JP2012225973A - Manufacturing method of liquid crystal device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of manufacturing a liquid crystal device excellent in display characteristics with high productivity.SOLUTION: There is provided a manufacturing method of a liquid crystal device in which positions corresponding to pixel electrodes 9 are defined as display areas P and positions among the display areas P are defined as non-display areas BM comprising: a first substrate 10 provided with the pixel electrodes 9; a second substrate arranged opposite thereto; and a liquid crystal layer held between the first substrate 10 and the second substrate. The manufacturing method of the liquid crystal device comprises the steps of: forming the pixel electrodes 9 at the positions defined as the display areas P and further forming peripheral portions thereof at the positions defined as the non-display areas BM; forming vertical alignment layers 41 at the positions defined as the display areas P on the pixel electrodes 9; and forming horizontal alignment layers 42 on at least the peripheral portions of the pixel electrodes 9 of the non-display areas BM. In this case, the horizontal alignment layers 42 are formed by performing a rubbing process on an alignment layer 42a on a substrate 10A and by modifying a surface thereof using a resist pattern R as a mask, a material of the vertical alignment layers 41 is formed.

Description

  The present invention relates to a method for manufacturing a liquid crystal device.

  There is a liquid crystal projector as a device for displaying an image on a large screen using a liquid crystal device. Projectors are required to have high brightness and high contrast, and in that respect, a vertical alignment type liquid crystal device is capable of displaying high contrast, and has recently been adopted as a liquid crystal alignment method for liquid crystal devices for projectors.

  However, in the vertical alignment method, the liquid crystal stands perpendicular to the substrate surface, and the interaction in the azimuth direction that falls when a voltage is applied is weak. Moreover, when a pixel potential is applied, a horizontal electric field is generated in a direction parallel to the substrate surface from the end of the pixel electrode. Therefore, due to the electric field in the lateral direction, the liquid crystal may fall in various directions, resulting in disclination. When disclination occurs, display defects such as light and dark unevenness, a decrease in contrast, and an afterimage are visually recognized.

  Therefore, liquid crystal is vertically aligned in the display area to ensure good contrast characteristics, and liquid crystal is horizontally aligned around the pixel area, mainly in the non-display area to prevent disclination by regulating the liquid crystal alignment. It is possible to do. A liquid crystal device having such a configuration is disclosed in Patent Document 1. In the liquid crystal device of Patent Document 1, a vertical alignment film is formed in a display region, and a horizontal alignment film made of an organic material is formed in a non-display region. This regulates the orientation of the liquid crystal.

JP 2008-216739 A JP 2009-294544 A

However, in the liquid crystal device described in Patent Literature 1, since different alignment films of an inorganic material and an organic material are formed in the display region and the non-display region, a step is likely to occur between the display region and the non-display region. However, there is a problem that the disclination is likely to occur.
Moreover, since the ease of attracting impurities in the liquid crystal is different between the inorganic material and the organic material, a phenomenon that the impurity is easily adsorbed to one material has occurred. Therefore, there is a problem that it is difficult to suppress display defects such as burn-in and afterimage.

  Further, in the liquid crystal device described in Patent Document 2, different alignment films are formed in the display region and the non-display region by irradiating with ultraviolet rays in the vacuum ultraviolet region. It is technically difficult to manufacture a device that irradiates ultraviolet rays in the vacuum ultraviolet region.

  The present invention has been proposed in view of the above-described problems of the prior art, and can accurately and efficiently pattern an alignment film to produce a liquid crystal device with good display quality with high productivity. An object is to provide a manufacturing method.

  Application Example 1 A method for manufacturing a liquid crystal device according to this application example includes a first substrate having a plurality of pixel electrodes, a second substrate disposed opposite to the first substrate, and a space between these substrates. A liquid crystal layer sandwiched between the liquid crystal layer, the liquid crystal layer is formed of a liquid crystal having an initial alignment state of vertical alignment and negative dielectric anisotropy, and a position corresponding to the pixel electrode is a display region, A method of manufacturing a liquid crystal device in which a display area is a non-display area, wherein the pixel electrode is formed at a position to be a display area of the first substrate, and a peripheral portion thereof is a position to be the non-display area And a step of forming a first alignment layer for aligning the liquid crystal substantially vertically on the pixel electrode at least at a position to be the display region, and a pixel electrode of the first substrate At least in front and in the non-display area Forming a second alignment layer for aligning the liquid crystal at a predetermined azimuth angle, and the step of forming the second alignment layer includes a pixel electrode side of the first substrate on which the pixel electrode is formed. Forming an alignment base layer, covering the alignment base layer, forming the second alignment layer, forming a resist pattern at a location to be the non-display region, and forming the resist pattern A step of modifying the surface of the second alignment layer using a mask, and a step of forming the first alignment layer is a step of removing the resist pattern and covering the alignment base layer. Forming an alignment layer.

