JP2013010888A - Semiconductor substrate detergent composition - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a prewashing agent composition which can solve a problem with conventional preliminary washing (prewashing) techniques for a compound semiconductor substrate, such as insufficient detergency, and is improved in washing stamina properties in repeated use.SOLUTION: The detergent composition includes hydrocarbon, glycol ether, a non-ionic surfactant, and an ethanol amine having a branched carbon chain. According to this, the prewashing agent composition can be provided which can be suitably used to remove dirt such as wax, abrasive or particles (foreign matter such as grinding dust) adhered to a semiconductor substrate after grinding treatment, particularly, to a substrate called a compound semiconductor such as GaAs, sapphire or SiC.

Description

  The present invention relates to a cleaning agent for cleaning dirt after polishing from a semiconductor substrate after polishing, particularly a substrate called a compound semiconductor such as GaAs, sapphire, and SiC.

In general, a semiconductor substrate is used by processing a thin film formed on the substrate. In order to form this thin film, flatness and cleanliness of the substrate surface are required. In particular, a light emitting diode (LED) is manufactured by forming a thin film crystal such as GaN or GaAs on a sapphire substrate. At this time, if the thin film is not flat and uniform, it may cause a decrease in the yield of LEDs. In order to grow a thin film uniformly, it is necessary that the sapphire substrate as the base is flat and has high cleanliness.

  First, polishing is performed in order to planarize the substrate. At that time, the substrate is temporarily fixed using wax (solid matter of oil and fat such as wax), and then polished using an abrasive such as colloidal silica.

  In addition to the wax and the abrasive, particles (foreign matter such as grinding scraps) are also attached to the substrate flattened by polishing. In order to form a thin film, it is necessary to remove these wax, abrasive and particles remaining on the substrate as much as possible. For this reason, there is usually a step of cleaning the substrate after the polishing process, and in order to achieve a high cleaning target, finish cleaning (final cleaning) is performed in addition to preliminary cleaning (pre-cleaning).

The present application provides a cleaning composition for preliminary cleaning (pre-cleaning). Conventionally, organic solvents have been frequently used in preliminary cleaning. For this reason, it has been pointed out that the cleaning performance is insufficient due to the occurrence of redeposition of dirt on the substrate as well as anxiety about work safety.

JP-A-10-112451 JP-A-9-36078 JP 2003-289060 A JP 2002-69492 A

Patent Document-1 and Patent Document-2 disclose a semiconductor substrate cleaning agent and a cleaning method for the purpose of removing wax. Further, Patent Document 3 and Patent Document 4 disclose precision cleaning agents and cleaning methods for the purpose of particle removal. However, the compound semiconductor substrate has a problem that high cleanliness cannot be obtained.

The present application provides a pre-cleaning (pre-cleaning) agent composition that solves problems such as insufficient cleaning power, which has been a problem of pre-cleaning technology for compound semiconductor substrates, and has improved cleaning stamina when repeatedly used. There is.

  In order to solve the above-mentioned problems, the present inventors have intensively studied and, as a result, have arrived at a solution means based on the claim structure.

This invention was made | formed based on the said knowledge, and provides the cleaning composition by the following structure. That is,
[1]
(A) 1-20 mass% of C8-20 saturated aliphatic hydrocarbon and / or unsaturated aliphatic hydrocarbon,
(B) 5-40% by mass of glycol ether represented by the general formula (1),

R ¹ —O— (AO) _n —R ² (1)
However, R ¹ is a linear or branched alkyl group, alkenyl group, phenyl group or benzyl group having 4 to 8 carbon atoms, and AO is an oxyalkylene group having 2 to 4 carbon atoms. At least one unit of oxyethylene group is contained, n represents the average number of AO repeats, and is a number from 1 to 4. R ² is a hydrogen group, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alkenyl group.

