JP2013117816A - Touch panel sensor substrate and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve structure of a terminal part of a touch panel sensor substrate, to prevent corrosion or peeling of a metal line at the terminal part, to reduce poor crimping with an FPC, and to improve damage and stain prevention functions of the touch panel sensor substrate.SOLUTION: A touch panel sensor substrate is made into structure that a surface layer is formed so that a touch panel sensor layer has first sensor electrodes, and a plurality of second sensor electrode main parts which orthogonally cross the first sensor electrode to extend in a second direction, and are arranged in parallel in a first direction, and a sensor electrode layer consisting of a plurality of first sensor electrodes and the second sensor electrodes occupies approximately the whole surface of the touch panel sensor layer, structure of a terminal part on the substrate surface is formed of an ITO transparent conductor layer which is the same as that of the sensor electrodes, and an extraction line and its wiring terminal connection part are made into laminated structure of being coated with the ITO transparent conductor layer or structure laminated on the ITO transparent conductor layer, and further made into terminal part structure that a laminated part and a laminated edge of the terminal part is coated with a protective layer.

Description

  The present invention relates to a touch panel sensor substrate and a method of manufacturing the substrate, and more particularly to a durable substrate and a method of manufacturing the substrate.

  In many cases, the touch panel device is used together with the display device as an input means for various devices including a display device such as a liquid crystal display or a plasma display (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). ing. In such a device, the touch panel sensor layer is disposed on the display surface of the display device, whereby the touch panel device enables direct input to the display device.

  Touch panel devices are classified into various types based on the principle of detecting a contact position (approach position) on the touch panel sensor layer. Nowadays, the capacitive coupling method ("capacitance method" or "capacitance method" is used because it is optically bright, has a good design, is easy in structure, and has excellent functionality. A touch panel device (also referred to as a “combined method”) is attracting attention.

  In a capacitively coupled touch panel device, an extraordinary capacitance is generated when an external conductor (typically a finger) whose position is to be detected contacts (approaches) the touch panel sensor layer via a dielectric. And the position of the target object on a touch panel sensor layer is detected using the change of this capacitive coupling. The capacitive coupling method includes a surface type and a projection type. The projection type is attracting attention because it is suitable for multi-touch recognition (multi-point recognition) (for example, Patent Document 1).

  In the touch panel sensor layer disclosed in Patent Document 1, the first transparent electrode and the second transparent electrode are provided on the same side surface of the substrate. The touch panel sensor is arranged so that the approach / contact detection surface covers the display area of the display device, detects an approach / contact event of the operator's finger or touch pen, and sends these signals to the control device. The control device processes these signals and outputs a predetermined signal to the control device on the display device side so that display corresponding to the input operation is performed on the display device. It is concentrated on the part.

By the way, the touch panel sensor substrate including the touch panel sensor layer is usually manufactured separately from the display device and attached to the display surface of the display device (for example, Patent Document 2). In this case, light can be reflected not only at the outermost surface on the observer side (the surface of the touch panel sensor) but also at the interface between the touch panel sensor substrate and the display surface of the display device.
As a result, more ambient light (external light) such as illumination light is reflected and the contrast is lowered, and the transmittance of the image light displayed by the display device is lowered.

  In addition, flat panel displays having a thin display panel are widely used as display devices. Therefore, by attaching a separate touch panel sensor substrate to the display panel, there is a problem that the thickness of the entire display panel is increased and the weight is increased.

  When the touch panel device is used in combination with a separate display device, the problems described above are eliminated, and the display substrate is made thinner and lighter, and the manufacturing cost is reduced and the productivity is improved by reducing the number of processes. Therefore, it is also considered to apply a touch panel sensor substrate having a touch panel sensor layer as a display device substrate that constitutes a display panel such as a liquid crystal display panel (LCD panel) or a plasma display panel (PDP). .

As an example, a base material, a touch panel sensor layer formed on one side of the base material, a configuration for a display device formed on the other side of the base material, and as a specific example, a color for PDP or LCD panel A substrate having a filter layer has been studied (hereinafter referred to as “touch panel integrated color filter”).

On the other hand, a touch panel sensor layer used in various types of touch panel devices has a complicated configuration, and includes a sensor unit 60a that is easily damaged by the complicated configuration.
A touch panel sensor layer such as a projected capacitive coupling system has a sensor unit 60a formed by patterning a transparent conductor, and the sensor unit 60a is disposed on the display surface.
Therefore, the transparent conductor pattern forming the sensor unit 60a is formed very thin so as not to be visually recognized. That is, the sensor unit 60a of the projected capacitive coupling touch panel sensor layer is very complicated and easily damaged, and it is difficult to recognize the damage.
Usually, polycrystalline ITO is typically used as the transparent electrode forming the sensor electrode.

Conventionally, in order to prevent damage to the touch panel sensor layer, the sensor unit 60a is covered with a protective layer. By covering the surface of the sensor electrode with a dielectric material made of an organic material as a protective layer, it is intended to prevent scratches and dirt, and to prevent disconnection due to damage to the sensor unit 60a.
However, in the process of manufacturing a display substrate using a touch panel sensor substrate, it is not possible to eliminate physical or chemical influences from various processing steps performed on the substrate in the process of forming the touch panel sensor layer.

  For example, conventionally, the terminal portion formed on the surface of the touch panel sensor substrate has a wiring terminal connection portion of the take-out line portion exposed to the outside as it is to input and output an electric signal to an external position detection circuit. In other words, the wiring terminal connection portion is provided so as to be covered with a transparent conductor layer made of an ITO transparent conductive material or the like that forms a sensor electrode or the like of the touch panel sensor portion 60a.

In Patent Documents 1 and 2, as a problem when the terminal portion is the metal 75a and the metal 75a + ITO coating 75c, the conductor layer 75a that forms the lead-out line of the terminal portion and the wiring terminal connection portion is made of a metal material with high conductivity. Therefore, there is a problem that the etching solution permeates through the etching process when patterning is formed, and peeling occurs (Comparative Example 1 in FIG. 13).
Even if the terminal portion has a laminated structure in which the wiring terminal connection portion 75a is covered with the transparent conductor layer 75c, the transparent conductor layer is thinned at the edge portion of the wiring terminal connection portion, or a sufficient laminated coating structure is provided. Since it cannot be taken, there is a problem that the same peeling occurs (Comparative Example 2 in FIG. 14).

Further, in a display substrate such as a color filter integrated with a touch panel sensor, it is necessary to carry the display with the touch panel sensor surface facing down in the process of forming the color filter layer.
At that time, the protective layer is rubbed against the conveying roller, the suction pad, the support pin, or the like of the conveying means, and scratches or dirt are generated, which deteriorates the appearance quality.

  Further, in the step of forming the color filter layer, the color filter layer usually has a black matrix (light shielding portion) formed corresponding to the pixel and a plurality of types of colored portions. The black matrix and the colored portion are usually formed by exposing and developing a coated material layer using a photolithography technique.

If there is ITO patterning in the process, the polycrystalline ITO film is usually formed by sputtering using a mixed gas of argon and oxygen while the substrate is heated, and a desired pattern is formed by photolithography. A method of etching unnecessary ITO with water is used. Here, the temperature of the substrate heating for ITO crystallization is usually 200 ° C. to 250 ° C. (Patent Document 3).
Also, the substrate is heated at a lower temperature, or without heating the substrate, an amorphous ITO film is formed by sputtering, then annealed to crystallize the ITO, and then unnecessary with aqua regia There is also a method of obtaining a polycrystalline ITO pattern by etching ITO (Patent Documents 4 and 5).

  In the step of forming the color filter layer in the touch panel sensor integrated color filter as described above, if there is ITO patterning, the ITO etching solution is always formed on the exposed touch panel sensor side in FIGS. 13 and 14. The metal line and ITO layer of the conventional terminal structure shown will come into contact with the ITO layer, and the etchant will penetrate the metal line and the laminated interface of the ITO layer and the laminated edge, or the part will be corroded and damaged. And peeling from the interface occurs. When silver or a silver alloy is used as the metal of the metal line of the peripheral wiring, it is particularly vulnerable to acid.

Moreover, the active area A1 in which the touch panel sensor layer is formed may have no problem even if a protective layer is formed, but the terminal portion formed in the periphery of the active area A1 needs to be electrically connected to the outside. Since the protective layer cannot be formed, the terminal portion is particularly damaged, and peeling, corrosion, poor conduction, etc. are likely to occur and connection stability is easily lost.
Therefore, there arises a problem that ITO patterning becomes difficult due to the above disadvantages.

  In addition, the protective film is not an organic material, but an inorganic material such as SiON or SiN is formed by vapor deposition (sputtering, CVD method, etc.). There were problems such as increased manufacturing costs.

  When the protective layer is formed, the protective layer is formed using a positive or negative photosensitive material and subjected to steps of coating, pre-baking, mask exposure, development, and post-baking. After the pre-baking process as coating film drying after coating, exposure is partially performed according to the mask shape, the exposed part in the positive type, the part not exposed in the negative type is removed by development, post The resin is cured by baking heat treatment to form a strong film, and many additional processes are added, resulting in an increase in the number of processes and a complicated process, leading to a decrease in productivity and an increase in cost.

As a method for protecting the surface, generally, a protective film is bonded to the surface to protect the surface at the production stage.
However, the sticking of the surface protective film is complicated, leading to an increase in cost, and further reducing the productivity.

In the final stage of the manufacturing process of the display substrate with a touch panel sensor layer, a polarizing plate or the like is laminated on the surface of the touch panel sensor layer via an adhesive layer, and thus a protective film is attached to the one manufactured on the manufacturing line. It cannot be transported as a product as it is.
In the manufacturing process, the protective film is surely removed, and the process of protecting the surface with the protective film is only a temporary protection process, which is a wasteful process and leads to an increase in cost. .

  Moreover, since each conductor layer formed on the touch panel sensor substrate is a thin film, it is easy to be damaged when the protective film protecting the terminal part is peeled off, or the laminated end structure made of conductors is a laminated structure of different materials. May cause delamination.

Utility model registration No. 3134925 JP-A-4-264613 JP 2005-290458 A Japanese Patent Laid-Open No. 2-194943 Japanese Patent Application Laid-Open No. 2004-149884

The capacitive touch pad of Patent Document 1 described above is a type using the same touch panel base material, color filter base material, and the like as the conventional one, but the touch panel sensor layer and color filter layer are provided for each base material. In the step of forming, since the terminal portion cannot be provided with a protective layer, the above-described problem occurs when the terminal portion is formed of a metal layer. Furthermore, when forming and superposing each on a separate transparent substrate, it is disadvantageous for making the entire touch panel device thinner and lighter.
Therefore, a touch panel sensor-integrated color filter in which a touch panel sensor portion is formed on one surface and a color filter portion is formed on the other surface with a common transparent substrate interposed therebetween is used.

  However, in the color filter / cell / module process, the touch panel integrated color filter is scratched and soiled on the touch panel sensor layer, especially the protective film, which contacts the roller during the production of the color filter layer. There is a problem that the quality is poor and the yield decreases.

  Also, in the color filter / cell / module process, during the production of the color filter layer, the etching solution penetrates into the interlayer interface of the sensor electrode part and the terminal part by the patterning process of the conductor and the conductor layer is etched. This causes the problem of corrosion and peeling.

  That is, in the step of forming the color filter layer, the sensor electrode of the touch panel sensor layer and the electrode laminated on the terminal part and the transparent electrode of the color filter part are both the same transparent conductive material. Since it is made of polycrystalline ITO, when the color filter layer is formed, if the ITO is etched, there is a problem that the ITO conductor layer on the surface on which the touch panel sensor layer is formed is damaged.

Therefore, for example, measures such as providing a protective film that can withstand aqua regia etching on the surface of the touch panel sensor unit are required. However, the method of providing the protective film is not preferable because the process becomes complicated and the cost is increased.
In addition, since the terminal portion needs to be electrically connected to the outside and a protective layer cannot be formed, in particular, the terminal portion is damaged, causing peeling, corrosion, or poor conduction. Connection stability is lost.

In consideration of the above-mentioned problems of the prior art, the present invention does not form a protective film that complicates the process on electrodes and terminals using the same conductive material, or without providing a protective film. Even when ITO etching treatment is required in the process of forming the color filter layer, the terminal portion is damaged, peeling, corrosion, poor conduction, etc., and connection stability is not lost. An object of the present invention is to provide a touch panel sensor substrate having a terminal structure that is highly durable and difficult to damage.

  As a result of various researches, in particular, in a touch panel sensor substrate including a touch panel integrated color filter, the entire surface of the touch panel sensor unit has a complicated process and increases the cost, without providing a protective layer, and without a protective layer. The transparent electrode of the color filter part is formed as amorphous ITO, etched using a weak acid mainly composed of oxalic acid, and then the amorphous ITO is annealed. And crystallizing it to make a low resistance transparent electrode, and applying a dielectric layer to the minimum necessary small area of only the bridge part to form an electrically non-contact state, and the surface of the touch panel sensor substrate It is assumed that the area of most layers is a touch panel sensor substrate occupied by the sensor electrode main part of the touch panel sensor section. It is, by the surface of the touch panel sensor substrate is substantially flatly formed of a transparent electrode material having a hardness than the resin protective layer, and completed the present invention can solve the above problems and the like.

