JP2012218095A - Waste liquid processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a waste liquid processing device capable of returning pure water stored in an ion exchange resin cylinder to a fresh water storage tank when replacing the ion exchange resin cylinder.SOLUTION: In this waste liquid processing device, the ion exchange resin cylinder 63 includes a fresh water supply port to which fresh water supplied from the fresh water storage tank 5 is supplied, and a pure water delivery port for delivering pure water. The waste liquid processing device includes a high pressure air supply means 7 for supplying high pressure air through a pure water delivery port of the ion exchange resin cylinder 63, and a return pipe for communicating the fresh water supply port of the ion exchange resin cylinder 63 with the fresh water storage tank 5. By an operation of the high pressure air supply means 7, high pressure air is supplied to the ion exchange resin cylinder 63 through the pure water delivery port and pure water in the ion exchange resin cylinder 63 is returned from the fresh water supply port to the fresh water storage tank 5 via the return pipe.

Description

  The present invention relates to a processing waste liquid processing apparatus that is attached to a processing apparatus such as a cutting apparatus that cuts a workpiece such as a semiconductor wafer and processes a waste liquid of a processing liquid supplied during processing.

  In the semiconductor device manufacturing process, a plurality of regions are partitioned by dividing lines called streets arranged in a lattice pattern on the surface of a substantially wafer-shaped semiconductor wafer, and devices such as ICs, LSIs, etc. are partitioned in the partitioned regions. Form. Then, the semiconductor wafer is cut along the streets to divide the region in which the device is formed to manufacture individual semiconductor devices. In addition, optical device wafers with gallium nitride compound semiconductors laminated on the surface of a sapphire substrate are also divided into individual optical devices such as light emitting diodes and laser diodes by cutting along the streets, and are widely used in electrical equipment. ing.

  Cutting along the streets of the above-described semiconductor wafer, optical device wafer or the like is usually performed by a cutting device called a dicer. This cutting apparatus includes a chuck table for holding a workpiece such as a semiconductor wafer, a cutting means having a cutting blade for cutting the workpiece held on the chuck table, and supplying cutting water to the cutting blade. A cutting water supply means for cooling the cutting blade by supplying the cutting water to the cutting blade that rotates, and supplying the cutting water to the cutting portion of the workpiece by the cutting blade. Carry out cutting work.

  As described above, cutting waste generated by cutting silicon or a gallium nitride compound semiconductor is mixed in the machining fluid supplied at the time of cutting. Since the processing waste liquid mixed with the cutting waste made of this semiconductor material contaminates the environment, it is reused or discarded after the cutting waste is removed by using the processing waste liquid processing apparatus. (For example, refer to Patent Document 1.)

  The processing waste liquid treatment apparatus includes a waste liquid storage tank that stores a processing waste liquid generated by the processing liquid supplied during processing of the processing apparatus, and a pump that feeds the processing waste liquid stored in the waste liquid storage tank. And a waste liquid filtering means for filtering the processing waste liquid fed by the pump and refining it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and a fresh water stored in the fresh water storage tank A pure water supply pump including an ion exchange resin cylinder containing an ion exchange resin that purifies pure water supplied by the fresh water supply pump into pure water, and the pure water generation means The pure water purified by the above is circulated to the processing liquid supply means of the processing apparatus.

JP 2009-190128 A

  The ion exchange resin for purifying fresh water into pure water in the processing waste liquid treatment apparatus has reached the end of its life and needs to be replaced when a predetermined amount of fresh water is treated. In this exchange, the ion exchange resin cylinder containing the ion exchange resin is replaced. However, since the pure water in which the purified water is purified is collected in the ion exchange resin cylinder, this pure water is also discarded together with the ion exchange resin. Therefore, there is a problem that it is uneconomical.

  The present invention has been made in view of the above-mentioned facts, and its technical problem is that when replacing an ion exchange resin cylinder, a processing waste liquid capable of returning pure water collected in the ion exchange resin cylinder to a fresh water storage tank. It is to provide a processing apparatus.

In order to solve the above technical problem, according to the present invention, a waste liquid storage tank for storing a processing waste liquid generated by processing a processing liquid supplied by a processing liquid supply means during processing of the processing apparatus, and the waste liquid storage Waste liquid feed pump for feeding the processing waste liquid stored in the tank, waste liquid filtering means for filtering and refining the processing waste liquid fed by the waste liquid feed pump into fresh water, and purified by the waste liquid filtration means Contains a fresh water storage tank that stores fresh water, a fresh water feed pump that feeds fresh water stored in the fresh water storage tank, and an ion exchange resin that purifies fresh water fed by the fresh water feed pump into pure water In a processing waste liquid treatment apparatus comprising: pure water generation means including an ion exchange resin cylinder, and processing liquid supply means for supplying pure water purified by the pure water generation means to the processing apparatus.
The ion exchange resin cylinder includes a fresh water supply port to which fresh water fed by the fresh water feed pump is supplied, and a pure water feed port for sending pure water.
A high-pressure air supply means for supplying high-pressure air through the pure water delivery port of the ion exchange resin cylinder, and a return pipe communicating the fresh water supply port of the ion exchange resin cylinder and the fresh water storage tank,
By operating the high-pressure air supply means, high-pressure air is supplied to the ion exchange resin cylinder through the pure water delivery port, and pure water in the ion exchange resin cylinder is supplied from the fresh water supply port through the return pipe. Return to the fresh water storage tank,
A processing waste liquid treatment apparatus is provided.

  In the processing waste liquid treatment apparatus according to the present invention, a high-pressure air supply means for supplying high-pressure air through the pure water delivery port of the ion exchange resin cylinder, and a return pipe communicating the fresh water supply port of the ion exchange resin cylinder and the fresh water storage tank are provided. A high-pressure air supply means is provided to supply high-pressure air to the ion exchange resin cylinder through the pure water delivery outlet, and the pure water in the ion exchange resin cylinder is supplied from the fresh water supply port to the fresh water storage tank through the return pipe. When replacing an ion exchange resin cylinder that has reached the end of its life, the high-pressure air supply means is activated to discharge the pure water accumulated in the ion exchange resin cylinder and return it to the fresh water storage tank. Accordingly, the pure water is economically disposed of together with the ion exchange resin.

The perspective view which shows the state which has arrange | positioned the processing waste-liquid processing apparatus comprised according to this invention adjacent to the cutting device as a processing apparatus. Explanatory drawing which shows the component of the processing waste liquid processing apparatus comprised according to this invention according to the flow of processing waste liquid. FIG. 3 is a perspective view illustrating a state in which constituent walls of a processing waste liquid treatment apparatus are disposed in the apparatus housing through the walls constituting the apparatus housing illustrated in FIG. 2. Sectional drawing of the ion exchange resin cylinder which comprises the processing waste liquid processing apparatus shown in FIG. The block diagram of the configuration of the control means equipped in the processing waste liquid treatment apparatus constructed according to the present invention.

  DESCRIPTION OF EMBODIMENTS Hereinafter, preferred embodiments of a processing waste liquid treatment apparatus configured according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view of a processing waste liquid processing apparatus according to the present invention disposed adjacent to a cutting apparatus as a processing apparatus.
The cutting device 2 as a processing device includes a device housing 20 having a substantially rectangular parallelepiped shape. A chuck table 21 that holds a workpiece is disposed in the apparatus housing 20 so as to be movable in a direction indicated by an arrow X that is a cutting feed direction. The chuck table 21 sucks and holds a workpiece on a holding surface which is an upper surface by operating a suction means (not shown). Further, the chuck table 21 is configured to be rotatable by a rotation mechanism (not shown). The chuck table 21 is provided with a clamp 211 for fixing an annular frame that supports a wafer, which will be described later, as a workpiece via a dicing tape. The chuck table 21 configured as described above can be moved in a cutting feed direction indicated by an arrow X by a cutting feed means (not shown).

  A cutting apparatus 2 shown in FIG. 1 includes a spindle unit 22 as cutting means. The spindle unit 22 is moved in the index feed direction indicated by an arrow Y in FIG. 1 by an index feed means (not shown), and is moved in the cut feed direction indicated by an arrow Z in FIG. 1 by a notch feed means (not shown). ing. The spindle unit 22 is mounted on a moving base (not shown) and is adjusted to move in a direction indicated by an arrow Y that is an indexing direction and a direction indicated by an arrow Z that is a cutting direction, and the spindle housing 221 is freely rotatable. And a cutting blade 223 attached to the front end portion of the rotating spindle 222. A blade cover 224 that covers the upper half of the cutting blade 223 is attached to the front end of the spindle housing 221, and a machining fluid supply nozzle 225 that injects a machining fluid toward the cutting blade 223 on the blade cover 224. It is arranged. The machining liquid supply nozzle 225 is connected to a machining liquid supply unit (not shown).

  The cutting apparatus 2 shown in FIG. 1 includes an image pickup means 23 for picking up an image of the surface of the workpiece held on the chuck table 21 and detecting a region to be cut by the cutting blade 223. The imaging means 23 is composed of optical means such as a microscope and a CCD camera. A cassette placement table 24 for placing a cassette that accommodates a workpiece is disposed in the cassette placement region 24 a of the apparatus housing 20. This cassette mounting table 24 is configured to be movable in the vertical direction by lifting means (not shown). On the cassette mounting table 24, a cassette 25 for storing a semiconductor wafer W as a workpiece is placed. The semiconductor wafer W accommodated in the cassette 25 has a grid-like street formed on the surface, and devices such as ICs and LSIs are formed in a plurality of rectangular areas partitioned by the grid-like street. The semiconductor wafer W formed in this way is accommodated in the cassette 25 with the back surface adhered to the front surface of the dicing tape T mounted on the annular support frame F.

  Further, the cutting apparatus 2 in the illustrated embodiment is supported by a semiconductor wafer W (an annular frame F supported by a dicing tape T) accommodated in a cassette 25 placed on a cassette placement table 24. ) On the temporary table 26, first conveying means 28 for conveying the semiconductor wafer W carried on the temporary table 26 onto the chuck table 21, and cutting on the chuck table 21. A cleaning means 29 for cleaning the processed semiconductor wafer W and a second transfer means 290 for transferring the semiconductor wafer W cut on the chuck table 21 to the cleaning means 29 are provided.

