JP2013115059A - Fluorine-based resin film, laminate containing fluorine-based resin film and solar cell module - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a fluorine-based resin film having sufficient initial adhesive force and high optical durability.SOLUTION: In the fluorine-based resin film, a certain amount or less of CFbranch chain exists in the surface structure, and a certain amount or more of oxygen element and nitrogen element exists on the surface. More specifically, when the surface is measured byF-NMR, the value obtained by dividing an integral value I(-78) of detection peak of -78 ppm by an integral value I(-113) of detection peak of -113 ppm is 0.15 or less. When the surface is measured by X-ray photoelectron spectroscopy, the oxygen/carbon element ratio (O/C) is 0.1 or more, and the nitrogen/carbon ratio (N/C) is 0.03 or less.

Description

  The present invention relates to a fluorine-based resin film, and more particularly to a fluorine-based resin film having excellent adhesive strength over time. Moreover, it is related with the laminated body and solar cell module containing this fluororesin film.

  A thin film photovoltaic cell normally constitutes a solar cell module in a state where it is sealed between sealing members (protective layer) with a sealing material such as EVA resin. Specifically, a photoelectric conversion layer in which a plurality of solar cells are connected with an electric wire or the like between protective layers such as a front surface protective layer and a back surface protective layer is sandwiched between EVA resin films, and the entire module is vacuum laminated. In general, it is vacuum-produced by heating and press molding.

  As a member used as the protective layer, a fluorine-based resin such as PCTFE or ETFE is used. Since these fluororesins have low adhesiveness, it is necessary to ensure adhesiveness by providing an adhesive layer (primer layer) when the laminate is formed, or by subjecting the fluororesin to plasma treatment or corona treatment. was there.

  As a technique for performing plasma treatment on such a fluororesin, for example, it is disclosed in Patent Document 1, and an ETFE molded product is mixed in a mixed gas composed of an inert gas, a polymerizable unsaturated compound gas, and a carbon oxide gas. It is said that an ETFE molded article having excellent adhesion durability with respect to the boiling water test can be obtained by performing the discharge treatment with.

  On the other hand, as a technique for performing corona treatment on a fluorine-based resin, for example, Patent Document 2 discloses that fluorine that has been corona-treated on the surface of the fluorine-based resin while adjusting the oxygen gas concentration to 4 to 100 ppm in a nitrogen gas atmosphere. It is said that a laminated body excellent in storage stability can be obtained by laminating a base film and a cross-linked elastic adhesive.

Japanese Patent No. 3567165 Japanese Patent No. 4431843

  When the present inventors examined the adhesion durability of fluorine-based resin films such as ETFE, even if the fluorine-based resin films were processed by the methods described in Patent Documents 1 and 2, high reliability such as solar cells was obtained. It has been found that the problem is insufficient for the durability required for adhesion. In particular, the light durability becomes insufficient, and when a solar cell module provided in a fluorine-based resin layer is placed outdoors, the adhesive strength decreases as time passes and a new problem occurs that peeling occurs. I found

When the present inventors examined this problem, they found that the surface structure of the fluororesin film to be surface-treated greatly affects the adhesion durability. In particular, when the polymer constituting the fluororesin film has many CF ₃ branched chains, the surface treatment can increase the initial adhesive force, but the new finding that the light durability is significantly reduced has been obtained. .
Based on these findings, the surface structure of the fluororesin film was selected to have a certain amount of CF ₃ branched chain or less. However, depending on the surface treatment state, although the light durability is improved, the initial adhesive strength is insufficient. It became clear that.
This invention is made | formed in such a condition, and makes it a subject to provide the fluorine resin film which shows high initial adhesiveness and has high light durability.

As a result of intensive studies to solve the above problems, the present inventors have found that the amount of CF ₃ branched chain existing in the surface structure is not more than a certain amount and the amount of oxygen element existing on the surface is not less than a certain amount. The inventors have found that the problem can be solved by a fluorine-based resin film having a nitrogen element amount of a certain amount or less, and completed the present invention.
That is, in the present invention, when the surface is measured by ¹⁹ F-NMR, the integrated value I (−78) of the detection peak at −78 ppm at the MAS rotation number 16 kHz is the integrated value I (−113) of the detection peak at −113 ppm. The divided value is 0.15 or less, the oxygen / carbon element ratio (O / C) when the surface is measured by X-ray photoelectron spectroscopy is 0.1 or more, and the nitrogen / carbon ratio (N / C) ) Is 0.03 or less.

  Another aspect of the present invention is a resin laminate obtained by laminating the fluororesin film with another resin film, the fluororesin film is an ETFE film, and the other resin film is an EVA film. It is preferable that

  Another embodiment of the present invention is a solar cell module including the fluororesin film or a laminate.

  According to the present invention, it is possible to provide a fluororesin film having sufficient initial adhesive force and high light durability. Therefore, when it is used for a solar cell module as a laminate, the film can be prevented from being peeled off due to light damage even if it is exposed to the outdoors for a long time.

  In addition, the fluororesin film of the present invention has high durability even in a high temperature and high humidity environment, and in addition, it has high durability even in a condensation and freezing environment, which is a completely opposite environment. Therefore, it has excellent durability against not only light damage but also temperature change, and has properties suitable as an outer layer of the solar cell module.

The fluororesin film of the present invention has high light durability and sufficient initial adhesive strength. The fluororesin film having such properties is obtained by integrating the integral value I (−78) of the detection peak at −78 ppm at MAS rotational speed 16 kHz when the surface is measured by ¹⁹ F-NMR with the integration of the detection peak at −113 ppm. The value divided by the value I (−113) is 0.15 or less, and the oxygen / carbon element ratio (O / C) is 0.1 or more when the surface is measured by X-ray photoelectron spectroscopy. The present inventors have found that the nitrogen / carbon ratio (N / C) is 0.03 or less.

<Fluorine resin film>
The kind of the fluororesin film of the present invention is not particularly limited, and can be appropriately selected according to the use application of the laminate.
Specific examples include polytetrafluoroethylene (PTFE), tetrafluoroethylene-hexafluoropropylene copolymer (FEP), tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA), polychlorotrifluoroethylene (PCTFE). , Polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF), ethylene-tetrafluoroethylene copolymer (ETFE), ethylene-chlorotrifluoroethylene copolymer (ECTFE), and the like. Among them, polytetrafluoroethylene (PTFE), polychlorotrifluoroethylene (PCTFE), ethylene-tetrafluoroethylene copolymer (ETFE), ethylene-chlorotrifluoroethylene copolymer (without a fluorine-containing branched chain ( ECTFE) is preferred.
For outdoor use, ethylene-tetrafluoroethylene copolymer (ETFE), polytetrafluoroethylene (PTFE), polychlorotrifluoroethylene (PCTFE) and the like are preferable. In particular, when used for a solar cell module, ethylene-tetrafluoroethylene copolymer (ETFE), polytetrafluoroethylene (PTFE) and the like are preferable.
These resins can be used alone, and may be a fluorine-based resin film as a laminate using two or more kinds of resins.

