表される、単結晶ウエハー表面に電極パターンや微細構造を形成して特定の電気的機能を発揮する素子のパッケージは、機能部表面を樹脂等で覆うと特性が変化するため、素子表面の特に機能的に重要な部分に他の物体が接触しないように、中空構造とされる。   The package of an element that exhibits a specific electrical function by forming an electrode pattern or a fine structure on the surface of a single crystal wafer, represented by a surface acoustic wave filter, changes its characteristics when the functional part surface is covered with a resin or the like. A hollow structure is employed so that other objects do not come into contact with a particularly functionally important part of the element surface.

一般的な表面弾性波フィルタ(以下SAWフィルタと記す)のパッケージ構造を図4に示す。   FIG. 4 shows a package structure of a general surface acoustic wave filter (hereinafter referred to as SAW filter).

パッケージ寸法の縮小を目的として、回路基板101に表面弾性波素子(以下SAW素子と記す)104を、機能面を基板側に向けて実装する、いわゆるフリップチップ実装が行われ、さらに樹脂等の材料107で封止された構造が一般的である。機能部表面上は封止材が覆わない中間部108となっている。   For the purpose of reducing package dimensions, so-called flip chip mounting is performed in which a surface acoustic wave element (hereinafter referred to as a SAW element) 104 is mounted on a circuit board 101 with a functional surface facing the substrate side, and a material such as a resin. A structure sealed with 107 is common. On the surface of the functional part, an intermediate part 108 that is not covered with the sealing material is formed.

上記構造は、SAW素子をウエハーから個片に切り出した後、個片素子を基板に実装した構造であるが、さらなる小型化を目的として、ウエハーのまま中空封止構造を形成した後、ダイシングにより個片化してパッケージ完成となる構造が提案されており、その例を図5に示す。   The above structure is a structure in which a SAW element is cut out from a wafer into individual pieces, and then the individual elements are mounted on a substrate. For the purpose of further miniaturization, after forming a hollow sealing structure with a wafer, dicing is performed. A structure in which a package is completed by dividing it into pieces is proposed, and an example thereof is shown in FIG.

図5は、個片化された後の素子の断面図で、機能部111と電極112が表面に形成された単結晶材110上に、空間116を形成するための樹脂層113とその上に接着された回路基板114からなる構造であり、115は外部接続用端子である。   FIG. 5 is a cross-sectional view of the element after being singulated. On the single crystal material 110 on which the functional portion 111 and the electrode 112 are formed, the resin layer 113 for forming the space 116 and the resin layer 113 are formed thereon. The circuit board 114 is bonded, and reference numeral 115 denotes an external connection terminal.

このような構造のパッケージは図4に示すパッケージに比べ、SAW素子を囲む封止構造がないため、さらなる小型化が図れるものであり、SAW素子を回路基板上に実装する工程を省略できるため、製造コスト面でも有利である。   Since the package having such a structure does not have a sealing structure surrounding the SAW element as compared with the package shown in FIG. 4, further downsizing can be achieved, and the process of mounting the SAW element on the circuit board can be omitted. This is also advantageous in terms of manufacturing cost.

この出願の発明に関する先行技術文献情報としては、例えば特許文献1が知られている。   For example, Patent Document 1 is known as prior art document information relating to the invention of this application.

特表2002−532934号公報Special Table 2002-532934

図5に示す、先行文献が開示するパッケージ構造では、実使用上の信頼性において課題があった。   The package structure disclosed in the prior art shown in FIG. 5 has a problem in reliability in actual use.

SAWフィルタは、携帯電話に代表される小型通信機器に使用されることが多いが、最近は、予めSAWフィルタを含む電子部品が実装された機能モジュールを作製し、それを機器のマザー基板に実装するという使用方法が一般的である。   SAW filters are often used in small communication devices typified by mobile phones, but recently, functional modules on which electronic parts including SAW filters are mounted in advance are mounted on the motherboard of the device. It is common to use it.

機能モジュールは、小型の回路基板に高密度に電子部品を実装して、特定の機能を発揮するように形成された部品集合体であり、外部電極部を除いて、樹脂で封止されていることが一般的である。樹脂封止方法として、最もよく使用されるのがトランスファーモールド法であり、樹脂モールド工程において、150℃以上の高温と数MPa以上の高圧が電子部品に加わる。   A functional module is an assembly of components formed so as to exhibit specific functions by mounting electronic components at high density on a small circuit board, and is sealed with resin except for external electrode portions. It is common. As the resin sealing method, the transfer mold method is most often used. In the resin molding process, a high temperature of 150 ° C. or higher and a high pressure of several MPa or higher are applied to the electronic component.

特許文献1に開示された実装構造は、空間部分の蓋をプリント基板と称する回路基板が成すものである。前記回路基板は、繊維強化樹脂シートの表面が銅箔で被覆されたもので、高温中での外力に対し十分な剛性および耐力を持たない。   The mounting structure disclosed in Patent Document 1 is a circuit board in which the lid of the space portion is called a printed board. In the circuit board, the surface of the fiber reinforced resin sheet is coated with a copper foil, and the circuit board does not have sufficient rigidity and strength against an external force at a high temperature.

上記、トランスファーモールド工程において、高温高圧が加わると、空間部分の蓋を成す回路基板は容易に変形し、空間がつぶれ、SAWフィルタとしても特性が変化してしまうという課題があった。   In the above transfer molding process, when high temperature and high pressure are applied, the circuit board forming the cover of the space part is easily deformed, the space is crushed, and the characteristics of the SAW filter are changed.

また、高温高圧に耐えうるような回路基板とするには、厚みを大きくする必要があり、パッケージ全体の厚みが大きくなってしまうという課題があった。   In addition, in order to obtain a circuit board that can withstand high temperature and high pressure, it is necessary to increase the thickness, which increases the overall thickness of the package.

前記課題を解決するために、本発明は、機能領域と電極を有する素子が表面に形成された基板に、少なくとも前記機能領域上に空間を設けた樹脂層と、金属層が積層された構造の電子部品パッケージであって、前記金属層は、前記機能領域を覆う蓋を形成する部分と、外部電極を形成する部分から成り、前記金属層の前記機能領域を覆う蓋を形成する少なくとも一部分が前記基板の表面に接する複数の突起を有し、前記複数の突起の間に前記空間が存在すると共に前記複数の突起は前記機能領域上における蓋を介して接続されており、前記複数の突起と前記空間との間に前記樹脂層の少なくとも一部が存在することを特徴とするものである。   In order to solve the above-described problems, the present invention has a structure in which a resin layer having a space on at least the functional region and a metal layer are laminated on a substrate on which a device having a functional region and an electrode is formed. In the electronic component package, the metal layer includes a portion that forms a lid that covers the functional region and a portion that forms an external electrode, and at least a part of the metal layer that forms the lid that covers the functional region is the A plurality of protrusions in contact with a surface of the substrate, wherein the space exists between the plurality of protrusions, and the plurality of protrusions are connected via a lid on the functional area, and the plurality of protrusions and the protrusions At least a part of the resin layer exists between the space and the space.

本発明の電子部品パッケージ構造は、空間を設けた樹脂層と、金属層が積層された構造であり、金属層により機能領域を覆う蓋が形成されているため高い剛性を持ち、かつ、金属蓋には基板表面に達する突起があり、トランスファーモールド等の高温高圧にさらされる場合においても、空間部分の変形が少なく、高信頼性が得られるという効果を有し、さらに、十分薄い構造でも高温高圧に耐えうるため、パッケージ全体の厚みを薄くすることができるという効果も有する。   The electronic component package structure of the present invention is a structure in which a resin layer having a space and a metal layer are laminated, and since the lid that covers the functional area is formed by the metal layer, it has high rigidity, and the metal lid Has protrusions that reach the surface of the substrate, and even when exposed to high temperatures and high pressures such as transfer molds, it has the effect of reducing the deformation of the space and obtaining high reliability. Therefore, the thickness of the entire package can be reduced.

また、本発明の電子部品パッケージの製造方法は、表面に機能領域と電極を有する素子が多数個形成された基板に、感光性樹脂層を用いて空間部および有底孔部を形成後、樹脂層全面に銅箔等の膜材を積層し、空間部の蓋となる膜材が残るようにパターニングし、電極との接続用有底孔および蓋部の突起となる有底孔を露出させ、前記有底孔に金属層をめっき堆積させると同時に、空間部上の膜材上に金属層を堆積させ、電極部と空間部蓋を同時形成する工程、めっき堆積された金属層を複数の部分に分割する工程、積層された各層を含めてダイシングして個片化する工程からなるもので、電極部と突起付きの空間部蓋が同時に形成でき、工程が簡略化されるという効果がある。   In addition, the method of manufacturing an electronic component package according to the present invention includes forming a space portion and a bottomed hole portion using a photosensitive resin layer on a substrate on which a large number of elements having functional regions and electrodes are formed on the surface. Laminating a film material such as copper foil on the entire surface of the layer, patterning so that the film material that becomes the lid of the space part remains, exposing the bottomed hole for connecting to the electrode and the bottomed hole that becomes the protrusion of the lid part, A step of depositing a metal layer on the bottomed hole and simultaneously depositing a metal layer on a film material on the space portion to simultaneously form an electrode portion and a space portion lid; And the step of dicing into individual pieces including each laminated layer, and the electrode portion and the space portion lid with protrusions can be formed at the same time, and the process is simplified.

また、前記めっき堆積された金属層を複数の部分に分割する工程において、予め分割境界となる場所に樹脂からなる壁を形成し、金属層をめっき後、金属層を前記樹脂壁の高さ以下にまで除去することにより金属層の分割を行うという工法は、一般的に金属層を所定のパターンに分割する方法として用いられるフォトレジストエッチング法では不可能な、厚い金属層を微細なパターンに分割できるという効果があり、また、厚みばらつきがウエハー内で非常に少ない、すなわち均一な厚みのパッケージが得られると言う効果を有する。   Further, in the step of dividing the metal layer deposited by plating into a plurality of portions, a wall made of a resin is previously formed at a location that becomes a division boundary, and after the metal layer is plated, the metal layer is not higher than the height of the resin wall. The method of dividing the metal layer by removing the metal layer to the thickness of the thick metal layer into fine patterns, which is generally impossible with the photoresist etching method used as a method of dividing the metal layer into a predetermined pattern. In addition, there is an effect that the thickness variation is very small in the wafer, that is, a package having a uniform thickness can be obtained.

本発明の実施の形態における電子部品パッケージを示す断面図Sectional drawing which shows the electronic component package in embodiment of this invention 同実施の形態における電子部品パッケージの製造方法を示す工程断面図Process sectional drawing which shows the manufacturing method of the electronic component package in the embodiment 同実施の形態における電子部品パッケージの製造方法を示す工程断面図Process sectional drawing which shows the manufacturing method of the electronic component package in the embodiment 従来のパッケージの断面図Cross section of conventional package 従来のパッケージの断面図Cross section of conventional package

(実施の形態)
以下、本発明の実施の形態における電子部品パッケージについて図面を参照しながら説明する。
(Embodiment)
Hereinafter, an electronic component package according to an embodiment of the present invention will be described with reference to the drawings.

図1は実施の形態における、SAWフィルタパッケージの断面図である。   FIG. 1 is a cross-sectional view of a SAW filter package in the embodiment.

図1において、機能領域であるIDT部2と電極3が形成されたリチウムタンタレート単結晶基板1の表面上に、空間部5を有する樹脂層4が形成され、さらに樹脂層4の表面にたとえば銅からなる金属層6が積層されている。   In FIG. 1, a resin layer 4 having a space portion 5 is formed on the surface of a lithium tantalate single crystal substrate 1 on which an IDT portion 2 and an electrode 3 which are functional regions are formed. A metal layer 6 made of copper is laminated.

電極3から外部電極7への接続は、樹脂層4に設けられた有底孔8に銅などの金属が突起状に充填されて行われる。   The connection from the electrode 3 to the external electrode 7 is performed by filling the bottomed hole 8 provided in the resin layer 4 with a metal such as copper in a protruding shape.

また、金属層6にたとえば銅からなる突起10が形成され、その先端は基板1の表面に接している。   Further, a protrusion 10 made of, for example, copper is formed on the metal layer 6, and the tip thereof is in contact with the surface of the substrate 1.

外部電極7は、空間部5の蓋を形成する金属層6と同材の金属からなり、絶縁樹脂層9によって他の電極や蓋部分と分離されている。   The external electrode 7 is made of the same metal as the metal layer 6 that forms the lid of the space portion 5, and is separated from other electrodes and lid portions by the insulating resin layer 9.