(C) 1-20% by mass of a nonionic surfactant represented by the general formula (2),

R ³ —O— (AO) _n —H (2)
R ³ is a linear or branched alkyl group, alkenyl group, phenyl group or benzyl group having 8 to 20 carbon atoms, and AO is an oxyalkylene group having 2 to 4 carbon atoms, but at least one unit. Oxyethylene groups are included, and n represents the average number of AO repeats and is 8 to 20.

(D) 1-30% by mass of at least one alkanolamine having a branched carbon chain selected from monoisopropanolamine, diisopropanolamine, and triisopropanolamine;
As mentioned above, the liquid cleaning composition for semiconductor substrates characterized by containing four components of (A)-(D).
[2]
The cleaning composition according to claim 1, wherein the semiconductor substrate is a hard and brittle material substrate, and is a compound semiconductor or oxide semiconductor such as GaAs, sapphire, SiC or the like.

  According to the present invention, the wax adhering in the manufacturing process of the compound semiconductor substrate can be removed to a high degree, and even if the cleaning composition containing the removed wax is used repeatedly, there is little reduction in cleaning power, that is, stamina cleaning. It is possible to provide a pre-cleaning (pre-cleaning) agent composition that is excellent in terms of properties.

  Hereinafter, the present invention will be described in detail.

(A component)
Here, the component (A) is a C8-20 saturated aliphatic hydrocarbon or unsaturated aliphatic hydrocarbon. The component (A) preferably has 8 to 20 carbon atoms, and more preferably 10 to 16 carbon atoms. When the carbon number is 8 to 20, particularly 10 to 16, the detergency against wax stains is further improved. When the carbon number is at least the lower limit, the flammability is low, and when the carbon number is at most the upper limit, a uniform and transparent appearance of the detergent composition is easily obtained.
The component (A) is not particularly limited as long as it is a saturated aliphatic hydrocarbon or unsaturated aliphatic hydrocarbon, and specifically, octane, decane, undecane, dodecane, tridecane, tetradecane, pentadecane, hexadecane, hexadecane, heptadecane, Examples include linear or branched alkanes such as octadecane; linear or branched alkenes such as octene, decene, undecene, dodecene, tridecene, tetradecene, pentadecene, hexadecene, hexadecene, heptadecene, and octadecene. (A) A component can be used individually by 1 type or in combination of 2 or more types as appropriate.
As a specific product example, liquid paraffin No. 30 (trade name, manufactured by Chuo Kasei Co., Ltd., mixture of 12 to 14 carbon atoms), N12D (trade name, normal paraffin manufactured by Nikko Petrochemical Co., Ltd., 12 carbon atoms), linearene 14 (trade name, α olefin produced by Idemitsu Kosan Co., Ltd. ) And the like.
The proportion of the component (A) in the cleaning composition of the present invention is preferably 1 to 20% by mass, and more preferably 3 to 10% by mass. When the proportion of the component (A) is 1% or more, the detergency to wax is improved. Moreover, if it is 20% or less, the composition which exhibits a uniform and transparent external appearance will be obtained.