Specifically, the touch panel sensor substrate including the peripheral wiring provided so as to surround the touch panel sensor layer of the present invention has a plurality of touch panel sensor layers extending in the first direction and arranged in parallel in the second direction. A first sensor electrode; and a second sensor electrode extending in the second direction and arranged in parallel in the first direction,
The peripheral wiring includes a plurality of first extraction wirings provided corresponding to the plurality of first sensor electrodes, and a plurality of second extraction wirings provided corresponding to the plurality of second sensor electrodes, respectively.
Each first lead-out wiring is connected to a first sensor electrode corresponding to the first lead-out wiring at one end, and a first wiring terminal connection portion connected to a terminal portion functioning as a connection terminal with the outside is formed at the other end. Has been
Each second lead-out wiring is connected to a second sensor electrode corresponding to the second lead-out wiring at one end and is connected to a terminal portion functioning as a connection terminal to the outside at the other end. Formed,
And as for the aspect of the terminal part structure of 1st implementation, the terminal part structure is the terminal part by the ITO transparent conductor layer directly formed on the transparent base material, and the said 1st wiring terminal connection part or A second wiring terminal connection portion;
The first and second wiring terminal connecting portions are formed on a transparent base material, overlapped on the wiring terminal connecting portions, and covering the periphery of each wiring terminal connecting portion. By providing a terminal layer structure having a body layer, a transparent layer, a wiring terminal connection portion, a laminated portion where the ITO transparent conductor layer is laminated, and a protective layer covering the laminated edge; or As an aspect of the implementation of the terminal part, the terminal part comprises a terminal part by an ITO transparent conductor layer directly formed on a transparent substrate, and the first wiring terminal connection part or the second wiring terminal connection part, The first wiring terminal connecting portion and the second wiring terminal connecting portion include the ITO transparent conductor layer formed on a transparent base material and the first and second wirings superimposed on the ITO transparent conductor layer. A terminal connection portion, and the transparent substrate, By serial ITO transparent conductor layer and each wiring terminal connecting portion and a protective layer covering the laminated portion and the laminate edges are laminated, it is to solve the above problems.

  Further, the touch panel sensor portion having the above structure forms the first and second sensor electrodes and the bridge portion directly on the substrate as one embodiment of the touch panel sensor layer, and extends in the first direction. And a first sensor electrode made of a plurality of transparent conductive films arranged in parallel in the second direction, each extending in the first direction, and being spaced from the plurality of first sensor electrodes between the first sensor electrodes. Each of the second sensor electrodes is made up of a plurality of second sensor electrodes made of a transparent conductive film, a plurality of bridge portions made of a conductor formed on a base material, and a dielectric disposed on the bridge portions. By forming a plurality of second sensor electrodes arranged in parallel and extending in the second direction in a non-contact state with the electrodes, most of the surface layer is constituted by the first and second sensor electrodes. ,loss Prevention, to issues such as antifouling is obtained as may correspond.

  As another embodiment of the touch panel sensor layer, a plurality of transparent conductive films that extend in the first direction and are arranged in parallel in the second direction, instead of directly forming the first and second sensor electrodes on the substrate A plurality of second sensor electrodes, each comprising a transparent conductive film that extends in the first direction and is spaced from the plurality of first sensor electrodes between the first sensor electrodes. A plurality of the second sensor electrodes arranged in parallel extending in the second direction in a non-contact state with the first sensor electrode by a bridge portion made of a conductor formed on the substrate and a dielectric layer thereon. By forming the second sensor electrode, the first and second sensor electrodes are formed on the dielectric layer, and the sensor electrode constitutes a large part of the surface layer, thereby preventing problems such as damage prevention and contamination prevention. Can also handle That.

  Furthermore, as another embodiment of the touch panel sensor layer, the first and second sensor electrodes and the bridge portion are directly formed on the substrate, and the plural touch panel sensor layers extend in the first direction and are arranged in parallel in the second direction. A plurality of first sensor electrodes, each of which is formed of a transparent conductive film that extends in the first direction and is spaced apart from the plurality of first sensor electrodes between the first sensor electrodes. 2 Each of the second sensor electrodes is in a non-contact state with the first sensor electrode by the plurality of bridge portions including the sensor electrode, the dielectric disposed on the first electrode, and the conductor formed on the dielectric. In addition, since a plurality of second sensor electrodes arranged in parallel extending in the second direction are configured, most of the surface layer is configured by the first and second sensor electrodes and the bridge portion, thereby preventing damage and contamination. Sections such as prevention It can be adapted to the title.

  According to the touch panel sensor substrate of the present invention, the substrate of the display substrate can be shared, the number of base materials can be reduced, and the touch panel sensor layer on the one surface of one base material, which is advantageous for thickness reduction and weight reduction, In the touch panel sensor substrate including the color filter layer with the color filter layer formed on the surface, the touch panel sensor substrate having a terminal part structure that is highly durable and hardly damaged can be obtained.

  In the present invention, since the conductor layer of the terminal portion is only ITO, in the conventional laminated terminal portion structure of the metal line layer and the ITO conductor layer, the ITO on the metal is difficult to crystallize and is easily etched and peeled off. That is, the ITO conductor layer on the base material is easily crystallized, and the hardness of the terminal portion is improved. As a result, the electrode material forming the terminal portion is hardened, so that the crimping conditions are stabilized, the poor electrical connection between the terminals is reduced, and the defective crimping of the flexible pattern circuit can be reduced.

In addition, since the hardness of the terminal portion is improved, scratches in the electrical inspection of the terminal portion can be reduced, and conveyance scratches, damage, and dirt can be reduced.
Moreover, a crystallized ITO conductor layer formed wider than the metal line width in the width direction of the metal line is coated on the metal line, and the ITO conductor layer is continuously formed also on the terminal portion. By forming the terminal part, the ITO layer of the edge taper part of the metal line is not thinned, and the edge taper of the metal line can be reliably covered and protected, and the penetration of the etching solution is ensured Prevents metal lines from peeling off.

Further, in the terminal portion of the present invention, the ITO conductor layer is disposed on the base material surface, the wiring conductor layer of the metal line is formed on the upper surface, and the protective layer is further formed. The metal line end in the boundary region between the active area A1 and the active area A1 is located in the protective layer, and the metal line portion is reliably protected.
Since a laminated structure in which the metal line and the ITO are in surface contact is formed, open defects due to the disconnection of the wiring in the middle are reduced.

  In the present invention, even when it is necessary to form an incision pattern on the sensor electrode in the color filter forming process, the touch panel sensor electrode is formed of polycrystalline ITO, and the color filter sensor electrode is formed of amorphous ITO and etched. Thus, etching can be performed without providing a protective film that complicates the process on the surface of the touch panel sensor unit, and an incision pattern can be manufactured.

  That is, according to the present invention, since the sensor electrode of the color filter portion is etched using a weak acid mainly composed of oxalic acid, the crystallized ITO exposed on the surface of the touch panel sensor portion (for example, a bridge) The electrode and the metal line) are not eroded, and therefore the step of providing a protective film can be omitted.

The touch panel sensor substrate of the present invention is formed of a transparent conductive material (pencil hardness: 6H or higher) having a surface hardness larger than that of the organic material protective film, without having a protective film of the organic material on the surface in the manufacturing process of the sensor electrode. Therefore, damage such as scratches due to rubbing and adhesion of dirt can be prevented.
Therefore, scratches and dirt are sufficiently reduced as compared with the case where a protective film made of an organic material is formed, so that the yield in the manufacturing process is improved. Moreover, since the touch panel sensor substrate can be formed without forming a protective film, the number of manufacturing steps of the touch panel sensor substrate including the color filter integrated with the touch panel sensor can be reduced, thereby improving productivity. And it leads to cost reduction.

  By not forming the protective film layer, and when using the dielectric material for insulating the first and second sensor electrodes, the overcoat layer is only applied to the portion corresponding to the bridge portion. Defective products can be reduced and yield is improved.

  Further, even when the protective layer is formed, it is only necessary to protect the region where the line part and the bridge part of the first and second sensor electrodes intersect, so the area of the protective film (overcoat layer) can be reduced. The transmittance of the touch panel sensor layer is improved. Further, the touch panel sensor layer is not yellowed because there is no repetition of forming and baking the protective film and fewer steps than the process of manufacturing the color filter by the conventional process of forming the protective film.

FIG. 1 is a diagram for explaining a first embodiment according to the present invention, and schematically shows a configuration of a display device. 2 is a cross-sectional view showing a display panel incorporated in the display device of FIG. 1 in a cross section along a normal line direction to a display surface of the display device. FIG. 3 is a diagram for explaining the configuration of the touch panel sensor layer of the first substrate (touch panel substrate and color filter) incorporated in the display panel of FIG. FIG. The touch panel sensor layer shown in FIG. 2 is a cross section taken along the line II-II in FIG. 4a is a cross-sectional view of only the touch panel layer along the line II-II in FIG. 3, and shows a terminal when the first ITO conductor layer is formed or when the first and second ITO conductor layers are formed. Sectional drawing of a part. 4B is a cross-sectional view of only the touch panel layer taken along the line IV-IV in FIG. 3, and shows a terminal when the first ITO conductor layer is formed or when the first and second ITO conductor layers are formed. Sectional drawing of a part. FIG. 5 is a schematic representation of an enlarged cross-sectional view of the terminal portion of the display device of FIG. 2 in a cross section along the normal direction to the display surface of the display device. FIG. 6 is a schematic representation of an enlarged cross-sectional view which is an embodiment of another terminal portion of the display device of FIG. 2 in a cross section along the normal direction to the display surface of the display device. FIG. 7 a is a manufacturing process flowchart and a sectional view for each manufacturing process for explaining the first embodiment of the terminal part structure of the present invention of the touch panel sensor layer and the terminal part manufacturing method included in the first substrate. FIG. 7 b is a manufacturing process flowchart and a sectional view for each manufacturing process for explaining a second embodiment of the terminal part structure of the present invention of the touch panel sensor layer and the terminal part manufacturing method included in the first substrate. FIG. 7c is a flowchart of a manufacturing process and a cross-sectional view for each manufacturing process for explaining another embodiment 1 of the touch panel sensor layer of the present invention in the method for manufacturing the touch panel sensor layer and the terminal portion included in the first substrate. FIG. 7d is a manufacturing process flowchart for explaining another embodiment 3 of the touch panel sensor layer of the present invention in the manufacturing method of the touch panel sensor layer and the terminal part included in the first substrate, and a sectional view for each manufacturing process. FIG. 8 is a diagram showing a cross section taken along line IV-IV in FIG. 3 when the protective layer is provided in a region where the line portion of the first sensor electrode and the bridge portion of the second sensor electrode intersect. In the drawing, the structure of the touch panel sensor base material is schematically represented in order to facilitate understanding of the structure of the present invention. FIG. 9 is a flowchart for explaining an example of a method for producing a color filter layer included in the first substrate. 10a is a cross-sectional view taken along a first direction for explaining another embodiment 1 of the touch panel sensor layer of the present invention in FIG. In the figure, the structure of only the touch panel sensor layer is schematically shown in order to facilitate understanding of the structure of the present invention. 10b is a cross-sectional view along the second direction for explaining another embodiment 1 of the touch panel sensor layer of the present invention in FIG. In the figure, the structure of only the touch panel sensor layer is schematically shown in order to facilitate understanding of the structure of the present invention. FIG. 11 is a diagram for explaining an embodiment of a touch panel sensor layer in a case where a protective layer is provided in a region where the line portion of the first sensor electrode and the bridge portion of the second sensor electrode intersect. In the drawing, the structure of the touch panel sensor base material is omitted to facilitate understanding of the structure of the present invention. FIG. 12 is a view for explaining an embodiment of the third touch panel sensor layer of the present invention. In the drawing, the structure of the touch panel sensor layer of the touch panel sensor base material is schematically represented in order to facilitate understanding of the structure of the present invention. FIG. 13 is a diagram for explaining a structure of a terminal portion using a conventional metal line as a terminal portion. In the drawing, the structure of the touch panel sensor base material is omitted to facilitate understanding of the structure of the present invention. FIG. 14 is a view for explaining the structure of another terminal portion in which a terminal portion of a conventional metal line is covered with a transparent conductor layer forming a sensor electrode. In the drawing, the structure of the touch panel sensor base material is omitted to facilitate understanding of the structure of the present invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, taking a touch panel sensor integrated color filter as an example. In the drawings attached to the present specification, for the sake of illustration and ease of understanding, the scale, the vertical / horizontal dimension ratio, and the like are appropriately changed and exaggerated from those of the actual product.

[First Embodiment]
First, a first embodiment according to the present invention will be described with reference to FIGS.

  The display device 10 shown in FIGS. 1 and 2 not only functions as an output device that outputs information such as characters and figures as an image, but also inputs information by contacting (approaching) the display surface 12. A liquid crystal display device that also functions as a device, and in which the display device 10 includes a display panel 30 configured as a liquid crystal display panel (LCD panel, liquid crystal panel) having a projection-type capacitively coupled touch panel function. An example applied to (liquid crystal display) will be described.

  As shown in FIG. 1, the display device 10 includes a display panel 30, a control unit 20 that is connected to the display panel 30 and controls driving of the display panel 30, and a display panel 30 as a liquid crystal panel on the back side (non-observer). And a surface light source device (backlight) 25 that illuminates from the side. As the surface light source device 25, for example, an edge light type or a direct type surface light source device can be used as appropriate. Further, the display surface 12 of the display panel 30 functions as an input surface (touch surface, contact surface) of the touch panel device. That is, information can be input from the outside to the display device 10 by bringing a conductor such as a human finger into contact with or approaching the display surface 12.

  The control unit 20 includes a video information processing unit 22 that processes information regarding a video to be displayed, and an input information processing unit 24 that processes information input via the display surface 12. The video information processing unit 22 is connected to the display panel 30 and drives the display panel 30 by a circuit (drive circuit) configured to control the display state of each pixel based on the video information.