The cutting device 2 shown in FIG. 1 is configured as described above, and its operation will be briefly described below.
The semiconductor wafer W (supported by the annular frame F via the dicing tape T) accommodated in a predetermined position of the cassette 25 placed on the cassette placement table 24 is transferred to the cassette by an elevating means (not shown). The mounting table 24 is positioned at the carry-out position by moving up and down. Next, the unloading / loading means 27 moves forward and backward to unload the semiconductor wafer W positioned at the unloading position onto the temporary placement table 26. The semiconductor wafer W carried out to the temporary placement table 26 is transferred onto the chuck table 21 by the turning operation of the first transfer means 28. When the semiconductor wafer W is placed on the chuck table 21, suction means (not shown) is operated to suck and hold the semiconductor wafer W on the chuck table 21. The annular frame F that supports the semiconductor wafer W via the dicing tape T is fixed by the clamp 211. In this way, the chuck table 21 holding the semiconductor wafer W is moved to just below the imaging means 23. When the chuck table 21 is positioned immediately below the image pickup means 23, the street formed on the semiconductor wafer W is detected by the image pickup means 23, and the spindle unit 22 is moved and adjusted in the direction of the arrow Y, which is the indexing direction. A precision alignment operation with the blade 223 is performed.

  After that, the cutting blade 223 is cut and fed by a predetermined amount in the direction indicated by the arrow Z and rotated in the predetermined direction, while the chuck table 21 holding the semiconductor wafer W is sucked and held in the direction indicated by the arrow X (cutting blade 223). The semiconductor wafer W held on the chuck table 21 is cut along a predetermined street by the cutting blade 223 (cutting process). In this cutting process, the machining fluid supply means (not shown) is operated to eject the machining fluid from the machining fluid supply nozzle 225 toward the machining portion by the cutting blade 223. When the semiconductor wafer W is cut along a predetermined street in this way, the chuck table 21 is indexed and fed in the direction indicated by the arrow Y by the street interval, and the above-described cutting process is performed. When the cutting process is performed along all the streets extending in a predetermined direction of the semiconductor wafer W, the chuck table 21 is rotated 90 degrees to extend in a direction orthogonal to the predetermined direction of the semiconductor wafer W. By performing the cutting process along the streets, all the streets formed in a lattice shape on the semiconductor wafer W are cut and divided into individual chips. The divided chips do not fall apart due to the action of the dicing tape T, but are supported by the annular frame F to maintain the wafer state.

  As described above, when the cutting process is completed along the street of the semiconductor wafer W, the chuck table 21 holding the semiconductor wafer W is first returned to the position where the semiconductor wafer W is sucked and held. Then, the suction holding of the semiconductor wafer W is released. Next, the semiconductor wafer W is transferred to the cleaning unit 29 by the second transfer unit 290. The semiconductor wafer W conveyed to the cleaning means 29 is cleaned and dried here. The semiconductor wafer W thus cleaned and dried is transferred to the temporary placement table 26 by the first transfer means 28. Then, the semiconductor wafer W is stored in a predetermined position of the cassette 25 by the unloading / loading means 27.

  In the cutting process described above, the machining fluid sprayed from the machining fluid supply nozzle 225 to the machining portion by the cutting blade 223 by the machining fluid supply means (not shown) is recovered as machining waste liquid after cooling the cutting blade 223 and the machining portion, The processed waste liquid treatment apparatus 10 disposed adjacent to the apparatus 2 is purified to pure water and reused. The processing waste liquid treatment apparatus 10 is connected to the plurality of cutting apparatuses 2, collects the processing waste liquid generated in the plurality of cutting apparatuses 2, purifies it into pure water, and supplies it to the plurality of cutting apparatuses 2 again. be able to. The processing waste liquid treatment apparatus 10 will be described with reference to FIGS. 1 to 4.

  The processing waste liquid treatment apparatus 10 in the illustrated embodiment includes an apparatus housing 100, and the components of the processing waste liquid treatment apparatus are disposed in the apparatus housing 100. The components of the processing waste liquid treatment apparatus disposed in the apparatus housing 100 will be described with reference to FIG.

  FIG. 2 shows components of the processing waste liquid treatment apparatus configured according to the present invention in accordance with the flow of the processing waste liquid. The processing waste liquid treatment apparatus 10 in the illustrated embodiment is a waste liquid tank that stores a processing waste liquid generated by processing with a processing liquid supplied from a processing liquid supply nozzle 225 to a processing portion by a cutting blade 223 during processing in the cutting apparatus 2. 3 and a waste liquid feed pump 30 that feeds the processing waste liquid stored in the waste liquid tank 3. The waste liquid tank 3 is connected by piping 31 to the processing waste liquid delivery means provided in the cutting device 2. Therefore, the processing liquid waste sent from the processing liquid discharge means provided in the cutting device 2 is introduced into the liquid waste tank 3 through the pipe 31. A waste liquid feed pump 30 for feeding the processing waste liquid to the upper wall of the waste liquid tank 3 is disposed.

  The processing waste liquid fed by the waste liquid feed pump 30 is sent to the waste liquid filtering means 4 through the processing waste liquid delivery pipe 32 made of a flexible hose. The waste liquid filtering means 4 includes a fresh water receiving pan 41 and a first filter 42 a and a second filter 42 b disposed on the fresh water receiving pan 41. The first filter 42 a and the second filter 42 b are detachably disposed on the fresh water receiving pan 41. An electromagnetic on-off valve 43a and an electromagnetic on-off valve 43b are disposed on the processing waste liquid delivery pipe 32 that connects the waste liquid feed pump 30 to the first filter 42a and the second filter 42b. When the electromagnetic on-off valve 43a is energized (ON) and opened, the processing waste liquid fed by the waste liquid feed pump 30 is introduced into the first filter 42a, and when the electromagnetic on-off valve 43b is energized (ON) and opened. The processing waste liquid fed by the waste liquid feed pump 30 is introduced into the second filter 42b. The processing waste liquid introduced into the first filter 42a and the second filter 42b is filtered by the first filter 42a and the second filter 42b, and the cutting waste mixed in the processing waste liquid is captured and purified into fresh water. It flows out into the fresh water receiving pan 41. The fresh water receiving pan 41 is connected to the fresh water storage tank 5 by a first fresh water delivery pipe 44 made of a flexible hose. Accordingly, the fresh water flowing into the fresh water receiving pan 41 passes through the first fresh water delivery pipe 44 made of a flexible hose. Through the fresh water storage tank 5 and stored.

  The processing waste liquid delivery pipe 32 is provided with pressure detecting means 33 for detecting the pressure of the processing waste liquid supplied to the first filter 42a and the second filter 42b of the waste liquid filtering means 4, and this pressure The detection means 33 sends a detection signal to the control means described later. For example, if the detection signal from the pressure detection means 33 reaches a predetermined pressure value or more in a state where the electromagnetic on-off valve 43a is energized (ON) and the processing waste liquid is filtered by the first filter 42a, The control means to be described later determines that the processing waste has accumulated on the first filter 42a and has lost its function as a filter, and deenergizes (OFF) the electromagnetic open / close valve 43a and energizes (ON) the electromagnetic open / close valve 43b. ) And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 1st filter 42a to the 2nd filter 42b. Thus, based on the message displayed on the display means, the operator can sense that the first filter 42a has reached the end of its life and replace the filter. Further, when the electromagnetic on / off valve 43b is energized (ON) and the processing waste liquid is filtered by the second filter 42b, if the detection signal from the pressure detecting means 33 reaches a predetermined pressure value or more, The control means which will be described later judges that the processing waste has accumulated on the second filter 42b and has lost its function as a filter, and deenergizes (OFF) the electromagnetic on / off valve 43b and energizes (ON) the electromagnetic on / off valve 43a. ) And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 2nd filter 42b to the 1st filter 42a.

  The fresh water sent from the waste liquid filtering means 4 via the first fresh water delivery pipe 44 made of a flexible hose and stored in the fresh water storage tank 5 is fed by the fresh water feed pump 50 and made of the flexible hose. It is sent to the pure water generating means 6 through the delivery pipe 51. The pure water generating means 6 in the illustrated embodiment includes a support base 61, a partition plate 611 erected on the support base 61, and an ultraviolet irradiation means 62 disposed on the rear side of the partition plate 611 in the support base 61. The first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b accommodating the ion exchange resin disposed on the front side of the partition plate 611 in the support base 61, and the rear side of the partition plate 611 in the support base 61 A precision filter 64 is provided. The first ion exchange resin cylinder 63a, the second ion exchange resin cylinder 63b, and the precision filter 64 are detachably disposed on the support base 61. The fresh water fed by the fresh water feed pump 50 and sent through the second fresh water delivery pipe 51 made of a flexible hose is introduced into the ultraviolet irradiation means 62, where ultraviolet (UV) is irradiated. Sterilized. The fresh water sterilized by the ultraviolet irradiation means 62 is introduced into the first ion exchange resin cylinder 63a or the second ion exchange resin cylinder 63b via the third fresh water delivery pipe 65.

Here, the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b will be described with reference to FIG.
The first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b shown in FIG. 4 are the cylinder 631, the ion exchange resin 632 accommodated in the cylinder 631, and the ion exchange resin 632 from above the cylinder 631. Is provided with a fresh water supply pipe 633. The fresh water supply pipe 633 includes a fresh water supply port 633a at the upper end, and is disposed so as to protrude from the cylinder 631. A filter 634 is disposed at the lower end of the fresh water supply pipe 633. A pure water outlet 631a is provided at the upper end of the cylinder 631, and the pure water outlet 633a communicates with the cylinder 631 through a filter 635 disposed at the upper end of the cylinder 631. As for the 1st ion exchange resin cylinder 63a and the 2nd ion exchange resin cylinder 63b which were comprised in this way, the fresh water supply port 633a is connected to the 3rd fresh water delivery pipe | tube 65, and the pure water delivery outlet 631a is the 1st. A pure water delivery pipe 67 is connected. The third fresh water delivery pipe 65 is provided with an electromagnetic on-off valve 66a and an electromagnetic on-off valve 66b. When the electromagnetic on-off valve 66a is energized (ON) and opened, the sterilized fresh water is introduced into the first ion exchange resin cylinder 63a, and when the electromagnetic on-off valve 66b is energized (ON) and opened, the sterilized water is sterilized. Fresh water is introduced into the second ion exchange resin cylinder 63b.