(B component)
Here, the component (B) is a compound represented by the following general formula (1).
^{R 1 -O- (AO) n-} R 2 ··· (1) formula ^{R 1} is a linear or branched alkyl group, an alkenyl group, a phenyl group or a benzyl group having 4 to 8 carbon atoms. AO is an oxyalkylene group having 2 to 4 carbon atoms, n represents the average number of AO repeats, and is a number of 1 to 4. However, at least one unit of oxyethylene group is contained in the repeating structure of-(AO) _n- . When n is 2 or more, AO may be an alkylene oxide added alone or a mixture of two or more alkylene oxides may be added, and the form of mixed addition is also random addition. However, either block addition may be used. R ² is a hydrogen group, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alkenyl group. Among them, detergency against wax of the detergent composition, liquid stability (uniformity, transparency) because it is improved, R ² is more preferably hydrogen group.
The component (B) is not particularly limited as long as it is a compound represented by the general formula (1), and specific examples thereof include diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tripropylene glycol monobutyl ether, trialkylene glycol mono Butyl ether (EO 1 mol, PO2 mol adduct), diethylene glycol dibutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether (hexyl diglycol), ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethyl-hexyl ether (2 -Ethylhexyl diglycol), phenyl glycol, phenyl diglycol, phenyl triglycol and the like. Among them, since the detergency to wax is further improved, ethylene oxide addition type hexyl diglycol, 2-ethylhexyl diglycol, trialkylene glycol monobutyl ether (EO 1 mol, PO2 mol adduct), triethylene glycol monobutyl ether are used. More preferred.
(B) A component can be used individually by 1 type or in combination of 2 or more types, As a specific product illustration, hexyl diglycol (brand name, product made from a Japanese emulsifier), 2 ethylhexyl diglycol (brand name) , Nippon Emulsifier), Kyowanol Series (trade name, manufactured by Kyowa Hakko Chemical) Leosolve 703B (trade name, manufactured by Lion), Butyl Triglycol (trade name, manufactured by Nippon Emulsifier), Butisenol Series (trade name, Kyowa Hakko) A commercially available product such as a chemical product can be used.
The proportion of the component (B) in the cleaning composition of the present invention is preferably 5 to 40% by mass, and more preferably 16 to 25% by mass. When the proportion of the component (B) is 5% or more, the detergency to the wax and the liquid stability exhibiting a uniform and transparent appearance are improved. If it is 40% or less, the liquid stability which exhibits a uniform and transparent external appearance will improve.
The main blending effect of the component (B) plays a role of solubilizing the component (A) and increasing the wax removability synergistically with the component (A).

(C component)
The nonionic surfactant is a compound obtained by adding arbitrary ethylene oxide or propylene oxide to an aliphatic hydrocarbon or aromatic hydrocarbon having 8 to 20 carbon atoms, and is a compound represented by the following formula (2). is there.
R ³ —O— (AO) n—H (2) where R ³ is a linear or branched alkyl group, alkenyl group, phenyl group or benzyl group having 8 to 20 carbon atoms. is there. AO is an oxyalkylene group having 2 to 4 carbon atoms, n represents the average number of AO repeats, and is a number of 8 to 20. However, at least one unit of oxyethylene group is contained in the repeating structure of-(AO) _n- . When n is 2 or more, AO may be an alkylene oxide added alone or a mixture of two or more alkylene oxides may be added, and the form of mixed addition is also random addition. However, either block addition may be used.
(C) A component will not be specifically limited if it is a compound represented as General formula (2), As a specific thing, polyoxyalkylene alkyl ether, polyoxyalkylene alkyl phenyl ether, polyoxyalkylene allyl phenyl ether, etc. Is mentioned. Among these, polyoxyalkylene alkyl ether is more preferable because liquid stability that exhibits a uniform and transparent appearance and rinsing properties after washing are further improved. In the exemplified compounds, the polyoxyalkylene group is preferably a polyoxyethylene group, a polyoxypropylene group containing at least one unit of oxyethylene group, or a polyoxybutylene group, and a polyoxyethylene group, at least one unit. A polyoxypropylene group containing an oxyethylene group is more preferable. (C) A component can be used individually by 1 type or in combination of 2 or more types as appropriate.
As specific product examples, the Dovanox series (trade name, made by Lion), Leo Coal series (trade name, made by Lion), Leox series (trade name, made by Lion), New Coal series (trade name, made by Nippon Emulsifier) ), Softanol series (trade name, manufactured by Nippon Shokubai Co., Ltd.), Neugen series (trade name, manufactured by Daiichi Kogyo Seiyaku), etc. can be used.
The ratio of the component (C) in the cleaning composition of the present invention is preferably 1 to 20% by mass, and more preferably 6 to 10% by mass. When the ratio of the component (C) is 1% or more, the liquid stability that exhibits a uniform and transparent appearance and the rinsing properties after washing are improved. If it is 20% or less, the detergency and antifoaming properties for wax are improved.

(D component)
Component (D) is ethanolamine having a branched carbon chain, and is monoisopropanolamine, diisopropanolamine, or triisopropanolamine.
Of these, monoisopropanolamine is more preferred because it improves the detergency (removability and solubility) of the wax, the abrasive and the dispersibility of the particles. Component (D) can be used singly or in appropriate combination of two or more. As specific product examples, monoisopropanolamine (NANJING BAOCHUN CHEMICAL CO., LTD), diisopropanolamine (Tokyo) Commercial products such as Kasei Kogyo Co., Ltd. and triisopropanolamine (Tokyo Kasei Kogyo Co., Ltd.) can be used.
The proportion of the component (D) in the cleaning composition of the present invention is preferably 1 to 30% by mass, and more preferably 5 to 20% by mass. When the proportion of the component (D) is 1% or more, the detergency (removability and solubility) and pH stability for the wax are improved. If it is 30% or less, the stability of the liquid exhibiting a uniform and transparent appearance is improved.

(Optional component)
The cleaning composition for removing a liquid crystal of the present invention may contain other components other than the components (A) to (D). Examples of other components include chelating agents, antioxidants, rust inhibitors, antifoaming agents, pH adjusters, anionic surfactants, and aromatic compounds.
For chelating agents, citric acid, tartaric acid, malic acid, ethylenediaminetetraacetic acid (EDTA), triethylenetetraacetic acid (TTHA), methylglycine diacetic acid (MGDA), 1,3-propane-2-diaminetetraacetic acid (PDTA) , Hydroxyethylethylenediaminetriacetic acid (HEDTA), hydroxyethyliminodiacetic acid (HIDA), nitrilotriacetic acid (NTA), diethylenetriaminepentaacetic acid (DTPA), propylenediaminetetraacetic acid, ethylenediaminetetrapropionic acid, cyclohexane-1,2-diaminetetra Examples thereof include acids such as acetic acid, iminodisuccinic acid, aspartic acid diacetate, β-alanine diacetate, and hydroxyiminodisuccinic acid, and salts thereof. Examples of the base for forming a salt include sodium, potassium, calcium, magnesium and the like.
Examples of the antioxidant include phenolic antioxidants [2,6-di-t-butylphenol, 2-t-butyl-4-methoxyphenol and 2,4-dimethyl-6-t-butylphenol], amines, and the like. Antioxidants [monoalkyldiphenylamines such as monooctyldiphenylamine and monononyldiphenylamine; dialkyldiphenylamines such as 4,4′-dibutyldiphenylamine and 4,4′-dipentyldiphenylamine; polyalkyldiphenylamines such as tetrabutyldiphenylamine and tetrahexyldiphenylamine Naphthylamines such as α-naphthylamine and phenyl-α-naphthylamine], sulfur compounds [phenothiazine, pentaerythritol-tetrakis- (3-laurylthiopropionate) and (3,5-tert-butyl-4-hydroxybenzyl) sulfide and the like] and phosphorus antioxidants [bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, phenyldiisodecylphosphite, diphenyldi Isooctyl phosphite, triphenyl phosphite, etc.].
Examples of the rust preventive include benzotriazole, tolyltriazole, benzotriazole having a hydrocarbon group having 2 to 10 carbon atoms, benzimidazole, imidazole having a hydrocarbon group having 2 to 20 carbon atoms, and 2 to 20 carbon atoms. Nitrogen-containing organic rust preventives such as thiazole having a hydrocarbon group and 2-mercaptobenzothiazole; alkyl or alkenyl succinic acids such as dodecenyl succinic acid half ester, octadecenyl succinic anhydride and dodecenyl succinic acid amide; sorbitan monooleate And polyhydric alcohol partial esters such as glycerin monooleate and pentaerythritol monooleate.
Examples of the antifoaming agent include silicone antifoaming agents [antifoaming agents including dimethyl silicone, fluorosilicone, polyether silicone, and the like].
Examples of the acidic pH adjuster include phosphoric acid and carboxylic acid other than those described for the chelating agent. Examples of the carboxylic acid include aliphatic carboxylic acids such as butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, dodecanoic acid; benzoic acid, paratertiary butylbenzoic acid, phthalic acid, Aromatic carboxylic acids such as isophthalic acid and terephthalic acid are preferred.
Examples of alkaline pH adjusters include alkanolamines, quaternary ammonium hydroxides, and inorganic salts.
Examples of the alkanolamine include monoethanolamine, diethanolamine, and triethanolamine.
Examples of the quaternary ammonium hydroxide include tetramethylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, methyltrihydroxyethylammonium hydroxide, dimethyldihydroxyethylammonium hydroxide, tetraethylammonium hydroxide, and trimethylethylammonium hydroxide. , Etc.
Examples of the inorganic salt include sodium hydroxide and potassium hydroxide.
Examples of the anionic surfactant include linear alkylbenzene sulfonate, alkane sulfonate, and alpha olefin sulfonate. Examples of the salt base include sodium, potassium, calcium, magnesium, ammonium and ethanolamine.
The aromatic compound may be any compound having two substituents on the benzene ring. Specifically, o-methoxytoluene, m-methoxytoluene, p-methoxytoluene, 1,2-dimethoxybenzene, 1, 3-dimethoxybenzene, 1,4-dimethoxybenzene, o-methoxy-α-methoxytoluene, m-methoxy-α-methoxytoluene, p-methoxy-α-methoxytoluene, α-methoxy-o-xylene, α-methoxy -M-xylene, (alpha) -methoxy-p-xylene, o-xylene glycol dimethyl ether, m-xylene glycol dimethyl ether, p-xylene glycol dimethyl ether are mentioned.