<Branched chain structure on film surface>
The fluororesin film of the present invention is characterized in that the surface structure has substantially no fluorine-containing group, in particular, a branched chain containing CF ₃ . As a parameter representing such a property, in the fluororesin film of the present invention, the integrated value I (−78) of the detection peak at −78 ppm at a MAS rotation number of 16 kHz when the surface was measured by ¹⁹ F-NMR was − A value obtained by dividing the integrated value I (−113) of the detection peak at 113 ppm is used, and the value is 0.15 or less.

-78 ppm when measured by ¹⁹ F-NMR is a chemical shift value corresponding to the structure having a CF ₃ group of the fluororesin. On the other hand, −113 ppm as measured by ¹⁹ F-NMR is a chemical shift value corresponding to the CF ₂ group of the fluororesin. The degree of branching of the surface structure can be grasped by measuring and comparing the integrated values of the detected peaks at these two positions. The fluororesin film of the present invention has a structure in which the value obtained by dividing the above I (-78) of the surface structure by I (-113) is 0.15 or less.

When the value obtained by dividing I (−78) by I (−113) is 0.15 or less, the present inventors consider the reason why the light durability is high as follows.
First, as already described, the fluorine-based resin has low adhesion, and corona treatment or plasma treatment is performed in order to improve the adhesion. By these treatments, the oxygen-containing functional group such as a hydroxyl group, a carbonyl group, or a carboxyl group that contributes to improving the adhesion can be modified on the surface of the fluororesin. On the other hand, in each molecular chain of the polymer constituting the fluororesin, a bond near a branched chain containing fluorine such as CF ₃ is cut. In such a region where the polymer structure is cut, external energy (light) is applied, so that the region containing fluorine is likely to change over time to a more stable structure, and the generated adhesion structure is easily broken. The present inventors consider that Boundary Layer (hereinafter also referred to as WBL) has occurred. And since WBL will detach | leave easily from original fluororesin with an oxygen-containing functional group, and will transfer to the other laminated | stacked resin layer, the present inventors guess that light durability becomes very low.
Therefore, by not having a branched structure such as CF _{3 on} the surface of the fluororesin film, the generation of WBL is suppressed and the light durability of the fluororesin film is improved. In addition to the light durability, there is also an effect that the durability is improved in a high-temperature and high-humidity environment, and also in a condensation and freezing environment, which is a completely opposite environment.

  When the value obtained by dividing I (−78) by I (−113) exceeds 0.15, the surface structure is a structure having many branched chains containing fluorine, and the film laminate is peeled off by light damage. It becomes easy. The value is preferably 0.13 or less, and more preferably 0.10 or less. On the other hand, the lower limit is not particularly limited and is ideally zero, but is usually 0.001 or more, preferably 0.01 or more.

^The conditions for measuring the surface of the fluororesin film by ¹⁹ F-NMR are as follows.
First, the fluororesin film was finely cut, and the cut sample was packed in a ¹⁹ F background-free solid NMR dedicated sample tube and measured using a Varian NMR System 400WB (manufactured by Varian). The measurement conditions are as follows.
Apparatus: Varian NMR Systems 400WB manufactured by Varian
Probe: 4mm (CP / MAS T3 HX probe)
Observation nucleus: ¹⁹ F
Measurement method: Single pulse method
3-pulse method to reduce background signal (DEPTH method)
Resonance frequency: 376.22 MHz
90 ° pulse width: 5 μs
MAS rotation speed: 16 kHz
Wait time: 10 s
Spectrum width: 833.33 kHz
Measurement temperature: Room temperature integration count: 256 times In order to calculate the integrated intensity of each peak, a waveform separation process combining a Gaussian waveform and a Lorentz waveform was performed.

As the fluorine-based resin film of the present invention, a fluorine-based resin film satisfying the above-mentioned range and having substantially no fluorine-containing branched chain, particularly CF ₃ group, on the surface may be appropriately selected. Moreover, the fluororesin film satisfy | filling the said range can be manufactured by selecting a raw material suitably. Specifically, the fluorine-based resin film that does not have a branched chain containing fluorine on the surface uses a monomer that does not form a branched chain containing fluorine when polymerized, as a fluorine-containing monomer among the raw materials of the resin. Can be manufactured. For example, it can be produced by using only tetrafluoroethylene and / or chlorotrifluoroethylene, preferably only tetrafluoroethylene as the fluorine-containing monomer. Although it does not specifically limit as a copolymerization component, In order to set it as the structure which does not have the branched chain containing a fluorine on the surface of a fluorine-type resin film, ethylene is preferable. Moreover, it becomes easy to satisfy | fill the said range by selecting polytetrafluoroethylene as a fluorine resin film. Moreover, it becomes easy to satisfy | fill the said range also by shape | molding into the film which has ETFE on the surface using the coextrusion molding machine which has a multilayer die.

<Element amount on the film surface>
The fluororesin film of the present invention requires the presence of a certain amount of functional groups on the surface in order to ensure the initial adhesive force. As already described, since the fluorine-based resin has low adhesiveness, it is necessary to secure the adhesiveness by some means when forming a laminate. In addition, in the fluororesin film of the present invention, when the fluororesin that contributes to the surface structure of the fluororesin film is selected to have a CF ₃ branched chain of a certain amount or less, the light durability is improved, but the initial It became clear that the adhesive strength was insufficient.
Therefore, the fluorine-based resin film of the present invention has an oxygen / carbon element ratio (O / C) of 0.1 or more when the surface is measured by X-ray photoelectron spectroscopy, and a nitrogen / carbon ratio (N / C). ) Is 0.03 or less.

The oxygen / carbon element ratio (O / C) of the fluororesin film of the present invention is 0.1 or more, but preferably 0.18 or more. On the other hand, the upper limit is not particularly limited, but is preferably 0.26 or less, and more preferably 0.23 or less. When O / C is smaller than 0.1, the wettability on the surface of the fluororesin film is lowered, so that the adhesiveness with other resin layers when the laminate is formed is lowered, and the adhesiveness is easily deteriorated. . In addition, the basic durability tends to bleed out, so that the adhesion durability is likely to decrease. Further, when O / C is larger than 0.26, H ₂ O is likely to be concentrated at the interface in the wet heat cycle test and the high temperature and high humidity test, so that interface peeling is likely to occur and a basic additive is added. Since it becomes easy to bleed out, adhesion durability tends to decrease.