  The fresh water introduced into the first ion exchange resin cylinder 63a or the second ion exchange resin cylinder 63b is purified to pure water by exchanging ions. The pure water purified by ion exchange of the fresh water in this way includes fine substances such as resin waste of ion exchange resin accommodated in the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b. May be mixed. For this reason, in the illustrated embodiment, as described above, the pure water purified by the ion exchange of the fresh water by the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b is used as the first pure water delivery pipe. The fine filter 64 is introduced into the precision filter 64 through 67, and fine substances such as resin waste of ion exchange resin mixed in pure water are captured by the precision filter 64.

  The first pure water delivery pipe 67 has a pressure detection means for detecting the pressure of pure water fed from the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b to the precision filter 64. 68 is disposed, and the pressure detection means 68 sends a detection signal to a control means described later. For example, if the detection signal from the pressure detection means 68 reaches a predetermined pressure value or more, the control means described later determines that a fine substance such as resin waste has accumulated on the precision filter 64 and the filter function has been lost. And it displays on the display means provided in the operation panel mentioned later. Thus, based on the message displayed on the display means, the operator can sense that the precision filter 64 has reached the end of its life and replace the filter.

  Further, the first pure water delivery pipe 67 detects the specific resistance of pure water fed from the first ion exchange resin cylinder 63a or the second ion exchange resin cylinder 63b to the precision filter 64. A specific resistance meter 69 is provided, and this specific resistance meter 69 sends a detection signal to a control means described later. The control means to be described later applies a detection signal from the resistivity meter 69 in a state where the electromagnetic on-off valve 66a is energized (ON) and fresh water is purified to pure water by the first ion exchange resin cylinder 63a. If the value (for example, 10 MΩ · cm) or less is reached, the control means described later determines that the pure water purification capacity of the first ion exchange resin cylinder 63a has decreased, and deenergizes (OFF) the electromagnetic on-off valve 66a. Thus, the electromagnetic on-off valve 66b is energized (ON). And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 1st ion exchange resin cylinder 63a to the 2nd ion exchange resin cylinder 63b. Thus, based on the message displayed on the display means, the operator can sense that the first ion exchange resin cylinder 63a has reached the end of its life and replace the first ion exchange resin cylinder 63a. In addition, when the electromagnetic on-off valve 66b is energized (ON) and the purified water is purified to pure water by the second ion exchange resin cylinder 63b, the detection signal from the resistivity meter 69 is a predetermined value (for example, 10 MΩ). If the pressure reaches below cm), the control means described later determines that the purification capacity of the pure water by the second ion exchange resin cylinder 63b has decreased, and deenergizes (OFF) the electromagnetic open / close valve 66b to open / close the electromagnetic The valve 66a is energized (ON). And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 2nd ion exchange resin cylinder 63b to the 1st ion exchange resin cylinder 63a.

  The processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a high-pressure air supply means 7 for supplying high-pressure air to the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b through the first pure water delivery pipe 67. It has. The high-pressure air supply means 7 includes a high-pressure air source 71, a high-pressure air supply pipe 72 that connects the high-pressure air source 71 and the first pure water delivery pipe 67, and an electromagnetic wave disposed in the high-pressure air supply pipe 72. An on-off valve 73 is provided. The electromagnetic on-off valve 73 is closed when de-energized (OFF) and is opened when energized (ON). In addition, the processing waste liquid treatment apparatus 10 in the illustrated embodiment is connected to the pure water outlet 631a of each of the first ion exchange resin cylinder 63a and the second ion exchange resin cylinder 63b in relation to the high pressure air supply means 7. The first pure water delivery pipe 67 is provided with an electromagnetic open / close valve 74a and an electromagnetic open / close valve 74b. The electromagnetic open / close valve 74a and the electromagnetic open / close valve 74b are closed when de-energized (OFF), and are opened when energized (ON). Further, the processing waste liquid treatment apparatus 10 in the illustrated embodiment is disposed closer to the precision filter 64 than the connection with the high pressure air supply pipe 72 in the first pure water delivery pipe 67 in relation to the high pressure air supply means 7. The electromagnetic on-off valve 75 is provided. The electromagnetic on-off valve 75 is closed when de-energized (OFF), and is opened when energized (ON). Further, the processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a return pipe 76 that connects the third fresh water delivery pipe 65 and the fresh water storage tank 5 in association with the high-pressure air supply means 7. The return pipe 76 is provided with an electromagnetic opening / closing valve 77. The electromagnetic on-off valve 77 is closed when de-energized (OFF) and is opened when energized (ON).

  The pure water purified by the pure water generating means 6 is sent to the pure water temperature adjusting means 8 through the second pure water delivery pipe 60 made of a flexible hose. The pure water sent to the pure water temperature adjusting means 8 is adjusted to a predetermined temperature (for example, 23 ° C.) and circulated to the machining liquid supply means equipped in the cutting apparatus 2 via the pipe 80.