(Cleaning method)
The cleaning method using the liquid cleaning composition is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include immersion cleaning, jet cleaning, spray cleaning, brush cleaning, and ultrasonic cleaning. It is done. In particular, the ultrasonic cleaning improves the dispersibility of dirt such as wax, abrasive and particles in the detergent composition, and the dirt can be effectively removed.

EXAMPLES Hereinafter, although the Example and comparative example of this invention are given and the effectiveness of this cleaning composition is demonstrated, this invention is not limited to the following Example. In the following examples, unless otherwise specified, “%” of the composition represents mass%, and the amount of each component in the table is mass% in terms of pure content in the composition. A cleaning composition having the composition shown in Table 1 was prepared by a conventional method. The following evaluation was performed about the obtained cleaning composition. The components used in Examples and Comparative Examples are shown below.
(A component)
n-dodecane, manufactured by Nikko Petrochemical Co., Ltd., N12D (trade name)
1-tetradecene, manufactured by Idemitsu Kosan Co., Ltd., Linearlen 14 (trade name)

(B component)
Diethylene glycol monohexyl ether, manufactured by Nippon Emulsifier Co., Ltd., hexyl diglycol (trade name)
Diethylene glycol mono-2-ethylhexyl ether, manufactured by Nippon Emulsifier Co., Ltd., 2-ethylhexyl diglycol (trade name)
Trialkylene glycol monobutyl ether (EO 1 mol, PO 2 mol adduct), Lion Corporation, Leosolv 703B (trade name)
Triethylene glycol monobutyl ether, manufactured by Kyowa Hakko Chemical Co., Ltd., Butisenol 30 (trade name)

(C component)
Polyoxyalkylene branched decyl ether (C ₁₀ AO ₁₀ ), manufactured by Daiichi Kogyo Seiyaku Co., Ltd., Neugen XL-140 (trade name)
Polyoxyethylene 2-ethylhexyl ether (C ₈ EO ₂₀ ), manufactured by Nippon Emulsifier Co., Ltd., New Coal 1020 (trade name)

(D component)
Monoisopropanolamine, manufactured by NANJING BAOCHUN CHEMICAL CO., LTD, monoisopropanolamine (trade name)

(D component comparison product)
Triethanolamine, manufactured by Kanto Chemical Co., Ltd., 2,2 ', 2''-nitrilotriethanol (trade name)