  The nitrogen-carbon ratio (N / C) of the fluororesin film of the present invention is 0.03 or less, but preferably 0.02 or less. On the other hand, the lower limit is not particularly limited, but is preferably 0.001 or more, and more preferably 0.002 or more. When N / C is smaller than 0.001, it is difficult to form a nitrogen-derived bond that contributes to improving the adhesiveness at the interface, so that the adhesion durability tends to decrease. On the other hand, when N / C is larger than 0.03, bleeding out of the basic additive added to improve the light durability is likely to occur, so that the adhesion durability is likely to be lowered.

In the present invention, the amount of elements on the film surface was measured by X-ray photoelectron spectroscopy (abbreviated as XPS or ESCA) using Quantum 2000 (manufactured by PHI). The measurement conditions are as follows.
・ X-ray source: Monochromatic Al-Ka, output 16kV-34W1 (X-ray generation area 170μmφ)
・ Charge neutralization: Combined use of electron gun (2μA) and ion gun (1V) ・ Spectroscopic system: Path energy
187.85 eV (wide spectrum)
58.70 eV (Narrow spectrum, N1s)
29.35 eV (Narrow spectrum, C1s, O1s, F1s)
11.75 eV (Narrow spectrum, C1s)
・ Pickup angle: 45 ° (from surface)
The elemental composition (at%) was calculated from the intensity of each narrow spectrum of C, O, and N obtained by XPS measurement under the above conditions. O / C and N / C were calculated from the calculated elemental composition of C, O, and N.

  Setting the amount of elements on the surface of the fluororesin film to the above range can be achieved by treating the surface of the fluororesin film. Specific examples include atmospheric pressure plasma treatment, corona treatment, glow treatment, RF bombardment treatment, ozone treatment, ultraviolet irradiation treatment, UV irradiation treatment, sputtering treatment, etching treatment, ion implantation method, and aerosol treatment. In addition, a method of laminating a film having a specific functional group on a fluororesin film, a coating having a specific functional group on the fluororesin film by spray coating, roll coating, dip coating, silk printing, die coating, etc. And a method of kneading a resin having a specific functional group on the fluororesin film itself.

  As the atmospheric pressure plasma treatment, there is a method of performing plasma treatment by selecting a specific gas type. The gas species is a gas composed of a mixture of an inert gas, a polymerizable unsaturated compound gas, a combustible gas, and a combustion-supporting gas. The role of the inert gas is to stabilize the discharge, remove the deteriorated fluororesin present on the very surface of the fluororesin film, activate the fluororesin film surface by suppressing the breakage of the polymer main chain, The reaction is caused by a saturated compound gas, a combustible gas or a carbon oxide gas.

Examples of the inert gas include nitrogen, argon gas, helium gas, neon gas, krypton gas, xenon gas, and radon gas, but helium gas and argon gas are particularly preferable, and argon gas is particularly preferable. Moreover, you may use the gas which mixed these, and the combination of helium gas and argon gas is especially preferable.
Examples of the polymerizable unsaturated compound gas include a compound gas having a double bond such as ethylene gas and propylene gas, and ethylene gas is preferable.
Examples of the combustible gas include a compound gas having a single bond such as hydrogen, ammonia, hydrogen sulfide, methane, ethane, and propane, and methane gas and hydrogen are particularly preferable.
Examples of the combustion-supporting gas include air, oxygen, ozone, chlorine, nitrogen monoxide, nitrogen dioxide, and hydrogen, with air and oxygen being particularly preferable.
As the carbon oxide gas, carbon dioxide and carbon monoxide are exemplified because of the role of effectively introducing oxygen-containing functional groups into the surface polymer, and in particular, carbon dioxide is a surface reactant that adheres firmly to the fluororesin. Is preferable.

  The plasma treatment may be performed using a plurality of gases selected from an inert gas, a polymerizable unsaturated compound gas, a hydrocarbon gas, a flammable gas, and a flammable gas. It is preferable to process using gas and carbon oxide gas.

  The surface-treated fluororesin film may be coated with an adhesive having oxygen and nitrogen-containing groups. The adhesive preferably has an oxygen-containing functional group such as a hydroxyl group or a carboxylic acid group, or a nitrogen-containing functional group such as an amine group or a cyanate group. Alternatively, a method may be used in which an adhesive having oxygen and nitrogen-containing groups is coated, and surface functional groups are grafted by plasma treatment. The adhesive preferably has an oxygen-containing functional group such as a hydroxyl group or a carboxylic acid group, or a nitrogen-containing functional group such as an amine group or a cyanate group.

Examples of corona treatment include a method in which a plurality of gas types are selected and subjected to corona treatment, such as oxygen-containing gas, nitrogen-containing gas, polymerizable unsaturated compound gas, hydrocarbon gas, air, oxygen, and ozone. Processing may be performed using a gas selected from a plurality of gases, carbon oxide gases, and the like.
Surface treatment methods using other gases include glow treatment, RF bombardment treatment, ozone treatment, ultraviolet irradiation treatment, UV irradiation treatment, sputtering treatment, etching treatment, ion implantation method, aerosol treatment, etc. Any method may be used as an energy source.
Moreover, you may use gas, a liquid, and a solid surface treatment agent as a surface treatment agent used for these surface treatment methods.
Gas surface treatment agents include oxygen, ozone, carbon dioxide, carbon monoxide, oxygen-containing gases such as methanol, sulfur dioxide, tetramethoxysilane, nitrogen, ammonia, nitrogen trifluoride, nitrogen dioxide, nitrous oxide, mono A plurality of gases selected from a nitrogen-containing gas such as nitrogen oxide, a polymerizable unsaturated compound gas such as ethylene and propylene, a hydrocarbon gas such as methane and ethane, air, and a carbon oxide gas may be used.
Liquid surface treatment agents include oxygen-containing functional groups such as hydroxyl groups, carboxyl groups, and carbonyl groups, and nitrogen-containing functional groups such as ammonia groups, cyanate groups, allophanate groups, biuret groups, urethane groups, and azo groups. Examples thereof include liquid, liquid polymerizable unsaturated compounds, and liquid hydrocarbon compounds. In particular, from the viewpoint of imparting a surface functional group excellent in adhesive strength, a carboxyl group and a hydroxyl group are preferable for the oxygen-containing functional group, and a cyanate group, an allophanate group, and a biuret group are preferable for the nitrogen-containing government and nausea. Moreover, you may mix and use these and may change a compounding quantity and the number of compounding species suitably by the process selected.
Preferred examples of the solid surface treatment agent include oxygen-containing functional groups, nitrogen-containing functional groups, polymerizable unsaturated compounds, and hydrocarbon compounds. In the treatment, powder is preferable, and the solvent may be diluted with a hydrocarbon compound such as toluene, xylene or acetone, water or the like.