  On the other hand, the input information processing unit 24 is connected to the display panel 30 and processes information input via the display surface 12. Specifically, the input information processing unit 24 determines the contact position or approach position of the conductor to the display surface 12 when a conductor (typically a human finger) is in contact with or close to the display surface 12. A circuit (detection circuit) configured to be specified is included. Further, the input information processing unit 24 is connected to the video information processing unit 22 and can transmit the processed input information to the video information processing unit 22. At this time, the video information processing unit 22 can create video information based on the input information and display a video corresponding to the input information on the display surface 12.

  Next, as shown in FIG. 2, the display panel as a liquid crystal panel includes a first substrate 40 (also referred to as a touch panel substrate, a color filter substrate, or a counter substrate) 40 and a first substrate 40 facing the first substrate 40. A second substrate (hereinafter also referred to as an element substrate or an array substrate) 35 disposed on the back side (surface light source device side), and a liquid crystal layer 32 sealed between the first substrate 40 and the second substrate 35, It is what has. The protective dielectric film 33 may or may not be formed on the viewer side of the first substrate 40 of the display panel. In addition, deflection plates (not shown) are provided on both sides of the liquid crystal panel.

  The first substrate 40 is provided on a transparent plate-like first base material 45 and one side of the base material 45 (in this embodiment, on the observer side, the upper side in FIG. 2). The touch panel sensor layer 60 and the color filter layer 50 provided on the other side opposite to one side of the base material 45 (in this embodiment, the light source side and the lower side in FIG. 2). And have. The touch panel sensor layer 60 is connected to the input information processing unit 24 of the control unit described above, and constructs a touch panel function together with the input information processing unit 24.

[Display panel]
Thus, the display panel 30 includes a configuration for enabling the display device 10 to display an image and a configuration for enabling the display device 10 to function as a touch panel. In the display panel 30, a configuration for mainly functioning as a video display device, specifically, the color filter layer 50 and the second substrate 35 of the first substrate 40 will be described first.

[Color filter layer]
In the present invention, the color filter layer 50 is formed on the first substrate 45. In the present invention, the first base material 45 is made of, for example, a resin plate or non-alkali glass.

As shown in FIG. 2, the color filter layer 50 has a light shielding portion 51 that has a light shielding effect and forms a non-pixel region (a region through which light cannot be transmitted). The light-shielding part 51 is formed with through-openings that each constitute a sub-pixel. The light shielding portion 51 functions as a so-called black matrix and can contribute to an improvement in contrast.
In the present invention, the first to third colored portions 52 colored in the display color of the sub-pixel are formed in the through-openings constituting each sub-pixel. As a specific example, the first colored portion 52G is colored green, the second colored portion 52R is colored red, and the third colored portion 52B is colored blue.

  Further, the first substrate 40 is appropriately provided with other components in order to effectively function as a viewer side substrate (color filter substrate) of the liquid crystal panel. For example, a protective film 53, a transparent electrode layer 54, an alignment film (not shown), and the like are provided on the light source side of the coloring portion 52.

  On the other hand, as shown in FIG. 2, the second substrate 35 is a pixel disposed on the base material 36 so as to face the transparent second base material 36 and the colored portions 52 of the color filter layer 50. And an electrode 37. In addition, a switching element 38 that controls application to the pixel electrode 37 is provided for each pixel electrode 37.

  The switching element 38 is electrically connected to the video information processing unit 22 of the control unit 20 described above, and operates based on a signal from a drive circuit for controlling display of each pixel of the video information processing unit 22. On the second substrate 36, various circuit wirings (not shown) such as scanning lines and signal lines (data lines) necessary for driving the switching element 38, and a second substrate (TFT substrate) 35 are provided. In order to effectively function as a substrate (element substrate, array substrate) on the surface light source device side of the liquid crystal panel, other components are appropriately provided. For example, an alignment film (not shown) or the like is provided on the viewer side of the pixel electrode 37.

[Touch panel sensor layer]
Next, a configuration for mainly functioning as a touch panel included in the display panel 30, that is, a configuration of the touch panel sensor layer 60 will be described.

  As shown in FIG. 3, the touch panel sensor layer 60 includes a sensor unit 60a arranged in an active area A1 (see FIGS. 1 and 3) corresponding to a region where a contact position (approach position) can be detected, and an active area A1. And a take-out part 60b connected to the sensor part 60a. The active area A1 is an area (display area) where the video on the display panel 30 can be displayed. The inactive area A2 is an area that is arranged outside the display area so as to surround the display area, and is an area where a video is not displayed (non-display area).

As shown in FIG. 3, in the touch panel sensor layer 60 according to the present embodiment configured as a projection-type capacitive coupling method, the sensor unit 60a includes first and second sensor electrodes.
The first sensor electrode constitutes a plurality of first sensor electrodes 61 arranged in parallel, and the second sensor electrode constitutes a plurality of second sensor electrodes 66 arranged in parallel. Each first sensor electrode 61 extends in a first direction parallel to the surface 45 a on one side of the substrate 45, and each second sensor electrode 66 is a direction intersecting the first direction by the bridge portion 68, and the substrate 45 extends in a second direction parallel to one surface 45a.

As shown in FIG. 3, in the present embodiment, the plurality of first sensor electrodes 61 are arranged at equal intervals in the second direction, which is the longitudinal direction of the second sensor electrode 66. The plurality of second sensor electrodes 66 are divided in a first direction, which is the longitudinal direction of the first sensor electrode 61, at a portion intersecting the first sensor electrode 61, and in the second direction by the bridge portion 68. And arranged at equal intervals in the first direction.
The longitudinal direction of the first sensor electrode 61 and the longitudinal direction of the second sensor electrode 66 are orthogonal to each other on the surface 45 a on one side of the substrate 45.

As shown in FIG. 3, in the active area A1, the first sensor electrode 61 and the second sensor electrode 66 intersect each other. As shown in FIG. 3 and FIG. 4, the first sensor electrode 61 and the second sensor electrode 66 are separated from the surface 45a on one side of the base material 45 by the thickness of the dielectric layer in the intersecting region. Only different positions, that is, different height direction positions from the surface of the base material 45 are passed.
As a result, the first sensor electrode 61 and the second sensor electrode 66 intersect with each other in a non-contact state. In FIGS. 4a and 4b, the color filter layer 50 is omitted for convenience of illustration and understanding.

[Sensor electrode]
Hereinafter, the configuration of the sensor electrode constituting the sensor unit 60a will be further described in detail.
The sensor unit 60a includes a first sensor electrode 61, a second sensor electrode 66, and a bridge unit 68, and each electrode and the bridge unit are usually formed of the same material. The first sensor electrode 61 and the second sensor electrode 66 are preferably made of the same material because they are simultaneously formed on the same plane. In order to obtain uniform transparency and conductivity, the bridge portion 68 includes the first sensor electrode 61 and the second sensor electrode 66. The same material as the sensor electrode 61 and the second sensor electrode 66 is preferable, but even a metal which is a conductive material can be employed in the present invention as long as it is narrow and covered with a dielectric layer or a sensor electrode.

  As the material, a material having transparency and required conductivity is used. For example, indium tin oxide (ITO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, zinc oxide-tin oxide system, oxidation Examples thereof include metal oxides such as indium-tin oxide, zinc oxide-indium oxide-magnesium oxide, and materials in which two or more of these metal oxides are combined.

[First sensor electrode]
First, the first sensor electrode 61 will be described. The plurality of first sensor electrodes 61 are made of a transparent conductive material, for example, ITO. As shown in FIG. 3, the plurality of first sensor electrodes 61 includes a large number of first sensor electrode main portions 62 arranged side by side in both the first direction and the second direction, and a large number of first sensor electrode mains. A plurality of first sensor electrode main parts 62 arranged in the first direction among the parts 62 are provided with line parts 63 that connect each other.
That is, between the two first sensor electrode main portions 62 adjacent to each other in the first direction, the line portions 63 are provided integrally with the two first sensor electrode main portions 62, respectively. 1 sensor electrode main part 62 is connected. Thus, each 1st sensor electrode 61 is comprised by the several 1st sensor electrode main part 62 arranged in the 1st direction, and the line part 63 which connects between them.

As shown in FIG. 3, the first sensor electrode main portion 62 has a substantially square shape on the surface 45 a on one side of the base material 45. The square is arranged on the surface 45a on one side of the base material 45 so that each side forming the square is inclined by approximately 45 ° with respect to the first direction.
On the other hand, the line portion 63 is arranged in the first direction formed on the surface 45a on one side of the base material 45 and the second direction orthogonal to the first direction, and covers the plurality of bridge portions 68 made of a conductor. It has an elongated rectangular shape extending across the dielectric layer and extending in the first direction. The width of the first sensor electrode 61 in the direction orthogonal to the first direction is the narrowest in the line portion 63.

[Second sensor electrode]
Next, the second sensor electrode 66 will be described. Similar to the first sensor electrode 61, the plurality of second sensor electrodes 66 are made of a transparent conductive material, for example, ITO. As shown in FIG. 3, the plurality of second sensor electrodes 66 are arranged in both the first direction and the second direction, and the plurality of first sensor electrodes 61 are interposed between the plurality of first sensor electrodes 61. A plurality of second sensor electrode main portions 67 arranged apart from each other and a plurality of second sensor electrode main portions 67 arranged in the second direction among the plurality of second sensor electrode main portions 67, And a bridge portion 68 to be connected.

  That is, a line portion 68 is provided as a separate body from the two second sensor electrode main portions 67 adjacent to each other in the second direction. Thus, each 2nd sensor electrode 66 is comprised by the several 2nd sensor electrode main part 67 arranged in the 2nd direction, and the bridge | bridging part 68 which connects between them.

[Bridge part]
As shown in FIGS. 2 and 4a, each bridge portion 68 is made of a conductor such as a metal line or a transparent conductor, and has a first direction and a first direction on a surface 45a on one side of the substrate 45. They are arranged in a second direction that intersects the direction. The plurality of bridge portions 68 connect between each of the two second sensor electrodes 66 adjacent in the second direction.

  A dielectric layer 70 is formed on the surfaces of the plurality of bridge portions 68 that are in contact with the substrate 45 so as to cover the bridge portions. The line part 63 of the first sensor electrode 61 extending in the first direction on the dielectric layer 70 extends across the bridge parts 68 arranged in the first direction so as to cross in a non-contact state. ing.

Specifically, as shown in FIGS. 2 and 4a, the second sensor electrode main portion 67 and the bridge portion 68 connecting the sensor electrodes are flush with the first sensor electrode main portion 62 (in the illustrated example, the base It is provided on one surface 45a) of the material 45. The observer side of the second sensor electrode main portion 67 and the first sensor electrode 61 is made of a transparent insulating material (for example, acrylic polymer or SiO ₂ ), and functions as a dielectric in a capacitively coupled touch panel. A plurality of dielectric layers (insulating layers) 70 are provided corresponding to the plurality of bridge portions 68.
As a result, the first sensor electrodes 61 are arranged at equal intervals in the second direction across the plurality of bridge portions 68 in a non-contact state via the dielectric layer 70.

As shown in FIG. 3, the second sensor electrode main portion 67 has a substantially square shape on the surface 45 a on one side of the base material 45. The square is arranged on the surface 45a on one side of the base material 45 so that each side forming the square is inclined by approximately 45 ° with respect to the second direction.
On the other hand, the bridge portion 68 extends substantially in a rectangular shape in the second direction, and the width of the bridge portion 68 in the direction orthogonal to the second direction is substantially constant except for both end portions connected to the second sensor electrode main portion 67. It has become. The width of the second sensor electrode 66 in the direction orthogonal to the second direction is the narrowest in the region located between the adjacent second sensor electrode main portions 67 in the bridge portion 68.

Further, as shown in FIG. 3, when the touch panel sensor layer 60 is viewed from above (when the touch panel sensor layer 60 is observed from the normal direction), the narrow bridge portion 68 of the second sensor electrode 66 includes the first sensor. It intersects with the narrow line portion 63 of the electrode 61.
As a result, in the top view, the portion where the first sensor electrode 61 and the second sensor electrode 66 overlap is very small.
For this reason, the first sensor electrode main part, the line part, and the second sensor electrode main part are on the same plane, and the second sensor electrode 66 is viewed from the display surface 12 functioning as the contact surface of the external conductor. Only the bridge part intersects with the line part of the first sensor electrode 61 and comes to be located on the back side, but the detection sensitivity at the second sensor electrode 66 is compared with the detection sensitivity at the first sensor electrode 61. It wo n’t drop significantly.

[Formation of lead-out wiring]
Next, the peripheral wiring of the extraction part 60b will be described. As shown in FIG. 3, the peripheral wiring provided in the extraction portion 60b has a plurality of first extraction lines provided corresponding to the plurality of first sensor electrodes 61 formed in the peripheral edge region on the substrate. 73 and a plurality of second take-out lines 74 provided in correspondence with the plurality of second sensor electrodes 66, respectively. The peripheral wiring is connected to the terminal portions 73t and 74t exposed to the outside in the terminal portion region.

Each first take-out line 73 is connected to the first sensor electrode 61 corresponding to the first take-out line 73 at one end, and connected to the outside (that is, a wiring leading to the input information processing unit 24) at the other end. A first wiring terminal connection portion connected to the terminal portion 73t functioning as a terminal is included.
Similarly, each second take-out line 74 is connected to the second sensor electrode 66 corresponding to the second take-out line 74 at one end, and connected to the terminal portion 74t functioning as a connection terminal to the outside at the other end. A second wiring terminal connecting portion.