本発明において、電極および中間部蓋を形成する金属層が銅であれば、特にめっき成膜が容易であり、有底孔への充填めっきと蓋部分のめっきを同時に行うことができ、電気抵抗が低く良好な電気的特性を得ることができる。なお、同様の金属層が形成できれば、銅に限定するものではない。   In the present invention, if the metal layer that forms the electrode and the intermediate cover is copper, it is particularly easy to form a plating film, and filling and plating of the bottomed hole and plating of the cover portion can be performed simultaneously. And good electrical characteristics can be obtained. In addition, if the same metal layer can be formed, it will not be limited to copper.

このパッケージに外部静水圧が印加された場合、空間部蓋が大きな加圧力を受けるが、金属製の突起10によって基板表面から支えられているために、空間部5の変形は小さく抑えられる。一般に銅と感光性樹脂材料の150℃以上の高温での弾性率を比較すると、銅の方が10倍乃至100倍以上大きく、樹脂だけで空間部を支える場合と比較して顕著な変形低減が可能である。   When an external hydrostatic pressure is applied to the package, the space lid receives a large applied pressure, but since the metal projection 10 supports the space lid, the deformation of the space 5 is suppressed to a small level. In general, when comparing the elastic modulus of copper and photosensitive resin materials at a high temperature of 150 ° C. or higher, copper is 10 to 100 times larger and the deformation is significantly reduced compared to the case where the space is supported by resin alone. Is possible.

次に、このようなパッケージ構造を実現するための製造方法を説明する。   Next, a manufacturing method for realizing such a package structure will be described.

図2、図3は、工程を追って説明するためのSAWフィルタパッケージの断面図である。   2 and 3 are cross-sectional views of the SAW filter package for explaining the process step by step.

図2(a)に示すように、IDT部2と電極3が複数個形成された単結晶基板1の表面上に、感光性樹脂層4を均一な厚みに形成する。この樹脂層の厚みが空間部の高さに相当するので、完成後のパッケージ高さおよび必要な耐圧力性を考慮して決定する。   As shown in FIG. 2A, a photosensitive resin layer 4 is formed with a uniform thickness on the surface of a single crystal substrate 1 on which a plurality of IDT portions 2 and electrodes 3 are formed. Since the thickness of the resin layer corresponds to the height of the space portion, the thickness is determined in consideration of the package height after completion and the required pressure resistance.

本図では、IDT部と電極のセットが2組形成された単結晶基板を図示している。   This figure shows a single crystal substrate in which two sets of IDT portions and electrodes are formed.

次に、図2(b)に示すように、樹脂層4の感光性を利用して、IDT部2上に空間部5を、電極3上に接続孔を形成する有底孔18を、さらに、空間部上の蓋の突起10を形成する有底孔20を形成する。   Next, as shown in FIG. 2B, by utilizing the photosensitivity of the resin layer 4, a bottomed hole 18 that forms a space portion 5 on the IDT portion 2 and a connection hole on the electrode 3 is further formed. The bottomed hole 20 that forms the projection 10 of the lid on the space is formed.

次に、図2(c)に示すように、膜材を樹脂層4上全面に接着する。   Next, as shown in FIG. 2C, the film material is bonded to the entire surface of the resin layer 4.

本実施の形態では膜材は厚み3μmの銅箔11を用いる。銅箔の接着面に薄いシート状の熱硬化性接着剤を積層した後、樹脂層4に加圧積層し加熱することで、容易に接着することができる。また、樹脂層4に未硬化のエポキシ樹脂を用いると、銅箔11を樹脂層4に加圧した状態で樹脂層4を硬化させることにより、他の接着剤を用いることなく銅箔を接着できる。   In the present embodiment, a copper foil 11 having a thickness of 3 μm is used as the film material. After laminating a thin sheet-like thermosetting adhesive on the adhesive surface of the copper foil, it can be easily bonded by pressure laminating on the resin layer 4 and heating. Moreover, when an uncured epoxy resin is used for the resin layer 4, the copper foil can be bonded without using another adhesive by curing the resin layer 4 in a state where the copper foil 11 is pressed against the resin layer 4. .

次に、図2(d)に示すように、銅箔11を空間部5上の銅箔12のみ残すようにフォトリソ法でエッチングすると、電極上の有底孔18および20が開口する。   Next, as shown in FIG. 2D, when the copper foil 11 is etched by the photolithography method so as to leave only the copper foil 12 on the space 5, the bottomed holes 18 and 20 on the electrodes are opened.

このとき、銅箔11は厚み3μmと十分薄いため、高精度にパターニングが可能である。   At this time, since the copper foil 11 is sufficiently thin with a thickness of 3 μm, patterning can be performed with high accuracy.

また、前記銅箔11を樹脂層4上に接着する際に、接着剤シートを用いた場合、銅箔11をエッチング除去後、有底孔18および20上に接着シートが残存する。この場合、酸素プラズマ等を用いたアッシング工程を導入することにより、有底孔18および20を完全に開口させることができる。   When an adhesive sheet is used when bonding the copper foil 11 on the resin layer 4, the adhesive sheet remains on the bottomed holes 18 and 20 after the copper foil 11 is removed by etching. In this case, the bottomed holes 18 and 20 can be completely opened by introducing an ashing process using oxygen plasma or the like.

この接着剤シートを用いた工法は、銅箔11のエッチング時に、銅腐食液が有底孔18に侵入することが無いため、電極3に対して腐食性のある腐食液を用いることができるという効果を有する。   In the method using the adhesive sheet, since the copper corrosive liquid does not enter the bottomed hole 18 when the copper foil 11 is etched, a corrosive liquid corrosive to the electrode 3 can be used. Has an effect.

次に、図3(e)に示すように、パターン化された樹脂層13を設ける。   Next, as shown in FIG. 3E, a patterned resin layer 13 is provided.

樹脂層13は、めっき銅層を分割する境界になるもので、少なくとも電極上の有底孔18、空間部5上の銅箔12、および突起用有底孔20が露出するように設ける。   The resin layer 13 serves as a boundary that divides the plated copper layer, and is provided so that at least the bottomed hole 18 on the electrode, the copper foil 12 on the space 5, and the bottomed hole 20 for protrusion are exposed.

また、空間部5上の銅箔12および突起用有底孔20は、銅めっき後一連の金属部になる必要があるため、樹脂層13によって分割されない同一の領域とする。   Moreover, since the copper foil 12 and the bottom hole 20 for protrusions on the space part 5 need to become a series of metal parts after copper plating, they are the same area that is not divided by the resin layer 13.

樹脂層13の厚みは、空間部5上に必要な銅厚以上の値とする。   The thickness of the resin layer 13 is a value equal to or greater than the copper thickness required on the space portion 5.

空間部5上に必要な銅厚は、完成後の電子部品パッケージに必要な耐圧力から決められる値とする。   The copper thickness required on the space 5 is a value determined from the pressure resistance required for the completed electronic component package.

次に、図3(f)に示すように、次工程のめっき用電極となる金属薄膜14を成膜する。本実施の形態では、スパッタ法により、チタン膜と銅膜を合計300nm成膜した。   Next, as shown in FIG. 3F, a metal thin film 14 to be a plating electrode in the next step is formed. In this embodiment, a total of 300 nm of a titanium film and a copper film is formed by sputtering.

金属薄膜14は、電極上の有底孔18の内部および電極3の表面、さらに、突起用有底孔20の内部にも成膜されることが必要である。   The metal thin film 14 needs to be formed inside the bottomed hole 18 on the electrode, the surface of the electrode 3, and also inside the bottomed hole 20 for protrusion.

次に、図3(g)に示すように、前工程で成膜した金属薄膜14をめっき電極として、表面全体に銅層15をめっき形成する。このときの銅層厚みとしては、少なくとも電極上の有底孔18の内部および突起用有底孔20の内部に充填されるとともに、空間部5上に最終必要な厚み以上の銅層が形成されることが必要である。   Next, as shown in FIG. 3G, a copper layer 15 is formed by plating on the entire surface using the metal thin film 14 formed in the previous step as a plating electrode. As the copper layer thickness at this time, at least the inside of the bottomed hole 18 on the electrode and the inside of the bottomed hole 20 for protrusion are filled, and a copper layer having a thickness greater than the final required thickness is formed on the space 5. It is necessary to

次に、図3(h)に示すように、めっき形成された銅層15表面を切削し、樹脂層13上に堆積した銅を除去する。樹脂層13が露出するまで切削を行う。   Next, as shown in FIG. 3H, the surface of the copper layer 15 formed by plating is cut, and the copper deposited on the resin layer 13 is removed. Cutting is performed until the resin layer 13 is exposed.

この結果、表面全体に形成されていためっき銅層は、樹脂層13によって、複数の部分に分断される。この分断された部分は、複数の外部接続用電極16と空間部5上の蓋17に相当する。   As a result, the plated copper layer formed on the entire surface is divided into a plurality of portions by the resin layer 13. The divided portions correspond to the plurality of external connection electrodes 16 and the lid 17 on the space portion 5.

この時、空間部5上の蓋17と、突起用有底孔20に充填めっきされた銅は一体化し、空間部5上の蓋17は突起10によって、基板表面に支えられた形となっている。   At this time, the lid 17 on the space portion 5 and the copper plated and filled in the bottom hole 20 for projection are integrated, and the lid 17 on the space portion 5 is supported by the projection 10 on the substrate surface. Yes.

さらに、突起10が接する基板表面に電極を設けておくと、電極と空間部5上の蓋17は突起10を介して電気的にも接続され、空間部5上の蓋17を外部接続用電極を兼ねるものとすることもできる。   Further, if an electrode is provided on the surface of the substrate in contact with the protrusion 10, the electrode and the lid 17 on the space 5 are also electrically connected via the protrusion 10, and the lid 17 on the space 5 is connected to the external connection electrode. It can also serve as.

このように、めっき銅層15は、空間部5を外圧から保護するための十分な厚みを持ちながら、微細なパターンに分断形成することが可能となる。   Thus, the plated copper layer 15 can be divided into fine patterns while having a sufficient thickness for protecting the space 5 from external pressure.

次に、図3(i)に示すように、ダイシングを行い、個片化することにより、パッケージが完成する。   Next, as shown in FIG. 3 (i), dicing is performed and the package is completed.

なお、本実施の形態では、表面弾性波フィルタ(SAW)素子を用いたが、これに限らず、加速度センサ素子、角速度センサ素子等の、表面に機能的構造を有して他の物体が接することによって特性変化を来すために、素子表面が中空状態に保たれたパッケージに適用することができる。   In this embodiment, a surface acoustic wave filter (SAW) element is used. However, the present invention is not limited to this, and other objects such as an acceleration sensor element and an angular velocity sensor element have a functional structure on the surface. Therefore, it can be applied to a package in which the element surface is kept hollow.

以上のように、本発明の電子部品パッケージ構造は、素子表面が中空状態に保たれたパッケージに適用することができ、小型かつ高信頼性が得られるものである。   As described above, the electronic component package structure of the present invention can be applied to a package in which the element surface is maintained in a hollow state, and is small and highly reliable.

また、本発明の電子部品パッケージの製造方法は、外圧に耐えることができる十分な厚みの金属層を形成し、かつ微細な部分に金属層を分断して電極を形成することが可能で、高信頼かつ小型の電子部品パッケージを少ない工程で提供するものである。   In addition, the manufacturing method of the electronic component package of the present invention can form a metal layer having a sufficient thickness that can withstand external pressure, and can divide the metal layer into fine portions to form electrodes. A reliable and small electronic component package is provided with a small number of processes.

1 単結晶基板
2 IDT部
3 電極
4 樹脂層
5 空間部
6 金属層(蓋部分)
7 金属層(外部電極部分)
8 有底孔
9 絶縁樹脂層
10 突起
DESCRIPTION OF SYMBOLS 1 Single crystal substrate 2 IDT part 3 Electrode 4 Resin layer 5 Space part 6 Metal layer (lid part)
7 Metal layer (external electrode part)
8 Bottomed hole 9 Insulating resin layer 10 Protrusion

Claims (5)

機能領域と電極を有する素子が表面に形成された基板に、少なくとも前記機能領域上に空間を設けた樹脂層と、金属層が積層された構造の電子部品パッケージであって、前記金属層は、前記機能領域を覆う蓋を形成する部分と、外部電極を形成する部分から成り、前記金属層の前記機能領域を覆う蓋を形成する少なくとも一部分が前記基板の表面に接する複数の突起を有し、
前記複数の突起の間に前記空間が存在すると共に前記複数の突起は前記機能領域上における蓋を介して接続されており、
前記複数の突起と前記空間との間に前記樹脂層の少なくとも一部が存在することを特徴とする電子部品パッケージ。
An electronic component package having a structure in which a resin layer having at least a space on the functional region and a metal layer are laminated on a substrate having an element having a functional region and an electrode formed on the surface, wherein the metal layer includes: A portion that forms a lid that covers the functional region, and a portion that forms an external electrode, and at least a portion that forms the lid that covers the functional region of the metal layer has a plurality of protrusions in contact with the surface of the substrate;
The space exists between the plurality of protrusions and the plurality of protrusions are connected via a lid on the functional area,
An electronic component package, wherein at least a part of the resin layer exists between the plurality of protrusions and the space.
機能領域と電極を有する素子が表面に形成された基板に、感光性樹脂層を形成する工程と、現像により感光性を利用して前記機能領域および前記電極上の樹脂層を除去することで空間部および有底孔部を作製する工程と、前記感光性樹脂層表面に膜材を積層する工程と、前記膜材を少なくとも前記空間部を覆う部分を残して除去することで前記有底孔部を露出する工程と、前記有底孔部にめっき法にて金属層を堆積させると共に、前記有底孔部以外にも金属層を堆積させることで前記空間部上に前記機能領域を覆う蓋の少なくとも一部を形成する工程とを有することを特徴とする電子部品パッケージの製造方法。 A step of forming a photosensitive resin layer on a substrate on which a device having functional regions and electrodes is formed, and a space by removing the functional region and the resin layer on the electrodes by utilizing photosensitivity by development. The bottomed hole portion by removing the film material leaving at least a portion covering the space portion, the step of producing the bottom portion and the bottomed hole portion, the step of laminating the film material on the surface of the photosensitive resin layer, And a metal layer deposited on the bottomed hole by plating, and a metal layer other than the bottomed hole is deposited to cover the functional area on the space. And a step of forming at least a part thereof. 前記膜材が接着膜付きの銅箔であり、前記めっき形成する金属層が銅であることを特徴とする請求項2に記載の電子部品パッケージの製造方法。 3. The method of manufacturing an electronic component package according to claim 2, wherein the film material is a copper foil with an adhesive film, and the metal layer to be plated is copper. 前記堆積させた金属層を少なくとも前記蓋と一部の有底孔部とを含む領域と、他の有底孔部を含む領域に分割する工程を有することを特徴とする請求項2に記載の電子部品パッケージの製造方法。 3. The method according to claim 2, further comprising the step of dividing the deposited metal layer into a region including at least the lid and a part of the bottomed hole portion and a region including another bottomed hole portion. Electronic component package manufacturing method. 前記堆積させた金属層を少なくとも前記空間部上部分と一部の有底孔部と、他の有底孔部を含む領域に分割する工程において、予め分割境界となる場所に樹脂からなる壁を形成し、金属層をめっき後、金属層を前記樹脂壁の高さ以下にまで除去することにより金属層の分割を行うことを特徴とする請求項4に記載の電子部品パッケージの製造方法。 In the step of dividing the deposited metal layer into at least the upper part of the space part, a part of the bottomed hole part, and a region including the other bottomed hole part, a wall made of a resin is previously provided at a place serving as a dividing boundary. 5. The method of manufacturing an electronic component package according to claim 4, wherein the metal layer is divided by removing the metal layer up to a height of the resin wall after forming and plating the metal layer.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001185976A (en) * 1999-12-24 2001-07-06 Kyocera Corp Surface acoustic wave device
JP2002300000A (en) * 2001-03-30 2002-10-11 Fujitsu Media Device Kk Surface acoustic wave device
JP2007324162A (en) * 2006-05-30 2007-12-13 Sony Corp Semiconductor device and its manufacturing process
JP2008159844A (en) * 2006-12-25 2008-07-10 Matsushita Electric Ind Co Ltd Electronic component package structure and its method for manufacturing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001185976A (en) * 1999-12-24 2001-07-06 Kyocera Corp Surface acoustic wave device
JP2002300000A (en) * 2001-03-30 2002-10-11 Fujitsu Media Device Kk Surface acoustic wave device
JP2007324162A (en) * 2006-05-30 2007-12-13 Sony Corp Semiconductor device and its manufacturing process
JP2008159844A (en) * 2006-12-25 2008-07-10 Matsushita Electric Ind Co Ltd Electronic component package structure and its method for manufacturing

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