  The fluorine-based resin film of the present invention has a Dyne test pen (hereinafter, also referred to as a dyne pen) manufactured by Machinetex Co., which evaluates the wettability of the surface, in addition to the above-mentioned range of the element amount on the film surface The dyne pen value is usually 40 or more, preferably 45 or more, and usually 70 or less. When the dyne pen value is 40 or more, the surface wettability of the fluororesin film tends to be high and the adhesiveness tends to be sufficient. The value of the dyne pen value can be adjusted by the plasma treatment or the corona treatment. On the other hand, if it is too high, the surface tends to become dirty, and the storage stability may be significantly reduced.

<Film production method>
If the fluororesin film of this invention satisfies the said requirements, the manufacturing method will not be limited. A production example of the fluororesin film of the present invention will be described by taking ETFE as an example.
ETFE can be obtained by copolymerizing ethylene and tetrafluoroethylene, but includes those obtained by copolymerizing other comonomer. Examples of other copolymerization monomers include fluoroolefins other than tetrafluoroethylene, olefins other than ethylene, vinyl monomers, polyol monomers and oligomers, epoxy monomers, and acrylic monomers.
Examples of fluoroolefins other than tetrafluoroethylene include C2-C3 fluoroolefins such as chlorotrifluoroethylene, hexafluoropropylene, vinylidene fluoride, and vinyl fluoride. Moreover, fluorovinyl monomers, such as (perfluoroalkyl) ethylene, are mentioned.
Examples of olefins other than ethylene include propylene and isobutylene.

  Examples of the vinyl monomer include vinyl ether, allyl ether, carboxylic acid vinyl ester, carboxylic acid allyl ester, and the like. Examples of vinyl ethers include cycloalkyl vinyl ethers such as cyclohexyl vinyl ether, alkyl vinyl ethers such as nonyl vinyl ether, 2-ethylhexyl vinyl ether, hexyl vinyl ether, ethyl vinyl ether, n-butyl vinyl ether, and t-butyl vinyl ether. Examples of allyl ethers include alkyl allyl ethers such as ethyl allyl ether and hexyl allyl ether. Examples of the carboxylic acid vinyl ester or the carboxylic acid allyl ester include vinyl esters or allyl esters of carboxylic acids such as acetic acid, butyric acid, pivalic acid, benzoic acid, and propionic acid. Moreover, as a vinyl ester of a carboxylic acid having a branched alkyl group, commercially available Veova-9, Veova-10 (both manufactured by Shell Chemical Co., Ltd., trade names) and the like may be used.

Examples of the polyol-based monomer and oligomer include polyester polyol, polycarbonate polyol, acrylic polyol, polycaprolactone polyol, polyether polyol, and fluorine-based polyol.
Examples of the epoxy monomer include ethylene glycol diglycidyl ether, trimethylolpropane triglycidyl ether, bisphenol A diglycidyl ether, and 1.4 butanediol diglycidyl ether.
Examples of the acrylic monomer include triethylene glycol dimethacrylate, alkoxylated neopentyl glycol diacrylate, lauryl acrylate, ethoxydiethylene glycol acrylate, 2-hydroxypropyl acrylate, and trimethylolpropane triacrylate.

The said copolymerization monomer may be used individually by 1 type, and may be used in combination of 2 or more type. Further, a monomer containing oxygen or a monomer containing nitrogen may be used in combination, and the amount of the surface element may be appropriately changed in the amount of the monomer containing oxygen and the monomer containing nitrogen.
The proportion of polymerized units based on tetrafluoroethylene in ETFE is preferably 20 to 70 mol%.

  ETFE obtained by copolymerization is formed into a film by extrusion molding, coextrusion molding, calendar molding, or the like. Then, in order to make surface element amount into a specific state, the fluorine-type resin film of this invention is obtained by performing a required process. As a treatment method, for example, ETFE pellets polymerized with a monomer containing no oxygen or nitrogen as a second copolymer component are mixed with pellets polymerized with a monomer containing oxygen or nitrogen as a second copolymer component. It may be tempered and film-formed. Alternatively, an ETFE film that uses a monomer that does not contain oxygen or nitrogen as the second copolymer component and a film that uses a monomer that contains oxygen or nitrogen as the second copolymer component may be bonded together. The film to be bonded is not limited to a film containing fluorine, and films such as polyethylene, polypropylene, polyester, polyester terephthalate, polycarbonate, and polymethyl methacrylate having necessary surface elements can be used. When bonding is performed at a high temperature, the functional groups on the surface may react in the atmosphere and the surface adhesion may be lowered. Therefore, it is preferable to bond the films at a low temperature using an adhesive.

<Laminated body>
Another aspect of the present invention is a resin laminate obtained by laminating the fluororesin film of the present invention with another resin film. The kind of other resin film laminated | stacked with the fluorine resin film of this invention is not specifically limited, For example, resin etc. which comprise an easily bonding process layer are mentioned. Moreover, when using as a surface layer of a solar cell module, it is preferable to comprise EVA and the laminated body which comprise the sealing layer of a solar cell element.

Moreover, when using as a surface layer of a solar cell module, you may laminate | stack with the layer which has various functions. Specifically, UV blocking, heat blocking, antifouling properties, hydrophilicity, hydrophobicity, antifogging properties, abrasion resistance, conductivity, antireflection, antiglare properties, light diffusion, light scattering, wavelength conversion, gas barrier properties And the like. In particular, a layer having an ultraviolet blocking function is preferable because it is exposed to strong ultraviolet rays from sunlight.
As a method for producing such a laminate, a layer having each function may be laminated on the fluororesin film of the present invention by coating or the like, or it may be made into a laminated sheet by coextrusion or inflation. Alternatively, the layers may be laminated by a method of laminating and pressing by lamination or pressing.

<Solar cell module>
Another aspect of the present invention is a solar cell module including the above-described fluororesin film or laminate. A general configuration of the solar cell module includes a surface protective layer, a sealing layer, a solar cell power generation member layer, a sealing layer, and a base material layer.
The fluorine resin film of the present invention can be used as a surface protective layer of a solar cell module.

<Surface protective layer>
The fluororesin film of the present invention is preferably used as a surface protective layer of a solar cell module. When used as the surface protective layer of the solar cell module, from the viewpoint of supplying a large amount of sunlight to the photoelectric conversion layer, the total light transmittance of the surface protective layer is 80% or more, preferably 90% or more. The measuring method of a total light transmittance is based on JISK7361-1, for example.

  When used as a surface protective layer, the thickness of the fluororesin film of the present invention is usually 0.02 mm or more. The thickness is preferably more than 0.03 mm, more preferably 0.05 mm or more. If it is less than 0.02 mm, the impact resistance as the surface protective layer is significantly reduced. On the other hand, the upper limit is not particularly limited, but is preferably 1 mm or less. If the resin becomes too thick, unevenness in the surface direction in the surface treatment tends to occur, and the flexibility of the resin layer decreases. Moreover, when it is set as the flexible type solar cell module which uses a board | substrate as a resin substrate, there exists a possibility of causing the weight increase of a module.

Moreover, in the solar cell module of this invention, you may provide a surface protection sheet further in the outer side (sunlight side) of a surface protection layer. In the present invention, it is preferable to provide a surface protective sheet in order to suppress damage and deterioration of the surface protective layer and maintain the total light transmittance. The material constituting the surface protective sheet is preferably a weather-resistant film, and commonly used known materials can be used.
Examples of the resin used as the material for the weather resistant film include ethylene-tetrafluoroethylene copolymer, silicone, polyethylene terephthalate, and polyamide. Among these, an ethylene-tetrafluoroethylene copolymer is preferable.
The thickness of the weather-resistant protective film is not particularly limited, but is usually 10 μm or more, preferably 20 μm or more, and usually 200 μm or less, preferably 150 μm or less.

  An adhesive layer may be provided between the surface protective sheet and the surface protective layer. The material of the adhesive layer is not particularly limited, but usually, for example, ethylene-vinyl acetate copolymer (EVA) resin, polyvinyl butyral (PVB) resin, modified polyethylene resin modified with maleic acid or silane, modified polypropylene resin, Light transmissive materials such as epoxy adhesives and urethane adhesives are used. The thickness of the adhesive layer is not particularly limited, but for example, a sheet shape of 200 to 500 μm is preferable.

<Solar cell power generation member layer>
The power generation member in the solar cell module includes a power generation element that converts sunlight into electricity and a power generation element base material for suppressing a change in shape of the power generation element. In addition, a gas barrier layer, a wavelength conversion layer, and a UV absorption layer may be laminated as necessary.

The power generation element is an element that generates power based on sunlight incident from the weathering layer side. The power generating element is not particularly limited as long as it can convert light energy into electric energy and can extract the electric energy obtained by the conversion to the outside.
As a power generation element, a power generation layer (photoelectric conversion layer, light absorption layer) is sandwiched between a pair of electrodes, a stack of a power generation layer and another layer (buffer layer, etc.) is sandwiched between a pair of electrodes, and so on. A plurality of such things connected in series can be used. Various layers can be adopted as the power generation layer, but a layer made of thin single crystal silicon, thin film polycrystalline silicon, amorphous silicon, microcrystalline silicon, spherical silicon, an inorganic semiconductor material, an organic dye material, or an organic semiconductor material It is preferable that By using these materials, a power generation efficiency is relatively high and a thin (light) power generation element can be realized. Further, from the viewpoint of increasing efficiency, a HIT type or a tandem type in which these are laminated may be used.

  When the power generation layer is a thin-film polycrystalline silicon layer, the power generation element is a type of element that uses indirect optical transition. Therefore, when the power generation layer is a thin-film polycrystalline silicon layer, in order to increase light absorption, a sufficient light confinement structure, such as a power generation element substrate described later, or a surface with an uneven structure is provided. Is preferred.

  When the power generation layer is an amorphous silicon layer, a solar cell element that has a large optical absorption coefficient in the visible region and can sufficiently absorb sunlight even with a thin film having a thickness of about 1 μm can be realized. Moreover, since amorphous silicon is an amorphous material, it is resistant to deformation. Therefore, when the power generation layer is an amorphous silicon layer, a particularly lightweight solar cell module having a certain degree of resistance to deformation can be realized.

When the power generation layer is an inorganic semiconductor material (compound semiconductor) layer, a power generation element with high power generation efficiency can be realized. From the viewpoint of power generation efficiency (photoelectric conversion efficiency), the power generation layer is preferably a chalcogenide-based power generation layer containing a chalcogen element such as S, Se, Te, etc. I-III-VI group 2 semiconductor system (chalcopyrite system) It is more preferable to set it as a power generation layer, and a Cu-III-VI group 2 semiconductor power generation layer using Cu as a group I element, particularly a CIS-based semiconductor [CuIn (Se _1-y S _y ) 2; 0 ≦ y ≦ 1 ] layer and a CIGS semiconductor _{[Cu (in 1-x Ga x} ) (Se 1-y S y) 2; 0 < be kept as x <1,0 ≦ y ≦ 1]] layer, preferred.

  Even if a dye-sensitized power generation layer composed of a titanium oxide layer and an electrolyte layer is employed as the power generation layer, a power generation element with high power generation efficiency can be realized, and an organic semiconductor layer (p-type semiconductor and n-type semiconductor) can be realized. A layer containing a semiconductor) can also be employed. In addition, as a p-type semiconductor which can comprise an organic-semiconductor layer, a purophylline compound such as tetrabenzoporphyrin, tetrabenzocopper porphyrin, tetrabenzozinc porphyrin; a phthalocyanine compound such as phthalocyanine, copper phthalocyanine, zinc phthalocyanine; a polycene of tetracene or pentacene; Examples include oligothiophenes such as sexithiophene and derivatives containing these compounds as a skeleton. Furthermore, examples of p-type semiconductors that can form the organic semiconductor layer include polymers such as polythiophene including poly (3-alkylthiophene), polyfluorene, polyphenylene vinylene, polytriallylamine, polyacetylene, polyaniline, polypyrrole, and the like. .

  In addition, n-type semiconductors that can constitute the organic semiconductor layer include fullerenes (C60, C70, C76); octaaporphyrins; perfluoro compounds of the above p-type semiconductors; naphthalenetetracarboxylic anhydrides, nafullerenetetracarboxylics. Examples thereof include aromatic carboxylic acid anhydrides such as acid diimide, perylene tetracarboxylic acid anhydride, and perylene tetracarboxylic acid diimide, and imide compounds thereof; and derivatives containing these compounds as a skeleton.

  Further, as a specific configuration example of the organic semiconductor layer, a bulk heterojunction type having a layer (i layer) in which a p-type semiconductor and an n-type semiconductor are phase-separated in the layer, and a layer (p layer) each including a p-type semiconductor. And a layered type (hetero pn junction type) in which layers containing an n-type semiconductor (n layer) are stacked, a Schottky type, and a combination thereof.

Each electrode of the power generation element can be formed using one or more arbitrary materials having conductivity. Examples of the electrode material (electrode constituent material) include metals such as platinum, gold, silver, aluminum, chromium, nickel, copper, titanium, magnesium, calcium, barium, sodium, and alloys thereof; indium oxide and tin oxide Metal oxides such as, or alloys thereof (ITO: indium tin oxide); conductive polymers such as polyaniline, polypyrrole, polythiophene, polyacetylene; acids such as hydrochloric acid, sulfuric acid, sulfonic acid, A material containing a dopant such as a Lewis acid such as FeCl ₃ , a halogen atom such as iodine, or a metal atom such as sodium or potassium; conductive particles such as metal particles, carbon black, fullerene, or carbon nanotubes, and a matrix such as a polymer binder And conductive composite materials dispersed in the material.

