JP2012516064A5 - - Google Patents

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Publication number
JP2012516064A5
JP2012516064A5 JP2011548195A JP2011548195A JP2012516064A5 JP 2012516064 A5 JP2012516064 A5 JP 2012516064A5 JP 2011548195 A JP2011548195 A JP 2011548195A JP 2011548195 A JP2011548195 A JP 2011548195A JP 2012516064 A5 JP2012516064 A5 JP 2012516064A5
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JP
Japan
Prior art keywords
substrate
temperature
present
tip
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011548195A
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English (en)
Japanese (ja)
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JP2012516064A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/022016 external-priority patent/WO2010085770A1/en
Publication of JP2012516064A publication Critical patent/JP2012516064A/ja
Publication of JP2012516064A5 publication Critical patent/JP2012516064A5/ja
Pending legal-status Critical Current

Links

JP2011548195A 2009-01-26 2010-01-25 基板温度制御を含む大面積均質アレイの製作方法 Pending JP2012516064A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14745109P 2009-01-26 2009-01-26
US61/147,451 2009-01-26
PCT/US2010/022016 WO2010085770A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including substrate temperature control

Publications (2)

Publication Number Publication Date
JP2012516064A JP2012516064A (ja) 2012-07-12
JP2012516064A5 true JP2012516064A5 (https=) 2013-03-14

Family

ID=41804775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011548195A Pending JP2012516064A (ja) 2009-01-26 2010-01-25 基板温度制御を含む大面積均質アレイの製作方法

Country Status (8)

Country Link
US (1) US20100227063A1 (https=)
EP (1) EP2389615A1 (https=)
JP (1) JP2012516064A (https=)
KR (1) KR20110119666A (https=)
AU (1) AU2010206595A1 (https=)
CA (1) CA2750434A1 (https=)
SG (1) SG172853A1 (https=)
WO (1) WO2010085770A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010085767A1 (en) * 2009-01-26 2010-07-29 Nanoink. Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
WO2010085769A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including homogeneous substrates
NL2004980A (en) * 2009-07-13 2011-01-17 Asml Netherlands Bv Heat transfers assembly, lithographic apparatus and manufacturing method.
US9645391B2 (en) 2013-11-27 2017-05-09 Tokyo Electron Limited Substrate tuning system and method using optical projection
US9735067B2 (en) 2013-11-27 2017-08-15 Tokyo Electron Limited Substrate tuning system and method using optical projection
WO2018144839A1 (en) 2017-02-02 2018-08-09 University Of Wyoming Apparatus for temperature modulation of samples

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE23838E (en) 1950-09-14 1954-06-08 Post-deflected color kinescope
US4609037A (en) * 1985-10-09 1986-09-02 Tencor Instruments Apparatus for heating and cooling articles
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US6827979B2 (en) * 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
US6635311B1 (en) 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US6642129B2 (en) 2001-07-26 2003-11-04 The Board Of Trustees Of The University Of Illinois Parallel, individually addressable probes for nanolithography
SE0102764D0 (sv) 2001-08-17 2001-08-17 Astrazeneca Ab Compounds
US7998528B2 (en) * 2002-02-14 2011-08-16 Massachusetts Institute Of Technology Method for direct fabrication of nanostructures
US7279046B2 (en) * 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US7060977B1 (en) 2002-05-14 2006-06-13 Nanoink, Inc. Nanolithographic calibration methods
EP1363164B1 (en) * 2002-05-16 2015-04-29 NaWoTec GmbH Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
WO2004044552A2 (en) * 2002-11-12 2004-05-27 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20040228962A1 (en) 2003-05-16 2004-11-18 Chang Liu Scanning probe microscopy probe and method for scanning probe contact printing
US6898084B2 (en) * 2003-07-17 2005-05-24 The Bergquist Company Thermal diffusion apparatus
WO2005115630A2 (en) 2004-04-30 2005-12-08 Bioforce Nanosciences, Inc. Method and apparatus for depositing material onto a surface
US7541062B2 (en) * 2004-08-18 2009-06-02 The United States Of America As Represented By The Secretary Of The Navy Thermal control of deposition in dip pen nanolithography
EP2013662B1 (en) 2006-04-19 2013-08-14 Northwestern University Article for parallel lithography with two-dimensional pen arrays
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
AU2008225175A1 (en) * 2007-03-13 2008-09-18 Nanoink, Inc. Nanolithography with use of viewports
JP5269887B2 (ja) * 2007-05-09 2013-08-21 ナノインク インコーポレーティッド 小型ナノファブリケーション装置
WO2009020658A1 (en) * 2007-08-08 2009-02-12 Northwestern University Independently-addressable, self-correcting inking for cantilever arrays

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