JP2012225907A5 - - Google Patents

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Publication number
JP2012225907A5
JP2012225907A5 JP2012048613A JP2012048613A JP2012225907A5 JP 2012225907 A5 JP2012225907 A5 JP 2012225907A5 JP 2012048613 A JP2012048613 A JP 2012048613A JP 2012048613 A JP2012048613 A JP 2012048613A JP 2012225907 A5 JP2012225907 A5 JP 2012225907A5
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JP
Japan
Prior art keywords
head
diffraction grating
alignment
detecting
respect
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Application number
JP2012048613A
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English (en)
Japanese (ja)
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JP6118030B2 (ja
JP2012225907A (ja
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Priority to JP2012048613A priority Critical patent/JP6118030B2/ja
Priority claimed from JP2012048613A external-priority patent/JP6118030B2/ja
Priority to US13/428,001 priority patent/US8928882B2/en
Publication of JP2012225907A publication Critical patent/JP2012225907A/ja
Publication of JP2012225907A5 publication Critical patent/JP2012225907A5/ja
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JP2012048613A 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法 Active JP6118030B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012048613A JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法
US13/428,001 US8928882B2 (en) 2011-04-05 2012-03-23 Measurement apparatus, exposure apparatus, and device fabrication method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011084076 2011-04-05
JP2011084076 2011-04-05
JP2012048613A JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2012225907A JP2012225907A (ja) 2012-11-15
JP2012225907A5 true JP2012225907A5 (cg-RX-API-DMAC7.html) 2015-04-23
JP6118030B2 JP6118030B2 (ja) 2017-04-19

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ID=46966364

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JP2012048613A Active JP6118030B2 (ja) 2011-04-05 2012-03-05 測定装置、露光装置及びデバイスの製造方法

Country Status (2)

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US (1) US8928882B2 (cg-RX-API-DMAC7.html)
JP (1) JP6118030B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201503261TA (en) * 2012-11-19 2015-05-28 Asml Netherlands Bv Position measurement system, grating for a position measurement system and method
KR102680059B1 (ko) * 2015-11-23 2024-06-28 어플라이드 머티어리얼스, 인코포레이티드 프로세스 툴에서의 온-보드 메트롤로지(obm) 설계 및 그 영향
US12261729B1 (en) * 2024-10-14 2025-03-25 Tp-Link Systems Inc. Signal processing in wireless communication

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3082516B2 (ja) 1993-05-31 2000-08-28 キヤノン株式会社 光学式変位センサおよび該光学式変位センサを用いた駆動システム
JPH07270122A (ja) 1994-03-30 1995-10-20 Canon Inc 変位検出装置、該変位検出装置を備えた露光装置およびデバイスの製造方法
US6034378A (en) * 1995-02-01 2000-03-07 Nikon Corporation Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
JP4164414B2 (ja) * 2003-06-19 2008-10-15 キヤノン株式会社 ステージ装置
TWI574305B (zh) * 2006-01-19 2017-03-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
WO2007097379A1 (ja) * 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法
JP4789194B2 (ja) * 2006-05-01 2011-10-12 国立大学法人東京農工大学 露光装置および方法ならびにデバイス製造方法
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
JP5177449B2 (ja) * 2007-07-24 2013-04-03 株式会社ニコン 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
JP2013046048A (ja) * 2011-08-24 2013-03-04 Asml Netherlands Bv リソグラフィ装置、基板テーブル及びデバイス製造方法

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