  According to this application example, the second alignment layer for aligning the liquid crystal at a predetermined azimuth angle is formed on the peripheral edge (second area) of the pixel electrode extending from the display region side to the non-display region side. Therefore, the liquid crystal on the periphery is aligned in a uniform direction when a pixel potential is applied. Therefore, the liquid crystal in the display area (first area) is regulated in the direction of alignment by the liquid crystal on the peripheral edge, and is not affected by the lateral electric field generated in the direction substantially parallel to the substrate from the pixel electrode end. It becomes oriented in a certain direction. Therefore, it is possible to manufacture a liquid crystal device in which alignment failure of liquid crystal in the display area is prevented and disclination is prevented.

  Further, the liquid crystal arranged in the display region (first area) is regulated in the direction of alignment by the pixel electrode peripheral portion (second area), so that no voltage is applied. Even when the vertical alignment is performed at approximately 0 degrees, when a voltage is applied, the films are aligned in a uniform direction, and disclination is prevented in the display area. Therefore, a liquid crystal device having good contrast characteristics and preventing display defects can be manufactured.

  Further, since the second area for aligning the liquid crystal at a predetermined azimuth angle is formed on the peripheral portion that protrudes from the non-display area of the pixel electrode, that is, only outside the display area, Only the liquid crystal vertically aligned at about 0 degrees is arranged. Therefore, the transmittance of the pixels becomes uniform within the same pixel, and a desired transmittance can be obtained. Therefore, it is possible to manufacture a liquid crystal device in which a decrease in display contrast of each pixel due to the transmittance not being desired.

  In the step of forming the second alignment layer, since the second alignment layer is formed on the entire surface of the pixel electrode, it is possible to easily apply an alignment regulating force to the liquid crystal.

  Moreover, since the well-known technique can be applied to the formation method of a resist pattern, a 1st orientation layer and a 2nd orientation layer can be arrange | positioned simply.

  Application Example 2 In the method for manufacturing a liquid crystal device according to the application example described above, the step of forming the first alignment layer includes reacting a silane coupling agent containing a long-chain alkyl group by a gas phase treatment, and A step of forming a long-chain alkyl chain serving as a first alignment layer, and a step of forming the second alignment layer comprises reacting a silane coupling agent containing a short-chain alkyl group by gas phase treatment, Preferably, the method includes a step of forming a short-chain alkyl chain serving as the second alignment layer, and a step of aligning the surface on which the short-chain alkyl chain is formed in a fixed azimuth direction. Here, examples of the step for the alignment treatment include means such as rubbing, optical alignment, and ion beam alignment.

In this way, the step between the portion where the first alignment layer is formed and the portion where the second alignment layer is formed can be almost ignored, so that the occurrence of disclination due to the step can be suppressed. it can.
Moreover, since both the first alignment layer material and the second alignment layer material are silane coupling agents, the impurities in the liquid crystal are suppressed from adhering to only one alignment layer material. Therefore, display defects such as burn-in can be suppressed.

  Application Example 3 In the method for manufacturing a liquid crystal device according to the application example described above, the step of aligning the surface on which the short-chain alkyl chain is formed in a fixed azimuth direction includes the first alignment layer forming portion and the first alignment layer. It is preferable to include a step of performing an alignment process in a state where the resist pattern is not covered at any of the two alignment layer forming portions. Examples of the alignment treatment include rubbing, optical alignment, ion beam alignment, and the like.

  In this way, since the alignment process can be performed on the flat alignment layer, it is possible to suppress display defects due to insufficient alignment regulating force.

  Application Example 4 In the method for manufacturing a liquid crystal device according to the application example described above, it is preferable that the long alkyl chain has 10 to 20 carbon atoms and the short alkyl chain has 1 to 3 carbon atoms. preferable.

  In this way, an alkyl chain having a length suitable for the vertical alignment film and an alkyl chain having a length suitable for the horizontal alignment film can be appropriately formed.