  Continuing the description with reference to FIG. 2, the processing waste liquid treatment apparatus 10 in the illustrated embodiment includes fresh water level detection means 52 that detects the level of fresh water stored in the fresh water storage tank 5. The fresh water level detection means 52 sends a detection signal to the control means described later. Further, the processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a water supply means 55 for supplying water to the fresh water storage tank 5. The water replenishing means 55 is controlled by a control means, which will be described later, to which a detection signal sent from the fresh water level detecting means 52 is input, and replenishes the fresh water storage tank 5 through a pipe 56. The water supplied to the fresh water storage tank 5 by the water supply means 55 may be city water.

  The waste liquid tank 3, the waste liquid filtering means 4, the pure water generating means 6, the pure water temperature adjusting means 8, each pipe, and the like are arranged in the apparatus housing 100 shown in FIGS. 3 is a perspective view of each wall, which will be described later, constituting the apparatus housing 100. In the apparatus housing 100, the waste liquid tank 3, the waste liquid filtering means 4, the pure water generating means 6, the pure water temperature adjusting means 8, the respective pipes, etc. The state where is arranged is shown. The apparatus housing 100 in the illustrated embodiment includes a frame 110 that forms a rectangular parallelepiped storage chamber, a bottom wall 121, an upper wall 122, a left wall 123, a right wall 124, and a rear wall 125 that are attached to the frame 110. And an opening / closing door 126 that is mounted on the front side of the frame body 110 and opens and closes the front opening 101 formed on the front side of the frame body 110.

  The waste liquid tank 3, the fresh water storage tank 5 and the pure water generating means 6 are disposed on the bottom wall 121 of the apparatus housing 100 configured as described above. The waste liquid tank 3 is disposed on the rear wall 125 side of the bottom wall 121 of the apparatus housing 100, the fresh water storage tank 5 is disposed in the center of the bottom wall 121 adjacent to the waste liquid tank 3, and the pure water generating means 6 is a fresh water storage unit. Adjacent to the tank 5, the bottom wall 121 is disposed on the front opening 101 side (opening / closing door 126 side).

  In the illustrated embodiment, the pure water generating means 6 is arranged so as to be drawn out through the front opening 101 of the apparatus housing 100. That is, a pair of guide rails 130, 130 arranged opposite to each other and extending in the front-rear direction in parallel with the upper surface of the bottom wall 121 are arranged at the lower ends of the inner surfaces of the left wall 123 and the right wall 124 constituting the apparatus housing 100. It is installed. By placing the support 61 of the pure water generating means 6 on the pair of guide rails 130, 130, the pure water generating means 6 passes through the front opening 101 of the apparatus housing 100 along the pair of guide rails 130, 130. It is supported so that it can be pulled out. Therefore, the first ion exchange disposed on the support base 61 constituting the pure water generating means 6 by pulling the pure water generating means 6 along the pair of guide rails 130 and 130 through the front opening 101 of the apparatus housing 100. The precision filter 64 can be easily replaced with the resin cylinder 63a and the second ion exchange resin cylinder 63b.

  In the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the waste liquid filtering means 4 is disposed on the upper side of the pure water generating means 6 and the fresh water storage tank 5 in the apparatus housing 100 so that it can be drawn out through the front opening 101 of the apparatus housing 100. Has been. That is, the inner surfaces of the left wall 123 and the right wall 124 constituting the apparatus housing 100 are arranged opposite to each other and parallel to the upper surface of the bottom wall 121 (parallel to the pair of guide rails 130 and 130). A pair of guide rails 140, 140 extending in the direction are disposed. By placing the fresh water receiving pan 41 of the waste liquid filtering means 4 on the pair of guide rails 140, 140, the waste liquid filtering means 4 is pulled out through the front opening 101 of the apparatus housing 100 along the pair of guide rails 140, 140. Supported as possible. In order to facilitate the operation of pulling out the waste liquid filtering means 4, a handle 411 protruding downward is provided at the front end of the fresh water receiving pan 41 constituting the waste liquid filtering means 4. Accordingly, by pulling out the waste liquid filtering means 4 along the pair of guide rails 140 and 140 through the front opening 101 of the apparatus housing 100, the first is disposed detachably on the fresh water receiving pan 41 constituting the waste liquid filtering means 4. The filter 42a and the second filter 42b can be easily exchanged. Since the waste liquid filtering means 4 is arranged so as to be able to be pulled out in this way, the pipe connecting the fresh water receiving pan 41 of the waste liquid filtering means 4 and the fresh water storage tank 5 is a first fresh water delivery pipe 44 made of a flexible hose. Connected by.

  As described above, in connection with connecting the fresh water receiving pan 41 of the waste liquid filtering means 4 and the fresh water storage tank 5 by the first fresh water delivery pipe 44 made of a flexible hose, the waste liquid filtering means 4 in the apparatus housing 100 is connected. A hose support plate 150 that supports the first fresh water delivery pipe 44 made of a flexible hose is disposed on the rear wall 125 side. The hose support plate 150 is configured to have a shape that inclines so as to increase toward the rear wall 125 side and inclines so as to increase toward the right wall 124 side, and is a first fresh water delivery made of a flexible hose. The pipe 44 is prevented from being bent downward by its own weight, and the first fresh water delivery pipe 44 made of a flexible hose is maintained so that the fresh water receiving pan 41 side is always positioned at a high position. Therefore, the fresh water flowing out into the fresh water receiving pan 41 can flow into the fresh water storage tank 5 through the first fresh water delivery pipe 44 made of a flexible hose by its own weight.

