JP2013114086A - Ips liquid crystal display panel and manufacturing method for the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an IPS liquid crystal display panel whose damage on a glass substrate is difficult to be viewed and which has the required display quality satisfied, and provide a manufacturing method for the same.SOLUTION: An IPS liquid crystal display panel P has liquid crystal 1 enclosed between two glass substrates 11 and 21 which are attached to each other. A base layer including a first layer 4 and a second layer 5 stacked, a transparent conductive film 6, and a polarizer 17 are sequentially stacked on a visible surface of one substrate 11 of the two substrates 11 and 21. The refractive index n1 of the first layer 4, the refractive index n2 of the second layer 5, and the refractive index n3 of the transparent conductive film 6 satisfy the relation of n2<n1<n3.

Description

  The present invention relates to an IPS liquid crystal display panel and a method for manufacturing the same, and more particularly to an IPS liquid crystal display panel obtained by subjecting a glass substrate to chemical polishing and a method for manufacturing the same.

In recent years, with the expansion of the market for portable terminals such as smartphones (high-performance mobile phones), there is an increasing need for downsizing and weight reduction of glass substrates of liquid crystal display devices, and thinning by chemical polishing is progressing. Compared with mechanical polishing, chemical polishing has the advantage that a plurality of substrates can be processed at the same time and the processing speed is high, and that the laminated glass substrate can be thinned to the limit.
However, in chemical polishing, scratches that originally existed on the substrate become obvious by the treatment with the polishing liquid, and are easily recognized as dimple-like scratches, and other scratches are generated, resulting in a deterioration in display quality. It is a problem to do. Therefore, various techniques have been proposed for making it difficult to visually recognize a flaw that becomes apparent by chemical polishing (see, for example, Patent Documents 1 and 2).

In the manufacturing method of the glass substrate for display of patent document 1, after immersing a bonded glass substrate in the hydrofluoric acid containing aqueous solution and carrying out chemical polishing, when the crack of a predetermined diameter is detected in an inspection process, A primer for improving adhesion and an ultraviolet curable resin are sequentially applied to the recess grooves, and then irradiated with ultraviolet rays and flattened with a scraper or the like.
Moreover, according to the chemical polishing liquid for glass substrates and the manufacturing method of a liquid crystal display device using the same of Patent Document 2, the growth of scratches on the glass surface is suppressed by controlling the composition of the chemical polishing liquid.

JP 2007-197236 A (paragraphs 0027 to 0040, FIGS. 1 and 4) Japanese Patent Laying-Open No. 2010-090018 (paragraphs 0010 to 0013, FIG. 1)

  However, according to the method for manufacturing a glass substrate for display described in Patent Document 1, the yield is improved, but the number of processes for filling the scratches is large, leading to a significant cost increase. In addition, in the chemical polishing liquid for glass substrate described in Patent Document 2 and the method of manufacturing a liquid crystal display device using the same, it is possible to suppress the growth of scratches to some extent, but the size of the scratches that are manifested by chemical polishing is as follows. It is difficult to optimize the etching conditions so that it is diverse and growth can be suppressed for all scratches.

The present invention has been made in view of the above circumstances, and an object thereof is to provide an IPS having a required display quality because it is difficult to visually recognize a scratch caused by chemical polishing or the like even on a glass substrate. It is to provide a liquid crystal display panel and a method for manufacturing the same.
Another object of the present invention is that an IPS type in which scratches caused by chemical polishing or the like are difficult to visually recognize can be easily implemented within the scope of the process equipment of a conventional IPS type liquid crystal display panel, without introducing new equipment separately. The object is to provide a method of manufacturing a liquid crystal display panel.

  The IPS liquid crystal display panel according to claim 1 is an IPS liquid crystal display panel in which liquid crystal is sealed between two glass substrates bonded to each other. The first layer film and the second layer film are laminated on the surface on one viewing side of the substrate on the viewing side, a base layer on which the first layer film and the second layer film are laminated, a transparent conductive film, and a polarizing plate are sequentially laminated. The refractive index n1 of the layer film, the refractive index n2 of the second layer film, and the refractive index n3 of the transparent conductive film are solved by n2 <n1 <n3.

As described above, since the base layer on which the first layer film and the second layer film are stacked, and the transparent conductive film are sequentially stacked, the reflectivity of the entire substrate surface on the viewing side is lowered, resulting in a dimple shape. The difference in reflectance between the scratched portion and the surrounding portion of the scratch is reduced, and the dimple-like scratch formed on the viewing-side substrate by chemical polishing becomes difficult to be visually recognized.
In addition, even when the substrate has not undergone chemical polishing, it is possible to make it difficult to visually recognize fine scratches present on the surface on the viewing side of the substrate.

The first layer film, the second layer film, and the transparent conductive film may be configured to be thin films of silicon nitride (SiN), silicon dioxide (SiO ₂ ), and indium tin oxide (ITO), respectively. Good.
If comprised in this way, the relationship of n2 <n1 <n3 can be satisfied about the refractive index n1 of a 1st layer film, the refractive index n2 of a 2nd layer film, and the refractive index n3 of a transparent conductive film. Moreover, since both silicon nitride and silicon dioxide are materials with little wavelength dependency of the refractive index, the average reflectance is reduced flatly over a wide wavelength range by using these materials. be able to.

Moreover, you may comprise so that the resistance value of the said transparent conductive film may be 200-500 ohm / sq.
If comprised in this way, in order to improve the display quality of a liquid crystal display panel, it can be set as an appropriate resistance value and transmittance | permeability, and the display quality of a liquid crystal display panel can be improved.

Moreover, you may comprise so that the thickness of said 1st layer film, said 2nd layer film, and said transparent conductive film may be 18-22 nm, 40-60 nm, and 15-19 nm, respectively.
If comprised in this way, a reflectance can be reduced to flat on the average over a wide wavelength range.

  According to the method of manufacturing an IPS type liquid crystal display panel according to claim 5, the problem is that the first substrate on the viewing side is bonded to the second substrate on the backlight side, and the bonded substrate is A step of creating, the base layer in which the first layer film and the second layer film are laminated on a surface on the viewing side of the first substrate, and the transparent conductive film. A step of sequentially laminating a film so that a refractive index n1, a refractive index n2 of the second layer film, and a refractive index n3 of the transparent conductive film satisfy n2 <n1 <n3; And the step of laminating the polarizing plates.

As described above, since the base layer on which the first layer film and the second layer film are stacked and the transparent conductive film are sequentially stacked, the reflectivity of the entire substrate surface on the viewing side is lowered, and the dimple-like scratches are reduced. The difference in reflectance between the portion and the portion around the scratch becomes small, and the dimple-like scratch formed on the substrate on the viewing side by chemical polishing becomes difficult to be visually recognized.
In addition, even when the substrate has not undergone chemical polishing, it is possible to make it difficult to visually recognize fine scratches present on the surface on the viewing side of the substrate.

At this time, a step of chemically polishing the bonded substrate with a chemical polishing liquid may be performed between the step of forming the bonded substrate and the step of forming the film.
Since it comprises in this way, the dimple-like damage | wound made on the visual recognition side board | substrate by chemical polishing can be made hard to be visually recognized.

According to the present invention, since the base layer on which the first layer film and the second layer film are stacked and the transparent conductive film are sequentially stacked, the reflectivity of the entire substrate surface on the viewing side is lowered, and the dimples are reduced. The difference in reflectance between the scratched portion and the surrounding portion of the scratch becomes small, and the dimple-like scratch formed on the viewing-side substrate by chemical polishing becomes difficult to be visually recognized.
In addition, even when the substrate has not undergone chemical polishing, it is possible to make it difficult to visually recognize fine scratches present on the surface on the viewing side of the substrate.

It is a schematic diagram which shows the cross-sectional structure of the IPS type | mold liquid crystal display panel which concerns on embodiment of this invention. FIG. 3 is a schematic cross-sectional view of a dimple-like scratch in a laminated body of a glass substrate, an optical multilayer film, an adhesive layer, and a polarizing plate according to an embodiment of the present invention. It is a flowchart which shows the manufacturing method of the IPS type | mold liquid crystal display panel which concerns on embodiment of this invention. It is explanatory drawing of a carousel type batch type sputtering device. It is explanatory drawing which shows an inline-type sputtering device. It is a graph which shows the relationship between the refractive index of the film | membrane which comprises an optical multilayer film, and a reflectance. It is a graph which shows the relationship between the thickness of the film | membrane which comprises an optical multilayer film, and a reflectance.

Hereinafter, embodiments of the present invention will be described with reference to FIGS. In addition, the structure demonstrated below does not limit this invention, Of course, it can change variously along the meaning of this invention.
The IPS liquid crystal display panel P of the present embodiment is a liquid crystal display panel according to an IPS (In-Plane-Switching) mode. The IPS mode is a method in which in an active matrix liquid crystal display device, display is performed by rotating a liquid crystal within a substrate plane by a horizontal electric field applied between a pair of comb electrodes provided on one substrate.
FIG. 1 is a schematic diagram showing a cross-sectional structure of an IPS liquid crystal display panel according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of a dimple-like scratch in a laminated body of a glass substrate, an optical multilayer film, an adhesive layer, and a polarizing plate according to an embodiment of the present invention. FIG. 3 is a flowchart showing a method for manufacturing the IPS liquid crystal display panel according to the embodiment of the present invention. FIG. 4 is an explanatory diagram of a carousel-type batch sputtering apparatus. FIG. 5 is an explanatory view showing an in-line type sputtering apparatus.

(IPS liquid crystal display panel P)
The IPS liquid crystal display panel P of the present embodiment is an IPS mode liquid crystal display panel, and as shown in FIG. 1, the color filter substrate 10 and the TFT substrate 20 are bonded together with the liquid crystal 1 sealed therein. Is formed.
In the color filter substrate 10, a color filter 13 arranged in a black matrix 12 is laminated on the surface of the glass substrate 11 on the liquid crystal 1 side that is the non-viewing side.
The surface on the opposite side of the liquid crystal 1 that is the viewing side of the glass substrate 11 has a maximum diameter of about several to several hundred μm, which is manifested by a chemical polishing step performed after the color filter substrate 10 and the TFT substrate 20 are bonded together. Many dimple-like scratches D are generated.
An alignment film 15 is further formed on the surface of the color filter substrate 10 on the liquid crystal 1 side.

On the surface of the color filter substrate 10 opposite to the liquid crystal 1, an optical multilayer film 3 is laminated to make it difficult to visually recognize the fine scratches D originally present on the substrate and the scratches D that have been revealed by chemical polishing. The optical multilayer film 3 is composed of three layers of a first layer 4 and a second layer 5 serving as a base layer and a transparent conductive film 6 for the purpose of preventing charging.
The first layer 4 is made of a material having a refractive index higher than that of the glass substrate 11 and has a refractive index of 1.65 to 1.90, silicon nitride (SiN), aluminum oxide (Al ₂ O ₃ ), Y ₂ O _3. (Yttrium oxide) or the like is used.
The second layer 5 is made of a material having a refractive index lower than that of the glass substrate 21, and silicon oxide (SiO ₂ ), MgF ₂ (magnesium fluoride) or the like having a refractive index of 1.35 to 1.5 is used. The refractive index ns of the glass substrate 21, the refractive index n1 of the first layer 4, the refractive index n2 of the second layer 5, and the refractive index n3 of the transparent conductive film 6 are configured to satisfy n2 <ns <n1 <n3. .

In the present embodiment, the first layer 4 is SiN having a thickness of 18 to 22 nm, the second layer 5 is SiO ₂ having a thickness of 40 to 60 nm, the transparent conductive film 6 is 15 to 19 nm in thickness, and a resistance value is 200 to 500 Ω / sq. Made of ITO (indium tin oxide). The transparent conductive film 6 can be adjusted to an appropriate resistance value of 200 to 500 Ω / sq by setting the thickness to 15 to 19 nm.
On the optical multilayer film 3, known polarizing plates 17 are sequentially laminated via an adhesive layer 7 for bonding the polarizing plate 17 and the transparent conductive film 6. The adhesive layer 7 has a thickness of about 1 μm, and the polarizing plate 17 has a thickness of 30 to 50 μm.

Based on FIG. 2, the mechanism by which the dimple-like scratch D on the glass substrate 11 becomes less visible will be described.
In a liquid crystal display panel that does not include the optical multilayer film 3, the scratch D appears to shine white when the viewing angle with respect to the incident light satisfies a specific relationship with respect to the surface of the glass substrate 11. Since the scratch D has a concave shape, there is a direction in which the reflected light of the incident light converges and is recognized as a point that shines when it matches the viewing direction.
In the present embodiment, the optical multilayer film 3, the adhesive layer 7, and the polarizing plate 17 are sequentially laminated on the glass substrate 11, and the dimple-shaped scratches D are the first layer 4 and the second layer that are sequentially laminated. 5, the transparent conductive film 6 and the adhesive layer 7 are layered, and the depressions due to the scratches D are filled and shallowed by the respective layers, and the surface of the polarizing plate 17 is substantially flat.

  In the IPS liquid crystal display panel P of the present embodiment, the optical multilayer film 3 is laminated on the glass substrate 11, so that the reflectance of the entire surface on the viewing side of the IPS liquid crystal display panel P is lowered and scratches D are visible. The degree is small. Although the optical multilayer film 3 does not affect the convergence direction of the reflected light, it is considered that the difference in reflectance between the scratch D and the surrounding area is reduced due to a decrease in the overall reflectance, and it becomes difficult to see.

  The TFT substrate 20 is formed by forming a comb-shaped transparent electrode 24 as a pixel electrode on the surface of the glass substrate 21 on the liquid crystal 1 side. An alignment film 25 is further formed on the surface of the TFT substrate 20 and the transparent electrode 24 on the liquid crystal 1 side, and the surface on the opposite side of the liquid crystal 1 that is the backlight side of the TFT substrate 20 is similar to the color filter substrate 10. A polarizing plate 27 is laminated via an adhesive layer 37.

(Manufacturing method of IPS type liquid crystal display panel P)
Next, a manufacturing method of the IPS type liquid crystal display panel P of the present embodiment will be described with reference to FIG.
First, the comb-shaped transparent electrode 24 is formed on the mother glass substrate of the glass substrate 21 by a known method, and the mother glass substrate of the TFT substrate 20 is prepared (step S1). On the other hand, the black matrix 12 and the color filter 13 are formed on the mother glass substrate of the glass substrate 11 by a known method, and the mother glass substrate of the color filter substrate 10 is prepared (step S2). In this embodiment, the mother glass substrate has a size of several hundred mm square or more, and the number of products of the IPS liquid crystal display panel P is several tens.

  Next, the alignment films 15 and 25 are printed on the mother glass substrates of the color filter substrate 10 and the TFT substrate 20 by a known method, and are baked and cured with infrared rays. The cured alignment films 15 and 25 are subjected to alignment treatment by rubbing or the like. Next, a sealing agent (not shown) is printed on the periphery of the mother glass substrate of the TFT substrate 20 by a known method, and the spacers 2 are dispersed and adhered to the entire surface of the mother glass substrate of the color filter substrate 10.

The mother glass substrate of the color filter substrate 10 and the TFT substrate 20 is positioned and bonded to each other by thermocompression bonding via a sealing agent (step S3), the sealing agent is cured, and the bonded substrate 30 of the mother glass substrate is fixed. obtain.
Next, the bonded substrate 30 is dipped in a chemical polishing aqueous solution containing a known hydrofluoric acid, and the outer surfaces of the glass substrates 11 and 21 are chemically polished by a known method (step S4). In this chemical polishing, the glass substrates 11 and 21 are thinned so that the thickness of the IPS liquid crystal display panel P is about 0.4 mm or the like required as a product.
At this time, the fine scratches existing on the glass substrates 11 and 21 are enlarged by chemical polishing, and dimple-shaped scratches D are generated on the glass substrates 11 and 21.

Next, the optical multilayer film 3 is formed on the glass substrate 11 (step S5). This step is performed in order to make the dimple-like scratch D generated in step S4 less visible.
In this step, first, the laminated substrate 30 is alkali-cleaned by a known method.
Thereafter, the optical multilayer film 3 is formed by using a vertical cylindrical carousel type batch type sputtering apparatus 40 shown in FIG.

Two Si targets 41 and one ITO target 42 are set in the sputtering apparatus 40. The target dimension may be anything corresponding to the glass substrate 21.
Next, the bonded substrate 30 is set on the substrate holder 43 of the sputtering apparatus 40, and the inside of the sputtering apparatus 40 is exhausted. When the inside of the sputtering apparatus 40 reaches a predetermined degree of vacuum, the rotation of the substrate holder 43 is started, the Si target 41 is used, N ₂ gas is introduced, and the first layer 4 made of SiN is formed by reactive sputtering. Form a film. Next, using the Si target 41, CO ₂ or O ₂ is introduced, and the second layer 5 made of SiO _{2 is formed} by reactive sputtering.
Thereafter, using the ITO target 42, the transparent conductive film 6 made of ITO is formed by sputtering.
A pulse DC power source is used for the first layer 4 and the second layer 5, and a DC power source is used for the transparent conductive film 6, and the film forming temperature is 70 ° C. or lower.
After the optical multilayer film 3 is formed, an appearance inspection is performed in an inspection process, and the film formation process in step S5 is completed.

In this embodiment, the carousel-type batch-type sputtering apparatus 40 is used. However, any of the batch-type and in-line-type film formation apparatuses can be used as long as films of three kinds of materials can be stacked. . For example, an in-line type sputtering apparatus 40 ′ shown in FIG. 5 may be used.
The sputtering apparatus 40 ′ in FIG. 5 shows a typical target arrangement of an apparatus capable of double-side film formation. In the case of the present invention, the Si target 41 ′ (two places) is installed in the optical adjustment film forming chamber CH-3, the ITO target 42 ′ is installed in the ITO film forming chamber CH-5, and the bonded substrate 30 is attached to the substrate holder 43 ′. The first and fourth layers 4 and 5 are formed in the optical adjustment film forming chamber CH-3, and the transparent conductive film 6 is formed in the ITO film forming chamber CH-5.

Next, the liquid crystal 1 is injected from the injection port into the bonding substrate 30 of the mother glass substrate (step S6). In the present embodiment, the liquid crystal 1 is injected after the bonded substrate is cut. However, in the case of ODF (Liquid Crystal Drop Method, One Drop Fill), the liquid crystal 1 is not the substrate in step S6 but the substrate in step S3. Inject at the time of bonding.
When the liquid crystal 1 is injected, the injection port is sealed using an ultraviolet curable adhesive, and the sealing agent is cured by irradiating ultraviolet rays. Thereafter, adhesive layers 7 and 37 are laminated on the upper surface of the color filter substrate 10 and the lower surface of the TFT substrate 20, respectively, and then polarizing plates 17 and 27 are formed on the upper surface of the color filter substrate 10 and the lower surface of the TFT substrate 20, respectively. (Step S7) and cut into a predetermined size (step S8) to complete the IPS liquid crystal display panel P.

By making various changes to the composition, film thickness, and refractive index of the optical multilayer film 3, an IPS type liquid crystal display panel P was produced, and the dimple-like scratches D were difficult to see. The examination examples 1 and 2 confirmed and verified will be described below.
(Test Example 1)
According to the manufacturing method of the IPS type liquid crystal display panel P described above, the IPS type liquid crystal display panel P according to Example 1 and Comparative Examples 1 to 4 is prepared so that the composition and film thickness of the optical multilayer film 3 are as shown in Table 1. did.

For the IPS type liquid crystal display panels P of Examples 1 to 1 to 4 that were produced, the appearance of the dimple-like scratch D was evaluated in three stages: ○, Δ, and ×.
When the angle of the IPS type liquid crystal display panel P is appropriately changed under a white fluorescent lamp, the scratch D shines white and the contour of the scratch D can be clearly recognized. The case where the outline of the image was blurred and difficult to see was evaluated as Δ, and the case where the scratch D could not be recognized or was hardly noticed even if it was recognized was evaluated as ○.

  As a result, as shown in Table 1, in Example 1, the scar D was not recognized, or even if it could be recognized, it was hardly anxious, and it was an evaluation of ◯, whereas in Comparative 1-4, The scratch D was shining white and was evaluated as Δ or ×.

(Examination example 1)
For the purpose of confirming the visual results in Table 1 by simulation, the reflectances of the laminates of Example 1, Comparative Example 1 and Comparative Example 4 in Table 1 were calculated in the wavelength range of visible light. At this time, ITO; 1.924, SiO ₂ ; 1.479, SiN; 1.846, Nb ₂ O ₅ ; 2.28 was adopted as a representative value of the refractive index of each substance at a wavelength of 550 nm.

A result is shown in the graph which shows the relationship between the refractive index of the film | membrane which comprises the optical multilayer film of FIG. 6, and a reflectance.
From the result of FIG. 6, when the combination of the refractive indexes of the films constituting the optical multilayer film 3 becomes medium refractive index, low refractive index, and high refractive index from the substrate side as in the first embodiment, that is, the first When the refractive index n1 of the layer 4, the refractive index n2 of the second layer 5, and the refractive index n3 of the transparent conductive film 6 satisfy n2 <n1 <n3, the first layer 4 and the second layer 5 are not provided. In contrast, it was confirmed that the reflectance decreased in almost all wavelength regions.

On the other hand, when the combination of the refractive indexes of the films constituting the optical multilayer film 3 becomes a high refractive index, a low refractive index, and a medium refractive index from the substrate side, as in Comparative Example 1, that is, the first layer 4 When the refractive index n1, the refractive index n2 of the second layer 5, and the refractive index n3 of the transparent conductive film 6 satisfy n2 <n3 <n1, the contrast 4 with the first layer 4 and the second layer 5 is not provided. Although the average reflectance in the entire wavelength region was lowered, the reflectance in the long wavelength region was considerably higher than that in Example 2.
From the use of a display panel, the reflectance is required to be a low average value in the entire wavelength range, and therefore it was found that the proportionality 1 does not correspond to the needs of the product.

