JP2012247508A - Manufacturing method of pattern phase difference film, and manufacturing method of metal mold for manufacturing pattern phase difference film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture a pattern phase difference film easily in a large amount, which can be applied to a three-dimensional image display employing a passive method.SOLUTION: Concave-convex shapes for each area is formed on a metal mold through polishing with the sequential use of a first mask 29 and a second mask. At this time, after the concave-convex shape is formed through polishing via a protective film 26, the protective film 26 is removed.

Description

  The present invention relates to the manufacture of a pattern retardation film applied to a three-dimensional image display by a passive method.

  Conventionally, flat panel displays have been mainly two-dimensional displays. However, in recent years, flat panel displays capable of three-dimensional display have attracted attention, and some are also commercially available. Further, there is a tendency that future flat panel displays are capable of three-dimensional display, and flat panel displays capable of three-dimensional display are being studied in a wide range of fields.

  In order to perform three-dimensional display on a flat panel display, it is usually necessary to selectively provide a right-eye image and a left-eye image in some manner, respectively, to the viewer's right eye and left eye. As a method for selectively providing a right-eye video and a left-eye video, for example, a passive method is known. This passive three-dimensional display method will be described with reference to the drawings. FIG. 11 is a schematic diagram illustrating an example of a passive three-dimensional display using a liquid crystal display panel. In the example of FIG. 11, the pixels of the liquid crystal display panel that are continuous in the vertical direction are sequentially assigned to the right eye and the left eye, and are driven by the image data for the right eye and the left eye, respectively. And the image for the left eye are displayed simultaneously. In addition, a pattern retardation film is disposed on the panel surface of the liquid crystal display panel, and light emitted by linearly polarized light from the right-eye and left-eye pixels is converted into circularly polarized light having different directions for the right-eye and left-eye. As a result, in the passive method, glasses equipped with corresponding polarizing filters are attached, and a right eye image and a left eye image are selectively provided to the viewer's right eye and left eye, respectively.

  This passive method can also be applied to a liquid crystal display device having a low response speed, and can also perform three-dimensional display with a simple configuration using a pattern retardation film and circularly polarized glasses. For this reason, a passive liquid crystal display device has attracted much attention as a central presence of future display devices.

  By the way, the pattern phase difference film which concerns on a passive system requires the pattern phase difference layer which gives a phase difference to transmitted light corresponding to allocation of a pixel. This pattern retardation film has not been widely researched and developed yet, and there is no established standard technology.

  Regarding this pattern phase difference film, Patent Document 1 discloses a production method in which a photo-alignment film with controlled alignment regulating force is formed on a glass substrate, and the alignment of liquid crystals is patterned by this photo-alignment film. However, since the method disclosed in Patent Document 1 requires the use of a glass substrate, there is a problem that the pattern retardation film becomes expensive and it is difficult to mass-produce a large area.

  Regarding the pattern retardation film, Patent Document 2 discloses a photo-alignment film in which a fine uneven shape is formed around a roll plate by laser irradiation, and this uneven shape is transferred to control the alignment regulating force in a pattern shape. A method of making is disclosed. In the method disclosed in Patent Document 2, it is necessary to irradiate the entire circumference of the roll plate with laser without being leaked by laser scanning. Therefore, there is a problem that it takes time to produce the roll plate. There is also a problem that an expensive laser processing apparatus must be used.

JP 2005-49865 A JP 2010-152296 A

  The present invention has been made in view of such a situation, and relates to a pattern retardation film applied to a passive three-dimensional image display. A pattern retardation film capable of easily and in large quantities producing a pattern retardation film. An object of the present invention is to provide a method for producing a mold for producing a pattern retardation film.

  The present inventor has conducted extensive research to solve the above-mentioned problems, and after producing a concavo-convex shape through a protective film, the protective film is removed to manage cutting dust and the like when producing the concavo-convex shape. The idea of improving the production efficiency by eliminating the labor related to the above has led to the completion of the present invention.

    Specifically, the present invention provides the following.