  In the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the pure water temperature adjusting means 8 is disposed above the hose support plate 150 in the apparatus housing 100. That is, the pure water temperature adjusting means 8 is placed on a support member (not shown) mounted on the left side wall 123 and the right side wall 124 constituting the apparatus housing 100 and fixed by appropriate fixing means.

  The processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a control means 9 for controlling the operation of each of the above-mentioned constituent means, and an operation panel 90 for inputting and displaying processing information such as waste liquid treatment start information on the control means 9. It has. The control means 9 and the operation panel 90 are integrally configured in the illustrated embodiment. The control means 9 and the operation panel 90 configured as described above are arranged above the waste liquid filtering means 4 in the apparatus housing 100. That is, the control means 9, the control means 9 and the operation panel 90 are placed on a support member (not shown) mounted on the left side wall 123 and the right side wall 124 constituting the apparatus housing 100, and fixed by appropriate fixing means. The At this time, the operation panel 90 is positioned on the front side of the device housing 100 (the side disposed on the opening / closing door 126 side). The operation panel 90 is provided with an input unit 91 for inputting processing information and the like, a display unit 92 for displaying processing information by the control unit 9 and the like.

Here, the control means 9 will be described with reference to FIG.
The control means 9 shown in FIG. 5 is configured by a computer, and a central processing unit (CPU) 901 that performs arithmetic processing according to a control program, a read-only memory (ROM) 902 that stores a control program and the like, and random access that allows reading and writing A memory (RAM) 903, an input interface 904, and an output interface 905 are provided. Detection signals and input signals from the pressure detection means 33, the fresh water level detection means 52, the pressure detection means 68, the resistivity meter 69, the input means 91, etc. are input to the input interface 904 of the control means 9. From the output interface 905 of the control means 9, the waste liquid feed pump 30, the electromagnetic on-off valve 43a, the electromagnetic on-off valve 43b, the fresh water feed pump 50, the water replenishing means 55, the electromagnetic on-off valve 66a, the electromagnetic on-off valve 66b, Control signals are output to the electromagnetic on-off valve 73, the electromagnetic on-off valve 74a, the electromagnetic on-off valve 74b, the electromagnetic on-off valve 75, the electromagnetic on-off valve 77, the display means 92, and the like.

  The processing waste liquid treatment apparatus in the illustrated embodiment is configured as described above. When the operator inputs waste liquid treatment start information from the input means 91 of the operation panel 90, the control means 9 controls each of the above constituent means to The waste liquid treatment work is executed as described above. Then, the control means 9 deenergizes (turns off) the electromagnetic on-off valve 43a of the waste liquid filtering means 4 based on the detection signal from the pressure detecting means 33 as described above when performing the above-described waste liquid treatment work. When the electromagnetic on-off valve 43b is energized (ON) or when the electromagnetic on-off valve 43b is de-energized (OFF) and the electromagnetic on-off valve 43a is energized (ON), the first filter 42a to the second The fact that the filter 42b or the second filter 42b is switched to the first filter 42a is displayed on the display means 92 of the operation panel 90. Thus, based on the message displayed on the display means 92, the operator senses that the first filter 42a or the second filter 42b has reached the end of its life, opens the door 126 of the apparatus housing 100, and filters the waste liquid. The means 4 is pulled out through the front opening 101 of the device housing 100 along a pair of guide rails 140, 140. At this time, the operator holds and pulls the handle 411 provided on the fresh water receiving pan 41 constituting the waste liquid filtering means 4. Then, the operator replaces the first filter 42a or the second filter 42b according to the message displayed on the display means 92.

  Further, the control means 9 determines that the function of the precision filter 64 has been lost if the detection signal from the pressure detection means 68 reaches a predetermined pressure value or more during the above-described waste liquid treatment work. And displayed on the display means 92 of the operation panel 90. Thus, based on the message displayed on the display means 92, the operator senses that the precision filter 64 has reached the end of its life, opens the door 126 of the apparatus housing 100, and moves the pure water generating means 6 to a pair of guide rails. Pull out through the front opening 101 of the device housing 100 along 130, 130. At this time, the operator grasps and pulls the handle 612 provided on the partition plate 611 standing on the support base 61 constituting the pure water generating means 6. Then, the operator replaces the precision filter 64 according to the message displayed on the display means 92.