  As shown in FIG. 2 and FIGS. 4a and 4b, in one embodiment of the present invention, each first take-out line 73 and each second take-out line 74 have three types due to the manufacturing method described later. Consists of layers.

  Specifically, each of the extraction lines 73 and 74 constituting the peripheral wiring is a metal line portion made of a high conductivity metal such as copper, aluminum, silver, or an alloy containing them, which is sequentially arranged from the base 45 side. 75a, the first conductor layer 75b made of the same metal layer or conductor layer as the bridge portion 68 described above, and / or the same transparent conductor as the first sensor electrode 61 and the second sensor electrode 66 described above. And a second conductor layer 75c. However, when the bridge portion is a metal line, the conductor layer 75b cannot be distinguished from the metal line portion 75a. In the case of a transparent conductor material, the conductor layer 75b may be formed or not formed. When the conductor layer 75b is made of the same transparent conductor as the sensor electrode, the conductor layer 75b may be formed and the second transparent conductor layer 75c may not be formed, or the conductor layer 75b may be formed. The second transparent conductor layer 75c may be formed. Further, the second transparent conductor layer 75c may be formed without forming the conductor layer 75b.

[Terminal structure]
The terminal portion of the present invention is not a conventional metal line or a structure of a conductor layer covering the metal line and the conductive laminated terminal corresponding to the conductive laminated structure of the lead-out line of the peripheral wiring portion as described above. It takes a partial structure.
The specific terminal part structure of the terminal part region of the present invention will be described in detail in the following formation of the touch panel sensor substrate.
[Terminal structure 1]
In the present invention, each of the lead-out lines 73 and 74 of the peripheral wiring is shown as an enlarged view in FIG. 5 in the terminal area, with the first and second wiring terminal connection parts 73e and 74e connected to the terminal parts 73t and 74t. It is connected and arranged with the terminal part so as to have a terminal part structure.
That is, the terminal portion structure includes the connection terminal portions 73t and 74t formed of the ITO transparent conductor layer directly formed on the transparent substrate, and the first portion formed on the terminal portion region side of each of the extraction lines 73 and 74. A wiring terminal connection portion 73e and a second wiring terminal connection portion 74e are provided.

  The first wiring terminal connecting portion and the second wiring terminal connecting portion of the present invention are formed on a transparent substrate, and each wiring terminal connecting portion is superimposed on the surface of each wiring terminal connecting portion, and each wiring By covering the periphery of the terminal connecting portion with the ITO transparent conductor layer, the terminal connecting portion is electrically connected to the terminal portion and the connecting portion is protected.

  As shown in FIG. 5, the connection portions between the connection terminal portions 73t and 74t of the present invention and the respective wiring terminal connection portions 73e and 74e are further divided into the transparent base material, the wiring terminal connection portions 73e and 74e, and the ITO transparent portion. Form the laminated part (wiring part) where the conductor layer is laminated and the laminated edge part where the wiring terminal connection part edge is covered with the ITO transparent conductor layer to protect the touch panel sensor part, or protect the peripheral wiring For this purpose, it is covered with a protective layer 42 to be formed, and the connecting portion is reliably protected.

As described above, in the present invention, the terminal portions 73t and 74t are different from the conventional terminal portions in that the terminal portions made only of the ITO transparent conductor layer are formed, and the wiring terminal connection of the metal line made of the high conductivity metal material is formed. The edges of the portions 73e and 74e are covered with an ITO transparent conductor layer and further covered with a protective layer 42.
As a result, the wiring terminal connection portions 73e and 74e are not formed in the terminal portion, do not constitute the terminal portion, and are not directly exposed to the outside. In addition, the edge of the wiring terminal connection portion is covered and protected by the ITO transparent conductor layers 75b and 75c and the protective layer 42 in a double layer.
And the edge part of the wiring terminal connection part does not enter the terminal part, but rather is located on the side slightly away from the peripheral part of the substrate from the terminal part boundary by the thickness of the ITO transparent conductor layer and the protective layer. It becomes a structure.

The terminal portions 73t and 74t of the present invention do not include the wiring terminal connection portions 73e and 74e, and the wiring terminal connection portions 73e and 74e in the terminal portion region are covered with the ITO transparent conductor layer and the protective layer and exposed to the outside. There will be no protection.
Therefore, a terminal portion formed by a conventional metal layer wiring terminal connection portion 73e, 74e or a terminal portion formed by a laminated structure in which the conventional metal layer wiring terminal connection portions 73e, 74e are covered with a transparent conductor layer. As described above, the etching solution resulting from the etching treatment penetrates or corrodes the wiring terminal connecting portions 73e and 74e and the edges thereof, so that the wiring terminal connecting portion is likely to be a starting point of peeling from the base material 45 of the metal line portion 75a. It can suppress effectively that 73e and 74e peel from the base material 45. FIG.

  Since electrical signals are input and output through the terminal part of this transparent conductor layer, the connection line with the FPC is more resistant to corrosion than the conventional terminal part that exposes the extraction line and its wiring terminal connection part as they are. A highly superior terminal part can be realized.

[Method of manufacturing touch panel sensor substrate]
Next, an example of a method for manufacturing the touch panel substrate 40 having the above configuration will be described.

First, a transparent base material constituting the first base material 45 is prepared. As the transparent base material, alkali-free glass is typically used, but the transparent base plate is not limited thereto, and a transparent resin plate having a sufficient thickness constitutes the first base material 45. It may be used.
Here, the base material does not mean only the base material itself, but simply includes a substrate including a substrate whose surface is surface-treated.
For example, a touch panel sensor and a color filter are formed, and light is transmitted. Therefore, between the transparent conductor layer and the glass substrate, the transmittance and reflectance of the portion with and without the transparent conductor layer are caused by the thin film interference effect. When providing a layer for invisibility that makes the sensor electrode pattern invisible easily, an index matching layer may be formed by forming a refractive index adjustment layer on the substrate. In addition, a substrate obtained by surface-treating the surface of such a substrate is also included.

  Next, about the process of producing the peripheral wiring and terminal part of the touch panel sensor layer 60 on the surface 45a on one side of the prepared base material 45, here, the touch panel sensor layer 60 is attached to the base material 45 according to the flowchart of FIG. It demonstrates along the method of forming on the surface of one side.

[Formation of take-out line]
First, the 1st taking-out line 73 and the 2nd taking-out line 74 on the base material 45 are formed (process Sa1 of FIG. 7a).
Of the first take-out line 73 and the second take-out line 74, a metal line portion 75a is formed. As described above, the first take-out line 73 and the second take-out line 74 are formed in the non-active area A2 to connect the sensor unit 60a formed in the active area A1 and the control unit 20, and are connected to the terminal unit. It is formed to extend into the region.
Therefore, the metal line portion 75a is formed outside the display area of the display surface 12, and can be formed from a non-transparent high conductivity metal such as copper, aluminum, silver, or an alloy containing them.

For example, a metal layer made of a highly conductive metal is formed by a vacuum thin film forming method such as vapor deposition or sputtering so as to cover the entire surface 45a on one side of the base material 45, and this high conductivity is formed using a photolithography technique. By patterning the metal layer made of the rate metal, the metal line portion 75a of the first extraction line 73 and the second extraction line 74 is formed.
As another example, the metal line portion 75a of the first take-out line 73 and the second take-out line 74 can be formed on the substrate 45 in a desired pattern by screen printing.

[Formation of first conductor layer]
Next, a first conductor layer (bridge portion) is formed (step Sa2 in FIG. 7a).
In the embodiment of the first touch panel sensor layer of the present invention, when the bridge portion 68 is formed of a metal line that is a conductor, the extraction line is formed in the above-described step of forming the wiring of the extraction line portion. Simultaneously with the patterning of the metal line part, the bridge part can also be formed by patterning. In this case, the formation of the first conductor layer is omitted, and the process proceeds to the formation of the dielectric layer.

  When the bridge portion 68 is formed of a transparent conductive material other than ITO, the first conductive layer of the transparent conductive material is deposited, sputtered, or the like so as to cover the active area A1 of the surface 45a on one side of the substrate 45. A film is formed by a vacuum thin film forming method, and a bridge portion is formed by patterning from the first conductor layer.

Further, when the first conductor layer is formed of an ITO conductive material, the active area A1 and the inactive area A2 are entirely covered with the ITO conductive material, and the bridge portion 68 and the terminal region extraction line 73, 74 and / or a first conductor layer 75b covering the first wiring terminal connection portion 73e and the second wiring terminal connection portion 74e and a first conductor layer 75b constituting the terminal portions 73t and 74t are formed (FIG. 7a). Step Sa2).
In addition to the case where the first conductor layer is formed from a polycrystalline ITO thin film formed by vapor deposition or sputtering film formation with substrate heating at 200 ° C. to 250 ° C., vapor deposition or sputtering film formation without substrate heating is used. In some cases, the formed amorphous ITO thin film is formed from an ITO thin film crystallized by annealing.
ITO (indium tin oxide) can be attached to the first substrate 45 from one side by vapor deposition or sputtering, and the first conductor layer made of ITO can be formed with a certain thickness.

Subsequently, the formed first conductor layer is patterned.
This patterning is mainly performed to connect adjacent second sensor electrodes among the plurality of second sensor electrodes arranged in the first direction and the second direction of the present invention from the formed first conductor layer. A plurality of bridge portions in which the bridge portions are arranged in the first direction and the second direction orthogonal to the first direction are formed by patterning.

  Here, when the first conductor layer is formed using the ITO conductive material, since the bridge portion is formed of the ITO conductor layer, the bridge portion is patterned, and at the same time, an external surface is formed on the surface 45a of the base material. In order to input / output electric signals to / from the position detection circuit etc., the ITO conductor layer 75b laminated on the wiring terminal connection portions 73e, 74e of the take-out line and the ITO formed on the terminal portions 73t, 74t to be electrically connected From the conductor layer 75b, the ITO conductor layer 75b constituting the wiring terminal connection portions 73e and 74e and the terminal portions 73t and 74t of the take-out line can be formed by patterning (step Sa2 in FIGS. 4a and 7a).

  The above-mentioned polycrystalline ITO or ITO crystallized by annealing is not etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution. Therefore, in the step of etching the sensor electrode of the color filter portion described later with an oxalic acid aqueous solution or the like, the terminal portion of the touch panel sensor portion is not etched, and a step of providing a protective film on the surface can be omitted.

In this patterning, the first conductor layer is patterned using photolithography technology as follows.
First, a photosensitive material is coated on the first conductor layer to form a photosensitive material layer. Next, this photosensitive material layer is exposed in a desired pattern and further developed. Thereby, a resist mask having a desired pattern is formed on the first conductor layer from the photosensitive material layer.
Then, by etching the first conductor layer through the resist mask, a pattern corresponding to the pattern of the resist mask, that is, an array pattern of a plurality of bridge portions 68 that are rectangular in the second direction, and extraction lines 73 and 74 are taken. The first conductor layer can be patterned into the arrangement pattern of the wiring terminal connection portions 73e and 74e and the arrangement pattern of the terminal portions 73t and 74t.

  Specifically, in the former method using high-temperature film formation, a sputtering method using a mixed gas of argon and oxygen is used while heating the substrate to 200 ° C. to 250 ° C. on one main surface of the transparent substrate. After forming a polycrystalline ITO film and forming a desired pattern in a photolithography process, at least a bridge portion 68, take-out lines 73 and 74, wiring are formed by etching unnecessary ITO with a strong acid mainly composed of hydrohalic acid. The ITO conductor layer 75b of the terminal connection portions 73e and 74e and the terminal portions 73t and 74t is formed.

The hydrohalic acid described above is, for example, hydrochloric acid, which is an aqueous solution of hydrogen chloride (HCl), hydrobromic acid, which is an aqueous solution of hydrogen bromide (HBr), or an aqueous solution of hydrogen iodide (HI). Hydroiodic acid and the like can be mentioned. The strong acid mainly composed of hydrohalic acid is, for example, aqua regia (HCl: HNO ₃ : H ₂ O = 1: 0.08) in addition to the aqueous solution described above. 1), volume ratio), and aqueous solutions obtained by adding iodine (I ₂ ) or ferric chloride (FeCl ₃ ) to hydrochloric acid. In general, aqua regia or an aqueous solution obtained by adding ferric chloride (FeCl ₃ ) to hydrochloric acid is often used.

  On the other hand, in the latter method using low temperature film formation, an amorphous ITO film is formed on one main surface of a transparent substrate by vapor deposition or sputtering film formation without substrate heating, and a desired pattern is formed in a photolithography process. After the formation, unnecessary ITO is etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution, and then annealed at 140 to 250 ° C. to crystallize the ITO, so that at least the bridge portion 68 and the extraction line 73 are formed. 74, the wiring terminal connection portions 73e and 74e and the ITO conductor layers 75b of the terminal portions 73t and 74t are formed.

Amorphous ITO can be formed by, for example, sputtering using an ITO target having a SnO ₂ ratio of 1 to 10% by weight and using a mixed gas of argon and oxygen without heating the substrate. Here, if the SnO ₂ ratio of the ITO target is excessively low, the density of the target cannot be increased. Therefore, the SnO ₂ ratio is preferably 1% by weight or more. Further, if the SnO ₂ ratio of the ITO target exceeds 10% by weight, an amorphous ITO thin film that can be crystallized by annealing at a low temperature for a short time cannot be formed. Therefore, the SnO ₂ ratio is 10% by weight or less. Preferably there is.

  The ITO thin film formed without heating the substrate as described above is in an amorphous state and can be etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution. However, since the amorphous ITO thin film has a high resistance, it is not preferable as a bridge part and a terminal part as it is. Therefore, annealing is performed after the etching process to crystallize the ITO, and a low resistance sensor electrode is obtained. The amorphous ITO film formed by the above-described method is crystallized at 140 to 250 ° C. for 5 to 40 minutes as an annealing treatment, for example.

  In this manner, the first conductive layer 75b is left on the metal line portion 75a without removing the first conductor layer on the metal line portion 75a of the first take-out line 73 and the second take-out line 74. At least a bridge portion and a terminal portion are formed from the first conductor layer (see FIG. 4a).

[Formation of dielectric layer]
Thereafter, a rectangular dielectric layer 70 is formed in the second direction so as to cover the bridge portion 68 while leaving a portion where the bridge portion surface region formed on the surface 45a on one side of the substrate 45 is connected to the second sensor electrode. Form (step Sa3 in FIG. 7a).
In this step, the dielectric layer 70 is formed so as to cover the inactive area A2 around the active area A1, thereby performing coating to cover the extraction lines 73 and 74, the metal line portion 75a, and the like. .
The dielectric layer 70 is formed by coating the substrate 45 with a transparent insulating material such as an acrylic polymer or SiO ₂ . In particular, in the present embodiment, the dielectric layer 70 is formed from a photosensitive material, more specifically, a negative photosensitive material that cures when exposed to light.

  By forming the dielectric layer 70 by coating, the surface 70a of the formed dielectric layer 70 becomes flat regardless of the pattern of the first conductor layer on the substrate 45. In particular, when the material that becomes the dielectric layer 70 is coated in a state where the base material 45 is held in parallel with the horizontal direction, the surface 70 a of the dielectric layer 70 is the same as the surface 45 a on one side of the base material 45. And parallel to the horizontal direction.

  In the patterning of the coated dielectric layer 70, the dielectric layer 70 is patterned using a photolithography technique. As described above, in the embodiment of the present invention, the dielectric layer 70 is formed of a negative photosensitive material. Then, with the mask disposed on the dielectric layer 70, the dielectric layer 70 is exposed from the mask side. As a result, the dielectric layer 70 is cured in a desired pattern formed on the mask. Thereafter, the uncured region of the dielectric layer 70 is removed with a developer, whereby the dielectric layer 70 is patterned (developed).

[Formation of Second Conductor Layer]
After patterning the dielectric layer, a second conductor layer is formed (step Sa4 in FIG. 7a).
The 2nd conductor layer which forms the touch-panel sensor part of this invention is a layer for forming the main part 67 of the 1st sensor electrode 61 and the 2nd sensor electrode 66. FIG. In this step, the second conductor layer is patterned using photolithography technology as follows.

More specifically, the sensor electrode of the touch panel sensor unit according to the present invention is a sensor electrode made of a polycrystalline ITO thin film formed by evaporation or sputtering film formation with substrate heating at 200 ° C. to 250 ° C. as in the prior art. In addition to the above, there may be a sensor electrode made of an ITO thin film crystallized by annealing an amorphous ITO thin film formed by vapor deposition or sputtering film formation without substrate heating.
ITO (indium tin oxide) can be deposited on the first substrate 45 from one side by vapor deposition or sputtering to form a second conductor layer made of ITO with a constant thickness.

  The above-mentioned polycrystalline ITO or ITO crystallized by annealing is not etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution. Therefore, even in the process of etching the sensor electrode of the color filter section described later with an oxalic acid aqueous solution or the like, the sensor electrode of the touch panel sensor section is not etched, and a process such as providing a protective film on the surface of the touch panel sensor section is omitted. Can do.

That is, on the dielectric layer 70, the line portions 63 of the plurality of first sensor electrodes 61 are arranged and provided in the second direction. Each first sensor electrode 61 extends in the first direction so as to cross the plurality of bridge portions 68 arranged in the first direction. Each first sensor electrode 61 passes between both end regions of the bridge portion exposed on the surface from both end portions of the rectangular dielectric layer provided corresponding to each bridge portion 68, and passes through the dielectric layer 70. It extends above.
The first sensor electrode 61 crosses each bridge portion 68 through the dielectric layer 70 in a non-contact state. In the illustrated example, the plurality of first sensor electrodes 61 are arranged in the second direction at equal intervals.

Further, one end portion of the second sensor electrode main portion 67 is simultaneously formed on one end portion of the both ends of the bridge portion protruding from both ends of the rectangular dielectric layer 70 and exposed on the surface. Vapor deposition or sputtering is performed so that the other end portion of the portion protrudes from both end portions of the dielectric layer 70 and is overlapped with and connected to one end portion of the other end portion of the bridge portion adjacent to the second direction exposed on the surface. In this way, an ITO film is formed.
Thereby, the 2nd conductor layer used as the 2nd sensor electrode main part 67 which consists of ITO is formed. According to vapor deposition or sputtering, even if the surface of the film formation target is formed in a concavo-convex shape, a thin and constant film (layer) extending along the concavo-convex shape can be formed.
Therefore, the second conductor layer having a desired thickness can be formed by protruding from both ends of the rectangular dielectric layer 70 and overlapping and electrically connecting to the surfaces of both ends of the bridge portion exposed on the surface. .

Next, the second conductor layer is patterned.
In this patterning, the second conductor layer is patterned using a photolithography technique. As a result, as shown in FIGS. 2 and 3, the first sensor electrode 61 and the plurality of second sensor electrode main portions 67 arranged side by side in both the first direction and the second direction are separated from the second conductor layer. It is formed.
As shown in FIGS. 2 and 4a, the second sensor electrode main portion 67 overlaps with the bridge portion 68 in both end regions of the bridge portion 68 not covered with the dielectric material in the second direction so as to be electrically connected. To position. As a result, the second sensor electrode 66 is formed.

Specifically, in the former method using high-temperature film formation, a sputtering method using a mixed gas of argon and oxygen is used while heating the substrate to 200 ° C. to 250 ° C. on one main surface of the transparent substrate. After forming a polycrystalline ITO film and forming a desired pattern in a photolithography process, at least the first sensor electrode 61 and the second sensor electrode 66 are etched by a method of etching unnecessary ITO with a strong acid mainly composed of hydrohalic acid. Is formed.

The hydrohalic acid described above is, for example, hydrochloric acid, which is an aqueous solution of hydrogen chloride (HCl), hydrobromic acid, which is an aqueous solution of hydrogen bromide (HBr), or an aqueous solution of hydrogen iodide (HI). Hydroiodic acid and the like can be mentioned. The strong acid mainly composed of hydrohalic acid is, for example, aqua regia (HCl: HNO ₃ : H ₂ O = 1: 0.08) in addition to the aqueous solution described above. 1), volume ratio), and aqueous solutions obtained by adding iodine (I ₂ ) or ferric chloride (FeCl ₃ ) to hydrochloric acid. In general, aqua regia or an aqueous solution obtained by adding ferric chloride (FeCl ₃ ) to hydrochloric acid is often used.

  On the other hand, in the latter method using low temperature film formation, an amorphous ITO film is formed on one main surface of a transparent substrate by vapor deposition or sputtering film formation without substrate heating, and a desired pattern is formed in a photolithography process. After the formation, unnecessary ITO is etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution, and then annealed at 140 to 250 ° C. to crystallize the ITO, so that at least the first sensor electrode and the second A sensor electrode 66 is formed.

Amorphous ITO can be formed by, for example, sputtering using an ITO target having a SnO ₂ ratio of 1 to 10% by weight and using a mixed gas of argon and oxygen without heating the substrate. Here, if the SnO ₂ ratio of the ITO target is excessively low, the density of the target cannot be increased. Therefore, the SnO ₂ ratio is preferably 1% by weight or more. Further, if the SnO ₂ ratio of the ITO target exceeds 10% by weight, an amorphous ITO thin film that can be crystallized by annealing at a low temperature for a short time cannot be formed. Therefore, the SnO ₂ ratio is 10% by weight or less. Preferably there is.

  The ITO thin film formed without heating the substrate as described above is in an amorphous state and can be etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution. However, since an amorphous ITO thin film has high resistance, it is not preferable as a sensor electrode as it is. Therefore, annealing is performed after the etching process to crystallize the ITO, and a low resistance sensor electrode is obtained. The amorphous ITO film formed by the above-described method is crystallized at 140 to 250 ° C. for 5 to 40 minutes as an annealing treatment, for example.

In the patterning of the dielectric layer 70 described above, the dielectric layer 70 is removed from a partial region of the inactive area A2.
As a result, the first conductive portion 75b on the first extraction line 73 and the second extraction line 74 is exposed. In the step of forming the second conductor layer, the second conductor layer is also formed in the exposed inactive area A2. Then, in the step of patterning the second conductive layer, the second conductive layer formed on the exposed first conductive portion 75b is left without being removed, and the second transparent conductive portion is formed on the first conductive portion 75b. You may form in the structure which laminated | stacked 75c (refer FIG. 4b).

In the embodiment of the present invention, the very narrow line portion 63 of the first sensor electrode 61 intersects the bridge portion 68 in a non-contact state so as to straddle the dielectric layer 70, and the dielectric layer Only a small thickness of the first and second sensor electrodes protrudes from the surface formed by the main parts 62 and 67.
The surface of the substrate 45 is substantially covered with the first and second sensor electrodes 61 and 66. Moreover, the material constituting the sensor electrode is a transparent conductive material that has a pencil hardness as high as 6H or more and can prevent scratches, and the entire surface of the touch panel sensor layer has a flat surface with high hardness. The sensor electrode main part and the narrow line part of the sensor electrode are arranged in alignment, and the surface part has a surface structure in which the line part is arranged at a predetermined interval as a small region protruding by the thickness of the dielectric layer.

In this case, after the touch panel sensor layer 60 is formed on one side of the base material 45, while the one side of the base material 45 is directed downward, the substrate 40 being produced is repeatedly moved and stopped by the transport means, Even if the color filter layer 50 is formed on the other side of the base material 45, the surface of the base material formed by the sensor electrode has a high hardness and can prevent scratches. It is possible to prevent the touch panel sensor layer 60 from being damaged or dirt from being attached to the touch panel sensor layer 60.
Therefore, the surface of the touch panel sensor layer 60 is substantially protected by the sensor electrode main parts 62 and 67 having a high surface hardness.
As a result, the display device substrate 40 having the touch panel sensor layer 60 that can exhibit the expected function can be stably obtained.

[Formation of protective layer]
Further, in the present invention, when the line part 63 of the first sensor electrode that intersects the bridge part 68 protrudes from the sensor electrode main part 62, in order to protect the surface more reliably, it is shown in FIG. 8 or FIG. Thus, the touch panel sensor surface is more reliably protected by arranging the protective layer 42 in a region where the line portion and the bridge portion intersect on the touch panel sensor surface or at least the bridge portion and the through hole. Can do.
In the present invention, in order to protect at least the terminal portion region of the present invention from the etching solution, a part of the terminal portions 73t and 74t is excluded, and the extraction lines 73 and 74 of the extraction line portion 60b and the wiring terminal connection portions 73e and 74e are removed. Is covered with a protective layer 42 (step Sa5 in FIGS. 4a, 4b, FIGS. 5, 6 and 7a).
By applying the protective layer 42 to the protruding region and reducing the protective region, it is possible to suppress a decrease in yield due to foreign matter. Further, the transmittance of the touch panel sensor can be improved by reducing the protective area.
The protective layer 42 is preferably formed after the step of forming the touch panel sensor layer 60 and before the step of forming the color filter layer 60.

The above-described protective layer 42 is formed by coating an organic material such as an acrylic polymer on the touch panel sensor layer 60 to form an organic material layer, and further patterning the organic material layer using a photolithography technique. Can be formed.
According to such a method, the protective layer 42 covering only a desired region of the touch panel sensor layer 60 can be formed. Alternatively, the protective layer 42 can be formed by depositing an inorganic material such as SiO ₂ or SiON on the touch panel sensor layer 60 by vapor deposition or sputtering.

  According to this aspect, an inorganic material can be obtained by performing vapor deposition or sputtering in a state where the touch panel sensor layer 60 is masked with a metal mask, or by patterning an inorganic material layer formed by vapor deposition or sputtering with a photolithography technique. The protective layer made of can cover a desired region of the touch panel sensor layer 60.

In the present invention, as described above, the case where the protective layer 42 is provided so as to partially cover the area where the line part 63 and the bridge part 68 intersect on the surface of the touch panel sensor is described.
According to such an aspect, the take-out portion 60b is covered with the protective layer 42 except for the terminal portions 73t and 74t that function as take-out terminals necessary for connection to the outside.

[Color filter layer]
Next, the process of producing the color filter layer 50 on the other surface 45b of the base material 45 will be described.
FIG. 9 is a schematic diagram showing a state of the color filter layer being created, along with a flowchart for explaining the method for manufacturing the color filter layer 50.

As shown in FIG. 9, the process of producing the color filter layer 50 includes the formation step Sb1 of the light shielding portion 51, the formation step Sb2 of the first coloring portion 52G, the formation step Sb3 of the second coloring portion 52R, and the third coloring portion 52B. Forming step Sb4, forming step Sb5 of the protective film 53, forming step Sb6 of the transparent electrode layer 54, and other steps such as forming an alignment film.
In each of these steps Sb1 to Sb6, a material layer forming step by coating, vapor deposition or sputtering, a step of exposing the material layer, and a step of developing the material layer are performed.

  Since each of these processes is generally performed by a dedicated device, the substrate 45 provided with the touch panel sensor layer 60 is repeatedly transported and stopped several tens of times during the process of forming the color filter layer 50. While being transported through a long production line. In the process of forming the color filter layer 50, unlike the process of forming the touch panel sensor layer 60 described above, the base material 45 (being produced) is in a state in which the base material 45 is in contact with a roller or the like of the conveying means from one side. The substrate 40) is transferred.

Therefore, according to the present embodiment, the first sensor electrode 61 is disposed on the surface 70a of the dielectric layer 70 on the side opposite to the base member 45, and the second sensor electrode is disposed on the other regions. Both sensor electrodes are provided so as to substantially cover the entire surface of the touch panel sensor layer.
Therefore, most of the surface area that is easily damaged is covered with the sensor electrode, and the line portion of the first sensor electrode out of the sensor electrode protrudes from the other sensor electrode layer by the thickness of the dielectric layer 70. Is substantially planar, and the transparent conductive material forming the sensor electrode has a higher hardness than the conventional resin protective layer, so that the sensor portion 60a that is difficult to find damaged because it is transparent, Damage can be prevented very effectively.

In the conventional manufacturing method, the transparent electrode of the color filter is formed by depositing polycrystalline ITO by sputtering using a mixed gas of argon and oxygen while heating the substrate. After forming an ITO pattern in a lithography process, a method of etching unnecessary ITO with aqua regia has been used. In addition, the temperature of said board | substrate heating is 200 to 250 degreeC normally for ITO crystallization.

  However, in the touch panel sensor integrated color filter in which the touch panel sensor unit 60 is formed on one surface of the common transparent substrate 40 and the color filter unit 50 is formed on the other surface, When etching processing is performed with aqua regia to form an incision pattern in the transparent electrode of the color filter unit 50, terminals such as a metal layer and a conductor layer where the touch panel sensor unit 60 is exposed or the protective function is insufficient Even parts, peripheral wiring and sensor electrodes are etched with aqua regia.

Therefore, in the present invention, amorphous ITO can be etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution, but polycrystalline ITO and ITO crystallized by annealing are mainly composed of oxalic acid. The characteristic of not being etched with a weak acid is used to pattern the transparent electrode.
That is, the transparent electrode of the color filter unit 50 is first formed as an amorphous ITO thin film, etched using a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution, and then the amorphous ITO thin film is processed. By forming a low-resistance transparent electrode by annealing and crystallization of the thin film, the terminal portions 73t and 74t, the sensor electrodes 61 and 66 formed on the touch panel sensor layer 60 side are corroded by etching. It is intended to prevent.

Amorphous ITO can be formed by vapor deposition or sputtering using a mixed gas of argon and oxygen, for example, using an ITO target with a SnO ₂ ratio of 1 to 10% by weight and without heating the substrate. . Here, if the SnO ₂ ratio of the ITO target is excessively low, the density of the target cannot be increased. Therefore, the SnO ₂ ratio is preferably 1% by weight or more. Further, if the SnO ₂ ratio of the ITO target exceeds 10% by weight, an amorphous ITO thin film that can be crystallized by annealing at a low temperature for a short time cannot be formed. Therefore, the SnO ₂ ratio is 10% by weight or less. Preferably there is.

  The ITO thin film formed without heating the substrate as described above is in an amorphous state and can be etched with a weak acid mainly composed of oxalic acid such as an oxalic acid aqueous solution. However, since an amorphous ITO thin film has high resistance, it is not preferable as a sensor electrode as it is. Therefore, annealing is performed after the etching process to crystallize the ITO, and a low resistance sensor electrode is obtained. The amorphous ITO film formed by the above-described method can be easily crystallized, for example, at 140 to 250 ° C. for 5 to 40 minutes as an annealing process.

As described above, the first substrate 40 having the touch panel sensor layer 60 and the color filter layer 50 is manufactured.
The first substrate 40 thus obtained is incorporated into the liquid crystal display device 10 as a color filter substrate having the touch panel sensor layer 60.
In addition, the sensor electrodes 61 and 66 and the terminal portions 73t and 74t formed on the touch panel sensor portion 60 are not corroded by the etching solution, and the FPC such as a defective touch panel sensor function, an electric failure of the terminal portion, and stabilization of the crimping conditions. Crimping defects can be reduced, and disconnection defects can also be reduced.
Therefore, the display device 10 functions as a highly sensitive touch panel device and also functions as a device that displays an image.

When the display device 10 functions as a touch panel device, the following operational effects can be expected.
As described above, since the touch panel sensor layer 60 can be stably manufactured while preventing damage and adhesion of dirt, the display device 10 can also detect the contact position or the approach position with stable sensitivity. Become.

On the other hand, when the display device 10 functions as a device for displaying an image, the following effects can be expected.
The display device 10 has an interface that can reflect ambient light (external light) such as illumination, image light, and the like as compared with a device in which a touch panel device formed separately from the display device is attached to the display device. The number of can be reduced. Thereby, the transmittance | permeability of image light rises and energy efficiency improves, and the contrast of the image | video displayed on the display apparatus 10 can be improved by suppressing reflection of environmental light.
From the above, according to the display device 10 according to the present embodiment, it is possible to display an image with excellent image quality although a touch panel function is provided.

  According to the present embodiment, in the touch panel sensor substrate, the line portion 63 of the first sensor electrode 61 is disposed on the surface 70 a of the dielectric layer 70 on the side opposite to the base material 45, and other than the base material 45. The first and second sensor electrode main parts 62 and 67 are disposed in the surface area of the touch panel sensor, and are provided so that the entire surface of the touch panel sensor layer 60 is substantially covered by both sensor electrode main parts.

Therefore, the sensor portion 60a that is easily damaged because it is thin and that is difficult to be detected because it is transparent, such as a touch panel sensor integrated color filter substrate without providing a resin protective layer. Even if functional layers such as sensors or filters are continuously formed on both surfaces, damage to the substrate surface and adhesion of dirt to the substrate surface can be prevented very effectively.
That is, the touch panel sensor layer 60 exhibits excellent durability against contact with the outside during handling, for example, contact with the roller of the conveying unit during formation of the color filter layer 60.

[Second Embodiment of Terminal Structure]
Next, a second embodiment of the terminal portion structure according to the present invention will be described with reference mainly to FIG. Here, FIG. 6 is an enlarged cross-sectional view of the terminal portion of the touch panel sensor substrate. In addition, the same code | symbol is attached | subjected about the same part as FIGS. 1-5, and the detailed description is abbreviate | omitted.

As an embodiment of another structure of the terminal portion formed on the touch panel sensor substrate of the present invention, the terminal portion is formed and arranged so as to be an area of the laminated terminal portion shown as an enlarged view in FIG.
In the embodiment of the first terminal portion structure described above, the extraction lines 73 and 74 made of metal lines of the high conductivity conductive material layer formed on the surface 45a on one side of the base material 45 and the wiring terminal connection portion thereof 73e and 74e are covered with the ITO transparent conductor layer 75b and / or 75c, and are further electrically connected and protected by the laminated structure covered with the protective layer 42, and the terminal portion 73t is formed only by the ITO transparent conductor layer. , 74t are formed.

In the second embodiment of the terminal structure of the present invention, as shown in FIG. 6, the terminal parts 73t and 74t are the same, but the ITO transparent conductor layer forming the terminal part and the extraction line part The laminated structure with the wiring terminal connection portions 73e and 74e is different.
That is, the terminal portions 73t and 74t are connected terminal portions 75b composed of an ITO transparent conductor layer directly formed on a transparent base material, and the ITO transparent conductor layer forming the terminal portion extends to the take-out line portion. A first wiring terminal connection portion 73e and a second wiring terminal connection portion 74e formed on the ITO transparent conductor layer on the terminal portion region side of each extraction line 73, 74, and further protecting the extraction line A laminated structure covered with the layer 42 is formed.

  As can be seen from FIG. 6, an ITO transparent conductor layer 75b is formed directly on the surface 45a on one side of the substrate 45, and the take-out lines 73 and 74 and the wiring terminal connection portion 73e thereof are formed on the ITO transparent conductor layer. 74e are laminated, and the wiring terminal connection portions are covered with a protective layer 42, and the wiring terminal connection portions 73e and 74e are covered and protected by the ITO transparent conductor layer 75b and the protection layer 42. This is the structure.

The first wiring terminal connection portion 73e and the second wiring terminal connection portion 74e of the present invention are formed by laminating a metal material on the surface of the ITO transparent conductor layer, being superimposed, and being electrically connected in surface contact with the terminal portion.
As shown in FIG. 6, the connection portions between the terminal portions 73 t and 74 t of the present invention and the respective wiring terminal connection portions 73 e and 74 e are formed by laminating the transparent base material, the ITO transparent conductor layer, and the wiring terminal connection portion. The laminated terminal (wiring portion) and the wiring terminal connection portions 73e and 74e formed on the ITO transparent conductor layer are covered with the protective layer 42.

As described above, in the present invention, the terminal portions 73t and 74t are different from the conventional terminal portions in that the terminal portions made only of the ITO transparent conductor layer are formed, and the wiring terminal connection of the metal line made of the high conductivity metal material is formed. The parts 73e and 74e and their edges are surrounded and covered with the protective layer 42.
As a result, the wiring terminal connection portions 73e and 74e do not enter the terminal portion and are not directly exposed to the outside, and the edges thereof are surrounded by the ITO transparent conductor layer 75b and the protective layer 42. So that it is covered and protected.
In the connection between the terminal portion and the take-out line of the present invention, since the wiring terminal connecting portions 73e and 74e are covered so as to be surrounded by the protective layer 42 on the ITO transparent conductor layer 75b, the thickness of the protective layer By adjusting the, the edge of the wiring terminal connection portion is securely and securely protected by the protective layer.

  The touch panel substrate (first substrate) 40 having the terminal part structure having the above-described configuration is obtained by changing the order of each process by the same method as the first embodiment as shown in the flowchart of FIG. 7b. Can be manufactured.

In the embodiment of the second terminal portion structure of the present invention, in the first conductor layer forming step (step Sa1 in FIG. 7b), first, the extraction lines 73 and 74, the wiring terminal connection portions 73e and 74e, and the terminals In order to form the portion with the ITO transparent conductor layer of the first conductor layer 75b, an ITO transparent conductor material is used for the entire active area A1 and non-active area A2 of the surface 45a on one side of the substrate 45, and the ITO transparent conductor Deposit layers.
The ITO conductor material forming the transparent conductor layer may be amorphous ITO or polycrystalline ITO.
After forming the first conductor layer, a step of patterning the first conductor layer is performed. After forming a pattern by the photolithographic method as described above, it is etched into a desired shape by a method of etching with a weak acid mainly composed of oxalic acid or hydrohalic acid such as aqua regia, and finally has a low resistance. A sensor electrode is formed of polycrystalline ITO.

In the step of forming, on the base material, the bridge portion 68 that connects the main portion 67 of the second sensor electrode 66 of the present embodiment in the second direction, an ITO transparent conductor is used for the bridge portion 68, and the bridge portion. It is possible to use a high conductivity metal or conductor for 68.
When an ITO transparent conductor is used for the bridge portion 68, the ITO transparent conductor layer of the first conductor layer is uniformly formed on the entire surface of one side of the substrate 45, and then the patterning of the bridge portion 68 is performed. The patterning of the inactive area A2 where the peripheral wiring of the peripheral part is arranged and the terminal part is simultaneously performed in the step of forming the first conductor layer (step Sa1 in FIG. 7b).
After patterning the first conductor layer, the metal layer is formed in the first inactive area A2 in order to form the extraction lines 73 and 74 and the wiring terminal connection portions 73e and 74e thereof using a metal having a high conductivity. A film is formed on the takeout line portion 60b of the conductor layer 75b, and the takeout lines 73 and 74 and their wiring terminal connection portions 73e and 74e are patterned and formed (step Sa2 in FIG. 7b).

  When a high conductivity metal or conductor is used for the bridge portion 68, an ITO transparent conductor layer is formed only in the non-active area A2 in the first conductor layer forming step, and then a take-out line forming step (FIG. In step Sa2) of 7b, a metal layer or a conductive layer is formed on the ITO transparent conductor layer of the first conductor layer of the takeout line portion 60b of the non-active area A2 and in the active area region A1 of the sensor portion 60a that forms the bridge portion. A body layer is formed, a metal layer or the like is laminated on the ITO transparent conductor layer of the first conductor layer 75b, the metal lines 75a of the take-out lines 73 and 74 and their wiring terminal connection portions 73e and 74e, and The bridge portion 68 can be patterned and formed together.

  Also in the second embodiment, in the step of forming the dielectric layer 70 (step Sa3 in FIG. 7b), the surface region of the bridge portion 68 is formed on the second sensor electrode 66 in the same manner as in the first embodiment. The dielectric layer 70 is formed in the second direction so as to cover the bridge portion 68 while leaving a connecting portion electrically connected to the main portion 67.