(Creation of wax dirt model board)
1) Shift wax stain model substrate Shift wax 679 (manufactured by Nikka Seiko Co., Ltd.) so as to be uniform on the end portion of about 20 mm × 26 mm on the surface of the slide glass (76 mm × 26 mm × 1 mm) heated to about 90 ° C. ), About 0.03 g was dissolved and applied. Then, what was left to cool at room temperature for 20 minutes or more was used as a model substrate.
2) Alcowax dirt model substrate Alcowax 5302 (manufactured by Nikka Seiko Co., Ltd.) to be uniform on the end of the glass slide (76mm x 26mm x 1mm) heated to about 90 ° C, about 20mm x 26mm. ) About 0.03 g was dissolved and applied. Then, what was left to cool at room temperature for 20 minutes or more was used as a model substrate.

(Liquid uniformity evaluation)
After stirring and preparing 100 g of the cleaning composition, it was allowed to stand at room temperature, and the appearance was visually observed with the naked eye. (Evaluation criteria) was as follows.
○: Maintained uniform transparency after standing for 1 day after preparation ×: Cloudy or separated into two layers after standing for 1 day after preparation

(Wax removability)
1) 100 mL of various cleaning agents were put into a 100 mL glass beaker, and the liquid temperature was kept at 50 ° C. while stirring with a magnetic stirrer. The model substrate was put here, and the washing operation was performed by immersing for 3 minutes. After 3 minutes, the model substrate was removed from the cleaning agent.
2) 100 mL of water was put into a 100 mL glass beaker, and the liquid temperature was kept at room temperature (15 to 25 ° C.) while stirring with a magnetic stirrer. Here, the model substrate taken out by the cleaning operation was immersed for 2 minutes to perform a rinsing operation. After 2 minutes, the model substrate was removed from the cleaning agent.
3) The model substrate after the rinsing operation was dried at 40 ° C. for 30 minutes or more, and the water adhering to the model substrate surface was blown away.
4) The wax removal rate% was calculated from the weight of the substrate before and after cleaning and the weight of the applied wax.

Wax removal rate (%) = 100 × ((substrate weight before cleaning) − (substrate weight after cleaning)) / (weight of applied wax)
(Evaluation criteria) was as follows.
A: Wax removal rate: 90% or more B: Wax removal rate: 80% or more and less than 90% X: Wax removal rate: less than 80%

(Wax solubility)
1) 100 mL of the cleaning agent in which the shift wax 679 removed from the model substrate after the evaluation of the wax removal rate of the shift wax 679 was dispersed or dissolved was allowed to stand at room temperature (15 to 25 ° C.) for 60 minutes. .
2) Thereafter, 100 mL of the cleaning agent was filtered using a membrane filter (pore size: 1 μm), and further 100 mL of ion exchange water was filtered as a rinsing agent, and the appearance on the filter was visually observed with the naked eye.
(Evaluation criteria) was as follows.
○: There is no wax remaining in the cleaning agent on the filter. ×: There is wax remaining in the cleaning agent on the filter.

(Cleaning agent rinsability)
1) 100 mL of various cleaning agents were put into a 100 mL glass beaker, and the liquid temperature was kept at room temperature (15 to 25 ° C.) while stirring with a magnetic stirrer. A slide glass (76 mm × 26 mm × 1 mm) was placed here, and immersed for 3 minutes to allow the cleaning agent to adhere to the slide glass. After 3 minutes, the glass slide was removed from the cleaning agent.
2) 100 mL of water was put into a 100 mL glass beaker, and the liquid temperature was kept at room temperature (15 to 25 ° C.) while stirring with a magnetic stirrer. The slide glass taken out by the operation (1) was immersed for 1 minute to perform a rinsing operation. After 1 minute, the model substrate was removed from the cleaning agent.
3) The model substrate after the rinsing operation was dried at 40 ° C. for 30 minutes or more, and the water adhering to the model substrate surface was blown away.
4) The rinsing property was evaluated by checking the residue of the cleaning agent adhered to the model substrate with the naked eye according to the following criteria.
(Evaluation criteria) was as follows.
○: No cleaning agent residue (rinse 100%)
Δ: Detergent residue is slightly adhered (rinse 50% or more and less than 100%)
X: A lot of cleaning agent residue adheres (rinseability is less than 50%)