  (1) In the method for producing a patterned retardation film in which the uneven shape formed on the transfer mold is transferred to a transparent sheet material to form an alignment film, the pattern retardation film is obtained by patterning the alignment film, The pattern for the right eye that gives the corresponding phase difference to the transmitted light for the right eye and the area for the left eye that gives the corresponding phase difference to the transmitted light for the left eye are alternately formed in a band shape, respectively, and the pattern A method for producing a retardation film is the first concavo-convex shape production in which the concavo-convex shape is produced in a first region corresponding to the region for the right eye or the region for the left eye on the base material related to the transfer mold. And a second concavo-convex shape producing step of producing the concavo-convex shape in a second region corresponding to the left eye region or the right eye region on the base material, the first and first The uneven shape manufacturing process of 2 The uneven shape is formed by polishing marks formed on the surface of the base material through the protective film by polishing a protective film that is formed on the surface of the base material and prevents polishing dust from adhering to the surface of the base material. A method for producing a patterned retardation film, characterized by comprising:

  (2) The first uneven shape forming step includes a first protective film forming step of forming the protective film for the first region on the surface of the base material, and a protective film for the first region. A first mask manufacturing step of manufacturing a first mask corresponding to the first region on the upper layer, and a first polishing step of polishing the entire surface of the base material from the upper layer side of the first mask And a first removing step of removing the first mask and the protective film for the first region, wherein the second concavo-convex shape producing step includes the second region on the surface of the base material. A second protective film manufacturing step of manufacturing the protective film for use, and a second mask manufacturing process for manufacturing a second mask corresponding to the second region on the protective film for the second region A second polishing step of polishing the entire surface of the base material from the upper layer side of the second mask, and the second mask The method for manufacturing a patterned retardation film according to (1) further comprising a second removal step of removing the protective film for the second region.

  (3) The first concavo-convex shape manufacturing step includes a protective film manufacturing step of manufacturing the protective film on a surface of the base material, and a first mask corresponding to the first region on the protective film. And a first polishing step for polishing the entire surface of the base material from the upper layer side of the first mask, wherein the second concavo-convex shape manufacturing step comprises the steps of: A second mask manufacturing step of manufacturing the second mask by removing the first mask after forming the second mask material on the upper layer of the first mask; and (2), comprising: a second polishing step for polishing the entire surface of the base material from an upper layer side of the mask; and a removal step for removing the second mask and the protective film. A method for producing a patterned retardation film.

  (4) A method for producing a pattern retardation film production mold for producing an alignment film of a pattern retardation film by transferring to a concavo-convex shaped transparent sheet material formed on the surface, wherein the pattern retardation film comprises: By patterning the alignment film, a right-eye region that gives a corresponding phase difference to the transmitted light for the right eye and a left-eye region that gives a corresponding phase difference to the transmitted light for the left eye are each strip-shaped. The pattern retardation film production mold is produced alternately in order, and the method for producing the pattern retardation film production mold corresponds to a first eye area or a left eye area on a base material of the pattern retardation film production mold. The uneven shape is prepared in the first uneven shape forming step for forming the uneven shape in the region, and the second region corresponding to the left eye region or the right eye region on the base material. Second concave And the first and second concavo-convex shape preparation steps include polishing the protective film formed on the surface of the base material and preventing the adhesion of polishing dust to the surface of the base material. A method for producing a mold for producing a pattern retardation film, wherein the concavo-convex shape is produced by polishing marks formed on the surface of the base material through a protective film.

  According to the present invention, it is possible to produce an uneven shape by polishing marks on the lower surface of the protective film by polishing through the protective film, so that polishing dust does not adhere to the surface of the base material by polishing through the protective film. can do. Therefore, it is possible to simplify the management related to the polishing dust and easily mass-produce the mold, and as a result, it is possible to easily and mass-produce the pattern retardation film applied to the passive three-dimensional image display. . Further, deterioration of quality due to adhesion of abrasive dust molds can also be prevented.

It is a figure which shows the pattern phase difference film which concerns on 1st Embodiment of this invention. It is a figure where it uses for description of the manufacturing method of the pattern phase difference film of FIG. FIG. 3 is a diagram showing a continuation of FIG. 2. It is a figure where it uses for description of the manufacturing method of the metal mold | die of FIG. It is a figure which shows the continuation of FIG. It is a figure which shows the continuation of FIG. It is a figure which shows the continuation of FIG. It is a figure which shows the metal mold | die preparation process used for manufacture of the pattern phase difference film which concerns on 2nd Embodiment of this invention. It is a figure which shows the continuation of FIG. FIG. 10 is a diagram showing a continuation of FIG. 9. It is a figure where it uses for description of the three-dimensional image display by a passive system.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[First Embodiment]
FIG. 1 is a view showing a pattern retardation film according to the first embodiment of the present invention. In the pattern retardation film 1, an alignment film 3 and a retardation layer 4 are sequentially formed on a base material 2 made of a transparent sheet material. In the pattern retardation film 1, the retardation layer 4 is formed of a liquid crystal material, and the alignment of the liquid crystal material is patterned by the alignment regulating force of the alignment film 3. The orientation of the liquid crystal molecules is indicated by a long and narrow ellipse in FIG. By this patterning, the pattern phase difference film 1 is formed in a band shape alternately with the right-eye area A and the left-eye area B sequentially with a certain width corresponding to the pixel assignment in the liquid crystal display panel. A phase difference corresponding to each of the light emitted from the right-eye and left-eye pixels is given.

  In the pattern retardation film 1, after the ultraviolet curable resin 5 is applied to the surface of the substrate 2, a fine uneven shape is formed on the surface of the ultraviolet curable resin 5, whereby the substrate 2 is interposed via the ultraviolet curable resin. An uneven shape is formed on the surface. In the pattern retardation film 1, the alignment film 3 is formed by the uneven shape on the surface of the ultraviolet curable resin 5. This uneven shape is formed by a streak pattern made up of a number of streaks extending in one direction, and the extending direction of each streak is set to one direction that coincides with the alignment direction of the liquid crystal material in the vicinity of the alignment film 3. Therefore, the uneven shape formed on the surface of the ultraviolet curable resin 5 is such that the extension direction of the stripes is 90 degrees different between the right eye area and the left eye area A and B, and the extension direction of each area. It is formed so as to be inclined by 45 degrees with respect to the angle. In addition, in the inclination with respect to the extension direction of each area | region, when the retardation of the base material 2 is so large that it cannot disregard, it is increased / decreased suitably according to the retardation value.

  FIG. 2 is a diagram illustrating a manufacturing process of the pattern retardation film 1. In this manufacturing process, the substrate 2 is supplied in a predetermined shape (FIG. 2A), and the ultraviolet curable resin 5 is applied to the surface of the substrate 2 with a predetermined film thickness (FIG. 2B). Subsequently, the mold 14 is pressed against the surface of the ultraviolet curable resin 5 (FIG. 3C). Here, the mold 14 is a transfer mold in which an uneven shape related to the alignment film 3 is formed on the surface. In this manufacturing process, in a state where the ultraviolet curable resin 5 is pressed by the mold 14, the ultraviolet curable resin 5 is cured by irradiating with ultraviolet rays, thereby producing an uneven shape related to the alignment film 3 on the surface of the ultraviolet curable resin 5. .

  Thereafter, as shown in FIG. 3, in this manufacturing process, after removing the base material 2 from the mold 14 and applying the liquid crystal material to the alignment film 3, the liquid crystal material is cured by irradiation with ultraviolet rays, whereby the retardation layer is formed. 4 is produced. The pattern retardation film 1 is then produced by forming an adhesive layer, an antireflection layer, and the like as necessary, and then cutting the film to a desired size. As a result, the pattern retardation film 1 is efficiently produced by processing the base material 2 by transferring the concavo-convex shape using the flat mold 14.

  FIG. 4 is a diagram showing a procedure for producing the mold 14. In this production process, the first protective film 26 is produced on the base material 25 whose surface has been polished (FIG. 4A). Here, although DLC (diamond-like carbon) is applied to the base material 25, various metal materials for molds and the like can be widely applied. The first protective film 26 is a film that prevents adhesion of polishing dust or the like to the surface of the base material 25 when the uneven shape related to the mold 14 is formed on the surface of the base material 25. A material capable of forming an uneven shape on the surface of the base material 25 under the first protective film 26 by polishing through the protective film 26 is applied. Specifically, the first protective film 26 is formed with a thin film thickness using a so-called soft metal. In this embodiment, the first protective film 26 is formed with a film thickness of 0.1 [μm] using copper.

  Subsequently, in this step, a first mask is formed on the surface of the base material 25. Here, the first mask is a mask that masks a portion corresponding to one of the region A for the right eye and the region B for the left eye, and is a mask that is used when the uneven surface is formed. Specifically, in this step, after the resist film 27 is formed on the entire surface (FIG. 4B), the resist film 27 is removed only at the portion to be masked by exposure processing, development processing, and cleaning processing (FIG. 4 ( c)). The resist film 27 may be either a positive type or a negative type. Subsequently, in this step, as shown in FIG. 5, a first mask material film 29 is formed on the entire surface (FIG. 5D). Here, the mask material film 29 functions as a protective film that protects the masked portion so that the concavo-convex shape does not occur in the lower layer in the polishing process when forming the concavo-convex shape. Therefore, the first mask material film 29 is made of a hard metal. In this embodiment, the first mask material film 29 is made by forming a chromium film by sputtering.

  Subsequently, in this step, the resist film 27 is removed, thereby exposing the first protective film 26 locally (FIG. 5E). In this way, this step forms the first mask by patterning the first mask material protective film 29. Subsequently, in this step, the surface is polished to form an uneven shape on the entire surface (FIG. 5F). In addition, as this polishing method, various methods relating to the alignment film manufacturing technique, such as grindstone polishing, paper polishing, and tape polishing, can be widely applied. Here, since the base material 25 is provided with the first mask made of the first mask material film 29, the first protective film 26 is selectively formed in a portion not masked by the first mask. Polished. As a result, a polishing mark is produced on the surface of the base material 25 which is the lower layer where the first protective film 26 is selectively polished. In this step, the polishing process is performed so that the polishing marks have a concavo-convex shape corresponding to the region for the right eye or the region for the left eye of the pattern retardation film. Although polishing dust is generated during this polishing, in this embodiment, since the surface of the base material 25 is covered with the first protective film 26, the polishing dust is transferred to the surface of the base material 25. Is prevented from sticking. Therefore, in this step, the management related to the polishing dust can be greatly simplified as compared with the conventional case, and as a result, the pattern retardation film can be mass-produced by a simple step. Moreover, since the adhesion of the polishing dust can be prevented by simple management, it is possible to effectively avoid the deterioration of the quality due to the adhesion of the polishing dust to the mold.

  Subsequently, in this step, the first mask material film 29 and the first protective film 26 are removed by etching (FIG. 5G). Through this series of processes, this process creates an uneven shape on the surface of the base material 25 for the region corresponding to the right eye region or the left eye region of the pattern retardation film 1. In this step, an uneven shape is similarly formed on the surface of the base material 25 for the remaining region by repeating the same process, and the mold 14 is manufactured.

  That is, in this step, the second protective film 36 and the resist film 37 are sequentially formed on the entire surface (FIG. 6H). Here, the second protective film is a protective film having the same function as that of the first protective film 26 with respect to the remaining region, and is produced in the same manner as the first protective film 26. The resist film 37 is formed in the same manner as the resist film 27. Subsequently, in this step, the resist film 37 is selectively left in the remaining region by exposure processing, development processing, and cleaning processing of the resist film 37 (FIG. 6I). Subsequently, in this step, a second mask material film 39 is formed on the entire surface (FIG. 6J), and the second protective film is formed on the remaining region by removing the resist film 37 as shown in FIG. A second mask exposing 36 is prepared (FIG. 7K). Subsequently, in this step, the entire surface is polished, thereby forming the uneven shape corresponding to the surface of the base material 25 in the remaining region (FIG. 7L). Thus, with respect to the remaining area, in this embodiment, the management of the polishing dust can be significantly reduced as compared with the conventional case, and adhesion to the surface of the base material 25 can be prevented. Quality pattern retardation film can be mass-produced.

  Subsequently, in this step, the second mask material film 39 and the second protective film 36 are removed by etching, whereby the mold 14 is completed (FIG. 7M).

  In this embodiment, an uneven shape can be produced by polishing marks on the lower layer surface of the protective film by polishing through the protective film, and polishing dust can be prevented from adhering to the surface of the base material. Therefore, it is possible to simplify the management related to the polishing dust and easily mass-produce the mold, and as a result, it is possible to easily and mass-produce the pattern retardation film applied to the passive three-dimensional image display. . Moreover, deterioration of quality due to adhesion of abrasive dust to the mold can be prevented.

  More specifically, by forming a concavo-convex shape with a corresponding mask for each region, and preparing a protective film for each region, the protective film once subjected to polishing is polished to adhere to this protective film. By removing dust and the like together, it is possible to prevent the cutting dust adhering to the protective film from affecting the subsequent process, and this also makes it possible to produce a high-quality mold more easily and reliably. .

[Second Embodiment]
8-10 is a figure which shows the manufacturing process of the metal mold | die which concerns on 2nd Embodiment of this invention. The second embodiment is configured in the same manner as the first embodiment except that the mold produced by the steps of FIGS. 8 to 10 is used.

  Here, in this manufacturing process, a first protective film 26 (FIG. 8A) and a resist film 27 are sequentially formed from copper on a DLC base material 25 having a polished surface (FIG. 8B). Further, after the resist film 27 is patterned by exposure processing, development processing, and cleaning processing (FIG. 8C), a first mask material film 29 made of chromium is formed on the entire surface (FIG. 9D). ). Subsequently, a first mask is produced by removing the resist film 27 (FIG. 9E). In this manufacturing process, the entire surface is polished using the first mask, and a concavo-convex shape is formed in a region related to the mask (FIG. 9F).

  Subsequently, in this step, a second mask material film 41 is formed on the entire surface while leaving the first mask (FIG. 10G). Subsequently, the mask material film 29 related to the first mask is removed by etching, whereby a second mask is produced by the second mask material film 41 (FIG. 10H). Even in the film 41, a hard material is applied because it functions as a protective film when a concave-convex shape to be described later is produced, and in this step, the mask material film 29 related to the first mask is selectively used. Since the second mask is manufactured by removing the mask material film 41, the mask material is different from the mask material film 29 according to the first mask, and the mask material film 29 can be selectively etched. A material different from the material film 29 is applied to the mask material film 41. Specifically, in this embodiment, titanium is applied to the mask material film 41 and formed by sputtering. Mask material film 41 Ri can be applied to various metal materials by the relationship between the material to be applied to a mask material film 29.

  Subsequently, in this step, after the entire surface is polished to form a concavo-convex shape in the remaining region (FIG. 10 (i)), the second mask material film 41 and the protective film 26 are removed by etching, and the mold 44 is formed. It is manufactured (FIG. 10 (j)).

  In this embodiment, even when the second mask is manufactured using the first mask, the same effect as that of the first embodiment can be obtained.

  Further, in the production of the concavo-convex shape using the first and second masks, the process can be simplified because the protective film can also be used.

[Other Embodiments]
The specific configuration suitable for the implementation of the present invention has been described in detail above, but the present invention can be variously modified and further combined with the configuration of the above-described embodiment without departing from the spirit of the present invention. .

  Moreover, although the above-mentioned embodiment described the case where the fine uneven | corrugated shape was produced by grinding | polishing, this invention is not limited to this, For example, it can apply widely, also when producing an uneven | corrugated shape by a rubbing process.

  Moreover, although the above-mentioned embodiment described the case where this invention is applied to flat metal mold | die preparation, this invention is not limited to this, It can apply also to preparation of a roll plate.

  In the above-described embodiment, the case where a pattern retardation film is prepared on the premise of using a liquid crystal display panel is described, but the present invention is not limited to this, and on the premise of using an organic EL panel or a plasma display panel. The present invention can be widely applied also when the polarizing filter is provided integrally.

DESCRIPTION OF SYMBOLS 1 Pattern phase difference film 2 Base material 3 Orientation film 4 Phase difference layer 5 UV curable resin 14,44 Mold 25 Base material 26,36 Protective film 27,37 Resist film 29,39,41 Mask material film

Claims (4)

In the method for producing a pattern phase difference film in which an uneven film formed on a transfer mold is transferred to a transparent sheet material to form an alignment film.
The pattern retardation film is
By patterning the alignment film, a right-eye region that gives a corresponding phase difference to the transmitted light for the right eye and a left-eye region that gives a corresponding phase difference to the transmitted light for the left eye are each strip-shaped. Formed one after the other,
The method for producing the pattern retardation film is as follows.
A first concavo-convex shape producing step of producing the concavo-convex shape in a first region corresponding to the region for the right eye or the region for the left eye on the base material related to the transfer mold;
A second concavo-convex shape producing step of producing the concavo-convex shape in a second region corresponding to the left eye region or the right eye region on the base material,
The first and second concavo-convex shape manufacturing steps include:
By polishing the protective film formed on the surface of the base material and preventing polishing dust from adhering to the surface of the base material, the uneven shape is formed by polishing marks formed on the surface of the base material through the protective film. A method for producing a patterned retardation film, characterized by comprising: The first uneven shape manufacturing step includes:
A first protective film production step of producing the protective film for the first region on the surface of the base material;
A first mask manufacturing step of manufacturing a first mask corresponding to the first region on an upper layer of the protective film for the first region;
A first polishing step of polishing the entire surface of the base material from the upper layer side of the first mask;
A first removal step of removing the first mask and the protective film for the first region,
The second uneven shape manufacturing step includes:
A second protective film production step of producing the protective film for the second region on the surface of the base material;
A second mask production step of producing a second mask corresponding to the second region on the upper layer of the protective film for the second region;
A second polishing step of polishing the entire surface of the base material from the upper layer side of the second mask;
The method for producing a patterned retardation film according to claim 1, further comprising: a second removal step of removing the second mask and the protective film for the second region. The first uneven shape manufacturing step includes:
A protective film production step of producing the protective film on the surface of the base material;
A first mask manufacturing step of manufacturing a first mask corresponding to the first region on the protective film;
A first polishing step of polishing the entire surface of the base material from the upper layer side of the first mask,
The second uneven shape manufacturing step includes:
A second mask manufacturing step of forming the second mask by forming the second mask material on the first mask and then removing the first mask;
A second polishing step of polishing the entire surface of the base material from the upper layer side of the second mask;
The method for producing a patterned retardation film according to claim 1, further comprising: a removing step of removing the second mask and the protective film. A method for producing a mold for producing a pattern retardation film, which produces an alignment film of a pattern retardation film by transferring to a concavo-convex shaped transparent sheet material formed on the surface,
The pattern retardation film is
By patterning the alignment film, a right-eye region that gives a corresponding phase difference to the transmitted light for the right eye and a left-eye region that gives a corresponding phase difference to the transmitted light for the left eye are each strip-shaped. Formed one after the other,
The method for producing the mold for producing the pattern retardation film is as follows.
A first concavo-convex shape producing step for producing the concavo-convex shape in a first region corresponding to the region for the right eye or the region for the left eye on the base material of the mold for producing the pattern retardation film;
A second concavo-convex shape producing step of producing the concavo-convex shape in a second region corresponding to the left eye region or the right eye region on the base material,
The first and second concavo-convex shape manufacturing steps include:
By polishing the protective film formed on the surface of the base material and preventing polishing dust from adhering to the surface of the base material, the uneven shape is formed by polishing marks formed on the surface of the base material through the protective film. A method for producing a mold for producing a pattern retardation film, characterized by comprising:

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