  The electrode material is preferably a material suitable for collecting holes or electrons. Examples of the electrode material suitable for collecting holes (that is, a material having a high work function) include gold and ITO. Examples of the electrode material suitable for collecting electrons (that is, a material having a low work function) include silver and aluminum.

  Each electrode of the power generation element may be substantially the same size as the power generation layer or may be smaller than the power generation layer. However, if the electrode on the light receiving surface side (weatherproof layer side) of the power generation element is relatively large (the area is not sufficiently small compared to the power generation layer area), the electrode should be The electrode should be a transparent (translucent) electrode, particularly an electrode having a relatively high transmittance (for example, 50% or more) of light having a wavelength that can be efficiently converted into electric energy by the power generation layer. Examples of transparent electrode materials include oxides such as ITO and IZO (indium oxide-zinc oxide); metal thin films, and the like.

  The thickness of each electrode of the power generation element and the thickness of the power generation layer can be determined based on the required output and the like. Further, an auxiliary electrode may be provided so as to be in contact with the electrode. In particular, it is effective when using a slightly conductive electrode such as ITO. As the auxiliary electrode material, the same material as the above metal material can be used as long as the conductivity is good, but silver, aluminum, and copper are exemplified.

  The power generation element substrate is a member on which one of the power generation elements is formed. Therefore, the power generating element base material is desired to have a relatively high mechanical strength, excellent weather resistance, heat resistance, chemical resistance, and the like, and lightweight. It is also desirable that the power generating element substrate has a certain degree of resistance against deformation. Therefore, it is preferable to employ a metal foil, a resin film having a melting point of 85 to 350 ° C., and some metal foil / resin film laminates as the power generation element substrate.

  Examples of the metal foil that can be used as the power generation element substrate (or its constituent elements) include foils made of aluminum, stainless steel, gold, silver, copper, titanium, nickel, iron, and alloys thereof. The resin film having a melting point of 85 to 350 ° C includes polyethylene, polypropylene, polystyrene, polyvinyl chloride, polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, polycarbonate, polyacetal, acrylic resin, polyamide resin, ABS resin, ACS resin. , AES resin, ASA resin, copolymers thereof, fluorine resin such as PVDF, PVF, silicone resin, cellulose, nitrile resin, phenol resin, polyurethane, ionomer, polybutadiene, polybutylene, polymethylpentene, polyvinyl alcohol, polyarylate, Examples thereof include films made of polyetheretherketone, polyetherketone, polyethersulfone and the like. The resin film used as the power generation element substrate may be a film in which glass fiber, organic fiber, carbon fiber, or the like is dispersed in the resin as described above.

  In addition, when the melting point of the resin film used as the power generation element base (or its constituent elements) is in the range of 85 to 350 ° C., the power generation element base does not deform and does not peel off from the power generation element. Therefore, it is preferable. Further, the melting point of the resin film used as the power generation element substrate (or its constituent elements) is more preferably 100 ° C. or higher, further preferably 120 ° C. or higher, and particularly preferably 150 ° C. or higher. Preferably, it is 180 ° C. or higher. The melting point of the resin film is more preferably 300 ° C. or less, further preferably 280 ° C. or less, and particularly preferably 250 ° C. or less.

  In the solar cell module of the present invention, when the thermoplastic resin layer and the power generation member are stacked in contact with each other, polyurethane or polyolefin is used as the thermoplastic resin, and among the power generation members in contact with the thermoplastic resin layer, the power generation element It is preferable to use polyethylene naphthalate, polyimide resin, or polyethylene terephthalate as the base material from the viewpoint of adhesion and strain absorption.

<Sealing layer>
The solar cell module has at least one sealing layer between the power generation member layer and the base material layer. By providing the sealing layer, the power generating element described above can be sealed, and impact resistance and the like can be imparted to the solar cell module.
The material laminated as the sealing layer is a resin material having a relatively high solar transmittance, such as polyethylene, polypropylene, ethylene-vinyl acetate copolymer (EVA), ethylene-methyl acrylate copolymer, ethylene. -Use polyolefin resin such as ethyl acrylate copolymer, propylene-ethylene-α-olefin copolymer, butyral resin, styrene resin, epoxy resin, (meth) acrylic resin, urethane resin, silicone resin, synthetic rubber, etc. One or more mixtures or copolymers of these can be used. Of these, EVA is preferable.

  The thickness of the sealing layer is preferably 100 μm or more, more preferably 200 μm or more, and further preferably 300 μm or more. On the other hand, it is preferably 1000 μm, more preferably 800 μm or less, and even more preferably 500 μm or less. By setting the thickness of the sealing layer within the above range, moderate impact resistance can be obtained, and it is preferable from the viewpoint of cost and weight, and power generation characteristics can be sufficiently exhibited.

  In addition to being laminated between the power generation member layer and the base material layer described above, the sealing layer is also laminated on the light receiving surface side of the power generation member layer, thereby contributing to the improvement in impact resistance of the power generation element. it can. In a solar cell module, the aspect by which a sealing layer is laminated | stacked so that the upper and lower sides of an electric power generation member layer may be pinched | interposed is preferable.

  An ultraviolet absorber may be added to the sealing layer of the solar cell module. Such ultraviolet absorbers can be used without particular limitation including those commercially available. Examples include benzophenone compounds, benzotriazole compounds, triazine compounds, and the like. When an ultraviolet absorber is added to the sealing layer, the amount is preferably 0.01% by weight or more, more preferably 0.05% by weight or more based on the total amount of the sealing layer. On the other hand, the content is preferably 1% by weight or less, more preferably 0.8% by weight or less, and particularly preferably 0.6% by weight or less. This is because if it is less than 0.01% by weight, it is difficult to exhibit the ultraviolet absorption effect, and if it exceeds 1% by weight, it causes bleeding out.

  Moreover, it is preferable that the said sealing layer contains a silane coupling agent. By including the silane coupling agent, the adhesion between the sealing layer and the layer in contact with the sealing layer is improved. Preferred examples of the silane coupling agent include those having an alkyl group as a functional group, and specific examples include an epoxy group, a methacryl group, and a vinyl group. The weight ratio of the sealing material to the silane coupling agent is preferably 0.1 to 2.0, more preferably 0.3 to 1.0, when the weight of the sealing material is 100. 0.5 to 0.7 is particularly preferable. By setting it as such a range, adhesiveness can be made suitable. The phrase “containing a silane coupling agent” here means adding or mixing the silane coupling agent to the sealing material, and adding or mixing the silane coupling agent to the thermoplastic resin in advance before stacking the solar cell module. It may be added, or may be added to or mixed with the sealing material during lamination.

  The thickness of the sealing layer is preferably 100 μm or more, more preferably 200 μm or more, and further preferably 300 μm or more. On the other hand, it is preferably 2000 μm, more preferably 1000 μm or less, and still more preferably 800 μm or less. By setting the thickness of the sealing layer within the above range, moderate impact resistance can be obtained, and it is preferable from the viewpoint of cost and weight, and power generation characteristics can be sufficiently exhibited.

<Base material layer>
The base material layer of the solar cell module may be any of metal, glass, synthetic resin, metal resin laminate, and nonwoven fabric. When the substrate is a flexible substrate, the substrate is preferably a resin film, a metal foil, or a metal resin laminate. When a synthetic resin is used as the base material, ethylene tetrafluoroethylene copolymer (ETFE), perfluoroalkoxy fluororesin (PFA), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), polychlorotrifluoroethylene (PCTFE), polycarbonate (PC), polyimide (PI), polystyrene (PS), polyethylene (PE), polypropylene (PP), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyamide (PA), polymethyl methacrylate (PMMA), polyvinyl chloride resin (PVC), and thermoplastic elastomer (TPO) are preferably polyolefin elastomers, polyester elastomers and the like, and are particularly good in mechanical properties and light resistance. Therefore, ETFE, PC, PV , TPO is desirable.

  Polyethylene, polypropylene, polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyamide 6, polyamide 66, etc. as interlayer resin between plate members made of aluminum, stainless steel, copper, titanium, iron, and alloys thereof as metal resin laminates A blend of these and a laminate of these copolymers are preferred. Further, these interlayer resins may contain inorganic compounds such as phosphate compounds, halogen compounds such as paraffin chloride, antimony oxide, antimony hydroxide, barium borate, glass fiber, aluminum hydroxide, sodium hydroxide. Alternatively, it may be foamed by some method.

  The nonwoven fabric is preferably made of synthetic resin such as polyester fiber, polypropylene fiber, glass cloth fiber, nylon fiber, cellulose fiber, carbon fiber, acrylic fiber, and may be a nonwoven fabric with a knitted structure, but it gives flexibility. For this purpose, a non-woven fabric impregnated with resin may be used.

<Other layers>
The solar cell module can be provided with other layers as required. Examples include a reinforcing layer, an electrical insulating layer, a gas barrier layer, an ultraviolet cut layer, a weather resistant protective layer, a scratch resistant layer, an antifouling layer, and the like.

<Method for manufacturing solar cell module>
Although the manufacturing method of the solar cell module of this invention can use a well-known method, for example, the surface protective layer, sealing layer, electric power generation member layer, sealing layer, base material layer etc. which are the fluorine resin films of this invention are used. A solar cell module can be obtained by disposing the multilayer sheet to be contained in a vacuum lamination apparatus, heating after vacuuming, and cooling after a predetermined time.

The heat laminating conditions are not particularly limited, and heat laminating is possible under normal conditions.
It is preferably performed under vacuum conditions, and the degree of vacuum is usually 30 Pa or more, preferably 50 Pa or more, more preferably 80 Pa or more. On the other hand, the upper limit is usually 150 Pa or less, preferably 120 Pa or less, more preferably 100 Pa or less. By setting it as the said range, since generation | occurrence | production of a bubble can be suppressed in each layer in a module, and productivity improves, it is preferable.
The vacuum time is usually 1 minute or longer, preferably 2 minutes or longer, more preferably 3 minutes or longer. On the other hand, the upper limit is usually 8 minutes or less, preferably 6 minutes or less, more preferably 5 minutes or less. Setting the vacuum time in the above range is preferable because the appearance of the solar cell module after heat lamination becomes good and the generation of bubbles in each layer in the module can be suppressed.

The pressurizing condition of the thermal laminate is usually a pressure of 50 kPa or more, preferably 70 kPa or more, more preferably 90 kPa or more. On the other hand, the upper limit value is preferably 101 kPa or less. By setting it as the pressurization conditions of the said range, since moderate adhesiveness can be acquired, without damaging a solar cell module, it is preferable also from a durable viewpoint.
The holding time of the pressure is usually 1 minute or longer, preferably 3 minutes or longer, more preferably 5 minutes or longer. On the other hand, the upper limit is usually 30 minutes or less, preferably 20 minutes or less, more preferably 15 minutes or less. By setting it as the said holding time, the function which protects the electric power generating element of a sealing layer can fully be exhibited, and sufficient adhesive strength can be obtained.

The temperature condition of the thermal laminate is usually 120 ° C. or higher, preferably 130 ° C. or higher, more preferably 140 ° C. or higher. On the other hand, the upper limit is usually 180 ° C. or lower, preferably 160 ° C. or lower, more preferably 150 ° C. or lower. By setting the temperature range, sufficient adhesive strength can be obtained.
Moreover, the heating time of the said temperature is 10 minutes or more normally, Preferably it is 12 minutes or more, More preferably, it is 15 minutes or more. On the other hand, the upper limit is 60 minutes or less, preferably 45 minutes or less, more preferably 30 minutes or less. By setting it as the said heating time, since durability of a sealing material is bridge | crosslinked moderately and it can have moderate softness | flexibility, it is preferable.

  The solar cell module of the present invention thus obtained has impact resistance that suppresses the destruction of solar cells despite being thin and lightweight, and also has a function that suppresses deflection and vibration. Therefore, it can be attached to automobiles such as trucks.

EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, it cannot be overemphasized that this invention is not limited only to such a specific aspect.
The following measurement methods were used for evaluation in the examples of the present invention.
<High temperature and high humidity test>
Using ES261 SH261, the test time was 100 hours at 85 ° C. and 85 rh%, and the change in peel strength before and after the test was measured.
<Light resistance test>
In accordance with JIS B7753, using a sunshine carbon arc lamp type weather resistance tester manufactured by Suga Co., Ltd., a light resistance test was conducted for 1000 hours under conditions of direct exposure to water and light, and changes in peel strength before and after the test were measured. did.

<Evaluation of wettability>
MachineTex Dyne Pen: JUMBO SURFACE TENSION TES
Using T PENS, the surface tension of the fluororesin surface was evaluated.
<Evaluation of occurrence of WBL>
Is a laminate of EVA and a fluororesin film produced in the same way as the surface element measurement method of a fluororesin film, peeled immediately and measured the amount of fluorine on the EVA, and is there a large amount of WBL? I confirmed.
<Peel test evaluation>
A laminate of EVA and a fluororesin film was subjected to a T-shaped peel test at 100 mm / min using an ORIENTEC tensile tester (ORIENTEC STA-1225).

