JP2013033664A - 光導電素子及び撮像デバイス - Google Patents
光導電素子及び撮像デバイス Download PDFInfo
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- JP2013033664A JP2013033664A JP2011169558A JP2011169558A JP2013033664A JP 2013033664 A JP2013033664 A JP 2013033664A JP 2011169558 A JP2011169558 A JP 2011169558A JP 2011169558 A JP2011169558 A JP 2011169558A JP 2013033664 A JP2013033664 A JP 2013033664A
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- photoconductive
- imaging device
- electron beam
- layer
- hole injection
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- 238000003384 imaging method Methods 0.000 title abstract description 65
- 238000002347 injection Methods 0.000 claims abstract description 36
- 239000007924 injection Substances 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 28
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910001195 gallium oxide Inorganic materials 0.000 claims abstract description 5
- 238000010894 electron beam technology Methods 0.000 claims description 44
- 230000000903 blocking effect Effects 0.000 claims description 28
- 239000011669 selenium Substances 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 12
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 11
- 229910052711 selenium Inorganic materials 0.000 claims description 11
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 230000005764 inhibitory process Effects 0.000 abstract 4
- 239000000243 solution Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 27
- 239000011521 glass Substances 0.000 description 22
- 230000005684 electric field Effects 0.000 description 11
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical group [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 229910000420 cerium oxide Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910052790 beryllium Inorganic materials 0.000 description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229940007424 antimony trisulfide Drugs 0.000 description 1
- NVWBARWTDVQPJD-UHFFFAOYSA-N antimony(3+);trisulfide Chemical compound [S-2].[S-2].[S-2].[Sb+3].[Sb+3] NVWBARWTDVQPJD-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Landscapes
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
Abstract
本発明は、暗電流を抑制し、高感度・高解像度で高S/Nの高品位画像が得られる正孔注入阻止層を含む光導電素子及び撮像デバイスを提供することを課題とする。
【解決手段】
光導電素子は、透光性基板と、前記透光性基板の上に形成される導電膜と、前記導電膜上に形成される正孔注入阻止層と、前記正孔注入阻止層の上に形成される光導電層とを具え、前記正孔注入阻止層は、酸化ガリウムで構成される。
【選択図】図1
Description
図1は、実施の形態1の撮像デバイスの構成を示す図であり、(A)は側断面図、(B)は撮像デバイスを(A)のA−A矢視断面で示す図である。
図4は、実施の形態2の撮像デバイスの断面構造を示す図である。実施の形態2の撮像デバイス200は、X線画像用撮像デバイスに好適であり、電子ビーム源としての電子放出源アレイ240を備える点が実施の形態1の撮像デバイスと主に相違する。この電子放出源アレイ240は、複数の微小なカソードがマトリクス状に配列されたものであり、任意のカソードを選択して電子ビームを発射させることができる。このため、実施の形態1の撮像デバイス100のように、第1グリッド電極51、第2グリッド電極52、第3グリッド電極53、偏向コイル、及び集束コイルは備えない。
10 光導電素子
11 透光性基板
12 導電膜
13 光導電部
13A 走査面
13B 入射面
13C 走査領域
131 正孔注入阻止層
132 光導電層
133 電子ビームランディング層
14 金属製ピン
20 インジウムリング
30 ガラス管
40 電子ビーム源
41 電子ビーム
50 偏向装置
51 第1グリッド電極
52 第2グリッド電極
53 第3グリッド電極
60 メッシュ電極
70 信号読み出し装置
71 電源
72 読み出し部
200 撮像デバイス
230 ガラス管
240 電子放出源アレイ
241 電子ビーム
Claims (3)
- 透光性基板と、
前記透光性基板の上に形成される導電膜と、
前記導電膜上に形成される正孔注入阻止層と、
前記正孔注入阻止層の上に形成される光導電層と
を具え、
前記正孔注入阻止層は、酸化ガリウムで構成される、光導電素子。 - 前記光導電層は、セレンを主体とする非晶質半導体層で構成される、請求項1に記載の光導電素子。
- 請求項1又は2に記載の光導電素子と、
前記光導電素子に走査用の電子ビームを発射する電子ビーム源と、
前記光導電素子に電気的に接続され、前記電子ビームの走査によって得る撮像信号を読み出すための信号読み出し部と
を具える、撮像デバイス。
Priority Applications (1)
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JP2011169558A JP5739763B2 (ja) | 2011-08-02 | 2011-08-02 | 光導電素子及び撮像デバイス |
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JP2011169558A JP5739763B2 (ja) | 2011-08-02 | 2011-08-02 | 光導電素子及び撮像デバイス |
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JP2013033664A true JP2013033664A (ja) | 2013-02-14 |
JP5739763B2 JP5739763B2 (ja) | 2015-06-24 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9887218B2 (en) | 2015-07-16 | 2018-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US10033952B2 (en) | 2015-09-10 | 2018-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, module, electronic device, and method of operating the imaging device |
US10373991B2 (en) | 2015-08-19 | 2019-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US10498980B2 (en) | 2015-07-07 | 2019-12-03 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device comprising n-channel oxide semiconductor transistors, photoelectric conversion element, and capacitor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS618829A (ja) * | 1984-06-25 | 1986-01-16 | Hitachi Ltd | 撮像管のタ−ゲツト部およびその製造方法 |
JP2010258205A (ja) * | 2009-04-24 | 2010-11-11 | Konica Minolta Holdings Inc | 有機光電変換素子の製造方法及び該製造方法により製造された有機光電変換素子 |
-
2011
- 2011-08-02 JP JP2011169558A patent/JP5739763B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS618829A (ja) * | 1984-06-25 | 1986-01-16 | Hitachi Ltd | 撮像管のタ−ゲツト部およびその製造方法 |
JP2010258205A (ja) * | 2009-04-24 | 2010-11-11 | Konica Minolta Holdings Inc | 有機光電変換素子の製造方法及び該製造方法により製造された有機光電変換素子 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10498980B2 (en) | 2015-07-07 | 2019-12-03 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device comprising n-channel oxide semiconductor transistors, photoelectric conversion element, and capacitor |
US9887218B2 (en) | 2015-07-16 | 2018-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US10199411B2 (en) | 2015-07-16 | 2019-02-05 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device comprising photoelectric conversion element, operating method thereof, and electronic device |
US10373991B2 (en) | 2015-08-19 | 2019-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US10992891B2 (en) | 2015-08-19 | 2021-04-27 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US11431932B2 (en) | 2015-08-19 | 2022-08-30 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US11706545B2 (en) | 2015-08-19 | 2023-07-18 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
US10033952B2 (en) | 2015-09-10 | 2018-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, module, electronic device, and method of operating the imaging device |
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JP5739763B2 (ja) | 2015-06-24 |
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