Next, in the step of forming the second conductor layer (step Sa4 in FIG. 7b), after patterning the dielectric layer 70, the first sensor electrode 61 and the second sensor electrode 66 that constitute the touch panel sensor unit of the present invention. In order to form the main portion 67, a second conductor layer is formed in the active area region A1 of the sensor portion 60 using an ITO transparent conductive material.
Next, the deposited second conductor layer that forms the touch panel sensor portion is formed of the first sensor electrode 61 and the second sensor electrode 66 using the photolithography technique, as in the first embodiment. The part 67 is patterned and formed.
In the step of forming the second conductor layer, the second conductor layer is formed using the ITO transparent conductive material also in the inactive area A2, and the extraction lines 73 and 74 of the extraction line portion 60b and the wiring terminal connection portion thereof are formed. The second conductor layer 75c may be formed on 73e and 74e.
Thereafter, in the step of forming the protective layer 42 (step Sa5 in FIG. 7b), the protective layer 70 is formed on the terminal area and the touch panel sensor portion formed of the laminated structure of the formed extraction lines 73 and 74 and the wiring terminal connection portions 73e and 74e. Film and coat.

  As described above, the flowchart for forming the touch panel sensor layer of FIGS. 7a and 7b shows a basic process example for forming the touch panel sensor layer 60, and is not limited thereto. The order of each process can be changed as appropriate, whereby a required touch panel sensor layer having a terminal structure can be formed.

[Other Embodiment 1 of Touch Panel Sensor Layer]
In the first and second embodiments of the terminal structure described above, the touch panel sensor layer has the first sensor electrode 61 and the main part 67 of the second sensor electrode 66 disposed on the surface on one side of the base material 45. Has been.
And the main part 67 of the 1st sensor electrode 61 and the 2nd sensor electrode 66 and the 2nd sensor electrode main part 67 adjacent to the 2nd direction of the some 2nd sensor electrode main part 67 are connected, and are electrically connected. The line portion 63 of the first sensor electrode 61 is disposed on the opposite side of the bridge portion 68 from the base material 45 (one side of the main portion 67) via the dielectric layer 70.

The touch panel sensor layer according to another embodiment 1 of the present invention includes the above-described first and second terminal portion structure embodiments of the present invention and the sensor portion 60a of the touch panel sensor layer 60 as shown in FIGS. 10a and 10b. Are different in the following points, and the others can be similarly configured.
That is, in other embodiments of the touch panel sensor layer (FIGS. 10a and 10b), the bridge sensor 68 of the second sensor electrode 66 is merely disposed on the surface of one side of the substrate 45, and the second sensor The entire surface of the substrate 45 including the surface 45 a opposite to the substrate 45 of the bridge portion 68 of the electrode 66 (one side of the bridge portion 68) is disposed so as to be covered with the dielectric layer 70.
The entire surface of the dielectric layer 70 is disposed so as to cover the main portions 67 of the first sensor electrode 61 and the second sensor electrode 66.
Hereinafter, it will be described in more detail with reference to the drawings.

As shown in FIGS. 10a and 10b, in this embodiment, a plurality of conductors are arranged on the surface 45a on one side of the base material in the first direction and in the second direction intersecting the first direction. A bridge portion 68 is provided. A dielectric layer 70 is formed on the entire surface of one side of the substrate including the plurality of bridge portions 68.
A through hole 71 is formed in the dielectric layer 70 so as to correspond to each of the plurality of bridge portions 68. The through hole 71 communicates with the corresponding bridge portion 68. As can be understood from FIG. 10 a, two through holes 71 are formed for each bridge portion 68. Two through holes 71 provided corresponding to one bridge portion 68 are spaced apart from each other in the second direction.

A plurality of first sensor electrodes 61 are provided on the dielectric layer 70. Each first sensor electrode 61 extends in the first direction so as to cross the plurality of bridge portions 68 arranged in the first direction. Each first sensor electrode 61 extends between the two through holes 71 provided corresponding to each bridge portion 68 and on the surface 70 a of the dielectric layer 70.
That is, in the first sensor electrode 61, the narrow line portion 63 of the first sensor electrode crosses each bridge portion 68 through the dielectric layer 70 in a non-contact state. In the illustrated example, the plurality of first sensor electrodes 61 are arranged in the second direction at equal intervals.

  Further, a main portion 67 of the second sensor electrode 66 is provided on the dielectric layer 70. The main portion 67 of the second sensor electrode 66 has through-holes 71 formed corresponding to two bridge portions 68 adjacent in the second direction among the plurality of bridge portions 68 formed on the substrate. It is provided in the position corresponding to each. The main portion 67 of each second sensor electrode 66 extends on the dielectric layer 70, passes through the through hole 71, and is connected to two bridge portions 68 corresponding to the first sensor electrode 61 in a non-contact state. The main portions 67 of the two second sensor electrodes 66 adjacent in the second direction are connected by a bridge portion 68 to electrically connect the second sensor electrode main portions 67.

In the present embodiment, as in the first and second embodiments, the entire surface of the touch panel sensor substrate, that is, the base of the dielectric layer 70, as shown in FIG. 10a, which is a cross section along the first direction. The surface 70 a opposite to the material 45 is covered with the first sensor electrode 61 and the second sensor electrode 66.
A first sensor electrode 61 and a plurality of second sensor electrode main portions 67 are disposed in the region of the surface 70 a of the dielectric layer 70. Two narrower line portions 63 of the first sensor electrode 61 intersect the bridge portion located on the surface 45a on one side of the base material 45 than the thick main portion 62 of the first sensor electrode. It is disposed on the surface 70a of the dielectric layer 70 in the region between the through holes.

  Further, as shown in FIG. 10 b, which is a cross section along the second direction, the surface 70 a of the dielectric layer 70 on the side opposite to the base material 45 is in a region facing each bridge portion 68 of the second sensor electrode 66. A main portion 67 of the second sensor electrode 66 is provided. That is, the dielectric layer 70 has a uniform thickness over the entire touch panel sensor portion, and the first sensor electrode 61 and the second sensor electrode 66 are provided on the surface so as to substantially cover the entire surface of the dielectric layer, The main portion 67 of the second sensor electrode 66 and the bridge portion 68 are connected via a through hole 71 formed at a location corresponding to the bridge portion 68 formed on the surface 45a of the base material 45.

  The touch panel substrate (first substrate) 40 having the touch panel sensor layer 60 configured as described above can be manufactured according to the flowchart shown in FIG.

When the bridge portion 68 is formed of a metal line when the extraction line formation step (step Sa1 in FIG. 7c) is performed, the first conductor layer formation step (step Sa2 in FIG. 7) is defined as the extraction line formation step. They can be formed simultaneously (step Sa1 in FIG. 7c).
A metal layer of a high conductivity material is formed on the active area A1 and the non-active area A2 on the base material 45, and the extraction lines 73 and 74 and the wiring terminal connection portions 73e and 74e of the extraction line portion 60b and the bridge portion 68 are formed. Are simultaneously patterned to form the metal line portion 75a (step Sa1 in FIG. 7c, FIG. 10a).

  When the bridge portion is formed of a conductor, the extraction line formation step and the bridge portion formation step are performed separately to form a metal layer in the inactive area A2, and the extraction lines 73 and 74 of the extraction line portion 60b. Then, after patterning and forming the wiring terminal connection portions 73e and 74e, the first conductor layer is formed using a conductive material in the active area A1, and the bridge portion is patterned and formed (step Sa1 in FIG. 7c). ). At that time, the conductor layer 75b may be laminated on the metal line portion 75a of the take-out line portion 60b to form a laminated terminal portion structure.

When the bridge portion is formed of an ITO transparent conductor, after the extraction line portion 60b is patterned and formed, the first conductor layer is formed, and the bridge portion 68 is patterned and formed.
When the bridge portion 68 is formed, the ITO transparent conductor layer 75b is formed on the metal layer 75a of the take-out line portion 60b and / or when the second conductor layer is formed, the ITO transparent conductor layer 75c. Is formed, and a take-out line in which an ITO transparent conductor layer is laminated on the metal layers of the take-out lines 73 and 74 is patterned and formed (step Sa3 in FIG. 7c, FIG. 10a).

  In the touch panel sensor layer 60 of this embodiment, after forming the take-out line portion 60b and the bridge portion 68, in the dielectric layer forming step (step Sa2 in FIG. 7c), the touch panel sensor layer 60 includes a plurality of bridge portions 68 and includes The entire area of the active area A1 on the side is covered with the connecting portion of the bridge portion, that is, the dielectric layer 70 except for the through hole 71, or the dielectric layer 70 is formed, and then the through hole 71 of the dielectric layer is formed by patterning You can also

Next, in the step of forming the second conductor layer (step Sa3 in FIG. 7c), the main portion 67 and the first portion 67 of the second sensor electrode 66 are formed on the dielectric layer 70 so as to make electrical contact with the bridge portion 68. In order to form the sensor electrode 61, an ITO transparent conductive layer is formed using an ITO transparent conductive material, and the first sensor electrode 61 and the second sensor electrode main portion 67 are patterned, whereby the first sensor electrode 61, The bridge portion 68 and the second sensor electrode main portion 67 are connected via the main portion 67 and the through hole 71 of the second sensor electrode 66 to form the electrically connected second sensor electrode 66 (FIG. Step Sa3) of 7c.
When the main portion 67 of the first sensor electrode 61 and the second sensor electrode 66 is formed, the first conductor layer formed on the terminal portions 73t and 74t and the wiring terminal connection portions 73e and 74e when the bridge portion 68 is formed. A second conductor layer 75c can be further stacked on the layer 75b (step Sa3 in FIG. 7c, FIG. 10a).

  Finally, in the step of forming the protective layer 42 (step Sa4 in FIG. 7c), the terminal portion region take-out lines 73 and 74, the first conductor layer 75b, and the second conductor layer 75c excluding the terminal portions 73t and 74t. The wiring terminal connection portions 73e and 74e and the active area A1 having the laminated structure are covered and protected by the protective layer. Although the entire active area A1 is protected by the protective layer 42, the protective layer 42 is not necessarily provided.

  According to the embodiment of the touch panel sensor layer 60, the bridge portion 68 of the second sensor electrode 66 is covered with the dielectric layer 70 and the ITO transparent conductor layer and is not exposed. Further, since the entire surface of the dielectric 70 is covered with the first and second sensor electrodes 61 and 66 and is covered with a high-hardness inorganic material made of a transparent conductive material on the surface, it is caused by contact with the outside during handling. For example, it is possible to prevent the surface of the touch panel sensor layer of the touch panel sensor substrate and the bridge portion 68 of the second sensor electrode 66 from being damaged due to the contact with the roller of the transport unit during the formation of the color filter layer 60.

  In addition, the line portion 63 of the first sensor electrode 61 is easily damaged because of its narrow width, but is wider than the line portion 63 of the first sensor electrode 61 and the bridge portion 68 of the second sensor electrode 66. The sensor electrode main parts 62 and 67 are surrounded from the periphery, so that the line part 63 can be effectively protected and has excellent durability.

[Other Embodiment 2 of Touch Panel Sensor Layer]
The main portion 62 of the first sensor electrode 61 and the main portion 67 of the second sensor electrode 66 are in a region where the line portion 63 of the first sensor electrode 61 and the bridge portion 68 of the second sensor electrode 66 intersect with each other. A narrow line portion 63 of the first sensor electrode is located on the surface 70a of the sensor, and the sensor portion 60a and the outside are in local contact with each other during handling of the touch panel sensor layer 60, and a large force is applied to the sensor portion 60a. In order to reliably protect the line portion when the slab is added, as shown in FIG. 11, a protective layer is formed to cover the minimum necessary small region, at least the bridge portion and the through hole, with the protective layer 42. You can also.
The touch panel sensor layer 60 according to the present embodiment also has higher transmittance than the conventional one and has sufficient durability including the terminal portion.

[Other Embodiment 3 of Touch Panel Sensor Layer]
Further modifications can be made to the above-described embodiments of the first and second touch panel sensor layers. Hereinafter, another embodiment of the touch panel sensor layer will be described with reference to FIGS. 7D and 12.
In the touch panel sensor layer of the first and second embodiments, the bridge portion 68 is formed by patterning the first conductor layer, but in the present embodiment, by patterning the first conductor layer, The main portions 67 of the first sensor electrode 61 and the second sensor electrode 66 are different in that they are directly formed on the surface 45 a on one side of the base material 45.

In the embodiment of the present invention, in the first conductor layer forming step and the second conductor layer forming step, the take-out line portion 60b and the terminal portions 73t and 74t are made of the ITO transparent conductive material. It can be formed as the first conductor layer 75b or the second conductor layer 75c, and the metal line layer 75a can be formed on the ITO conductor layer.
Since the main parts 62 and 67 of the first and second sensor electrodes are formed on the surface of the base material 45, there are few parts laminated on the touch panel sensor layer, and there are few causes of peeling from the laminated parts. A sensor electrode layer that is securely in close contact is formed, and durability is good.

  The touch panel sensor display substrate (first substrate) 40 having the touch panel sensor layer 60 configured as described above can be manufactured according to the flowchart shown in FIG.

In the present embodiment of the touch panel sensor layer 60, the first sensor electrode 61 and the first sensor electrode 61 and the first sensor electrode 61 are formed using the ITO transparent conductive material in the first conductor layer forming step (step Sa1 in FIG. 7d) without forming the extraction line. (2) An ITO transparent conductor layer is formed on the sensor electrode main part 67 and the terminal part region, patterned, and then the metal layers of the takeout lines 73 and 74 are formed on the ITO transparent conductor layer in the takeout line forming step. A film is formed, and a terminal portion structure is laminated.
Next, in the step of forming the dielectric layer 70 (step Sa3 in FIG. 7d), the dielectric layer 70 is formed on the surface 45a opposite to the substrate 45 of the line portion 63 in the region where the line portion 63 and the bridge portion 68 intersect. Is formed and patterned.