<Example 1>
(Surface treatment of fluororesin film)
A 50 μm thick, A4-sized ethylene-tetrafluoroethylene copolymer (hereinafter referred to as ETFE) film (Nephron EF0050 manufactured by Daikin Corporation) has a gas composition of 100 mol of a mixed gas of argon gas and helium gas. On the other hand, a surface treatment is performed by performing a discharge treatment at 30 ° C. and atmospheric pressure in a mixed gas atmosphere having a composition of 1.0 mol of methane and 1.3 mol of carbon dioxide. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1 and the like.

(Method for producing laminate)
As the release film, ETFE surface-treated by the above method was used, and a 500 μm-thick ethylene-vinyl acetate copolymer (hereinafter referred to as EVA) sheet (CHI Kasei Co., Ltd., HFCE) was used as a 100 μm ETFE film ( It is sandwiched between Asahi Glass Co. and Aflex 100HK-DCS), and using a vacuum laminator made by NPC, heat lamination (vacuum degree 80 Pa, vacuum time 5 minutes, pressurization time 5 minutes, hold at 145 ° C. for 30 minutes. 20 minutes), and a specimen for a peel test was produced.
As a result of performing a light durability test on this surface-treated film, the peel strength after 1000 hours was 27.7 N / inch. The surface tension was 52 dyne / cm. The initial peel strength was 50.2 N / inch.

<Example 2>
A fluororesin film was obtained in the same manner as in Example 1 except that the discharge treatment in Example 1 was performed in twice the time. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 2. The initial peel strength was measured and found to be 48.6 N / inch.

<Example 3>
A fluororesin film was obtained in the same manner as in Example 1 except that the discharge treatment in Example 2 was performed in twice the time. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 2. Further, the initial peel strength was measured and found to be 51.2 N / inch.

<Example 4>
A fluororesin film was obtained in the same manner as in Example 1 except that the discharge treatment in Example 3 was performed in twice the time. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 2 etc. Further, when the initial peel strength was measured, it was 52.3 N / inch, and the surface tension was 52 dyne / cm. Moreover, it was 3.7 at% when the fluorine amount on EVA after peeling was measured.

<Example 5>
A fluororesin film was obtained in the same manner as in Example 4 except that an ETFE film having a width of 1000 mm was carried out by roll treatment. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1 and the like. Further, as a result of performing a light durability test on this surface-treated film, the peel strength after 1000 hours is 26.6 N / inch, and as a result of performing a high temperature and high humidity test, the peel strength after 100 hours is 49. .2N / inch. The surface tension was 54 dyne / cm. The initial peel strength was 49.8 N / inch.

<Comparative Example 1>
A fluororesin film was obtained in the same manner as in Example 1 except that surface-treated ETFE (Norton manufactured by Saint Gobain) having a thickness of 100 μm was used as the release film. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1. Moreover, as a result of performing a light durability test with respect to this surface treatment film, the peel strength after 1000 hours was 7.0 N / inch. The initial peel strength was 77.6 N / inch.

<Comparative example 2>
A fluororesin film was obtained in the same manner as in Example 1 except that ETFE (Aflex 100HK-DCS manufactured by Asahi Glass Co., Ltd.) having a plasma surface treatment with a thickness of 100 μm was used as the release film. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1 and the like. Further, as a result of performing a light durability test on this surface-treated film, the peel strength after 1000 hours is 12.0 N / inch. As a result of performing a high temperature and high humidity test, the peel strength after 100 hours is 72. 0.0 N / inch. The surface tension was 53 dyne / cm. The initial peel strength was 73.8 N / inch. Moreover, it was 31.2 at% when the fluorine amount on EVA after peeling was measured.

<Comparative Example 3>
A fluororesin film was obtained in the same manner as in Example 1 except that 100 μm-thick corona-treated ETFE (Aflex 100N-S manufactured by Asahi Glass Co., Ltd.) was used as the release film. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1 and the like. Moreover, as a result of performing a high-temperature, high-humidity test with respect to this surface treatment film, the peel strength after 100 hours was 15.0 N / inch. The initial peel strength was 31.6 N / inch.

<Comparative example 4>
A fluororesin film was obtained in the same manner as in Example 1 except that untreated ETFE having a thickness of 100 μm (Aflex 100N-NT manufactured by Asahi Glass Co., Ltd.) was used as the release film. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1. Further, when the initial peel strength was measured, it was 0.3 N / inch, and the surface tension was 32 dyne / cm.

<Comparative Example 5>
A fluororesin film was obtained in the same manner as in Example 1 except that untreated ETFE having a thickness of 100 μm (Nephron EF0050 manufactured by Daikin Corporation) was used as the release film. The surface of the obtained fluororesin film was measured by ¹⁹ F-NMR and XPS. The results are shown in Table 1. Further, when the initial peel strength was measured, it was 0.5 N / inch, and the surface tension was 32 dyne / cm.

  From Table 1, it can be understood that the fluororesin film of the present invention has sufficient initial peel strength and is excellent in light durability. Therefore, when used as an outer layer of a solar cell module exposed to an outdoor environment, a long-term reliable solar cell that does not peel off can be configured.

From Table 2, the fluororesin film of the present invention has a specific range of O / C and N / C, despite having substantially no branched chain containing fluorine on the surface, in particular, a CF ₃ group. It can be understood that a high initial peel strength is obtained.

  From Table 3, it can be understood that the fluorine-based resin film of the present invention has a low amount of surface fluorine when the film is peeled off and an extremely small WBL structure. Therefore, it can be understood that the light durability of the fluororesin film of the present invention is due to the very small WBL structure.

  From Table 4, the fluororesin film of the present invention also has durability under high temperature and high humidity. Therefore, it can be understood that the fluororesin film of the present invention has both light durability and high temperature and high humidity durability.

Claims (4)

When the surface was measured by ¹⁹ F-NMR, the value obtained by dividing the integrated value I (−78) of the detection peak of −78 ppm at the MAS rotation number of 16 kHz by the integrated value I (−113) of the detection peak of −113 ppm was 0. .15 or less,
Fluorine-based oxygen / carbon element ratio (O / C) of 0.1 or more and nitrogen / carbon ratio (N / C) of 0.03 or less when the surface is measured by X-ray photoelectron spectroscopy Resin film.   The resin laminated body formed by laminating | stacking the fluorine resin film of Claim 1 with another resin film.   The resin laminate according to claim 2, wherein the fluororesin film is an ETFE film and the other resin film is an EVA film.   A solar cell module comprising the fluororesin film according to claim 1 or the laminate according to claim 2 or 3.