(Examination example 2)
In order to set the film thickness range in which the reflectance is sufficiently lowered, the film thicknesses of the first layer 4, the second layer 5, and the transparent conductive film 6 are changed with the film thickness of each layer of Example 1 as the center value. The reflectance was calculated by simulation. Although each case is included in the scope of the present invention, it is regarded as approximate examples 1 to 6 in a position of slightly deviating from the example 1 where the maximum effect is obtained. The control was a proportional 4 of the single layer of the transparent conductive film 6 not including the first layer 4 and the second layer 5.
Specific film thicknesses are shown in Table 2.

  A result is shown in the graph regarding the relationship between the thickness of the film | membrane which comprises the optical multilayer film of FIG. 7, and a reflectance. Table 3 shows the average values, maximum values, minimum values, and maximum-minimum values of the reflectances of Examples 1, Approximation Examples 1 to 6, and Comparative Example 4 at wavelengths of 450 to 700 nm.

From the results of FIG. 7 and Table 3, as compared with the proportionality 4 not including the first layer 4 and the second layer 5, in all the examples and approximate examples, a decrease in the reflectance is observed. It was found that the reflectance is lowered by providing the second layer 5.
Further, in Example 1 and Approximation Examples 1 to 4, the reflectance was sufficiently lowered in the entire wavelength region. In the approximate examples 5 and 6, the reflectance exceeded 13% in the wavelength region near the wavelength of 400 to 410 nm, but the reflectance was sufficiently lowered in the wavelength region of 450 to 700 nm.
From the above, it was found that when the first layer 4 is in the range of 15 to 22 nm and the second layer 5 is in the range of 45 to 60 nm, a sufficient decrease in reflectance can be obtained.

D scratch P IPS type liquid crystal display panel CH-3 optical adjustment film forming chamber CH-5 ITO film forming chamber 1 liquid crystal 2 spacer 3 optical multilayer film 4 first layer 5 second layer 6 transparent conductive films 7 and 37 adhesive layer 10 Color filter substrate 11, 21 Glass substrate 12 Black matrix 13 Color filter 24 Transparent electrode 15, 25 Alignment film 17, 27 Polarizing plate 20 TFT substrate 30 Bonded substrate 40, 40 ′ Sputtering device 41, 41 ′ Si target 42, 42 ′ ITO target 43, 43 'Substrate holder

Claims (6)

An IPS liquid crystal display panel in which liquid crystal is sealed between two glass substrates bonded together,
An underlayer in which a first layer film and a second layer film are laminated, a transparent conductive film, and a polarizing plate are sequentially formed on the surface on the viewing side of one of the two substrates that is on the viewing side. Laminated,
The IPS liquid crystal display panel according to claim 1, wherein a refractive index n1 of the first layer film, a refractive index n2 of the second layer film, and a refractive index n3 of the transparent conductive film satisfy n2 <n1 <n3. 2. The first layer film, the second layer film, and the transparent conductive film are thin films of silicon nitride (SiN), silicon dioxide (SiO ₂ ), and indium tin oxide (ITO), respectively. The IPS type liquid crystal display panel described.   3. The IPS liquid crystal display panel according to claim 1, wherein the transparent conductive film has a resistance value of 200 to 500 [Omega] / sq.   4. The IPS type according to claim 1, wherein thicknesses of the first layer film, the second layer film, and the transparent conductive film are 18 to 22 nm, 40 to 60 nm, and 15 to 19 nm, respectively. LCD display panel. A method for manufacturing the IPS liquid crystal display panel according to claim 1,
Bonding the first substrate on the viewing side and the second substrate on the backlight side to create the bonded substrate;
The base layer on which the first layer film and the second layer film are laminated on the surface on the viewing side of the first substrate, and the transparent conductive film, the refractive index n1 of the first layer film, the A step of sequentially laminating the film so that the refractive index n2 of the second layer film and the refractive index n3 of the transparent conductive film satisfy n2 <n1 <n3;
And a step of laminating the polarizing plate on the transparent conductive film. A method for producing an IPS type liquid crystal display panel. 6. The IPS liquid crystal display according to claim 5, wherein a step of chemically polishing the bonded substrate with a chemical polishing liquid is performed between the step of forming the bonded substrate and the step of forming the film. Panel manufacturing method.

Images