CN103576377A - Color film substrate and display device provided with same - Google Patents
Color film substrate and display device provided with same Download PDFInfo
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- CN103576377A CN103576377A CN201310537960.7A CN201310537960A CN103576377A CN 103576377 A CN103576377 A CN 103576377A CN 201310537960 A CN201310537960 A CN 201310537960A CN 103576377 A CN103576377 A CN 103576377A
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- membrane substrates
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Abstract
The invention provides a color film substrate and a display device provided with the same. The color film substrate comprises a substrate, a black matrix, a color resin unit and a first transparent antireflective film, wherein the black matrix is formed on one side of the substrate; the color resin unit is formed on the black matrix; the first transparent antireflective film is formed on the color resin unit; and the refractive index of the first transparent antireflective film is larger than a first predetermined refractive index. According to the color film substrate, the reflectivity of the surface of the color film substrate to light can be reduced.
Description
Technical field
The present invention relates to display technique field, relate in particular to a kind of color membrane substrates and there is the display device of this color membrane substrates.
Background technology
Please refer to Fig. 1, the structural representation that Fig. 1 is existing color membrane substrates.As can be seen from Figure 1, existing color membrane substrates 102 mainly comprises: substrate 1021, tin indium oxide (ITO) electrode layer 1022, black matrix (BM) 1023, color resin (R/G/B) layer 1024, protective seam 1025 and cylindrical spacer (PS) 1026.Wherein, the refractive index of color resin unit 1024 and protective seam 1025 is lower, stronger to reflection of light ability.
Please refer to Fig. 2, Fig. 2 is the light path schematic diagram in existing liquid crystal indicator, the incident light 201 that the backlight of liquid crystal indicator sends sees through the final arrival human eye of transmitted light 202 after array base palte 101, liquid crystal (scheming not shown) and color membrane substrates 102 successively, thereby has realized picture disply.Because the surface of existing color membrane substrates 102 has higher reflecting properties to incident light 201, the reflected light 203 forming through color membrane substrates 102 surfaces can be irradiated to the upper photogenerated current that produces of grid line, data line or thin film transistor (TFT) (TFT) of array base palte 101, the photogenerated current producing can affect the electric capacity of thin film transistor (TFT), thereby affects the characteristic of thin film transistor (TFT).
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of color membrane substrates and has the display device of this color membrane substrates, to reduce color membrane substrates surface to reflection of light ability.
For solving the problems of the technologies described above, the invention provides a kind of color membrane substrates, comprise: substrate, be formed at the black matrix of described substrate one side, be formed at the color resin unit on described black matrix, be formed at the first transparent antireflective film on described color resin unit, the refractive index of described the first transparent antireflective film is greater than the first predetermined refraction.
Preferably, described the first transparent antireflective film is directly formed on described color resin unit as the protective seam of described color resin unit simultaneously.
Preferably, described color membrane substrates also comprises: be formed at the protective seam between described color resin unit and described the first transparent antireflective film.
Preferably, described color membrane substrates also comprises:
Be formed at the second transparent antireflective film between described color resin unit and described protective seam, the refractive index of described the second transparent antireflective film is greater than the second predetermined refraction.
Preferably, described the second predetermined refraction is more than or equal to 1.5.
Preferably, described the second transparent antireflective film adopts silicon dioxide, titania or hafnium oxide to make.
Preferably, described the first transparent antireflective film adopts silicon dioxide, titania or hafnium oxide to make.
Preferably, described the first predetermined refraction is more than or equal to 1.5.
Preferably, described color membrane substrates also comprises: the electrode layer that is formed at described substrate opposite side.
The present invention also provides a kind of display device, comprises above-mentioned color membrane substrates.
The beneficial effect of technique scheme of the present invention is as follows:
In the present invention, on color membrane substrates, increased the transparent antireflective film of high index of refraction, when the light of backlight sees through the array base palte of the liquid crystal indicator that uses this color membrane substrates and liquid crystal and is irradiated to color membrane substrates surface, can be more much lower than using the intensity of reflected light of traditional color membrane substrates to the intensity of reflected light on grid line, data line or the thin film transistor (TFT) of array base palte through this color membrane substrates surface reflection, thus the impact on film transistor device characteristic of the photogenerated current that causes due to reflected light can be reduced.
Accompanying drawing explanation
Fig. 1 is the structural representation of existing color membrane substrates;
Fig. 2 is the light path schematic diagram in existing liquid crystal indicator;
Fig. 3 is the structural representation of the color membrane substrates of the embodiment of the present invention one;
Fig. 4 is the structural representation of the color membrane substrates of the embodiment of the present invention two;
Fig. 5 is the structural representation of the color membrane substrates of the embodiment of the present invention three;
Fig. 6 is preparation method's schematic diagram of the color membrane substrates of the embodiment of the present invention two;
Fig. 7 is the light path schematic diagram in the display device of the embodiment of the present invention.
Embodiment
In the embodiment of the present invention, on color membrane substrates, increased the transparent antireflective film of high index of refraction, when the light of backlight is irradiated to this color membrane substrates surface, can reduce color membrane substrates surface to reflection of light ability, thereby the reflected light of avoiding forming through color membrane substrates surface can be irradiated on grid line, data line or the thin film transistor (TFT) of array base palte and produce photogenerated current, affects the characteristic of thin film transistor (TFT).
For making the technical problem to be solved in the present invention, technical scheme and advantage clearer, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
Please refer to Fig. 3, Fig. 3 is the structural representation of the color membrane substrates of the embodiment of the present invention one.
The color membrane substrates of the present embodiment comprises: substrate 301, be formed at the electrode layer 302 of described substrate 301 1 sides, and be formed at the black matrix 303 of described substrate 301 opposite sides, be formed at the color resin unit 304 on described black matrix 303.
Wherein, color resin unit 304 adopts such as red/green/color resin materials such as blue (R/G/B) and makes, its refractive index is lower, stronger to reflection of light ability, in order to reduce by 304 pairs of color resin unit reflection of light ability, color membrane substrates in the embodiment of the present invention can also comprise: be formed at the first transparent antireflective film 305 on described color resin unit 306, the refractive index of described the first transparent antireflective film 305 is greater than predetermined refraction.Described the first transparent antireflective film 305 can adopt the materials such as silicon dioxide (SiO2), titania (TiO2) or hafnium oxide (HfO2) to make.Described the first predetermined refraction can be more than or equal to 1.5.
In the present embodiment, described the first transparent antireflective film 305 is directly formed on described color resin unit 304, when reducing the reflection potential of color resin unit 304, also as the protective seam of described color resin unit 304.
In addition,, in order to maintain the box thick (cell gap) of the liquid crystal cell at color membrane substrates place, the color membrane substrates in the embodiment of the present invention can also comprise: be formed at the chock insulator matter 306 on described the first transparent antireflective film 305.In the present embodiment, described chock insulator matter 306 is cylindrical spacer.Certainly, in other embodiments of the invention, described color membrane substrates also can not comprise chock insulator matter, and chock insulator matter also can be arranged on the array base palte being oppositely arranged with color membrane substrates.
The color membrane substrates providing by above-described embodiment, on the color resin unit 304 of color membrane substrates, increase the first transparent antireflective film 305 of one deck high index of refraction, to reduce color membrane substrates surface to reflection of light ability, thereby the reflected light of avoiding forming through color membrane substrates surface can be irradiated on grid line, data line or the thin film transistor (TFT) of array base palte and produce photogenerated current, affects the characteristic of thin film transistor (TFT).
Please refer to Fig. 4, Fig. 4 is the structural representation of the color membrane substrates of the embodiment of the present invention two.
The color membrane substrates of the present embodiment comprises: substrate 301; be formed at the electrode layer 302 of described substrate 301 1 sides; be formed at the black matrix 303 of described substrate 301 opposite sides, be formed at the color resin unit 304 on described black matrix 303, be formed at the protective seam 307 on described color resin unit 304.
Wherein, color resin unit 304 adopts such as red/green/color resin materials such as blue (R/G/B) and makes; protective seam 307 adopts transparent resin material to make conventionally; both refractive indexes are all lower; stronger to reflection of light ability; in order to reduce by 307 pairs of reflection of light abilities of color resin unit 304 and protective seam; color membrane substrates in the embodiment of the present invention can also comprise: be formed at the first transparent antireflective film 305 on described protective seam 307, the refractive index of described the first transparent antireflective film 305 is greater than predetermined refraction.Described the first transparent antireflective film 305 can adopt the materials such as silicon dioxide, titania or hafnium oxide to make.Described predetermined refraction can be for being more than or equal to 1.5.
In addition, thick in order to maintain the box of liquid crystal cell at color membrane substrates place, the color membrane substrates in the embodiment of the present invention can also comprise: be formed at the chock insulator matter 306 on described the first transparent antireflective film 305.In the present embodiment, described chock insulator matter 306 is cylindrical spacer.Certainly, in other embodiments of the invention, described color membrane substrates also can not comprise chock insulator matter, and chock insulator matter also can be arranged on the array base palte being oppositely arranged with color membrane substrates.
The color membrane substrates providing by above-described embodiment; on the protective seam 307 of color membrane substrates, increase the first transparent antireflective film 305 of one deck high index of refraction; to reduce color membrane substrates surface to reflection of light ability; thereby the reflected light of avoiding forming through color membrane substrates surface can be irradiated on grid line, data line or the thin film transistor (TFT) of array base palte and produce photogenerated current, affects the characteristic of thin film transistor (TFT).
Please refer to Fig. 5, Fig. 5 is the structural representation of the color membrane substrates of the embodiment of the present invention three.
The color membrane substrates of the present embodiment comprises: substrate 301; be formed at the electrode layer 302 of described substrate 301 1 sides; be formed at the black matrix 303 of described substrate 301 opposite sides, be formed at the color resin unit 304 on described black matrix 303, be formed at the protective seam 307 on described color resin unit 304.
Wherein, color resin unit 304 adopts such as red/green/color resin materials such as blue (R/G/B) and makes, protective seam 307 adopts transparent resin material to make conventionally, both refractive indexes are all lower, stronger to reflection of light ability, in order to reduce by 307 pairs of reflection of light abilities of color resin unit 304 and protective seam, color membrane substrates in the embodiment of the present invention can also comprise: be formed at the second transparent antireflective film 308 between described color resin unit 304 and described protective seam 307, and be formed at the first transparent antireflective film 305 on described protective seam 307, the refractive index of described the first transparent antireflective film 305 is greater than the first predetermined refraction.The refractive index of described the second transparent antireflective film 308 is greater than the second predetermined refraction, and described the first predetermined refraction can equate with the second predetermined refraction, also can be unequal.Described the first predetermined refraction and described the second predetermined refraction can be for being more than or equal to 1.5.Described the first transparent antireflective film 305 and described the second transparent antireflective film 308 can adopt the materials such as silicon dioxide, titania or hafnium oxide to make.Described the first transparent antireflective film 305 and the second transparent antireflective film 308 can adopt identical material, also can adopt different materials.
In addition, the structure of color membrane substrates of the present invention is also not limited to the structure described in above-described embodiment.
Please refer to Fig. 6, Fig. 6 is preparation method's schematic diagram of the color membrane substrates of the embodiment of the present invention two.
The preparation method of described color membrane substrates comprises the following steps:
Step 601 a: substrate 301 is provided;
Step 602: at side sputter one deck conducting film of substrate 301, form conductive layer 302;
Step 603-605: the opposite side at substrate 301 adopts the method for coating, exposure, development to form successively black matrix 303, color resin unit 304 and protective seam 307;
Step 606: adopt the method for sputter to there is the first transparent antireflective film 305 of high index of refraction and high permeability at protective seam 307 surface deposition one decks;
Step 607: adopt the method for coating, exposure and development to prepare cylindrical spacer 306.
The embodiment of the present invention also provides a kind of display device, comprises color membrane substrates and array base palte, and described color membrane substrates is the color membrane substrates in above-mentioned any embodiment.
Please refer to Fig. 7, the light path schematic diagram in the display device of Fig. 7 embodiment of the present invention.
In Fig. 7, display device 700 comprises: array base palte 701 and color membrane substrates 702, wherein, color membrane substrates 702 comprises again the first transparent antireflective film 305.
The incident light 801 that the backlight of display device sends sees through the final arrival human eye of transmitted light 802 after array base palte 701, liquid crystal (scheming not shown) and color membrane substrates 702 successively, thereby has realized picture disply.
As can be seen from Figure 7, on color membrane substrates 702, increased after the first transparent antireflective film 305 of high index of refraction, when the light 801 of backlight sees through array base palte 701 and liquid crystal (scheming not shown) and is irradiated to color membrane substrates 702 surface, can be more much lower than using the intensity of reflected light of traditional color membrane substrates to reflected light 803 intensity on grid line, data line or the thin film transistor (TFT) of array base palte 701 through these color membrane substrates 702 surface reflections, thus the impact on film transistor device characteristic of the photogenerated current that causes due to reflected light can be reduced.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (10)
1. a color membrane substrates, comprise: substrate, be formed at the black matrix of described substrate one side, be formed at the color resin unit on described black matrix, it is characterized in that, also comprise: be formed at the first transparent antireflective film on described color resin unit, the refractive index of described the first transparent antireflective film is greater than the first predetermined refraction.
2. color membrane substrates as claimed in claim 1, is characterized in that, described the first transparent antireflective film is directly formed on described color resin unit as the protective seam of described color resin unit simultaneously.
3. color membrane substrates as claimed in claim 1, is characterized in that, also comprises: be formed at the protective seam between described color resin unit and described the first transparent antireflective film.
4. color membrane substrates as claimed in claim 3, is characterized in that, also comprises:
Be formed at the second transparent antireflective film between described color resin unit and described protective seam, the refractive index of described the second transparent antireflective film is greater than the second predetermined refraction.