(Evaluation of stamina cleanability)
1) 100 g of various cleaning agents were put in a 100 mL glass beaker, and 1 wt% of shift wax 679 was added to the various cleaning agents, and the liquid temperature was kept at 50 ° C. while stirring with a magnetic stirrer. Here, a shift wax-stained model substrate was placed and immersed for 3 minutes for washing operation. After 3 minutes, the model substrate was removed from the cleaning agent.
2) 100 mL of water was put into a 100 mL glass beaker, and the liquid temperature was kept at room temperature (15 to 25 ° C.) while stirring with a magnetic stirrer. Here, the model substrate taken out by the cleaning operation was immersed for 2 minutes to perform a rinsing operation. After 2 minutes, the model substrate was removed from the cleaning agent.
3) The model substrate after the rinsing operation was dried at 40 ° C. for 30 minutes or more, and the water adhering to the model substrate surface was blown away.
4) The wax removal rate% was calculated from the weight of the substrate before and after cleaning and the weight of the applied wax.
Wax removal rate (%) = 100 × ((substrate weight before cleaning) − (substrate weight after cleaning)) / (weight of applied wax)
(Evaluation criteria) was as follows.
A: Wax removal rate: 90% or more B: Wax removal rate: 80% or more and less than 90% X: Wax removal rate: less than 80%

Table 1 shows examples and comparative examples.

As shown in Table 1, Examples 1 to 11, which are products of the present invention, were excellent in liquid uniformity, detergency, and stamina detergency.
On the other hand, the comparative example 1 which does not contain (A) component was inferior in the washing | cleaning property with respect to the alcohol wax 5302 and stamina washing | cleaning property. (B) The comparative example 2 which does not contain a component was inferior in liquid uniformity, detergency, and stamina detergency.
Comparative Example 3 containing no component (C) was inferior in liquid uniformity and cleaning agent rinsing properties. The comparative example 4 which does not contain (D) component was inferior in the detergency with respect to the shift wax 679, and a stamina detergency. The comparative example 5 which made the (D) component triethanolamine was inferior in stamina detergency.
From the above results, by applying the present invention, the wax adhering in the manufacturing process of the compound semiconductor substrate is satisfactorily removed, and even when the removed wax is mixed, the detergency is reduced, that is, the stamina detergency is improved. I found it excellent.

Claims (2)

(A) 1-20 mass% of C8-20 saturated aliphatic hydrocarbon and / or unsaturated aliphatic hydrocarbon,
(B) 5-40% by mass of glycol ether represented by the general formula (1),

R ¹ —O— (AO) _n —R ² (1)
(However, R ¹ is a linear or branched alkyl group having 4 to 8 carbon atoms, an alkenyl group, a phenyl group or a benzyl group, and AO is an oxyalkylene group having 2 to 4 carbon atoms. Includes at least one unit of oxyethylene group, n represents the average number of AO repeats and is a number of 1 to 4. R ² is a hydrogen group, a linear or branched chain having 1 to 4 carbon atoms. An alkyl group or an alkenyl group.)

(C) 1-20% by mass of a nonionic surfactant represented by the general formula (2),

R ³ —O— (AO) _n —H (2)
(However, R ³ is a linear or branched alkyl group, alkenyl group, phenyl group or benzyl group having 8 to 20 carbon atoms, and AO is an oxyalkylene group having 2 to 4 carbon atoms, but at least 1 (The unit contains an oxyethylene group, and n represents the average number of AO repeats and is 8 to 20.)

(D) 1-30% by mass of at least one alkanolamine having a branched carbon chain selected from monoisopropanolamine, diisopropanolamine, and triisopropanolamine,

As mentioned above, the liquid cleaning composition for semiconductor substrates characterized by containing four components of (A)-(D). The cleaning composition according to claim 1, wherein the semiconductor substrate is a compound semiconductor or an oxide semiconductor.