  Further, when the above-described waste liquid treatment operation is being performed, the control means 9 causes the detection signal from the resistivity meter 69 to reach a predetermined value (for example, 10 MΩ · cm) or less, so When 66a is energized (ON), the display means 92 displays that the first ion exchange resin cylinder 63a has reached the end of its life. Thus, based on the message displayed on the display unit 92, the operator inputs a command signal for discharging the pure water accumulated in the first ion exchange resin cylinder 63a from the display unit 92 of the operation panel 90. Based on this command signal, the control means 9 maintains a state where the electromagnetic on-off valve 66a and the electromagnetic on-off valve 74a are energized (ON) and the electromagnetic on-off valve 66b and the electromagnetic on-off valve 74b are de-energized (OFF). The electromagnetic on-off valve 77 is de-energized (OFF) and the electromagnetic on-off valve 77 disposed on the return pipe 76 is energized (ON) to open the circuit. Then, the control means 9 energizes (ON) the electromagnetic on-off valve 73 of the high pressure air supply means 7 to open the circuit. As a result, the high pressure air supply pipe 72 and the high pressure air from the high pressure air source 71 are supplied to the first ion exchange resin cylinder 63a through the electromagnetic on / off valve 73, the first pure water delivery pipe 67, and the electromagnetic on / off valve 74a. The gas is introduced from the outlet 631a through the filter 635 into the first ion exchange resin cylinder 63a. In this way, when high-pressure air is introduced into the first ion exchange resin cylinder 63a, it acts on the pure water accumulated in the first ion exchange resin cylinder 63a, and therefore the first ion exchange resin cylinder. The pure water accumulated in 63a is returned to the fresh water storage tank 5 through the filter 634, the fresh water supply pipe 633, the fresh water supply port 633a, the electromagnetic on-off valve 66a, the return pipe 76, and the electromagnetic on-off valve 77. As described above, by operating the high pressure air supply means 7 for several tens of seconds, the pure water accumulated in the first ion exchange resin cylinder 63a can be discharged and returned to the fresh water storage tank 5.

  As described above, when the pure water accumulated in the first ion exchange resin cylinder 63a is discharged and returned to the fresh water storage tank 5, the control means 9 includes the electromagnetic on-off valve 73 of the high-pressure air supply means 7 and The electromagnetic on-off valve 77 disposed on the return pipe 76 is de-energized (OFF) to close it, and the electromagnetic on-off valve 75 is energized (ON) to open. Then, the electromagnetic on-off valve 66a is deenergized (OFF) and the electromagnetic on-off valve 66b is energized (ON). In this way, the control means 9 displays on the display means 92 that the first ion exchange resin cylinder 63a is switched to the second ion exchange resin cylinder 63b. The operator replaces the first ion exchange resin cylinder 63a that has reached the end of life in accordance with the message displayed on the display means 92. That is, the operator opens the opening / closing door 126 of the apparatus housing 100 and pulls the pure water generating means 6 through the pair of guide rails 130 and 130 through the front opening 101 of the apparatus housing 100. At this time, the operator grasps and pulls the handle 612 provided on the partition plate 611 erected on the support base 61 constituting the pure water generating means 6 as described above. Then, the operator replaces the first ion exchange resin cylinder 63a that has reached the end of life according to the message displayed on the display means 92. At this time, since the pure water accumulated in the first ion exchange resin cylinder 63a is discharged as described above and returned to the fresh water storage tank 5, it is economical without being discarded together with the ion exchange resin 632. It is.

2: Cutting device 21: Chuck table 22: Spindle unit 221: Spindle housing 222: Rotating spindle 223: Cutting blade 225: Processing liquid supply nozzle 3: Waste liquid tank 30: Waste liquid feed pump 4: Waste liquid filtering means 41: Fresh water receiving pan 42a: first filter 42b: second filter 43a, 43b: electromagnetic open / close valve 5: fresh water storage tank 50: fresh water feed pump 52: fresh water level detecting means 55: water replenishing means 6: pure water generating means 61: support Table 62: Ultraviolet irradiation means 63a: First ion exchange resin cylinder 63b: Second ion exchange resin cylinder 64: Precision filter 66a, 66b: Electromagnetic on-off valve 7: High pressure air supply means 71: High pressure air source 72: High pressure air Supply pipe 73: Electromagnetic on-off valve 9: Control means 10: Processing waste liquid treatment apparatus 100: Equipment Housing

Claims (1)

A waste liquid storage tank for storing the processing waste liquid generated by the processing liquid supplied by the processing liquid supply means during processing of the processing apparatus, and a waste liquid supply for supplying the processing waste liquid stored in the waste liquid storage tank A pump, a waste liquid filtering means for filtering the processing waste liquid fed by the waste liquid feed pump and refining it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and a fresh water storage tank A pure water feed pump that feeds the stored fresh water, and a pure water generating means that includes an ion exchange resin cylinder containing an ion exchange resin that purifies the pure water fed by the fresh water feed pump into pure water; and In a processing waste liquid treatment apparatus comprising: a processing liquid supply means for supplying pure water purified by pure water generation means to the processing apparatus;
The ion exchange resin cylinder includes a fresh water supply port to which fresh water fed by the fresh water feed pump is supplied, and a pure water feed port for sending pure water.
A high-pressure air supply means for supplying high-pressure air through the pure water delivery port of the ion exchange resin cylinder, and a return pipe communicating the fresh water supply port of the ion exchange resin cylinder and the fresh water storage tank,
By operating the high-pressure air supply means, high-pressure air is supplied to the ion exchange resin cylinder through the pure water delivery port, and pure water in the ion exchange resin cylinder is supplied from the fresh water supply port through the return pipe. Return to the fresh water storage tank,
A processing waste liquid treatment apparatus characterized by that.

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