  Application Example 5 A method of manufacturing a liquid crystal device according to this application example includes a first substrate having a plurality of pixel electrodes, a second substrate disposed opposite to the first substrate, and a space between these substrates. A liquid crystal layer sandwiched between the liquid crystal layer, the liquid crystal layer is formed of a liquid crystal having an initial alignment state of vertical alignment and negative dielectric anisotropy, and a position corresponding to the pixel electrode is a display region, A method of manufacturing a liquid crystal device in which a display area is a non-display area, wherein the pixel electrode is formed at a position to be a display area of the first substrate, and a peripheral portion thereof is a position to be the non-display area And a step of forming a first alignment layer for aligning the liquid crystal substantially vertically on the pixel electrode at least at a position to be the display region, and a pixel electrode of the first substrate At least in front and in the non-display area Forming a second alignment layer for aligning the liquid crystal at a predetermined azimuth angle, and the step of forming the second alignment layer includes a pixel electrode side of the first substrate on which the pixel electrode is formed. Forming an alignment base layer, covering the alignment base layer, forming the first alignment layer, forming a resist pattern at the first alignment layer formation site, and the resist pattern A step of modifying the surface of the first alignment layer using the mask as a mask, a step of forming a second alignment layer covering the resist pattern, and a step of removing the resist pattern thereafter. It is characterized by having.

  According to this application example, in the step of forming the second alignment layer, when the second alignment layer material is disposed on the first substrate, the first alignment layer is covered with the resist pattern. When the resist pattern is removed, the second alignment layer material attached to the pattern is removed together with the resist pattern. Therefore, even if the second alignment layer material is disposed on the entire surface including the resist pattern, the second alignment layer material is prevented from adhering to the first alignment layer, and the first alignment layer is prevented. It is prevented that the orientation of is impaired. Therefore, when a voltage is applied to the liquid crystal, the liquid crystal in the periphery of the display region can be aligned well, and a liquid crystal device with favorable display characteristics can be obtained. In addition, since the first alignment film material can be disposed on the entire surface including the resist pattern, the first alignment layer can be formed efficiently.

  Application Example 6 In the method for manufacturing a liquid crystal device according to the application example described above, the step of forming the first alignment layer includes reacting a silane coupling agent containing a long-chain alkyl group by a gas phase treatment, and A step of forming a long-chain alkyl chain serving as a first alignment layer, and a step of forming the second alignment layer comprises reacting a silane coupling agent containing a short-chain alkyl group by gas phase treatment, Preferably, the method includes a step of forming a short-chain alkyl chain serving as the second alignment layer, and a step of aligning the surface on which the short-chain alkyl chain is formed in a fixed azimuth direction. Here, examples of the step for the alignment treatment include means such as rubbing, optical alignment, and ion beam alignment.

In this way, the step between the portion where the first alignment layer is formed and the portion where the second alignment layer is formed can be almost ignored, so that the occurrence of disclination due to the step can be suppressed. it can.
Moreover, since both the first alignment layer material and the second alignment layer material are silane coupling agents, the impurities in the liquid crystal are suppressed from adhering to only one alignment layer material. Therefore, display defects such as burn-in can be suppressed.

  Application Example 7 In the liquid crystal device according to the application example described above, in the step of aligning the surface on which the short-chain alkyl chain is formed in a certain azimuth direction, the resist pattern is covered at the first alignment film formation portion. It is preferable to have a step of performing an orientation treatment in a wet state. Examples of the alignment treatment include rubbing, optical alignment, ion beam alignment, and the like.

  In this way, since the alignment process can be performed with the pixel electrode covered with the resist pattern, it is possible to prevent the pixel electrode from being directly aligned. Accordingly, display defects such as alignment processing unevenness due to direct alignment processing of the pixel electrodes are prevented, and the first alignment layer is not directly aligned, so that the alignment regulating power of the first alignment layer is prevented. Is not impaired and can have good contrast characteristics.

  Application Example 8 In the method for manufacturing a liquid crystal device according to the application example described above, it is preferable that the long alkyl chain has 10 to 20 carbon atoms and the short alkyl chain has 1 to 3 carbon atoms. preferable.

  In this way, an alkyl chain having a length suitable for the vertical alignment film and an alkyl chain having a length suitable for the horizontal alignment film can be appropriately formed.

1 is an equivalent circuit diagram of a liquid crystal device according to the present invention. The schematic diagram which planarly viewed the principal part of the display part of the liquid crystal device. XX sectional drawing of FIG. The figure which shows typically the orientation of a liquid crystal when a voltage is applied. Explanatory drawing of the manufacturing method of the liquid crystal device in Embodiment 1 which concerns on this invention. Explanatory drawing of the manufacturing method of the liquid crystal device in Embodiment 1 which concerns on this invention. Explanatory drawing of the manufacturing method of the liquid crystal device in Embodiment 1 which concerns on this invention. Explanatory drawing of the manufacturing method of the liquid crystal device in Embodiment 2 which concerns on this invention. Explanatory drawing of the manufacturing method of the liquid crystal device in Embodiment 2 which concerns on this invention. FIG. 14 is a perspective view illustrating some examples of the electronic apparatus according to the invention. The figure which shows an example about the projection type display apparatus which concerns on this invention.

  (Embodiment 1)

  Hereinafter, an embodiment of the present invention will be described by taking as an example a manufacturing method of an active matrix type transmissive liquid crystal device using a TFT (Thin-Film-Transistor) element, but the technical scope of the present invention is the following embodiment. It is not limited. In the drawings used for the following description, the scale of each member is appropriately changed in order to make each member a recognizable size.

  First, prior to the description of the manufacturing method of the present invention, the configuration of a liquid crystal device (transmission type liquid crystal device) 1 obtained by the manufacturing method of the present invention will be described with reference to FIGS.

FIG. 1 is an equivalent circuit diagram of switching elements, signal lines, etc. in a plurality of pixels arranged in a matrix of the transmissive liquid crystal device 1.
As shown in FIG. 1, a plurality of pixels arranged in a matrix are formed with a pixel electrode 9 and a TFT element 30 as a switching element for controlling energization to the pixel electrode 9, respectively. Is supplied to the source of the TFT element 30. Image signals S1, S2,..., Sn to be written to the data line 6a are supplied line-sequentially in this order, or are supplied for each group to a plurality of adjacent data lines 6a.

  Further, the scanning line 3a is electrically connected to the gate of the TFT element 30, and the scanning signals G1, G2,..., Gm are pulse-sequentially line-sequentially at a predetermined timing with respect to the plurality of scanning lines 3a. Applied. Further, the pixel electrode 9 is electrically connected to the drain of the TFT element 30, and the image signal S1, S2,... Supplied from the data line 6a is turned on by turning on the TFT element 30 as a switching element for a certain period. .., Sn is written at a predetermined timing.

Image signals S1, S2,..., Sn written at a predetermined level on the liquid crystal via the pixel electrode 9 are held for a certain period with a common electrode described later. The liquid crystal modulates light by changing the orientation and order of the molecular assembly according to the applied voltage level, thereby enabling gradation display. Here, in order to prevent the held image signal from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9 and the common electrode.

  FIG. 2 is a diagram illustrating a display unit of the transmissive liquid crystal device 1, and is a schematic diagram viewed from the surface side on which the alignment film (not shown) of the first substrate on which the pixel electrodes 9 are arranged is formed. is there. The display unit of the liquid crystal device is provided in the display area P provided inside corresponding to the pixel electrode 9 (periphery 9a), and between the display areas P, that is, at a position surrounded by the display area P. The pixel electrode 9 is arranged so that the peripheral edge of the pixel electrode 9 protrudes from the non-display area BM. The first area A1 is formed to include at least the entire display area P, and the second area A2 is formed in the non-display area BM.

  FIG. 3 is a schematic diagram of a cross section taken along line XX of FIG. As shown in FIG. 3, the transmissive liquid crystal device 1 includes a first substrate 10, a second substrate 20, and a liquid crystal layer 50 sandwiched between these substrates. The first substrate 10 includes a transparent substrate 10A such as glass, the pixel electrode 9 and the light shielding film 13 formed on the substrate 10A, a first alignment layer (vertical alignment film) 41, a second alignment layer ( Horizontal alignment film) 42, alignment base layer 43, and the like. TFT elements (not shown), wirings (not shown), and the like are formed on the light shielding film 13, and light incident from the substrate 10A side does not hit the TFT elements. Further, since the light shielding film 13 is formed, the non-display area BM is defined, and the display area P is defined as a pixel opening between the non-display areas BM.

  Further, a first area A1 is formed on the first substrate 10 so as to include at least the display region P, and the peripheral portion formed by projecting from at least the non-display region of the pixel electrode 9 in the non-display region BM. A second area A2 is formed including 9b. As shown in FIG. 3, the first area A1 and the second area A2 are provided continuously. A first alignment layer (vertical alignment film) 41 is formed on the pixel electrode 9 corresponding to the first area A1, and the light shielding film 13 and the pixel electrode 9 corresponding to the second area A2. A second alignment layer (horizontal alignment film) 42 is formed thereon, and an alignment base layer 43 is formed as a base for the first alignment layer and the second alignment layer.

  The second substrate 20 includes a transparent substrate 20A made of glass or the like, a first alignment layer (vertical alignment film) 61, an alignment base layer 63, a common electrode 21, and the like. The light shielding film 13 may also be formed on the second substrate side.

  FIG. 4 is a diagram schematically showing the alignment of the liquid crystal when a voltage is applied between the pixel electrode 9 and the common electrode 21. When a voltage is applied between the pixel electrode 9 and the common electrode 21, the liquid crystal in the liquid crystal layer 50 is aligned according to the voltage, and the light transmitted in the thickness direction of the transmissive liquid crystal device 1 is modulated. The liquid crystal device 1 can perform gradation display.

At this time, in the transmissive liquid crystal device 1 of the present invention, the liquid crystal 52 positioned in the second area A2 is aligned at a predetermined pretilt angle in a state where no voltage is applied. Align in a tilted direction. Therefore, the liquid crystal 51 located in the first area A1 is oriented in a uniform direction, with the liquid crystal 52 restricting the direction of tilting when a voltage is applied. That is, the liquid crystal located in the vicinity of the second area A2 in the first area A1 is greatly affected by the operation of the liquid crystal 52 on the peripheral edge portion 9b of the pixel electrode 9 serving as the outer peripheral portion of the second area A2. In particular, the direction in which the liquid crystal 52 falls is restricted to the direction in which the liquid crystal 52 on the peripheral edge 9b falls.
As a result, the liquid crystals 51 in the first area A1 all fall down in a uniform direction and are uniformly aligned. Therefore, even if a lateral electric field is generated in the direction parallel to the first substrate 10 from the end of the pixel electrode 9, the liquid crystal 51 in the display region P is prevented from causing alignment failure.

  Further, since the liquid crystal 52 having an orientation different from that of the liquid crystal 51 corresponding to the display region P is disposed only in the non-display region BM, the transmittance of the pixel corresponding to the display region (pixel opening) P is the liquid crystal 51. It is specified only and becomes uniform. Therefore, the transmittance of the pixel can be made desired. In addition, the liquid crystal 51 corresponding to the display region P can be aligned substantially vertically without applying a voltage because the alignment defect is prevented.

  Next, an embodiment of a method for manufacturing a liquid crystal device according to the present invention will be described using the method for manufacturing the transmissive liquid crystal device 1 as an example.

5-7 is a figure explaining the manufacturing method of the said transmissive liquid crystal device 1 (liquid crystal device).
First, as shown in FIG. 5A, a light shielding film 13 made of Cr (chromium) or the like is formed in a lattice pattern on a transparent substrate 10A made of glass or the like, and the non-display area BM is defined by the light shielding film 13. In addition, a region surrounded by the non-display region BM is set as a display region (pixel opening) P. Subsequently, the TFT element 30, the data line 6a, the scanning line 3a, and the like shown in FIG. Next, the pixel electrode 9 is formed by using a transparent conductor such as ITO (indium tin oxide) so as to protrude from the display region P to the non-display region BM. A known method can be used for these steps.

Next, as shown in FIG. 5B, a sol-gel-based SiO ₂ film is formed on the pixel electrode 9 side of the substrate 10A on which the pixel electrode 9 is formed by using a method such as spin coating, and the alignment is performed. An underlayer 43 is formed. Thereafter, the alignment underlayer 43 is surface-modified by irradiating the alignment underlayer 43 with vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp. Thereafter, a short-chain silane coupling agent is surface-treated on the SiO ₂ film to form the alignment layer 42a. As a material for this short chain silane coupling agent, for example, hexamethyldisilazane or the like is used.

  And as shown in FIG.5 (c), the rubbing process apparatus 55 which wound the rubbing cloth around the roller performs the rubbing process on the whole surface of the alignment layer 42a, and provides orientation to the alignment layer 42a. At this time, since a vertical alignment film (first alignment layer) to be described later is not formed, there is no inconvenience that alignment is imparted to the vertical alignment film.

  Next, as shown in FIG. 6A, a resist pattern R is formed at the second alignment layer formation portion of the alignment layer 42a. Then, by using this resist pattern R as a mask and irradiating with vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp, as shown in FIG. 6B, a horizontal alignment film (second alignment layer) is obtained. 42 is formed. By forming the horizontal alignment film 42, the second area A2 can be formed on the horizontal alignment film 42. Further, the area between the second areas A2 is defined as the first area A1. Thereafter, the resist pattern R covering the horizontal alignment film 42 is peeled off.

Next, a vertical alignment film is formed at a position that becomes the first area A1 of the substrate 10A on which the horizontal alignment film 42 is formed. First, a drying process is performed on the substrate 10A for about 3 hours at a temperature of about 150 to 180 ° C. in an N ₂ atmosphere, for example. Thereafter, the substrate 10A is left in a sealed container together with a container having a decyltrimethoxysilane solution, for example. Then, for example, by heating the container at a temperature of 150 ° C. for one hour, the vapor of the decyltrimethoxysilane solution is brought into contact with the alignment base layer 43 on the substrate 10A, and as shown in FIG. A film (first alignment layer) 41 is formed.

At this time, since the horizontal alignment film 42 is densely adhered, the vertical alignment film material is prevented from adhering to the upper surface of the horizontal alignment film 42.
Thus, the first substrate 10 provided with the vertical alignment film 41 in the first area A1 and the horizontal alignment film 42 in the second area A2 is formed.

In addition to the first substrate 10, the second substrate 20 is formed as shown in FIG. In the second substrate 20, a common electrode 21 is formed on a substrate 20 </ b> A made of a transparent material such as glass using a transparent conductor such as ITO, and the alignment base layer 63 and the vertical alignment are formed on the common electrode 21. A film 61 is formed. A sputtering method or the like is used to form the common electrode 21. For example, after forming a sol-gel SiO ₂ film by spin coating, the alignment underlayer 63 is subjected to surface modification by irradiating the alignment underlayer 63 with vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp, and then decyl tri-layer. Methoxysilane is surface-treated on the alignment base layer 63 to form the vertical alignment film 61.

  Next, as shown in FIG. 7B, the first substrate 10 and the second substrate 20 are divided into vertical alignment films (first alignment layers) 41 and 61 and a horizontal alignment film (second alignment layer) 42. 7a and 7b, and the liquid crystal layer 50 is sealed between the first substrate 10 and the second substrate 20 to form the transmissive liquid crystal device 1 as shown in FIG. 7C. .

  According to the above manufacturing method, even if the first alignment layer material is surface-treated on the entire surface of the substrate 10A, the first alignment layer material is prevented from adhering to the second alignment layer. . Thus, a liquid crystal device with good display quality can be manufactured. In addition, the second alignment layer 42 and the first alignment layer 41 can be efficiently formed, and thus the liquid crystal device (transmission type liquid crystal device) 1 can be manufactured with high productivity.

In the present embodiment, the second area A2 is continuously formed between the peripheral edge of the pixel electrode 9 and the area between the pixel electrodes 9, but may be formed only on the peripheral edge 9b of the pixel electrode 9. Further, although the light shielding film 13 is formed of Cr or the like to define the non-display area BM, for example, the non-display area BM may be defined by a wiring electrode or the like.
(Embodiment 2)

8 and 9 are explanatory diagrams of the above-described transmissive liquid crystal device (liquid crystal device) manufacturing method according to the second embodiment. The liquid crystal device according to the present embodiment will be described with reference to these drawings. In addition, about the component same as Embodiment 1, the same number is used and the overlapping description is abbreviate | omitted.
Since FIG. 8A is the same as FIG. 5A of the first embodiment, the description is omitted.
Next, as shown in FIG. 8B, a sol-gel SiO ₂ film is formed on the pixel electrode 9 side of the substrate 10A on which the pixel electrode 9 is formed, using a method such as spin coating, for example. An alignment underlayer 43 is formed. Thereafter, the alignment underlayer 43 is surface-modified by irradiating the alignment underlayer 43 with vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp. Thereafter, a long-chain silane coupling agent is surface-treated on the SiO ₂ film to form the alignment layer 41b. As a material for this long-chain silane coupling agent, for example, decyltrimethoxysilane or the like is used.

  Next, as shown in FIG. 9A, a resist pattern R is formed at the first alignment layer forming portion of the alignment layer 41b. Then, by using this resist pattern R as a mask and irradiating vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp, as shown in FIG. 9B, a vertical alignment film (first alignment layer) 41 is formed. By forming the vertical alignment film 41, the first area A1 can be formed on the vertical alignment film 41. Further, the area between the first areas A1 is defined as the second area A2. The resist pattern R covering the vertical alignment film 41 is held as it is without being removed.

  Next, a horizontal alignment film is formed at a position to be the second area A2 of the substrate 10A on which the vertical alignment film 41 is formed. By irradiating the substrate 10A with vacuum ultraviolet light using a low-pressure mercury lamp or excimer UV lamp, the surface of the vertical alignment film 41 formed at the position to be the second area A2 is modified. Thereafter, the resist pattern R is covered with a short-chain silane coupling agent and surface-treated to form the alignment layer 42b. As a material for this short chain silane coupling agent, for example, hexamethyldisilazane or the like is used.

  At this time, since the upper surface of the vertical alignment film 41 is covered with the resist pattern R, the material of the horizontal alignment film is prevented from adhering to the upper surface of the vertical alignment film 41.

  Next, as shown in FIG. 9C, a rubbing treatment device 55 in which a rubbing cloth is wound around a roller performs rubbing treatment on the entire surface of the alignment layer 42b, thereby imparting orientation to the alignment layer 42b. At this time, since the rubbing process is performed with the vertical alignment film 41 covered with the resist pattern R, the vertical alignment film 41 is protected from the rubbing process, and the vertical alignment film 41 is prevented from being damaged such as rubbing marks. In addition, the material of the horizontal alignment film is prevented from being transferred to the first area A1.

Then, as shown in FIG. 9D, when the resist pattern R is removed, a horizontal alignment film (second alignment layer) 42 is formed, and the structure shown in FIG.
Subsequent steps, such as the second substrate forming method and the liquid crystal sealing method, are the same as those in the first embodiment, and are therefore omitted.

  According to the above manufacturing method, even if the entire alignment layer 42b is rubbed, the vertical alignment film 41 is rubbed while being covered with the resist pattern R. This protects the vertical alignment film 41 from scratches such as rubbing marks. Further, the material of the horizontal alignment film is prevented from being transferred to the first area A1. Thus, a liquid crystal device with good display quality can be manufactured. Further, as in the first embodiment, the liquid crystal device (transmission type liquid crystal device) 1 can be manufactured with high productivity.

[Electronics]
An example of an electronic device including the liquid crystal device according to the above embodiment will be described.
FIG. 10A is a perspective view showing an example of a mobile phone. In FIG. 10A, reference numeral 500 denotes a mobile phone body, and reference numeral 501 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment.

  FIG. 10B is a perspective view illustrating an example of a portable information processing apparatus such as a word processor or a personal computer. In FIG. 10B, reference numeral 600 denotes an information processing apparatus, reference numeral 601 denotes an input unit such as a keyboard, reference numeral 603 denotes an information processing apparatus body, and reference numeral 602 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment. .

  FIG. 10C is a perspective view illustrating an example of a wristwatch type electronic device. In FIG. 10C, reference numeral 700 denotes a watch body, and reference numeral 701 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment.

  As described above, the electronic device illustrated in FIG. 10 is obtained by applying the above-described liquid crystal device as an example of the present invention to the display portion. Therefore, an electronic device including a display device with high contrast and high display quality can be provided. .

[Projection type display device]
Next, a configuration of a projection display device (projector) including the liquid crystal device of the above embodiment as a light modulation unit will be described with reference to FIG. FIG. 11 is a schematic configuration diagram showing a main part of a projection display device using the liquid crystal device of the above embodiment as a light modulation device. 11, 810 is a light source, 813 and 814 are dichroic mirrors, 815, 816 and 817 are reflection mirrors, 818 is an incident lens, 819 is a relay lens, 820 is an exit lens, 822, 823 and 824 are liquid crystal light modulators, and 825. Is a cross dichroic prism, and 826 is a projection lens.

  The light source 810 includes a lamp 811 such as a metal halide and a reflector 812 that reflects the light of the lamp. The dichroic mirror 813 that reflects blue light and green light transmits red light out of the light flux from the light source 810 and reflects blue light and green light. The transmitted red light is reflected by the reflection mirror 817 and is incident on the red light liquid crystal light modulation device 822 including the liquid crystal device as an example of the present invention.

  On the other hand, of the color light reflected by the dichroic mirror 813, the green light is reflected by the dichroic mirror 814 that reflects green light, and enters the liquid crystal light modulator 823 for green light that includes the above-described liquid crystal device according to the present invention. . Note that the blue light also passes through the second dichroic mirror 814. For blue light, light guide means 821 comprising a relay lens system including an incident lens 818, a relay lens 819, and an exit lens 820 is provided in order to compensate for the difference in optical path length from green light and red light. Through this, the blue light is incident on the liquid crystal light modulation device 824 for blue light provided with the liquid crystal device as an example of the present invention.

  The three color lights modulated by the respective light modulation devices are incident on the cross dichroic prism 825. In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface. These dielectric multilayer films combine the three color lights to form light representing a color image. The synthesized light is projected onto the screen 827 by the projection lens 826 which is a projection optical system, and the image is enlarged and displayed.

  Since the projection type display device having the above structure includes the liquid crystal device as an example of the present invention described above, a display device with high contrast and high display quality can be provided.

  DESCRIPTION OF SYMBOLS 1 ... Transmission type liquid crystal device (liquid crystal device), 9 ... Pixel electrode, 10 ... 1st board | substrate, 13 ... Light shielding film, 20 ... 2nd board | substrate, 21 ... Common electrode, 41, 61 ... 1st orientation layer (vertical orientation) Film), 42 ... second alignment layer (horizontal alignment film), 43, 63 ... alignment base layer, 50 ... liquid crystal layer, 55 ... rubbing device, A1 ... first area, P ... display area (pixel opening) , BM ... non-display area, R ... resist pattern.

Claims (8)

A first substrate having a plurality of pixel electrodes; a second substrate disposed opposite to the first substrate; and a liquid crystal layer sandwiched between the substrates, wherein the liquid crystal layer is in an initial alignment state Is a method of manufacturing a liquid crystal device in which the liquid crystal display device is formed of a liquid crystal having a vertical alignment and a negative dielectric anisotropy, a position corresponding to the pixel electrode is a display area, and a space between the display areas is a non-display area. And
Forming the pixel electrode at a position to be a display area of the first substrate and projecting a peripheral edge thereof to a position to be the non-display area;
Forming a first alignment layer for aligning the liquid crystal substantially vertically on the pixel electrode and at least at a position to be the display region;
Forming a second alignment layer that aligns at least the liquid crystal at a predetermined azimuth angle on the pixel electrode side of the first substrate and in the non-display region,
The step of forming the second alignment layer includes a step of forming an alignment base layer on the pixel electrode side of the first substrate on which the pixel electrode is formed, and the second alignment layer covering the alignment base layer. A step of forming a resist pattern at a location to be the non-display region, and a step of modifying the surface of the second alignment layer using the resist pattern as a mask,
The step of forming the first alignment layer includes the step of removing the resist pattern and the step of forming the first alignment layer so as to cover the alignment base layer. Method.   The step of forming the first alignment layer has a step of forming a long-chain alkyl chain that becomes the first alignment layer by reacting a silane coupling agent containing a long-chain alkyl group by a gas phase treatment. The step of forming the second alignment layer includes a step of reacting a silane coupling agent containing a short-chain alkyl group by gas phase treatment to form a short-chain alkyl chain that becomes the second alignment layer; The method for manufacturing a liquid crystal device according to claim 1, further comprising: aligning the surface on which the short-chain alkyl chain is formed in a fixed azimuth direction.   The step of orienting the surface on which the short-chain alkyl chain is formed in a certain azimuth direction is a state in which a resist pattern is not covered at any of the first alignment layer formation portion and the second alignment layer formation portion. The method for manufacturing a liquid crystal device according to claim 2, further comprising a step of performing an alignment process.   4. The method of manufacturing a liquid crystal device according to claim 2, wherein the long alkyl chain has 10 to 20 carbon atoms and the short alkyl chain has 1 to 3 carbon atoms. A first substrate having a plurality of pixel electrodes; a second substrate disposed opposite to the first substrate; and a liquid crystal layer sandwiched between the substrates, wherein the liquid crystal layer is in an initial alignment state Is a method of manufacturing a liquid crystal device in which the liquid crystal display device is formed of a liquid crystal having a vertical alignment and a negative dielectric anisotropy, a position corresponding to the pixel electrode is a display area, and a space between the display areas is a non-display area. And
Forming the pixel electrode at a position to be a display area of the first substrate and projecting a peripheral edge thereof to a position to be the non-display area;
Forming a first alignment layer for aligning the liquid crystal substantially vertically on the pixel electrode and at least at a position to be the display region;
Forming a second alignment layer that aligns at least the liquid crystal at a predetermined azimuth angle on the pixel electrode side of the first substrate and in the non-display region,
The step of forming the second alignment layer includes a step of forming an alignment base layer on the pixel electrode side of the first substrate on which the pixel electrode is formed, and the first alignment layer covering the alignment base layer. Forming a resist pattern on the first alignment layer forming portion, performing a surface modification on the first alignment layer using the resist pattern as a mask, and the resist pattern A method for manufacturing a liquid crystal device, comprising: forming a second alignment layer so as to cover the substrate; and subsequently removing the resist pattern.   The step of forming the first alignment layer has a step of forming a long-chain alkyl chain that becomes the first alignment layer by reacting a silane coupling agent containing a long-chain alkyl group by a gas phase treatment. The step of forming the second alignment layer includes a step of reacting a silane coupling agent containing a short-chain alkyl group by gas phase treatment to form a short-chain alkyl chain that becomes the second alignment layer; 6. The method of manufacturing a liquid crystal device according to claim 5, further comprising a step of aligning the surface on which the short-chain alkyl chain is formed in a fixed azimuth direction.   The step of orienting the surface on which the short-chain alkyl chain is formed in a certain azimuth direction includes the step of orienting in a state in which a resist pattern is covered at the first alignment film forming portion. Item 7. A method for manufacturing a liquid crystal device according to Item 6.   The method for producing a liquid crystal device according to claim 6 or 7, wherein the long alkyl chain has 10 to 20 carbon atoms, and the short alkyl chain has 1 to 3 carbon atoms.

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