  Thereafter, in the present embodiment, in the step of forming the second conductor layer (step Sa4 in FIG. 7d), the bridge portion 68 is covered by the dielectric layer 70 covering the region where the line portion 63 and the bridge portion 68 intersect. Arranged on the surface 70a so as to straddle the line portion 63 of the first sensor electrode, and connects the two second sensor electrode main portions 67 that intersect the first sensor electrode 61 in a non-contact state and are adjacent in the second direction. Then, the second sensor electrodes 66 arranged in parallel and extending in the second direction by being electrically connected are formed.

When the bridge portion 68 is formed of an ITO transparent conductor, when forming the bridge portion 68 of the second sensor electrode 66, the terminal portions 73t and 74t and the extraction lines 73 and 74 and the extraction lines of the wiring terminal connection portions 73e and 74e are used. An ITO transparent conductor layer may be formed on the portion 60b, patterned, and the second conductor layer 75c may be stacked.
Next, in a protective layer formation step (step Sa5 in FIG. 7d), a protective layer 42 is formed on the entire active area A1 and inactive area A2 except for the terminal portions in order to protect the touch panel sensor portion 60a and the peripheral wirings formed above. To do. In this case, since the touch panel sensor layer is covered with the ITO transparent conductor layer, the protective layer 42 is not necessarily formed.

When the bridge portion 68 is formed of a metal line, the step of forming the extraction line is omitted, and the second conductor layer 75a of the metal layer is formed on the first conductor layer in the step of forming the second conductor layer. The metal line part 75a can also be formed in the extraction line part 60b of the extraction lines 73 and 74 and the wiring terminal connection parts 73e and 74e.
When the metal layer is formed in the formation process of the second conductor layer, in particular, by forming the protective layer 42 uniformly on the entire surface of the touch panel sensor layer 60, the bridge portion 68 and the extraction line portion 60b formed from the metal layer. Must be protected (step Sa5 in FIG. 7d).

In the present embodiment, when the bridge portion 68 of the second sensor electrode 66 is an ITO transparent conductor, it is exposed on the dielectric layer 70, and the thickness of the dielectric layer 70 is divided from the sensor electrode main portions 62 and 67. The entire surface of the touch panel sensor layer 60 is covered with the first and second sensor electrodes 61 and 66, and is a transparent conductive material made of an inorganic material. Since the high protrusions are arranged at predetermined intervals, the sensor electrode layer having a high surface hardness is substantially protected.
As a result, the surface of the touch panel sensor layer 60 of the touch panel sensor substrate and the second sensor electrode 66 by contact with the outside during handling of the touch panel sensor substrate, for example, by contact with the roller of the conveying means during formation of the color filter layer 60. It is possible to prevent the bridge portion 68 from being damaged.
Further, since the bridge portion 68 protrudes, as described above, the bridge portion 68 of the second sensor electrode 66 that is easily damaged due to its narrow width is covered with the protective layer 42, so that the bridge portion 68 is effectively formed. Can be protected, and durability can also be improved.

The above-described protective layer 42 is formed by coating an organic material such as an acrylic polymer on the touch panel sensor layer 60 to form an organic material layer, and further patterning the organic material layer using a photolithography technique. Can be formed. According to such a method, a protective layer that covers only a desired region of the touch panel sensor layer 60 can be produced. Alternatively, the protective layer 42 can also be produced by depositing an inorganic material such as SiO ₂ or SiON on the touch panel sensor layer 60 by vapor deposition or sputtering.

According to this aspect, an inorganic material can be obtained by performing vapor deposition or sputtering in a state where the touch panel sensor layer 60 is masked with a metal mask, or by patterning an inorganic material layer formed by vapor deposition or sputtering with a photolithography technique. The protective layer made of can cover only a desired region of the touch panel sensor layer 60.
In addition, it is preferable that the protective layer 42 is formed on the entire surface of the substrate surface excluding the terminal portion after the step of forming the touch panel sensor layer 60 and before the step of forming the color filter layer 50. The protective layer may cover the wiring terminal connection portion and the extraction line in the inactive area excluding the terminal portion.

In this case, after the touch panel sensor layer 60 is formed on one side of the base material 45, while the one side of the base material 45 is directed downward, the substrate 40 being produced is repeatedly moved and stopped by the transport means, Even if the color filter layer 50 is formed on the other side of the substrate 45, the bridge portion 68 of the touch panel sensor layer 60 can be protected by the protective layer 42.
Thereby, it is possible to prevent the touch panel sensor layer 60 from being damaged or the touch panel sensor layer 60 from being contaminated. As a result, the display device substrate 40 having the touch panel sensor layer 60 that can exhibit the expected function can be stably obtained.

The main portion 62 of the first sensor electrode 61 and the main portion 67 of the second sensor electrode 66 are exposed on the surface of the base material 45 on the touch panel sensor layer side. The main part 62 of the first sensor electrode 61 and the main part 67 of the second sensor electrode 66 are wider than the line part 63 of the first sensor electrode 61 and the bridge part 68 of the second sensor electrode 66. It adheres tightly to the base material and has excellent durability.
Since the main portion 62 of the first sensor electrode 61 and the main portion 67 of the second sensor electrode 66 occupy most of the base material 45 in the active area A1, during the handling of the touch panel sensor layer 60, It is effectively suppressed that a large force is applied to the sensor unit 60a due to local contact between the sensor unit 60a and the outside. As a result, the touch panel sensor layer 60 according to the present embodiment can also be stably manufactured while preventing damage and adhesion of dirt.

  By providing a touch panel sensor substrate in which the sensor electrode layer is positioned on the surface without providing a protective layer on the surface of the touch panel sensor layer 60 shown in each embodiment of the present invention, that is, almost the surface of the touch panel sensor layer 60. Forming the first substrate 40 in a state where the whole is occupied by the sensor electrode, and forming the ITO transparent conductor layer forming the sensor electrode as a conductor layer of the terminal portions 73t and 74t, and A structure in which the wiring terminal connection portions 73e and 74e of the extraction line portion 60b are covered with the ITO transparent conductor layer, or the wiring terminal connection portion of the extraction line portion is laminated on the ITO transparent conductor layer and further covered with the protective layer 42 Thus, since the sensor electrode material has a pencil hardness of 6H to 7H, the protective layer 42 is transferred during the transfer by the transfer means. It is possible to effectively prevent damage and unremovable adhesion of the protective layer 42 to the protective layer 42, and the terminal portion is not corroded or peeled off. A touch panel sensor substrate that can reduce pressure bonding defects can be realized.

  As described above, the present invention is manufactured by patterning a touch panel sensor layer in which sensor electrodes are arranged on almost the entire surface using photolithography, and also as a conductor layer of a terminal portion formed on a substrate. In conjunction with the formation of the sensor electrode, an ITO transparent conductor layer is formed and patterned to manufacture, and the take-out line and its wiring terminal connection are covered with the ITO transparent conductor layer or laminated on the ITO transparent conductor layer. A touch panel sensor used in a display device such as a VA-mode, STN-mode, or plasma display can be reliably connected and prevented from being damaged and soiled by a structure in which the laminated portion and the laminated edge are covered and protected by a protective layer. It is useful for touch panel sensor substrates such as layer-integrated color filters.

DESCRIPTION OF SYMBOLS 10 Display apparatus 12 Display surface 20 Control part 30 Display panel 35 2nd board | substrate (TFT board | substrate)
40 First substrate (display device substrate, touch panel substrate, color filter substrate)
42 protective layer 45 base material 45a one side 45b other side 50 color filter layer 60 touch panel sensor layer 61 first sensor electrode 62 main part (main part) of first sensor electrode
63 1st sensor electrode line part (line part)
66 Second sensor electrode 67 Main part (main part) of second sensor electrode
68 Bridge part (bridge part) of second sensor electrode
70 Dielectric layer (insulating layer)
70a Surface 71 Through hole 72 Recess 73 First extraction line 74 Second extraction lines 73e, 74e Wiring terminal connection portion 73t, 74t Terminal portion 75a Metal line portion 75b First conductor layer 75c Second conductor layer

Claims (8)

A transparent substrate;
A touch panel sensor layer provided on one surface of the transparent substrate;
A touch panel sensor substrate comprising peripheral wiring provided around the touch panel sensor layer on the transparent substrate,
The touch panel sensor layer includes a plurality of first sensor electrodes extending in the first direction and arranged in parallel in the second direction, and second sensor electrodes extending in the second direction and arranged in parallel in the first direction. Prepared,
The peripheral wiring includes a plurality of first extraction wirings provided corresponding to the plurality of first sensor electrodes, and a plurality of second extraction wirings provided corresponding to the plurality of second sensor electrodes, respectively.
Each first lead-out wiring is connected to a first sensor electrode corresponding to the first lead-out wiring at one end, and a first wiring terminal connection portion connected to a terminal portion functioning as a connection terminal with the outside is formed at the other end. Has been
Each second lead-out wiring is connected to a second sensor electrode corresponding to the second lead-out wiring at one end and is connected to a terminal portion functioning as a connection terminal to the outside at the other end. Formed,
The terminal part comprises a terminal part by an ITO transparent conductor layer directly formed on a transparent substrate, and the first wiring terminal connection part or the second wiring terminal connection part,
The first and second wiring terminal connecting portions are formed on a transparent base material, overlapped on the wiring terminal connecting portions, and covering the periphery of each wiring terminal connecting portion. A touch panel sensor substrate comprising: a body layer; a laminated portion in which the transparent base material, the wiring terminal connection portion, and the ITO transparent conductor layer are laminated; and a protective layer that covers the laminated edge portion. A transparent substrate;
A touch panel sensor layer provided on one surface of the transparent substrate;
A touch panel sensor substrate comprising peripheral wiring provided to surround the periphery of the touch panel sensor layer on the transparent substrate,
The touch panel sensor layer includes a plurality of first sensor electrodes extending in the first direction and arranged in parallel in the second direction, and second sensor electrodes extending in the second direction and arranged in parallel in the first direction. Prepared,
The peripheral wiring includes a plurality of first extraction wirings provided corresponding to the plurality of first sensor electrodes, and a plurality of second extraction wirings provided corresponding to the plurality of second sensor electrodes, respectively.
Each first lead-out wiring is connected to a first sensor electrode corresponding to the first lead-out wiring at one end, and a first wiring terminal connection portion connected to a terminal portion functioning as a connection terminal with the outside is formed at the other end. Has been
Each second lead-out wiring is connected to a second sensor electrode corresponding to the second lead-out wiring at one end and is connected to a terminal portion functioning as a connection terminal to the outside at the other end. Formed,
The terminal part comprises a terminal part by an ITO transparent conductor layer directly formed on a transparent substrate, and the first wiring terminal connection part or the second wiring terminal connection part,
The first wiring terminal connecting portion and the second wiring terminal connecting portion include the ITO transparent conductor layer formed on a transparent base material and the first and second wirings superimposed on the ITO transparent conductor layer. A touch panel sensor substrate comprising: a terminal connection portion; a laminated portion where the transparent base material, the ITO transparent conductor layer, and the wiring terminal connection portions are laminated; and a protective layer covering the laminated edge portion.   The touch panel sensor substrate according to claim 1, further comprising a color filter layer on the other surface of the transparent substrate on which the touch panel sensor layer is formed.   The touch panel sensor substrate according to claim 3, wherein a transparent base material is further laminated on the touch panel sensor layer via an adhesive layer.   The touch panel sensor substrate according to claim 3, wherein the transparent substrate is a polarizing plate. In the method of manufacturing a touch panel sensor substrate having a color filter layer according to claim 3,
After forming the sensor electrode of the touch panel sensor, the lead-out wiring, the wiring terminal connection portion, the terminal portion and the protective layer, an amorphous ITO thin film layer is formed on the other main surface of the transparent substrate. And etching with a weak acid containing oxalic acid as a main component, followed by annealing to crystallize the amorphous ITO and form a sensor electrode in the color filter portion,
A method for manufacturing a touch panel sensor substrate, comprising: In the manufacturing method of the touch panel sensor substrate according to claim 6,
The step of forming the touch panel sensor includes the step of forming a peripheral wiring on the transparent base material so as to surround the periphery of the touch panel sensor layer, and then the first touch panel sensor layer provided on one surface of the transparent base material. At the same time as forming the first and second sensor electrodes, an ITO transparent conductor layer is directly formed on the transparent substrate to form a terminal portion, and the connection side between the terminal portion and the wiring is on the transparent substrate. A step of laminating an ITO transparent conductor layer on each of the formed wiring terminal connection portions and covering a peripheral portion of each wiring terminal connection portion; and the transparent base material, each wiring terminal connection portion and the ITO transparent conductor layer. A step of covering the laminated structure portion and the laminated edge portion with a protective layer,
A method for manufacturing a touch panel sensor substrate, comprising: In the manufacturing method of the touch panel sensor substrate according to claim 6,
The step of forming the touch panel sensor forms the first and second sensor electrodes of the touch panel sensor layer provided on one surface of the transparent base material, and at the same time forms the ITO transparent conductor layer directly on the transparent base material. Forming the ITO transparent conductor layer so that the peripheral wiring is formed on the ITO transparent conductor layer, and forming the terminal portion, and the connection side of the terminal portion and the peripheral wiring is formed on the ITO transparent conductor layer;
Forming a peripheral wiring so as to surround the periphery of the touch panel sensor layer on the transparent conductor layer;
A step of laminating an ITO transparent conductor layer on each wiring and covering a peripheral edge portion of each wiring terminal connecting portion; and thereafter, the transparent base material, the ITO transparent conductor layer, and a laminated structure portion and a laminated edge portion of each wiring. Coating with a protective layer,
A method for manufacturing a touch panel sensor substrate, comprising:

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