KR20110119666A - 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작 - Google Patents

기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작 Download PDF

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Publication number
KR20110119666A
KR20110119666A KR1020117017431A KR20117017431A KR20110119666A KR 20110119666 A KR20110119666 A KR 20110119666A KR 1020117017431 A KR1020117017431 A KR 1020117017431A KR 20117017431 A KR20117017431 A KR 20117017431A KR 20110119666 A KR20110119666 A KR 20110119666A
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KR
South Korea
Prior art keywords
substrate
temperature
tip
cantilever
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020117017431A
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English (en)
Korean (ko)
Inventor
나빌 아. 암로
레이몬드 세인드린
제프리 알. 렌들렌
마이클 알. 넬슨
Original Assignee
나노잉크, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 나노잉크, 인크. filed Critical 나노잉크, 인크.
Publication of KR20110119666A publication Critical patent/KR20110119666A/ko
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/06—Probe tip arrays

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Radiology & Medical Imaging (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020117017431A 2009-01-26 2010-01-25 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작 Withdrawn KR20110119666A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14745109P 2009-01-26 2009-01-26
US61/147,451 2009-01-26

Publications (1)

Publication Number Publication Date
KR20110119666A true KR20110119666A (ko) 2011-11-02

Family

ID=41804775

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117017431A Withdrawn KR20110119666A (ko) 2009-01-26 2010-01-25 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작

Country Status (8)

Country Link
US (1) US20100227063A1 (https=)
EP (1) EP2389615A1 (https=)
JP (1) JP2012516064A (https=)
KR (1) KR20110119666A (https=)
AU (1) AU2010206595A1 (https=)
CA (1) CA2750434A1 (https=)
SG (1) SG172853A1 (https=)
WO (1) WO2010085770A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010085767A1 (en) * 2009-01-26 2010-07-29 Nanoink. Inc. Large area, homogeneous array fabrication including controlled tip loading vapor deposition
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
WO2010085769A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including homogeneous substrates
NL2004980A (en) * 2009-07-13 2011-01-17 Asml Netherlands Bv Heat transfers assembly, lithographic apparatus and manufacturing method.
US9645391B2 (en) 2013-11-27 2017-05-09 Tokyo Electron Limited Substrate tuning system and method using optical projection
US9735067B2 (en) 2013-11-27 2017-08-15 Tokyo Electron Limited Substrate tuning system and method using optical projection
WO2018144839A1 (en) 2017-02-02 2018-08-09 University Of Wyoming Apparatus for temperature modulation of samples

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE23838E (en) 1950-09-14 1954-06-08 Post-deflected color kinescope
US4609037A (en) * 1985-10-09 1986-09-02 Tencor Instruments Apparatus for heating and cooling articles
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US6827979B2 (en) * 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
US6635311B1 (en) 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US6642129B2 (en) 2001-07-26 2003-11-04 The Board Of Trustees Of The University Of Illinois Parallel, individually addressable probes for nanolithography
SE0102764D0 (sv) 2001-08-17 2001-08-17 Astrazeneca Ab Compounds
US7998528B2 (en) * 2002-02-14 2011-08-16 Massachusetts Institute Of Technology Method for direct fabrication of nanostructures
US7279046B2 (en) * 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US7060977B1 (en) 2002-05-14 2006-06-13 Nanoink, Inc. Nanolithographic calibration methods
EP1363164B1 (en) * 2002-05-16 2015-04-29 NaWoTec GmbH Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
WO2004044552A2 (en) * 2002-11-12 2004-05-27 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20040228962A1 (en) 2003-05-16 2004-11-18 Chang Liu Scanning probe microscopy probe and method for scanning probe contact printing
US6898084B2 (en) * 2003-07-17 2005-05-24 The Bergquist Company Thermal diffusion apparatus
WO2005115630A2 (en) 2004-04-30 2005-12-08 Bioforce Nanosciences, Inc. Method and apparatus for depositing material onto a surface
US7541062B2 (en) * 2004-08-18 2009-06-02 The United States Of America As Represented By The Secretary Of The Navy Thermal control of deposition in dip pen nanolithography
EP2013662B1 (en) 2006-04-19 2013-08-14 Northwestern University Article for parallel lithography with two-dimensional pen arrays
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
AU2008225175A1 (en) * 2007-03-13 2008-09-18 Nanoink, Inc. Nanolithography with use of viewports
JP5269887B2 (ja) * 2007-05-09 2013-08-21 ナノインク インコーポレーティッド 小型ナノファブリケーション装置
WO2009020658A1 (en) * 2007-08-08 2009-02-12 Northwestern University Independently-addressable, self-correcting inking for cantilever arrays

Also Published As

Publication number Publication date
CA2750434A1 (en) 2010-07-29
AU2010206595A1 (en) 2011-07-28
SG172853A1 (en) 2011-08-29
EP2389615A1 (en) 2011-11-30
WO2010085770A1 (en) 2010-07-29
JP2012516064A (ja) 2012-07-12
US20100227063A1 (en) 2010-09-09

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20110725

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid