JP2013000809A5 - - Google Patents

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Publication number
JP2013000809A5
JP2013000809A5 JP2011131587A JP2011131587A JP2013000809A5 JP 2013000809 A5 JP2013000809 A5 JP 2013000809A5 JP 2011131587 A JP2011131587 A JP 2011131587A JP 2011131587 A JP2011131587 A JP 2011131587A JP 2013000809 A5 JP2013000809 A5 JP 2013000809A5
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JP
Japan
Prior art keywords
monomer
transition temperature
glass transition
homopolymer
gives
Prior art date
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Application number
JP2011131587A
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Japanese (ja)
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JP5851124B2 (en
JP2013000809A (en
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Publication date
Application filed filed Critical
Priority claimed from JP2011131587A external-priority patent/JP5851124B2/en
Priority to JP2011131587A priority Critical patent/JP5851124B2/en
Priority to CN201280028637.0A priority patent/CN103596729B/en
Priority to PCT/US2012/041535 priority patent/WO2012173885A2/en
Priority to KR1020147000358A priority patent/KR20140051212A/en
Priority to TW101121028A priority patent/TW201307504A/en
Publication of JP2013000809A publication Critical patent/JP2013000809A/en
Publication of JP2013000809A5 publication Critical patent/JP2013000809A5/ja
Publication of JP5851124B2 publication Critical patent/JP5851124B2/en
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (3)

支持体と、研磨材と、これらを接合する粘着剤層と、を備える研磨用構造体であって、
前記粘着剤層は、第一のモノマー５８〜８５質量％、第二のモノマー２〜７質量％及び第三のモノマー１０〜４０質量％を含むモノマーの重合体を含有し、
前記第一のモノマーは、ガラス転移温度が０℃以下のホモポリマーを与える、炭素数８〜１８のアルキル基を有する（メタ）アクリル酸エステルであり、
前記第二のモノマーは、ガラス転移温度が５０℃以上のホモポリマーを与える、極性モノマーであり、
前記第三のモノマーは、ガラス転移温度が１０℃以上のホモポリマーを与える、炭素数４〜１８のアルキル基又は炭素数７〜１８のアラルキル基を有する（メタ）アクリル酸エステルである、研磨用構造体。 A polishing structure comprising a support, an abrasive, and a pressure-sensitive adhesive layer for joining them,
The pressure-sensitive adhesive layer contains a polymer of monomers including a first monomer 58 to 85% by mass, a second monomer 2 to 7% by mass, and a third monomer 10 to 40% by mass,
The first monomer is a (meth) acrylic acid ester having an alkyl group having 8 to 18 carbon atoms that gives a homopolymer having a glass transition temperature of 0 ° C. or lower.
The second monomer is a polar monomer that gives a homopolymer having a glass transition temperature of 50 ° C. or higher,
The third monomer is a (meth) acrylic acid ester having an alkyl group having 4 to 18 carbon atoms or an aralkyl group having 7 to 18 carbon atoms, which gives a homopolymer having a glass transition temperature of 10 ° C. or higher. Structure. 前記重合体のガラス転移温度が、−１５〜１０℃である、請求項１に記載の研磨用構造体。   The polishing structure according to claim 1, wherein the polymer has a glass transition temperature of −15 to 10 ° C. 前記研磨材が、基材と、該基材上に規則的に複数配置された砥粒及びその結合剤を含む立体要素と、を有する、請求項１又は２に記載の研磨用構造体。   The polishing structure according to claim 1 or 2, wherein the abrasive has a base material and a three-dimensional element including a plurality of abrasive grains regularly arranged on the base material and a binder thereof.
JP2011131587A 2011-06-13 2011-06-13 Polishing structure Expired - Fee Related JP5851124B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011131587A JP5851124B2 (en) 2011-06-13 2011-06-13 Polishing structure
CN201280028637.0A CN103596729B (en) 2011-06-13 2012-06-08 Structural member for polishing
PCT/US2012/041535 WO2012173885A2 (en) 2011-06-13 2012-06-08 Structural member for polishing
KR1020147000358A KR20140051212A (en) 2011-06-13 2012-06-08 Structural member for polishing
TW101121028A TW201307504A (en) 2011-06-13 2012-06-13 Structural member for polishing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011131587A JP5851124B2 (en) 2011-06-13 2011-06-13 Polishing structure

Publications (3)

Publication Number Publication Date
JP2013000809A JP2013000809A (en) 2013-01-07
JP2013000809A5 true JP2013000809A5 (en) 2014-07-31
JP5851124B2 JP5851124B2 (en) 2016-02-03

Family

ID=47357676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011131587A Expired - Fee Related JP5851124B2 (en) 2011-06-13 2011-06-13 Polishing structure

Country Status (5)

Country Link
JP (1) JP5851124B2 (en)
KR (1) KR20140051212A (en)
CN (1) CN103596729B (en)
TW (1) TW201307504A (en)
WO (1) WO2012173885A2 (en)

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US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
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KR102436416B1 (en) 2014-10-17 2022-08-26 어플라이드 머티어리얼스, 인코포레이티드 Cmp pad construction with composite material properties using additive manufacturing processes
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10618141B2 (en) 2015-10-30 2020-04-14 Applied Materials, Inc. Apparatus for forming a polishing article that has a desired zeta potential
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
JP6976048B2 (en) * 2015-11-30 2021-12-01 日東電工株式会社 Adhesive sheet for fixing polishing pads
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. Abrasive delivery polishing pads and manufacturing methods thereof
CN112654655A (en) 2018-09-04 2021-04-13 应用材料公司 Advanced polishing pad formulations
KR102345784B1 (en) * 2019-07-10 2022-01-03 에프엔에스테크 주식회사 High-hardness polishing pad for polishing the backside of wafer
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
CN112171532A (en) * 2020-08-26 2021-01-05 南京航空航天大学 Elastic milling and polishing tool for free-form surface machining and manufacturing method thereof

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