5. color membrane substrates as claimed in claim 4, is characterized in that, described the second predetermined refraction is more than or equal to 1.5.
6. color membrane substrates as claimed in claim 4, is characterized in that, described the second transparent antireflective film adopts silicon dioxide, titania or hafnium oxide to make.
7. the color membrane substrates as described in claim 1-6 any one, is characterized in that, described the first transparent antireflective film adopts silicon dioxide, titania or hafnium oxide to make.
8. color membrane substrates as claimed in claim 7, is characterized in that, described the first predetermined refraction is more than or equal to 1.5.
9. color membrane substrates as claimed in claim 1, is characterized in that, also comprises: the electrode layer that is formed at described substrate opposite side.
10. a display device, is characterized in that, comprises the color membrane substrates described in claim 1-9 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310537960.7A CN103576377A (en) | 2013-11-04 | 2013-11-04 | Color film substrate and display device provided with same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310537960.7A CN103576377A (en) | 2013-11-04 | 2013-11-04 | Color film substrate and display device provided with same |
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| CN103576377A true CN103576377A (en) | 2014-02-12 |
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| CN201310537960.7A Pending CN103576377A (en) | 2013-11-04 | 2013-11-04 | Color film substrate and display device provided with same |
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Cited By (7)
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| CN106094387A (en) * | 2016-06-22 | 2016-11-09 | 武汉华星光电技术有限公司 | Liquid crystal lens and 3d display |
| CN106940496A (en) * | 2017-05-19 | 2017-07-11 | 京东方科技集团股份有限公司 | Chock insulator matter, display device and color membrane substrates manufacture method |
| CN108153035A (en) * | 2016-12-02 | 2018-06-12 | 三星显示有限公司 | The method that substrate, the display equipment including substrate and manufacture show equipment |
| CN108333832A (en) * | 2018-03-05 | 2018-07-27 | 京东方科技集团股份有限公司 | Color membrane substrates, liquid crystal display panel and display device |
| CN108508648A (en) * | 2018-04-04 | 2018-09-07 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN109324441A (en) * | 2018-11-29 | 2019-02-12 | 武汉华星光电技术有限公司 | Color membrane substrates and liquid crystal display panel |
| WO2020124714A1 (en) * | 2018-12-21 | 2020-06-25 | 深圳市华星光电技术有限公司 | Color filter substrate, liquid crystal display panel and liquid crystal display device |
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| JP2010175599A (en) * | 2009-01-27 | 2010-08-12 | Toppan Printing Co Ltd | Color filter and liquid crystal display device including same |
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| CN101512388A (en) * | 2006-08-30 | 2009-08-19 | 日本电气硝子株式会社 | Multilayer film |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106094387A (en) * | 2016-06-22 | 2016-11-09 | 武汉华星光电技术有限公司 | Liquid crystal lens and 3d display |
| CN106094387B (en) * | 2016-06-22 | 2019-01-22 | 武汉华星光电技术有限公司 | Liquid crystal lens and 3D display device |
| CN108153035A (en) * | 2016-12-02 | 2018-06-12 | 三星显示有限公司 | The method that substrate, the display equipment including substrate and manufacture show equipment |
| CN108153035B (en) * | 2016-12-02 | 2022-06-03 | 三星显示有限公司 | Substrate, display apparatus including the same, and method of manufacturing the display apparatus |
| CN106940496A (en) * | 2017-05-19 | 2017-07-11 | 京东方科技集团股份有限公司 | Chock insulator matter, display device and color membrane substrates manufacture method |
| CN108333832A (en) * | 2018-03-05 | 2018-07-27 | 京东方科技集团股份有限公司 | Color membrane substrates, liquid crystal display panel and display device |
| CN108508648A (en) * | 2018-04-04 | 2018-09-07 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| WO2019192039A1 (en) * | 2018-04-04 | 2019-10-10 | 深圳市华星光电技术有限公司 | Liquid crystal panel and manufacturing method therefor |
| CN108508648B (en) * | 2018-04-04 | 2020-01-17 | 深圳市华星光电技术有限公司 | Liquid crystal panel and manufacturing method thereof |
| CN109324441A (en) * | 2018-11-29 | 2019-02-12 | 武汉华星光电技术有限公司 | Color membrane substrates and liquid crystal display panel |
| WO2020107725A1 (en) * | 2018-11-29 | 2020-06-04 | 武汉华星光电技术有限公司 | Color film substrate and liquid crystal display panel |
| WO2020124714A1 (en) * | 2018-12-21 | 2020-06-25 | 深圳市华星光电技术有限公司 | Color filter substrate, liquid crystal display panel and liquid crystal display device |
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Application publication date: 20140212 |